JP5723187B2 - Multi-chip substrate - Google Patents
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- JP5723187B2 JP5723187B2 JP2011064802A JP2011064802A JP5723187B2 JP 5723187 B2 JP5723187 B2 JP 5723187B2 JP 2011064802 A JP2011064802 A JP 2011064802A JP 2011064802 A JP2011064802 A JP 2011064802A JP 5723187 B2 JP5723187 B2 JP 5723187B2
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- 239000000758 substrate Substances 0.000 title claims description 116
- 238000001465 metallisation Methods 0.000 claims description 20
- 239000000919 ceramic Substances 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 description 31
- 238000005520 cutting process Methods 0.000 description 23
- 238000007747 plating Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 239000004020 conductor Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 230000002265 prevention Effects 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000004080 punching Methods 0.000 description 3
- 238000005336 cracking Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Structure Of Printed Boards (AREA)
Description
本発明は、例えばSAWフィルター用パッケージやデュプレクサー用パッケージなどに用いられる配線基板を製造する際に使用される多数個取り基板に関するものである。 The present invention relates to a multi-chip substrate used when manufacturing a wiring substrate used for, for example, a SAW filter package or a duplexer package.
一般に、配線基板を製造する場合には、1枚の大版の基板上に複数の配線基板を形成したいわゆる多数個取り基板が用いられる。この種の多数個取り基板は、ビア導体や配線層などを有する複数の配線基板が縦横に配置された中央の配線基板領域と、その配線基板領域の周囲を囲む様に形成されたセラミック層からなる枠部とから構成されている。 In general, when a wiring board is manufactured, a so-called multi-piece substrate in which a plurality of wiring boards are formed on one large-sized board is used. This type of multi-piece substrate is composed of a central wiring board region in which a plurality of wiring boards having via conductors and wiring layers are arranged vertically and horizontally, and a ceramic layer formed so as to surround the periphery of the wiring board region. And a frame portion.
また、近年では、部品全体の小型化のために、多数個取り基板の薄型化が顕著であり、そのため多数個取り基板が反るという問題が生じている。この対策として、枠部の外周に沿って、配線基板領域の全周を囲む様に、複数のライン状のメタライズ層を形成する技術が提案されている(特許文献1参照)。 Further, in recent years, a reduction in the thickness of a multi-piece substrate has been remarkable in order to reduce the size of the entire component, and thus a problem has arisen that the multi-piece substrate is warped. As a countermeasure, a technique has been proposed in which a plurality of line-shaped metallization layers are formed so as to surround the entire periphery of the wiring board region along the outer periphery of the frame portion (see Patent Document 1).
この従来技術によって多数個取り基板を製造する際には、大版のグリーンシートに、複数の多数個取り基板に対応した領域(多数個取り基板用領域)を形成し、次に、各多数個取り基板用領域の外周の縁部に沿ってメタライズ層を形成し、次に、メタライズ層に沿って各多数個取り基板用領域を切断して各多数個取り基板用領域のグリーンシートを分離し、その後、各多数個取り基板用領域のグリーンシートを焼成して多数個取り基板を製造していた。 When manufacturing a multi-chip substrate by this conventional technique, an area corresponding to a plurality of multi-chip substrates (a multi-chip substrate area) is formed on a large green sheet, and then each multi-chip substrate is formed. A metallized layer is formed along the outer peripheral edge of the substrate substrate area, and then each multi-chip substrate region is cut along the metallized layer to separate each multi-substrate substrate green sheet. Thereafter, the multi-chip substrate was manufactured by firing the green sheet for each multi-chip substrate region.
しかしながら、上述した従来技術では、多数個取り基板の反りについては解決が図られているが、多数個取り基板を薄型化するに伴って、多数個取り基板を搬送する際などに、その角部等に欠けやクラックが発生するという問題については、何等検討されていない。 However, in the above-described prior art, the warping of the multi-cavity substrate is solved, but when the multi-cavity substrate is transported, the corner portion of the multi-cavity substrate is reduced. No consideration has been given to the problem of chipping or cracking.
また、上述した従来技術では、メタライズ層の形成箇所にて各多数個取り基板領域を切断するので、その切断の際に、メタライズ層の切断くずが多数個取り基板領域に付着することがある。そのため、多数個取り基板領域のグリーンシートを焼成後した場合に、多数個取り基板にメタライズ層の切断くずが残っていると、多数個取り基板や各配線基板にショート等の問題が生じる恐れがあった。 Further, in the above-described prior art, each multi-piece substrate region is cut at the location where the metallized layer is formed. Therefore, when the cutting is performed, cutting pieces of the metallized layer may adhere to the multi-piece substrate region. Therefore, after firing the green sheet of the multi-chip substrate area, if the metallized layer cutting waste remains on the multi-chip substrate, problems such as short circuit may occur on the multi-chip substrate and each wiring board. there were.
本発明は、上述した課題を解決するためになされたものであり、その目的は、欠けやクラックの発生を抑制できるとともに、多数個取り基板や配線基板にショートの原因となる物質が付着することを抑制できる多数個取り基板を提供することである。 The present invention has been made to solve the above-described problems, and its purpose is to suppress the occurrence of chips and cracks, and to attach a substance that causes a short circuit to a multi-chip substrate or a wiring board. It is to provide a multi-piece substrate that can suppress the above.
(1)本発明は、第1態様として、セラミックを主体とし、平面視が矩形を呈する多数個取り基板であって、複数の配線基板が平面方向において縦横に配置された配線基板領域と、前記配線基板領域の平面方向における全周を囲む様に配置された枠部と、前記枠部の平面方向における外周に沿って形成されたメタライズ層と、を備え、前記メタライズ層は、前記枠部の外周の全ての角部を覆うように形成されるとともに、前記角部と角部との間には、前記メタライズ層が形成されない不形成領域を備え、前記多数個取り基板の所定の辺に凹部を備える場合には、当該凹部を備えた辺のメタライズ層の幅が凹部を備えない辺のメタライズ層の幅よりも大であることを特徴とする。 (1) The present invention, as a first aspect, is a multi-piece substrate mainly composed of ceramic and having a rectangular shape in plan view, wherein a plurality of wiring substrates are arranged vertically and horizontally in a planar direction; A frame portion disposed so as to surround the entire circumference in the planar direction of the wiring board region, and a metallized layer formed along an outer periphery in the planar direction of the frame portion, the metallized layer comprising: It is formed so as to cover all the corners of the outer periphery, and is provided with a non-formation region where the metallized layer is not formed between the corners and the corners, and a recess on a predetermined side of the multi-cavity substrate. Is provided, the width of the metallized layer on the side provided with the concave portion is larger than the width of the metallized layer on the side not provided with the concave portion .
本発明では、枠部の外周に沿って形成されたメタライズ層は、枠部の外周の全ての角部を覆うように形成されるとともに、角部と角部との間には、メタライズ層が形成されない不形成領域を備えている。 In the present invention, the metallized layer formed along the outer periphery of the frame part is formed so as to cover all corners of the outer periphery of the frame part, and the metallized layer is provided between the corner parts. The non-formation area | region which is not formed is provided.
従って、多数個取り基板を例えば0.15〜0.3mmの様に薄型化した場合でも、角部はメタライズ層で覆われているので、多数個取り基板を搬送する際などに、角部に欠けやクラックが発生し難いという効果がある。 Therefore, even when the multi-piece substrate is thinned, for example, 0.15 to 0.3 mm, the corners are covered with the metallized layer. There is an effect that chips and cracks are hardly generated.
しかも、本発明では、メタライズ層の形成範囲が少ないので、グリーンシートから多数個取り基板領域を切断する際に、メタライズ層の切断くずが多数個取り基板領域に付着し難く、そのため、多数個取り基板領域のグリーンシートを焼成後した場合に、多数個取り基板や配線基板にショートが発生し難いという効果がある。
凹部が形成してある辺は、メッキ時のラック掛け、はずし作業時のハンドリングミスによる欠けやクラックが発生し易いが、第1態様では、凹部が形成してある辺におけるメタライズ層の幅を(そうでない辺に比べて)広く設定しているので、凹部が形成してある辺における欠けやクラックの発生を好適に防止できる。
なお、上述した発明では、多数個取り基板の各辺においてメタライズ層が形成される長さは、各辺の40〜80%の範囲が好ましい。この範囲であれば、角部における欠けやクラックの防止と、製造段階におけるメタライズ層の切断くずの付着の防止とを、好適に両立することができる。
Furthermore, in the present invention, since the formation range of the metallized layer is small, when cutting the multi-piece substrate region from the green sheet, it is difficult for the metallized layer cutting scraps to adhere to the multi-piece substrate region. When the green sheet in the substrate region is fired, there is an effect that a short circuit hardly occurs in the multi-piece substrate and the wiring substrate.
The side where the concave portion is formed is liable to be chipped or cracked due to a racking at the time of plating and a handling mistake at the time of removal work. In the first aspect, the width of the metallized layer on the side where the concave portion is formed ( Since it is set wider (compared to the side that is not so), it is possible to suitably prevent the occurrence of chipping and cracks on the side where the recess is formed.
In the above-described invention, the length of the metallized layer formed on each side of the multi-cavity substrate is preferably in the range of 40 to 80% of each side. If it is this range, the prevention of the chip | tip and crack in a corner | angular part and the prevention of the adhesion of the cutting waste of a metallized layer in a manufacture stage can be made compatible suitably.
(2)本発明は、第2態様として、前記角部は、矩形の多数個取り基板の四隅であることを特徴とする。
ここでは、角部を例示している。矩形の基板の四隅の角部は破損し易いが、角部にメタライズ層を形成することにより、角部における欠けやクラックの発生を防止できる。
(2) As a second aspect of the present invention, the corners are four corners of a rectangular multi-chip substrate.
Here, corner portions are illustrated. Although the corners at the four corners of the rectangular substrate are easily damaged, the formation of metallization layers at the corners can prevent the corners from being chipped or cracked.
(3)本発明は、第3態様として、前記多数個取り基板の所定の辺に凹部を備える場合には、前記角部は凹部の開口端であることを特徴とする。
ここでは、角部を例示している。矩形の基板の辺に凹部がある場合には、凹部の(角となる)開口端は破損し易いが、この開口端にメタライズ層を形成することにより、開口端における欠けやクラックの発生を防止できる。この凹部はメッキを行う場合の接点端子となりうるが、接点端子を取り付ける際に発生する凹部の破損防止の効果もある。
(3) The present invention is characterized in that, as a third aspect, when a predetermined side of the multi-cavity substrate is provided with a concave portion, the corner portion is an open end of the concave portion.
Here, corner portions are illustrated. If there is a recess on the side of the rectangular substrate, the opening end (which becomes a corner) of the recess is easily damaged, but by forming a metallized layer on this opening end, the occurrence of chipping or cracking at the opening end is prevented. it can. This recess can serve as a contact terminal for plating, but also has an effect of preventing breakage of the recess that occurs when the contact terminal is attached.
(4)本発明は、第4態様として、セラミックを主体とし、平面視が矩形を呈する多数個取り基板であって、複数の配線基板が平面方向において縦横に配置された配線基板領域と、前記配線基板領域の平面方向における全周を囲む様に配置された枠部と、前記枠部の平面方向における外周に沿って形成されたメタライズ層と、を備え、前記メタライズ層は、前記枠部の外周の複数の角部を覆うように形成されるとともに、前記角部と角部との間には、前記メタライズ層が形成されない不形成領域を備え、更に、前記多数個取り基板の所定の辺に凹部を備えるとともに、当該凹部を備えた辺のメタライズ層の幅が凹部を備えない辺のメタライズ層の幅よりも大であることを特徴とする。
本発明では、枠部の外周に沿って形成されたメタライズ層は、枠部の外周の複数の角部を覆うように形成されるとともに、角部と角部との間には、メタライズ層が形成されない不形成領域を備えている。
従って、多数個取り基板を例えば0.15〜0.3mmの様に薄型化した場合でも、角部はメタライズ層で覆われているので、多数個取り基板を搬送する際などに、角部に欠けやクラックが発生し難いという効果がある。
しかも、本発明では、メタライズ層の形成範囲が少ないので、グリーンシートから多数個取り基板領域を切断する際に、メタライズ層の切断くずが多数個取り基板領域に付着し難く、そのため、多数個取り基板領域のグリーンシートを焼成後した場合に、多数個取り基板や配線基板にショートが発生し難いという効果がある。
また、凹部が形成してある辺は、メッキ時のラック掛け、はずし作業時のハンドリングミスによる欠けやクラックが発生し易いが、本第4態様では、凹部が形成してある辺におけるメタライズ層の幅を(そうでない辺に比べて)広く設定しているので、凹部が形成してある辺における欠けやクラックの発生を好適に防止できる。
なお、上述した発明では、多数個取り基板の各辺においてメタライズ層が形成される長さは、各辺の40〜80%の範囲が好ましい。この範囲であれば、角部における欠けやクラックの防止と、製造段階におけるメタライズ層の切断くずの付着の防止とを、好適に両立することができる。
( 4 ) The present invention, as a fourth aspect, is a multi-piece substrate mainly composed of ceramic and having a rectangular shape in plan view, wherein a plurality of wiring substrates are arranged vertically and horizontally in a planar direction; A frame portion disposed so as to surround the entire circumference in the planar direction of the wiring board region, and a metallized layer formed along an outer periphery in the planar direction of the frame portion, the metallized layer comprising: It is formed so as to cover a plurality of corners on the outer periphery, and is provided with a non-formation region where the metallized layer is not formed between the corners, and further, a predetermined side of the multi-cavity substrate The width of the metallized layer on the side provided with the concave part is larger than the width of the metallized layer on the side not provided with the concave part.
In the present invention, the metallized layer formed along the outer periphery of the frame is formed so as to cover a plurality of corners on the outer periphery of the frame, and the metallized layer is provided between the corners. The non-formation area | region which is not formed is provided.
Therefore, even when the multi-piece substrate is thinned, for example, 0.15 to 0.3 mm, the corners are covered with the metallized layer. There is an effect that chips and cracks are hardly generated.
Furthermore, in the present invention, since the formation range of the metallized layer is small, when cutting the multi-piece substrate region from the green sheet, it is difficult for the metallized layer cutting scraps to adhere to the multi-piece substrate region. When the green sheet in the substrate region is fired, there is an effect that a short circuit hardly occurs in the multi-piece substrate and the wiring substrate.
In addition, the side where the concave portion is formed is liable to be chipped or cracked due to mishandling during racking and removal work during plating, but in this fourth aspect, the metallized layer on the side where the concave portion is formed Since the width is set wider (compared to the side that is not so), it is possible to suitably prevent the occurrence of chipping and cracks on the side where the recess is formed.
In the above-described invention, the length of the metallized layer formed on each side of the multi-cavity substrate is preferably in the range of 40 to 80% of each side. If it is this range, the prevention of the chip | tip and crack in a corner | angular part and the prevention of the adhesion of the cutting waste of a metallized layer in a manufacture stage can be made compatible suitably.
以下、本発明の実施形態について説明する。
[第1参考形態]
a)まず、本実施形態の前提となる第1参考形態の多数個取り基板の構成を説明する。
Hereinafter, embodiments of the present invention will be described.
[First Reference Form]
a) First, the configuration of the multi-cavity substrate of the first reference embodiment, which is a premise of the present embodiment , will be described.
図1に示す様に、本参考形態の多数個取り基板1は、平面視が長方形(矩形)であり、例えばアルミナからなる上下2層のセラミック層3、5(図2参照)を積層した薄膜(例えば厚み0.15〜0.3mm)の多層基板である。なお、この多数個取り基板1の寸法としては、例えば縦80mm×横60mm×厚み1mmを採用できる。 As shown in FIG. 1, the multi-cavity substrate 1 of the present embodiment has a rectangular (rectangular) plan view, and is a thin film in which two upper and lower ceramic layers 3 and 5 (see FIG. 2) made of alumina, for example, are laminated. It is a multilayer substrate (for example, thickness 0.15-0.3 mm). In addition, as a dimension of this multi-piece substrate 1, for example, 80 mm in length x 60 mm in width x 1 mm in thickness can be adopted.
この多数個取り基板1は、複数の配線基板7が平面方向において格子状に配置された配線基板領域(図1の中央の灰色部分)9と、配線基板領域9の全周を囲む様に形成された四角形状の枠部11とからなる。 The multi-chip substrate 1 is formed so as to surround a wiring board region (gray portion at the center in FIG. 1) 9 in which a plurality of wiring boards 7 are arranged in a grid pattern in the plane direction and the entire circumference of the wiring board region 9. The rectangular frame portion 11 is formed.
このうち、配線基板領域9には、例えば縦2.5mm×横2.0mm×厚み1mmの配線基板13が、所定の個数だけ縦横方向に配置されている。
図2に示す様に、前記配線基板13においては、これを構成している上層側のセラミック層3には、縦横に合計12個のビア導体15が格子状に貫通して形成され、それらの上端面には表面側パッド17が形成されている。一方、配線基板13における下層側のセラミック層5には、縦横に2個ずつ合計4個のビア導体19が貫通して形成され、それらの下端面には裏面側パッド21が形成されている。なお、両セラミック層3、5の間には、ビア導体15同士や上下のビア導体15、19を電気的に接続する内部配線層23が形成されている。
Among these, in the wiring board region 9, for example, a predetermined number of wiring boards 13 having a length of 2.5 mm, a width of 2.0 mm, and a thickness of 1 mm are arranged in the vertical and horizontal directions.
As shown in FIG. 2, in the wiring board 13, a total of 12 via conductors 15 are formed penetrating in a lattice shape in the upper ceramic layer 3 constituting the wiring board 13. A surface side pad 17 is formed on the upper end surface. On the other hand, in the ceramic layer 5 on the lower layer side of the wiring substrate 13, a total of four via conductors 19 are formed penetrating in the vertical and horizontal directions, and back side pads 21 are formed on the lower end surfaces thereof. An internal wiring layer 23 that electrically connects the via conductors 15 and the upper and lower via conductors 15 and 19 is formed between the ceramic layers 3 and 5.
なお、前記ビア導体15、19、内部配線層23、表面側パッド17、裏面側パッド21は、例えばW又はMoからなり、表面側パッド17及び裏面側パッド21の(露出する側の)外側表面には、Niメッキ膜及びAuメッキ膜(何れも図示せず)が被覆されている。 The via conductors 15 and 19, the internal wiring layer 23, the front surface side pad 17, and the back surface side pad 21 are made of, for example, W or Mo, and the outer surface (on the exposed side) of the front surface side pad 17 and the back surface side pad 21. Is coated with a Ni plating film and an Au plating film (both not shown).
一方、図1に示す様に、前記枠部11は、図1の上下方向の短辺側の短辺側枠部25、27と、図1の左右方向の長辺側の長辺側枠部29、31とから構成されている。
このうち、長辺側枠部29、31には、その外側(同図左右方向)に、メッキ用の電極として使用される平面形状が半円状(例えば半径1mm)の凹部41が、長辺毎に2箇所づつ設けられている。
On the other hand, as shown in FIG. 1, the frame portion 11 includes short side frame portions 25 and 27 on the short side in the vertical direction in FIG. 1 and long side frame portion on the long side in the horizontal direction in FIG. 29 and 31.
Among these, the long side frame portions 29 and 31 are provided with a recess 41 on the outer side (left and right direction in the figure) having a semicircular planar shape (for example, a radius of 1 mm) used as an electrode for plating. Two places are provided for each.
特に、本参考形態では、枠部11の上下両面(図2の上下方向)において、枠部11の外周に沿って、例えばW又はMoからなる外周メタライズ層43が、一部隙間を空けて断続的に形成されている。 In particular, in the present embodiment , the outer peripheral metallized layer 43 made of, for example, W or Mo is intermittently provided with a gap between the upper and lower surfaces (vertical direction in FIG. 2) of the frame portion 11 along the outer periphery of the frame portion 11. Is formed.
この外周メタライズ層43は、帯状の層(例えば厚み10〜20μm×幅1mm)であり、多数個取り基板1の四隅の角部(隅の角部)45と、長辺側の4箇所の凹部41の近傍(特に内側に湾曲する部分と湾曲する端の部分(端の角部42))を覆う様に形成されている。 The outer peripheral metallized layer 43 is a belt-like layer (for example, 10 to 20 μm thick × 1 mm wide), and has four corners (corner corners) 45 of the multi-chip substrate 1 and four concave portions on the long side. It is formed so as to cover the vicinity of 41 (particularly, the inwardly curved portion and the curved end portion (end corner portion 42)).
詳しくは、外周メタライズ層43は、短辺側においては、短辺の長さの30%を覆う様に形成され、長辺側においては、長辺の長さの10%を覆う様に形成されている。なお、長辺の長さは凹部41が凹んでいないと仮定した長さとしている。 Specifically, the outer peripheral metallization layer 43 is formed so as to cover 30% of the length of the short side on the short side, and is formed so as to cover 10% of the length of the long side on the long side. ing. Note that the length of the long side is assumed to be the length where the recess 41 is not recessed.
つまり、図3(a)に拡大して示す様に、外周メタライズ層43は、多数個取り基板1の隅の角部45においては、その角部45の90°に曲がる端部(曲がり点X)から短辺に沿って約20mm伸びており、且つ、曲がり点Xから長辺に沿って約8mm伸びている。 That is, as shown in an enlarged view in FIG. 3A, the outer peripheral metallized layer 43 is formed at the corner 45 of the corner of the multi-piece substrate 1 at an end (bending point X) that bends 90 ° of the corner 45. ) From the bending point X along the long side and about 8 mm along the long side.
同様に、図3(b)に拡大して示す様に、外周メタライズ層43は、多数個取り基板1の凹部41においては、その凹部41の端の角部42の湾曲開始点(曲がり点Y)から長辺に沿って両隅の角部45側に約8mm伸びている。なお、凹部41の内側(配線基板領域9側)の上下面においては、その湾曲に沿って他の箇所と同様な幅で、半円状に外周メタライズ層43が形成されている。 Similarly, as shown in an enlarged view in FIG. 3 (b), the outer peripheral metallized layer 43, in the concave portion 41 of the multi-piece substrate 1, has a bending start point (bending point Y) at the corner 42 at the end of the concave portion 41. ) Extends about 8 mm toward the corners 45 at both corners along the long side. In addition, on the upper and lower surfaces inside the recess 41 (on the side of the wiring board region 9), the outer peripheral metallized layer 43 is formed in a semicircular shape with the same width as other portions along the curve.
なお、多数個取り基板1の各辺において、外周メタライズ層43が形成されていない箇所が、(外周メタライズ層43の)不形成領域46である。
b)次に、本参考形態の多数個取り基板1の製造方法について説明する。
In each side of the multi-chip substrate 1, a portion where the outer metallized layer 43 is not formed is a non-formed region 46 (of the outer metallized layer 43).
b) Next, a method for manufacturing the multi-cavity substrate 1 of this embodiment will be described.
・予め、アルミナ粉末の粒子、樹脂バインダ、可塑剤、および溶剤などからなる原料を混合して、セラミックスラリーを製作した。
・このセラミックスラリーを用い、ドクターブレード法によって、平面視が長方形(矩形)である2層のグリーンシートを形成した。尚、この2層のグリーンシートは、多数個取り基板1を複数個(例えば3個)とるための大版タイプであり、予め各多数個取り基板1の領域や各配線基板13の領域が設定されている。
A raw material composed of alumina powder particles, a resin binder, a plasticizer, a solvent, and the like was mixed in advance to produce a ceramic slurry.
Using this ceramic slurry, a two-layer green sheet having a rectangular shape (rectangular view) was formed by a doctor blade method. This two-layer green sheet is a large plate type for taking a plurality of (for example, three) multi-chip substrates 1, and a region for each multi-chip substrate 1 and a region for each wiring board 13 are set in advance. Has been.
・次に、上層用と下層用との各グリーンシートにおける複数の配線基板13の形成箇所に、所要数のビアホールを、打ち抜き加工により貫通させて形成した。
・次に、各ビアホール内に、スキージに押されたW又はMo粉末を含む導電性ペーストを、反対側の吸引による負圧を利用して充填して、未焼成ビア導体を個別に形成した。
Next, a required number of via holes were formed by punching through the formation positions of the plurality of wiring boards 13 in the green sheets for the upper layer and the lower layer.
Next, each via hole was filled with a conductive paste containing W or Mo powder pressed by a squeegee using negative pressure by suction on the opposite side to form unfired via conductors individually.
・次に、下層用のグリーンシートの表面に対し、前記と同様の導電性ペーストを、スクリーン印刷して未焼成内部配線層を形成した。
・次に、未焼成ビア導体が形成された上層用のグリーンシートと、未焼成ビア導体及び未焼成内部配線層が形成された下層用のグリーンシートとを、積層し且つ圧着して、図4に示す様な大版のグリーンシート積層体47を形成した。
Next, the same conductive paste as described above was screen-printed on the surface of the lower layer green sheet to form an unfired internal wiring layer.
Next, the upper layer green sheet on which the unfired via conductor is formed and the green sheet for the lower layer on which the unfired via conductor and the unfired internal wiring layer are formed are laminated and pressure-bonded, and FIG. A large green sheet laminate 47 as shown in FIG.
・次に、前記と同様の導電性ペーストを用いたスクリーン印刷によって、グリーンシート積層体47の上下面に、未焼成表面側パッド及び未焼成裏面側パッドを形成するとともに、切断ラインSに沿って部分的に未焼成外周メタライズ層51を形成した。 Next, an unfired front side pad and an unfired back side pad are formed on the upper and lower surfaces of the green sheet laminate 47 by screen printing using the same conductive paste as described above, and along the cutting line S. An unfired outer peripheral metallized layer 51 was partially formed.
つまり、この未焼成外側メタライズ層51を形成する際には、図4に示す様に、グリーンシート積層体47から(各多数個取り基板1に対応する)各未焼成多数個取り基板49を切り分ける際の切断ラインSに沿って、切断ラインSを跨ぐ様に所定幅(例えば外周メタライズ層43の幅の2倍の幅)で未焼成外周メタライズ層51を形成する。例えば切断ラインSの外側にも、外周メタライズ層43と同様な幅で未焼成外周メタライズ層51を形成する。なお、凹部41の部分は、凹部41の湾曲に沿って未焼成外周メタライズ層51を形成する。 That is, when the unfired outer metallized layer 51 is formed, each unfired multi-chip substrate 49 (corresponding to each multi-chip substrate 1) is cut out from the green sheet laminate 47 as shown in FIG. An unfired outer peripheral metallized layer 51 is formed with a predetermined width (for example, twice the width of the outer peripheral metallized layer 43) so as to straddle the cut line S along the cutting line S. For example, the non-fired outer peripheral metallized layer 51 is formed outside the cutting line S with the same width as the outer peripheral metallized layer 43. The concave portion 41 forms an unfired outer peripheral metallized layer 51 along the curvature of the concave portion 41.
・次に、カッターを用いて、切断ラインSに沿って、グリーンシート積層体47から各未焼成多数個取り基板49を切り分ける。その際に、未焼成外周メタライズ層51も同時に切断する。 Next, each unfired multi-chip substrate 49 is cut from the green sheet laminate 47 along the cutting line S using a cutter. At that time, the unfired outer peripheral metallized layer 51 is also cut simultaneously.
なお、前記凹部41の部分は、各未焼成多数個取り基板49を切り分ける前に、予めパンチング等により、半円形(又は円形)に切断ラインを入れておいてもよいが、未焼成多数個取り基板を切り分けた後に、パンチング等により切り分けてもよい。 The recess 41 may have a semi-circular (or circular) cutting line by punching or the like before cutting each unfired multi-piece substrate 49. After the substrate is cut, it may be cut by punching or the like.
なお、本参考形態においては、凹部41の側面にメタライズを塗布する必要はないが、別途塗布してもよい。塗布する場合は、未焼成外側メタライズ層51を形成する工程と同じ工程中に形成してもよい。 In this reference embodiment , it is not necessary to apply metallization to the side surface of the recess 41, but it may be applied separately. When applying, you may form in the same process as the process of forming the non-baking outer metallization layer 51.
・次に、未焼成ビア導体、未焼成表面側パッド、未焼成裏面側パッド、未焼成内部配線層、未焼成外周メタライズ層51が形成された未焼成多数個取り基板49を、所定の温度帯に加熱して焼成し、焼成済み基板を作製した。 Next, an unfired multi-chip substrate 49 on which an unfired via conductor, an unfired front side pad, an unfired back side pad, an unfired internal wiring layer, and an unfired outer peripheral metallized layer 51 are formed is formed in a predetermined temperature range. And baked to prepare a baked substrate.
・その後、焼成済み基板の凹部41の部分(即ちメッキ用の電極となる部分)に、電極棒(メッキラック)を接触させて、Ni電解メッキおよびAu電解メッキを行って、表面側パッド17及び裏面側パッド21の表面に、Niメッキ膜およびAuメッキ膜を被覆した。 Thereafter, the electrode bar (plating rack) is brought into contact with the recessed portion 41 of the baked substrate (that is, the portion serving as the electrode for plating) to perform Ni electrolytic plating and Au electrolytic plating, and the surface side pads 17 and The surface of the back side pad 21 was coated with a Ni plating film and an Au plating film.
これにより、多数個取り基板1を完成した。
なお、その後、カッターにより、多数個取り基板1を配線基板13の外周に沿って切り離すことにより、各配線基板13を作製した。なお、焼成前に切断ラインが予め形成してある場合は、分割によって各配線基板13を個片化してもよい。
Thereby, the multi-piece substrate 1 was completed.
After that, each wiring board 13 was produced by cutting the multi-piece substrate 1 along the outer periphery of the wiring board 13 with a cutter. In addition, when the cutting line is previously formed before baking, you may divide each wiring board 13 into pieces by a division | segmentation.
c)次に、本参考形態の効果を確認するために行った実験例について説明する。
上述した製造方法により、各多数個取り基板において、外周メタライズ層の各辺に沿
た長さの割合(%)を変えた試料を作製した。
c) it will now be described experimental example conducted for confirming the effect of this preferred embodiment.
By the manufacturing method described above, a sample in which the ratio (%) of the length along each side of the outer peripheral metallized layer was changed in each multi-cavity substrate was produced.
具体的には、各辺において、外周メタライズ層の長さ(辺に沿った長さ)の割合を、0%(メタライズ無し)とした試料Aと、100%(全周メタライズ)とした試料Bと、一部メタライズ層有り(短辺側30%、長辺側10%)とした試料Cとを、それぞれ10個ずつ作製した(他の寸法は前記第1参考形態と同様)。 Specifically, in each side, the sample A in which the ratio of the length of the outer peripheral metallized layer (length along the side) is 0% (no metallization) and the sample B in which the ratio is 100% (full metallization) 10 samples C each having a metallized layer (30% on the short side and 10% on the long side) were prepared (other dimensions are the same as in the first embodiment).
そして、これらの試料を用いて、上述した製造方法の様に、カッターを用いて、切断ラインSに沿って、グリーンシート積層体から各未焼成多数個取り基板を切り分けた(メタライズ層も同時に切断した)ところ、下記表1に示す様に、外周メタライズ層が一部形成されている試料Cの場合には、全周メタライズの試料Bと比べて、多数個取り基板にメタライズの切断くずが付着する割合が少なかった。 Then, using these samples, each unfired multi-chip substrate was cut from the green sheet laminate along the cutting line S using the cutter as in the manufacturing method described above (the metallized layer was also cut at the same time). However, as shown in Table 1 below, in the case of the sample C in which the outer peripheral metallization layer is partially formed, the metallized cutting waste adheres to the multi-piece substrate as compared with the sample B of the entire peripheral metallization. The ratio to do was small.
その結果を、下記表2に示すが、外周メタライズ層が一部形成されている試料Cの場合には、メタライズ層無しの試料Aと比べて、隅の角部や凹部の端の角部における欠けやクラックの発生が少なかった。 The results are shown in Table 2 below. In the case of the sample C in which the outer peripheral metallized layer is partially formed, compared with the sample A without the metallized layer, the corners at the corners and the corners at the ends of the recesses are shown. There were few occurrences of chips and cracks.
d)この様に、本参考形態の多数個取り基板1では、枠部11の外周に沿って形成された外周メタライズ層43は、枠部11の外周の四隅の角部(隅の角部)45や凹部41の開口端の角部(端の角部42)を覆うように形成されるとともに、各角部45、42の間には、外周メタライズ層43が形成されない不形成領域46が設けられている。 d) As described above, in the multi-cavity substrate 1 of the present embodiment, the outer peripheral metallized layer 43 formed along the outer periphery of the frame portion 11 has four corners (corner corners) on the outer periphery of the frame portion 11. 45 and the corner of the open end of the recess 41 (the corner 42 of the end) are formed, and a non-formation region 46 in which the outer metallized layer 43 is not formed is provided between the corners 45 and 42. It has been.
従って、多数個取り基板1を例えば0.15〜0.3mmの様に薄型化した場合でも、各角部45、42は外周メタライズ層43で覆われているので、多数個取り基板1を搬送する際などに、各角部45、42に欠けやクラックが発生し難いという効果がある。特に、矩形の多数個取り基板1の隅の角部5や凹部41の端の角部42は、破損し易いが、その部分に外周メタライズ層43を形成することにより、効果的に欠けやクラックの発生を防止できる。 Therefore, even when the multi-piece substrate 1 is thinned, for example, 0.15 to 0.3 mm, the corners 45 and 42 are covered with the outer peripheral metallized layer 43, so the multi-piece substrate 1 is conveyed. For example, the corners 45 and 42 are less likely to be chipped or cracked. In particular, the corners 5 of the corners of the rectangular multi-cavity substrate 1 and the corners 42 of the ends of the recesses 41 are easily damaged. Can be prevented.
しかも、本参考形態では、外周メタライズ層43の形成範囲が少ないので、グリーンシート積層体47から未焼成多数個取り基板49を切断する際に、未焼成外周メタライズ層51の切断くずが未焼成多数個取り基板49に付着し難く、そのため、未焼成多数個取り基板49を焼成後した場合に、多数個取り基板1や配線基板13にショートが発生し難いという効果がある。 In addition, in this reference embodiment, since the formation range of the outer peripheral metallized layer 43 is small, when cutting the unfired multi-cavity substrate 49 from the green sheet laminate 47, a large number of uncut fired outer metallized layer 51 cuttings are unfired. Therefore, when the unfired multi-piece substrate 49 is fired, the multi-piece board 1 and the wiring board 13 are less likely to be short-circuited.
つまり、本参考形態では、多数個取り基板1の各辺において、一部に外周メタライズ層43が形成されているので、上述した実験例から明らかな様に、各角部45、42における欠けやクラックの防止と、製造段階における未焼成外周メタライズ層51の切断くずの付着の防止とを、好適に両立することができる。
[第2の参考形態]
次に、本発明の前提となる第2参考形態について説明するが、前記第1参考形態と同様な内容の説明は省略する。
That is, in this reference embodiment, since the outer peripheral metallized layer 43 is partially formed on each side of the multi-cavity substrate 1, as is clear from the experimental example described above, It is possible to suitably achieve both prevention of cracks and prevention of adhesion of cutting waste of the unfired outer peripheral metallized layer 51 in the manufacturing stage.
[Second Reference Form]
Next, the second reference embodiment as a premise of the present invention will be described, but the description of the same contents as the first reference embodiment will be omitted.
図5に示す様に、本発明の前提となる第2参考形態の多数個取り基板51は、前記第1参考形態と同様に、略長方形のセラミック基板であり、その中央部分に多数の配線基板53が配置された長方形の配線基板領域55を備えるとともに、その配線基板領域55の外周の全てを囲む様に四角形状の枠部57を備えている。 As shown in FIG. 5, the multi-cavity substrate 51 of the second reference embodiment, which is the premise of the present invention, is a substantially rectangular ceramic substrate, similar to the first reference embodiment, and has a large number of wiring substrates at the center thereof. In addition to a rectangular wiring board region 55 in which 53 is disposed, a rectangular frame portion 57 is provided so as to surround the entire outer periphery of the wiring board region 55.
また、枠部57の表面及び裏面において、枠部57の外周の隅の角部59や凹部61には、枠部57の外周に沿って、前記第1参考形態と同様な外周メタライズ層63を備えている。なお、外周メタライズ層63の形成範囲は、各辺の長さの20〜80%の範囲である。 Further, on the front surface and the back surface of the frame portion 57, the outer peripheral metallized layer 63 similar to the first reference embodiment is formed along the outer periphery of the frame portion 57 in the corners 59 and the concave portions 61 of the outer periphery of the frame portion 57. I have. In addition, the formation range of the outer periphery metallization layer 63 is a range of 20 to 80% of the length of each side.
特に、本参考形態では、枠部57(従って多数個取り基板51)の外周の四隅の1箇所の角部59は斜めに切りかかれており、この切り欠き部65の縁部にも、同様な外周メタライズ層63が形成されている。 In particular, in this reference embodiment, one corner 59 of the four corners of the outer periphery of the frame 57 (and hence the multi-chip substrate 51) is cut obliquely, and the same applies to the edge of the notch 65. An outer peripheral metallized layer 63 is formed.
なお、外周メタライズ層63の形成範囲の%(割合)の計算の際には、斜めに切りかかれていないとして計算した(即ち、縦横の辺を延長した交点を角部とし、この角部からの外周メタライズ層63の端部までの距離を用いて算出した)。 In calculating the% (ratio) of the formation range of the outer peripheral metallized layer 63, it was calculated that the outer metallized layer 63 was not cut obliquely (that is, the intersection of extending the vertical and horizontal sides was regarded as a corner, and the distance from this corner was calculated. (Calculated using the distance to the end of the outer metallized layer 63).
本参考形態においても、前記第1参考形態と同様な効果を奏するとともに、多数個取り基板51の1箇所の角部59に切り欠き部65が形成されているので、多数個取り基板51の向きが容易に分かるという利点がある。
[第1実施形態]
次に、第1実施形態について説明するが、前記第2参考形態と同様な内容の説明は省略する。
Also in this reference embodiment, the same effects as those of the first reference embodiment can be obtained, and the notch 65 is formed at one corner 59 of the multi-cavity substrate 51. Has the advantage of being easily understood.
First Embodiment
Next, the first embodiment will be described, but the description of the same contents as the second reference embodiment will be omitted.
図6に示す様に、本実施形態の多数個取り基板71は、前記第1参考形態と同様に、略長方形のセラミック基板であり、その中央部分に多数の配線基板73が配置された長方形の配線基板領域75を備えるとともに、その配線基板領域75の外周の全てを囲む様に四角形状の枠部77を備えている。 As shown in FIG. 6, the multi-piece substrate 71 of the present embodiment is a substantially rectangular ceramic substrate as in the first reference embodiment, and is a rectangular shape in which a large number of wiring boards 73 are arranged at the center. A wiring board region 75 is provided, and a rectangular frame portion 77 is provided so as to surround the entire outer periphery of the wiring board region 75.
また、枠部77の表面及び裏面において、枠部77の外周の隅の角部79や凹部81には、枠部77の外周に沿って、前記第2実施形態と同様な外周メタライズ層83を備えている。なお、外周メタライズ層83の形成範囲は、各辺の長さの20〜80%の範囲である。 Further, on the front surface and the back surface of the frame portion 77, the outer peripheral metallization layer 83 similar to that of the second embodiment is formed along the outer periphery of the frame portion 77 in the corners 79 and the concave portions 81 of the outer periphery of the frame portion 77. I have. In addition, the formation range of the outer periphery metallization layer 83 is a range of 20 to 80% of the length of each side.
更に、本実施形態においても、枠部77(従って多数個取り基板71)の外周の1箇所の角部79は斜めに切りかかれており、この切り欠き部85の縁部にも、同様な外側メタライズ層83が形成されている。 Furthermore, also in this embodiment, one corner 79 on the outer periphery of the frame 77 (and hence the multi-chip substrate 71) is cut obliquely, and the outer edge of the notch 85 is similarly outer. A metallized layer 83 is formed.
特に、本実施形態においては、長辺側(図の左右方向)の外側メタライズ層83の幅は、短辺側(図の上下方向)の外周メタライズ層83の幅よりも大きく(例えば2倍の幅)設定されている。 In particular, in the present embodiment, the width of the outer metallization layer 83 on the long side (left-right direction in the figure) is larger than the width of the outer metallization layer 83 on the short side (vertical direction in the figure) (for example, twice as large). Width) is set.
本実施形態においても、前記第2実施形態と同様な効果を奏するとともに、長辺側(即ち凹部81のある側)の外周メタライズ層83の幅は、短辺側よりも大きく設定されているので、メッキの際に凹部81にメッキ用の部材(メッキラック)が当たっても、長辺側が破損し難いという利点がある。 In the present embodiment, the same effect as in the second embodiment is obtained, and the width of the outer metallization layer 83 on the long side (that is, the side having the recess 81) is set larger than that on the short side. Even when a plating member (plating rack) hits the recess 81 during plating, there is an advantage that the long side is not easily damaged.
尚、本発明は前記実施形態になんら限定されるものではなく、本発明を逸脱しない範囲において種々の態様で実施しうることはいうまでもない。
(1)例えば、多数個取り基板を形成するセラミックは、前記アルミナに限らず、窒化アルミニウムやムライトなど、あるいは低温焼成セラミックの一種であるガラス−セラミックとしても良い。
In addition, this invention is not limited to the said embodiment at all, and it cannot be overemphasized that it can implement with a various aspect in the range which does not deviate from this invention.
(1) For example, the ceramic forming the multi-chip substrate is not limited to alumina, but may be aluminum nitride, mullite, or a glass-ceramic that is a kind of low-temperature fired ceramic.
(2)また、多数個取り基板は、単層のセラミック層からなる形態としたり、3層以上のセラミック層を積層した多層セラミック基板としても良い。
(3)配線基板のビア導体の露出側の端面に、表面側パッドや裏面側パッドを形成せずに、ビア導体の端面にメッキを施してもよい。
(2) Further, the multi-piece substrate may be formed of a single ceramic layer or a multilayer ceramic substrate in which three or more ceramic layers are laminated.
(3) The end surface of the via conductor may be plated without forming the front surface side pad or the back surface side pad on the exposed end surface of the via conductor of the wiring board.
1、51、71…多数個取り基板
3、5…セラミック層
9、55、75…配線基板領域
11、57、77…枠部
13、53、73…配線基板
15、19…ビア導体
17…表面側パッド
21…裏面側パッド
23…内部配線層
41、61、81…凹部
42…端の角部
43、63、83…外周メタライズ層
45、59、79…隅の角部
46…不形成領域
DESCRIPTION OF SYMBOLS 1, 51, 71 ... Multi-piece substrate 3, 5 ... Ceramic layer 9, 55, 75 ... Wiring board area | region 11, 57, 77 ... Frame part 13, 53, 73 ... Wiring board 15, 19 ... Via conductor 17 ... Surface Side pad 21 ... Back side pad 23 ... Internal wiring layer 41, 61, 81 ... Recess 42 ... Corner corners 43, 63, 83 ... Peripheral metallized layers 45, 59, 79 ... Corner corners 46 ... Non-forming region
Claims (4)
複数の配線基板が平面方向において縦横に配置された配線基板領域と、
前記配線基板領域の平面方向における全周を囲む様に配置された枠部と、
前記枠部の平面方向における外周に沿って形成されたメタライズ層と、
を備え、
前記メタライズ層は、前記枠部の外周の全ての角部を覆うように形成されるとともに、前記角部と角部との間には、前記メタライズ層が形成されない不形成領域を備え、
前記多数個取り基板の所定の辺に凹部を備える場合には、当該凹部を備えた辺のメタライズ層の幅が凹部を備えない辺のメタライズ層の幅よりも大であることを特徴とする多数個取り基板。 A multi-piece substrate mainly composed of ceramic and having a rectangular shape in plan view,
A wiring board region in which a plurality of wiring boards are arranged vertically and horizontally in a plane direction;
A frame portion arranged so as to surround the entire circumference in the planar direction of the wiring board region;
A metallized layer formed along the outer periphery in the planar direction of the frame part;
With
The metallized layer is formed so as to cover all corners on the outer periphery of the frame part, and includes a non-forming region where the metallized layer is not formed between the corners and the corners,
In the case where a recess is provided on a predetermined side of the multi-cavity substrate, the width of the metallization layer on the side having the recess is larger than the width of the metallization layer on the side not having the recess. Single substrate.
複数の配線基板が平面方向において縦横に配置された配線基板領域と、
前記配線基板領域の平面方向における全周を囲む様に配置された枠部と、
前記枠部の平面方向における外周に沿って形成されたメタライズ層と、
を備え、
前記メタライズ層は、前記枠部の外周の複数の角部を覆うように形成されるとともに、前記角部と角部との間には、前記メタライズ層が形成されない不形成領域を備え、 更に、前記多数個取り基板の所定の辺に凹部を備えるとともに、当該凹部を備えた辺のメタライズ層の幅が凹部を備えない辺のメタライズ層の幅よりも大であることを特徴とする多数個取り基板。 A multi-piece substrate mainly composed of ceramic and having a rectangular shape in plan view,
A wiring board region in which a plurality of wiring boards are arranged vertically and horizontally in a plane direction;
A frame portion arranged so as to surround the entire circumference in the planar direction of the wiring board region;
A metallized layer formed along the outer periphery in the planar direction of the frame part;
With
The metallized layer is formed so as to cover a plurality of corners on the outer periphery of the frame part, and includes a non-forming region where the metallized layer is not formed between the corners and the corners. The multi-cavity substrate is provided with a recess on a predetermined side of the multi-cavity substrate, and the width of the metallization layer on the side having the recess is larger than the width of the metallization layer on the side without the recess. substrate.
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JPH02241096A (en) * | 1989-03-15 | 1990-09-25 | Fujitsu Ltd | Manufacture of multilayer ceramic substrate |
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