CN104527165B - Half-reflection and half-transmission glass and preparation method thereof - Google Patents
Half-reflection and half-transmission glass and preparation method thereof Download PDFInfo
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- CN104527165B CN104527165B CN201410795647.8A CN201410795647A CN104527165B CN 104527165 B CN104527165 B CN 104527165B CN 201410795647 A CN201410795647 A CN 201410795647A CN 104527165 B CN104527165 B CN 104527165B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
- B32B2037/1081—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure using a magnetic force
Abstract
The invention discloses that a kind of high rigidity, acid-alkali-corrosive-resisting, alkaline-resisting liquid are ultrasonic, scratch-resistant, the half-reflection and half-transmission glass that rear operation processability is strong, the reflectivity of this half-reflection and half-transmission glass is the arbitrary reflectivity in 18%～75% scope. This half-reflection and half-transmission glass comprises the glass substrate, the first low-index layer, the first high refractive index layer, the second low-index layer, the second high refractive index layer, the 3rd low-index layer, third high index layer and the 4th high rigidity index layer that stack gradually; The material of the first low-index layer is SiO2; The material of the first high refractive index layer is Nb2O5; The material of the second low-index layer is SiO2; The material of the second high refractive index layer is Nb2O5; The material of the 3rd low-index layer is SiO2. This half-reflection and half-transmission glass hard (HRC65Yi Shang) can reach 7H, and acid-alkali-corrosive-resisting, alkaline-resisting liquid are ultrasonic, scratch-resistant, and rear operation processability is strong. The invention also discloses the preparation method of above-mentioned half-reflection and half-transmission glass.
Description
Technical field
The present invention relates to that a kind of high rigidity, acid-alkali-corrosive-resisting, alkaline-resisting liquid are ultrasonic, scratch-resistant, rear operation processability strong halfAnti-semi-transparent glass and preparation method thereof.
Background technology
The intelligent touch electronic products such as existing panel computer, touch-screen mobile phone, often need to be at surface label half-reflection and half-transmission lightLearn film, to realize the optical property of half-reflection and half-transmission, in the time of the standby of intelligent touch product, can play mirror-reflection effect, Ke YizuoFor mirror is used for arranging dressing or combing hair. Also have on back of the body cover glass and paste half-reflection and half-transmission blooming, thereby protecgulum is normally aobviousShow, touch-control, and bonnet possesses certain mirror-reflection shadow that disappears.
Also have part automobile, adopt half-reflection and half-transmission blooming as vehicular rear mirror, thereby after can clear view arrivingThe traffic conditions of face, also can avoid that vehicle long sight lamp is opened below time, irradiate the light of coming after rearview mirror reflection notAll emergency light reflexs, but part reflection, part see through, thus avoid emergency light reflex to enter in driver's eyes and disturb driver'sNormal driving.
Traditional half-reflection and half-transmission blooming is to be plated in the cover-plate glass that is attached to again mobile phone, panel computer on PET flexible parent metalOn. On the one hand, pad pasting time length is understood bubble, is peeled off, and affects semi-transparent semi-reflecting effect, on the other hand, and traditional part reflective semitransparent filmHardness not high enough, in use easily scratch, thereby affect the attractive in appearance of product.
Although it is on glass to also have the half-reflection and half-transmission blooming of parts of traditional to be plated in, owing to all adopting TiO2Or Nb2O5DoFor high-index material, SiO2As low-index material, due to TiO2After fitting with OCA, then there will be under UV irradiationBlackspot, thin out gradually although this blackspot extends in time, after irradiating, UV occurring again, affect the visual effect of product.And Nb2O5Be dissolved in alkali lye, if in following process operation with alkali lye clean, alkali lye is ultrasonic, there will be part Nb2O5Layer is moltenSeparate phenomenon, destroyed optical film, thereby destroyed the optical effect of half-reflection and half-transmission blooming; Nb simultaneously2O5And SiO2VickersHardness is only 560Hv and 640Hv, if whole bi-materials for this reason, the half-reflection and half-transmission blooming generating is in following process processIn, in terminal client use procedure, easily scratch, affect the attractive in appearance of product and client's acceptance.
Summary of the invention
Based on this, be necessary to provide that a kind of hardness is higher, acid-alkali-corrosive-resisting, alkaline-resisting liquid are ultrasonic, scratch-resistant, rear operation processingProperty strong half-reflection and half-transmission glass and preparation method thereof.
A kind of half-reflection and half-transmission glass, the reflectivity of described half-reflection and half-transmission glass is 18%～75%, described half-reflection and half-transmission glassGlass comprises the glass substrate, the first low-index layer, the first high refractive index layer, the second low-index layer, the second height that stack graduallyIndex layer, the 3rd low-index layer, third high index layer and the 4th high rigidity index layer;
The material of described the first low-index layer is SiO2；
The material of described the first high refractive index layer is Nb2O5；
The material of described the second low-index layer is SiO2；
The material of described the second high refractive index layer is Nb2O5；
The material of described the 3rd low-index layer is SiO2；
The material of described third high index layer is Nb2O5；
The material of described the 4th high rigidity index layer is Si3N4；
The thickness of described the first low-index layer is
The thickness of described the first high refractive index layer is
The thickness of described the second low-index layer is
The thickness of described the second high refractive index layer is
The thickness of described the 3rd low-index layer is
The thickness of described third high index layer is
The thickness of described the 4th high rigidity index layer is
In one embodiment, the refractive index of described glass substrate is 1.52.
In one embodiment, the thickness of described glass substrate is 0.3～3.0mm.
In one embodiment, the reflectivity of described half-reflection and half-transmission glass is 50%, described the first low-index layer thickDegree isThe thickness of described the first high refractive index layer isThe thickness of described the second low-index layer isThe thickness of described the second high refractive index layer isThe thickness of described the 3rd low-index layer isDescribed third highThe thickness of index layer isThe thickness of described the 4th high rigidity index layer is
In one embodiment, the reflectivity of described half-reflection and half-transmission glass is 70%, described the first low-index layer thickDegree isThe thickness of described the first high refractive index layer isThe thickness of described the second low-index layer isThe thickness of described the second high refractive index layer isThe thickness of described the 3rd low-index layer isThe thickness of described third high index layer isThe thickness of described the 4th high rigidity index layer is
In one embodiment, the reflectivity of described half-reflection and half-transmission glass is 20%, described the first low-index layer thickDegree isThe thickness of described the first high refractive index layer isThe thickness of described the second low-index layer isDescribedThe thickness of two high refractive index layers isThe thickness of described the 3rd low-index layer isDescribed third high refractive indexThe thickness of layer isThe thickness of described the 4th high rigidity index layer is
A preparation method for half-reflection and half-transmission glass, comprises the steps:
Glass substrate is provided;
At the surface of described glass substrate magnetron sputtering deposition the first low-index layer, the first high refractive index layer, successivelyTwo low-index layers, the second high refractive index layer, the 3rd low-index layer, third high index layer and the 4th high rigidity refractive indexLayer, obtains reflectivity and is 18%～75% described half-reflection and half-transmission glass, and wherein, the material of described the first low-index layer isSiO2, the material of described the first high refractive index layer is Nb2O5, the material of described the second low-index layer is SiO2, described the second heightThe material of index layer is Nb2O5, the material of described the 3rd low-index layer is SiO2, the material of described third high index layerFor Nb2O5, the material of described the 4th high rigidity index layer is Si3N4, the thickness of described the first low-index layer isThe thickness of described the first high refractive index layer isThe thickness of described the second low-index layer isThe thickness of described the second high refractive index layer isThe thickness of described the 3rd low-index layerForThe thickness of described third high index layer isDescribed the 4th high rigidity index layerThickness is
In one embodiment, also comprise step: described glass substrate is cleaned and is dried.
In one embodiment, the refractive index of described glass substrate is 1.52.
In one embodiment, the thickness of described glass substrate is 0.3～3.0mm.
This half-reflection and half-transmission glass, comprises the first low-index layer, the first high refractive index layer, the second low-index layer,Two high refractive index layers, the 3rd low-index layer, third high index layer and the 4th high rigidity index layer, the combination of transmitance heightThe film layer structure of suitable thickness, make half-reflection and half-transmission glass self there is the performance of half-reflection and half-transmission, be applied to cover-plate glassTime, do not need additionally to paste half-reflection and half-transmission blooming, with respect to the traditional cover-plate glass that need to paste half-reflection and half-transmission blooming,Avoided the light absorption of PET rete, visual effect is better in use, and the material of the 4th high rigidity index layer is simultaneouslySi3N4, the aspects such as half-reflection and half-transmission glass is ultrasonic in hardness, acid-alkali-corrosive-resisting, alkaline-resisting liquid, durability, rub resistance are had moreAdvantage.
Concrete, this half-reflection and half-transmission glass applications on mobile phone, panel computer time, can be as the touch surface of OGS orThe touch surface of the cover sheet of GFF or G1F structure and for mobile phone, panel computer. While making mobile phone, panel computer standby, possesses mirrorFace effect, arranges dressing or combing hair for user, and while lighting backlight also without too bright just can be to mobile phone, flatPlate computer operates; Also can, for mobile phone, panel computer bonnet, can use as mirror. Meanwhile, this series products also canFor automobile rearview mirror, can observe by day below traffic conditions, also can avoid vehicle long sight light irradiation after nightThe emergency light reflex of coming over enters driver's intraocular and causes intense laser interfere, the generation avoiding traffic accident.
Brief description of the drawings
Fig. 1 is the structural representation of the half-reflection and half-transmission glass of an embodiment.
Detailed description of the invention
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing to the present inventionDetailed description of the invention be described in detail. A lot of details are set forth in the following description so that fully understand thisBright. But the present invention can implement to be much different from alternate manner described here, those skilled in the art can be notRun counter in the situation of intension of the present invention and do similar improvement, therefore the present invention is not subject to the restriction of following public concrete enforcement.
An embodiment half-reflection and half-transmission glass 100 as shown in Figure 1, reflectivity is 18%～75%, comprises and stacking graduallyGlass substrate 10, the first low-index layer 20, the first high refractive index layer 30, the second low-index layer 40, the second high index of refractionLayer 50, the 3rd low-index layer 60, third high index layer 70 and the 4th high rigidity index layer 80.
Glass substrate 10 can be selected the glass of float glass or other this area routines.
Preferably, the thickness of glass substrate 10 is 0.3～3.0mm, preferred, is 0.55～1.1mm.
Preferably, the refractive index of glass substrate 10 is 1.52.
The material of the first low-index layer 20 is SiO2。SiO2Refractive index be 1.48. Adopt SiO2As the first low refractionThe material of rate layer 20, makes the transmitance of the first low-index layer 20 relatively high.
The thickness of the first low-index layer 20In a special embodiment, the first low-index layer 20Thickness beThat is to say, the first low-index layer 20 can omit.
The material of the first high refractive index layer 30 is Nb2O5。Nb2O5Refractive index be 2.3. Adopt Nb2O5As the first high foldingPenetrate the material of rate layer 30, make the transmitance of the first high refractive index layer 30 relatively low.
The thickness of the first high refractive index layer 30 can beIn a special embodiment, the first high foldingThe thickness of penetrating rate layer 30 isThat is to say, the first high refractive index layer 30 can omit.
The material of the second low-index layer 40 is SiO2。SiO2Refractive index be 1.48. Adopt SiO2As the second low refractionThe material of rate layer 40, makes the transmitance of the second low-index layer 40 relatively high.
The thickness of the second low-index layer 40 is
The material of the second high refractive index layer 50 is Nb2O5。Nb2O5Refractive index be 2.3. Adopt Nb2O5As the second high foldingPenetrate the material of rate layer 50, make the transmitance of the second high refractive index layer 50 relatively low.
The thickness of the second high refractive index layer 50 can be
The material of the 3rd low-index layer 60 is SiO2。SiO2Refractive index be 1.48. Adopt SiO2As the 3rd low refractionThe material of rate layer 60, makes the transmitance of the 3rd low-index layer 60 relatively high.
The thickness of the 3rd low-index layer 60 is
The material of third high index layer 70 is Nb2O5。Nb2O5Refractive index be 2.3. Adopt Nb2O5Roll over as third highPenetrate the material of rate layer 70, make the transmitance of third high index layer 70 relatively low.
The thickness of third high index layer 70 isIn a special embodiment, third high index layer70 thickness isThat is to say, third high index layer 70 can omit.
The material of the 4th high rigidity index layer 80 is Si3N4。Si3N4Refractive index be 2.0. Adopt Si3N4As the 4thThe material of high rigidity index layer 80, makes the reflectivity of the 4th high rigidity index layer 80 relatively high.
The thickness of the 4th high rigidity index layer 80 is
This half-reflection and half-transmission glass, comprises the first low-index layer 20, the first high refractive index layer 30, the second low-index layer40, the second high refractive index layer 50, the 3rd low-index layer 60, third high index layer 70 and the 4th high rigidity index layer 80,The film layer structure of the suitable thickness of transmitance height combination, makes half-reflection and half-transmission glass self have the performance of half-reflection and half-transmission,While being applied to cover-plate glass, do not need additionally to paste half-reflection and half-transmission blooming, need to paste half-reflection and half-transmission light with respect to traditionalLearn the cover-plate glass of film, avoided the light absorption of PET rete, visual effect is better in use; The 4th high rigidity index layer80 material is silicon nitride, and the Vickers hardness of silicon nitride is 1720Hv, and both different acid reactions, also Different Alkali reactions, makesThe aspect such as durability, rub resistance has more advantage.
Concrete, this half-reflection and half-transmission glass applications on mobile phone, panel computer time, can be as the touch surface of OGS orThe touch surface of the cover sheet of GFF or G1F structure and for mobile phone, panel computer. In the time of mobile phone, panel computer standby, can doFor mirror use, and backlight also just can operate mobile phone, panel computer without too bright while lighting; Also can be for handMachine, panel computer bonnet, can use as mirror. Meanwhile, this series products also can be used for automobile rearview mirror, can be by dayObserve traffic conditions below, also can avoid vehicle long sight light irradiation is come after night emergency light reflex to enter driver's intraocular andCause intense laser interfere, the generation avoiding traffic accident.
The preparation method of above-mentioned half-reflection and half-transmission glass, comprises the steps:
S10, provide glass substrate 10.
Glass substrate 10 can be selected the glass of float glass or other this area routines.
Preferably, the thickness of glass substrate 10 is 0.3～3.0mm, more preferably 0.55～1.1mm.
Preferably, the refractive index of glass substrate 10 is 1.52.
Preferably, first glass substrate 10 is cleaned and is dried.
S20, by glass substrate 10 surfaces after cleaning successively magnetron sputtering deposition the first low-index layer 20, the first high foldingPenetrate rate layer 30, the second low-index layer 40, the second high refractive index layer 50, the 3rd low-index layer 60, third high index layer 70And the 4th high rigidity index layer 80, obtain half-reflection and half-transmission glass.
The material of the first low-index layer 20 is SiO2。SiO2Refractive index be 1.48. Adopt SiO2As the first low refractionThe material of rate layer 20, makes the transmitance of the first low-index layer 20 relatively high.
The thickness of the first low-index layer 20In a special embodiment, the first low-index layer20 thickness isThat is to say, the first low-index layer 20 can omit.
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of the first low-index layer 20 and is: base vacuum degree is0.1～0.005Pa, the vacuum in plated film chamber is 0.1Pa～0.5Pa, power is 0～30Kw.
The material of the first high refractive index layer 30 is Nb2O5。Nb2O5Refractive index be 2.3. Adopt Nb2O5As the first high foldingPenetrate the material of rate layer 30, make the transmitance of the first high refractive index layer 30 relatively low.
The thickness of the first high refractive index layer 30 can beIn a special embodiment, the first high foldingThe thickness of penetrating rate layer 30 isThat is to say, the first high refractive index layer 30 can omit.
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of the first high refractive index layer 30 and is: base vacuum degree is0.1～0.005Pa, the vacuum in plated film chamber is 0.1Pa～0.5Pa, power is 0～60Kw.
The material of the second low-index layer 40 is SiO2。SiO2Refractive index be 1.48. Adopt SiO2As the second low refractionThe material of rate layer 40, makes the transmitance of the second low-index layer 40 relatively high.
The thickness of the second low-index layer 40 is
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of the second low-index layer 40 and is: base vacuum degree is0.1～0.005Pa, the vacuum in plated film chamber is 0.1Pa～0.5Pa, power is 15～60Kw.
The material of the second high refractive index layer 50 is Nb2O5。Nb2O5Refractive index be 2.3. Adopt Nb2O5As the second high foldingPenetrate the material of rate layer 50, make the transmitance of the second high refractive index layer 50 relatively low.
The thickness of the second high refractive index layer 50 can be
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of the second high refractive index layer 50 and is: base vacuum degree is0.1～0.005Pa, the vacuum in plated film chamber is 0.1Pa～0.5Pa, power is 2～30Kw.
The material of the 3rd low-index layer 60 is SiO2。SiO2Refractive index be 1.48. Adopt SiO2As the 3rd low refractionThe material of rate layer 60, makes the transmitance of the 3rd low-index layer 60 relatively high.
The thickness of the 3rd low-index layer 60 is
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of the 3rd low-index layer 60 and is: base vacuum degree is0.1～0.005Pa, the vacuum in plated film chamber is 0.1Pa～0.5Pa, power is 20～60Kw.
The material of third high index layer 70 is Nb2O5。Nb2O5Refractive index be 2.3. Adopt Nb2O5Roll over as third highPenetrate the material of rate layer 70, make the transmitance of third high index layer 70 relatively low.
The thickness of third high index layer 70 isIn a special embodiment, third high refractive indexThe thickness of layer 70 isThat is to say, third high index layer 70 can omit.
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of third high index layer 70 and is: base vacuum degree is0.1～0.005Pa, the vacuum in plated film chamber is 0.1Pa～0.5Pa, power is 0～30Kw.
The material of the 4th high rigidity index layer 80 is Si3N4。Si3N4Refractive index be 2.0. Adopt Si3N4As the 4thThe material of high rigidity index layer 80, makes the transmitance of the 4th high rigidity index layer 80 relatively high.
The thickness of the 4th high rigidity index layer 80 is
Specifically in the present embodiment, magnetron sputtering is prepared the parameter of the 4th high rigidity index layer 80 and is: base vacuumDegree is 0.1～0.005Pa, and the vacuum in plated film chamber is 0.1Pa～0.5Pa, and power is 2～50Kw.
The preparation method of above-mentioned half-reflection and half-transmission glass, technique is relatively simple, In-Line magnetron sputtering apparatus or BatchCoater all can batch volume production. The half-reflection and half-transmission glass of preparation, comprises the first low-index layer, the first high refractive index layer, theTwo low-index layers, the second high refractive index layer, the 3rd low-index layer, third high index layer and the 4th high rigidity refractive indexLayer, the film layer structure of the suitable thickness of transmitance height combination, makes half-reflection and half-transmission glass self have the performance of half-reflection and half-transmission,In the time being applied to cover-plate glass, do not need additionally to paste half-reflection and half-transmission blooming, need to paste half-reflection and half-transmission with respect to traditionalThe cover-plate glass of blooming, has avoided the light absorption of PET rete, and visual effect is better in use, simultaneously the 4th high rigidity foldingThe material of penetrating rate layer is Si3N4, make half-reflection and half-transmission glass at aspects such as scratch-resistant, acid-alkali-corrosive-resisting, durability, rub resistancesHave more advantage.
Concrete, this half-reflection and half-transmission glass applications on mobile phone, panel computer time, can be as the touch surface of OGS orThe touch surface of the cover sheet of GFF or G1F structure and for mobile phone, panel computer. But can do when mobile phone, panel computer standbyFor mirror use, and backlight also just can operate mobile phone, panel computer without too bright while lighting; Also can be for handMachine, panel computer bonnet, can use as mirror. Meanwhile, this series products also can be used for automobile rearview mirror, can be by dayObserve traffic conditions below, also can avoid vehicle long sight light irradiation is come after night emergency light reflex to enter driver's intraocular andCause intense laser interfere, the generation avoiding traffic accident.
Be specific embodiment below.
Embodiment 1
The structure of the half-reflection and half-transmission glass of embodiment 1 is glass substrate Wherein, "/" presentation layer stack structure, the numerical value representative thickness in bracket, below realExecute example identical.
The material of the glass substrate of embodiment 1 is soda-lime glass, and thickness is 0.7mm.
The half-reflection and half-transmission glass of embodiment 1, by using the SD-6000 of Japanese electric look, is 380～780nm to wave-length coverageLight test, test 550nm reflectivity is 20%.
Use pencil hardometer to carry out hardness test to this half-reflection and half-transmission optical film, result hardness is 7H.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 20%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; TestHundred lattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 20%, adopts that concentration is 5%, temperature is 40 DEG CHCl solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; Test hundredLattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 20%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 20 minutes. Test the light of ultrasonic rear printSpectrum, compares with spectrum before soaking, and registration is very good; Test hundred lattice, adhesive force is still 5B.
Embodiment 2
The structure of the half-reflection and half-transmission glass of embodiment 2 is glass substrate
The material of the glass substrate of embodiment 2 is soda-lime glass, and thickness is 1.1mm.
The half-reflection and half-transmission glass of embodiment 2, by using the SD-6000 of Japanese electric look, is 380～780nm to wave-length coverageLight test, test experiments result is that 550nm place reflectivity is 30%. Use pencil hardometer to this half-reflection and half-transmission lightLearn rete and carry out hardness test, result hardness is 7H.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 30%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; TestHundred lattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 30%, adopts that concentration is 5%, temperature is 40 DEG CHCl solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; Test hundredLattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 30%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 20 minutes. Test the light of ultrasonic rear printSpectrum, compares with spectrum before soaking, and registration is very good; Test hundred lattice, adhesive force is still 5B.
Embodiment 3
The structure of the half-reflection and half-transmission glass of embodiment 3 is glass substrate
The material of the glass substrate of embodiment 3 is aluminosilicate glass, and thickness is 0.55mm.
The SD-6000 that the half-reflection and half-transmission glass of embodiment 3 is Japanese electric look by use test instrument, to wave-length coverage isThe light of 380～780nm is tested, and it is 40% that test 550nm goes out reflectivity.
Use pencil hardometer to carry out hardness test to this half-reflection and half-transmission optical film, result hardness is 7H.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 40%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; TestHundred lattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 40%, adopts that concentration is 5%, temperature is 40 DEG CHCl solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; Test hundredLattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 40%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 20 minutes. Test the light of ultrasonic rear printSpectrum, compares with spectrum before soaking, and registration is very good; Test hundred lattice, adhesive force is still 5B.
Embodiment 4
The structure of the half-reflection and half-transmission glass of embodiment 4 is glass substrate
The material of the glass substrate of embodiment 4 is soda-lime glass, and thickness is 0.7mm.
The SD-6000 that the half-reflection and half-transmission glass of embodiment 4 is Japanese electric look by use test instrument, to wave-length coverage isThe light of 380～780nm is tested, and it is 50% that test 550nm goes out reflectivity.
Use pencil hardometer to carry out hardness test to this half-reflection and half-transmission optical film, result hardness is 7H.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 50%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; TestHundred lattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 50%, adopts that concentration is 5%, temperature is 40 DEG CHCl solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; Test hundredLattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 50%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 20 minutes. Test the light of ultrasonic rear printSpectrum, compares with spectrum before soaking, and registration is very good; Test hundred lattice, adhesive force is still 5B.
Embodiment 5
The structure of the half-reflection and half-transmission glass of embodiment 5 is glass substrate
The material of the glass substrate of embodiment 5 is soda-lime glass, and thickness is 1.8mm.
The SD-6000 that the half-reflection and half-transmission glass of embodiment 5 is Japanese electric look by use test instrument, to wave-length coverage isThe light of 380～780nm is tested, and it is 60% that test 550nm goes out reflectivity.
Use pencil hardometer to carry out hardness test to this half-reflection and half-transmission optical film, result hardness is 7H.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 60%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; TestHundred lattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 60%, adopts that concentration is 5%, temperature is 40 DEG CHCl solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; Test hundredLattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 60%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 20 minutes. Test the light of ultrasonic rear printSpectrum, compares with spectrum before soaking, and registration is very good; Test hundred lattice, adhesive force is still 5B.
Embodiment 6
The structure of the half-reflection and half-transmission glass of embodiment 6 is glass substrate
The material of the glass substrate of embodiment 6 is soda-lime glass, and thickness is 0.55mm.
The SD-6000 that the half-reflection and half-transmission glass of embodiment 6 is Japanese electric look by use test instrument, to wave-length coverage isThe light of 380～780nm is tested, and it is 70% that test 550nm goes out reflectivity.
Use pencil hardometer to carry out hardness test to this half-reflection and half-transmission optical film, result hardness is 7H.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 70%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; TestHundred lattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 70%, adopts that concentration is 5%, temperature is 40 DEG CHCl solution, soak 2H. The spectrum of the print after test is soaked, compares with spectrum before soaking, and registration is very good; Test hundredLattice, adhesive force is still 5B.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 70%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 20 minutes. Test the light of ultrasonic rear printSpectrum, compares with spectrum before soaking, and registration is very good; Test hundred lattice, adhesive force is still 5B.
Comparative example 1
The structure of the half-reflection and half-transmission glass of comparative example 1 is glass substrate Obtain reflectivity and be 50% half anti-halfGlass thoroughly.
The material of the glass substrate of comparative example 1 is soda-lime glass, and thickness is 0.7mm.
The SD-6000 that the half-reflection and half-transmission glass of comparative example 1 is Japanese electric look by use test instrument, to wave-length coverage isThe light of 380～780nm is tested, and it is 50% that test 550nm goes out reflectivity.
Use pencil hardometer to carry out hardness test to this half-reflection and half-transmission optical film, result hardness is 5H.
Get this print, coated surface is by the OCA PET film of fitting, with the UV irradiation of 165nm wavelength 10 minutes, and laminating positionThere is sheet blackspot in centre, forms sharp contrast in the region of mirror effect around with blackspot half-reflection and half-transmission blooming.
Comparative example 2
The structure of the half-reflection and half-transmission glass of comparative example 2 is glass substrate Obtain reflectivity and be 30% half-reflection and half-transmission blooming glassGlass.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 30%, employing concentration is that 10wt%, temperature are 40DEG C NaOH solution, soak 1H. The spectrum of the print after test is soaked, compares reflectivity variation with spectrum before soaking; Test hundredLattice, part position exists point-like or sheet to fall film phenomenon, and there is the inconsistent aberration phenomenon of heavier color in full wafer glass.
The half-reflection and half-transmission blooming glass that to get some, reflectivity be 30%, employing concentration is that 5wt%, temperature are 50DEG C NaOH solution, frequency be that 40Hz, power are 1500W ultrasonic tank is ultrasonic, ultrasonic 10 minutes. Observe this print, possess positionPutting and exist point-like or sheet to fall film, there is the inconsistent aberration phenomenon causing of heavier color in full wafer glass.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but alsoCan not therefore be interpreted as the restriction to the scope of the claims of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to guarantor of the present inventionProtect scope. Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (1)
1. a half-reflection and half-transmission glass, is characterized in that, described half-reflection and half-transmission glass comprises the glass substrate, first stacking graduallySilicon dioxide layer, the first niobium pentaoxide layer, the second silicon dioxide layer, the second niobium pentaoxide layer, the 3rd silicon dioxide layer,Three niobium pentaoxide layers, silicon nitride layer;
The material of described glass substrate is soda-lime glass, and thickness is 0.55mm;
The thickness of described the first silicon dioxide layer is
The thickness of described the first niobium pentaoxide layer is
The thickness of described the second silicon dioxide layer is
The thickness of described the second niobium pentaoxide layer is
The thickness of described the 3rd silicon dioxide layer is
The thickness of described the 3rd niobium pentaoxide layer is
The thickness of described silicon nitride layer is
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| CN108302378A (en) * | 2017-12-29 | 2018-07-20 | 青岛海信电器股份有限公司 | A kind of backlight module and display device |
| CN114966909A (en) * | 2022-05-19 | 2022-08-30 | 安徽立光电子材料股份有限公司 | Semi-permeable semi-reflecting laminated body and application and preparation method thereof |
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| CN104163022A (en) * | 2014-08-07 | 2014-11-26 | 宜昌南玻显示器件有限公司 | Semi reflective and semi transparent glass and preparation method thereof |
| CN204451388U (en) * | 2014-12-18 | 2015-07-08 | 宜昌南玻显示器件有限公司 | Half-reflection and half-transmission glass |
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| CN104163022A (en) * | 2014-08-07 | 2014-11-26 | 宜昌南玻显示器件有限公司 | Semi reflective and semi transparent glass and preparation method thereof |
| CN204451388U (en) * | 2014-12-18 | 2015-07-08 | 宜昌南玻显示器件有限公司 | Half-reflection and half-transmission glass |
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