JP5683236B2 - 形状測定装置 - Google Patents
形状測定装置 Download PDFInfo
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- JP5683236B2 JP5683236B2 JP2010265143A JP2010265143A JP5683236B2 JP 5683236 B2 JP5683236 B2 JP 5683236B2 JP 2010265143 A JP2010265143 A JP 2010265143A JP 2010265143 A JP2010265143 A JP 2010265143A JP 5683236 B2 JP5683236 B2 JP 5683236B2
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Claims (1)
- 反射型サンプル基板上の被検パタン領域に対し、空間領域及び/又は時間領域でのコヒーレントな光を、照射位置をシフトさせながら複数回照射する照射手段と、
上記照射手段により照射された上記被検パタン領域からの回折光を受光する受光手段と、
上記受光手段による受光結果である画像情報を記録する記録手段と、
形状が既知で所定幅のパタンを上記所定幅の半分のステップで格子状等間隔に点在する領域毎に測定し、上記パタンに対応する照明形状を、上記記録手段に記録された上記画像情報から、実験的に導出する導出手段と、
上記記録手段に記録された上記画像情報から、上記導出手段により導出された上記照明形状を用いて、パタン形状ならびに欠陥を抽出する演算手段と、を備え、
上記演算手段は、上記記録手段に記録された二次元の複数枚の回折強度情報に対してフーリエ変換と逆フーリエ変換による周波数変換を繰り返す処理により回折光の位相を回復して像再生するとともに、上記抽出されたパタン形状ならびに欠陥に現れる周期パタン成分をフィルタリングして出力する形状測定装置。
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JP2010265143A JP5683236B2 (ja) | 2010-11-29 | 2010-11-29 | 形状測定装置 |
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JP2010265143A JP5683236B2 (ja) | 2010-11-29 | 2010-11-29 | 形状測定装置 |
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JP2012117830A JP2012117830A (ja) | 2012-06-21 |
JP5683236B2 true JP5683236B2 (ja) | 2015-03-11 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107924118B (zh) | 2015-08-12 | 2022-08-09 | Asml荷兰有限公司 | 量测方法、辐射源、量测设备及器件制造方法 |
KR102098034B1 (ko) | 2015-08-12 | 2020-04-08 | 에이에스엠엘 네델란즈 비.브이. | 검사 장치, 검사 방법 및 제조 방법 |
KR102570560B1 (ko) * | 2015-12-24 | 2023-08-29 | 에스케이하이닉스 주식회사 | 반도체 패턴 검사 시스템, 검사 장치 및 방법 |
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WO2005114693A1 (ja) * | 2004-05-20 | 2005-12-01 | National University Corporation Hokkaido University | 電子顕微方法およびそれを用いた電子顕微鏡 |
JP4988224B2 (ja) * | 2006-03-01 | 2012-08-01 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びその装置 |
GB0709796D0 (en) * | 2007-05-22 | 2007-06-27 | Phase Focus Ltd | Three dimensional imaging |
JP5279280B2 (ja) * | 2008-01-16 | 2013-09-04 | 博雄 木下 | 形状測定装置 |
WO2011093043A1 (ja) * | 2010-01-27 | 2011-08-04 | 国立大学法人北海道大学 | 回折顕微法 |
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