JP5662039B2 - 試料観察方法、試料検査方法、および試料観察装置 - Google Patents

試料観察方法、試料検査方法、および試料観察装置 Download PDF

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JP5662039B2
JP5662039B2 JP2010054436A JP2010054436A JP5662039B2 JP 5662039 B2 JP5662039 B2 JP 5662039B2 JP 2010054436 A JP2010054436 A JP 2010054436A JP 2010054436 A JP2010054436 A JP 2010054436A JP 5662039 B2 JP5662039 B2 JP 5662039B2
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sample
aperture
electrons
mirror
pattern
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JP2010237200A5 (enExample
JP2010237200A (ja
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畠山　雅規
雅規 畠山
渡辺　賢治
賢治 渡辺
内藤　儀彦
儀彦 内藤
村上　武司
武司 村上
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Ebara Corp
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Ebara Corp
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  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2010054436A 2009-03-12 2010-03-11 試料観察方法、試料検査方法、および試料観察装置 Active JP5662039B2 (ja)

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JP2010054436A JP5662039B2 (ja) 2009-03-12 2010-03-11 試料観察方法、試料検査方法、および試料観察装置

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JP2009059206 2009-03-12
JP2009059206 2009-03-12
JP2010054436A JP5662039B2 (ja) 2009-03-12 2010-03-11 試料観察方法、試料検査方法、および試料観察装置

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JP2014246164A Division JP2015062200A (ja) 2009-03-12 2014-12-04 試料観察方法及び試料検査方法

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JP2010237200A JP2010237200A (ja) 2010-10-21
JP2010237200A5 JP2010237200A5 (enExample) 2013-04-11
JP5662039B2 true JP5662039B2 (ja) 2015-01-28

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JP2010054436A Active JP5662039B2 (ja) 2009-03-12 2010-03-11 試料観察方法、試料検査方法、および試料観察装置
JP2014246164A Pending JP2015062200A (ja) 2009-03-12 2014-12-04 試料観察方法及び試料検査方法
JP2016115096A Pending JP2016189335A (ja) 2009-03-12 2016-06-09 試料観察方法及び試料観察装置

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JP2016115096A Pending JP2016189335A (ja) 2009-03-12 2016-06-09 試料観察方法及び試料観察装置

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Families Citing this family (5)

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JP5963453B2 (ja) 2011-03-15 2016-08-03 株式会社荏原製作所 検査装置
JP6294130B2 (ja) * 2014-04-04 2018-03-14 株式会社荏原製作所 検査装置
US10103004B2 (en) * 2015-07-02 2018-10-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics
US11538657B2 (en) 2018-10-19 2022-12-27 Hitachi High-Tech Corporation Alignment system and seal for positional alignment
CN118502306B (zh) * 2024-05-23 2025-01-03 乳山市东方硅胶有限公司 一种硅胶颗粒生产设备控制方法及系统

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* Cited by examiner, † Cited by third party
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US8030A (en) * 1851-04-08 Celia b
JP2003173756A (ja) * 2001-12-05 2003-06-20 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
JP2004363085A (ja) * 2003-05-09 2004-12-24 Ebara Corp 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法
JP2006156134A (ja) * 2004-11-30 2006-06-15 Hitachi Ltd 反射結像型電子顕微鏡
JP4751635B2 (ja) * 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
JP4287850B2 (ja) * 2005-10-14 2009-07-01 株式会社日立ハイテクノロジーズ 荷電粒子ビーム応用装置
JP4825530B2 (ja) * 2006-02-06 2011-11-30 株式会社日立ハイテクノロジーズ パターン欠陥検査方法および装置
JP4870450B2 (ja) * 2006-02-27 2012-02-08 株式会社日立ハイテクノロジーズ 検査装置、および検査方法

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JP2016189335A (ja) 2016-11-04
JP2015062200A (ja) 2015-04-02
JP2010237200A (ja) 2010-10-21

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