JP5662680B2 - Surface coated cutting tool - Google Patents

Description

  The present invention relates to a surface-coated cutting tool comprising a substrate and a coating formed on the substrate.

  Surface-coated cutting tools used to cut various work materials can improve the surface wear resistance of hard substrates such as WC-base cemented carbide, cermet, high-speed steel, etc. For the purpose of improving the protective function, the surface has been coated with a hard coating such as TiN, TiCN, TiAlN or the like. In particular, since a coating made of TiAlN exhibits excellent wear resistance, it is widely used as a coating for such surface-coated cutting tools in place of a coating made of titanium nitride, carbide, carbonitride, or the like.

  However, the life of cutting tools is much shorter than before due to the diversification of work materials and the need for high-speed cutting to improve processing efficiency. Furthermore, as a recent trend of cutting tools, there is a tendency that dry processing (dry processing) without using a cutting fluid is required from the viewpoint of global environmental conservation.

  For this reason, the characteristics required for cutting tools are becoming increasingly sophisticated, and various advanced characteristics are also required for the coating of surface-coated cutting tools.

As an attempt to meet such a requirement, a coating in which a part of Al is replaced with Cr, Ce, Mo, Nb or the like in TiAl carbide, carbonitride, and composite nitride has been proposed. For example, in order to improve chipping resistance in heavy cutting of difficult-to-cut materials, as a hard coating layer, Al component highest content points and Al component non-content points are alternately spaced at predetermined intervals along the layer thickness direction. Provide a coating having a component concentration distribution structure that repeatedly exists and the Al component content continuously changes from the Al component highest content point to the Al component non-content point and from the Al component non-content point to the Al component highest content point It is being considered. In this film, the Al component maximum content point is the composition formula [Ti _{1- (X + Z)} Al _X V _Z ] N (where X and Z are atomic ratios, and X is 0.40 to 0.65). , Z satisfies 0.05 to 0.20), and the Al component-free point is the composition formula (Ti ₁ -Z V _Z ) N (where Z is an atomic ratio, and Z is 0.05 to 0). .20) and the distance between adjacent Al component highest content point and Al component non-contained point is 0.01 to 0.1 μm (Japanese Patent Laid-Open No. 2003-300105 (Patent) Literature 1)). Further, in JP-A-12-061708 (Patent Document 2), in a coated hard alloy coated with nitride, carbonitride, borohydride, or carbonitride containing Ti or Ti and Al as main components, Any one or more of the Ti or Ti and Al compound film, and a nitride, carbonitride, nitride oxide or carbon represented by (Ti _x V _1-x ) and x is 0.9 or less A coated hard tool characterized in that at least three layers of any one of the nitrided oxide films are coated has been proposed. However, these coatings do not satisfy the above-mentioned requirements for advanced characteristics, and further improvements in chipping resistance and the like are required.

Further, _a hard coating made of (Ti _a Al _b Cr _c ) (C _1-d N _d ) has been proposed as a TiAl-based coating in which a part of Al is replaced by Cr (wherein 0.02 ≦ a ≦ 0.30, 0.55 ≦ b ≦ 0.765, 0.06 ≦ c, a + b + c = 1, 0.5 ≦ d ≦ 1 (a, b, and c are atomic ratios of Ti, Al, and Cr, respectively. D represents the atomic ratio of N.), or 0.02 ≦ a ≦ 0.175, 0.765 ≦ b, 4 (b−0.75) ≦ c, a + b + c = 1, 0.5 ≦ d ≦ 1) (Japanese Patent Laid-Open No. 2003-071610) Patent Document 3). In this proposal, by mixing Cr with Ti and Al as a component of the film, the crystal structure of rock salt type AlN having a high hardness is included at a higher content than the conventional TiAlN film. It is said that it is possible to provide higher wear resistance because of the improved hardness. Moreover, since the content rate of Cr and Al which is excellent in oxidation resistance is also improved at the same time, it is said that it is possible to impart higher hardness oxidation resistance. However, since Al is contained as an essential component, it has been difficult to prevent crater wear (a rake face wear phenomenon) caused by Al. On the other hand, it has an average layer thickness of 0.05 to 0.5 μm and satisfies the composition formula (Ti _1-X Cr _X ) N (wherein X is 0.05 to 0.20 in terms of atomic ratio). Further, an X-ray diffraction pattern in which the highest peak appears on the (200) plane and the half-value width of the highest peak is 2θ at 0.9 degrees or less as measured by an X-ray diffractometer using Cu-Kα rays. There has been proposed a hard film having a crystal orientation history layer composed of a Ti—Cr composite nitride layer showing (Patent Document 4) (Japanese Patent Laid-Open No. 2003-136305). Although such a coating does not contain Al, the occurrence of crater wear is considered to be prevented to some extent, but since it has a crystal structure in which the highest peak appears on the (200) plane, it cannot have sufficient hardness. There was a need to further improve the wear resistance.

In the TiAl-based coating, a part of Al is replaced with Nb. A hard coating layer made of a composite nitride of Ti and Nb is formed on the surface of a tungsten carbide-based cemented carbide substrate or a titanium carbonitride-based cermet substrate. A surface-coated cemented carbide cutting tool formed by physical vapor deposition with an overall average layer thickness of ˜15 μm has been studied (Japanese Patent Laid-Open No. 2003-340609 (Patent Document 5)). In this cutting tool, the Nb highest content point and the Nb lowest content point alternately and repeatedly exist at predetermined intervals along the film thickness direction, and from the Nb highest content point to the Nb lowest content point, and Nb It has a component concentration distribution structure in which the Nb content continuously changes from the lowest content point to the highest Nb content point. The Nb highest content point satisfies the composition formula (Ti _1-X Nb _x ) N (where X is an atomic ratio, X is 0.30 to 0.50), and the Nb lowest content point is the composition formula. (Ti _1-Y Nb _Y ) N (where Y is an atomic ratio, Y is 0.05 to 0.25) and the distance between the adjacent Nb highest content point and the Nb lowest content point adjacent to each other is It has been proposed to be 0.01 to 0.1 μm. This complements the characteristics of the composition (Ti _1-X Nb _X ) N, which is excellent in high-temperature hardness but low toughness and low strength, with (Ti _1-Y Nb _Y ) N. However, it is necessary to prepare multiple compositions of raw materials, and it is necessary to optimize the interval between the two layers. This is a surface-coated cutting tool that satisfies the above requirements with a single coating composition as a whole. Was desired. In JP-A-12-218407 (Patent Document 6), one or more of Si, Cr, and Nb is 10% or more and 60% or less in atomic percent of only the metal component of the film, and the balance is A layer which is any one of nitride, carbonitride, oxynitride, oxycarbonitride composed of Ti, and Al is more than 40% and 75% or less in atomic% of only the metal component of the coating, More than one layer each of nitride, carbonitride, oxynitride, and oxycarbonitride, each of which is composed of Ti, is alternately stacked, and the layer b is immediately above the base material surface. Although a hard film coated tool characterized by the above has been proposed, the improvement in fracture resistance has not been sufficient.

In the TiAl-based film, a film in which a part of Al is replaced with Mo is disclosed in Japanese Patent Laid-Open No. 9-300105 (Patent Document 7). However, since the film contains Al as an essential constituent, It was difficult to prevent crater wear (a rake face wear phenomenon). On the other hand, a film satisfying the composition formula (Ti _x M _1-x ) C _y N _1-y (provided that the atomic ratio is 0.4 ≦ x ≦ 1, 0 ≦ y ≦ 1.0) is TiCN−. It has been proposed that it is formed on a cermet that is a Co—Ni alloy (Japanese Patent Laid-Open No. 2004-090289 (Patent Document 8)). In this film, the orientation is not defined, the concentration range of the additive element is unknown, and a film having sufficient oxidation resistance cannot be achieved, resulting in further wear resistance. Improvement was required.

Moreover, as a film for improving the characteristics of the cutting tool, Japanese Patent Publication No. 61-0579904 (Patent Document 9) proposes a film made of a nitride of a metal of group IVa, Va, or VIa. However, there are many cases where the above-mentioned effects cannot be obtained simply by using these elements in combination. In order to obtain an effective film that improves the characteristics, various studies have been made on the above metals and their compositions. Has been made. For example, JP-A 2-050948 (Patent Document 10), the chemical formula _{[Ti x Zr y Hf z]} N v (x + y + z = 1,0.4 ≦ x ≦ 0.95,0.05 ≦ y ≦ 0. 5, 0.05 ≦ z ≦ 0.5, 0.8 ≦ v ≦ 1.0), and a method for producing a coating is proposed in which a layer made of a composite compound is provided on the surface of a cutting tool using an ion beam mixing method. ing. However, the layer made of the composite compound obtained by this method contains Zr as an essential component, and the fracture resistance of the cutting edge due to the presence of Zr has not been sufficiently improved. In addition, as a technique for improving the characteristics of a coating film made of TiAlN that is generally used for surface hardening of a cutting tool or the like, JP 2000-334607 A (Patent Document 11) discloses a TiAl-based compound and B, Al, and V. , Cr, Y, Zr, Nb, Mo, Hf, Ta, W has been proposed a film having a laminated structure with a TiSi-based compound, Japanese Patent Application Laid-Open No. 2002-337007 (Patent Document 12) And a layer containing Cr, Al and Si, which are relatively rich in Si as a metal component, and a layer containing Cr, Al and Si, which are relatively poor in Si, and Cr, Al and C, N, O, and Disclosed is a hard layer comprising a compound of at least one of B, wherein a part of Cr is replaced with one or more elements of metals of Group IVa, Va, VIa and Y. To have. However, since the coating disclosed in these documents contains Si as an essential component, it has been difficult to prevent a reduction in chipping resistance of the cutting edge due to the presence of Si. Further, since Al is an essential component, it is impossible to suppress the progress of crater wear during cutting. Furthermore, Japanese Patent Application Laid-Open No. 2000-129420 (Patent Document 13) discloses a coating that improves the surface characteristics of a high-temperature sliding member. This coating is intended to improve the high temperature corrosion resistance, which is a problem of the TiN film, in particular as a surface property, and it is described that a dynamic mixing method is applied as a method for forming the coating. However, the structure of the coating formed by this method cannot sufficiently improve the wear resistance, the low friction coefficient, the chipping resistance of the blade edge, and the like required for the surface-coated cutting tool.

  In the TiAl-based film, in which part of Al is replaced with other atoms, in Japanese Patent Application Laid-Open No. 2000-334607 (Patent Document 11), Si is 10% or more and 60% or less in terms of atomic% of the coating metal component, B Nitride, carbonitride, and oxynitridation in which one or more atoms of Al, V, Cr, Y, Zr, Nb, Mo, Hf, Ta, and W are less than 10% and the remainder is made of Ti A film having an NaCl type crystal structure and a lattice constant of 0.417 nm or more and 0.423 nm or less is proposed. However, in this proposal, since Si is included as an essential component as a coating, it is difficult to prevent a reduction in chipping resistance of the cutting edge due to the presence of Si.

In JP-A-9-295204 (Patent Document 14), in a throw-away insert coated with a composite nitride, carbonitride or carbide of Ti and Al, a part of Ti is 0.05 atomic% with respect to Ti. A coating layer made of a compound having a composition substituted with one or more elements of Zr, Hf, Y, Si, W, and Cr in the range of 60 atomic% or less has been proposed. In addition, for example, Ti and Al may be one or more selected from Zr, Hf, Cr, W, Y, Si, Ce, and Nb at 0.1 atomic% to 50 atomic% with respect to Ti and Al. A multilayer coating in which a layer made of a compound containing a third component, which is an element, and a layer made of Ti nitride or carbonitride is coated at least two or more layers has been proposed (Japanese Patent Laid-Open No. 9-323204). Patent Document 15)). However, since these coatings contain Al as an essential component, (200) with respect to the diffraction intensity (I (111)) of the (111) plane in the X-ray diffraction of the layer containing further components in the proposed Ti and Al. ) Surface diffraction intensity (I (200)) value (I (200) / I (111)) is 1 or more, and Al is included as an essential constituent, so that crater wear due to Al ( It was difficult to prevent the rake face wear phenomenon). On the other hand, a film made of a compound having a composition not containing Al has been proposed (Japanese Patent Laid-Open No. 2006-009059 (Patent Document 16)). However, the proposed coating is formed directly on the substrate and has a relatively high blending ratio of tungsten in order to improve the adhesion to the base material. For this reason, when used for a cutting tool having low oxidation resistance and requiring high performance, the desired performance was not exhibited.
JP 2003-300105 A JP 12-061708 A JP 2003-071610 A JP 2003-136305 A JP 2003-340609 A JP-A-12-218407 JP-A-9-300105 JP 2004-090289 A Japanese Patent Publication No. 61-057904 JP-A-2-050948 JP 2000-334607 A JP 2002-337007 A JP 2000-129420 A Japanese Patent Laid-Open No. 9-295204 JP-A-9-323204 JP 2006-009059 A

  The present invention has been made in view of the above-described situation, and an object thereof is to provide a surface-coated cutting tool provided with a coating that can reduce crater wear and can impart high wear resistance. To do.

The surface-coated cutting tool of the present invention comprises a substrate and a coating formed on the substrate, and the coating includes one or more layers, and at least one of the layers has the chemical formula Ti _{1- X} M _X Z _Y (where X and Y are atomic ratios, X is 0 <X ≦ 0.3, Y is 0.1 ≦ Y ≦ 1 , and Z is boron, oxygen, .M indicative of at least one element selected from the group consisting of carbon, and nitrogen, represented by Cr, Nb, Mo, Hf, Ta or W der Ri, Al, does not contain Si and Zr.) It is a titanium compound layer containing the first compound.

The above compound that have a crystal structure that the ratio B / A of peak intensity B of the X-ray diffraction (111) plane of the peak intensity A (200) plane is 0 ≦ B / A ≦ 1.

The first compound, the crystal grain size of Ru der than 200nm or less 0.1 nm.

Further, when M in the chemical formula Ti _1-X M _X Z _Y is Cr, X is preferably 0 <X ≦ 0.15, and when M is Nb, X is 0 <X ≦ 0.15. Preferably there is. When M is Cr, the first compound has a (111) plane spacing of 2.46 mm to 2.63 mm in X-ray diffraction, and a (200) plane spacing of 2.09 mm to 2 It is preferable to have a crystal structure that is 15 mm or less.

When M in the chemical formula Ti _1-X M _X Z _Y is Mo, X is preferably 0 <X ≦ 0.15, and when M is Hf, X is 0 <X ≦ 0.2. It is preferable that When M is Hf, the first compound has a (111) plane spacing of 2.40 mm to 2.55 mm in X-ray diffraction and a (200) plane spacing of 2.09 mm or more. It preferably has a crystal structure of 2.25 mm or less.

Further, when M in the chemical formula Ti _1-X M _X Z _Y is Ta, X is preferably 0 <X ≦ 0.15. In this case, the first compound has a (111) plane in X-ray diffraction. It is preferable to have a crystal structure in which the surface spacing is 2.40 to 2.65 and the (200) plane spacing is 2.00 to 2.30. It is also preferable that M in the chemical formula Ti _1-X M _X Z _Y is W and X is 0 <X ≦ 0.2.

  In addition, the first compound has a (111) plane spacing of 2.40 to 2.53 mm and a (200) plane spacing of 2.04 to 2.20 mm in X-ray diffraction. It is also preferable to have a structure.

In the titanium compound layer or the first compound in the present invention, Mo, Hf, W, and preferably contains at least one element selected from the group consisting of Nb. In this case, Mo, Hf, W, and at least one element selected from Nb or Ranaru group is preferably contained in an amount of 0.005 to 0.3 in atomic ratio to Ti.

  The titanium compound layer has a stacked structure in which one or more first layers including the first compound and second layers including the second compound are stacked, and the second compound includes Si, Cr, Al. And at least one element selected from the group consisting of Ti, Hf, Ta, Nb, and V, and at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen Preferably, the second compound includes at least one element selected from the group consisting of Cr, Al, and Ti and at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen. More preferably, it is a compound.

  When the titanium compound layer in the present invention has a laminated structure as described above, the first layer has a thickness of 0.5 nm to 200 nm, and the second layer has a thickness of 0.5 nm to 200 nm. Preferably there is.

  Further, the surface-coated cutting tool of the present invention can have a structure in which a base layer is formed on the substrate as a coating, and a titanium compound layer is formed on the base layer. It is preferable to include a third compound containing Ti and at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen.

  The titanium compound layer in the present invention preferably has a thickness of 0.3 μm or more and 10 μm or less.

  By adopting the above-described configuration, the present invention can provide a surface-coated cutting tool provided with a coating capable of reducing crater wear and imparting high wear resistance.

It is the schematic which shows the structure of the film-forming apparatus.

Explanation of symbols

  1, 2 metal source evaporation source, 3 rotary table, 4 substrate holder, 5 substrate, 6 film forming apparatus.

Hereinafter, the present invention will be described in more detail.
<Surface coated cutting tool>
The surface-coated cutting tool of the present invention comprises a substrate and a film formed on the substrate. The surface-coated cutting tool of the present invention having such a structure is, for example, for drill milling, end milling, milling or turning edge cutting type cutting tips, metal saws, gear cutting tools, reamers, taps or crankshaft pin milling. It can be used very effectively as a chip or the like. And the surface-coated cutting tool of the present invention is a drill for heat-resistant alloy processing such as Ti alloy processing or Inconel alloy, end mill, milling processing or cutting edge replacement type cutting tip for turning, metal saw, gear cutting tool, reamer, Particularly useful as a tap or the like.

<Base material>
As the base material of the surface-coated cutting tool of the present invention, a conventionally known material known as such a cutting tool base material can be used without particular limitation. For example, cemented carbide (for example, WC base cemented carbide, including WC, including Co, or further including carbonitride such as Ti, Ta, Nb, etc.), cermet (TiC, TiN, TiCN, etc.) High-speed steel, ceramics (titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide, and mixtures thereof), cubic boron nitride sintered body, diamond sintered body Etc. can be mentioned as examples of such a substrate. When a cemented carbide is used as such a base material, the effect of the present invention is exhibited even if such a cemented carbide contains an abnormal phase called free carbon or η phase in the structure.

  In addition, these base materials may have a modified surface. For example, in the case of cemented carbide, a de-β layer may be formed on the surface, and in the case of cermet, a surface hardened layer may be formed, and even if the surface is modified in this way, The effect is shown.

<Coating>
The coating film formed on the base material of the surface-coated cutting tool of the present invention includes one or more layers. And at least 1 layer is a titanium compound layer containing the 1st compound explained in full detail below among those layers. The coating of the present invention may contain other layers as long as it contains this titanium compound layer. In addition, the film of this invention is not restricted only to what coat | covers the whole surface on a base material, The aspect in which a film is partially formed is also included.

  The total thickness of such a coating (when two or more layers are formed, the total thickness) is preferably 0.3 μm or more and 15 μm or less, more preferably 10 μm or less, and even more preferably 5 μm. Hereinafter, the lower limit is 0.5 μm or more, more preferably 1 μm or more. If the thickness is less than 0.3 μm, the effect of improving various properties such as wear resistance may not be sufficiently exhibited. If the thickness exceeds 15 μm, the residual stress may increase and the adhesion to the substrate may decrease. . In addition, as a measuring method of a film thickness, it can obtain | require by cut | disconnecting a cutting tool and observing the cross section using SEM (scanning electron microscope). Hereinafter, the coating will be described in more detail.

<Titanium compound layer>
Titanium compound layer of the present invention has the formula _{Ti 1-X M X Z Y} ( provided that, X, Y each represent atomic ratios, X is 0 <X ≦ 0.3, Y is 0.1 ≦ Y ≦ Z is at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen, and M is V, Cr, Nb, Mo, Hf, Ta, or W.) The 1st compound shown by these is included. Such a first compound exhibits higher hardness than a compound having a structure not containing a metal corresponding to M. This is probably because, in the crystal lattice of the first compound, the metal is mixed as an interstitial type or a substitution type with respect to Ti at a specific site, so that the crystal lattice is distorted and the crystal grains themselves are made finer. Guessed.

  The titanium compound layer of the present invention can be composed of only the first compound except for inevitable impurities. However, it may contain other components (elements) as described below, and may be formed by laminating a layer containing a first compound and a layer containing another compound as described below. Good.

  Such a titanium compound layer includes, together with the first compound, a secondary compound (formed simultaneously with the formation of the first compound or formed over time after the formation of the first compound). It doesn't matter if it goes out. Such secondary compounds are contained in a small amount with respect to the first compound, and examples thereof include compounds composed of Ti and Z in the above chemical formula, and compounds composed of M and Z in the above chemical formula, Ti simple substance and the simple substance of M contained in the said 1st compound can also be mentioned.

<First compound>
The first compound contained in the titanium compound layer has the formula _{Ti 1-X M X Z Y} ( provided that, X, Y each represent atomic ratios, X is 0 <X ≦ 0.3, Y is 0. 1 ≦ Y ≦ 2, and Z represents at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen, and M represents V, Cr, Nb, Mo, Hf, Ta, or W. It is a compound represented by. In the above chemical formula, when the atomic ratios X and Y satisfy the above ranges, the effect of improving the wear resistance is exhibited.

  The first compound is a compound in which a part of Ti or Cr in the above chemical formula is replaced with another element (for example, Zr, Si, Mo, Hf, Al, W, Nb, V, etc. as described later). Even in such a case, it does not depart from the scope of the present invention.

  As is apparent from the chemical formula as described above, since the first compound of the present invention does not contain Al as a constituent element in principle, crater wear can be reduced extremely effectively. Moreover, by including the metal element M as described above at a specific atomic ratio, the residual stress (compressive stress) is moderately adjusted, and these act synergistically to dramatically reduce crater wear. It is thought that it has become possible.

  In the above chemical formula, Z represents at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen. That is, Z may be composed of these elements alone or in combination of two or more elements. When two or more elements are combined, the atomic ratio of each element is not particularly limited. However, when nitrogen is included, nitrogen occupies these constituent elements (that is, with respect to Y in the above chemical formula). The atomic ratio is preferably 50% or more.

  Further, the atomic ratio Y is not particularly limited as long as 0.1 ≦ Y ≦ 2, but more preferably 0.4 ≦ Y ≦ 1.8. When Y is less than 0.1, the wear resistance is lowered, which is not preferable. On the other hand, if Y exceeds 2, the wear resistance is also lowered, which is not preferable. In addition, when Z is comprised with 2 or more types of elements as mentioned above, the atomic ratio Y shall show the total amount of those elements.

In the above chemical formula, M is V, Cr, Nb, Mo, Hf, Ta or W.
When M in the above chemical formula is V (vanadium), that is, when the first compound is represented by Ti _1-X V _X Z _Y , in addition to wear resistance, the finished surface roughness of the cutting workpiece can be improved. it can. In this case, in the above chemical formula, the atomic ratio X is preferably 0 <X ≦ 0.2, the upper limit thereof is more preferably 0.15, and the lower limit is 0.005, more preferably 0.05. is there. When said M is V, when X becomes these values, oxidation resistance will improve more and as a result, abrasion resistance will improve.

When M in the above chemical formula is Cr (chromium), that is, when the first compound is represented by Ti _1-X Cr _X Z _Y , in the above chemical formula, the atomic ratio X is preferably 0 <X ≦ 0.15 The upper limit is more preferably 0.12, still more preferably 0.1, and the lower limit is 0.005, more preferably 0.01.

When M in the above chemical formula is Nb (niobium), that is, when the first compound is represented by Ti _1-X Nb _X Z _Y , the atomic ratio X is preferably 0 <X ≦ 0.15, and the upper limit is More preferably, it is 0.12, More preferably, it is 0.1, Most preferably, it is 0.08, The minimum is 0.005, More preferably, it is 0.01. When X becomes these values, the oxidation resistance is further improved, and as a result, the wear resistance is improved.

When M in the above chemical formula is Mo (molybdenum), that is, when the first compound is represented by Ti _1-X Mo _X Z _Y , in the above chemical formula, the atomic ratio X is preferably 0 <X ≦ 0.15 The upper limit is more preferably 0.12, and still more preferably 0.1. Moreover, it is preferable that the minimum is 0.005, More preferably, it is 0.01. When the atomic ratio X exceeds 0.3, the effect of reducing crater wear is inferior and excellent wear resistance is not exhibited.

When M in the chemical formula is Hf (hafnium), that is, when the first compound is represented by Ti _1-X Hf _X Z _Y , in the chemical formula, the atomic ratio X is preferably 0 <X ≦ 0.2. The upper limit is more preferably 0.12, still more preferably 0.1, and the lower limit is 0.005, more preferably 0.01. When the atomic ratio X satisfies the above range, the oxidation resistance can be further improved, whereby the wear resistance can be improved. On the other hand, when the atomic ratio X exceeds 0.3, the effect of reducing crater wear is inferior and excellent wear resistance is not exhibited.

When M in the above chemical formula is Ta (tantalum), that is, when the first compound is represented by Ti _1-X Ta _X Z _Y , the atomic ratio X in the above chemical formula is preferably 0 <X ≦ 0.15 The upper limit is more preferably 0.12, still more preferably 0.1, and the lower limit is 0.005, more preferably 0.01. When X becomes these values, the wear resistance is improved by further improving the oxidation resistance. When the atomic ratio X exceeds 0.3, the effect of reducing crater wear is inferior and excellent wear resistance is not exhibited.

When M in the chemical formula is W (tungsten), that is, when the first compound is represented by Ti _1-X W _X Z _Y , the atomic ratio X in the chemical formula is preferably 0 <X ≦ 0.15 The upper limit is more preferably 0.12, still more preferably 0.1, and the lower limit is 0.005, more preferably 0.01. When the atomic ratio X exceeds 0.2, the effect of reducing crater wear is inferior and excellent wear resistance is not exhibited.

  As is apparent from the above chemical formula, the first compound in the present invention does not contain Al as a constituent element in principle, and therefore crater wear can be reduced extremely effectively. Moreover, it is considered that crater wear can be drastically reduced because the film hardness increases by including V in the above atomic ratio. Further, by including Mo, Nb, Hf or W, the oxidation resistance can be improved to the oxidation resistance of TiAlN. On the other hand, the film hardness can be increased by containing Cr, Nb, Ta, V or Hf. This can reduce crater wear very effectively.

  In addition, since Si and Zr are not contained in principle as constituent elements, the residual stress (compressive stress) is appropriately adjusted, and the chipping resistance of the cutting edge can be improved.

<Crystal structure of the first compound>
The first compound preferably has a crystal structure in which the ratio B / A between the peak intensity A of the (111) plane and the peak intensity B of the (200) plane in X-ray diffraction satisfies 0 ≦ B / A ≦ 1. . That is, in the crystal structure defined in this way, the orientation of the first compound of the present invention is (200) preferred orientation (for example, the highest peak appears in the (200) plane as in the above-mentioned Patent Document 4, and the highest (111) preferential orientation, not a crystal structure showing an X-ray diffraction pattern in which the half width of the peak is 0.9 degrees or less at 2θ. This fact indicates that the ratio B / A of the non-oriented TiN powder is 1.3, so that if the first compound of the present invention is non-oriented, the ratio B / A is naturally 1.25 to 1. This is because a numerical value within the range of 3 is expected.

  The upper limit of the ratio B / A is more preferably 0.8, still more preferably 0.5, and the lower limit is ideally 0.

  As described above, when the crystal structure of the first compound exhibits the (111) preferential orientation, extremely high wear resistance is exhibited. In the present invention, it has been found that the (111) preferential orientation has extremely high lubricity compared to the case of the (200) preferential orientation, and it is considered that the wear resistance during cutting is improved. It is done. Further, the roughness of the finished surface of the cutting work can be reduced.

<Surface spacing>
In the present invention, the film strength of the first compound can be further improved as will be described later when the interplanar spacing in the X-ray diffraction is within a specific range. Such X-ray diffraction is determined by the θ-2θ method.

When the first compound is represented by Ti _1-X V _X Z _Y , it is desirable that the interplanar spacing of the (111) plane in X-ray diffraction is 2.28 mm or more and 2.65 mm or less. More preferably, the (111) plane spacing is 2.40 mm or more and 2.51 mm or less.

If the first compound is represented by _{Ti 1-X Cr X Z Y} , spacing of (111) plane in X-ray diffraction is not more than 2.63Å than 2.46A, the spacing of (200) plane 2. It preferably has a crystal structure of 09 to 2.15 cm. More preferably, the (111) plane spacing is 2.49 mm to 2.58 mm, and the (200) plane spacing is 2.10 mm to 2.13 mm.

When the first compound is represented by Ti _1-X Hf _X Z _Y , the (111) plane spacing in X-ray diffraction is preferably 2.40 mm or more and 2.55 mm or less, and the (200) plane spacing is Preferably has a crystal structure of 2.09 to 2.25. The plane spacing of the (111) plane is more preferably 2.43 mm or more, and further preferably 2.47 mm or more. Further, the surface spacing of the (111) plane is more preferably 2.52 mm or less, and further preferably 2.50 mm or less. The plane spacing of the (200) plane is more preferably 2.10 mm or more, and further preferably 2.11 mm or more. Further, the (200) plane spacing is more preferably 2.16 mm or less, and further preferably 2.14 mm or less. When the distance between the (111) plane and the (200) plane satisfies the above range, the wear resistance tends to be further improved.

When the first compound is represented by Ti _1-X Ta _X Z _Y , the (111) plane spacing in the X-ray diffraction is 2.30 mm or more and 2.75 mm or less, and the (200) plane spacing is 2. A crystal structure that is greater than or equal to 00 and less than or equal to 2.30 is desirable. More preferably, the crystal structure has a (111) plane spacing of 2.40 mm to 2.55 mm and a (200) plane spacing of 2.1 mm to 2.2 mm. .

In the coating of the present invention, when the first compound is represented by Ti _1-X W _X Z _Y , the (111) plane spacing in X-ray diffraction is 2.30 mm or more and 2.65 mm or less, (200 ) It is preferable to have a crystal structure having a plane spacing of 2.04 to 2.20.

  It is known that the (111) face spacing of TiN is generally 2.45 mm and the (200) face spacing is generally 2.12 mm. Therefore, the crystal structure of the first compound of the present invention defined by the above-mentioned face spacing represents that the face spacing clearly shows a large value in the (111) plane. This is presumably because V, Cr, Hf or Ta is present as an interstitial type or a substitution type for Ti at a specific site in the crystal lattice of the first compound.

  Thus, in the crystal structure of the first compound, only the (111) plane spacing shows a large numerical value, and it is considered that there is a large strain in the (111) plane. And it is thought that the mechanical properties such as the hardness and toughness of the coating are improved by the large distortion of the (111) plane, and the cutting performance is drastically improved by their synergistic action.

<Crystal grain size>
Furthermore, the first compound of the present invention preferably has a crystal grain size of 0.1 nm or more and 200 nm or less, more preferably the upper limit is 100 nm, and even more preferably 60 nm. When the crystal grain size is less than 0.1 nm, it cannot be distinguished from the amorphous state, and when it exceeds 200 nm, the cutting performance may be deteriorated.

  Thus, it is preferable that the crystal grain size of the first compound of the present invention is as small as the above-mentioned range, and the smaller the size, the more the densification is promoted and the toughness is improved and the cutting performance is improved. Will be. Therefore, the smaller the crystal grain size, the better. However, if the crystal grain size is less than 0.1 nm as described above, the crystal state cannot be maintained and an amorphous state is obtained, so that the cutting performance is deteriorated.

  In addition, such a crystal grain diameter means the average value which can be calculated | required from the half value width of the peak resulting from the (111) plane in X-ray diffraction.

<Other components contained in the titanium compound layer>
The titanium compound layer of the present invention can contain at least one element selected from the group consisting of Zr, Si, Mo, Hf, Al, W, Nb, and V. By containing Zr, Si, Al, and Nb, the hardness is further increased and the wear resistance is improved. Moreover, by containing Mo, oxidation resistance can be improved and crater wear can be further reduced. Further, by containing Hf, W, and V, both hardness and oxidation resistance are improved, and improvement of wear resistance and reduction of crater wear can be achieved.

  The aspect in which the titanium compound layer of the present invention contains at least one element selected from the group consisting of Zr, Si, Mo, Hf, Al, W, Nb, and V is not particularly limited, and the first compound is Zr. May contain at least one element selected from the group consisting of Si, Mo, Hf, Al, W, Nb, and V, or may be contained independently of such a first compound It may be. When the first compound contains at least one element selected from the group consisting of Zr, Si, Mo, Hf, Al, W, Nb, and V, these elements penetrate into the first compound. Although it is preferable to contain as a type | mold or a substituted type | mold, the characteristic of the crystal structure of said 1st compound does not change by this.

  In addition, at least one element selected from the group consisting of Zr, Si, Mo, Hf, Al, W, Nb, and V, which exhibits excellent effects as described above, has an atomic ratio of 0.1 to Ti. It is preferably contained at a ratio of 005 to 0.3. In particular, Al, Si, and Zr have the disadvantage of promoting crater wear as described above. Therefore, it is not preferable to include a large amount of Al, Si, and Zr as long as they do not have an adverse effect.

  Here, Ti of “with respect to Ti” indicates all Ti contained in the titanium compound layer (the first compound when other components are contained in the first compound). In the case of Zr, Si, Mo, W, Nb, and V, the above-mentioned atomic ratio is more preferably the upper limit is 0.2, still more preferably 0.15, and the lower limit is 0.01, more preferably 0.8. 02. In the case of Hf and Al, the upper limit is more preferably 0.28, still more preferably 0.2, and the lower limit is 0.05, more preferably 0.08.

  When the atomic ratio is less than 0.005 or exceeds 0.3, the above excellent effects may not be exhibited. In addition, when the said element is contained 2 or more types, as long as the total amount is contained in the atomic ratio of the said range, the atomic ratio between each element will not be specifically limited.

<Laminated structure of titanium compound layer>
The titanium compound layer of the present invention may be formed by laminating one or more first layers containing the first compound and a second layer containing the second compound. The two compounds are at least one element selected from the group consisting of Si, Cr, Al, Ti, Hf, Ta, Nb, and V, and at least selected from the group consisting of boron, oxygen, carbon, and nitrogen One kind of element can be included. In this case, it is preferable that M of the first compound in the first layer is not included in the second compound included in the second layer. By sliding with such a configuration, the properties imparted to the coating film by the first layer and the second layer are improved.

  Here, the second compound is composed of boron, oxygen, carbon, and nitrogen with respect to at least one element selected from the group consisting of Si, Cr, Al, Ti, Hf, Ta, Nb, and V. It is preferable to contain at least one element selected from the group consisting of 0.1 to 2 in atomic ratio. By setting the atomic ratio within this range, the following excellent effects are exhibited. In addition, when two or more different elements among Si, Cr, Al, Ti, Hf, Ta, Nb, and V are included, the atomic ratio between the elements is as long as the total amount satisfies the atomic ratio in the above range. Is not particularly limited. Similarly, when two or more different elements of boron, oxygen, carbon, and nitrogen are included, the atomic ratio between the elements is not particularly limited.

  By adopting the laminated structure as described above, the following excellent effects are exhibited. That is, since the second compound is excellent in oxidation resistance, the entire titanium compound layer exhibits excellent oxidation resistance in addition to the action of reducing crater wear and the action of improving wear resistance. In addition, by laminating two layers having different compositions in this way, it is possible to extremely effectively prevent cracks from progressing in the thickness direction of the film, and wear phenomenon caused by film destruction due to the progress of the cracks can be suppressed. As a result, the wear resistance can be further improved.

  In the case where the titanium compound layer has a laminated structure as described above, the laminated structure in the case where the second layer is a layer containing Ti and Al or a layer containing Al and Cr is used for improving the wear resistance. desirable. As described above, when the abundance ratio of Al increases in the first layer containing the first compound, it is not desirable because it tends to reduce crater wear resistance. However, when a layer containing Ti and Al or a layer containing Al and Cr is multi-layered (or super multi-layered) with the first layer as the second layer, the crater resistance is the same as when the first layer contains Al. It has been found by the present inventors that the wear resistance is not lowered, but rather the crater wear resistance is improved. This is considered to suggest that when the laminated structure as described above is adopted, the toughness of the entire coating film is significantly improved by the laminated structure. The layer containing Ti and Al or the layer containing Al and Cr is, for example, a layer containing TiAlN or a layer containing AlCrN. In these layers, the atomic ratio of Ti and Al is Ti: Al = 50: 50. It is desirable that it is ˜80: 20, and the atomic ratio of Al and Cr is desirably Al: Cr = 80: 20 to 60:40.

When the first compound is Ti _1-X V _X Z _Y and has a laminated structure as described above, it is desirable from the viewpoint of chipping resistance that the atoms constituting the second layer do not contain vanadium. This is because, for example, when the second layer is made of TiAlVN, the lattice constant of the second layer is closer to that of TiVN of the first layer than that of TiAlN not containing vanadium, As a result, it can be mentioned that the structure is such that the lattice distortion between the layers constituting the laminated structure is small. That is, since the lattice distortion is small, it is considered that the compressive stress in the film is small, and therefore, the fracture resistance is small and the film is considered to be easily chipped. For the same reason, in the laminated structure, it is preferable that the first compound and the second compound contained in the second layer have different lattice constants.

  When the titanium compound layer has the above laminated structure, the first layer preferably has a thickness of 0.5 nm to 200 nm, and the second layer also has a thickness of 0.5 nm to 200 nm. Is preferred. This is because having a thickness in this range exhibits particularly excellent wear resistance during cutting. And as for each thickness of the said 1st layer and the 2nd layer, More preferably, the upper limit is 80 nm, More preferably, it is 20 nm, The lower limit is more preferably 1 nm. It is difficult to form each layer with a thickness of less than 0.5 nm. When the thickness exceeds 200 nm, the above-described excellent effects may not be shown. Particularly preferably, the total thickness of only the first layer is 0.3 μm or more and 10 μm or less, and more preferably 0.7 μm or more and 5 μm or less. By making the total thickness of only the first layer within these ranges, the above effect is most effectively exhibited. As long as the total thickness of only the first layer falls within such a range, the total thickness of only the second layer is not particularly limited, but a thickness of 1 μm or more and 10 μm or less is usually sufficient. The thicknesses of the first layer and the second layer stacked in this way may be approximately equal or different.

  In the present invention, the laminated structure means that each of the first layer and the second layer is formed by laminating one or more layers, more preferably the first layer and the second layer. It is preferable that a plurality of layers are alternately stacked. In such a laminated structure, the lowermost layer and the uppermost layer may be formed of either the first layer or the second layer. In addition, the number of stacked layers is not particularly limited, but each layer may be 1 layer or more and 8000 layers or less, more preferably 20 layers or more and 5000 layers or less.

<Thickness of titanium compound layer>
The titanium compound layer of the present invention preferably has a thickness of 0.3 μm or more and 10 μm or less. More preferably, the upper limit is 8 μm, more preferably 6 μm, and the lower limit is 0.7 μm, more preferably 1 μm.

  If the thickness is less than 0.3 μm, the effect of the present invention that reduces crater wear and imparts high wear resistance may not be shown, and if it exceeds 10 μm, the effect may be reduced. is there. The above-described effect is particularly excellent when the thickness is 1 μm or more and 6 μm or less.

<Underlayer>
In the surface-coated cutting tool of the present invention, a base layer may be formed on a base material as a coating, and the titanium compound layer may be formed on the base layer. The base layer includes Ti and boron. And a third compound containing at least one element selected from the group consisting of oxygen, carbon, and nitrogen. Since this third compound is excellent in adhesion to the base material, if the base layer is formed on the base material so as to be in contact with the base material, and the titanium compound layer is formed on the base layer, these coating films are formed. Is formed on the substrate with high adhesion as a whole.

  Examples of such a third compound include TiN, TiC, TiCN, TiBN, TiNO, etc., or compounds obtained by adding Si, W, Mo, or the like to these compounds. In addition, when atomic ratio is not prescribed | regulated especially in these chemical formulas, the atomic ratio of each element does not necessarily become an equivalent ratio, but all the conventionally well-known atomic ratio shall be included. For example, when TiN is described, the atomic ratio of Ti and N includes 1: 1, and includes 2: 1, 1: 0.95, 1: 0.9, etc. (otherwise, unless otherwise specified) Same for describing chemical formula). That is, the atomic ratio between Ti and at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen (including the atomic ratio of that element when other (metal) elements are included in addition to Ti) In the case where two or more of boron, oxygen, carbon, or nitrogen are contained, the atomic ratio between these elements is also not particularly limited, and all conventionally known atomic ratios are included.

  The underlayer as described above preferably has a thickness of 0.05 μm to 2 μm, more preferably 0.1 μm to 1 μm. In addition, such an underlayer can be composed of one layer, or can be composed of two or more layers (when composed of two or more layers, the total thickness is within the above range). ).

<Other layers>
The film of the present invention may further contain one or more layers other than the titanium compound layer and the underlayer as described above. For example, such other layers can be formed between the base layer and the titanium compound layer, or can be formed on the titanium compound layer. By forming such other layers, the effect of the present invention of reducing crater wear and imparting high wear resistance can be further improved, or lubricity can be imparted. The effect that welding can be suppressed can also be achieved.

Examples of the compound constituting such another layer include oxides such as Al ₂ O ₃ , siliconitrides such as TiSiN, carbonitrides such as TiCN, and the like. In addition, it is preferable that such other layers have a thickness of 0.05 μm or more and 5 μm or less, more preferably 0.1 μm or more and 2 μm or less.

<Manufacturing method>
Since the coating of the present invention, particularly the titanium compound layer, needs to be composed of a compound having high crystallinity as described above, the film forming process in which the coating of the present invention is composed of such a compound having high crystallinity. It is preferable that it is formed by. Therefore, it is desirable that the film of the present invention is formed by physical vapor deposition (PVD method). Examples of such physical vapor deposition include balanced magnetron sputtering, unbalanced magnetron sputtering, arc ion plating, and combinations of these. Even when the titanium compound layer is formed in the above laminated structure, it can be formed by a conventionally known method under these physical vapor deposition methods.

  In particular, specific conditions for suitably forming the titanium compound layer as described above are as follows. That is, when the arc ion plating method is adopted, a target containing each corresponding element at an appropriate blending ratio is set in an arc evaporation source so as to obtain a first compound having a desired structure, and a substrate (base material) ) By setting the temperature to 400 to 700 ° C. and the reaction gas pressure in the apparatus to 2.0 to 6.0 Pa, and selecting one or more gases from among nitrogen, methane, oxygen, etc. as the reaction gas Is introduced. Then, while maintaining the substrate (negative) bias voltage at −60 V to −200 V, an arc current of 50 to 120 A is supplied to the cathode electrode, and metal ions are generated from the arc evaporation source to form a titanium compound layer. can do. Note that the higher the substrate (negative) bias voltage is to the negative side (that is, the larger the absolute value), the higher the (111) preferred orientation of the crystal structure of the first compound tends to be.

When the unbalanced magnetron sputtering method is adopted, the substrate (base material) temperature is set to 400 to 600 ° C., the reaction gas pressure in the apparatus is set to 300 mPa to 800 mPa, and the reaction gas corresponding to the desired first compound For example, one or more gases are selected from nitrogen, acetylene, and oxygen (introducing the reaction gas, the ratio of the rare gas / reaction gas is preferably set to 1 to 5). ). Then, while the substrate (negative) bias voltage is maintained at 0 V to −90 V (the substrate (negative) bias voltage is lowered to the negative side (that is, the absolute value is decreased), the crystal structure of the first compound (111) The titanium compound layer can be formed by generating a power density of 0.12 to 0.3 W / mm ^{2 on} the target.

<Example>
EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, this invention is not limited to these. In addition, the chemical composition (composition of the compound) of each layer constituting each of the following films is confirmed by an energy dispersive X-ray fluorescence spectrometer (SEM-EDX) attached to the secondary electron microscope, and the thickness of each layer is determined by the thickness of the film. The cross section was confirmed by observing with a secondary electron microscope (SEM). Also, by performing X-ray diffraction by the θ-2θ method using CuKα rays as X-rays, the peak intensity A of the (111) plane and the peak intensity B of the (200) plane are obtained for the crystal structure of the first compound. Ratio B / A (hereinafter sometimes simply referred to as B / A), crystal grain size, (111) plane spacing (d ₍₁₁₁₎ ), and (200) plane spacing (d ₍₂₀₀₎ ). The crystal grain size of the first compound was calculated from the half width of the (111) plane, and the plane spacing was calculated from the 2θ angle where the peak intensity was maximum.

  In the present example, the coating film formed on the substrate was formed by the cathodic arc ion plating method as follows. In Examples and Comparative Examples, a film was formed using a cutting edge-exchangeable tip for cutting (made of cemented carbide (P20), shape CNMG120408 (ISO standard)) to obtain a surface-coated cutting tool.

<Cathode-type arc ion plating (AIP) method>
First, as a base material, a cutting tip having a grade of P30 (JIS B 4053-1998) cemented carbide and a shape of SNGN120408 (JIS B 4121-1998) was prepared, washed, and then a cathodic arc. The substrate was set in the ion plating apparatus (deposition apparatus) at the substrate mounting position. As such a film forming apparatus, a conventionally known apparatus can be used without any particular limitation.

And while reducing the inside of this apparatus to 1x10 <^-4> Pa or less with a vacuum pump, the temperature of the said base material was heated to 650 degreeC with the heater installed in this apparatus, and it hold | maintained for 1 hour.

  Next, argon gas was introduced to maintain the pressure in the apparatus at 3.0 Pa, the substrate (base material) bias voltage was gradually increased to −1500 V, and the surface of the base material was cleaned for 15 minutes. Thereafter, argon gas was exhausted.

  Next, each target containing each corresponding metal element so that its chemical composition is as shown in Table 1 below as a film (that is, a titanium compound layer made of the first compound) formed on the substrate surface. Was set in a raw material evaporation source (an arc evaporation source). The substrate (base material) temperature is set to 550 to 650 ° C. and the reaction gas pressure in the apparatus is set to 4.0 Pa, corresponding to light element components such as nitrogen, oxygen, boron, and carbon having the chemical composition shown in Table 1. This was introduced by selecting one or more gases from among nitrogen, methane, and oxygen as the reaction gas. When TiVZ, TiCrZ, TiNbZ, TiMoZ, TiHfZ, TiTaZ, and TiWZ are used as the first compound constituting the titanium compound layer, the cathode bias is maintained at -50V to -400V, and 50A to 200A is applied to the cathode electrode. The arc current was supplied and metal ions were generated from an arc evaporation source to form a titanium compound layer.

  That is, a metal compound, metal element, or cluster generated from an arc evaporation source reacts with the reaction gas in a plasma atmosphere to form (precipitate) a titanium compound layer (ie, the first compound) on the substrate. Will be. As the reaction gas, nitrogen is selected when the final product (first compound) is a nitride, and methane (a hydrocarbon gas such as acetylene is not limited to methane, but is not limited to methane). And argon gas can be selected as the atmospheric gas (for reactive gas partial pressure control), and in the case of oxide, argon gas can be selected as the oxygen and atmospheric gas (for reactive gas partial pressure control). In the case of other carbonitrides or nitride oxides, two or more kinds of reaction gases were selected and used based on the above example. When boron was included in the chemical composition, a target containing a desired amount of boron element in advance was used.

  In order to produce a laminated structure of the first compound and the second compound, for example, as shown in the schematic diagram showing the configuration of the film forming apparatus 6 in FIG. 3 and the substrate holder 4 may be used. In the present embodiment and the like, using such a film forming apparatus 6, for example, a raw material composed of the metal component of the first compound is set in the target metal raw material evaporation source 1, and a position facing the metal raw material evaporation source 1 or a predetermined position. At the position where the angle is given, the raw material made of the metal component of the second compound is set as a target in the metal raw material evaporation source 2 and the substrate holder 4 holds the substrate 5 serving as a cutting tip. In order to pass the base material 5 so as to face each target side, the base material 5 is rotated by the rotary table 3 in the direction of the arrow in FIG. 1, for example, and a desired number of layers each composed of the first compound and the second compound are formed. To obtain a laminated structure.

  In the case of nitride, the ratio B / A exceeds 1.0 by setting the bias voltage to 0 to -50V. Further, by increasing the bias voltage to a negative side from −50 V, the ratio B / A for the orientation can be set to 1.0 or less. From the viewpoint of wear resistance, it is desirable that the bias voltage is continuously increased from −50 V to −150 V to the negative side during film formation. In the embodiment, the bias voltage is continuously increased in the above range. It was. The titanium compound layer produced by such a production method had a B / A of 1 or less.

  Then, when the thickness described in Tables 1 to 18 is reached, the current supplied to the arc evaporation source is stopped, and after cooling, the inside of the apparatus is opened to the atmosphere, and then the surface-coated cutting in which the coating is formed on the substrate The surface-coated cutting tool of the present invention was manufactured by removing the tool from the apparatus. In addition, in the section of “Production method” in Tables 1 to 18, the surface-coated cutting tool produced by this cathodic arc ion plating method was represented as “AIP”.

( Reference Examples 1-27): TiVZ
A film was formed by the above-mentioned cathodic arc ion plating method so as to have the composition of the first compound shown in Tables 1 and 2 and the composition of the first compound and the second compound shown in Table 3 to produce a surface-coated cutting tool. .

(Comparative Examples 1-6)
As Comparative Example 1, a surface-coated cutting tool in which a film made of a compound containing no vanadium in the first compound (that is, specifically TiN) was formed on a substrate was manufactured. Further, as Comparative Example 2, a surface-coated cutting tool in which a film made of TiAlN was formed on a substrate was manufactured. Comparative Example 3 is a surface-coated cutting tool obtained in the same manner as Reference Example 2 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 4 is a surface-coated cutting tool obtained in the same manner as Reference Example 2 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1. Comparative Example 5 is a surface-coated cutting tool obtained in the same manner as Reference Example 2 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. In Comparative Example 6, the same composition as in Reference Example 2 was used except that instead of Ti alone, Ti was mixed with 10 atomic% Si (ratio to the metal composition in the first compound column) Si. This is a Si-containing nitride film formed in accordance with film conditions. Table 1 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 7-12)
As Comparative Example 7, a surface-coated cutting tool in which a coating of a carbonitride containing no vanadium in the first compound (that is, specifically TiCN) was formed on a substrate was manufactured. Further, as Comparative Example 8, a surface-coated cutting tool in which a film made of TiAlCN was formed on a substrate was manufactured. Comparative Example 9 is a surface-coated cutting tool obtained in the same manner as Reference Example 9 except that the atomic ratio X in the above chemical formula of the first compound exceeds 0.3. Comparative Example 10 is a surface-coated cutting tool obtained in the same manner as Reference Example 9 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1. Comparative Example 11 is a surface-coated cutting tool obtained in the same manner as in Reference Example 9 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 12 was the same as Reference Example 9 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. The Si-containing carbonitride film obtained as described above. Table 2 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 13 and 14)
Comparative Example 13 is a surface-coated cutting tool obtained in the same manner as Reference Example 12 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 14 is a surface-coated cutting tool obtained in the same manner as Reference Example 18 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Table 3 shows the physical properties and the like of the surface-coated cutting tools obtained in these comparative examples.

<Cutting test 1>
For the surface-coated cutting tools of Examples 1 to 27 and the surface-coated cutting tools of Comparative Examples 1 to 14 manufactured as described above, a continuous turning test was performed under the cutting conditions shown in Table 19 below, and the flank The amount of wear (VB) and the amount of crater wear (KT) were measured. The smaller the flank wear amount, the better the wear resistance, and the smaller the crater wear amount, the lower the crater wear. The results are shown in Tables 1 to 3 below.

<Cutting test 2>
About the surface covering cutting tool of Examples 1-27 manufactured as mentioned above and the surface covering cutting tool of Comparative Examples 1-14, by carrying out the intermittent cutting test by the following cutting conditions, flank wear amount and The amount of crater wear was measured.

  The workpiece has a size of width 100 mm × length 300 mm × height 100 mm, and a large number of grooves perpendicular to the side having a length of 300 mm and parallel to the side having a width of 100 mm are formed at equal intervals. The distance between the grooves was the distance between the centers of the grooves. As a cutting test, only one chip is attached to the cutter FPG 4160R, and cutting is started under the following conditions. The time when the chip was damaged and cutting was impossible was described in the table as the cutting time. It can be judged that the longer the time, the higher the fracture resistance of the coating. Table 20 shows the conditions of the cutting test 2.

  As a result, the multi-layered laminated structure improved the fracture resistance of the coating, and in particular, the surface-coated cutting tool on which the coating having a lamination period of about 10 nm had the highest fracture resistance.

<Cutting test 3>
About the surface covering cutting tool manufactured as mentioned above, the continuous cutting test was implemented on the following cutting conditions, and flank wear amount and crater wear amount were measured. Cutting was performed for a predetermined time under the conditions shown in Table 21, and the gloss of the final work material surface was visually evaluated in five stages. The surface gloss of 5 is the best and the surface gloss of 1 is the worst. “5” indicates that the entire cutting surface has a metallic luster, “4” indicates that the total area of the defective metallic luster due to peeling or the like is about 1/4 of the total area of the cutting surface, and “3” indicates the above metal. The total area of the poorly glossy part is about 1/2 of the total area of the cut surface, “2” is about 3/4 of the total area of the metal glossy defective part, and “1” is almost glossy. Indicates that was not observed.

In Tables 1 to 3, “X”, “Y”, and “Z” respectively indicate X, Y, and Z in the chemical formula Ti _1-X M _X Z _{Y as} the first compound. “Mixed element” refers to an element other than Ti and M contained in the first compound and Z in the above chemical formula. In addition, the numerical value described in the item of “Z” indicates an atomic ratio (the sum of those numerical values is the numerical value described in “Y”). “Atom ratio of mixed elements” indicates an atomic ratio with respect to Ti contained in the first compound as described above. “D” indicates the thickness of the titanium compound layer or the equivalent layer in the comparative example. In Table 3, the numerical value described in the “second compound” section indicates an atomic ratio.

  In addition, in the section of “lamination structure” in Tables 1 to 3, when the titanium compound layer is formed by laminating the first layer and the second layer described above, it is expressed as “present”, and such lamination When the structure was not included (that is, in the case of a single layer), it was described as “none”.

Examples 28 to 42: TiCrZ
A film was formed by the above-mentioned cathodic arc ion plating method so as to have the composition of the first compound shown in Table 4 or the composition of the first compound and the second compound shown in Table 5, thereby producing a surface-coated cutting tool.

(Comparative Examples 15 to 21)
As Comparative Example 15, a surface-coated cutting tool was produced in which a coating of a carbonitride containing no chromium in the first compound (ie, specifically, TiCN) was formed on a substrate. Further, as Comparative Example 16, a surface-coated cutting tool in which a film made of TiAlCN was formed on a substrate was manufactured. In Comparative Example 17, a film made of a compound having the same composition as the first compound of Example 24 was formed. By changing the bias voltage during film formation to 50 V, the peak intensity of the (111) plane was This is a surface-coated cutting tool different from Example 2 in that the ratio B / A between A and the peak intensity B of the (200) plane is 1 or more.

  Comparative Example 18 is a surface-coated cutting tool obtained in the same manner as in Example 24 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 19 is a surface-coated cutting tool obtained in the same manner as in Example 24 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1. Comparative Example 20 is a surface-coated cutting tool obtained in the same manner as in Example 24 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 21 was obtained in the same manner as in Example 24 except that instead of Ti alone, Ti was mixed with 10 atomic% Si (ratio to the metal composition in the first compound column) Si. A surface-coated cutting tool. Table 4 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 22-25)
In Comparative Example 22, a film made of a compound having the same composition as the first compound of Example 32 was formed. By changing the bias voltage during film formation to 20 V, the peak intensity A on the (111) plane was 200) a surface-coated cutting tool different from that in Example 32 in that the ratio B / A to the peak intensity B of the surface is 1 or more. Comparative Example 23 is a surface-coated cutting tool obtained in the same manner as in Example 28 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. In Comparative Example 24, a film made of a compound having the same composition as the first compound of Example 38 was formed. By changing the bias voltage during film formation to 20 V, the peak intensity A on the (111) plane was This is a surface-coated cutting tool different from Example 38 in that the ratio B / A to the peak intensity B of the (200) plane is 1 or more. Comparative Example 25 is a surface-coated cutting tool obtained in the same manner as in Example 34 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3.

  The cutting tests 1 to 3 were performed on the surface-coated cutting tools obtained in Examples 28 to 42 and Comparative Examples 15 to 25. The results are shown in Tables 4-5.

Each item in Tables 4 and 5 shows the same contents as each item in Tables 1-3.
(Examples 43 to 49, 51 to 55 and 57 to 68, and Reference Examples 50 and 56 ): TiNbZ
A film is formed by the cathode arc ion plating method so as to have the composition of the first compound shown in Tables 6 to 7 or the composition of the first compound and the second compound shown in Table 8 to produce a surface-coated cutting tool. did. In the table, “Reference” written in the leftmost column is a reference example.

(Comparative Examples 26-31)
As a comparative example 26, a surface-coated cutting tool in which a film made of a compound containing no niobium in the first compound (that is, specifically TiN) was formed on a substrate was manufactured. Further, as Comparative Example 27, a surface-coated cutting tool in which a film made of TiAlN was formed on a substrate was manufactured. Comparative Example 28 is a surface-coated cutting tool obtained in the same manner as in Example 44 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 29 is a surface-coated cutting tool obtained in the same manner as in Example 44 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 30 is a surface-coated cutting tool obtained in the same manner as in Example 44 except that the atomic ratio Y in the above chemical formula in the first compound exceeds 2. Comparative Example 31 was the same as Example 44 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. This is a Si-containing nitride film formed under the above film forming conditions. Table 6 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 32-37)
As Comparative Example 32, a surface-coated cutting tool was produced in which a coating of carbonitride containing niobium in the first compound (specifically, TiCN) was formed on a substrate. Further, as Comparative Example 33, a surface-coated cutting tool in which a film made of TiAlCN was formed on a base material was manufactured. Comparative Example 34 is a surface-coated cutting tool obtained in the same manner as in Example 51 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 35 is a surface-coated cutting tool obtained in the same manner as in Example 51 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 36 is a surface-coated cutting tool obtained in the same manner as in Example 51 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 37 is the same as Example 51 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. The Si-containing carbonitride film obtained as described above. Table 7 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 38 and 39)
Comparative Example 38 is a surface-coated cutting tool obtained in the same manner as in Example 54 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 39 is a surface-coated cutting tool obtained in the same manner as in Example 68 except that the atomic ratio X in the above chemical formula exceeds 0.3 in the first compound.

Each item in Tables 6-8 shows the same content as each item in Tables 1-3.
(Examples 69 to 74, 77 to 84 and 86 to 90, and Reference Examples 75, 76, 85 and 91): TiMoZ
A coating film is formed by the cathode arc ion plating method so as to have the composition of the first compound shown in Tables 9 to 10 or the composition of the first compound and the second compound shown in Table 11 to produce a surface-coated cutting tool. did. In the table, “Reference” written in the leftmost column is a reference example.

(Comparative Examples 40-45)
As Comparative Example 40, a surface-coated cutting tool in which a coating of a first compound containing no molybdenum (that is, specifically TiN) was formed on a substrate was manufactured. Further, as Comparative Example 41, a surface-coated cutting tool in which a film made of TiAlN was formed on a base material was manufactured. Comparative Example 42 is a surface-coated cutting tool obtained in the same manner as in Example 70 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 43 is a surface-coated cutting tool obtained in the same manner as in Example 70 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 44 is a surface-coated cutting tool obtained in the same manner as in Example 70 except that the atomic ratio Y in the above chemical formula in the first compound exceeds 2. Comparative Example 45 is the same as Example 70 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. This is a Si-containing nitride film formed under the above film forming conditions. Table 9 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 46-51)
As Comparative Example 46, a surface-coated cutting tool was produced in which a coating of carbonitride containing no molybdenum in the first compound (that is, specifically TiCN) was formed on a substrate. Further, as Comparative Example 47, a surface-coated cutting tool in which a film made of TiAlCN was formed on a substrate was manufactured. Comparative Example 48 is a surface-coated cutting tool obtained in the same manner as in Example 77 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 49 is a surface-coated cutting tool obtained in the same manner as in Example 77 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 50 is a surface-coated cutting tool obtained in the same manner as in Example 77 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 51 was the same as Example 77 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. The Si-containing carbonitride film obtained as described above. Table 10 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 52 and 53)
Comparative Example 52 is a surface-coated cutting tool obtained in the same manner as in Example 80 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 53 is a surface-coated cutting tool obtained in the same manner as in Example 87 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3.

Each item in Tables 9-11 shows the same content as each item in Tables 1-3.
(Examples 92 to 97, and 99 to 110, and Reference Example 98 ): (TiHfZ)
A film was formed by the above-mentioned cathodic arc ion plating method so as to have the composition of the first compound shown in Table 12 or the composition of the first compound and the second compound shown in Table 13, and a surface-coated cutting tool was produced. In the table, “Reference” written in the leftmost column is a reference example.

(Comparative Examples 54-59)
As Comparative Example 54, a surface-coated cutting tool in which a coating of a carbonitride containing no hafnium in the first compound (that is, specifically TiCN) was formed on a substrate was manufactured. Further, as Comparative Example 55, a surface-coated cutting tool in which a film made of TiAlCN was formed on a substrate was manufactured. Comparative Example 56 is a surface-coated cutting tool obtained in the same manner as Reference Example 98 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 57 is a surface-coated cutting tool obtained in the same manner as Reference Example 98 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

Comparative Example 58 is a surface-coated cutting tool obtained in the same manner as in Reference Example 98 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 59 was the same as Reference Example 98 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the first compound column) instead of Ti alone as a target. A surface-coated cutting tool obtained as described above. Table 12 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 60 and 61)
Comparative Example 60 is a surface-coated cutting tool obtained in the same manner as in Example 100 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 61 is a surface-coated cutting tool obtained in the same manner as in Example 106 except that the atomic ratio X in the above chemical formula exceeds 0.3 in the first compound.

Each item in Tables 12-13 shows the same content as each item in Tables 1-3.
(Examples 111-116, 119-126 and 128-132, and Reference Examples 117, 118, 127 and 133): TiTaZ
A film is formed by the cathode arc ion plating method so as to have the composition of the first compound shown in Tables 14 to 15 or the composition of the first compound and the second compound shown in Table 16 to produce a surface-coated cutting tool. did. In the table, “Reference” written in the leftmost column is a reference example.

(Comparative Examples 62-67)
As Comparative Example 62, a surface-coated cutting tool in which a film made of a compound containing no tantalum in the first compound (that is, specifically TiN) was formed on a substrate was manufactured. Further, as Comparative Example 63, a surface-coated cutting tool in which a film made of TiAlN was formed on a base material was manufactured. Comparative Example 64 is a surface-coated cutting tool obtained in the same manner as in Example 112 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 65 is a surface-coated cutting tool obtained in the same manner as in Example 112 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 66 is a surface-coated cutting tool obtained in the same manner as in Example 112 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 67 was the same as Example 112 except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. This is a Si-containing nitride film formed under the above film forming conditions. Table 14 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 68-73)
As Comparative Example 68, a surface-coated cutting tool was produced in which a coating of a carbonitride containing no tantalum in the first compound (specifically, TiCN) was formed on a substrate. Further, as Comparative Example 69, a surface-coated cutting tool in which a film made of TiAlCN was formed on a base material was manufactured. Comparative Example 70 is a surface-coated cutting tool obtained in the same manner as in Example 119 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 71 is a surface-coated cutting tool obtained in the same manner as in Example 119 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 72 is a surface-coated cutting tool obtained in the same manner as in Example 119 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 73 was the same as Example 119, except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. The Si-containing carbonitride film obtained as described above. Table 15 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 74 and 75)
Comparative Example 74 is a surface-coated cutting tool obtained in the same manner as in Example 123 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 75 is a surface-coated cutting tool obtained in the same manner as in Example 129 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3.

Each item in Tables 14-16 shows the same content as each item in Tables 1-3.
(Examples 134 to 150): TiWZ
A film was formed by the above-mentioned cathodic arc ion plating method so as to have the composition of the first compound shown in Table 17 or the composition of the first compound and the second compound shown in Table 18, and a surface-coated cutting tool was produced.

(Comparative Examples 76-82)
As Comparative Example 76, a surface-coated cutting tool in which a coating of carbonaceous nitride containing no tungsten in the first compound (specifically, TiCN) was formed on a substrate was manufactured. Further, as Comparative Example 77, a surface-coated cutting tool in which a film made of TiAlCN was formed on a substrate was manufactured. In Comparative Example 78, a film made of a compound having the same composition as the first compound of Example 135 was formed. By changing the bias voltage during film formation to 50 V, the peak intensity of the (111) plane was The surface-coated cutting tool is different from Example 135 in that the ratio B / A between A and the peak intensity B of the (200) plane is 1 or more. Comparative Example 79 is a surface-coated cutting tool obtained in the same manner as in Example 135 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3. Comparative Example 80 is a surface-coated cutting tool obtained in the same manner as Example 135 except that the atomic ratio Y in the chemical formula of the first compound is less than 0.1.

  Comparative Example 81 is a surface-coated cutting tool obtained in the same manner as in Example 135 except that the atomic ratio Y in the above chemical formula exceeds 2 in the first compound. Comparative Example 82 was the same as Example 135, except that Ti was mixed with Ti at 10 atomic% (ratio to the metal composition in the column of the first compound) instead of Ti alone as a target. A surface-coated cutting tool obtained as described above. Table 17 shows the physical properties and the like of the surface-coated cutting tools of these comparative examples.

(Comparative Examples 83-86)
In Comparative Example 83, a film made of a compound having the same composition as the first compound of Example 144 was formed. By changing the bias voltage during film formation to 20 V, the peak intensity A on the (111) plane was 200) a surface-coated cutting tool that differs from Example 144 in that the ratio B / A to the peak intensity B of the surface is 1 or more. Comparative Example 84 is a surface-coated cutting tool obtained in the same manner as in Example 140 except that the atomic ratio X in the above chemical formula exceeds 0.3 in the first compound.

  In Comparative Example 85, a film made of a compound having the same composition as the first compound of Example 150 was formed. By changing the bias voltage during film formation to 20 V, the peak intensity A on the (111) plane was This is a surface-coated cutting tool different from Example 150 in that the ratio B / A to the peak intensity B of the (200) plane is 1 or more. Comparative Example 86 is a surface-coated cutting tool obtained in the same manner as in Example 146 except that the atomic ratio X in the chemical formula of the first compound exceeds 0.3.

  Each item in Tables 17-18 shows the same content as each item in Tables 1-3.

As is clear from Tables 1 to 18, the surface-coated cutting tool of the example of the present invention was superior to the surface-coated cutting tool of the comparative example in both reducing crater wear and improving wear resistance. It is clear that Thus, it can be seen that the surface-coated cutting tool of the present invention has excellent cutting performance. In addition, from the results of Tables 1 to 18, it is possible to improve the fracture resistance of the coating by using a multi-layered structure, and the most excellent fracture resistance when the lamination period is about 10 nm. I understood it. Further, the use of Ti _0.35 Al _0.5 V _0.15 N ₁ for the second layer did not improve the fracture resistance.

  In the above-described embodiment, only the titanium compound layer is formed as a coating on the base material. However, the base layer as described above is formed on the base material, and the titanium compound layer is formed on the base layer. In such a case, the adhesion between the substrate and the film can be further improved.

  Although the embodiments and examples of the present invention have been described as described above, it is also planned from the beginning to appropriately combine the configurations of the above-described embodiments and examples.

  It should be understood that the embodiments and examples disclosed herein are illustrative and non-restrictive in every respect. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

Claims (12)

A surface-coated cutting tool comprising a substrate and a coating formed on the substrate,
The coating comprises one or more layers;
At least one of the layers has the chemical formula Ti _1-X M _X Z _Y (where X and Y each represent an atomic ratio, X is 0 <X ≦ 0.3, and Y is 0.1 ≦ Y ≦ 1, and Z represents at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen, M is Cr, Nb, Mo, Hf, Ta, or W; A titanium compound layer containing a first compound represented by the following formula:
The first compound has a crystal structure in which the ratio B / A between the peak intensity A of the (111) plane and the peak intensity B of the (200) plane in X-ray diffraction is 0 ≦ B / A ≦ 1, and A surface-coated cutting tool having a crystal grain size of 0.1 nm to 200 nm. In the chemical formula Ti _1-X M _X Z _Y , M is Hf,
X is 0 <X ≦ 0.2,
The first compound has a crystal structure in which the (111) plane spacing in the X-ray diffraction is 2.40 mm to 2.55 mm and the (200) plane spacing is 2.09 mm to 2.25 mm. The surface-coated cutting tool according to claim 1. In the chemical formula Ti _1-X M _X Z _Y, the M is Ta.
X is 0 <X ≦ 0.15,
The first compound has a crystal structure in which the (111) plane spacing in X-ray diffraction is 2.30 mm to 2.75 mm and the (200) plane spacing is 2.00 mm to 2.30 mm. The surface-coated cutting tool according to claim 1. In the chemical formula Ti _1-X M _X Z _Y , M is Cr,
X is 0 <X ≦ 0.15,
The first compound has a (111) plane spacing of 2.46 to 2.63 in X-ray diffraction.
2. The surface-coated cutting tool according to claim 1, wherein the surface-coated cutting tool has a crystal structure that is not more than Å and has a (200) plane spacing of 2.09 to 2.15 Å. In the chemical formula Ti _1-X M _X Z _Y , M is W;
X is 0 <X ≦ 0.2,
The first compound has a crystal structure in which the (111) plane spacing in the X-ray diffraction is 2.30 mm to 2.65 mm and the (200) plane spacing is 2.04 mm to 2.20 mm. The surface-coated cutting tool according to claim 1. In the chemical formula Ti _1-X M _X Z _Y , M is Mo,
The surface-coated cutting tool according to claim 1, wherein X is 0 <X ≦ 0.15. Wherein the first compound comprises Mo, Hf, W, and at least one element selected from Nb or Ranaru group,
Wherein Mo, Hf, W, and at least one element selected from Nb or Ranaru group, according to claim 1 contained in a proportion of 0.005 to 0.3 in atomic ratio to Ti Surface coated cutting tool. The titanium compound layer has a laminated structure in which a first layer containing the first compound and a second layer containing a second compound are each laminated one or more layers,
The second compound is selected from the group consisting of at least one element selected from the group consisting of Si, Cr, Al, Ti, Hf, Ta, Nb, and V, and boron, oxygen, carbon, and nitrogen. The surface-coated cutting tool according to claim 1, comprising at least one element.   The second compound is a compound comprising at least one element selected from the group consisting of Cr, Al, and Ti and at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen. The surface-coated cutting tool according to claim 8. The first layer has a thickness of 0.5 nm or more and 200 nm or less,
The surface-coated cutting tool according to claim 8, wherein the thickness of the second layer is 0.5 nm or more and 200 nm or less. In the surface-coated cutting tool, a base layer is formed on the substrate as the coating, and the titanium compound layer is formed on the base layer,
2. The surface-coated cutting tool according to claim 1, wherein the underlayer includes a third compound containing Ti and at least one element selected from the group consisting of boron, oxygen, carbon, and nitrogen.   The surface-coated cutting tool according to claim 1, wherein the titanium compound layer has a thickness of 0.3 μm or more and 10 μm or less.

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