JP5648252B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP5648252B2 JP5648252B2 JP2010206094A JP2010206094A JP5648252B2 JP 5648252 B2 JP5648252 B2 JP 5648252B2 JP 2010206094 A JP2010206094 A JP 2010206094A JP 2010206094 A JP2010206094 A JP 2010206094A JP 5648252 B2 JP5648252 B2 JP 5648252B2
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- Japan
- Prior art keywords
- thin film
- crystal
- shows
- semiconductor
- semiconductor device
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Description
2 疑似Ge領域
3 固液界面
4 結晶成長方向
6 ガラス基板
7 Siアイランド
8 ゲート酸化膜
9 ゲートメタル
10 ソース・ドレイン
11 層間絶縁膜
12 コンタクトホール
13 電極
Claims (2)
- シリコン(Si)とゲルマニウム(Ge)を構成成分とする多結晶半導体薄膜からなる半
導体装置において、長さ100ミクロン以上のリボン状の細長い形状を有する結晶粒から
なることを特徴とし、該リボン状結晶粒は相互に同一の(111)方位を有することを特
徴とする半導体装置。 - 各々のリボン状結晶粒は、相互に平行の関係を有する線状疑似Ge領域に挟まれているこ
とを特徴とする請求項1に記載の半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2010206094A JP5648252B2 (ja) | 2010-08-27 | 2010-08-27 | 半導体装置 |
Applications Claiming Priority (1)
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JP2010206094A JP5648252B2 (ja) | 2010-08-27 | 2010-08-27 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012049484A JP2012049484A (ja) | 2012-03-08 |
JP5648252B2 true JP5648252B2 (ja) | 2015-01-07 |
Family
ID=45903983
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010206094A Expired - Fee Related JP5648252B2 (ja) | 2010-08-27 | 2010-08-27 | 半導体装置 |
Country Status (1)
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JP (1) | JP5648252B2 (ja) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4358998B2 (ja) * | 2001-02-01 | 2009-11-04 | 株式会社日立製作所 | 薄膜トランジスタ装置およびその製造方法 |
JP2007251007A (ja) * | 2006-03-17 | 2007-09-27 | Sharp Corp | 結晶質半導体膜およびその製造方法 |
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2010
- 2010-08-27 JP JP2010206094A patent/JP5648252B2/ja not_active Expired - Fee Related
Also Published As
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JP2012049484A (ja) | 2012-03-08 |
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