CN110938803A - Coating treatment method for preparing Ti-Mo-N lubricating coating - Google Patents
Coating treatment method for preparing Ti-Mo-N lubricating coating Download PDFInfo
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- CN110938803A CN110938803A CN201911250715.1A CN201911250715A CN110938803A CN 110938803 A CN110938803 A CN 110938803A CN 201911250715 A CN201911250715 A CN 201911250715A CN 110938803 A CN110938803 A CN 110938803A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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Abstract
The invention belongs to the technical field of material surface modification, and discloses a coating treatment method for preparing a Ti-Mo-N lubricating coating. Cleaning the base material, placing the cleaned base material in a coating chamber of an arc ion coating machine, and vacuumizing to 8 x 10‑3Pa below; introducing argon gas, carrying out glow discharge cleaning on the base material, then igniting a Cr target cathode evaporation source to carry out sputtering cleaning on the base material, and finally carrying out film deposition preparation under the condition that the nitrogen pressure is 1.2Pa or 1.8Pa, the Mo atom ratio is 8% through a Ti-Mo alloy target cathode evaporation source, and the target current is 105A to obtain the Ti-Mo-N lubricating coating. By designing the substrate pretreatment process and the coating process, the prepared coating has higher hardness and lower friction coefficient, the binding force between the coating and the substrate is good, and the deposition rate is high.
Description
Technical Field
The invention belongs to the technical field of material surface modification, and particularly relates to a coating treatment method for preparing a Ti-Mo-N lubricating coating.
Background
With the introduction of the concept of light weight, more and more lightweight high-strength materials are applied to the design of parts, such as aluminum alloy, titanium alloy, and ultra-high-strength steel. Such a material has a high work hardening rate and is very worn on a tool during machining, and is also called a difficult-to-machine material. In the processing of such materials, it is required that the processing tool must have a certain processing ability, i.e. a high hardness, while also ensuring good frictional properties, so as to increase the service life of the processing tool. Therefore, the development of the hard coating with high hardness and low friction coefficient is an effective way for solving the problem of difficult processing of the difficult-to-process material.
In hard coating systems, the hardness of the transition metal nitride coating is relatively high. Among them, TiN coating is the most used of transition metal nitride hard coatings, and its excellent appearance, high hardness, good toughness and high film-based bonding force make the coating widely used in the fields of cutting tools, medical instruments, etc. The hardness of the coating can be significantly increased by the addition of other elements, such as Al, Si, Cr. However, such TiN-based coatings have a high coefficient of friction (0.6 to 1.0) and exhibit poor frictional properties. The Ti-Mo-N coating prepared by adding Mo element on the basis of TiN has higher hardness (30-40Gpa) and lower friction coefficient (about 0.4), so the Ti-Mo-N coating has wider application prospect.
According to the report of relevant documents, the Ti-Mo-N coating is mostly prepared by adopting a magnetron sputtering technology at present, the coating has high hardness, but the deposition rate is low (about 0.0125 mu m/min), the production cost is not reduced, the industrial production of the Ti-Mo-N coating is hindered, the binding force of the magnetron sputtering Ti-Mo-N coating is poor, and the binding force is about 60N under the condition that Ti is used as a priming layer, so that the application scene of the coating is greatly limited. Therefore, on the premise of ensuring that the coating has higher hardness and lower friction coefficient, the improvement of the deposition efficiency and the bonding force of the coating is the main target of the system development.
Disclosure of Invention
Aiming at the defects and shortcomings of the prior art, the invention aims to provide a coating treatment method for preparing a Ti-Mo-N lubricating coating.
The purpose of the invention is realized by the following technical scheme:
a coating treatment method for preparing a Ti-Mo-N lubricating coating comprises the following steps:
(1) carrying out ultrasonic cleaning and drying on a base material, clamping the base material on a planet carrier, and placing the base material in a coating chamber of an arc ion coating machine;
(2) vacuumizing the coating chamber to 8 x 10-3Pa below;
(3) opening the planet carrier to rotate, heating the coating chamber and the substrate material to remove gas, preserving heat, vacuumizing again to 8 x 10-3Pa below;
(4) argon is introduced, negative bias is applied to the base material and the planet carrier, and glow discharge is adopted to clean the base material;
(5) reducing the argon pressure, igniting a Cr target cathode evaporation source, and carrying out sputtering cleaning on the base material by using the cations of the evaporation source;
(6) closing the Cr target cathode evaporation source, stopping introducing argon, adjusting the negative bias, introducing nitrogen to 1.2Pa or 1.8Pa, igniting the Ti-Mo alloy target cathode evaporation source, wherein the Mo atom proportion of the Ti-Mo alloy target is 8%, performing film deposition preparation under the condition of target current 105A, and after the film coating is finished, cooling the chamber and taking out the material.
Further, in the step (1), the matrix material was YG6X, and the surface roughness was 0.05 μm.
Further, the ultrasonic cleaning in the step (1) is to put the sample into an ethanol solution for cleaning for 15 min.
Further, in the step (2), the inside of the coating chamber is vacuumized to 8 x 10-3Pa comprises the following specific steps: firstly, using rotary vane pump and Roots pump to make vacuum pumping to below 2.5Pa, then using diffusion pump to make vacuum pumping to 8X 10-3Pa or less.
Further, the rotating speed of the planet carrier in the step (3) is 10rpm, and the heat preservation refers to maintaining the temperature of the cavity at 250 ℃.
Further, the pressure of the argon introduced in the step (4) is 2.8 Pa; the negative bias voltage is-700V.
Further, the argon gas pressure in the step (5) is reduced to 0.5 Pa; target current 70A of the Cr target cathode evaporation source.
Further, the negative bias is adjusted to-100V in the step (6).
Further, the time for preparing the film by deposition in the step (6) is 1 h.
Further, the cooling in the step (6) means natural cooling to 100 ℃ or below.
The principle of the invention is as follows: the arc ion plating technology is characterized in that the ionization rate is high, and the method can solve the problem of low deposition efficiency of the Ti-Mo-N coating as long as the process parameters in the film plating process are reasonably set. The binding force of the coating depends on the matrix pretreatment process and the coating process before coating, and if the matrix pretreatment process is properly designed and matched with reasonable process parameters in the coating process, the defect of poor binding force of the Ti-Mo-N coating can be overcome.
The method of the invention has the following advantages and beneficial effects:
(1) the high-quality Ti-Mo alloy target (Mo atom accounts for 8%) is used as a target material, reasonable nitrogen gas pressure (1.2Pa and 1.8Pa) and target current (105A) are matched, high ionization rate in the film coating process is guaranteed, deposition efficiency is obviously improved, the coating thickness is 1.906 mu m and 1.894 mu m under the condition of 1h of film coating time, and the deposition rate is 0.0318 mu m/min and 0.0316 mu m/min respectively.
(2) Before coating, the substrate is cleaned by argon glow and Cr ions respectively, and reasonable coating process parameters are matched, so that the coating has excellent binding force (> 100N).
Drawings
FIG. 1 is a nano-indentation graph of the Ti-Mo-N coating obtained in example 1.
FIG. 2 is a graph of the scratch surface topography of the Ti-Mo-N coating obtained in example 1.
FIG. 3 is a graph of the coefficient of friction of the Ti-Mo-N coating obtained in example 1 as a function of time.
FIG. 4 is a graph of ball-crater test of the Ti-Mo-N coating obtained in example 1.
FIG. 5 is a nano-indentation graph of the Ti-Mo-N coating obtained in example 2.
FIG. 6 is a graph of the scratch surface topography of the Ti-Mo-N coating obtained in example 2.
FIG. 7 is a graph of the coefficient of friction of the Ti-Mo-N coating obtained in example 2 as a function of time.
FIG. 8 is a graph of ball-crater test of the Ti-Mo-N coating obtained in example 2.
Detailed Description
The present invention will be described in further detail with reference to examples and drawings, but the present invention is not limited thereto.
Example 1
(1) YG6X hard alloy (surface roughness 0.05 μm) was put into ethanol for ultrasonic cleaning for 5 minutes, dried and then put into new ethanol for ultrasonic cleaning for 10 minutes, clamped on a planet carrier after dried and placed in a coating chamber of an arc ion coating machine.
(2) And starting the mechanical pump, connecting the gas path to the diffusion pump, starting a resistance wire heating switch of the diffusion pump, and continuously heating the pump oil in the diffusion pump until the oil temperature of the diffusion pump reaches 180 ℃. Switching gas path to film coating chamber, vacuumizing with rotary vane pump, starting Roots pump when the pressure in the chamber is reduced to 100Pa until the pressure is reduced to below 2.5Pa, starting diffusion pump, and vacuumizing to 8 × 10-3Pa or less.
(3) Maintaining the air pressure in the cavity at 8 x 10-3Below Pa, turning on the planet carrier to rotate at a speed of 10rpm, turning on resistance heating, heating the chamber and the sample to remove residual gas, maintaining the temperature after the temperature of the chamber reaches 250 deg.C, and vacuumizing to 8 × 10-3Pa or less.
(4) Argon is introduced, the pressure of the argon is 2.8Pa, negative bias of-700V is applied to the substrate material, and sputtering cleaning is carried out on the surface of the substrate by glow discharge.
(5) The argon gas pressure was reduced to 0.5Pa, the Cr target was ignited, the target current was set to 70A, and the substrate was sputter-cleaned with the evaporation source cations.
(6) Closing the Cr target, stopping introducing argon, adjusting the negative bias to-100V, introducing nitrogen, igniting the Ti-Mo target (Mo atom accounts for 8%), setting the target current to be 105A, keeping the nitrogen gas pressure at 1.2Pa, and depositing the film for 1 h. And after the film coating is finished, taking out the sample after the temperature of the chamber is cooled to be below 100 ℃.
The hardness of the prepared coating reaches 32.09GP, and a nano indentation curve is shown in figure 1; the coating has good bonding force, the bonding force is more than 100N, and the surface appearance of scratches is shown in figure 2; coating with Si3N4The grinding ball was rubbed with an average friction coefficient (0-60 min) of 0.283, the time course of the friction coefficient is shown in FIG. 3; the coating thickness was 1.906 μm and the ball crater test of the coating is shown in FIG. 4.
Example 2
(1) YG6X hard alloy (surface roughness 0.05 μm) was put into ethanol for ultrasonic cleaning for 5 minutes, dried and then put into new ethanol for ultrasonic cleaning for 10 minutes, clamped on a planet carrier after dried and placed in a coating chamber of an arc ion coating machine.
(2) And starting the mechanical pump, connecting the gas path to the diffusion pump, starting a resistance wire heating switch of the diffusion pump, and continuously heating the pump oil in the diffusion pump until the oil temperature of the diffusion pump reaches 180 ℃. Switching gas path to film coating chamber, vacuumizing with rotary vane pump, starting Roots pump when the pressure in the chamber is reduced to 100Pa until the pressure is reduced to below 2.5Pa, starting diffusion pump, and vacuumizing to 8 × 10-3Pa or less.
(3) Maintaining the air pressure in the cavity at 8 x 10-3Below Pa, turning on the planet carrier to rotate at a speed of 10rpm, turning on resistance heating, heating the chamber and the sample to remove residual gas, maintaining the temperature after the temperature of the chamber reaches 250 deg.C, and vacuumizing to 8 × 10-3Pa or less.
(4) Argon is introduced, the pressure of the argon is 2.8Pa, negative bias of-700V is applied to the substrate material, and sputtering cleaning is carried out on the surface of the substrate by glow discharge.
(5) The argon gas pressure was reduced to 0.5Pa, the Cr target was ignited, the target current was set to 70A, and the substrate was sputter-cleaned with the evaporation source cations.
(6) Closing the Cr target, stopping introducing the argon, adjusting the negative bias to 100V, introducing nitrogen, igniting the Ti-Mo target (Mo atom accounts for 8%), setting the target current to be 105A, and keeping the nitrogen gas pressure at 1.8Pa to deposit the film. And after the film coating is finished, taking out the sample after the temperature of the chamber is cooled to be below 100 ℃.
The hardness of the prepared coating reaches 32.62GP, and a nano indentation curve is shown in figure 5; the coating has good bonding force, the bonding force is more than 100N, and the surface appearance of scratches is shown in figure 6; coating with Si3N4The balls were rubbed with an average coefficient of friction (0-60 minutes) of 0.276, the coefficient of friction versus time curve being shown in FIG. 7; the coating thickness was 1.894 μm, and the ball crater test of the coating is shown in FIG. 8.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such changes, modifications, substitutions, combinations, and simplifications are intended to be included in the scope of the present invention.
Claims (10)
1. A coating treatment method for preparing a Ti-Mo-N lubricating coating is characterized by comprising the following steps:
(1) carrying out ultrasonic cleaning and drying on a base material, clamping the base material on a planet carrier, and placing the base material in a coating chamber of an arc ion coating machine;
(2) vacuumizing the coating chamber to 8 x 10-3Pa below;
(3) opening the planet carrier to rotate, heating the coating chamber and the substrate material to remove gas, preserving heat, vacuumizing again to 8 x 10-3Pa below;
(4) argon is introduced, negative bias is applied to the base material and the planet carrier, and glow discharge is adopted to clean the base material;
(5) reducing the argon pressure, igniting a Cr target cathode evaporation source, and carrying out sputtering cleaning on the base material by using the cations of the evaporation source;
(6) closing the Cr target cathode evaporation source, stopping introducing argon, adjusting the negative bias, introducing nitrogen to 1.2Pa or 1.8Pa, igniting the Ti-Mo alloy target cathode evaporation source, wherein the Mo atom proportion of the Ti-Mo alloy target is 8%, performing film deposition preparation under the condition of target current 105A, and after the film coating is finished, cooling the chamber and taking out the material.
2. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: in the step (1), the matrix material is YG6X, and the surface roughness is 0.05 μm.
3. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: the ultrasonic cleaning is to put the sample into ethanol solution for cleaning for 15 min.
4. The coating process of claim 1, wherein the vacuum in the coating chamber is reduced to 8 x 10 in step (2)-3Pa comprises the following specific steps: firstly, using rotary vane pump and Roots pump to make vacuum pumping to below 2.5Pa, then using diffusion pump to make vacuum pumping to 8X 10-3Pa or less.
5. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: in the step (3), the rotating speed of the planet carrier is 10rpm, and the heat preservation refers to maintaining the temperature of the cavity at 250 ℃.
6. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: the pressure of the argon introduced in the step (4) is 2.8 Pa; the negative bias voltage is-700V.
7. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: reducing the argon pressure to 0.5Pa in the step (5); target current 70A of the Cr target cathode evaporation source.
8. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: and (6) adjusting the negative bias to-100V.
9. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: the time for depositing and preparing the film in the step (6) is 1 h.
10. The plating treatment method for preparing a Ti-Mo-N lubricating coating according to claim 1, wherein: the cooling in the step (6) means natural cooling to 100 ℃ or below.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112410728A (en) * | 2020-12-14 | 2021-02-26 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | High Cr content CrB2Preparation process of-Cr coating |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009025112A1 (en) * | 2007-08-22 | 2009-02-26 | Sumitomo Electric Industries, Ltd. | Surface-coated cutting tool |
| JP2009287063A (en) * | 2008-05-28 | 2009-12-10 | Hokunetsu:Kk | Protective film for die surface |
| CN202273799U (en) * | 2011-09-23 | 2012-06-13 | 深圳市先力得热处理有限公司 | Automobile |
| CN108884553A (en) * | 2016-03-29 | 2018-11-23 | 大同特殊钢株式会社 | Titanium alloy overlay film and titanium alloy target |
-
2019
- 2019-12-09 CN CN201911250715.1A patent/CN110938803A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009025112A1 (en) * | 2007-08-22 | 2009-02-26 | Sumitomo Electric Industries, Ltd. | Surface-coated cutting tool |
| JP2009287063A (en) * | 2008-05-28 | 2009-12-10 | Hokunetsu:Kk | Protective film for die surface |
| CN202273799U (en) * | 2011-09-23 | 2012-06-13 | 深圳市先力得热处理有限公司 | Automobile |
| CN108884553A (en) * | 2016-03-29 | 2018-11-23 | 大同特殊钢株式会社 | Titanium alloy overlay film and titanium alloy target |
Non-Patent Citations (3)
| Title |
|---|
| 张钧等: "《多弧离子镀技术与应用》", 31 December 2007, 冶金工业出版社 * |
| 胡传炘: "《表面处理手册》", 31 March 2004, 北京工业大学出版社 * |
| 范玉殿: "《电子束与离子束加工》", 30 June 1989, 机械工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112410728A (en) * | 2020-12-14 | 2021-02-26 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | High Cr content CrB2Preparation process of-Cr coating |
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Application publication date: 20200331 |