CN106033288A - Touch screen cover plate and manufacturing method thereof - Google Patents
Touch screen cover plate and manufacturing method thereof Download PDFInfo
- Publication number
- CN106033288A CN106033288A CN201510116447.XA CN201510116447A CN106033288A CN 106033288 A CN106033288 A CN 106033288A CN 201510116447 A CN201510116447 A CN 201510116447A CN 106033288 A CN106033288 A CN 106033288A
- Authority
- CN
- China
- Prior art keywords
- film
- cover plate
- touch screen
- screen cover
- reflecting layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 3
- 239000000758 substrate Substances 0.000 claims abstract description 91
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 11
- 229910052777 Praseodymium Inorganic materials 0.000 claims abstract description 10
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims abstract description 10
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 9
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims abstract description 9
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims abstract description 8
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 6
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000005083 Zinc sulfide Substances 0.000 claims abstract description 4
- 229910052984 zinc sulfide Inorganic materials 0.000 claims abstract description 4
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000012528 membrane Substances 0.000 claims description 60
- 239000003795 chemical substances by application Substances 0.000 claims description 58
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- 239000002253 acid Substances 0.000 claims description 27
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 26
- 238000002360 preparation method Methods 0.000 claims description 24
- 239000000872 buffer Substances 0.000 claims description 22
- 235000012239 silicon dioxide Nutrition 0.000 claims description 21
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 19
- 239000011521 glass Substances 0.000 claims description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- 230000003647 oxidation Effects 0.000 claims description 15
- 238000007254 oxidation reaction Methods 0.000 claims description 15
- 238000007639 printing Methods 0.000 claims description 15
- 239000004408 titanium dioxide Substances 0.000 claims description 13
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- VKJLWXGJGDEGSO-UHFFFAOYSA-N barium(2+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[Ti+4].[Ba+2] VKJLWXGJGDEGSO-UHFFFAOYSA-N 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 229910010272 inorganic material Inorganic materials 0.000 claims description 11
- 239000011147 inorganic material Substances 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 10
- 238000002604 ultrasonography Methods 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 9
- 229910052804 chromium Inorganic materials 0.000 claims description 9
- 239000011651 chromium Substances 0.000 claims description 9
- 229910052749 magnesium Inorganic materials 0.000 claims description 9
- 239000011777 magnesium Substances 0.000 claims description 9
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 8
- 229910052725 zinc Inorganic materials 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 8
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 7
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
- 241001132374 Asta Species 0.000 claims description 6
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 6
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 6
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 claims description 6
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910052738 indium Inorganic materials 0.000 claims description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 5
- 229910017604 nitric acid Inorganic materials 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 claims description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 claims description 4
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 4
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 4
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001117 sulphuric acid Substances 0.000 claims description 4
- 235000011149 sulphuric acid Nutrition 0.000 claims description 4
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 229910052712 strontium Inorganic materials 0.000 claims description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 3
- 229940105963 yttrium fluoride Drugs 0.000 claims description 3
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000003682 fluorination reaction Methods 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 abstract 1
- 229910002113 barium titanate Inorganic materials 0.000 abstract 1
- 229910052746 lanthanum Inorganic materials 0.000 abstract 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 20
- 238000007650 screen-printing Methods 0.000 description 19
- 238000012360 testing method Methods 0.000 description 13
- 238000013461 design Methods 0.000 description 11
- 238000007711 solidification Methods 0.000 description 9
- 230000008023 solidification Effects 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 238000002207 thermal evaporation Methods 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 5
- 229940040526 anhydrous sodium acetate Drugs 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229960003975 potassium Drugs 0.000 description 5
- 239000011591 potassium Substances 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 239000007974 sodium acetate buffer Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- XRADHEAKQRNYQQ-UHFFFAOYSA-K trifluoroneodymium Chemical compound F[Nd](F)F XRADHEAKQRNYQQ-UHFFFAOYSA-K 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- 241000209094 Oryza Species 0.000 description 3
- 235000007164 Oryza sativa Nutrition 0.000 description 3
- 229910003978 SiClx Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- NMLQNVRHVSWEGS-UHFFFAOYSA-N [Cl].[K] Chemical compound [Cl].[K] NMLQNVRHVSWEGS-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 235000009566 rice Nutrition 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 2
- 235000005979 Citrus limon Nutrition 0.000 description 2
- 244000131522 Citrus pyriformis Species 0.000 description 2
- 241000790917 Dioxys <bee> Species 0.000 description 2
- 241001312741 Gekko swinhonis Species 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000001508 potassium citrate Substances 0.000 description 2
- 229960002635 potassium citrate Drugs 0.000 description 2
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 2
- 235000011082 potassium citrates Nutrition 0.000 description 2
- 239000012286 potassium permanganate Substances 0.000 description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 2
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 2
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910006069 SO3H Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- SHPBBNULESVQRH-UHFFFAOYSA-N [O-2].[O-2].[Ti+4].[Zr+4] Chemical compound [O-2].[O-2].[Ti+4].[Zr+4] SHPBBNULESVQRH-UHFFFAOYSA-N 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000002927 oxygen compounds Chemical group 0.000 description 1
- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention relates to a touch screen cover plate and a manufacturing method thereof. The touch screen cover plate comprises a substrate, a reflecting layer, and an ink layer. The reflecting layer is formed on one surface of the substrate. The reflecting layer is arranged on the periphery of the edge of the substrate. The reflecting layer is a metal elemental film or a compound film. The compound film is one selected from an oxide film, a fluoride film, a zinc sulfide film, a zinc selenide film, a titanium nitride film, a silicon carbide film, a lanthanum titanate film, a barium titanate film, a strontium titanate film, a praseodymium titanate film, and a cadmium sulfide film. The ink layer is on the reflecting layer, and the ink layer can reflect light which passes through the reflecting layer back to the reflecting layer. The touch screen cover plate has relatively high reflectivity, so glossiness of the touch screen cover plate is good.
Description
Technical field
The present invention relates to touch screen field, particularly relates to a kind of touch screen cover plate and preparation method thereof.
Background technology
Universal along with smart mobile phone and panel computer, the processing technology of touch screen (Touch Panel) is continuous
Improving, capacitive touch screen cover plate has become current main flow.The frame of the touch screen cover plate of present stage is mostly
It is the technique using silk-screen black and white ink, and black and white outward appearance cannot meet consumer's pursuit to fashion,
Therefore, various frame colour mobile phones are favored by masses gradually.Although ink colors is various, but due to oil
Self dull of ink so that touch screen cover plate all seems intensely dark.
Summary of the invention
In consideration of it, be necessary to provide a kind of glossiness preferable touch screen cover plate.
Additionally, also provide for the preparation method of a kind of touch screen cover plate.
A kind of touch screen cover plate, including:
Substrate；
Reflecting layer, is formed on a surface of described substrate, and described reflecting layer is along the edge of described substrate
Arranging one week, described reflecting layer is metal simple-substance film or compound film, described compound film selected from oxidation film,
Fluoride films, ZnS-film, zinc selenide film, titanium nitride film, silicon carbide film, lanthanium titanate film, Barium metatitanate. film,
One in Strontium titanate films, metatitanic acid praseodymium film and cadmium sulphide film；And
Ink layer, is arranged on described reflecting layer, and described ink layer can make the light through described reflecting layer anti-
It is emitted back towards described reflecting layer.
Wherein in an embodiment, described substrate is glass plate, quartz plate, alumina plate or transparent organic
Plate.
Wherein in an embodiment, described oxidation film is selected from pellumina, silicon monoxide film, titanium dioxide
Silicon fiml, titanium dioxide film, zirconium dioxide film, hafnium oxide film, titanium monoxide film, five oxidation three titanium films,
One in niobium pentaoxide film, tantalum pentoxide film, yittrium oxide film and Zinc oxide film.
Wherein in an embodiment, described fluoride films selected from neodymium fluoride film, barium fluoride film, cerium fluoride film,
One in Afluon (Asta) film, lanthanum fluoride film and yttrium fluoride film.
Wherein in an embodiment, described metal simple-substance film is selected from copper film, titanium film, gold film, silverskin, indium
One in film, magnesium film, zinc film, platinum film, germanium film, nickel film and chromium film.
Wherein in an embodiment, the thickness in described reflecting layer is 0.1 nanometer～10 microns.
The preparation method of a kind of touch screen cover plate, comprises the steps:
Coating inorganic material on a surface of substrate, and make described inorganic material hide described surface, shape
Becoming inoranic membrane, described inorganic material is metal simple-substance or compound, and described compound is selected from oxide, fluorination
Thing, zinc sulfide, zinc selenide, titanium nitride, carborundum, lanthanium titanate, Barium metatitanate., strontium titanates, metatitanic acid praseodymium and
One in cadmium sulfide；
Coating printing ink on the edge of described inoranic membrane one week, cured, form ink layer, and described ink
Inoranic membrane described in layer covering part；
Being removed by the described inoranic membrane not hidden by described ink layer, remaining described inoranic membrane is reflecting layer,
Obtaining described touch screen cover plate, described ink layer can make the luminous reflectance through described reflecting layer go back to described reflecting layer.
Wherein in an embodiment, the step that the described inoranic membrane not hidden by described ink layer is removed is had
Body is: soaked 0.5～10 minute in strip agent under conditions of 20～150 DEG C by described substrate.
Wherein in an embodiment, the step that the described inoranic membrane not hidden by described ink layer is removed is had
Body is: described substrate soaks under ultrasound condition in strip agent 0.5～10 minute, wherein, ultrasound intensity
For 2KHz～1000KHz.
Wherein in an embodiment, described strip agent includes following component according to mass fraction: 70%～80%
The buffer agent of acid, 15%～20% and the oxidant of 3%～15%；Described acid be Fluohydric acid., sulphuric acid, hydrochloric acid,
Nitric acid, sulfonic acid, sulfinic acid, carboxylic acid or thionothiolic acid；Described buffer agent be Fructus Citri Limoniae class buffer agent, acetate type delay
Electuary or amine buffer agent；Described oxidant is permanganate, bichromate, hydrogen peroxide, hypochlorite
Or perchlorate.
Due to a kind of electromagnetic wave with certain wavelength, and the spread speed that light is in different medium is different,
When light travels to the interface of two media, a part of light can be reflected back original matter, another part light
Can deflect so that light occurs reflection and refraction, and existing ink is relatively low to the reflectance of light, causes tactile
Touch screen cover plate intensely dark, and above-mentioned touch screen cover plate be by arranging reflecting layer between substrate and ink layer,
Make the contact interface in reflecting layer and ink layer of the light through reflecting layer be reflected back reflecting layer, and reflecting layer is
Metal simple-substance film or compound film, compound film is selected from oxidation film, fluoride films, ZnS-film, selenizing
Zinc film, titanium nitride film, silicon carbide film, lanthanium titanate film, Barium metatitanate. film, Strontium titanate films, metatitanic acid praseodymium film and sulfur
One in cadmium film, the anti-of the contact interface of reflecting layer and ink layer can be improved in the reflecting layer of above-mentioned material
Penetrate rate, thus be effectively improved the reflectance of entirety, so that touch screen cover plate has preferable glossiness.
Accompanying drawing explanation
Fig. 1 is the structural representation of the touch screen cover plate of an embodiment；
Fig. 2 is the exploded view of the touch screen cover plate shown in Fig. 1；
Fig. 3 is the flow chart of the preparation method of the touch screen of an embodiment；
Fig. 4 is the structural representation of the substrate in Fig. 3；
Fig. 5 is the schematic diagram after the substrate of Fig. 4 is formed with inoranic membrane；
Fig. 6 is the exploded view of the substrate being formed with inoranic membrane of Fig. 5；
Fig. 7 is the schematic diagram after the substrate of Fig. 5 is formed with ink layer；
Fig. 8 is the exploded view of the substrate being formed with ink layer of Fig. 7.
Detailed description of the invention
For the ease of understanding the present invention, below with reference to relevant drawings, the present invention is described more fully.
Accompanying drawing gives the preferred embodiment of the present invention.But, the present invention can come in many different forms
Realize, however it is not limited to embodiment described herein.On the contrary, provide the purpose of these embodiments be make right
The understanding of the disclosure is more thorough comprehensively.
It should be noted that when element is referred to as " being fixed on " another element, and it can be directly at another
On individual element or element placed in the middle can also be there is.When an element is considered as " connection " another yuan
Part, it can be directly to another element or may be simultaneously present centering elements.Used herein
Term " vertical ", " level ", "left", "right" and similar statement simply to illustrate that mesh
's.
Unless otherwise defined, all of technology used herein and scientific terminology and the technology belonging to the present invention
The implication that the technical staff in field is generally understood that is identical.The art used the most in the description of the invention
Language is intended merely to describe the purpose of specific embodiment, it is not intended that in limiting the present invention.Used herein
Term " and/or " include the arbitrary and all of combination of one or more relevant Listed Items.
As shown in Figures 1 and 2, the touch screen cover plate 100 of an embodiment, including substrate 110, reflecting layer
120 and ink layer 130.
Wherein, substrate 110 is glass plate, quartz plate, alumina plate or transparent organic plates.
The thickness of substrate 110 is 0.01～10 millimeter；Preferably, the thickness of substrate 110 is 0.1～5 millimeter；
It is furthermore preferred that the thickness of substrate 110 is 0.3～2 millimeter.
Reflecting layer 120 is formed on a surface of substrate 110, and reflecting layer 120 is along the limit of substrate 110
Edge arranges one week.Substrate 110 is divided into viewing area and shows around the non-of viewing area by i.e. reflecting layer 120
Showing region, the position of non-display area is corresponding with reflecting layer 120.
Wherein, reflecting layer 120 is metal simple-substance film or compound film.
Metal simple-substance film is selected from copper film, titanium film, gold film, silverskin, indium film, magnesium film, zinc film, platinum film, germanium
One in film, nickel film and chromium film.
Compound film is selected from oxidation film, fluoride films, ZnS-film, zinc selenide film, titanium nitride film, carbon
One in SiClx film, lanthanium titanate film, Barium metatitanate. film, Strontium titanate films, metatitanic acid praseodymium film and cadmium sulphide film.
Oxidation film is selected from pellumina, silicon monoxide film, silicon dioxide film, titanium dioxide film, titanium dioxide
Zirconium film, hafnium oxide film, titanium monoxide film, five oxidation three titanium films, niobium pentaoxide film, tantalum pentoxides
One in film, yittrium oxide film and Zinc oxide film.
Fluoride films is selected from neodymium fluoride film, barium fluoride film, cerium fluoride film, Afluon (Asta) film, lanthanum fluoride film and fluorine
Change the one in yttrium film.
Preferably, the thickness in reflecting layer 120 is 0.1 nanometer～10 microns；Further, reflecting layer 120
Thickness is 1 nanometer～1 micron；It is furthermore preferred that the thickness in reflecting layer 120 is 3～300 nanometers.
Being appreciated that the number of plies in reflecting layer 120 can be one layer can also be multilamellar.Wherein, reflecting layer is worked as
120 when being multilamellar, and the material of multilayer reflective layers 120 can be identical, it is also possible to differs.
Ink layer 130 is arranged on reflecting layer 120, and ink layer 130 can make the light through reflecting layer 120
It is reflected back reflecting layer 120.Wherein, the shape of ink layer 130 is consistent with the shape in reflecting layer 120.
The material of ink layer 130 is thermohardening type printing ink or UV curable ink.Such as, thermohardening type oil
Ink can be the S-200 series HD-3 ink of TAIYO INK company；UV curable ink can be good
The cc-103 type ink of Bao Li company.
The number of plies being appreciated that ink layer 130 can be one layer or multilamellar.All ink layeies 130 total
Thickness is 1 nanometer～1 millimeter.I.e. when ink layer 130 is one layer, the thickness of this layer of ink layer 130 is 1
Nanometer～1 millimeter；When ink layer 130 is multilamellar, the thickness sum of multilamellar ink layer 130 is 1 nanometer～1
Millimeter；Preferably, the gross thickness of all ink layeies 130 is 1 micron～100 microns；It is furthermore preferred that it is all
The gross thickness of ink layer 130 is 3 microns～20 microns.
Due to a kind of electromagnetic wave with certain wavelength, and the spread speed that light is in different medium is different,
When light travels to the interface of two media, a part of light can be reflected back original matter, another part light
Can deflect so that light occurs reflection and refraction, and existing ink is relatively low to the reflectance of light, causes tactile
Touch screen cover plate intensely dark, and above-mentioned touch screen cover plate 100 is by between substrate 110 and ink layer 130
Arranging reflecting layer 120, and reflecting layer 120 is metal simple-substance film or compound film, described compound film is selected from oxygen
Compound film, fluoride films, ZnS-film, zinc selenide film, titanium nitride film, silicon carbide film, lanthanium titanate film,
One in Barium metatitanate. film, Strontium titanate films, metatitanic acid praseodymium film and cadmium sulphide film, above-mentioned reflecting layer 120 can change
The reflection of kind interface, thus it is effectively improved the reflectance of entirety, cause touch screen cover plate 100 to have preferably
Glossiness.
As it is shown on figure 3, the preparation method of the touch screen cover plate of an embodiment, can be used for preparing above-mentioned touch
Screen cover plate.The preparation method of the touch screen cover plate of present embodiment comprises the steps:
Step S210: coating inorganic material on a surface of substrate, and make inorganic material hide substrate
This surface, forms inoranic membrane.
Wherein, substrate is glass plate, quartz plate, alumina plate or transparent organic plates.See also Fig. 4,
Fig. 4 is the structural representation of substrate 300.
The thickness of substrate is 0.01～10 millimeter；Preferably, the thickness of substrate is 0.1～5 millimeter；It is furthermore preferred that
The thickness of substrate is 0.3～2 millimeter.
See also Fig. 5 and Fig. 6, on a surface of substrate 300 after coating inorganic material, formed inorganic
Film 400, the shape size of inoranic membrane 400 is consistent with the shape size on this surface of substrate 300.
Inorganic material is metal simple-substance or compound, and compound is selected from oxide, fluoride, zinc sulfide, selenium
Change the one in zinc, titanium nitride, carborundum, lanthanium titanate, Barium metatitanate., strontium titanates, metatitanic acid praseodymium and cadmium sulfide.
Metal simple-substance one in copper, titanium, gold, silver, indium, magnesium, zinc, platinum, germanium, nickel and chromium.
Oxide is selected from aluminium oxide, silicon monoxide, silicon dioxide, titanium dioxide, zirconium dioxide, titanium dioxide
In hafnium, titanium monoxide, five oxidation Tritanium/Trititaniums, niobium pentaoxide, tantalum pentoxide, yittrium oxide and zinc oxide
A kind of.
Fluoride one in neodymium fluoride, barium fluoride, cerium fluoride, Afluon (Asta), lanthanum fluoride and yttrium fluoride.
Preferably, the thickness in reflecting layer is 0.1 nanometer～10 microns；Further, the thickness in reflecting layer is 1
Nanometer～1 micron；It is furthermore preferred that the thickness in reflecting layer is 3～300 nanometers.
Concrete, it can also be multilamellar that the number of plies in reflecting layer can be one layer.It is appreciated that the layer in reflecting layer
It can also be multilamellar that number can be one layer.Wherein, when reflecting layer is multilamellar, the material of multilayer reflective layers can
With identical, it is also possible to differ.
Wherein, on a surface of substrate, the method for coating inorganic material can be vacuum thermal evaporation, magnetic
Control sputtering method, ion vapour deposition method, electroless plating, electrochemical plating embrane method, chemical vapour deposition technique or physics
Vapour deposition process.
Step S220: coating printing ink on the edge of inoranic membrane one week, cured, form ink layer, and oil
Layer of ink covering part inoranic membrane.
See also Fig. 7 and Fig. 8, on inoranic membrane 400 after coating printing ink, inoranic membrane 400 is formed
Ink layer 500, ink layer 500 is arranged along the edge of the one side being formed with inoranic membrane 400 of substrate for one week.
The material of ink layer is thermohardening type printing ink or UV curable ink.
Wherein, the solidification temperature of thermohardening type printing ink is 100～200 DEG C, and hardening time is 10～30 minutes；
The solidification energy of UV curable ink is 300～1200mJ/cm2。
Concrete, the number of plies of ink layer can be one layer or multilamellar.The gross thickness of all ink layeies is 1 to receive
Rice～1 millimeter.I.e. when ink layer is one layer, the thickness of this layer of ink layer is 1 nanometer～1 millimeter；Work as ink
Layer is when being multilamellar, and the thickness sum of multilamellar ink layer is 1 nanometer～1 millimeter；Preferably, all ink layeies
Gross thickness is 1 micron～100 microns；It is furthermore preferred that the gross thickness of all ink layeies is 3 microns～20 microns.
Wherein, on inoranic membrane, the method for coating printing ink is silk screen printing, sprays or transfer.
Step S230: the inoranic membrane not hidden by ink layer is removed, remaining inoranic membrane is reflecting layer,
To touch screen cover plate, ink layer can make the luminous reflectance back reflection layer through reflecting layer.
I.e. after step S230, just obtain touch screen cover plate as depicted in figs. 1 and 2.
The step that the inoranic membrane that do not hidden by ink layer is removed can particularly as follows: use strip agent spray substrate,
The inoranic membrane not hidden by ink layer with removal.
The inoranic membrane that do not hidden by ink layer is removed and is preferably following method, by substrate at the bar of 20～150 DEG C
Soak 0.5～10 minute in strip agent under part, the inoranic membrane not hidden by ink layer with removal.Preferably,
Temperature during strip is 30～100 DEG C；It is furthermore preferred that temperature during strip is 45～75 DEG C.
Or, substrate is soaked under ultrasound condition in strip agent 0.5～10 minute, wherein, ultrasound intensity
For 2KHz～1000KHz, remove the inoranic membrane not hidden by ink layer and remove.Preferably, surpassing during strip
Sound intensity is 10KHz～100KHz；It is furthermore preferred that ultrasound intensity during strip is 20KHz～60KHz.
Wherein, strip agent can be alkaline decoating liquid F-15 or Shen Zhenze of Tianjin Gekko Swinhonis detergent company limited
The acid decoating liquid 301 of health Science and Technology Ltd..
Preferably, strip agent includes following component according to mass fraction: acid, 15%～20% of 70%～80%
Buffer agent and the oxidant of 3%～15%.
Wherein, acid is preferably Fluohydric acid. (HF), sulphuric acid (H2SO4), hydrochloric acid (HCl), nitric acid (HNO3)、
Sulfonic acid (R-SO3H), sulfinic acid (R-SOOH), carboxylic acid (R-COOH) or thionothiolic acid (R-COSH).
Carboxylic acid can be formic acid, acetic acid, propanoic acid etc..
Buffer agent is preferably Fructus Citri Limoniae class buffer agent, acetate type buffer agent or amine buffer agent.Such as, Fructus Citri Limoniae class
Buffer agent can be potassium citrate buffer agent；Acetate type buffer agent can be anhydrous sodium acetate buffer agent；Amine
Buffer agent can be Tris etc..
Oxidant is preferably permanganate, bichromate, hydrogen peroxide, hypochlorite or perchlorate.Example
As, permanganate can be potassium permanganate；Bichromate can be potassium dichromate, sodium dichromate etc.；Secondary chlorine
Hydrochlorate can be subacid chlorine potassium, sodium hypochlorite etc.；Perchlorate can be potassium hyperchlorate, sodium perchlorate etc..
The preparation method of above-mentioned touch screen cover plate is relatively simple, and manufacturing procedure is less.
It is below specific embodiment part:
Embodiment 1
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) vacuum thermal evaporation is used to be deposited with oxygen on a surface of the glass substrate that thickness is 0.1 millimeter
Change aluminum, and make this surface of the aluminium oxide covering glass substrate of evaporation, form the aluminium oxide that thickness is 10 microns
Film.
(2) at silk screen printing thermohardening type printing ink along the edge one week of pellumina, 30 are solidified through 100 DEG C
Minute, formed thickness be 1 millimeter, along the edge ink layer of a week of substrate, so that ink layer shielding part
Divide inoranic membrane.
(3) strip agent spray substrate is used 10 minutes, so that the inoranic membrane not hidden by ink layer is removed,
Remaining inoranic membrane is reflecting layer, once purged, continues to complete subsequent step according to design requirement, obtains
Touch screen cover plate, wherein, strip agent includes following component according to mass fraction: the sulphuric acid of 78%, the lemon of 15%
Lemon acid potassium buffer agent and the potassium permanganate of 7%.
Use Albedometer tests the reflectance of the touch screen cover plate of the present embodiment, uses standard glossiness
The glossiness of the touch screen cover plate of calibrating instrument test the present embodiment.The reflection of the touch screen cover plate of the present embodiment
Rate and glossiness are shown in Table 1.
Embodiment 2
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) magnetron sputtering method is used to sputter titanium dioxide on a surface of the quartz base plate that thickness is 5 millimeters
Titanium, and make the titanium dioxide of sputtering hide this surface of substrate, form the titanium dioxide that thickness is 300 nanometers
Film.
(2) at silk screen printing thermohardening type printing ink along the edge one week of titanium dioxide film, through 200 DEG C of solidifications
10 minutes, formed thickness be 1 nanometer, along the edge ink layer of a week of substrate, so that ink layer hides
Part inoranic membrane.
(3) being soaked in by substrate in the strip groove being loaded with strip agent, intensity is under the ultrasound condition of 60KHz
Soaking 0.5～10 minute, remove the inoranic membrane not hidden by ink layer and remove, remaining inoranic membrane is reflection
Layer, once purged, continue to complete subsequent step according to design requirement, obtain touch screen cover plate, wherein, move back
Plating agent includes following component according to mass fraction: the Fluohydric acid. of 75%, the anhydrous sodium acetate buffer agent of 15% and
The hydrogen peroxide of 10%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 3
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) electroless plating chromium plating on a surface of the aluminum oxide substrate that thickness is 0.01 millimeter is used,
And make this surface of the chromium covering glass substrate of plating, to form the chromium film that thickness is 1 micron.
(2) at silk screen printing thermohardening type printing ink along the edge one week of chromium film, solidify 15 minutes through 150 DEG C,
Form the first ink layer, to hide chromium film, then at silk screen printing thermo-cured ink on the first ink layer,
Cured, form the second ink layer, the gross thickness of two-layer ink layer is 1 micron.
(3) substrate is soaked in it is loaded with the moving back of alkaline decoating liquid F-15 of Tianjin Gekko Swinhonis detergent company limited
In coating bath, 100 DEG C are soaked 6 minutes, and the removal that will do not hidden by ink layer, remaining inoranic membrane is reflection
Layer, once purged, continue to complete subsequent step according to design requirement, obtain touch screen cover plate.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 4
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) vacuum thermal evaporation is used to be deposited with on a surface of the transparent organic plates that thickness is 10 millimeters
Silicon dioxide so that it is hide this surface of transparent organic plates, to form the first titanium dioxide that thickness is 30 nanometers
Silicon fiml, is then deposited with aluminium oxide, silicon dioxide, aluminium oxide and dioxy on the first silicon dioxide film the most successively
SiClx, form the first pellumina that thickness is 45 nanometers, thickness be 45 nanometers the second silicon dioxide film,
Thickness is the second pellumina of 50 nanometers and the 3rd silicon dioxide film that thickness is 50 nanometers, and i.e. five layers depend on
The inorganic film of secondary stacking.
(2) at silk screen printing UV curable ink along the edge one week of the 3rd silicon dioxide film, through UV
Solidification, forms edge first ink layer of a week along substrate, with covering part the 3rd silicon dioxide film, then
On the first ink layer, twice UV curable ink of silk screen printing, cured, is formed and stacks gradually in first
The second ink layer on ink layer and the 3rd ink layer, and the gross thickness of three layers of ink layer is 100 microns, Gu
Energy during change is 1200mJ/cm2。
(3) being soaked in by substrate in the strip groove being loaded with strip agent, 45 DEG C are soaked 5 minutes, will be the most oily
The inoranic membrane that layer of ink hides is removed, and remaining organic membrane is reflecting layer, i.e. forms five layers of edge along substrate
One week and the reflecting layer of stacking, once purged, continue to complete subsequent step according to design requirement, touched
Screen cover plate, wherein, strip agent includes following component according to mass fraction: the hydrochloric acid of 80%, the Tris of 17%
Amine buffer agent and the potassium dichromate of 3%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 5
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) vacuum thermal evaporation is used to be deposited with dioxy on a surface of the glass substrate that thickness is 1 millimeter
SiClx, and make silicon dioxide hide this surface of substrate, form the first silicon dioxide film that thickness is 25 nanometers,
Again on silicon dioxide film successively evaporation formed thickness be the first pellumina of 30 nanometers, thickness be 30 to receive
First titanium dioxide film of rice, thickness be the second silicon dioxide film of 40 nanometers, thickness be the of 50 nanometers
Aluminium dioxide film, thickness are the second titanium dioxide film of 30 nanometers and the 3rd titanium dioxide that thickness is 45 nanometers
Silicon fiml, the i.e. seven layers inoranic membrane stacked gradually.
(2) at silk screen printing UV curable ink along the edge one week of the 3rd silicon dioxide film, through UV
Solidification, energy during solidification is 800mJ/cm2, form the ink layer that thickness is 3 microns, with covering part
Three silicon dioxide films.
(3) substrate is soaked in the strip of the acid decoating liquid 301 being loaded with Shenzhen Ze Kang Science and Technology Ltd.
In groove, soak 0.5 minute under the ultrasound condition that intensity is 1000KHz, the nothing that will do not hidden by ink layer
Machine film is removed, and remaining organic membrane is reflecting layer, i.e. forms seven layers of one week, edge along substrate and stacking
Reflecting layer, once purged, continue to complete subsequent step according to design requirement, obtain touch screen cover plate.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 6
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) vacuum thermal evaporation is used to be deposited with one on a surface of the glass substrate that thickness is 0.3 millimeter
Silicon oxide, and make the silicon monoxide of evaporation hide this surface of substrate, form the oxidation that thickness is 0.1 nanometer
Silicon fiml；Again on silicon monoxide film successively evaporation thickness be the zirconium dioxide film of 1 nanometer, thickness be 3 nanometers
Zinc oxide film, thickness be the hafnium oxide film of 30 nanometers, thickness be the copper film of 50 nanometers, thickness be 60
The ZnS-film of nanometer and the Barium metatitanate. film that thickness is 100 nanometers, the i.e. seven layers inoranic membrane stacked gradually.
(2) at silk screen printing thermohardening type printing ink along the edge one week of Barium metatitanate. film, 15 are solidified through 150 DEG C
Minute, form the first ink layer, with covering part Barium metatitanate. film, then silk screen printing three on the first ink layer
Secondary thermohardening type printing ink, forms the second ink layer on layer the first ink layer successively, the 3rd ink layer and the 4th
Ink layer, and the gross thickness of four layers of ink layer is 20 microns.
(3) substrate is soaked in the strip groove being loaded with strip agent, is the ultrasound condition of 20KHz in intensity
Lower immersion 10 minutes, removes the inoranic membrane not hidden by ink layer, and remaining organic membrane is reflecting layer, i.e.
Form seven layers of one week, edge along substrate and the reflecting layer of stacking, once purged, continue to have required according to design
Becoming subsequent step, obtain touch screen cover plate, wherein, strip agent includes following component according to mass fraction: 75%
The subacid chlorine potassium of nitric acid, the anhydrous sodium acetate buffer agent of 18% and 7%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 7
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) vacuum thermal evaporation is used to be deposited with an oxygen on a surface of the glass substrate that thickness is 2 millimeters
Change titanium so that it is this surface of covering glass substrate, to form the titanium monoxide film that thickness is 3 nanometers, then
Five oxidation three titanium films, thickness that on titanium monoxide film, evaporation sequentially forms that thickness is 50 nanometers are 20 nanometers
Yittrium oxide film, thickness are the neodymium fluoride film of 30 nanometers and barium fluoride film that thickness is 80 nanometers, and i.e. five layers depend on
The inoranic membrane of secondary stacking.
(2) at silk screen printing UV curable ink along the edge one week of barium fluoride film, solidification energy is
300mJ/cm2, cured, form the ink layer that thickness is 1 nanometer, with covering part barium fluoride film.
(3) substrate is soaked in the strip groove being loaded with strip agent, 30 DEG C soak 8 minutes, remove not by
The inoranic membrane that ink layer hides, remaining organic membrane is reflecting layer, i.e. forms five layers of edge one along substrate
Week and the reflecting layer of stacking, once purged, continue to complete subsequent step according to design requirement, obtain touch screen
Cover plate, wherein, strip agent includes following component according to mass fraction: the sulfonic acid of 70%, the potassium citrate of 15%
Buffer agent and the subacid chlorine potassium of 15%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 8
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) electrochemical plating embrane method is used to electroplate five oxygen on a surface of the glass substrate that thickness is 2 millimeters
Change two niobiums, and make this surface of niobium pentaoxide covering glass substrate, form five oxidations that thickness is 3 nanometers
Two niobium films, then on niobium pentaoxide film, plating forms thickness successively is that the cerium fluoride film of 50 nanometers, thickness are
The titanium film of 20 nanometers, thickness be the zinc selenide film of 30 nanometers, thickness be lanthanium titanate film and the thickness of 80 nanometers
It is the magnesium film of 100 nanometers, the i.e. six layers inoranic membrane stacked gradually.
(2) at silk screen printing UV curable ink along the edge one week of magnesium film, cured, solidify energy
For 800mJ/cm2, formed along edge first ink layer of a week of substrate, with covering part magnesium film, then the
Silk screen printing UV curable ink on one ink, forms the second ink layer, and the gross thickness of two-layer ink layer
It it is 10 microns.
(3) being soaked in by substrate in the strip groove being loaded with strip agent, 150 DEG C are soaked 0.5 minute, remove not
The inoranic membrane hidden by ink layer, remaining organic membrane is reflecting layer, i.e. forms six layers of edge along substrate
One week and the reflecting layer of stacking, once purged, continue to complete subsequent step according to design requirement, touched
Screen cover plate, wherein, strip agent includes following component according to mass fraction: the sulfinic acid of 80%, 17% anhydrous
Sodium acetate buffer agent and the potassium hyperchlorate of 3%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 9
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) chemical vapour deposition technique is used to deposit gold on a surface of the glass substrate that thickness is 2 millimeters,
And make this surface of the golden covering glass substrate of deposition, form the golden film that thickness is 3 nanometers, then on gold film
Be sequentially depositing thickness be the tantalum pentoxide film of 50 nanometers, thickness be the silverskin of 20 nanometers, thickness be 30 to receive
The titanium nitride film of rice, thickness are the indium film of 80 nanometers and Strontium titanate films that thickness is 100 nanometers, and i.e. six layers depend on
The inoranic membrane of secondary stacking.
(2) at silk screen printing thermohardening type printing ink along the edge one week of Strontium titanate films, 10 are solidified through 200 DEG C
Minute, form the first ink layer, with covering part Strontium titanate films, then silk screen printing heat on the first ink layer
Curable ink, forms the second ink layer, and the gross thickness of two-layer ink layer is 15 microns.
(3) being soaked in by substrate in the strip groove being loaded with strip agent, 20 DEG C are soaked 10 minutes, remove not
The inoranic membrane hidden by ink layer, remaining organic membrane is reflecting layer, i.e. forms six layers of edge along substrate
One week and the reflecting layer of stacking, once purged, continue to complete subsequent step according to design requirement, touched
Screen cover plate, wherein, strip agent includes following component according to mass fraction: the acetic acid of 75%, the citric acid of 20%
Potassium buffer agent and the sodium perchlorate of 5%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 10
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) physical vaporous deposition is used to deposit fluorine on a surface of the glass substrate that thickness is 2 millimeters
Change magnesium, and this surface of the magnesium covering glass substrate of deposition, form the Afluon (Asta) film that thickness is 3 nanometers, then
On Afluon (Asta) film formation of deposits thickness be the zinc film of 50 nanometers, thickness be the silicon carbide film of 20 nanometers, thickness
Degree be the lanthanum fluoride film of 30 nanometers, thickness be the platinum film of 80 nanometers, thickness be the metatitanic acid praseodymium film of 100 nanometers
And the germanium film that thickness is 70 nanometers, the i.e. seven layers inoranic membrane stacked gradually.
(2) at silk screen printing UV curable ink along the edge one week of germanium film, solidify through UV, formed
Along edge first ink layer of a week of substrate, with covering part germanium film, then screen printing on the first ink layer
Brush UV curable ink, forms the second ink layer, and the gross thickness of two-layer ink layer is 5 microns, solidification
Energy is 900mJ/cm2。
(3) substrate is soaked in the strip groove being loaded with strip agent, 75 DEG C soak 5 minutes, remove not by
The inoranic membrane that ink layer hides, remaining organic membrane is reflecting layer, i.e. forms seven layers of edge one along substrate
Week and the reflecting layer of stacking, once purged, continue to complete subsequent step according to design requirement, obtain touch screen
Cover plate, wherein, strip agent includes following component according to mass fraction: the thionothiolic acid of 80%, the citric acid of 15%
Potassium buffer agent and the sodium hypochlorite of 5%.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Embodiment 11
The preparation process of the touch screen cover plate of the present embodiment is as follows:
(1) vacuum thermal evaporation is used to be deposited with nickel on a surface of the glass substrate that thickness is 2 millimeters,
And make the nickel of evaporation hide a surface of substrate, form the nickel film that thickness is 10 nanometers, then steam on nickel film
Plating forms the cadmium sulphide film that thickness is 300 nanometers, the inoranic membrane that i.e. two-layer stacks gradually.
(2) silk screen printing UV curable ink on the edge of cadmium sulphide film one week, solidification energy is
500mJ/cm2, cured, formed thickness be 15 microns and along substrate edge one week ink layer.
(3) substrate is soaked in the strip groove being loaded with strip agent, at the ultrasonic bar that intensity is 100KHz
Soaking 9 minutes under part, remove the inoranic membrane not hidden by ink layer, remaining inoranic membrane is reflecting layer,
Once purged, continue to complete subsequent step according to design requirement, obtain touch screen cover plate, wherein, strip agent
Following component is included: the Fluohydric acid. of 75%, the anhydrous sodium acetate buffer agent of 15% and 10% according to mass fraction
Sodium dichromate.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of the present embodiment
Pool degree is shown in Table 1.
Comparative example 1
The preparation process of the touch screen cover plate of comparative example 1 is as follows:
Use vacuum thermal evaporation on a surface of the glass substrate that thickness is 0.1 millimeter and the limit along substrate
One week silk screen printing thermohardening type printing ink of edge, solidifies 30 minutes through 100 DEG C, forms the oil that thickness is 1 millimeter
Layer of ink, obtains touch screen cover plate.
Use the method for testing that embodiment 1 is identical, obtain reflectance and the light of the touch screen cover plate of comparative example 1
Pool degree is shown in Table 1.
Embodiment 1 that table 1 represents～11 and the reflectance of touch screen cover plate of comparative example 1 and glossiness.
Table 1
| Reflectance (%) | Glossiness (%) | |
| Embodiment 1 | 97 | 94.1 |
| Embodiment 2 | 97.2 | 94.3 |
| Embodiment 3 | 97.1 | 94.2 |
| Embodiment 4 | 98 | 94.1 |
| Embodiment 5 | 96.4 | 94.5 |
| Embodiment 6 | 98.5 | 94.4 |
| Embodiment 7 | 97.7 | 94.2 |
| Embodiment 8 | 98.3 | 94.3 |
| Embodiment 9 | 97.5 | 94.3 |
| Embodiment 10 | 96.8 | 94.1 |
| Embodiment 11 | 98.3 | 94.6 |
| Comparative example 1 | 95.4 | 92.1 |
From table 1 it follows that the reflectance of the touch screen cover plate of embodiment 1～11 and glossiness are the most at least
It is 96.4% and 94.1%, and the reflectance of the touch screen cover plate of comparative example 1 and glossiness are respectively 95.4% He
92.1%, it is clear that the touch screen cover plate of embodiment 1～11 has preferably reflectance and glossiness.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.
Claims (10)
1. a touch screen cover plate, it is characterised in that including:
Substrate；
Reflecting layer, is formed on a surface of described substrate, and described reflecting layer is along the edge of described substrate
Arranging one week, described reflecting layer is metal simple-substance film or compound film, described compound film selected from oxidation film,
Fluoride films, ZnS-film, zinc selenide film, titanium nitride film, silicon carbide film, lanthanium titanate film, Barium metatitanate. film,
One in Strontium titanate films, metatitanic acid praseodymium film and cadmium sulphide film；And
Ink layer, is arranged on described reflecting layer, and described ink layer can make the light through described reflecting layer anti-
It is emitted back towards described reflecting layer.
Touch screen cover plate the most according to claim 1, it is characterised in that described substrate be glass plate,
Quartz plate, alumina plate or transparent organic plates.
Touch screen cover plate the most according to claim 1, it is characterised in that described oxidation film is selected from oxygen
Change aluminum film, silicon monoxide film, silicon dioxide film, titanium dioxide film, zirconium dioxide film, hafnium oxide film,
Titanium monoxide film, five oxidation three titanium films, niobium pentaoxide film, tantalum pentoxide film, yittrium oxide film and oxidation
One in zinc film.
Touch screen cover plate the most according to claim 1, it is characterised in that described fluoride films is selected from fluorine
Change the one in neodymium film, barium fluoride film, cerium fluoride film, Afluon (Asta) film, lanthanum fluoride film and yttrium fluoride film.
Touch screen cover plate the most according to claim 1, it is characterised in that described metal simple-substance film is selected from
In copper film, titanium film, gold film, silverskin, indium film, magnesium film, zinc film, platinum film, germanium film, nickel film and chromium film
A kind of.
Touch screen cover plate the most according to claim 1, it is characterised in that the thickness in described reflecting layer is
0.1 nanometer～10 microns.
7. the preparation method of a touch screen cover plate, it is characterised in that comprise the steps:
Coating inorganic material on a surface of substrate, and make described inorganic material hide described surface, shape
Becoming inoranic membrane, described inorganic material is metal simple-substance or compound, and described compound is selected from oxide, fluorination
Thing, zinc sulfide, zinc selenide, titanium nitride, carborundum, lanthanium titanate, Barium metatitanate., strontium titanates, metatitanic acid praseodymium and
One in cadmium sulfide；
Coating printing ink on the edge of described inoranic membrane one week, cured, form ink layer, and described ink
Inoranic membrane described in layer covering part；
Being removed by the described inoranic membrane not hidden by described ink layer, remaining described inoranic membrane is reflecting layer,
Obtaining described touch screen cover plate, described ink layer can make the luminous reflectance through described reflecting layer go back to described reflecting layer.
The preparation method of touch screen cover plate the most according to claim 7, it is characterised in that will be not by institute
State step that the described inoranic membrane that ink layer hides removes particularly as follows: by described substrate the condition of 20～150 DEG C
Under in strip agent soak 0.5～10 minute.
The preparation method of touch screen cover plate the most according to claim 7, it is characterised in that will be not by institute
State ink layer hide described inoranic membrane remove step particularly as follows: by described substrate under ultrasound condition in moving back
Soaking 0.5～10 minute in plating agent, wherein, ultrasound intensity is 2KHz～1000KHz.
The preparation method of touch screen cover plate the most according to claim 8 or claim 9, it is characterised in that institute
State strip agent and include following component according to mass fraction: the buffer agent of acid, 15%～20% of 70%～80% and
The oxidant of 3%～15%；Described acid is Fluohydric acid., sulphuric acid, hydrochloric acid, nitric acid, sulfonic acid, sulfinic acid, carboxylic acid
Or thionothiolic acid；Described buffer agent is Fructus Citri Limoniae class buffer agent, acetate type buffer agent or amine buffer agent；Described oxygen
Agent is permanganate, bichromate, hydrogen peroxide, hypochlorite or perchlorate.
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| CN109796138A (en) * | 2017-11-17 | 2019-05-24 | 蓝思科技（长沙）有限公司 | For stripping the decoating liquid and withdrawal plating and glassware of glass NCVM film layer |
| CN107973622A (en) * | 2017-12-14 | 2018-05-01 | 信利光电股份有限公司 | The production method that default gloss cover board is presented with coloured side |
| CN107973622B (en) * | 2017-12-14 | 2021-01-29 | 信利光电股份有限公司 | Method for manufacturing cover plate with colored edge and capable of presenting preset gloss |
| CN110540368A (en) * | 2018-05-31 | 2019-12-06 | 蓝思科技（长沙）有限公司 | deplating liquid and deplating process |
| CN110540368B (en) * | 2018-05-31 | 2022-02-08 | 蓝思科技（长沙）有限公司 | Deplating liquid and deplating process |
| CN109305764B (en) * | 2018-10-17 | 2021-11-02 | 晶石科技(中国)股份有限公司 | Darkroom glass processing method and darkroom glass |
| CN109305764A (en) * | 2018-10-17 | 2019-02-05 | 晶石科技(中国)股份有限公司 | A kind of processing method and darkroom glass of darkroom glass |
| CN110205594A (en) * | 2019-05-24 | 2019-09-06 | 河南镀邦光电股份有限公司 | A kind of cover board IM coating structure and preparation method |
| CN111835896A (en) * | 2020-06-10 | 2020-10-27 | 深圳市锐欧光学电子有限公司 | Cell-phone camera apron coating film structure |
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| CN115079313B (en) * | 2022-06-10 | 2023-08-08 | 贵州铜仁旭晶光电科技有限公司 | High-stability blue glass antireflection film |
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Application publication date: 20161019 |