CN109930106B - Preparation method of TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance - Google Patents
Preparation method of TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance Download PDFInfo
- Publication number
- CN109930106B CN109930106B CN201910379626.0A CN201910379626A CN109930106B CN 109930106 B CN109930106 B CN 109930106B CN 201910379626 A CN201910379626 A CN 201910379626A CN 109930106 B CN109930106 B CN 109930106B
- Authority
- CN
- China
- Prior art keywords
- coating
- tialsi
- tialsin
- substrate
- wear resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
A preparation method of a TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance relates to a preparation method of a TiAlSiN coating. The invention aims to solve the technical problem that the existing TiAlSiN coating is poor in wear resistance. The preparation method of the TiAlSi/TiAlSiN multilayer alternating coating provided by the invention uses a TiAlSi alloy cathode target material, and changes of coating components are realized by changing introduced nitrogen, so that the multilayer alternating coating is prepared, and the industrial applicability of the coating is improved. Because the hardness of the TiAlSi alloy is lower and the hardness of the TiAlSiN coating is higher, the soft-hard alternating coating prepared by the method can well relieve the stress of the coating, improve the plasticity and toughness of the coating and improve the wear resistance of the coating, and has great significance for prolonging the service life of the cutter coating.
Description
Technical Field
The invention relates to a preparation method of a TiAlSiN coating.
Background
The TiAlSiN coating is used as a hard alloy coating, has important application prospect in the field of hard coatings due to high hardness and high wear resistance, can remarkably improve the service life and cutting capacity of a coated cutter, greatly improves the industrial production efficiency, and promotes the development process of manufacturing industry. However, the high hardness of the coating causes the coating to have poor toughness, the coating has poor bonding performance with a base material, abrasion is easy to generate during processing and manufacturing, and the abrasion resistance is poor, so that the service life of the cutter is influenced. The wear resistance is an important performance index of the cutter coating material, and the improvement of the wear resistance of the coating plays an important role in improving the applicability of the coating.
The common methods for improving the wear resistance of the coating mainly include: adding a lubricating phase to reduce the friction coefficient of the material; preparing a transition layer in advance to improve the film-substrate bonding performance; multilayer coatings are prepared to improve the ductility of the coating material. For the TiAlSiN coating, most of the current researches are to improve the film-substrate bonding performance of the coating and the substrate by plating a layer of TiN, TiAlN or TiSiN on the surface of the substrate, mainly realize the transition of the coating components by changing the cathode material components, and the coating preparation process is relatively complex.
Disclosure of Invention
The invention provides a preparation method of a TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance, aiming at solving the technical problem of poor wear resistance of the existing TiAlSiN coating.
The preparation method of the TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance is carried out according to the following steps:
firstly, cleaning a substrate and mounting the substrate: using YG8 hard alloy as a coating substrate, polishing the surface of the substrate to a mirror surface, and then sequentially ultrasonically cleaning the substrate for 10-15 min by using acetone and alcohol respectively; selecting plasma immersion ion injection and deposition equipment as coating equipment, wherein the plasma immersion ion injection and deposition equipment is provided with a 45-degree magnetic filtering bent pipe and an arc source system; mounting the cleaned substrate on a target table of plasma immersion ion injection and deposition equipment, and facing an outlet of a 45-degree magnetic filtration bent pipe, and mounting the TiAlSi alloy cathode target material in an arc source system;
secondly, sputtering and cleaning the substrate, namely vacuumizing the vacuum chamber to the air pressure of 6 × 10 by using a mechanical pump and a molecular pump-3Pa～7×10-3Pa, introducing argon gas of 50 sccm-55 sccm, and controlling the air pressure of the vacuum chamber to be 0.5 Pa-0.55 Pa by using a molecular pump; ionizing argon by using a radio frequency power supply, adding a voltage of 6kV to 6.5kV between the substrate and the wall of the vacuum chamber, carrying out sputtering cleaning on the substrate to ensure that the surface of the substrate is clean, wherein the frequency is 100Hz to 110Hz, and the pulse width is 60 mu s to 65 mu s, and the sputtering cleaning time is 30min to 35 min;
thirdly, after the sputtering cleaning is finished, closing the radio frequency power supply, stopping introducing argon, introducing 50-55 sccm nitrogen, and controlling the air pressure of the vacuum chamber to be kept at 0.3-0.35 Pa by a molecular pump;
② stopping introducing nitrogen, and reducing the pressure to 8 × 10-3Pa～1.2×10-2Pa, 15 kV-16 kV voltage is applied between the substrate and the wall of the vacuum chamber, the frequency is 100 Hz-110 Hz, the pulse width is 60 mus-65 mus, an arc source system is started, the arc starting mode is contact arc starting, the cathode arc is burnt, the arc current is adjusted to 45A-55A, the arc voltage is 20V-30V, 10V-20V bias voltage is applied on a 45-degree magnetic filtration bent pipe, and the outer wall of the 45-degree magnetic filtration bent pipe is provided with a 45-degree magnetic filtration bent pipeApplying a magnetic field of 2A-3A, coating for 2 min-3 min, wherein the application of bias voltage and the magnetic field is to lead out plasma better, the plasma formed by arc combustion is led out from the bent pipe, and is accelerated by an electric field to act on a substrate to prepare a TiAlSi coating;
thirdly, introducing 50 sccm-55 sccm nitrogen, adding 15 kV-16 kV voltage between the substrate and the wall of the vacuum chamber, controlling the frequency to be 100 Hz-110 Hz, the pulse width to be 60 mus-65 mus, adjusting the arc current to be 45A-55A, controlling the arc voltage to be 20V-30V, applying 10V-20V bias voltage on the 45-degree magnetic filtering bent pipe, applying 2A-3A magnetic field on the outer wall of the 45-degree magnetic filtering bent pipe, and coating for 4 min-5 min to prepare a TiAlSiN coating;
fourthly, the process of the third step and the third step is repeated for total film coating of 60-65 min, and the TiAlSi/TiAlSiN multilayer alternating coating is obtained on the substrate.
The preparation method of the TiAlSi/TiAlSiN multilayer alternating coating provided by the invention uses a TiAlSi alloy cathode target material, and changes of coating components are realized by changing introduced nitrogen, so that the multilayer alternating coating is prepared, and the industrial applicability of the coating is improved. When the TiAlSi alloy cathode target material is subjected to arc starting discharge in the atmosphere of nitrogen, the nitrogen is used as active gas to participate in reaction, and a TiAlSiN coating is prepared; when gas is not introduced, the TiAlSiN coating (approximately considered as a TiAlSi coating) with low N content is prepared due to the fact that the air pressure value in the vacuum chamber is low, the vacuum degree is high, and the gas content is extremely low. Because the hardness of the TiAlSi alloy is low (3500HK, microhardness tester) and the hardness of the TiAlSiN coating is high (41GPa, nano indentation tester), the soft-hard alternating coating prepared by the method can well relieve the stress of the coating, improve the plasticity and toughness of the coating and improve the wear resistance of the coating, and has great significance for prolonging the service life of the cutter coating.
The reason that the substrate is plated with TiAlSi firstly and then with TiAlSiN is as follows: the hardness of TiAlSiN is high, the hardness of TiAlSi is low, the hardness of YG8 hard alloy is very close to that of TiAlSi, a layer of TiAlSi is firstly made on a YG8 hard alloy substrate, the hardness difference between the TiAlSi and the TiAlSi is small, the generated stress is relatively small, and the improvement of the bonding strength between the coating and the substrate is facilitated.
The invention uses plasma immersion ion injection and deposition equipment, TiAlSi alloy as a cathode target material, uses a direct current arc source to generate arc plasma, uses a 45-degree magnetic filtering elbow to filter large particles generated in the arc combustion process, and installs a substrate material at the outlet of the elbow.
The invention has the beneficial effects that:
the invention changes the introduction atmosphere (introducing N)2Or otherwise disable N2) The TiAlSi/TiAlSiN multilayer alternating coating can be prepared, and the wear resistance of the coating is obviously improved. Compared with a single TiAlSiN coating, the wear resistance is improved by more than 3 times.
Drawings
FIG. 1 is a schematic view of a TiAlSi/TiAlSiN multilayer alternating coating prepared according to a first embodiment, wherein 1 is a coating substrate, 2 is a TiAlSi coating, and 3 is a TiAlSiN coating;
fig. 2 is a schematic diagram of a plasma immersion ion implantation and deposition apparatus described in step one of the first embodiment, where 4 is a vacuum chamber, 5 is a 45 ° magnetic filter bend, 6 is an arc source system, 7 is a coating sample, and 8 is a target table;
FIG. 3 is a friction wear path optical mirror image of a TiAlSiN coating prepared in test two;
FIG. 4 is a friction wear path optical mirror image of a TiAlSiN coating prepared in test two;
FIG. 5 is a graphical representation of the frictional wear path of a TiAlSi/TiAlSiN coating prepared in a test;
FIG. 6 is a graphical representation of the frictional wear path of a TiAlSi/TiAlSiN coating prepared in a test.
Detailed Description
The first embodiment is as follows: the embodiment is a preparation method of a TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance, which is specifically carried out according to the following steps:
firstly, cleaning a substrate and mounting the substrate: using YG8 hard alloy as a coating substrate, polishing the surface of the substrate to a mirror surface, and then sequentially ultrasonically cleaning the substrate for 10-15 min by using acetone and alcohol respectively; selecting plasma immersion ion injection and deposition equipment as coating equipment, wherein the plasma immersion ion injection and deposition equipment is provided with a 45-degree magnetic filtering bent pipe and an arc source system; mounting the cleaned substrate on a target table of plasma injection and deposition equipment, and facing the outlet of the 45-degree magnetic filtration elbow, and mounting the TiAlSi alloy cathode target material in an arc source system;
secondly, sputtering and cleaning the substrate, namely vacuumizing the vacuum chamber to the air pressure of 6 × 10 by using a mechanical pump and a molecular pump-3Pa～7×10-3Pa, introducing argon gas of 50 sccm-55 sccm, and controlling the air pressure of the vacuum chamber to be 0.5 Pa-0.55 Pa by using a molecular pump; ionizing argon by using a radio frequency power supply, adding a voltage of 6kV to 6.5kV between the substrate and the wall of the vacuum chamber, carrying out sputtering cleaning on the substrate to ensure that the surface of the substrate is clean, wherein the frequency is 100Hz to 110Hz, and the pulse width is 60 mu s to 65 mu s, and the sputtering cleaning time is 30min to 35 min;
thirdly, after the sputtering cleaning is finished, closing the radio frequency power supply, stopping introducing argon, introducing 50-55 sccm nitrogen, and controlling the air pressure of the vacuum chamber to be kept at 0.3-0.35 Pa by a molecular pump;
② stopping introducing nitrogen, and reducing the pressure to 8 × 10-3Pa～1.2×10-2Pa, adding 15 kV-16 kV voltage between a substrate and the wall of a vacuum chamber, the frequency is 100 Hz-110 Hz, the pulse width is 60 mus-65 mus, starting an arc source system, carrying out contact arcing in an arcing mode, enabling a cathode to burn, adjusting the arc current to be 45A-55A, enabling the arc voltage to be 20V-30V, applying 10V-20V bias voltage on a 45-degree magnetic filtering bent pipe, applying 2A-3A magnetic field on the outer wall of the 45-degree magnetic filtering bent pipe, and coating for 2 min-3 min, wherein the bias voltage and the magnetic field are applied to lead out plasma better, the plasma formed by arc burning is led out from the bent pipe, and is accelerated to act on the substrate through the electric field to prepare a TiAlSi coating;
thirdly, introducing 50 sccm-55 sccm nitrogen, adding 15 kV-16 kV voltage between the substrate and the wall of the vacuum chamber, controlling the frequency to be 100 Hz-110 Hz, the pulse width to be 60 mus-65 mus, adjusting the arc current to be 45A-55A, controlling the arc voltage to be 20V-30V, applying 10V-20V bias voltage on the 45-degree magnetic filtering bent pipe, applying 2A-3A magnetic field on the outer wall of the 45-degree magnetic filtering bent pipe, and coating for 4 min-5 min to prepare a TiAlSiN coating;
fourthly, the process of the third step and the third step is repeated for total film coating of 60-65 min, and the TiAlSi/TiAlSiN multilayer alternating coating is obtained on the substrate.
The second embodiment is as follows: the first difference between the present embodiment and the specific embodiment is: polishing the surface of the substrate to a mirror surface in the first step, and then sequentially ultrasonically cleaning the substrate for 10min by using acetone and alcohol respectively. The rest is the same as the first embodiment.
The third concrete implementation mode: the present embodiment differs from the first or second embodiment in that: the TiAlSi alloy cathode target material in the step one is prepared by water-cooled copper crucible smelting equipment. The others are the same as in the first or second embodiment.
Fourth embodiment unlike the first to third embodiments, the vacuum chamber is evacuated to a pressure of 6 × 10 using a mechanical pump and a molecular pump in the second embodiment-3Pa, introducing 50sccm of argon, and controlling the air pressure of the vacuum chamber to be kept at 0.5Pa by a molecular pump; and (3) ionizing the argon by using a radio frequency power supply, applying a voltage of 6kV between the substrate and the wall of the vacuum chamber, wherein the frequency is 100Hz, the pulse width is 60 mu s, and carrying out sputtering cleaning on the substrate to ensure that the surface of the substrate is clean, wherein the sputtering cleaning time is 30 min. The rest is the same as one of the first to third embodiments.
The fifth concrete implementation mode: the fourth difference between this embodiment and the specific embodiment is that: and in the third step, the process of the third step and the third step is repeated for coating for 60min in total, and a TiAlSi/TiAlSiN multilayer alternating coating is obtained on the substrate. The rest is the same as the fourth embodiment.
The invention was verified with the following tests:
test one: the test is a preparation method of a TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance, and the preparation method is specifically carried out according to the following steps:
firstly, cleaning a substrate and mounting the substrate: using YG8 hard alloy as a coating substrate, polishing the surface of the substrate to a mirror surface, and then sequentially ultrasonically cleaning the substrate for 10min by using acetone and alcohol respectively; selecting plasma immersion ion injection and deposition equipment as coating equipment, wherein the plasma immersion ion injection and deposition equipment is provided with a 45-degree magnetic filtering bent pipe and an arc source system; mounting the cleaned substrate on a target table of plasma immersion ion injection and deposition equipment, and facing an outlet of a 45-degree magnetic filtration bent pipe, and mounting the TiAlSi alloy cathode target material in an arc source system;
secondly, sputtering and cleaning the substrate, namely vacuumizing the vacuum chamber to the air pressure of 6 × 10 by using a mechanical pump and a molecular pump-3Pa, introducing 50sccm of argon, and controlling the air pressure of the vacuum chamber to be kept at 0.5Pa by a molecular pump; ionizing argon by using a radio frequency power supply, adding 6kV voltage between the substrate and the wall of a vacuum chamber, wherein the frequency is 100Hz, the pulse width is 60 mu s, and carrying out sputtering cleaning on the substrate to ensure that the surface of the substrate is clean, and the sputtering cleaning time is 30 min;
thirdly, after the sputtering cleaning is finished, closing the radio frequency power supply, stopping introducing argon, introducing 50sccm nitrogen, and controlling the air pressure of the vacuum chamber to be kept at 0.3Pa by using a molecular pump;
② stopping introducing nitrogen, and reducing the air pressure to 10-2Pa, adding 15kV voltage between a substrate and the wall of a vacuum chamber, controlling the frequency to be 100Hz and the pulse width to be 60 mus, starting an arc source system, wherein the arc starting mode is contact arc starting to enable cathode arc to burn, regulating the arc current to be 50A and the arc voltage to be 25V, applying 15V bias voltage on a 45-degree magnetic filtration elbow, applying 2A magnetic field on the outer wall of the 45-degree magnetic filtration elbow, coating for 2min, applying the bias voltage and the magnetic field to enable plasma to be better led out, leading out the plasma formed by arc combustion from the elbow, and acting the plasma on the substrate through the acceleration of an electric field to prepare a TiAlSi coating;
thirdly, introducing 50sccm nitrogen, applying 15kV voltage between the substrate and the wall of the vacuum chamber, the frequency is 100Hz, the pulse width is 60 mus, starting an arc source system, adjusting the arc current to be 50A, the arc voltage to be 25V, applying 15V bias voltage on the 45-degree magnetic filtering bent pipe, applying 2A magnetic field on the outer wall of the 45-degree magnetic filtering bent pipe, and coating for 4min to prepare a TiAlSiN coating;
fourthly, the process of the third step and the third step is repeated for coating for 60min totally, and the TiAlSi/TiAlSiN multilayer alternating coating is obtained on the substrate.
And (2) test II: the test is a preparation method of a TiAlSiN coating, and the specific steps are different from the first test: and step three, introducing nitrogen all the time, and finally obtaining the TiAlSiN coating on the substrate. The rest is the same as test one.
The friction and wear performance of the coating is tested by using an HT-1000 type multifunctional friction and wear testing machine, and the testing parameters are as follows: for a GCr15 steel ball with the grinding ball diameter of 6.35mm, the load is 150g, the rotating speed is 600r/min, and the friction radius is 2 mm. The frictional wear performance of the TiAlSi/TiAlSiN multilayer alternating coating prepared in the first test and the TiAlSiN multilayer alternating coating prepared in the second test are respectively tested and compared, as shown in FIGS. 3-6, the TiAlSiN coating prepared in the second test is shown in FIGS. 3 and 4, and the TiAlSi/TiAlSiN multilayer alternating coating prepared in the first test is shown in FIGS. 5 and 6, it is found that the TiAlSiN coating is damaged after being ground for 30min, the surface of the coating is exposed out of a matrix, and the surface of the coating is still not damaged after the TiAlSi/TiAlSiN multilayer alternating coating is ground for 90min, which shows that the wear resistance of the TiAlSi/TiAlSiN multilayer alternating coating prepared by the method is greatly improved, and compared with the TiAlSiN coating, the wear resistance.
Claims (5)
1. A preparation method of a TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance is characterized in that the preparation method of the TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance is carried out according to the following steps:
firstly, cleaning a substrate and mounting the substrate: using YG8 hard alloy as a coating substrate, polishing the surface of the coating substrate to a mirror surface, and then sequentially ultrasonically cleaning the coating substrate by using acetone and alcohol for 10-15 min respectively; selecting plasma immersion ion injection and deposition equipment as coating equipment, wherein the plasma immersion ion injection and deposition equipment is provided with a 45-degree magnetic filtering bent pipe and an arc source system; installing the cleaned coated substrate on a target table of plasma immersion ion injection and deposition equipment, and facing an outlet of a 45-degree magnetic filtration bent pipe, and installing a TiAlSi alloy cathode target material in an arc source system;
second, sputtering cleaning baseVacuum chamber was evacuated to 6 × 10 pressure using mechanical and molecular pumps-3Pa～7×10- 3Pa, introducing argon gas of 50 sccm-55 sccm, and controlling the air pressure of the vacuum chamber to be 0.5 Pa-0.55 Pa by using a molecular pump; ionizing argon by using a radio frequency power supply, adding a voltage of 6 kV-6.5 kV between the coated substrate and the wall of a vacuum chamber, carrying out sputtering cleaning on the coated substrate to ensure that the surface of the coated substrate is clean, wherein the frequency is 100 Hz-110 Hz, and the pulse width is 60 mus-65 mus, and the sputtering cleaning time is 30 min-35 min;
thirdly, after the sputtering cleaning is finished, closing the radio frequency power supply, stopping introducing argon, introducing 50-55 sccm nitrogen, and controlling the air pressure of the vacuum chamber to be kept at 0.3-0.35 Pa by a molecular pump;
② stopping introducing nitrogen, and reducing the pressure to 8 × 10-3Pa～1.2×10-2Pa, adding 15 kV-16 kV voltage between a coating substrate and the wall of a vacuum chamber, the frequency is 100 Hz-110 Hz, the pulse width is 60 mus-65 mus, starting an arc source system, carrying out contact arcing in an arcing mode to enable a cathode to burn in an arc, adjusting the arc current to be 45A-55A, the arc voltage to be 20V-30V, applying 10V-20V bias voltage on a 45-degree magnetic filtering bent pipe, applying 2A-3A magnetic field on the outer wall of the 45-degree magnetic filtering bent pipe, and coating for 2 min-3 min to obtain a TiAlSi coating;
thirdly, introducing 50 sccm-55 sccm nitrogen, adding 15 kV-16 kV voltage between the coated substrate and the wall of the vacuum chamber, controlling the frequency to be 100 Hz-110 Hz and the pulse width to be 60 mus-65 mus, adjusting the arc current to be 45A-55A and the arc voltage to be 20V-30V, applying 10V-20V bias voltage on a 45-degree magnetic filtration elbow, applying 2A-3A magnetic field on the outer wall of the 45-degree magnetic filtration elbow, and coating for 4 min-5 min to obtain a TiAlSiN coating;
fourthly, the process of the third step and the third step is repeated for total coating for 60 to 65 minutes, and the TiAlSi/TiAlSiN multilayer alternating coating is obtained on the coated substrate.
2. The method for preparing a TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance as claimed in claim 1, wherein in the first step, the surface of the coated substrate is polished to a mirror surface, and then the coated substrate is sequentially cleaned with acetone and alcohol for 10 min.
3. The method for preparing the TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance according to claim 1, wherein the TiAlSi alloy cathode target material in the first step is prepared by water-cooled copper crucible melting equipment.
4. The method for preparing TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance according to claim 1, wherein in step two, the vacuum chamber is evacuated to a pressure of 6 × 10 by using a mechanical pump and a molecular pump-3Pa, introducing 50sccm of argon, and controlling the air pressure of the vacuum chamber to be kept at 0.5Pa by a molecular pump; and (3) ionizing argon by using a radio frequency power supply, applying a voltage of 6kV between the coated substrate and the wall of the vacuum chamber, wherein the frequency is 100Hz, the pulse width is 60 mu s, and carrying out sputtering cleaning on the coated substrate to ensure that the surface of the substrate is clean, wherein the sputtering cleaning time is 30 min.
5. The method for preparing the TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance as claimed in claim 1, wherein the process of repeating the third step and the third step in the third step is repeated for 60min in total, so as to obtain the TiAlSi/TiAlSiN multilayer alternating coating on the coated substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910379626.0A CN109930106B (en) | 2019-05-08 | 2019-05-08 | Preparation method of TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910379626.0A CN109930106B (en) | 2019-05-08 | 2019-05-08 | Preparation method of TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109930106A CN109930106A (en) | 2019-06-25 |
| CN109930106B true CN109930106B (en) | 2020-10-13 |
Family
ID=66991396
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910379626.0A Active CN109930106B (en) | 2019-05-08 | 2019-05-08 | Preparation method of TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109930106B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113061844B (en) * | 2021-03-19 | 2023-05-12 | 安徽纯源镀膜科技有限公司 | Preparation process of superhard high-temperature-resistant Ta-C coating |
| CN113201724B (en) * | 2021-04-25 | 2022-12-13 | 赣州澳克泰工具技术有限公司 | Coated cutting tool and method of making same |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100659743B1 (en) * | 2005-04-16 | 2006-12-20 | 울산대학교 산학협력단 | DEPOSITION OF SUPER HARD TiAlSiN THIN FILMS BY CATHODIC ARC PLASMA DEPOSITION |
| CN103757597B (en) * | 2014-02-07 | 2016-03-23 | 上海理工大学 | A kind of TiN/CrAlSiN nanocomposite laminated coating and preparation method thereof |
| CN107190233A (en) * | 2016-05-25 | 2017-09-22 | 上海仟纳真空镀膜科技有限公司 | A kind of preparation technology of the Si dopen Nano composite coatings with ultrahigh hardness |
| CN106702331B (en) * | 2016-12-07 | 2018-03-02 | 广东工业大学 | A kind of high-temperature wearable CrAlSiON base nano-composite coatings and its preparation method and application |
| CN108690983B (en) * | 2017-04-10 | 2020-07-28 | 中国科学院宁波材料技术与工程研究所 | Wear-resistant corrosion-resistant Cr/CrAlSiN composite coating, and preparation method and application thereof |
| CN108977775B (en) * | 2018-07-18 | 2020-11-03 | 南京理工大学 | TiAlSiN coating cutter preparation process |
| CN108866491A (en) * | 2018-07-24 | 2018-11-23 | 山东大学 | TiAlN/CrAlSiN nanocomposite laminated coating and preparation method thereof |
-
2019
- 2019-05-08 CN CN201910379626.0A patent/CN109930106B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109930106A (en) | 2019-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102994967B (en) | Ultra high speed preparation method for ultra thick diamond-like coating | |
| CN109930106B (en) | Preparation method of TiAlSi/TiAlSiN multilayer alternating coating with high wear resistance | |
| CN111101101B (en) | Method for reducing friction coefficient of coating through micro-sandblasting post-treatment | |
| KR101860292B1 (en) | Method for producing coated tool | |
| RU2409703C1 (en) | Procedure for vacuum application of coating on items out of electric conducting materials and dielectrics | |
| CN108531905A (en) | A kind of high-performance diamond-like composite coating and preparation method thereof | |
| CN111378947B (en) | Preparation method of diamond-like thin film | |
| CN1548578A (en) | Prepn of heat shock resisting heat barrier coating | |
| CN108611590B (en) | Method for preventing Ti alloy workpiece from being seized | |
| CN111485208B (en) | Preparation method of lubricating coating of air-floating motor | |
| CN110129733B (en) | Sintered neodymium-iron-boron magnet with composite film layer and preparation method thereof | |
| CN110777341B (en) | DLC/CNx/MeN/CNx nano multilayer film and preparation method thereof | |
| CN108359938B (en) | Preparation method of super-thick diamond-like carbon film coating on surface of piston ring | |
| CN118234886A (en) | Method for forming hard and ultra-smooth a-C by sputtering | |
| CN113151797B (en) | Ion cleaning process based on ta-C film plated on surface of hard alloy | |
| CN109554667B (en) | Wear-resistant Nb-N co-permeation layer on surface of TA15 alloy, and preparation method and application thereof | |
| RU2566232C1 (en) | Method of combined ion-plasma treatment of products out of aluminium alloys | |
| CN110938803A (en) | Coating treatment method for preparing Ti-Mo-N lubricating coating | |
| CN108441832B (en) | Centrifugal pump impeller surface treatment method and equipment | |
| US20120164356A1 (en) | Process for surface treating aluminum or aluminum alloy and article made with same | |
| Sanchette et al. | Single cycle plasma nitriding and hard coating deposition in a cathodic arc evaporation device | |
| KR20120129445A (en) | The method of high wear and oxidation resistant multi-layer coating material process. | |
| CN115505886B (en) | AlCrSiN/AlCrMoSiN nano multilayer composite coating with high hardness and high wear resistance and preparation method thereof | |
| KR100314727B1 (en) | Method of manufacturing aluminum films on small sintered parts | |
| CN112708857B (en) | Coating structure with strain tolerance and wear resistance and method of making the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |