JP5737606B2 - プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法 - Google Patents

プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法 Download PDF

Info

Publication number
JP5737606B2
JP5737606B2 JP2010293660A JP2010293660A JP5737606B2 JP 5737606 B2 JP5737606 B2 JP 5737606B2 JP 2010293660 A JP2010293660 A JP 2010293660A JP 2010293660 A JP2010293660 A JP 2010293660A JP 5737606 B2 JP5737606 B2 JP 5737606B2
Authority
JP
Japan
Prior art keywords
plasma
microwave
unit
electric field
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010293660A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012142172A5 (enExample
JP2012142172A (ja
Inventor
秀郎 菅井
秀郎 菅井
イヴァン　ペトロフ　ガナシェフ
ペトロフ ガナシェフ イヴァン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Chubu University
Original Assignee
Shibaura Mechatronics Corp
Chubu University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp, Chubu University filed Critical Shibaura Mechatronics Corp
Priority to JP2010293660A priority Critical patent/JP5737606B2/ja
Publication of JP2012142172A publication Critical patent/JP2012142172A/ja
Publication of JP2012142172A5 publication Critical patent/JP2012142172A5/ja
Application granted granted Critical
Publication of JP5737606B2 publication Critical patent/JP5737606B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2010293660A 2010-12-28 2010-12-28 プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法 Active JP5737606B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010293660A JP5737606B2 (ja) 2010-12-28 2010-12-28 プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010293660A JP5737606B2 (ja) 2010-12-28 2010-12-28 プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法

Publications (3)

Publication Number Publication Date
JP2012142172A JP2012142172A (ja) 2012-07-26
JP2012142172A5 JP2012142172A5 (enExample) 2014-02-20
JP5737606B2 true JP5737606B2 (ja) 2015-06-17

Family

ID=46678247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010293660A Active JP5737606B2 (ja) 2010-12-28 2010-12-28 プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法

Country Status (1)

Country Link
JP (1) JP5737606B2 (enExample)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4107736B2 (ja) * 1998-11-16 2008-06-25 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP2000173797A (ja) * 1998-12-01 2000-06-23 Sumitomo Metal Ind Ltd マイクロ波プラズマ処理装置
JP3830814B2 (ja) * 2001-12-21 2006-10-11 シャープ株式会社 プラズマプロセス装置およびプラズマ制御方法
JP2004306029A (ja) * 2003-03-27 2004-11-04 Techno Network Shikoku Co Ltd 化学反応装置および有害物質分解方法
JP4678718B2 (ja) * 2005-03-14 2011-04-27 国立大学法人名古屋大学 プラズマ発生装置
JP4852934B2 (ja) * 2005-08-26 2012-01-11 パナソニック電工株式会社 微細気泡発生装置
JP2008256625A (ja) * 2007-04-09 2008-10-23 Canon Inc 検出装置及び検出方法
JP2009110802A (ja) * 2007-10-30 2009-05-21 Noritsu Koki Co Ltd プラズマ発生装置及びワーク処理装置
JP4849382B2 (ja) * 2008-02-18 2012-01-11 株式会社安川電機 水処理装置

Also Published As

Publication number Publication date
JP2012142172A (ja) 2012-07-26

Similar Documents

Publication Publication Date Title
JP4607073B2 (ja) マイクロ波共鳴プラズマ発生装置、該装置を備えるプラズマ処理システム
CN102084469B (zh) 等离子体处理装置
JP5717888B2 (ja) プラズマ処理装置
KR100291152B1 (ko) 플라즈마발생장치
US10083820B2 (en) Dual-frequency surface wave plasma source
JP6545053B2 (ja) 処理装置および処理方法、ならびにガスクラスター発生装置および発生方法
JP2011029475A (ja) プラズマ処理装置及びプラズマ処理方法
JP5799503B2 (ja) 液中プラズマ発生装置、液中プラズマ処理装置、液中プラズマ発生方法、および液中プラズマ処理方法
JP2008187062A (ja) プラズマ処理装置
JPWO2011099247A1 (ja) 液中プラズマ用電極、液中プラズマ発生装置およびプラズマ発生方法
CN1290399A (zh) 在等离子体中产生激活/离子化粒子的装置
KR102015876B1 (ko) 플라즈마 처리 방법 및 플라즈마 처리 장치
JP6757162B2 (ja) プラズマ処理方法、およびプラズマ処理装置
JP5737606B2 (ja) プラズマ発生装置、プラズマ処理装置、プラズマ発生方法、およびプラズマ処理方法
JP6244141B2 (ja) プラズマ発生装置およびその利用
JP7658822B2 (ja) プラズマアプリケータ、およびプラズマ処理装置
JP5088667B2 (ja) プラズマ処理装置
JP7220944B2 (ja) プラズマを収容したラジカル源
JP2011187507A (ja) プラズマ処理装置およびプラズマ処理方法
JP5363901B2 (ja) プラズマ処理装置及びプラズマ処理方法
JP7137737B2 (ja) 金属ナノ粒子の製造方法
CN109479369B (zh) 等离子源以及等离子处理装置
JPH11238597A (ja) プラズマ処理方法及び装置
JP2010098174A (ja) プラズマ処理装置
JP2005116362A (ja) マイクロ波励起のプラズマ処理装置およびプラズマ処理方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131224

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131224

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20131225

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140912

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140918

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141112

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150311

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150409

R150 Certificate of patent or registration of utility model

Ref document number: 5737606

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250