JP5640156B2 - Tempered glass plate for touch panel and manufacturing method thereof - Google Patents
Tempered glass plate for touch panel and manufacturing method thereof Download PDFInfo
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- 238000000034 method Methods 0.000 claims description 71
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- 238000005530 etching Methods 0.000 claims description 33
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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- 230000007613 environmental effect Effects 0.000 description 1
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- 239000004033 plastic Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24488—Differential nonuniformity at margin
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Mining & Mineral Resources (AREA)
- Thermal Sciences (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Position Input By Displaying (AREA)
- Surface Treatment Of Glass (AREA)
Description
本発明は、タッチパネル用強化ガラス板及びその製造方法に係り、より具体的には、タッチパネル用強化ガラス板の縁部領域をハーフ(half)エッチングによって化学エッチングした後、原板ガラス単位で基板形成工程を行い、セルガラス単位に切断して使用するタッチパネル用強化ガラス板及びその製造方法に関する。 The present invention relates to a tempered glass plate for a touch panel and a manufacturing method thereof, more specifically, after chemically etching the edge region of the tempered glass plate for a touch panel by half etching, a substrate forming step in units of original glass It is related with the tempered glass board for touchscreens which cut | disconnect and use for a cell glass unit, and its manufacturing method.
最近、強化ガラスに透明電極を一体化させたタッチスクリーンパネル(Touch Screen Panel:TSP)の登場によりタッチスクリーン市場の競争構図がさらに激化している。 Recently, with the advent of a touch screen panel (TSP) in which transparent electrodes are integrated with tempered glass, the competitive composition of the touch screen market has intensified.
タッチスクリーンパネル(TSP)は、電子手帳、液晶表示装置(LCD、Liquid Crystal Display Device)、PDP(Plasma Display Panel)、EL(Electroluminescence)などの平面ディスプレイ装置にタッチ機能を付加したものであって、ユーザーがディスプレイを介して所望の情報を選択するようにするのに用いられるツールである。タッチスクリーンパネルは、1)抵抗膜方式(Resistive Type)、2)静電容量方式(Capacitive Type)、3)抵抗膜−マルチタッチ方式(Resistive-Multi-Touch Type)などに大別される。 The touch screen panel (TSP) is a flat display device such as an electronic notebook, a liquid crystal display device (LCD), a PDP (Plasma Display Panel), an EL (Electroluminescence), and the like, and has a touch function. A tool used to allow a user to select desired information via a display. Touch screen panels are roughly classified into 1) a resistive film type (Resistive Type), 2) a capacitive type (Capacitive Type), and 3) a resistive film-multi-touch type (Resistive-Multi-Touch Type).
1) 抵抗膜方式(Resistive Type)は、ガラスまたはプラスチック板上に抵抗成分の物質をコートし、その上にポリエチレンフィルムを被せた形になっており、両面が互いに接しないように一定の間隔で絶縁棒が設置されている。作動原理は、抵抗膜の両端から一定の電流を流すと、抵抗膜が抵抗成分を有する抵抗体のように作用するため、両端に電圧がかかる。手の指を当てると、上側の表面のポリエスチルフィルムが撓んで両面が接続される。よって、両面の抵抗成分のため、抵抗の並列接続のような形になり、抵抗値の変化が起こる。この際、両端に流れる電流によって電圧の変化も起こるが、このような電圧の変化程度を直ちに把握し、接触した指の位置を知ることができる。抵抗膜方式は、表面圧力による作動で解像度が高く応答速度が速いものの、タッチ位置を同時に一箇所しか感知することができず、破損に対する危険が大きいという欠点を持っている。 1) In the Resistive Type, a resistive component material is coated on a glass or plastic plate, and a polyethylene film is placed on top of it. An insulation rod is installed. The principle of operation is that when a constant current is passed from both ends of the resistance film, the resistance film acts like a resistor having a resistance component, and thus a voltage is applied to both ends. When the finger of the hand is applied, the polyester film on the upper surface is bent and both sides are connected. Therefore, due to the resistance components on both sides, it becomes like a parallel connection of resistors, and the resistance value changes. At this time, a voltage change also occurs due to the current flowing at both ends, but it is possible to immediately grasp the degree of such a voltage change and know the position of the touched finger. The resistive film method has a drawback that it can detect only one touch position at the same time and has a high risk of breakage, although it has a high resolution and a high response speed due to operation by surface pressure.
2) 静電容量方式(Capacitive Type)は、熱処理が施されているガラスの両面に透明な特殊伝導性金属(TAO)をコートして製造する。スクリーンの四つ角に電圧をかけると、高周波がセンサーの全面に広がり、この際、スクリーンに指が接すると、電子の流れが変化し、このような変化を感知して座標を把握する。静電容量方式は、多数のポイントを同時に押して実行可能であり、解像度が高く耐久性が良いという利点を持っているものの、反応速度が遅く装着が難しいという欠点を持っている。 2) Capacitive type is manufactured by coating a transparent special conductive metal (TAO) on both surfaces of heat-treated glass. When a voltage is applied to the four corners of the screen, a high frequency spreads over the entire surface of the sensor. At this time, when a finger touches the screen, the flow of electrons changes, and such changes are detected to grasp the coordinates. The electrostatic capacity method can be executed by pressing a large number of points at the same time, and has the advantage of high resolution and good durability, but has the disadvantage that the reaction speed is slow and the mounting is difficult.
3) 抵抗膜−マルチタッチ方式(Resistive-Multi-Touch Type)は、1つのポイントしか実行することができない抵抗膜方式の最大欠点を補完改善し、静電容量方式と同様に実行することができるように実現した。 3) Resistive Multi-Touch Type (Resistive-Multi-Touch Type) can be implemented in the same way as the capacitance method, complementing and improving the maximum drawback of the resistive membrane method that can only be implemented at one point. As realized.
また、タッチスクリーンパネル(TSP)は、信号増幅の問題、解像度の違い、設計及び加工技術の難易度だけでなく、それぞれのタッチスクリーンパネルの特徴的な光学的特性、電気的特性、機械的特性、耐環境特性、入力特性、耐久性及び経済性などを考慮して個々の電子製品に選択的に使用される。特に、電子手帳、PDA、携帯用PC及びモバイルフォン(携帯電話)などでは、抵抗膜方式(Resistive Type)と静電容量方式(Capacitive Type)が広く用いられる。 Touch screen panels (TSP) not only have signal amplification problems, resolution differences, and difficulty in design and processing technology, but also the characteristic optical characteristics, electrical characteristics, and mechanical characteristics of each touch screen panel. It is selectively used for individual electronic products in consideration of environmental resistance characteristics, input characteristics, durability and economy. In particular, in electronic notebooks, PDAs, portable PCs, mobile phones (cell phones), and the like, a resistive film type (Resistive Type) and a capacitance type (Capacitive Type) are widely used.
タッチスクリーン製造技術の向後の動向を考慮するとき、従来の複雑な工程を最大限減らしても十分な耐久性を有するように、タッチスクリーンパネルをさらに薄く製造する必要がある。その理由は、光透過率を高めてディスプレイの輝度を低めても、既存の製品と同様の性能を実現するようにすることにより、消費電力を減少させてバッテリーの利用時間を増やすことができるためである。 When considering the future trend of touch screen manufacturing technology, it is necessary to manufacture the touch screen panel thinner so that it has sufficient durability even if the conventional complicated processes are reduced to the maximum. The reason is that, even if the light transmittance is increased and the brightness of the display is lowered, by realizing the same performance as existing products, the power consumption can be reduced and the battery usage time can be increased. It is.
このような要求に応えて、厚さ1.8mm以下のガラス基板を使用するタッチスクリーンパネルが提示されており、このような薄いガラスを使用するタッチスクリーンパネルは、使用者が後ろの袋などに入れた状態で座る場合、破損が発生するため、強化ガラスを採用する必要がある。 In response to these demands, touch screen panels that use a glass substrate with a thickness of 1.8 mm or less have been presented. The touch screen panel that uses such thin glass can be used by a user in a back bag or the like. When sitting in a state of being put in, breakage occurs, so it is necessary to employ tempered glass.
厚さ1.8mm以下のガラス基板を強化させる方法としては、熱処理を用いることができないため、化学的強化方式を使っている。化学的強化方式は、ガラスに含まれているNa+イオンを除去し、K+物質を代替注入してガラスを強化させる方式である。 As a method for strengthening a glass substrate having a thickness of 1.8 mm or less, a chemical strengthening method is used because heat treatment cannot be used. The chemical strengthening method is a method of strengthening the glass by removing Na + ions contained in the glass and injecting a K + substance instead.
まず、説明の便宜のために、大きいサイズのガラス基板を「原板ガラス」と称し、原板ガラスを切断してタッチパネル用の小さいパネルガラスのサイズに切断されたガラスを「セルガラス」と称する。 First, for convenience of explanation, a glass substrate having a large size is referred to as “original glass”, and glass obtained by cutting the original glass and cutting it into a small panel glass for a touch panel is referred to as “cell glass”.
従来の厚さ1.8mm以下の強化ガラス基板を使用するタッチパネルに用いるセルガラスは、次のような工程によって製造された。 The cell glass used for the touch panel which uses the conventional tempered glass substrate of thickness 1.8mm or less was manufactured by the following processes.
図1を用いて、厚さ1.8mm以下の強化ガラス基板を使用する従来のタッチパネル用パネルの製造工程について簡略に説明する。まず、多数のセルを含む大きいサイズの原板ガラスをセルガラスに切断する(ST100)。切断されたセルガラスを化学的強化方式によって強化させる(ST110)。切断されたセルガラスに透明電極層の形成などのタッチパネル形成工程を行う(ST120)工程を適用する。 A conventional process for manufacturing a touch panel using a tempered glass substrate having a thickness of 1.8 mm or less will be briefly described with reference to FIG. First, a large-size glass plate containing a large number of cells is cut into cell glass (ST100). The cut cell glass is strengthened by a chemical strengthening method (ST110). A process of performing a touch panel forming process such as formation of a transparent electrode layer on the cut cell glass (ST120) is applied.
ところが、従来の厚さ1.8mm以下の強化ガラス基板を使用するタッチパネル用パネルを製造する工程は、原板ガラスをセルガラスに切断した後、セルガラスに基板形成工程(透明電極層の形成など)を行わなければならないので、原板単位で行う工程と比較して工程の収率が低下するという問題点があった。 However, the process of manufacturing a conventional panel for a touch panel using a tempered glass substrate having a thickness of 1.8 mm or less cuts the original glass into cell glass, and then forms the substrate on the cell glass (formation of a transparent electrode layer, etc.) Therefore, there is a problem in that the yield of the process is reduced as compared with the process performed in units of original plates.
本発明は、上述した問題点を解決するためになされたもので、その目的は、厚さ1.8mm以下の強化ガラス基板を使用しながらも、原板ガラス単位で基板形成工程を行うことが可能なタッチパネル用強化ガラス板及びその製造方法を提供することにある。 The present invention has been made to solve the above-described problems, and its purpose is to perform a substrate forming process in units of original glass while using a tempered glass substrate having a thickness of 1.8 mm or less. It is providing the tempered glass board for touch panels, and its manufacturing method.
また、本発明の他の目的は、原板ガラス単位で強化ガラス処理及び基板加工を行った後、タッチパネルサイズのセルガラス単位に切断しても、切断面をある程度強化処理することが可能なタッチパネル用強化ガラス板の製造方法を提供することにある。 Another object of the present invention is for a touch panel capable of tempering the cut surface to some extent even if it is cut into cell glass units of a touch panel size after performing tempered glass processing and substrate processing in an original glass unit. It is providing the manufacturing method of a tempered glass board.
上記目的は、強化ガラスから形成されるタッチパネル用強化ガラス板の製造方法において、複数のタッチパネル用セルガラスを含む原板ガラスを強化させる第1段階と、前記原板ガラスの表面上にセルガラスサイズ単位で区画する縁部領域をハーフエッチングする第4段階と、原板ガラス単位で、透明電極形成工程を含む基板形成工程を行う第2段階と、前記基板形成工程及び前記ハーフエッチングを済ませた前記原板ガラスをセルガラス単位に切断し、しかる後に、切断面を研削(grinding)する第3段階と、を含んでなるタッチパネル用強化ガラス板の製造方法によって達成可能である。 In the method for producing a tempered glass plate for a touch panel formed from tempered glass, the above object is a first step of strengthening an original plate glass including a plurality of touch panel cell glasses, and cell glass size units on the surface of the original plate glass. a fourth step of half-etching an edge region defining, with the original plate glass units, a second step of performing a substrate forming step including a transparent electrode forming step, the original plate glass finished the substrate forming step and the half-etching cut into the cell glass unit, and thereafter, a third step of grinding (grinding) the cutting plane can be achieved by the manufacturing method of the containing Do filter touch panel reinforcing glass plate.
上記他の目的は、タッチパネルに使用され、強化ガラスから形成されるタッチパネル用強化ガラス板であって、端面において、前記強化ガラスの厚さ中心線を基準に上面及び下面の表面から厚さ中心線領域までの領域は外方へ凹入した凹面形状を有し、前記厚さ中心線領域は前記凹面形状に連なって形成される、外方へ膨出した凸面形状を有することを特徴とするタッチパネル用強化ガラス板によって達成可能である。 The above other objects are used in the touch panel, a touch panel for tempered glass, which is formed of tempered glass, in the end surface, the thickness of the center line from the upper and lower surfaces of the surface relative to the thickness center line of the reinforcing glass region to region has a concave shape that is recessed outward, the thickness centerline region characterized in that it has a convex shape that bulges are formed continuous to said concave, outwardly It can be achieved by a tempered glass plate for data touch panel.
本発明のタッチパネル用強化ガラス板及びその製造方法を適用すると、大きいサイズの原板ガラス単位で基板形成工程を行うことができるから、基板形成工程が容易になるうえ、生産収率を向上させることができる。 When the tempered glass plate for a touch panel of the present invention and the manufacturing method thereof are applied, the substrate forming step can be performed in a large-size original plate glass unit, so that the substrate forming step is facilitated and the production yield can be improved. it can.
また、本発明で提案されたタッチパネル用強化ガラス板の製造方法は、厚さ1.8mm以下の強化された原板ガラス状態で基板形成工程を行った後、強化処理されていない領域を切断し、研削するので、従来の技術と比較してチップ(chip)の発生を抑制させることができるという利点がある。 Moreover, the manufacturing method of the tempered glass board for touch panels proposed by this invention cut | disconnects the area | region which is not tempered, after performing a board | substrate formation process in the reinforced original glass state of thickness 1.8mm or less, Since grinding is performed, there is an advantage that generation of chips can be suppressed as compared with the conventional technique.
以下、添付図面を参照して本発明の好適な実施例、利点及び特徴について詳細に説明する。 Hereinafter, preferred embodiments, advantages, and features of the present invention will be described in detail with reference to the accompanying drawings.
まず、図2を用いて、本発明の一実施例に係る厚さ1.8mm以下のタッチパネルに用いられる強化ガラス板を製造する工程について簡略に説明する。原板ガラスを強化処理する(ST200)。本発明で使用するガラス基板は、1.8mm以下の厚さを有するため、化学的強化方式を適用することが好ましい。背景技術で説明したように、化学的強化方式は、ガラスに含まれているNa+イオンを除去し、K+物質を代替注入してガラスを強化させる方式である。 First, the process of manufacturing the tempered glass board used for the touch panel of thickness 1.8mm or less which concerns on one Example of this invention using FIG. 2 is demonstrated easily. The original glass sheet is tempered (ST200). Since the glass substrate used in the present invention has a thickness of 1.8 mm or less, it is preferable to apply a chemical strengthening method. As described in the background art, the chemical strengthening method is a method in which Na + ions contained in the glass are removed, and K + material is alternatively injected to strengthen the glass.
その後、原板ガラスの上面及び下面から厚さ方向にセルガラスサイズに切断するための前段階として、セルガラスを形成するための縁部を化学エッチングする(ST210)。この際、行われる化学エッチングは、原板ガラスをセルガラス単位に完全に切断せず、厚さ方向を基準に中心の一部を残存させる方式で行い、これを本発明では「ハーフエッチング」と称する。ハーフエッチングによって原板ガラスの上下面は厚さを基準として中心方向に化学エッチングが行われ、原板ガラスの中央部はエッチングされずに残っている領域が存在する。 Then, the edge part for forming cell glass is chemically etched as a pre-stage for cut | disconnecting to cell glass size in the thickness direction from the upper surface and lower surface of original glass (ST210). At this time, the chemical etching performed is performed by a method in which the original glass is not completely cut into cell glass units and a part of the center is left with reference to the thickness direction, and this is referred to as “ half etching” in the present invention. . By half- etching, the upper and lower surfaces of the original glass are chemically etched in the center direction based on the thickness, and there is a region that remains in the central part of the original glass without being etched.
図3は本発明に係る一実施例として原板ガラスにハーフエッチングが行われる縁部を示し、図4は図3に示したa−a’線に沿った断面を拡大して示す。図3は一つの原板ガラスを9つのセルガラスに形成する例であって、セルガラス単位に切断されるべき縁部20に化学ハーフエッチングを行う状態の斜視図である。図4はC1セルガラスとC2セルガラスとの間に行われるハーフエッチング断面を拡大して示す断面図である。図3では一枚の原板ガラスに9つのセルガラスが含まれるものを示したが、これは例示に過ぎず、実際は一層さらに多いセルガラス、或いはさらに少ないセルガラスが、一枚の原板ガラスから形成できる。
FIG. 3 shows an edge where half- etching is performed on the original glass as one embodiment according to the present invention, and FIG. 4 shows an enlarged cross section along the line aa ′ shown in FIG. FIG. 3 is an example in which one original glass sheet is formed on nine cell glasses, and is a perspective view showing a state where chemical half etching is performed on the
図4に示すように、原板ガラスの上面と下面の縁部20で化学エッチングが行われる。原板ガラスはST200段階で強化処理された。このような強化処理の結果、上下面の表面からそれぞれTD深さだけ化学的強化領域10が形成される。このような化学的強化深さ(DOL、Depth of Layer)は、現在広く販売されているiPhoneに使用されるゴリラガラスの場合には、50〜60μm程度であると知られている。本発明では、後続の切断及び研削(grinding)工程が強化領域を除いた領域で行われなければならないので、ST210段階で行われるハーフエッチングの深さは、少なくとも強化深さ(DOL)を超えなければならず、一般に等方性化学エッチングを採用する。例えば、図4に示した原板ガラスの厚さ(T)が1.8mm、強化深さ(TD)が60μmであると仮定すると、ハーフエッチングの深さは強化深さ(TD)よりは大きく、原板ガラスの厚さ(T)の1/2よりは小さくする。後続の切断工程及び研削工程を円滑に行うためには、強化処理されていない領域が十分露出するように、ハーフエッチングを行わなければならない。好ましくは、ハーフエッチングの後に厚さ方向に残っている残存領域の厚さ(TR)は、少なくとも5μmよりは大きくすることがよい。残存領域の厚さ(TR)を5μm以下にすると、後で行われる基板形成工程でハーフエッチングされた部分が切断されてしまう問題が発生する。
As shown in FIG. 4, chemical etching is performed at the
また、ハーフエッチングの後、隣り合うセルガラス同士の間に強化処理されていない水平距離(L)は、後続工程で行われる切断工程の技法及びセルガラスのサイズによって異なるように設定しなければならない。例えば、サンドブラスト工法によって切断工程を行う場合は、レーザー光によって切断工程を行う場合より、水平距離(L)を大きく持たなければならない。 In addition, after half- etching, the horizontal distance (L) that is not tempered between adjacent cell glasses must be set differently depending on the technique of the cutting process performed in the subsequent process and the size of the cell glass. . For example, when the cutting process is performed by a sandblasting method, the horizontal distance (L) must be larger than when the cutting process is performed by a laser beam.
次に、ハーフエッチングされた状態の原板ガラス単位で基板形成工程を行う(ST220)。基板形成工程は、形成しようとする基板構造によって様々な方式で行われる。例えば、セルガラス毎にブラックインクでウィンドウの縁部と製造社のロゴを形成するデコレーション領域形成工程、及びオーバーコーティング層またはアンカーコーティング層の上部に透明電極を形成する透明電極形成工程が行われる。 Next, a substrate forming process is performed for each half- etched original glass unit (ST220). The substrate forming process is performed in various ways depending on the substrate structure to be formed. For example, a decoration region forming step of forming a window edge and a manufacturer's logo with black ink for each cell glass, and a transparent electrode forming step of forming a transparent electrode on the overcoating layer or the anchor coating layer are performed.
図2に示した製造工程では、強化処理された原板ガラスをセルガラス単位でハーフエッチングした後(ST210段階)、基板形成工程を行う(ST220段階)と説明した。本発明の主な要旨は原板ガラス単位で基板形成工程を行うことであるから、ST210段階及びST220段階の順序を変えても、本発明の目的を達成することができる。 In the manufacturing process shown in FIG. 2, it is described that the tempered original glass sheet is half- etched in units of cell glass (ST210 stage) and then the substrate forming process is performed (ST220 stage). Since the main gist of the present invention is to perform the substrate forming process in units of original glass, the object of the present invention can be achieved even if the order of ST210 stage and ST220 stage is changed.
その後、基板形成工程済みの原板ガラスをセルガラス単位で切断し、研削を行う(ST230)。この際、切断工程及び研削工程は、ハーフエッチングによって強化処理が露出した領域(L)で行われる。よって、強化処理された部分にエッチングを行うと、表面応力によりチップ(chip)が発生し、激しい場合にはクラックが発生する。ところが、本発明に係る切断工程及び研削工程は、強化処理されていない部分で行われるので、すなわちストレスが集中していない領域で行われるので、チップの発生を減らすことができるという利点がある。 Thereafter, the original glass after the substrate forming step is cut in units of cell glass and ground (ST230). At this time, the cutting step and the grinding step are performed in a region (L) where the reinforcing treatment is exposed by half etching. Therefore, if etching is performed on the strengthened portion, a chip is generated due to surface stress, and if it is severe, a crack is generated. However, since the cutting process and the grinding process according to the present invention are performed in a portion not subjected to the strengthening process, that is, performed in an area where stress is not concentrated, there is an advantage that the generation of chips can be reduced.
切断は、レーザー光を用いた切断、ダイヤモンドホイールカッティング、ウォータージェットカッティング(water jet cutting)、サンドブラストなどの物理的切断方法によって行うことが好ましいが、フッ素による化学的切断によっても可能であるのはもとよりである。 Cutting is preferably performed by a physical cutting method such as cutting using laser light, diamond wheel cutting, water jet cutting, sand blasting, etc., but it can also be done by chemical cutting with fluorine. It is.
この際、切断された面は強化処理されていない領域であるから、外部の衝撃に弱くなるおそれがある。本発明では、切断の後、強化処理されていない側面にフッ酸含有ペーストを塗布し、洗浄すれば、ある程度強化処理を施すことができるようになった。 At this time, since the cut surface is a region that has not been subjected to the strengthening process, there is a possibility that the surface becomes weak against external impact. In the present invention, after cutting, if a hydrofluoric acid-containing paste is applied to the side surface that has not been reinforced, and then washed, it can be reinforced to some extent.
[第1変形例] [First Modification]
図5は強化ガラス基板を使用する本発明に係る別の実施例のタッチパネル用ガラス板の製造工程流れ図である。複数のセルガラスが含まれた原板ガラスの上面及び下面に対して、セルガラス単位で切断されるべき縁部領域をハーフエッチングする(ST500)。その後、ハーフエッチングされた領域の一部に、強化処理を防止するための強化処理妨害物質を塗布する(ST510)。強化処理妨害物質の一例としては、シリカ(SiO2)と酸化アルミニウム(Al2O3)から構成された化合物を挙げることができる。その後、原板ガラスを強化処理する(ST520)。次に、原板ガラス単位で基板形成工程を行い(ST530)、基板形成工程が完了すると、強化処理妨害物質の塗布されたハーフエッチング領域を切断し、切断面を研削(grinding)する(ST540)。ST520段階の強化処理を完了した後にも、強化処理妨害物質は縁部領域に残っているが、残存する強化処理妨害物質は、ST540段階で行われる切断工程及び研削工程で面取りされることにより除去される。この際、面取りされた面は強化処理されていない領域であるから、外部の衝撃に弱くなるおそれがある。本発明では、切断の後、強化処理されていない面取り面にフッ酸含有ペーストを塗布し、洗浄すれば、ある程度は強化処理を施すことができるようになった。 FIG. 5 is a flowchart of a manufacturing process of a glass plate for a touch panel according to another embodiment of the present invention using a tempered glass substrate. Edge regions to be cut in units of cell glass are half- etched on the upper and lower surfaces of the original glass plate including a plurality of cell glasses (ST500). Thereafter, a reinforcing treatment interfering substance for preventing the reinforcing treatment is applied to a part of the half- etched region (ST510). As an example of the reinforcing treatment interfering substance, a compound composed of silica (SiO 2 ) and aluminum oxide (Al 2 O 3 ) can be given. Thereafter, the original glass is tempered (ST520). Next, a substrate forming process is performed in units of original glass (ST530). When the substrate forming process is completed, the half- etched region to which the reinforcing treatment interfering substance is applied is cut and the cut surface is ground (ST540). Even after completion of the strengthening process in ST520, the reinforcing treatment interfering substance remains in the edge region, but the remaining reinforcing treatment interfering substance is removed by chamfering in the cutting process and the grinding process performed in ST540 stage. Is done. At this time, the chamfered surface is a region that has not been reinforced, and thus may be susceptible to external impact. In the present invention, after cutting, if a hydrofluoric acid-containing paste is applied to a chamfered surface that has not been reinforced, and washed, it can be reinforced to some extent.
図6は本発明に係る変形例のST500及びST510段階を行った後の原板ガラスの斜視図であり、図7は図6に示したb−b’線に沿った切断面を拡大して示す図である。図7に示すように、強化処理されていない原板ガラスの縁部領域20にハーフエッチングを行い、ハーフエッチングされた領域の一部に強化処理妨害物質30が塗布されている状態を確認することができる。図7の状態で強化処理を完了すると、図8に示した断面形状のように、原板ガラスの上下面の表面から強化処理妨害物質30が塗布されていない領域には、一定の深さまで強化処理領域10が形成される。図7及び図8において、「L」は隣り合うセルガラス間の縁部領域中における、強化処理が発生していない水平距離を示す。
FIG. 6 is a perspective view of the original glass after performing steps ST500 and ST510 of the modified example according to the present invention, and FIG. 7 shows an enlarged cut surface along the line bb ′ shown in FIG. FIG. As shown in FIG. 7, half- etching is performed on the
ST500で行われるハーフエッチングの深さは、図2の実施例で提示した深さと同様に行われるようにする。 The depth of the half etching performed in ST500 is performed in the same manner as the depth presented in the embodiment of FIG.
[第2変形例] [Second Modification]
図9は強化ガラス基板を使用する本発明に係る別の実施例のタッチパネル用ガラス基板の製造工程流れ図である。原板ガラスを強化処理し(ST900)、原板ガラス単位で基板形成工程を行う(ST910)。原板ガラス単位で基板形成工程を行うという意味は、セルガラス単位に切断した後、切断されたセルガラス単位でそれぞれ基板形成工程を行う工程と対比される工程処理流れを説明するために使用された用語であって、複数のセルガラスが含まれている原板ガラス単位で透明電極形成などの基板形成工程を行うことを意味する。よって、セルガラス単位で基板形成工程を行うときと比較して、同時に多数のセルガラスに同一の工程を適用することができるので、生産時間が短縮されるうえ、工程が単純になるという利点がある。基板形成工程が完了すると、セルガラス単位に切断するためにマスクを適用し、フッ素エッチングを行って原板ガラスをセルガラス単位に切断する(ST920)。その後、切断面を研削処理すると、タッチパネル用ガラス板の製造が完成される。 FIG. 9 is a manufacturing process flow chart of a glass substrate for a touch panel according to another embodiment of the present invention using a tempered glass substrate. The original glass is tempered (ST900), and the substrate forming step is performed in units of the original glass (ST910). The meaning of performing the substrate forming step in the original glass unit was used to explain the process flow compared with the step of performing the substrate forming step in the cut cell glass unit after cutting into the cell glass unit. It is a term, and means that a substrate forming process such as forming a transparent electrode is performed in an original glass unit containing a plurality of cell glasses. Therefore, compared with the case where the substrate forming process is performed in units of cell glass, the same process can be applied to a large number of cell glasses at the same time, so that the production time is shortened and the process is simplified. is there. When the substrate forming step is completed, a mask is applied to cut the cell glass unit, and fluorine etching is performed to cut the original glass into cell glass units (ST920). Thereafter, when the cut surface is ground, the manufacture of the glass plate for a touch panel is completed.
第2変形例に提示された工程は、透明電極形成工程などが完了した後、フッ素(F)を用いた化学エッチングが行われるので、エッチング液が、既に行われた基板形成工程によって積層された構造物を汚染させるおそれがあるという欠点があるので、これに適したマスクの開発が必要である。 In the process presented in the second modification, since the chemical etching using fluorine (F) is performed after the transparent electrode forming process and the like are completed, the etching solution is stacked by the already performed substrate forming process. Since there is a drawback that the structure may be contaminated, it is necessary to develop a mask suitable for this.
図10は図2の工程によって生産されたセルガラスの切断面を示す拡大図である。セルガラス切断領域20は、ハーフエッチングによってガラス厚さの中心線を基準に上下面の表面から中心線領域までの領域には外方へ凹入した凹面形状に形成され、前記中心線領域はハーフエッチングによって発生した凹面形状に連なって研削処理により外方へ膨出した凸面形状に形成される、特異な形状を有することが分る。
FIG. 10 is an enlarged view showing a cut surface of the cell glass produced by the process of FIG. Cell
図10では、等方性ハーフエッチングによってガラス厚さの中心線を基準に上下面の表面から中心線領域までの領域には外方へ凹入した単一R凹面形状に形成され、前記中心線領域は研削処理により外方へ膨出した単一r凸面形状に形成されるガラス切断面を例示した。 In FIG. 10, isotropic half etching is used to form a single R concave shape that is recessed outward in the region from the surface of the upper and lower surfaces to the center line region with respect to the center line of the glass thickness. The area | region illustrated the glass cut surface formed in the single r convex shape which bulged outward by the grinding process.
すなわち、本発明によって生産されたタッチパネル用強化ガラスの上板は、切断面がガラス厚さの中心線を基準に上下面の表面から中心線領域までの領域には外方へ凹入した凹面形状に形成され、前記中心線領域は凹面形状に連なって研削処理により外方へ膨出した凸面形状に形成されることが分る。 In other words, the upper plate of the tempered glass for touch panel produced by the present invention has a concave shape in which the cut surface is recessed outward from the upper and lower surface to the center line region on the basis of the center line of the glass thickness. It can be seen that the center line region is formed in a convex shape that continues to the concave shape and bulges outward by the grinding process.
図11は図2の工程によって生産されたセルガラスの別の切断形態を示す切断面の拡大図である。図11の実施例では、セルガラス切断領域20の中央部分を面取り加工した。セルガラス切断領域20は、ハーフエッチングによりガラス厚さの中心線を基準に上下面の表面から中心線領域までの領域には凹面形状に形成され、前記中心線領域は面取りした形状を呈する特異な形状を有することが分る。
FIG. 11 is an enlarged view of a cut surface showing another cut form of the cell glass produced by the process of FIG. In the example of FIG. 11, the central portion of the cell
図12は図2の工程によって生産されたセルガラスの別の切断形態を示す切断面の拡大図である。図12の実施例では、図11において凹面形状と垂直に面取りされた部分との間に45°方向の面取りを追加することができることを示す。 FIG. 12 is an enlarged view of a cut surface showing another cut form of the cell glass produced by the process of FIG. The embodiment of FIG. 12 shows that a 45 ° chamfer can be added between the concave shape and the vertically chamfered portion in FIG.
以上、本発明の好適な実施例を特定の用語を用いて説明及び図示したが、そのような用語は本発明を明確に説明するためのものに過ぎず、本発明の実施例は添付された請求の範囲の技術的思想及び範囲から離脱することなく、様々な変更及び変化を加え得るのは自明である。 Although the preferred embodiments of the present invention have been described and illustrated with specific terms, such terms are merely for purposes of illustrating the present invention and the embodiments of the present invention have been attached. Obviously, various modifications and changes may be made without departing from the spirit and scope of the appended claims.
Claims (14)
複数のタッチパネル用セルガラスを含む原板ガラスを強化させる第1段階と、
前記原板ガラスの表面上にセルガラスサイズ単位で区画する縁部領域をハーフエッチングする第4段階と、
原板ガラス単位で、透明電極形成工程を含む基板形成工程を行う第2段階と、
前記基板形成工程及び前記ハーフエッチングを済ませた前記原板ガラスをセルガラス単位に切断し、しかる後に、切断面を研削する第3段階と、
を含んでなるタッチパネル用強化ガラス板の製造方法。 In the manufacturing method of the tempered glass board for touch panels formed from tempered glass,
A first stage for strengthening an original glass plate including a plurality of touch panel cell glasses;
A fourth step of half-etching an edge region partitioned by a cell glass size unit on the surface of the original glass;
A second stage of performing a substrate forming process including a transparent electrode forming process in units of original glass;
Cutting the original glass after the substrate forming step and the half etching into cell glass units, and then grinding the cut surface ; and
The comprise Do filter touch panel for the production method of the tempered glass sheet.
複数のタッチパネル用セルガラスを含む原板ガラスを強化させる第1段階と、A first stage for strengthening an original glass plate including a plurality of touch panel cell glasses;
原板ガラス単位で、透明電極形成工程を含む基板形成工程を行う第2段階と、A second stage of performing a substrate forming process including a transparent electrode forming process in units of original glass;
前記原板ガラスの表面上にセルガラスサイズ単位で区画する縁部領域をハーフエッチングする第4段階と、A fourth step of half-etching an edge region partitioned by a cell glass size unit on the surface of the original glass;
前記基板形成工程及び前記ハーフエッチングを済ませた前記原板ガラスをセルガラス単位に切断し、しかる後に、切断面を研削する第3段階と、Cutting the original glass after the substrate forming step and the half etching into cell glass units, and then grinding the cut surface; and
を含んでなるタッチパネル用強化ガラス板の製造方法。The manufacturing method of the tempered glass board for touchscreens containing this.
複数のタッチパネル用セルガラスを含む原板ガラスの表面上にセルガラスサイズ単位で縁部領域をハーフエッチングする第1段階と、
前記第1段階によってハーフエッチングが行われた領域の一部に、強化処理が施されないようにする強化処理妨害物質を塗布する第2段階と、
前記強化処理妨害物質の塗布された前記原板ガラスを強化処理する第3段階と、
前記第1段階によってハーフエッチング及び前記第3段階によって強化処理された原板ガラス単位で、透明電極形成工程を含む基板形成工程を行う第4段階と、
前記第4段階による基板形成工程済みの前記原板ガラスをタッチパネルサイズのセルガラス単位に切断し、しかる後に、切断面を研削する第5段階と、
を含んでなることを特徴とするタッチパネル用強化ガラス板の製造方法。 In the manufacturing method of the tempered glass board for touch panels formed from tempered glass,
A first stage of half- etching the edge region in units of cell glass size on the surface of the original glass plate including a plurality of touch panel cell glasses;
A second step of applying a reinforcing treatment interfering substance to prevent a strengthening treatment from being applied to a part of the region that has been half- etched by the first step;
A third step of hardening the coated the original plate glass of the reinforcement treatment interfering substances,
A fourth stage in which a substrate forming process including a transparent electrode forming process is performed in the original glass unit that is half- etched by the first stage and strengthened by the third stage ;
The original plate glass substrate forming step already by the fourth stage and cut into cell glass unit of the touch panel size, and thereafter, the fifth step of grinding the cut surfaces,
Features and to filter touch panel for the production method of the tempered glass sheet to be comprised of.
端面において、前記強化ガラスの厚さ中心線を基準に上面及び下面の表面から厚さ中心線領域までの領域は外方へ凹入した凹面形状を有し、前記厚さ中心線領域は前記凹面形状に連なって形成される、外方へ膨出した凸面形状を有することを特徴とするタッチパネル用強化ガラス板。 A tempered glass plate for a touch panel used for a touch panel and formed from tempered glass,
In the end face, the area from the upper and lower surface to the thickness centerline area with respect to the thickness centerline of the tempered glass has a concave shape recessed outward, and the thickness centerline area is the concave surface It is formed continuous with the shape, characteristics and to filter touch panel for tempered glass plate having a bulging convex outwardly.
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PCT/KR2011/008885 WO2012070819A2 (en) | 2010-11-25 | 2011-11-21 | Tempered glass sheet for a touch panel, and method for manufacturing same |
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Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100989125B1 (en) * | 2008-07-16 | 2010-10-20 | 삼성모바일디스플레이주식회사 | Mother substrate cutting apparatus and organic light emitting diode display cut thereby |
KR101719588B1 (en) * | 2010-11-17 | 2017-03-27 | 삼성디스플레이 주식회사 | Touch Screen Panel and Fabricating Method for the Same |
KR20130124754A (en) * | 2012-05-07 | 2013-11-15 | 삼성전기주식회사 | Touch panel and method for manufacturing the same |
KR101681931B1 (en) * | 2012-06-12 | 2016-12-02 | 코닝정밀소재 주식회사 | Cutting method and cutting apparatus of tempered glass |
CN103508663A (en) * | 2012-06-14 | 2014-01-15 | 睿明科技股份有限公司 | Method for making glass substrate of touch control display equipment |
KR101395646B1 (en) * | 2012-07-10 | 2014-05-16 | (주)멜파스 | Method for manufacturing touch screen panel and tempered glass substrate |
CN103011608B (en) * | 2012-12-03 | 2016-08-03 | 广东拓捷科技股份有限公司 | A kind of manufacture method of the glass cover-plate of display device |
KR20140086536A (en) * | 2012-12-28 | 2014-07-08 | 삼성전기주식회사 | Touch panel integrated with cover glass and manufacturing method thereof |
CN103336610A (en) * | 2013-06-17 | 2013-10-02 | 南昌欧菲光学技术有限公司 | Panel glass, preparation method thereof, preparation method of touch screen adopting panel glass |
TWI554481B (en) * | 2015-04-10 | 2016-10-21 | Projection and structure of single glass touch panel with corner | |
CN104964655B (en) * | 2015-06-01 | 2017-11-07 | 东旭科技集团有限公司 | A kind of chemically enhancing glass handles the method for testing of depth |
CN106466796B (en) * | 2015-08-21 | 2018-09-18 | 蓝思科技(长沙)有限公司 | A kind of production method and sapphire panel of 3D sapphires panel |
WO2017136507A1 (en) * | 2016-02-05 | 2017-08-10 | Sabic Global Technologies B.V. | Foldable cover assembly, method of manufacture, and device comprising the foldable cover assembly |
KR101749598B1 (en) * | 2016-04-19 | 2017-06-22 | (주)유티아이 | manufacturing method of camera window with prominent pattern and camera window with prominent pattern thereby |
CN108803949A (en) * | 2017-04-28 | 2018-11-13 | 晶达光电股份有限公司 | Touch panel and its manufacturing method |
US11203550B2 (en) * | 2018-04-27 | 2021-12-21 | AGC Inc. | Chemically strengthened glass plate, portable information terminal, and manufacturing method of chemically strengthened glass plate |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1470772A (en) * | 1922-08-21 | 1923-10-16 | Henry L Greenbaum | Paste for etching glass |
US4053351A (en) * | 1975-11-21 | 1977-10-11 | Rockwell International Corporation | Chemical machining of silica and glass |
US4275494A (en) * | 1978-06-30 | 1981-06-30 | Hitachi, Ltd. | Method for manufacturing liquid crystal display elements |
US4702042A (en) * | 1984-09-27 | 1987-10-27 | Libbey-Owens-Ford Co. | Cutting strengthened glass |
US4911743A (en) * | 1986-05-29 | 1990-03-27 | Hughes Aircraft Company | Glass structure strengthening by etching |
JP3271691B2 (en) * | 1996-02-29 | 2002-04-02 | セイコーインスツルメンツ株式会社 | Display device manufacturing method |
JP3965902B2 (en) * | 2000-05-23 | 2007-08-29 | 株式会社日立製作所 | Manufacturing method of liquid crystal display device |
JP2004168584A (en) * | 2002-11-19 | 2004-06-17 | Thk Co Ltd | Method for cutting glass substrate material |
KR20060004867A (en) * | 2004-07-10 | 2006-01-16 | 아이티엠 주식회사 | Touch panel manufacturing method for improving productivity |
JP2008007360A (en) * | 2006-06-28 | 2008-01-17 | Optrex Corp | Mother glass substrate, glass substrate and method for manufacturing the glass substrate |
JP4885675B2 (en) * | 2006-09-27 | 2012-02-29 | 株式会社Nsc | Method for cutting and separating laminated glass plates |
TWI486320B (en) * | 2007-03-02 | 2015-06-01 | Nippon Electric Glass Co | Reinforced plate glass and manufacturing method thereof |
JP2008216835A (en) * | 2007-03-07 | 2008-09-18 | Epson Imaging Devices Corp | Manufacturing method of thin substrate |
US8153016B2 (en) * | 2007-10-03 | 2012-04-10 | Apple Inc. | Shaping a cover glass |
KR101512213B1 (en) * | 2007-12-18 | 2015-04-14 | 호야 가부시키가이샤 | Cover glass for portable terminal, method for manufacturing cover glass for portable terminal, and portable terminal apparatus |
KR101040789B1 (en) * | 2009-01-16 | 2011-06-13 | 삼성모바일디스플레이주식회사 | Touch Screen Panel and Fabricating Method for the Same |
KR101023794B1 (en) * | 2009-01-20 | 2011-03-21 | 한성기성주식회사 | In order for the hardening part and not hardening part to be divided in the original tempered glass, about under pattern coating scratch occurrence processes the without eyelets with UV ultraviolet rays and method and the system which cut |
US8624849B2 (en) * | 2009-04-20 | 2014-01-07 | Apple Inc. | Touch actuated sensor configuration integrated with an OLED structure |
US20100279067A1 (en) * | 2009-04-30 | 2010-11-04 | Robert Sabia | Glass sheet having enhanced edge strength |
KR100937262B1 (en) * | 2009-08-31 | 2010-01-18 | 이기송 | Manufacturing method of strengthed glass for touch panel |
US8946590B2 (en) * | 2009-11-30 | 2015-02-03 | Corning Incorporated | Methods for laser scribing and separating glass substrates |
US20110127242A1 (en) * | 2009-11-30 | 2011-06-02 | Xinghua Li | Methods for laser scribing and separating glass substrates |
TWI438162B (en) * | 2010-01-27 | 2014-05-21 | Wintek Corp | Cutting method and preparatory cutting structure for reinforced glass |
US8864005B2 (en) * | 2010-07-16 | 2014-10-21 | Corning Incorporated | Methods for scribing and separating strengthened glass substrates |
US8393175B2 (en) * | 2010-08-26 | 2013-03-12 | Corning Incorporated | Methods for extracting strengthened glass substrates from glass sheets |
TWI402228B (en) * | 2010-09-15 | 2013-07-21 | Wintek Corp | Cutting method and thin film process for reinforced glass, preparatory cutting structure of reinforced glass and reinforced glass block |
US8616024B2 (en) * | 2010-11-30 | 2013-12-31 | Corning Incorporated | Methods for forming grooves and separating strengthened glass substrate sheets |
US8635887B2 (en) * | 2011-08-10 | 2014-01-28 | Corning Incorporated | Methods for separating glass substrate sheets by laser-formed grooves |
JPWO2013031547A1 (en) * | 2011-08-29 | 2015-03-23 | 旭硝子株式会社 | Glass plate and method for producing glass plate |
JP4932059B1 (en) * | 2011-12-16 | 2012-05-16 | 株式会社ミクロ技術研究所 | Tempered glass, touch panel, and method of manufacturing tempered glass |
-
2011
- 2011-11-21 CN CN201180054705.6A patent/CN103229130B/en active Active
- 2011-11-21 WO PCT/KR2011/008885 patent/WO2012070819A2/en active Application Filing
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