CN103294306A - Simplified production method for capacitive touch screen - Google Patents

Abstract

The invention discloses a simplified production method for a capacitive touch screen. The simplified production method includes a pattern electrode production process of respectively producing a first transparent conductive layer and a second transparent conductive layer on a glass substrate with a double-sided conductive layer; subjecting the first transparent conductive layer and a second conductive film to gluing, exposing, developing and hardening, and etching and stripping simultaneously to realize imagining of the first conductive layer and the second conductive layer and form a first group of sensing electrodes and a second group of sensing electrodes and lead electrodes simultaneously as well. By the method, processing is can be greatly simplified, investment and cost are reduced, and good yield rate and production efficiency are improved at the same time.

Description

A kind of capacitive touch screen method for making of simplification

Technical field

The present invention relates to the touch-screen field, be specifically related to a kind of capacitive touch screen method for making of simplification.

Background technology

At present, touch panel is as a kind of input equipment of intelligence, has the close friend, the interactive operation interface of hommization, therefore be applied to more and more widely on the various portable sets, as mobile phone, notebook, PDA etc., touch-screen generally can be divided into resistance-type based on touching principle, condenser type, infrared-type, table sound wave type etc., capacitive touch screen is quick on the draw owing to having, multiple point touching, the characteristics that life-span is long, and the continuous maturation along with capacitance touching control IC technology, the reduction of cost has become smart mobile phone up till now, the main flow touch screen technology in fields such as panel computer.

As shown in Figure 1, capacitive touch screen generally comprises glass substrate 11, sensing electrode layer 12,13 and lead-in wire electrode 14: sensing electrode layer 12,13 is produced on the glass substrate 11, comprise that a plurality of first sensing electrode 12 and a plurality of second sensing electrode, 13, the first sensing electrodes 12 and second sensing electrodes 13 that extend along second direction that extend along first direction intersect to form the sense node array mutually; Each first sensing electrode does not electrically link to each other each other, does not electrically link to each other mutually between each second sensing electrode, does not electrically link to each other mutually between first sensing electrode 12 and second sensing electrode 13.First sensing electrode 12 and second sensing electrode 13 generally are through graphically forming by tin indium oxide (ITO) film.Lead-in wire electrode 14 can be the photoetching metal lead wire, also can be silk-screen silver slurry lead-in wire.When the user contacted the cover plate cover glass with finger, first sensing electrode 12 at contact point place and the mutual capacitance between second sensing electrode 13 changed, and detected by check circuit, can judge the generation of touch and the coordinate of touch point.

Fig. 2 represents a kind of method for making of traditional capacitive touch screen, be two-sided ITO sensing electrode and the technological process of two-sided silver slurry pin configuration capacitive touch screen, idiographic flow is: cleaning → sputtering ITO 1 → cleaning → gluing → exposure → development → post bake → etching → striping → check → cleaning → sputtering ITO 2 → cleaning → gluing → exposure → development → post bake → etching → striping → check → cleaning-→ ITO1 silk-screen silver slurry → curing → cleaning → ITO2 face silk-screen silver slurry → solidify → check, comprise 26 steps altogether.

The equipment that above-mentioned capacitive touch screen technology relates to comprises several magnetron sputtering apparatus, several cleanings, gluing, exposure, development, etching, striping equipment and several screen printing apparatus, equipment investment cost is very high, and the complex process that relates to, the product yield is difficult to improve, and cost of products is difficult to reduce significantly.

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Summary of the invention

Purpose of the present invention is exactly to drop into height, complex process, the too high problem of cost at existing capacitive touch screen production process equipment, proposes a kind of capacitive touch screen method for making of simplification.

For solving above-mentioned technical matters, technical scheme provided by the invention is:

A kind of capacitive touch screen method for making of simplification is characterized in that, includes following steps:

(1) first glass substrate cleans, and removes grit, stain and the fingerprint etc. of glass baseplate surface;

(2) utilize the mode of vacuum magnetic-control sputtering to make first ito thin film layer and second ito thin film layer respectively on the glass substrate two sides, form two-sided ito glass;

Concrete technological parameter:

Plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;

(3) first ito thin film layer carried out gluing, exposure, development, post bake technology; Then second ito thin film layer carried out gluing, exposure, development, post bake technology;

Concrete technological parameter:

The coating photoresist covers the ito thin film layer, the thickness 1600 ~ 2000nm of photoresist, and in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;

Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um ~ 200um of substrate;

To photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;

(4) simultaneously etching and striping are carried out in the two sides of ito glass, adopt the ITO circuit as the lead-in wire of ITO electrode, form touch-screen;

Concrete technological parameter:

Etching ito thin film layer forms ito thin film layer electrode pattern, and material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, and the time: 120 ~ 220 seconds;

When making the ITO pattern electrode, form the ITO lead-in wire, be connected second group of external wire of FPC as first group of external wire of first ITO electrode connection FPC with second ITO electrode;

Remove photoresist, form the ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use the pure water rinsing at last.

Advantage of the present invention is:

Compared with prior art, the method for making of capacitive touch screen of the present invention can be simplified production technology greatly, reduces equipment investment, reduce cost of products, and is conducive to improve the production yields, particularly:

1, reduced closely 40% with respect to existing capacitive touch screen method for making, simplified production technology greatly.

2, two-sided ito glass can directly be bought, and has therefore saved expensive magnetron sputtering apparatus, has saved cost of investment greatly, has improved production efficiency.

3, directly replace silk-screen silver slurry lead-in wire with the ITO lead-in wire, saved silk-screen printing technique, not only saved equipment and Material Cost, saved technological process, and can realize that narrow frame design, yields and the production efficiency of product improve greatly.

 

Description of drawings

Fig. 1 is the structural representation of existing capacitive touch screen.

Fig. 2 is the synoptic diagram of the method for making flow process of traditional capacitive touch screen.

Fig. 3 is the structural representation of two-sided ito glass.

Fig. 4 is the synoptic diagram of the capacitive touch screen method for making flow process after improving.

 

Embodiment

A kind of capacitive touch screen method for making of simplification includes following steps:

(1) first glass substrate cleans, and removes grit, stain and the fingerprint etc. of glass baseplate surface;

(2) utilize the mode of vacuum magnetic-control sputtering to make first ito thin film layer and second ito thin film layer respectively on the glass substrate two sides, form two-sided ito glass;

Concrete technological parameter:

Plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;

As shown in Figure 3, utilize the method for vacuum sputtering to form the ITO conducting film respectively at the upper and lower surface of glass substrate 31, form the first sensing electrode layer 32 and the second sensing electrode layer 33;

(3) first ito thin film layer carried out gluing, exposure, development, post bake technology; Then second ito thin film layer carried out gluing, exposure, development, post bake technology;

Concrete technological parameter:

The coating photoresist covers the ito thin film layer, the thickness 1600 ~ 2000nm of photoresist, and in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;

Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um ~ 200um of substrate;

To photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;

(4) simultaneously etching and striping are carried out in the two sides of ito glass, adopt the ITO circuit as the lead-in wire of ITO electrode, form touch-screen;

Concrete technological parameter:

Etching ito thin film layer forms ito thin film layer electrode pattern, and material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, and the time: 120 ~ 220 seconds;

When making the ITO pattern electrode, form the ITO lead-in wire, be connected second group of external wire of FPC as first group of external wire of first group of sensing electrode connection FPC with second group of sensing electrode;

Remove photoresist, form the ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use the pure water rinsing at last.

Referring to Fig. 4, be capacitive touch screen method for making one preferred embodiment of the present invention, be two-sided ito glass substrate technology, idiographic flow comprises: cleaning → sputtering ITO face 1 → sputtering ITO face 2 → cleaning → ito surface 1 gluing → exposure → development → post bake → ito surface 2 gluings → exposure → development → post bake → etching (ito surface 1 and 2 is carried out etching simultaneously) → striping (ito surface 1 and 2 is carried out striping simultaneously) → check.

Can find that according to the described flow process of figure this touch technology has reduced by 15 process steps, therefore simplify production technology greatly, reduce cost.

Owing to directly utilize the ITO lead-in wire to replace silk-screen silver slurry lead-in wire, saved screen printing apparatus and silver slurry Material Cost simultaneously, technological process reduces, and cost of products further reduces, so the capacitance touch screen products that the present invention produces has the great market advantage.

Only be preferred implementation of the present invention below, should be pointed out that above-mentioned preferred implementation should not be considered as limitation of the present invention, protection scope of the present invention should be as the criterion with claim institute restricted portion.For those skilled in the art, without departing from the spirit and scope of the present invention, can also make some improvements and modifications, these improvements and modifications all should be considered as protection scope of the present invention.

Claims (1)

1. the capacitive touch screen method for making of a simplification is characterized in that, includes following steps:

(1) first glass substrate cleans, and removes grit, stain and the fingerprint etc. of glass baseplate surface;

(2) utilize the mode of vacuum magnetic-control sputtering to make first ito thin film layer and second ito thin film layer respectively on the glass substrate two sides, form two-sided ito glass;

Concrete technological parameter:

Plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;

(3) first ito thin film layer carried out gluing, exposure, development, post bake technology; Then second ito thin film layer carried out gluing, exposure, development, post bake technology;

Concrete technological parameter:

The coating photoresist covers the ito thin film layer, the thickness 1600 ~ 2000nm of photoresist, and in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;

Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um ~ 200um of substrate;

To photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;

(4) simultaneously etching and striping are carried out in the two sides of ito glass, adopt the ITO circuit as the lead-in wire of ITO electrode, form touch-screen;

Concrete technological parameter:

Etching ito thin film layer forms ito thin film layer electrode pattern, and material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, and the time: 120 ~ 220 seconds;

When making the ITO pattern electrode, form the ITO lead-in wire, be connected second group of external wire of FPC as first group of external wire of first ITO electrode connection FPC with second ITO electrode;

Remove photoresist, form the ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use the pure water rinsing at last.

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