JP5669636B2 - 荷電粒子線レンズおよびそれを用いた露光装置 - Google Patents

荷電粒子線レンズおよびそれを用いた露光装置 Download PDF

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Publication number
JP5669636B2
JP5669636B2 JP2011056812A JP2011056812A JP5669636B2 JP 5669636 B2 JP5669636 B2 JP 5669636B2 JP 2011056812 A JP2011056812 A JP 2011056812A JP 2011056812 A JP2011056812 A JP 2011056812A JP 5669636 B2 JP5669636 B2 JP 5669636B2
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JP
Japan
Prior art keywords
charged particle
particle beam
section
potential
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011056812A
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English (en)
Japanese (ja)
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JP2012195369A (ja
JP2012195369A5 (enExample
Inventor
加藤 貴久
貴久 加藤
豊 ▲瀬▼戸本
豊 ▲瀬▼戸本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011056812A priority Critical patent/JP5669636B2/ja
Priority to US14/005,175 priority patent/US20140151571A1/en
Priority to PCT/JP2012/001777 priority patent/WO2012124320A1/en
Publication of JP2012195369A publication Critical patent/JP2012195369A/ja
Publication of JP2012195369A5 publication Critical patent/JP2012195369A5/ja
Application granted granted Critical
Publication of JP5669636B2 publication Critical patent/JP5669636B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/12Lenses electrostatic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • H01J2237/04924Lens systems electrostatic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10Lenses
    • H01J2237/12Lenses electrostatic
    • H01J2237/1205Microlenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10Lenses
    • H01J2237/12Lenses electrostatic
    • H01J2237/1207Einzel lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3175Lithography
    • H01J2237/31774Multi-beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2011056812A 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置 Expired - Fee Related JP5669636B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011056812A JP5669636B2 (ja) 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置
US14/005,175 US20140151571A1 (en) 2011-03-15 2012-03-14 Charged particle beam lens and exposure apparatus using the same
PCT/JP2012/001777 WO2012124320A1 (en) 2011-03-15 2012-03-14 Charged particle beam lens and exposure apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011056812A JP5669636B2 (ja) 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置

Publications (3)

Publication Number Publication Date
JP2012195369A JP2012195369A (ja) 2012-10-11
JP2012195369A5 JP2012195369A5 (enExample) 2014-05-01
JP5669636B2 true JP5669636B2 (ja) 2015-02-12

Family

ID=45932474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011056812A Expired - Fee Related JP5669636B2 (ja) 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置

Country Status (3)

Country Link
US (1) US20140151571A1 (enExample)
JP (1) JP5669636B2 (enExample)
WO (1) WO2012124320A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012195096A (ja) * 2011-03-15 2012-10-11 Canon Inc 荷電粒子線レンズおよびそれを用いた露光装置

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JP4298399B2 (ja) * 2003-06-26 2009-07-15 キヤノン株式会社 電子線装置及び該電子線装置を用いた電子線描画装置
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KR100496643B1 (ko) * 2003-10-25 2005-06-20 한국전자통신연구원 마이크로칼럼 전자빔 장치의 자체정렬 적층 금속 박막전자빔 렌즈 및 그 제작방법
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JP5744579B2 (ja) * 2011-03-15 2015-07-08 キヤノン株式会社 荷電粒子線レンズおよびそれを用いた露光装置

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Publication number Publication date
US20140151571A1 (en) 2014-06-05
JP2012195369A (ja) 2012-10-11
WO2012124320A1 (en) 2012-09-20

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