JP5714780B2 - ダブルパス干渉方式エンコーダシステム - Google Patents
ダブルパス干渉方式エンコーダシステム Download PDFInfo
- Publication number
- JP5714780B2 JP5714780B2 JP2014541253A JP2014541253A JP5714780B2 JP 5714780 B2 JP5714780 B2 JP 5714780B2 JP 2014541253 A JP2014541253 A JP 2014541253A JP 2014541253 A JP2014541253 A JP 2014541253A JP 5714780 B2 JP5714780 B2 JP 5714780B2
- Authority
- JP
- Japan
- Prior art keywords
- encoder
- encoder system
- regression
- incident
- scale
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Transform (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161557755P | 2011-11-09 | 2011-11-09 | |
| US61/557,755 | 2011-11-09 | ||
| PCT/US2012/064086 WO2013070871A1 (en) | 2011-11-09 | 2012-11-08 | Double pass interferometric encoder system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015048528A Division JP6224019B2 (ja) | 2011-11-09 | 2015-03-11 | ダブルパス干渉方式エンコーダシステムを用いた物体の位置判定方法。 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015501921A JP2015501921A (ja) | 2015-01-19 |
| JP2015501921A5 JP2015501921A5 (https=) | 2015-02-26 |
| JP5714780B2 true JP5714780B2 (ja) | 2015-05-07 |
Family
ID=48223473
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014541253A Active JP5714780B2 (ja) | 2011-11-09 | 2012-11-08 | ダブルパス干渉方式エンコーダシステム |
| JP2015048528A Active JP6224019B2 (ja) | 2011-11-09 | 2015-03-11 | ダブルパス干渉方式エンコーダシステムを用いた物体の位置判定方法。 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015048528A Active JP6224019B2 (ja) | 2011-11-09 | 2015-03-11 | ダブルパス干渉方式エンコーダシステムを用いた物体の位置判定方法。 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9025161B2 (https=) |
| EP (1) | EP2776792B1 (https=) |
| JP (2) | JP5714780B2 (https=) |
| KR (1) | KR101521146B1 (https=) |
| CN (2) | CN104040296B (https=) |
| TW (1) | TWI476376B (https=) |
| WO (1) | WO2013070871A1 (https=) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104040296B (zh) * | 2011-11-09 | 2016-08-24 | 齐戈股份有限公司 | 双通干涉测量编码器系统 |
| WO2013073538A1 (ja) * | 2011-11-17 | 2013-05-23 | 株式会社ニコン | エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置 |
| US9983028B2 (en) | 2012-04-26 | 2018-05-29 | Nikon Corporation | Measurement method and encoder device, and exposure method and device |
| KR101960403B1 (ko) * | 2014-08-28 | 2019-03-20 | 에이에스엠엘 네델란즈 비.브이. | 검사 장치, 검사 방법 및 제조 방법 |
| WO2016030227A1 (en) * | 2014-08-29 | 2016-03-03 | Asml Netherlands B.V. | Method for controlling a distance between two objects, inspection apparatus and method |
| EP3207339B1 (en) | 2014-10-13 | 2019-07-24 | Zygo Corporation | Interferometric encoder systems |
| DE102015203188A1 (de) * | 2015-02-23 | 2016-08-25 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| US9739644B2 (en) * | 2015-05-28 | 2017-08-22 | The Boeing Company | Interferometric rotary encoder |
| US9823061B2 (en) | 2015-06-15 | 2017-11-21 | Zygo Corporation | Displacement measurement of deformable bodies |
| CN105606033B (zh) * | 2016-03-18 | 2018-04-20 | 清华大学深圳研究生院 | 绝对式光栅尺、其主光栅及其测量方法 |
| US10488228B2 (en) * | 2016-04-11 | 2019-11-26 | Nikon Corporation | Transparent-block encoder head with isotropic wedged elements |
| US10591826B2 (en) * | 2016-04-11 | 2020-03-17 | Nikon Corporation | Encoder head with a birefringent lens element and exposure system utilizing the same |
| US10483107B2 (en) * | 2016-04-11 | 2019-11-19 | Nikon Corporation | Encoder head with birefringent elements for forming imperfect retroreflection and exposure system utilizing the same |
| US10162087B2 (en) * | 2016-04-11 | 2018-12-25 | Nikon Research Corporation Of America | Optical system with a frustrated isotropic block |
| CN105758435B (zh) * | 2016-04-14 | 2018-02-09 | 清华大学深圳研究生院 | 一种绝对式光栅尺 |
| EP3467591A4 (en) * | 2016-05-31 | 2020-02-12 | Nikon Corporation | BRAND DETECTION APPARATUS, BRAND DETECTION METHOD, MEASURING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD |
| DE102016210434A1 (de) * | 2016-06-13 | 2017-12-14 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| JP6643199B2 (ja) * | 2016-07-15 | 2020-02-12 | Dmg森精機株式会社 | 変位検出装置 |
| US11237056B2 (en) * | 2016-11-07 | 2022-02-01 | California Institute Of Technology | Monolithic assembly of reflective spatial heterodyne spectrometer |
| CN107167081B (zh) * | 2017-06-02 | 2021-06-15 | 哈尔滨师范大学 | 一种野外鸟卵测量装置 |
| CN107144298A (zh) * | 2017-06-27 | 2017-09-08 | 常州瑞丰特科技有限公司 | 高容差光栅读数头 |
| US10921718B2 (en) * | 2017-12-15 | 2021-02-16 | Nikon Corporation | Two-dimensional position encoder |
| CN112997094B (zh) * | 2018-11-13 | 2024-07-16 | 欧若拉运营公司 | 相位编码lidar中用于内反射减除的激光相位跟踪的方法和系统 |
| JP7233305B2 (ja) * | 2019-05-30 | 2023-03-06 | Dmg森精機株式会社 | 光学式変位測定装置 |
| TWI721719B (zh) | 2019-12-19 | 2021-03-11 | 財團法人工業技術研究院 | 量測裝置 |
| US11598629B2 (en) * | 2020-04-14 | 2023-03-07 | Mitutoyo Corporation | Optical displacement sensor |
| WO2022042947A1 (en) * | 2020-08-27 | 2022-03-03 | Asml Netherlands B.V. | Compact dual pass interferometer for a plane mirror interferometer |
| CN112097651B (zh) * | 2020-09-11 | 2022-07-22 | 中国科学院长春光学精密机械与物理研究所 | 外差二维光栅位移测量系统及测量方法 |
| US11802796B2 (en) | 2020-12-07 | 2023-10-31 | California Institute Of Technology | Monolithic assembly of miniature reflective cyclical spatial heterodyne spectrometer interferometry systems |
| CN114413945B (zh) * | 2021-12-20 | 2025-02-21 | 四川云盾光电科技有限公司 | 一种亮度定位的绝对式编码器 |
| US11821791B1 (en) * | 2022-06-27 | 2023-11-21 | Viavi Solutions Inc. | Techniques for reducing optical ghosts in a gratings-based optical spectrum analyzer (OSA) |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4629886A (en) | 1983-03-23 | 1986-12-16 | Yokogawa Hokushin Electric Corporation | High resolution digital diffraction grating scale encoder |
| EP0313681A1 (en) | 1987-10-30 | 1989-05-03 | Ibm Deutschland Gmbh | Phase-sensitive interferometric mask-wafer alignment |
| DE3872227T2 (de) * | 1987-12-15 | 1992-12-03 | Renishaw Plc | Opto-elektronischer skalenlese-apparat. |
| US5035507A (en) | 1988-12-21 | 1991-07-30 | Mitutoyo Corporation | Grating-interference type displacement meter apparatus |
| JP2683098B2 (ja) * | 1989-05-12 | 1997-11-26 | キヤノン株式会社 | エンコーダー |
| US5104225A (en) * | 1991-01-25 | 1992-04-14 | Mitutoyo Corporation | Position detector and method of measuring position |
| JPH05126603A (ja) * | 1991-11-05 | 1993-05-21 | Canon Inc | 格子干渉測定装置 |
| JP3478567B2 (ja) * | 1992-09-25 | 2003-12-15 | キヤノン株式会社 | 回転情報検出装置 |
| JP3144143B2 (ja) * | 1993-04-13 | 2001-03-12 | ソニー・プレシジョン・テクノロジー株式会社 | 光学式変位測定装置 |
| JP3219349B2 (ja) * | 1993-06-30 | 2001-10-15 | キヤノン株式会社 | 波長コンペンセータ、該波長コンペンセータを用いたレーザ干渉測定装置、該レーザ干渉測定装置を有するステージ装置、該ステージ装置を有する露光システム、および該露光システムを用いたデバイスの製造方法 |
| US5442172A (en) | 1994-05-27 | 1995-08-15 | International Business Machines Corporation | Wavefront reconstruction optics for use in a disk drive position measurement system |
| JP2001004411A (ja) * | 1999-06-17 | 2001-01-12 | Canon Inc | 光学式エンコーダ |
| JP3695398B2 (ja) * | 2002-01-30 | 2005-09-14 | 富士ゼロックス株式会社 | 光学式エンコーダ及びエンコーダ用スケール |
| JP4153234B2 (ja) * | 2002-04-26 | 2008-09-24 | ソニーマニュファクチュアリングシステムズ株式会社 | 受発光複合ユニット及びその製造方法、変位検出装置 |
| US7375823B2 (en) * | 2004-04-22 | 2008-05-20 | Zygo Corporation | Interferometry systems and methods of using interferometry systems |
| GB0413710D0 (en) | 2004-06-21 | 2004-07-21 | Renishaw Plc | Scale reading apparatus |
| US7317539B2 (en) | 2004-08-23 | 2008-01-08 | Asml Netherlands B.V. | Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method |
| DE102004053082A1 (de) * | 2004-11-03 | 2006-05-04 | Dr. Johannes Heidenhain Gmbh | Positionsmesssystem |
| JP4722474B2 (ja) * | 2004-12-24 | 2011-07-13 | 株式会社ミツトヨ | 変位検出装置 |
| DE102005029917A1 (de) | 2005-06-28 | 2007-01-04 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
| US7763875B2 (en) * | 2005-09-07 | 2010-07-27 | Romanov Nikolai L | System and method for sensing position utilizing an uncalibrated surface |
| US7440113B2 (en) * | 2005-12-23 | 2008-10-21 | Agilent Technologies, Inc. | Littrow interferometer |
| US7636165B2 (en) | 2006-03-21 | 2009-12-22 | Asml Netherlands B.V. | Displacement measurement systems lithographic apparatus and device manufacturing method |
| US7812965B2 (en) * | 2006-12-11 | 2010-10-12 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
| US7894075B2 (en) * | 2006-12-11 | 2011-02-22 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
| US7545507B2 (en) * | 2007-03-15 | 2009-06-09 | Agilent Technologies, Inc. | Displacement measurement system |
| US7561280B2 (en) * | 2007-03-15 | 2009-07-14 | Agilent Technologies, Inc. | Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components |
| US7864336B2 (en) | 2008-04-28 | 2011-01-04 | Agilent Technologies, Inc. | Compact Littrow encoder |
| JP5235554B2 (ja) * | 2008-08-01 | 2013-07-10 | 株式会社森精機製作所 | 光学式変位測定装置 |
| JP5113000B2 (ja) | 2008-09-19 | 2013-01-09 | 株式会社ミツトヨ | 光電式エンコーダ |
| US8120781B2 (en) * | 2008-11-26 | 2012-02-21 | Zygo Corporation | Interferometric systems and methods featuring spectral analysis of unevenly sampled data |
| US8334983B2 (en) | 2009-05-22 | 2012-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2553401B1 (en) * | 2010-03-30 | 2015-09-02 | Zygo Corporation | Interferometric encoder systems |
| US8829420B2 (en) | 2010-06-09 | 2014-09-09 | Nikon Corporation | Two dimensional encoder system and method |
| JP5856184B2 (ja) | 2010-12-16 | 2016-02-09 | ザイゴ コーポレーションZygo Corporation | 干渉計エンコーダ・システムでのサイクリック・エラー補償 |
| WO2012106246A2 (en) | 2011-02-01 | 2012-08-09 | Zygo Corporation | Interferometric heterodyne optical encoder system |
| CN104040296B (zh) * | 2011-11-09 | 2016-08-24 | 齐戈股份有限公司 | 双通干涉测量编码器系统 |
| WO2013073538A1 (ja) | 2011-11-17 | 2013-05-23 | 株式会社ニコン | エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置 |
-
2012
- 2012-11-08 CN CN201280066526.9A patent/CN104040296B/zh active Active
- 2012-11-08 US US13/671,920 patent/US9025161B2/en active Active
- 2012-11-08 EP EP12847106.7A patent/EP2776792B1/en active Active
- 2012-11-08 WO PCT/US2012/064086 patent/WO2013070871A1/en not_active Ceased
- 2012-11-08 CN CN201610602780.6A patent/CN106289336B/zh active Active
- 2012-11-08 JP JP2014541253A patent/JP5714780B2/ja active Active
- 2012-11-08 KR KR1020147015505A patent/KR101521146B1/ko active Active
- 2012-11-08 TW TW101141505A patent/TWI476376B/zh active
-
2015
- 2015-03-11 JP JP2015048528A patent/JP6224019B2/ja active Active
- 2015-03-24 US US14/666,782 patent/US9746348B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US9025161B2 (en) | 2015-05-05 |
| CN104040296B (zh) | 2016-08-24 |
| EP2776792A4 (en) | 2015-08-12 |
| CN106289336B (zh) | 2019-07-09 |
| JP6224019B2 (ja) | 2017-11-01 |
| CN104040296A (zh) | 2014-09-10 |
| US20130114061A1 (en) | 2013-05-09 |
| US9746348B2 (en) | 2017-08-29 |
| JP2015501921A (ja) | 2015-01-19 |
| KR20140097326A (ko) | 2014-08-06 |
| EP2776792A1 (en) | 2014-09-17 |
| JP2015111157A (ja) | 2015-06-18 |
| CN106289336A (zh) | 2017-01-04 |
| WO2013070871A1 (en) | 2013-05-16 |
| EP2776792B1 (en) | 2016-08-10 |
| KR101521146B1 (ko) | 2015-05-18 |
| TW201333432A (zh) | 2013-08-16 |
| TWI476376B (zh) | 2015-03-11 |
| US20150292913A1 (en) | 2015-10-15 |
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