CN103645818A - Sapphire touch screen and producing method thereof - Google Patents
Sapphire touch screen and producing method thereof Download PDFInfo
- Publication number
- CN103645818A CN103645818A CN201310614136.7A CN201310614136A CN103645818A CN 103645818 A CN103645818 A CN 103645818A CN 201310614136 A CN201310614136 A CN 201310614136A CN 103645818 A CN103645818 A CN 103645818A
- Authority
- CN
- China
- Prior art keywords
- sapphire
- layer
- touch
- sheet
- cover plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention belongs to the technical field of touch panels and discloses a sapphire touch screen and a producing method thereof. The sapphire touch screen comprises a sapphire cover plate, a touch sensor and an insulation protection layer. The touch sensor is attached to the lower portion of a middle touch region of the sapphire cover plate, a shading material layer is attached to the lower portion of an edge non-touch region of the sapphire cover plate, a connection line between the touch sensor and a flexible printed circuit (FPC) is attached to the lower portion of the shading material layer, and the insulation protection layer covers the touch sensor and the connection line from the lower portions. The sapphire cover plate is in a double-layer composite structure, an upper sapphire layer is a C-plane sapphire layer, and a lower sapphire layer is an A-plane sapphire layer. According to the sapphire touch screen and the producing method thereof, processes such as slicing and composite machining are performed on sapphires which are processed into sheets suitable for being used as touch screen substrates and are subjected to composite machining, and accordingly, physical characteristics are improved. The sapphire touch screen has the advantages of being high in rigidity, good in strength, anti-abrasion, anti-scratching, dropping resistant and the like.
Description
Technical field
The invention belongs to touch technology field, relate to touch screen technology, relate in particular to OGS touch-screen.
Background technology
Touch-screen is a kind of input equipment, can conveniently realize the reciprocation of people and computing machine and other portable mobile apparatus, the functional area of touch-screen is as shown in Fig. 1, can be divided into Touch Zone 9 and the non-Touch Zone frame 8 of window type, and flexible PCB FPC and data processing chip IC chip that electrical connection is provided.In recent years, the capacitance touch screen based on tin indium oxide (ITO) transparent conductive film is widely used in mobile InterWorking Equipment, as smart mobile phone, and Portable tablet personal computer.
Along with mobile InterWorking Equipment is more and more higher to the requirement of the aspects such as screen reflecting rate, transmittance and thickness is frivolous, the capacitance touch screen that tradition adopts biplate glass (high rigidity glass cover-plate and with the glass of sensing electrode) laminating to form has been difficult to meet the demands.A kind of OGS(One of being called Glass Solution) capacitance touch screen scheme is suggested and applies, and becomes the important directions of touch-screen of new generation.
The hierarchical structure of described OGS capacitance touch screen as shown in Figure 2, comprising: glass cover-plate 2; Be printed on the ink layer 1 of glass cover-plate 2 downside surfaces within the scope of non-viewfinder area; Continue to be formed at the transparency conducting layer (ITO layer) 3 of glass cover-plate 2 and ink layer 1 downside; Within the scope of non-viewfinder area, form the electrode layer (connection line) 5 being electrically connected to transparency conducting layer 3; And the insulating protective layer 4 being fitted and connected by OCA optical cement.OGS structure capacitive touch-screen, at the high rigidity cover glass cover plate back side, directly forms conduction and sensing electrode, plays the double action that touches protection and touch-control sensing with same glass simultaneously.
Existing touch-screen glass cover-plate all adopts tempering organic glass, although higher through chemical enhanced tempered glass hardness, its hardness is still limited, in use procedure, is still easy to form cut at panel surface.In order to protect screen, need to paste layer protecting film for mobile phone screen.The increase of diaphragm, not only affect the penetrability of touch-screen, and diaphragm itself is easier to form slide mark.Take mobile phone as example, upgrade triennium from starting with to upgrading, what during the most of the time (possible two-and-a-half years are the longer time even), user faced is the protection pad pasting that is covered with cut.Can see, once expend hugely, develop improvement touch-screen difficultly, improve bit by bit its hardness and penetrability, yet its achievement only embody in laboratory.In actual use, due to the use of protection pad pasting, expend technological achievement huge and that obtain, directly normal incidence is converted into user's experience.That is to say, if the touch-screen cover plate after exploitation or improvement is not enough to make user to break away from protection pad pasting, so, even if achievement is remarkable, be also skimble-skamble.
Can solution to this problem be really; the hardness of seeking to improve glass cover-plate is to surpassing hardness method or the reinforcement process that most users can contact material; or seek a kind of hardness to the new material that surpasses the hardness that most users can contact material and substitute tempering organic glass, make user thoroughly break away from the use of screen protector.
Sapphire is the crystalline solid that a kind of hardness is only second to diamond, and it is more spent much larger than common tempered glass.For example, and high-purity (more than 99%) sapphire, also has very high optical transmittance, scattering is few, can effectively intercept diffusion of light, in addition, sapphire also has than the better capability of resistance to radiation of simple glass, high-termal conductivity, chemical stability is high, and anti-strong acid, highly basic, etc. plurality of advantages.
If be applied to touch-screen, substitute existing tempering organic glass, may bring outstanding effect.
Summary of the invention
The object of the invention is to, for the deficiencies in the prior art, provide a kind of hardness touch-screen more.
For achieving the above object; the technical solution adopted in the present invention is: a kind of sapphire OGS touch panel; it is characterized in that; comprise upper strata sapphire cover plate, middle level touch sensor, lower floor's insulating protective layer; described sapphire cover plate comprises non-Touch Zone, edge and middle Touch Zone; described touch sensor invests below cover plate Touch Zone; below the non-Touch Zone of sapphire cover plate, has light-shielding material layers; connection line between touch sensor and FPC depends on below light-shielding material layers, and insulating protective layer covers touch sensor and connection line from below.
The sapphire sheet that described sapphire cover plate is double-deck different high preferred orientations is composited, and upper strata sapphire layer is C surface sapphire layer, and lower floor's sapphire layer is A surface sapphire layer.
Described light-shielding material layers is the ink layer being printed on below the non-Touch Zone of sapphire substrate.
Described touch sensor is the projected capacitive sensor forming based on double-deck ITO conducting film etching and processing.
The present invention, by sapphire being cut into slices and the technique such as Compound Machining, is processed into using sapphire the thin slice being suitable for as touch screen base plate, and by Compound Machining, has improved its physical characteristics.Because sapphire hardness is higher than most mineral, the smart machines such as mobile phone are in routine use process, and the various objects that touch, are all difficult to mark cut on the touch-screen cover plate of making based on sapphire material.The touch pad cover plate that use is made based on sapphire crystal material, user can break away from the puzzlement of pad pasting completely.The advantages such as the saturating low reflection of height of touch-screen itself are given full play of.To routine use, bring perfect user to experience.
Adopt the upper strata sapphire layer of C planar orientation to there is higher hardness, the compound A planar orientation sapphire layer with higher rupture modulus of lower floor, make touch-screen cover plate based on fabricated from sapphire in performance sapphire high rigidity characteristic, also there is higher intensity, make touch-screen finished product there is the stronger anti-ability of falling.
Another object of the present invention is, proposes a kind of method for making of sapphire OGS touch panel for above-mentioned sapphire touch panel, it is characterized in that, comprises the following steps:
(1) processing sapphire substrate;
Get one side that shape size is identical two sapphire sheet that crystal orientation capture is different through grinding, wherein first is A surface sapphire sheet, second is C surface sapphire sheet, and first sapphire sheet engaged to the process for sapphire-based boards half-finished product obtaining after compound through lapped face and second sapphire sheet through lapped face;
To compound process for sapphire-based boards half-finished product upper and lower surface, and after side grinds, obtain sapphire substrate.The upper and lower surface crystal orientation orientation of sapphire substrate is respectively C planar orientation and A planar orientation;
(2) on sapphire substrate surface, make light shield layer film;
Utilize method or the screen printing method of vacuum magnetic-control sputtering to make uniform light-shielding material layers on the C of sapphire substrate planar orientation surface;
(3) graphical by photoetching technique to light shield layer film;
By techniques such as gluing, exposure, development, etching and stripings, the light-shielding material layers that invests sapphire substrate Touch Zone is removed, formed light tight frame;
(4) make transparency conducting layer;
Utilize the method for vacuum magnetic-control sputtering making electrically conducting transparent layer film,
Then by gluing, exposure, development, post bake, etching and striping technique, electrically conducting transparent layer film is carried out graphically;
(5) FPC with touch-control IC chip is carried out to electricity by hot pressing and described electrode pin and be connected, form final OGS touch-screen.
As prioritization scheme, described sapphire sheet material is comprised of sapphire table sheet and sapphire egative film, and sapphire egative film is comprised of a centre slice and four gusset plates, and centre slice is consistent with sapphire table sheet with gusset plate amalgamation area.
This programme has overcome the defect of monolithic sapphire sheet material, simultaneously the scheme compound with 2 complete sapphire sheet materials compared, there is better intensity and toughness, because the combination of the crystal orientation of sapphire table sheet and centre slice, gusset plate is more various, can make full use of the characteristic in each crystal orientation of sapphire.And reduced cost.In the practical application of touch-screen, while falling, most situation is that corner line lands, therefore the special reinforcement at position, corner has realistic meaning, and large multipurpose circular chamfering alleviates stress and concentrates in prior art, but this scheme does not fundamentally solve the frangible problem in corner, and the scheme of centre slice and gusset plate has thoroughly solved the problems referred to above.
As further prioritization scheme, there is straight line chamfering in two corners of described gusset plate.The effect of right angle chamfering is from a contact, to change the way of contact between gusset plate into line contact, has improved the anti-shearing force of composite structure.
As further prioritization scheme, described centre slice is prismatic sheet, and described gusset plate is the triangular plate that corner is provided with straight line chamfering.
With adopt the job operation of the touch panel of poly (methyl methacrylate) plate and compare, although the process of sapphire touch panel of the present invention has increased the manufacture craft of sapphire substrate, but omitted chemical enhanced technique twice, complicated unlike the processing technology of existing face glass.But can obtain more outstanding wear-resisting anti-scratch effect.
Can expect, adopt sapphire substrate of the present invention, also can make the touch-screen of other structure based on beyond OGS, as the touch-screen of G/G structure, when sapphire is applied in the touch-screen of G/G structure, sapphire sheet is used as the superiors' cover plate.
Accompanying drawing explanation
Fig. 1 is common OGS touch panel structural representation.
Fig. 2 is sapphire touch panel structural representation of the present invention.
Fig. 3 is the another kind of structural representation of sapphire touch panel of the present invention.
Fig. 4 is that sapphire of the present invention touches face processing process figure.
Fig. 5 is sapphire composite structure touch panel structural representation of the present invention.
Embodiment
Below in conjunction with accompanying drawing, to exemplify the mode of some instantiations, technical scheme of the present invention is described further.
With reference to Fig. 2; this figure is depicted as a kind of concrete structure of OGS touch panel of the present invention; comprise upper strata sapphire cover plate, middle level ITO conductive layer (being processed into touch sensor) 3, lower floor's insulating protective layer 4; sapphire cover plate comprises non-Touch Zone 8, edge and middle Touch Zone 9, and described sapphire cover plate comprises upper strata C surface sapphire layer 7 and the A of lower floor surface sapphire layer 6.Described ITO conductive layer 3 invests the surface of the sapphire cover plate A of lower floor surface sapphire layer 6 corresponding Touch Zone; the surface of the corresponding non-Touch Zone of A surface sapphire layer of sapphire cover plate is with ink layer 1; connection line 5 between ITO conductive layer 3 and FPC depends on below light-shielding material layers, and insulating protective layer 4 covers ITO conductive layer 3 and connection line 5 from below.
The thickness of described ink layer is 8nm-15nm.Described ITO conductive layer thickness is 10nm-20nm.
Described sapphire cover sheet thickness is 0.3mm-0.8mm.
Described sapphire side edge thereof is processed with lead angle structure.
With reference to Fig. 3, the manufacturing process of touch panel shown in Fig. 2, comprises the following steps.
(1) processing sapphire substrate;
By high preferred orientation, be two sapphire sheet of A face and C face respectively, be processed into the thin slice that shape is identical with size;
Grind on a surface to process two sapphire wafer, makes surface brighter and cleaner smooth;
First sapphire sheet engaged to the process for sapphire-based boards half-finished product obtaining after compound through lapped face and second sapphire sheet through lapped face, wherein the surface of the sapphire layer of C face high preferred orientation is as upper surface, and the surface of the sapphire layer of A face high preferred orientation is as lower surface;
To the compound upper and lower surface of process for sapphire-based boards half-finished product completing, and after side grinds, obtain sapphire substrate.Now, the upper and lower surface crystal orientation of sapphire substrate orientation is respectively C planar orientation and A planar orientation;
In said process, monolithic sapphire sheet material thickness is less than 0.4mm, compound after, from upper and lower surface, grind respectively, finished product thickness protection is between 0.4mm-0.6mm;
(2) on sapphire substrate surface, make light shield layer film;
Utilize method or the screen printing method of vacuum magnetic-control sputtering to make uniform light-shielding material layers on the C of sapphire substrate planar orientation surface;
(3) graphical by photoetching technique to light shield layer film;
By techniques such as gluing, exposure, development, etching and stripings, the light-shielding material layers that invests sapphire substrate Touch Zone is removed, formed light tight frame;
(4) make transparency conducting layer;
Utilize the method for vacuum magnetic-control sputtering making electrically conducting transparent layer film,
Then by gluing, exposure, development, post bake, etching and striping technique, electrically conducting transparent layer film is carried out graphically concrete technology parameter:
Plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of transparency conducting layer;
Coating photoresist, covers etched transparency conducting layer, the thickness 1600 ~ 2000nm of photoresist, and in homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of the electrode pattern of transparency conducting layer is chromium plate, apart from the size 100um ~ 200um of substrate;
To photoresist developing sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
Etching transparency conducting layer, forms transparency conducting layer electrode figure, and material is used in etching: HCL60% ~ 65%+HO240% ~ 35%, and temperature: 40 ~ 45 ℃, the time: 120 ~ 220 seconds;
Remove photoresist, form transparent conductive patterns functional electrode, use material: NaOH, concentration 2.0 ~ 1.5 MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, finally use pure water rinsing;
(5) FPC with touch-control IC chip is carried out to electricity by hot pressing and described electrode pin and be connected, form final OGS touch-screen.
As shown in Figure 5, sapphire composite structure forms by showing sheet 20, centre slice 21 and gusset plate 22.Centre slice 21 and gusset plate 22 combined area equate with table sheet 20.Centre slice 21 is prismatic sheet, and gusset plate 22 is triangular plate, and gusset plate 22 has straight line chamfering 221.
Claims (10)
1. a sapphire touch panel, it is characterized in that, comprise upper strata sapphire cover plate, middle level touch sensor, lower floor's insulating protective layer, described sapphire cover plate comprises non-Touch Zone, edge and middle Touch Zone, described touch sensor invests below cover plate Touch Zone, below the non-Touch Zone of sapphire cover plate, with light-shielding material layers, the connection line between touch sensor and FPC depends on below light-shielding material layers, and insulating protective layer covers touch sensor and connection line from below;
The sapphire sheet that described sapphire cover plate is double-deck different high preferred orientations is composited, and upper strata sapphire layer is C surface sapphire layer, and lower floor's sapphire layer is A surface sapphire layer.
2. sapphire touch panel according to claim 1, is characterized in that, described light-shielding material layers is the ink layer being printed on below the non-Touch Zone of sapphire substrate.
3. sapphire touch panel according to claim 2, is characterized in that, the thickness of described ink layer is 8nm-15nm.
4. sapphire touch panel according to claim 1, is characterized in that, described touch sensor is the projected capacitive sensor forming based on double-deck ITO conducting film etching and processing.
5. sapphire touch panel according to claim 4, is characterized in that, described ITO conductive layer thickness is 10nm-20nm.
6. sapphire touch panel according to claim 1, is characterized in that, described sapphire cover sheet thickness is 0.3mm-0.8mm.
7. sapphire touch panel according to claim 1, is characterized in that, described sapphire side edge thereof is processed with lead angle structure.
8. a method for making for sapphire touch panel, is characterized in that, comprises the following steps:
1) processing sapphire substrate;
Get one side that shape size is identical two sapphire sheet that crystal orientation capture is different through grinding, wherein first is A surface sapphire sheet, second is C surface sapphire sheet, and first sapphire sheet engaged to the process for sapphire-based boards half-finished product obtaining after compound through lapped face and second sapphire sheet through lapped face;
To compound process for sapphire-based boards half-finished product upper and lower surface, and after side grinds, obtain sapphire substrate, the upper and lower surface crystal orientation orientation of sapphire substrate is respectively C planar orientation and A planar orientation;
2) on sapphire substrate surface, make light shield layer film;
Utilize method or the screen printing method of vacuum magnetic-control sputtering to make uniform light-shielding material layers on the C of sapphire substrate planar orientation surface;
3) graphical by photoetching technique to light shield layer film;
By techniques such as gluing, exposure, development, etching and stripings, the light-shielding material layers that invests sapphire substrate Touch Zone is removed, formed light tight frame;
4) make transparency conducting layer;
Utilize the method for vacuum magnetic-control sputtering making electrically conducting transparent layer film, then by gluing, exposure, development, post bake, etching and striping technique, electrically conducting transparent layer film is carried out graphically;
5) FPC with touch-control IC chip is carried out to electricity by hot pressing and described electrode pin and be connected, form final OGS touch-screen.
9. the preparation method of sapphire touch panel according to claim 8, is characterized in that, the concrete steps of step 1) are: by high preferred orientation, be two sapphire sheet of A face and C face respectively, be processed into the thin slice that shape is identical with size; Grind on a surface to process two sapphire wafer, makes surface brighter and cleaner smooth; First sapphire sheet engaged to the process for sapphire-based boards half-finished product obtaining after compound through lapped face and second sapphire sheet through lapped face, wherein the surface of the sapphire layer of C face high preferred orientation is as upper surface, and the surface of the sapphire layer of A face high preferred orientation is as lower surface; To the compound upper and lower surface of process for sapphire-based boards half-finished product completing, and after side grinds, obtain sapphire substrate; Now, the upper and lower surface crystal orientation of sapphire substrate orientation is respectively C planar orientation and A planar orientation; In said process, monolithic sapphire sheet material thickness is less than 0.4mm, compound after, from upper and lower surface, grind respectively, finished product thickness protection is between 0.4mm-0.6mm.
10. the preparation method of sapphire touch panel according to claim 8, is characterized in that, the concrete technology parameter in step 4) is:
Plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of transparency conducting layer;
Coating photoresist, covers etched transparency conducting layer, the thickness 1600 ~ 2000nm of photoresist, and in homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of the electrode pattern of transparency conducting layer is chromium plate, apart from the size 100um ~ 200um of substrate;
To photoresist developing sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
Etching transparency conducting layer, forms transparency conducting layer electrode figure, and material is used in etching: HCL60% ~ 65%+HO240% ~ 35%, and temperature: 40 ~ 45 ℃, the time: 120 ~ 220 seconds;
Remove photoresist, form transparent conductive patterns functional electrode, use material: NaOH, concentration 2.0 ~ 1.5 MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, finally use pure water rinsing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310614136.7A CN103645818A (en) | 2013-11-26 | 2013-11-26 | Sapphire touch screen and producing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310614136.7A CN103645818A (en) | 2013-11-26 | 2013-11-26 | Sapphire touch screen and producing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103645818A true CN103645818A (en) | 2014-03-19 |
Family
ID=50251045
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310614136.7A Pending CN103645818A (en) | 2013-11-26 | 2013-11-26 | Sapphire touch screen and producing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103645818A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103761001A (en) * | 2013-12-23 | 2014-04-30 | 合肥晶桥光电材料有限公司 | Composite sapphire screen |
| CN104657019A (en) * | 2015-02-10 | 2015-05-27 | 苏州亚晶新材料有限公司 | Polycrystalline transparent ceramic touch screen and preparation method thereof |
| WO2015149852A1 (en) * | 2014-04-03 | 2015-10-08 | Vertu Corporation Limited | Antenna radiator integrated to touch sensitive device for mobile apparatus |
| CN105335075A (en) * | 2014-05-26 | 2016-02-17 | 南昌欧菲光学技术有限公司 | Terminal device and touch screen |
| CN106033288A (en) * | 2015-03-17 | 2016-10-19 | 南昌欧菲光学技术有限公司 | Touch screen cover plate and manufacturing method thereof |
| CN106648228A (en) * | 2016-12-12 | 2017-05-10 | 晟光科技股份有限公司 | OGS functional layer protecting and processing method |
| JP2017114761A (en) * | 2014-04-18 | 2017-06-29 | アップル インコーポレイテッド | Coated substrate and process for cutting a coated substrate |
| CN110582730A (en) * | 2017-03-27 | 2019-12-17 | Fgp资本公司 | reading device for a device with a glass or screen |
| CN110603496A (en) * | 2017-03-17 | 2019-12-20 | Fgp资本公司 | Devices comprising crystals or screens |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013134159A2 (en) * | 2012-03-06 | 2013-09-12 | Apple Inc. | Sapphire laminates |
| CN203250298U (en) * | 2013-04-02 | 2013-10-23 | 深圳市泽金光学电子有限公司 | Abrasion-resistant capacity touch screen |
-
2013
- 2013-11-26 CN CN201310614136.7A patent/CN103645818A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013134159A2 (en) * | 2012-03-06 | 2013-09-12 | Apple Inc. | Sapphire laminates |
| CN203250298U (en) * | 2013-04-02 | 2013-10-23 | 深圳市泽金光学电子有限公司 | Abrasion-resistant capacity touch screen |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103761001A (en) * | 2013-12-23 | 2014-04-30 | 合肥晶桥光电材料有限公司 | Composite sapphire screen |
| WO2015149852A1 (en) * | 2014-04-03 | 2015-10-08 | Vertu Corporation Limited | Antenna radiator integrated to touch sensitive device for mobile apparatus |
| JP2017114761A (en) * | 2014-04-18 | 2017-06-29 | アップル インコーポレイテッド | Coated substrate and process for cutting a coated substrate |
| CN105335075A (en) * | 2014-05-26 | 2016-02-17 | 南昌欧菲光学技术有限公司 | Terminal device and touch screen |
| CN104657019A (en) * | 2015-02-10 | 2015-05-27 | 苏州亚晶新材料有限公司 | Polycrystalline transparent ceramic touch screen and preparation method thereof |
| CN106033288A (en) * | 2015-03-17 | 2016-10-19 | 南昌欧菲光学技术有限公司 | Touch screen cover plate and manufacturing method thereof |
| CN106648228A (en) * | 2016-12-12 | 2017-05-10 | 晟光科技股份有限公司 | OGS functional layer protecting and processing method |
| CN110603496A (en) * | 2017-03-17 | 2019-12-20 | Fgp资本公司 | Devices comprising crystals or screens |
| CN110582730A (en) * | 2017-03-27 | 2019-12-17 | Fgp资本公司 | reading device for a device with a glass or screen |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103645818A (en) | Sapphire touch screen and producing method thereof | |
| JP5878562B2 (en) | Cover glass for electronic equipment, manufacturing method thereof, and touch sensor module for electronic equipment | |
| US9740315B2 (en) | Touch panel and method of manufacturing the same | |
| TWI610209B (en) | Thin film sensor, capacitive touch panel having the same, preparation method thereof and terminal product | |
| US9417745B2 (en) | Touch screen, the manufacturing method of the touch screen and display device | |
| US20150041303A1 (en) | Novel ito crossover integrated capacitive touch screen and manufacturing method thereof | |
| JP2010195600A (en) | Methods for manufacturing glass substrate for electronic device and electronic device | |
| WO2018024133A1 (en) | Touch panel, preparation method therefor, and add-on-mode touch display device | |
| CN102200654A (en) | Integrated touch display device and making method thereof | |
| WO2013143292A1 (en) | Touch sensor, manufacturing method therefor and liquid crystal display with touch screen | |
| US11907456B2 (en) | Touch substrate, display panel, and touch display device | |
| CN103294306A (en) | Simplified production method for capacitive touch screen | |
| TW201519021A (en) | Method for carrying out edge etching and strengthening of OGS (One-Glass-Solution) touch panel with one-time film lamination | |
| CN103019496A (en) | Capacitive touch module, manufacturing method for same and capacitive touch screen panel | |
| CN102778988B (en) | Integration projected capacitive touch screen display apparatus module and manufacture method thereof | |
| TW201145127A (en) | Touch panel structure and making the same | |
| JP2012155644A (en) | Manufacturing method of touch panel integrated with decoration cover glass, and liquid crystal display | |
| CN203606819U (en) | Sapphire touch screen | |
| CN202217249U (en) | Touch-on-lens (TOL) device | |
| CN104252278A (en) | OGS (one-glass solution) touch screen substrate, manufacturing method of OGS touch screen substrate and related equipment | |
| CN109725777B (en) | Touch substrate, manufacturing method thereof and touch display device | |
| WO2015027637A1 (en) | Touchscreen and manufacturing method therefor, and display device | |
| CN103294310A (en) | Manufacture method of OGS (one glass solution) touch screen | |
| CN103324376A (en) | One-chip type capacitive touch screen and preparation method thereof | |
| CN103853395A (en) | Capacitive screen and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140319 |
|
| WD01 | Invention patent application deemed withdrawn after publication |