JP5679866B2 - Coating apparatus and coating method - Google Patents

Coating apparatus and coating method Download PDF

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JP5679866B2
JP5679866B2 JP2011042439A JP2011042439A JP5679866B2 JP 5679866 B2 JP5679866 B2 JP 5679866B2 JP 2011042439 A JP2011042439 A JP 2011042439A JP 2011042439 A JP2011042439 A JP 2011042439A JP 5679866 B2 JP5679866 B2 JP 5679866B2
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coating
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JP2012181036A (en
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尊士 紺藤
尊士 紺藤
豊和 釘井
豊和 釘井
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Toray Engineering Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/007After-treatment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • G01N2021/945Liquid or solid deposits of macroscopic size on surfaces, e.g. drops, films, or clustered contaminants

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  • Coating Apparatus (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
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  • Health & Medical Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Description

本発明は、基板上に塗布液を塗布し、基板上に薄膜を形成する塗布装置および塗布方法に関するものである。   The present invention relates to a coating apparatus and a coating method for applying a coating liquid on a substrate and forming a thin film on the substrate.

基板上に、塗布液を基板と相対的に移動するスリットノズルから吐出することにより塗布し、薄膜を形成する技術は古くから知られている。この塗布技術は、液晶等のフラットパネルディスプレイを始めとして多くの分野で活用されている。この塗布技術においてはスリットノズルから前記移動中に塗布液を継続的に吐出するためにスリットノズルと基板間に塗布液によるビードを形成する必要が有り、基板とスリットノズルを相対的に移動しながらビードを維持する為には基板とスリットノズルの間隔を例えば100〜200μm程度に狭く設定する必要が有る。   A technique for forming a thin film by applying a coating liquid on a substrate by discharging it from a slit nozzle that moves relative to the substrate has been known for a long time. This coating technique is utilized in many fields including flat panel displays such as liquid crystals. In this coating technique, it is necessary to form a bead by the coating liquid between the slit nozzle and the substrate in order to continuously discharge the coating liquid from the slit nozzle during the movement, while moving the substrate and the slit nozzle relatively. In order to maintain the bead, it is necessary to set the distance between the substrate and the slit nozzle as narrow as about 100 to 200 μm, for example.

ところが、塗布前の基板は洗浄されているとはいえパーティクル等の異物が完全に除去されている訳ではない。異物が存在している状態で塗布を行うと、異物そのものまたは異物の基板下への潜り込みにより、スリットノズルが異物または基板と衝突し、基板やスリットノズルの損傷または塗布液の供給が中断される等の問題が発生する。これを防ぐ為に特許文献1のように、塗布前にレーザー光を含む各種手段により異物を検知する技術が提案されている。   However, foreign substances such as particles are not completely removed although the substrate before coating is cleaned. If coating is performed in the presence of foreign matter, the slit nozzle collides with the foreign matter or the substrate due to the foreign matter itself or the penetration of the foreign matter under the substrate, damaging the substrate or the slit nozzle or interrupting the supply of the coating liquid. Problems occur. In order to prevent this, as in Patent Document 1, a technique for detecting foreign matter by various means including laser light before coating has been proposed.

この異物検知技術、とりわけそのなかでもレーザー光を利用する技術は検出精度および装置のコンパクト化において効果的ではあったが、近年大形液晶TVの増加などにより基板サイズが増加し塗布巾2mを超えるものが主流になるに至り、このような長距離をレーザー光で投光する必要が生じている状況下での各種問題が発生している。これら問題の一つに外乱による検知精度の低下が挙げられる。基本的に前述のように塗布装置は異物による障害を受けるので、生産ラインでは塗布装置およびその周辺の清浄を保つために天井などから清浄空気が供給され異物を排除する対応がなされているいる。この清浄空気は滞留するものではなく流れている為、その流れにより照射レーザー光が散乱するなどの外乱により検知精度が低下する事態が発生している。前記問題を含み外乱による異物検知精度低下問題に対しては特許文献2に示すように、光軸全長に渡ってカバーを設置するという対策が提案されている。しかしながら、軽量かつ剛性の高い長尺カバーを製作することは困難であり、逆に剛性はあるが重量も大きいカバーは塗布装置に余分な負荷を与え、塗布精度を狂わせる原因になる。   This foreign matter detection technology, particularly the technology using laser light, was effective in detecting accuracy and downsizing the device, but in recent years the substrate size has increased due to an increase in large liquid crystal TVs and the coating width exceeds 2 m. Various things have arisen under the circumstances where it has become necessary to project such a long distance with a laser beam. One of these problems is a decrease in detection accuracy due to disturbance. Basically, as described above, the coating apparatus is damaged by the foreign matter, and in the production line, clean air is supplied from the ceiling or the like to keep the coating apparatus and its surroundings clean, and the foreign matter is removed. Since this clean air flows instead of staying, there is a situation in which the detection accuracy is reduced due to disturbance such as scattering of the irradiation laser beam due to the flow. As shown in Patent Document 2, a countermeasure for installing a cover over the entire length of the optical axis has been proposed for the problem of reduced accuracy of foreign object detection due to disturbance including the above problems. However, it is difficult to manufacture a light and highly rigid long cover. Conversely, a cover that is stiff but heavy is an extra load on the applicator and causes the application accuracy to go wrong.

特許第4325084号公報Japanese Patent No. 4325084 特許第4562190号公報Japanese Patent No. 4562190

本発明は前記問題点を克服し、基板上の異物検知用に2mを超える距離でレーザー光を照射しても周囲の気流よるレーザー光の乱れ等の外乱による検知精度低下を防止し、軽量かつ加工性に優れる遮蔽装置を有する塗布装置および塗布方法を提供するものである。   The present invention overcomes the above-mentioned problems and prevents a decrease in detection accuracy due to disturbance such as disturbance of laser light due to the surrounding airflow even when laser light is irradiated at a distance exceeding 2 m for detecting foreign matter on the substrate. It is an object of the present invention to provide a coating apparatus and a coating method having a shielding device with excellent processability.

上記課題を解決する為に、本発明の塗布装置は、シート状基板と相対的に移動することにより基板を走査し、基板表面に塗布液を吐出することにより基板表面に塗布膜を形成する吐出装置と、前記吐出装置の前記走査方向上流側に配置され、基板上の異物を検知する検知装置を少なくとも有する塗布装置であって、前記検知装置はレーザー光を基板表面と平行に照射する投光装置と、前記投光されたレーザー光を受光する受光装置と、少なくとも前記投光装置から投光された直後のレーザー光の空気流れを遮蔽する遮蔽装置を有しており、前記遮蔽装置は、前記基板を載置するステージと、このステージを支持する基台との間に形成された隙間を塞ぐように設けられていることを特徴としている。 In order to solve the above problems, the coating apparatus of the present invention scans the substrate by moving relative to the sheet-like substrate, and discharges the coating liquid on the substrate surface to form a coating film on the substrate surface. And a coating device that includes at least a detection device that is disposed upstream of the ejection device in the scanning direction and detects foreign matter on the substrate, wherein the detection device emits laser light parallel to the substrate surface. a device, a light receiving device for receiving the projected by laser light, and have a shielding device for shielding the air flow of the laser beam immediately after being projected from at least the light emitting device, the shielding device, It is characterized in that it is provided so as to close a gap formed between a stage on which the substrate is placed and a base that supports the stage .

本発明の遮蔽装置によれば加工及び装着が容易であり、同時に空気流によるレーザー光の乱れを抑制することが可能である。その結果、基板やスリットノズルの破損等の原因となる異物の検知を確実に行うことが可能になる。   According to the shielding device of the present invention, it is easy to process and attach, and at the same time, it is possible to suppress the disturbance of the laser beam due to the air flow. As a result, it is possible to reliably detect foreign matter that causes damage to the substrate and the slit nozzle.

具体的には、前記遮蔽装置は、前記投光された直後のレーザー光の直下の領域を遮蔽する構成としてもよい。   Specifically, the shielding device may be configured to shield a region immediately below the laser beam immediately after the projection.

また、本発明の塗布装置はその遮蔽装置が、前記レーザー光軸自体を遮蔽することなく検知装置に影響を与える空気流を抑制、遮蔽することを特徴としている。この構成によれば最小限の遮蔽を行うことでレーザー光の乱れを抑制し、前記遮蔽装置をよりコンパクトに製作することが出来る。   Further, the coating apparatus of the present invention is characterized in that the shielding device suppresses and shields the air flow that affects the detection device without shielding the laser optical axis itself. According to this configuration, it is possible to manufacture the shielding device more compactly by suppressing the disturbance of the laser beam by performing the minimum shielding.

さらに、本発明の塗布方法は、シート状基板と相対的に移動することにより前記シート状基板を走査し、前記シート状基板表面に塗布液を吐出することにより前記シート状基板表面に塗布膜を形成する吐出工程と、前記吐出工程において前記走査方向上流側の前記シート状基板上の異物を検知する検知工程であって、前記検知工程はレーザー光を基板表面と平行に照射する投光し、前記投光されたレーザー光を受光する受光工程を含み、前記基板を載置するステージと、このステージを支持する基台との間に形成された隙間を塞ぐことにより、少なくとも前記投光領域直下の空気流れを遮蔽することを特徴としている。
Furthermore, the coating method of the present invention scans the sheet-like substrate by moving relative to the sheet-like substrate, and discharges a coating liquid onto the surface of the sheet-like substrate, thereby forming a coating film on the surface of the sheet-like substrate. A discharge step of forming, and a detection step of detecting a foreign matter on the sheet-like substrate on the upstream side in the scanning direction in the discharge step, wherein the detection step projects light that irradiates a laser beam parallel to the substrate surface, Including a light receiving step for receiving the projected laser beam, and closing a gap formed between a stage on which the substrate is placed and a base supporting the stage, at least directly below the light projecting area. It is characterized by shielding the air flow.

本発明の塗布方法によれば、加工及び装着が容易であり、空気流れを遮蔽すればレーザー光の乱れを抑制することが可能であり、その結果基板やスリットノズルの破損等の原因となる異物の検知を確実に行うことが可能になる。   According to the coating method of the present invention, the processing and mounting are easy, and if the air flow is shielded, it is possible to suppress the disturbance of the laser beam, and as a result, foreign matter that causes damage to the substrate and the slit nozzle. Can be reliably detected.

本発明の塗布装置および塗布方法により、異物によりスリットノズルおよび/又は基板を破損する事無く安定した塗布基板を生産することが可能になる。   According to the coating apparatus and the coating method of the present invention, a stable coated substrate can be produced without damaging the slit nozzle and / or the substrate due to foreign matter.

本発明の遮蔽装置を含む塗布装置の斜視図である。It is a perspective view of the coating device containing the shielding apparatus of this invention. 異物と口金の関係を示す説明図である。It is explanatory drawing which shows the relationship between a foreign material and a nozzle | cap | die. 本発明の遮蔽装置を含む実施例を示す正面図である。It is a front view which shows the Example containing the shielding apparatus of this invention.

本発明の塗布装置に係わる実施の形態を図面を用いて説明する。   Embodiments relating to the coating apparatus of the present invention will be described with reference to the drawings.

図1は本発明の異物検知装置を有する塗布装置の一実施例の概略を示す斜視図である。図1において、塗布装置1は基台11、基板10を固定するステージ21、塗布液を吐出し基板10に塗布液を吐出して塗布膜を形成する吐出装置30、異物検知装置40から構成されている。   FIG. 1 is a perspective view showing an outline of an embodiment of a coating apparatus having a foreign matter detection apparatus of the present invention. In FIG. 1, a coating apparatus 1 includes a base 11, a stage 21 that fixes a substrate 10, a discharge device 30 that discharges a coating liquid and discharges the coating liquid onto the substrate 10 to form a coating film, and a foreign matter detection device 40. ing.

なお、本実施形態では、基板10の上を吐出装置30が走査を行いながら基板上に塗布液を塗布するが、この走査する方向をX方向(塗布方向ともいう)、これと水平面上で直交する方向をY軸方向、X軸およびY軸方向の双方に直交する方向をZ軸方向とし、さらに図2において右方向を下流側、左方向を上流側として説明を進めることとする。   In the present embodiment, the coating liquid is applied onto the substrate while the ejection device 30 performs scanning on the substrate 10, and the scanning direction is the X direction (also referred to as the application direction), and is orthogonal to the horizontal plane. The direction to be performed is the Y-axis direction, the direction orthogonal to both the X-axis and the Y-axis directions is the Z-axis direction, and in FIG. 2, the right direction is the downstream side and the left direction is the upstream side.

基台11およびステージ21は石材またはセラミックもしくは金属構造体で構成されている。基板10はガラス等の薄板であって、ロボット等の搬入装置(不図示)によりステージ21に搬入される。その際、前記搬入装置から搬入された基板10を受け取るためにリフトピン(不図示)がステージ21に組み込まれている。前記搬入装置が基板10を前記リフトピンに受け渡すと、前記リフトピンは下降し基板10をステージ21上に載置する。   The base 11 and the stage 21 are made of stone, ceramic, or metal structure. The substrate 10 is a thin plate made of glass or the like, and is carried into the stage 21 by a carrying-in device (not shown) such as a robot. At that time, lift pins (not shown) are incorporated in the stage 21 in order to receive the substrate 10 carried from the carry-in device. When the carry-in apparatus transfers the substrate 10 to the lift pins, the lift pins descend and place the substrate 10 on the stage 21.

ステージ21はさらに基板位置決め機構(不図示)が設置されており、ステージ21上に載置された基板10のX及びY方向の位置決めを行う。また、ステージ21には複数の吸着穴(不図示)が開孔されていて、真空ポンプ(不図示)を通じて基板10の真空吸着を行うことにより前記位置決め機構により位置決めされた基板10をステージ21に固定する。吐出装置30は門型形状を為し基板10に塗布液を塗布する装置であり、塗布液を吐出する口金31、門型構造を支える側板32、口金31をサポートするステー33、口金上昇機構34から構成されている。   The stage 21 is further provided with a substrate positioning mechanism (not shown), and positions the substrate 10 placed on the stage 21 in the X and Y directions. A plurality of suction holes (not shown) are formed in the stage 21, and the substrate 10 positioned by the positioning mechanism by vacuum suction of the substrate 10 through a vacuum pump (not shown) is placed on the stage 21. Fix it. The discharge device 30 is a device that has a portal shape and applies the coating liquid to the substrate 10. The base 31 discharges the coating liquid, the side plate 32 that supports the gate structure, the stay 33 that supports the base 31, and the base lifting mechanism 34. It is composed of

口金31はスリット状の吐出口を有し、吐出装置30のX方向への移動に合わせ、基板10上をX方向に走査しながら前記吐出口から塗布液を基板10に吐出する。また、口金31は真直度向上と操作性改善を兼ねてステー33がその上部に取り付けられている。口金31は塗布位置と待機位置の間をZ方向に移動するが、その移動は口金上昇機構34で行われる。口金上昇機構はモーター等の駆動手段と直動手段の組み合わせまたはリニアモーターの様な直線駆動手段で構成されている。口金31には塗布液を補給する塗布液補給機構50が配管53により接続されている。塗布液補給機構50は塗布液補給タンク54、バッファタンク51、制御弁52、配管53から構成されている。塗布液補給タンク54に貯蔵された塗布液は圧縮空気などの手段によりバッファタンク51に送液され一時的に貯蔵される。次いで、塗布状況に応じて塗布装置1の制御部(不図示)から出される信号により、制御弁52は開閉を行い、塗布液補給タンク54に送液する。塗布液補給タンク54は塗布動作に応じて基板1枚分の塗布液を口金31に送液する。   The base 31 has a slit-like discharge port, and discharges the coating liquid from the discharge port to the substrate 10 while scanning the substrate 10 in the X direction in accordance with the movement of the discharge device 30 in the X direction. The base 31 has a stay 33 attached to the upper portion thereof for improving straightness and operability. The base 31 moves in the Z direction between the application position and the standby position, and the movement is performed by the base lifting mechanism 34. The base raising mechanism is composed of a combination of driving means such as a motor and linear motion means, or linear driving means such as a linear motor. An application liquid supply mechanism 50 for supplying an application liquid is connected to the base 31 by a pipe 53. The coating liquid supply mechanism 50 includes a coating liquid supply tank 54, a buffer tank 51, a control valve 52, and a pipe 53. The coating solution stored in the coating solution supply tank 54 is sent to the buffer tank 51 by means of compressed air or the like and temporarily stored. Next, the control valve 52 opens and closes according to a signal output from a control unit (not shown) of the coating apparatus 1 according to the coating state, and sends the liquid to the coating liquid supply tank 54. The coating liquid supply tank 54 sends the coating liquid for one substrate to the base 31 according to the coating operation.

図2は、口金と異物の関係を示す概略説明図である。吐出装置30はリニアモーター等の駆動装置(不図示)により直線運動を行い、基板10上をX方向に移動しながら口金31より塗布液を吐出する。その際、口金31の先端部すなわち塗布液が吐出される先端部と基板10の間隔は100μm前後に設定されている。そのため、図2に示されている様な基板10上に異物49aがある場合や、異物49bが基板10の下側に潜り込んでいる場合に吐出装置30が前記の様な走査を行うと、口金31の先端部分が異物49aそのもの、または異物49bの潜り込みにより盛り上がった基板10と接触し、最悪の場合咬み込む可能性がある。このような咬み込みは、異物の種類によっては基板10のみならず口金31の破損を引き起こす場合がある。   FIG. 2 is a schematic explanatory diagram showing the relationship between the base and the foreign matter. The discharge device 30 performs a linear motion by a drive device (not shown) such as a linear motor, and discharges the coating liquid from the base 31 while moving on the substrate 10 in the X direction. At that time, the distance between the tip of the base 31, that is, the tip of the coating liquid discharged from the substrate 10 is set to about 100 μm. Therefore, when the foreign material 49a is present on the substrate 10 as shown in FIG. 2 or when the foreign material 49b has entered the lower side of the substrate 10, the discharge device 30 performs the scanning as described above. There is a possibility that the tip of 31 contacts the foreign substance 49a itself or the substrate 10 raised by the penetration of the foreign substance 49b, and bites in the worst case. Such biting may cause damage to the base 31 as well as the substrate 10 depending on the type of foreign matter.

この咬み込みを防ぐ為異物検知器40が設置されているが、前述のようにレーザー光を利用した異物検知については技術的課題がある。そこで以下図1および図3を使用して本発明の異物検知装置40の詳細説明を行う。   In order to prevent this biting, the foreign object detector 40 is installed, but there is a technical problem with foreign object detection using laser light as described above. Therefore, the foreign object detection device 40 of the present invention will be described in detail below with reference to FIGS.

異物検知装置40は、図3で示されている様に投光器43a、受光器43b、制御装置41、制御/パワー配線42、遮蔽装置45aおよび遮蔽装置45bにより構成されている。投光器43aはレーザー発振器および照射光学系から構成されていて、出力0.7mW、波長670nmのレーザー光(クラス2)を照射光学系により概略平行光に調整し光軸46方向に投光する。受光器43bはフォトダイオードを有しており、投光器43aから投光されたレーザー光を受光する。ここで、異物49a、又は異物49bが有る場合、投光されたレーザー光の全て又は一部が異物49a、又は異物49bに当り反射または散乱される。その結果、異物49a、又は異物49bが無い場合に比べて受光器43bで受光するレーザー光は減少することになる。制御装置41は受光器43bから制御/パワー配線42を経て送信された受光信号を比較し、異物情報として塗布装置1の制御部(不図示)に送信することにより塗布装置1は異物の有無を判定することはできる。なお、制御/パワー配線42は複数のハーネスにより構成され、前記信号に加え投光器および受光器の電源および駆動信号などの送受にも利用される。   As shown in FIG. 3, the foreign object detection device 40 includes a projector 43a, a light receiver 43b, a control device 41, a control / power wiring 42, a shielding device 45a, and a shielding device 45b. The projector 43a is composed of a laser oscillator and an irradiation optical system. The laser light (class 2) having an output of 0.7 mW and a wavelength of 670 nm is adjusted to be approximately parallel light by the irradiation optical system and is projected in the direction of the optical axis 46. The light receiver 43b has a photodiode and receives the laser light projected from the projector 43a. Here, when there is the foreign matter 49a or the foreign matter 49b, all or a part of the projected laser beam hits the foreign matter 49a or the foreign matter 49b and is reflected or scattered. As a result, the laser beam received by the light receiver 43b is reduced compared to the case where there is no foreign object 49a or foreign object 49b. The control device 41 compares the light reception signal transmitted from the light receiver 43b via the control / power wiring 42 and transmits it as foreign matter information to a control unit (not shown) of the coating device 1, whereby the coating device 1 determines whether or not there is a foreign matter. It can be judged. The control / power wiring 42 is composed of a plurality of harnesses, and is used for transmitting and receiving the power and drive signals of the projector and the light receiver in addition to the signals.

遮蔽装置45a、45bは、金属または樹脂性の薄板部材で構成されており、それぞれ投光器43a、および受光器43bの塗布方向にそって、図1および図3に示されるように基台11上に設置されている。すなわち、遮蔽装置45a、45bは、基台11とステージ21との間には隙間が生じており、この隙間を塞ぐように設けられている。この隙間は、本実施形態では、投光器43aから投光されるレーザー光の直下領域に形成されており、この領域を塞ぐように遮蔽装置45aが配置されている。また、受光器43bが受光するレーザー光の直下領域も同様に隙間が形成されており、この領域を塞ぐように遮蔽装置45bが配置されている。   The shielding devices 45a and 45b are made of a metal or resin thin plate member, and are arranged on the base 11 as shown in FIGS. 1 and 3 along the application direction of the light projector 43a and the light receiver 43b, respectively. is set up. That is, the shielding devices 45a and 45b have a gap between the base 11 and the stage 21, and are provided so as to close the gap. In the present embodiment, this gap is formed in a region immediately below the laser beam projected from the projector 43a, and the shielding device 45a is disposed so as to block this region. Similarly, a gap is also formed in the region immediately below the laser beam received by the light receiver 43b, and the shielding device 45b is disposed so as to close this region.

一般に異物を排除する為の清浄空気は塗布装置1の上方から吹き出され、それにより投光器43a、受光器43bの前を清浄空気が流れ、ステージ21と基台11との隙間を抜けてステージ21下の空間を通過している。一般的に液晶パネル等の製造ラインに於いては、床は装置真下の様に重量物を支える必要のある箇所を除き、開孔パネルを敷き詰めた構造が利用されている。これにより塗布装置1の上方から吹き出される清浄空気は床下へと流出し、塗布装置1の周辺に清浄空気流を形成することができる。ところが、空気流路は均一に形成される訳ではなく特定の流路に空気流が集中するので、前記空気流路では流速が早くなることが有る。この様な状況下において、これら空気流が投光器43aと受光器43bの間に形成されると投光器43aから投光されたレーザー光が散乱等の障害を受けることになる。   In general, clean air for removing foreign substances is blown out from above the coating apparatus 1, whereby clean air flows in front of the projector 43 a and the light receiver 43 b, passes through the gap between the stage 21 and the base 11, and below the stage 21. Is passing through the space. In general, in a production line for liquid crystal panels or the like, a structure is used in which a floor is covered with a perforated panel except for a place where it is necessary to support a heavy object just below the apparatus. As a result, the clean air blown out from above the coating apparatus 1 flows out under the floor, and a clean air flow can be formed around the coating apparatus 1. However, the air flow path is not formed uniformly, and the air flow is concentrated in a specific flow path, so that the flow speed may be increased in the air flow path. Under such circumstances, when these air flows are formed between the projector 43a and the light receiver 43b, the laser light projected from the projector 43a is subject to obstacles such as scattering.

このため、遮蔽装置45a、45bは前記空気流路を防ぐように基台11とステージ21との隙間を塞ぐ様に配置されている。遮蔽装置45a、45bは吐出装置30に設けても良いが、この場合は吐出装置30の走査による空気流の発生を抑えるため、基台11に設置する場合より大型化する必要がある。さらに、実験結果によると空気流のレーザー光に与える影響は投光側の方が大きいので、目標検知精度などの設定条件または塗布装置1や床構造などの構成によっては受光側の遮蔽装置を省略しても良い。   For this reason, the shielding devices 45a and 45b are arranged so as to close the gap between the base 11 and the stage 21 so as to prevent the air flow path. The shielding devices 45 a and 45 b may be provided in the discharge device 30, but in this case, in order to suppress the generation of an air flow due to the scanning of the discharge device 30, it is necessary to increase the size as compared with the case where it is installed on the base 11. Further, according to the experimental results, the influence of the air flow on the laser beam is larger on the light projecting side, so the light receiving side shielding device is omitted depending on the setting conditions such as target detection accuracy or the configuration of the coating apparatus 1 or the floor structure. You may do it.

以上述べた様に本実施例の遮蔽装置を有する異物検知装置を塗布装置に採用すれば、2m巾を超える大形基板を塗布する場合においても塗布工程において異物による口金破損等の事故を大幅に減少して安定した生産が可能になる。また、2m巾以下の基板を塗布する塗布装置においても従来以上の安定的生産を期待することができる。   As described above, if the foreign matter detection device having the shielding device of the present embodiment is adopted in the coating device, accidents such as breakage of the base due to foreign matter in the coating process are greatly increased even when a large substrate exceeding 2 m wide is applied. Reduced and stable production becomes possible. In addition, even in a coating apparatus that coats a substrate having a width of 2 m or less, stable production more than conventional can be expected.

尚、本実施例において塗布装置1はステージ21が固定され、吐出装置30がステージ21上に吸着固定された基板10上を走査する機構となっているが、吐出装置30を固定しステージ10を駆動する方式としても構わない。この場合においても、遮蔽装置45a、45bの構造は本実施例と同じにすることができる。また、本実施例の吐出装置30はスリットノズル機構となっているが、吐出機構についてはこれ以外の機構たとえばインクジェット機構やスロット塗布ディスペンサーなどであっても構わない。塗布機構1がスリットノズル以外のものであっても遮蔽装置45a、45bは本実施例と同じとすることができる。   In the present embodiment, the coating apparatus 1 has a mechanism in which the stage 21 is fixed and the discharge apparatus 30 scans the substrate 10 that is suction-fixed on the stage 21. However, the discharge apparatus 30 is fixed and the stage 10 is fixed. A driving method may be used. Also in this case, the structure of the shielding devices 45a and 45b can be made the same as in this embodiment. Further, although the ejection device 30 of this embodiment is a slit nozzle mechanism, the ejection mechanism may be other mechanisms such as an inkjet mechanism or a slot coating dispenser. Even if the coating mechanism 1 is other than the slit nozzle, the shielding devices 45a and 45b can be the same as in this embodiment.

1 塗布装置
10 基板
11 基台
21 ステージ
30 吐出装置
31 口金
32 側板
33 ステー
34 口金上昇機構
40 異物検知装置
43a 投光器
43b 受光器
45a 遮蔽装置(投光側)
45b 遮蔽装置(受光側)
49a 異物(上)
49b 異物(下)
50 塗布液補給機構
51 バッファタンク
52 制御弁
53 配管
54 塗布液補給タンク
DESCRIPTION OF SYMBOLS 1 Coating device 10 Substrate 11 Base 21 Stage 30 Discharge device 31 Base 32 Side plate 33 Stay 34 Base raising mechanism 40 Foreign object detection device 43a Projector 43b Receiver 45a Shielding device (projection side)
45b Shielding device (light receiving side)
49a Foreign object (top)
49b Foreign object (bottom)
50 Coating liquid supply mechanism 51 Buffer tank 52 Control valve 53 Piping 54 Coating liquid supply tank

Claims (3)

シート状基板と相対的に移動することにより基板を走査し、基板表面に塗布液を吐出することにより基板表面に塗布膜を形成する吐出装置と、前記吐出装置の前記走査方向上流側に配置され、基板上の異物を検知する検知装置を少なくとも有する塗布装置であって、前記検知装置はレーザー光を基板表面と平行に照射する投光装置と、前記投光されたレーザー光を受光する受光装置と、少なくとも前記投光装置から投光された直後のレーザー光の空気流れを遮蔽する遮蔽装置を有しており、
前記遮蔽装置は、前記基板を載置するステージと、このステージを支持する基台との間に形成された隙間を塞ぐように設けられていることを特徴とする塗布装置。
A discharge device that scans the substrate by moving relative to the sheet-like substrate and forms a coating film on the substrate surface by discharging a coating liquid on the substrate surface, and is disposed upstream of the discharge device in the scanning direction. A coating device having at least a detection device for detecting foreign matter on the substrate, wherein the detection device irradiates a laser beam parallel to the substrate surface, and a light-receiving device that receives the projected laser beam. When, and have a shielding device for shielding the air flow of the laser beam immediately after being projected from at least the light emitting device,
The said shielding apparatus is provided so that the clearance gap formed between the stage which mounts the said board | substrate and the base which supports this stage may be plugged up .
前記遮蔽装置は、前記投光された直後のレーザー光の直下の領域を遮蔽することを特徴とする請求項1に記載の塗布装置。 The coating apparatus according to claim 1, wherein the shielding device shields a region immediately below the laser beam immediately after the projection. シート状基板と相対的に移動することにより前記シート状基板を走査し、前記シート状基板表面に塗布液を吐出することにより前記シート状基板表面に塗布膜を形成する吐出工程と、前記吐出工程において前記走査方向上流側の前記シート状基板上の異物を検知する検知工程であって、前記検知工程はレーザー光を基板表面と平行に照射して投光し、前記投光されたレーザー光を受光する受光工程を含み、前記基板を載置するステージと、このステージを支持する基台との間に形成された隙間を塞ぐことにより、少なくとも前記投光領域直下の空気流れを遮蔽することを特徴とする塗布方法。 A discharge step of scanning the sheet-like substrate by moving relative to the sheet-like substrate and forming a coating film on the surface of the sheet-like substrate by discharging a coating liquid onto the surface of the sheet-like substrate; and the discharge step wherein a detection step of detecting a scanning direction upstream side foreign matter of the sheet-like substrate of the said detection step is projecting the light by irradiating a laser beam parallel to the substrate surface, the projected by laser beam Including a light receiving step for receiving light, and blocking at least an air flow immediately below the light projecting region by closing a gap formed between a stage on which the substrate is placed and a base supporting the stage. A characteristic coating method.
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