JP5750293B2 - 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 - Google Patents
表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 Download PDFInfo
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- JP5750293B2 JP5750293B2 JP2011087816A JP2011087816A JP5750293B2 JP 5750293 B2 JP5750293 B2 JP 5750293B2 JP 2011087816 A JP2011087816 A JP 2011087816A JP 2011087816 A JP2011087816 A JP 2011087816A JP 5750293 B2 JP5750293 B2 JP 5750293B2
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- amorphous carbon
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- 229910003481 amorphous carbon Inorganic materials 0.000 title claims description 136
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 230000004048 modification Effects 0.000 title description 4
- 238000012986 modification Methods 0.000 title description 4
- 239000010408 film Substances 0.000 claims description 215
- 239000007789 gas Substances 0.000 claims description 77
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 70
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 64
- 239000011737 fluorine Substances 0.000 claims description 64
- 229910052731 fluorine Inorganic materials 0.000 claims description 64
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 54
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 51
- 239000010703 silicon Substances 0.000 claims description 51
- 229910052710 silicon Inorganic materials 0.000 claims description 51
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 50
- 239000001301 oxygen Substances 0.000 claims description 50
- 229910052760 oxygen Inorganic materials 0.000 claims description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 34
- 229910052757 nitrogen Inorganic materials 0.000 claims description 32
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- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 36
- 239000010410 layer Substances 0.000 description 28
- 238000000034 method Methods 0.000 description 25
- 230000000052 comparative effect Effects 0.000 description 23
- 229910052786 argon Inorganic materials 0.000 description 18
- 239000005871 repellent Substances 0.000 description 16
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical group O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 11
- 229910001882 dioxygen Inorganic materials 0.000 description 11
- 239000011888 foil Substances 0.000 description 11
- 238000002360 preparation method Methods 0.000 description 11
- 150000004756 silanes Chemical class 0.000 description 10
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
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- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
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- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 230000005660 hydrophilic surface Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
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- 229910000077 silane Inorganic materials 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
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- 239000002904 solvent Substances 0.000 description 3
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 3
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 2
- BSYQEPMUPCBSBK-UHFFFAOYSA-N [F].[SiH4] Chemical compound [F].[SiH4] BSYQEPMUPCBSBK-UHFFFAOYSA-N 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
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- 150000003377 silicon compounds Chemical class 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- JQMFQLVAJGZSQS-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JQMFQLVAJGZSQS-UHFFFAOYSA-N 0.000 description 1
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
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- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
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- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011087816A JP5750293B2 (ja) | 2010-04-09 | 2011-04-11 | 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010090052 | 2010-04-09 | ||
| JP2010090052 | 2010-04-09 | ||
| JP2011087816A JP5750293B2 (ja) | 2010-04-09 | 2011-04-11 | 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011230505A JP2011230505A (ja) | 2011-11-17 |
| JP2011230505A5 JP2011230505A5 (enExample) | 2014-09-04 |
| JP5750293B2 true JP5750293B2 (ja) | 2015-07-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2011087816A Active JP5750293B2 (ja) | 2010-04-09 | 2011-04-11 | 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 |
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| JP (1) | JP5750293B2 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2012169540A1 (ja) * | 2011-06-06 | 2012-12-13 | 太陽化学工業株式会社 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
| JP6256953B2 (ja) * | 2012-03-26 | 2018-01-10 | シルコテック コーポレーション | コーティングされた物品及び化学蒸着方法 |
| JP6125210B2 (ja) * | 2012-09-11 | 2017-05-10 | 太陽誘電ケミカルテクノロジー株式会社 | 工作物を収容可能なメッシュ構造体 |
| JP7205742B2 (ja) * | 2018-08-07 | 2023-01-17 | 大日本印刷株式会社 | 積層フィルムおよびシリコーン樹脂成型体 |
| JP6595062B2 (ja) * | 2018-09-04 | 2019-10-23 | 太陽誘電株式会社 | 構造体及び構造体の製造方法 |
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| JP4357912B2 (ja) * | 2003-09-18 | 2009-11-04 | 大日本印刷株式会社 | バリア性フィルム |
| JP4402412B2 (ja) * | 2003-09-25 | 2010-01-20 | 大日本印刷株式会社 | 積層材およびそれを使用した包装用袋 |
| JP2009107314A (ja) * | 2007-11-01 | 2009-05-21 | Seiko Epson Corp | ノズルプレート、液滴吐出ヘッド及び液滴吐出装置並びにノズルプレートの製造方法 |
| JP2009113351A (ja) * | 2007-11-07 | 2009-05-28 | Seiko Epson Corp | シリコン製ノズル基板、シリコン製ノズル基板を備えた液滴吐出ヘッド、液滴吐出ヘッドを搭載した液滴吐出装置、及びシリコン製ノズル基板の製造方法 |
| JP5532555B2 (ja) * | 2008-07-04 | 2014-06-25 | 株式会社リコー | 撥液層被覆部材の作製方法 |
| JP2010067637A (ja) * | 2008-09-08 | 2010-03-25 | Toyota Industries Corp | 放熱部材並びにそれを用いた半導体装置及びそれらの製造方法 |
| JP5420877B2 (ja) * | 2008-10-07 | 2014-02-19 | テイカ製薬株式会社 | 眼科用剤 |
| WO2011108625A1 (ja) * | 2010-03-03 | 2011-09-09 | 太陽化学工業株式会社 | 非晶質炭素膜からなる層への固定化方法及び積層体 |
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