JP5703224B2 - 有機材料のための蒸発器、及び、蒸発器を用いて基板を有機材料で被覆するための方法 - Google Patents

有機材料のための蒸発器、及び、蒸発器を用いて基板を有機材料で被覆するための方法 Download PDF

Info

Publication number
JP5703224B2
JP5703224B2 JP2011528448A JP2011528448A JP5703224B2 JP 5703224 B2 JP5703224 B2 JP 5703224B2 JP 2011528448 A JP2011528448 A JP 2011528448A JP 2011528448 A JP2011528448 A JP 2011528448A JP 5703224 B2 JP5703224 B2 JP 5703224B2
Authority
JP
Japan
Prior art keywords
chamber
organic material
sublimation
evaporator
melamine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011528448A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012504188A5 (OSRAM
JP2012504188A (ja
Inventor
シュテファン ハイン，
シュテファン ハイン，
ゲルト ホフマン，
ゲルト ホフマン，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2012504188A publication Critical patent/JP2012504188A/ja
Publication of JP2012504188A5 publication Critical patent/JP2012504188A5/ja
Application granted granted Critical
Publication of JP5703224B2 publication Critical patent/JP5703224B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2011528448A 2008-09-29 2009-09-29 有機材料のための蒸発器、及び、蒸発器を用いて基板を有機材料で被覆するための方法 Expired - Fee Related JP5703224B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08165434A EP2168643A1 (en) 2008-09-29 2008-09-29 Evaporator for organic materials
EP08165434.5 2008-09-29
PCT/IB2009/006990 WO2010035130A2 (en) 2008-09-29 2009-09-29 Evaporator for organic materials

Publications (3)

Publication Number Publication Date
JP2012504188A JP2012504188A (ja) 2012-02-16
JP2012504188A5 JP2012504188A5 (OSRAM) 2012-11-15
JP5703224B2 true JP5703224B2 (ja) 2015-04-15

Family

ID=40640318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011528448A Expired - Fee Related JP5703224B2 (ja) 2008-09-29 2009-09-29 有機材料のための蒸発器、及び、蒸発器を用いて基板を有機材料で被覆するための方法

Country Status (8)

Country Link
US (1) US20100080901A1 (OSRAM)
EP (1) EP2168643A1 (OSRAM)
JP (1) JP5703224B2 (OSRAM)
CN (1) CN102165091B (OSRAM)
MX (1) MX2011003339A (OSRAM)
RU (1) RU2524521C2 (OSRAM)
TW (1) TWI467040B (OSRAM)
WO (1) WO2010035130A2 (OSRAM)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5179739B2 (ja) * 2006-09-27 2013-04-10 東京エレクトロン株式会社 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法
WO2012081476A1 (ja) * 2010-12-14 2012-06-21 シャープ株式会社 蒸着装置、蒸着方法、並びに、有機エレクトロルミネッセンス表示装置の製造方法
JP5410618B2 (ja) * 2010-12-21 2014-02-05 シャープ株式会社 蒸着装置、蒸着方法、並びに、有機エレクトロルミネッセンス表示装置の製造方法
JP5330608B2 (ja) 2010-12-24 2013-10-30 シャープ株式会社 蒸着装置、蒸着方法、並びに、有機エレクトロルミネッセンス表示装置の製造方法
CN103430625B (zh) * 2011-03-15 2015-09-23 夏普株式会社 蒸镀装置、蒸镀方法和有机el显示装置的制造方法
JP2013100581A (ja) * 2011-11-09 2013-05-23 Ulvac Japan Ltd 蒸着装置及び蒸着方法
EP2746423B1 (en) * 2012-12-20 2019-12-18 Applied Materials, Inc. Deposition arrangement, deposition apparatus and method of operation thereof
US20150079283A1 (en) * 2013-09-13 2015-03-19 LGS Innovations LLC Apparatus and method to deposit doped films
FR3024162A1 (fr) * 2014-07-28 2016-01-29 Nexcis Dispositif et procede pour la formation d'une couche mince sur un substrat
CN107217233A (zh) * 2017-04-24 2017-09-29 无锡市司马特贸易有限公司 聚合物真空镀膜机
US11946131B2 (en) * 2017-05-26 2024-04-02 Universal Display Corporation Sublimation cell with time stability of output vapor pressure
KR20230035447A (ko) * 2017-09-20 2023-03-13 어플라이드 머티어리얼스, 인코포레이티드 기판 상의 세라믹 층의 두께를 제어하기 위한 방법 및 처리 시스템
WO2020082282A1 (en) * 2018-10-25 2020-04-30 China Triumph International Engineering Co., Ltd. Vapor deposition apparatus and use thereof
KR102859881B1 (ko) * 2020-11-18 2025-09-12 주식회사 엘지화학 유기발광다이오드의 증착장치
US20240084439A1 (en) * 2021-02-16 2024-03-14 Applied Materials, Inc. Crucible, evaporation source, evaporation method, evaporation system, and method of manufacturing a device
WO2023018600A1 (en) 2021-08-12 2023-02-16 Applied Materials, Inc. Evaporator for effective surface area evaporation
US20230130079A1 (en) * 2021-10-27 2023-04-27 Entegris, Inc. High vapor pressure delivery system

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0147536B1 (de) * 1983-10-07 1990-02-07 Johannes Zimmer Einrichtung zum gleichmässigen Verteilen fliessfähiger Medien in vorgegebener Breite
GB8708436D0 (en) * 1987-04-08 1987-05-13 British Telecomm Reagent source
RU2031187C1 (ru) * 1991-06-06 1995-03-20 Индивидуальное частное предприятие "Электрон-Вега" Испаритель
RU2051200C1 (ru) * 1991-10-01 1995-12-27 Владимир Григорьевич Белов Устройство для нанесения полимерных пленок в вакууме
EP1445036B1 (en) 1998-05-28 2006-02-01 Ulvac, Inc. Method of vapour depositing an organic film
EP0962260B1 (en) * 1998-05-28 2005-01-05 Ulvac, Inc. Material evaporation system
US6275649B1 (en) 1998-06-01 2001-08-14 Nihon Shinku Gijutsu Kabushiki Kaisha Evaporation apparatus
US6503564B1 (en) 1999-02-26 2003-01-07 3M Innovative Properties Company Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile
JP4599727B2 (ja) * 2001-02-21 2010-12-15 株式会社デンソー 蒸着装置
ITMI20011216A1 (it) * 2001-06-08 2002-12-08 Eurotecnica Dev And Licensing Procedimento migliorato per la produzione con alte rese di melanina
US7112351B2 (en) 2002-02-26 2006-09-26 Sion Power Corporation Methods and apparatus for vacuum thin film deposition
JP2004055401A (ja) * 2002-07-22 2004-02-19 Sony Corp 有機膜形成装置
US7192486B2 (en) * 2002-08-15 2007-03-20 Applied Materials, Inc. Clog-resistant gas delivery system
JP4041005B2 (ja) * 2003-04-02 2008-01-30 長州産業株式会社 薄膜堆積用分子線源とそれを使用した薄膜堆積方法
US20050271893A1 (en) * 2004-06-04 2005-12-08 Applied Microstructures, Inc. Controlled vapor deposition of multilayered coatings adhered by an oxide layer
DE10330401B3 (de) * 2003-07-04 2005-02-24 Applied Films Gmbh & Co. Kg Verfahren und Vorrichtung zum bereichsweisen Auftragen von Trennmitteln
US7288286B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
KR100958778B1 (ko) * 2004-10-22 2010-05-18 황창훈 유기 박막 증착 공정용 증발원 연속 공급장치
US7431807B2 (en) * 2005-01-07 2008-10-07 Universal Display Corporation Evaporation method using infrared guiding heater
JP5179739B2 (ja) * 2006-09-27 2013-04-10 東京エレクトロン株式会社 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法
JP5506147B2 (ja) * 2007-10-18 2014-05-28 キヤノン株式会社 成膜装置及び成膜方法
JP2009228091A (ja) * 2008-03-25 2009-10-08 Canon Inc 蒸着装置

Also Published As

Publication number Publication date
RU2524521C2 (ru) 2014-07-27
CN102165091A (zh) 2011-08-24
RU2011116917A (ru) 2012-11-10
TWI467040B (zh) 2015-01-01
EP2168643A1 (en) 2010-03-31
MX2011003339A (es) 2011-08-03
TW201020330A (en) 2010-06-01
US20100080901A1 (en) 2010-04-01
WO2010035130A2 (en) 2010-04-01
WO2010035130A3 (en) 2010-06-17
JP2012504188A (ja) 2012-02-16
CN102165091B (zh) 2013-08-14

Similar Documents

Publication Publication Date Title
JP5703224B2 (ja) 有機材料のための蒸発器、及び、蒸発器を用いて基板を有機材料で被覆するための方法
JP4966028B2 (ja) 真空蒸着装置
RU2538891C2 (ru) Испаритель для органических материалов и способ испарения органических материалов
JP5551336B2 (ja) Ｏｌｅｄの製造における有機材料の制御可能な供給
KR101379646B1 (ko) 유기 박막의 성막 장치 및 유기 재료 성막 방법
JP2007500794A (ja) 薄膜蒸着エバポレーター
JP6222929B2 (ja) 真空蒸着装置
TW200532036A (en) Vacuum evaporation plating machine
CN1946872B (zh) 蒸发装置及蒸发涂料的方法
CN101082122A (zh) 具有蒸镀器管的材料蒸镀装置
JP4545028B2 (ja) 蒸着装置
JP3662874B2 (ja) 真空蒸着装置及び真空蒸着方法
KR100656181B1 (ko) 유기 el소자의 연속 증착 시스템
JP2012226838A (ja) 真空蒸着装置
JP6207319B2 (ja) 真空蒸着装置
JP5270165B2 (ja) 気化した有機材料の付着の制御
KR20250003414A (ko) 증발 증착 장치 및 증발 증착 방법
JP7309882B2 (ja) 真空チャンバ内で基板をコーティングするための気相堆積装置及び方法
JP2008519904A (ja) 有機材料の気化を制御するための方法と装置
JP2008519905A5 (OSRAM)
US20100034970A1 (en) Apparatus and method for chemical vapor deposition
JP2007126303A (ja) 薄膜堆積用分子線源とその分子線量制御方法
JP2015209559A (ja) 蒸着装置
JP2003306763A (ja) 真空蒸着方法及び真空蒸着装置
JP5180469B2 (ja) 真空蒸着装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120926

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120926

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130924

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131015

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140114

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140924

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141215

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150127

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150223

R150 Certificate of patent or registration of utility model

Ref document number: 5703224

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees