JP5636962B2 - Resin composition - Google Patents

Description

  The present invention relates to a resin composition suitable for forming an insulating layer such as a multilayer printed wiring board.

  As a resin composition used for an insulating layer of a multilayer printed wiring board, it is known that a resin composition containing a cyanate ester resin can form an insulating layer having excellent dielectric properties. Although a resin composition for a multilayer printed wiring board containing a cyanate ester resin, an epoxy resin and a phenoxy resin has been disclosed, it cannot be said that the low dielectric loss tangent is sufficient.

  In recent years, the formation of high-density fine wiring has been desired, and it is an important issue to keep the surface roughness of the insulating layer low and to obtain sufficient adhesion strength with the conductor layer. This is because if the roughness is high, the plated portion that has entered the anchor is not removed by etching, and it is difficult to form a high-density wiring, and the subsequent insulation reliability is remarkably deteriorated. In addition, multilayer printed wiring boards with high-density wiring tend to cause problems such as cracking due to the difference in thermal expansion coefficient between copper wiring and insulating layer, so it is also necessary to keep the thermal expansion coefficient of insulating layer low. Is done.

  As a resin composition characterized by low dielectric loss tangent and suitable for an insulating layer, a resin composition containing a polyvinyl compound is disclosed in Patent Document 2, but an elastomer component is essential in a cured product of the composition. There was a problem that the coefficient of thermal expansion was not sufficient, and only the formation of a conductor layer by plating using a copper foil as a support was studied.

International Publication 2003/099952 Pamphlet International Publication No. 2006/059750 Pamphlet

  An object of the present invention is to provide a resin composition having a low dielectric loss tangent of a cured product and excellent adhesion strength with a conductor, and further, an adhesive film using the curable resin composition, and a prepreg Another object of the present invention is to provide an electronic component such as a printed wiring board using the adhesive film and the like, and a manufacturing method thereof.

  As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that the present invention is achieved by a resin composition comprising a specific cyanate ester resin, a curable polyvinyl benzyl compound, and a metal-based curing catalyst. It came to be completed. That is, the present invention includes the following contents.

  [1] It contains (A) a dicyclopentadiene-type cyanate ester resin represented by the following general formula (1), (B) a curable polyvinylbenzyl compound, and (C) a metal-based curing catalyst. Resin composition. (However, n is 0-5.)

[2] When the nonvolatile content of the resin composition is 100% by mass, the content of the component (A) is 3 to 60% by mass, the content of the component (B) is 0.5 to 50% by mass, and the component (C The resin composition according to the above [1], wherein the metal content based on the metal-based curing catalyst is from 25 to 500 ppm.
[3] The above [1] or [2], wherein the metal-based curing catalyst is an organometallic complex or an organometallic salt of one or more metals selected from cobalt, copper, zinc, iron, nickel, manganese, and tin. The resin composition as described.
[4] Further selected from polyvinyl acetal resin, phenoxy resin, polyimide resin, polyamideimide resin, polyetherimide resin, polysulfone resin, polyethersulfone resin, polyphenylene ether resin, polycarbonate resin, polyetheretherketone resin, and polyester resin The resin composition according to any one of the above [1] to [3], comprising at least one polymer resin.
[5] The resin composition according to the above [4], wherein the content of the polymer resin is 1 to 20% by mass with respect to 100% by mass of the nonvolatile content of the resin composition.
[6] The resin composition according to any one of [1] to [5], further including an inorganic filler.
[7] The resin composition according to the above [6], wherein the content of the inorganic filler is 10 to 70% by mass with respect to 100% by mass of the nonvolatile content of the resin composition.
[8] The resin composition according to the above [6] or [7], wherein the inorganic filler is silica.
[9] The above [1], wherein the peel strength is 0.4 kgf / cm to 1.0 kgf / cm, the arithmetic average roughness is 50 nm to 440 nm, and the dielectric loss tangent is 0.0030 to 0.0079. -The resin composition in any one of [8].
[10] An adhesive film in which the resin composition according to any one of [1] to [9] is layered on a support.
[11] A prepreg obtained by impregnating the resin composition according to any one of [1] to [9] into a sheet-like reinforcing base material made of fibers.
[12] A multilayer printed wiring board in which an insulating layer is formed from a cured product of the resin composition according to any one of [1] to [9].

  According to the present invention, a resin composition suitable for forming an insulating layer of a multilayer printed wiring board, wherein the insulating layer formed of the resin composition has a low dielectric loss tangent and a low coefficient of thermal expansion, and has a uniform roughened surface. Thus, a resin composition capable of maintaining high adhesion between the insulating layer and the conductor layer even at low roughness is provided.

[(A) Dicyclopentadiene-type cyanate ester resin represented by the following general formula (1)]
In the resin composition of the present invention, a dicyclopentadiene-type cyanate ester resin represented by the following general formula (1) is used.

  The resin represented by the general formula (1) is available as DT-4000 and DT-7000 manufactured by Lonza Japan Co., Ltd. Although the repeating unit n is not specifically limited, Preferably it is 0-5, More preferably, it is 0-3, More preferably, it is 0-2.

  The content of the cyanate ester resin in the resin composition is not particularly limited, but is preferably 3 to 60% by mass, and more preferably 10 to 10% by mass with respect to 100% by mass of the nonvolatile content of the resin composition. It is 30 mass%, More preferably, it is 15-25 mass%. When there is too little content of this cyanate ester resin, it exists in the tendency for heat resistance to fall and for a thermal expansion coefficient to increase. When there is too much content of cyanate ester resin, it exists in the tendency for the adhesive strength of a plating conductor layer to fall.

It should be noted that cyanate ester resins having different structures, such as novolak type (phenol novolak type, alkylphenol novolak type, etc.) cyanate ester resin, bisphenol type (bisphenol A type, bisphenol F type, bisphenol S type, etc.) cyanate ester resin, and the like. A partially triazine prepolymer or the like may be used in combination with the cyanate ester resin.
Commercially available cyanate ester resins include phenol novolac polyfunctional cyanate ester resins (Lonza Japan Co., Ltd., PT30), bisphenol A dicyanate (Lonza Japan Co., Ltd., Badcy), a part of bisphenol A dicyanate or Examples include prepolymers that are all triazine-modified to form trimers (Lonza Japan Co., Ltd., BA230).

[(B) Curable Polyvinylbenzyl Compound]
The curable polyvinyl benzyl compound in the present invention is a compound having two or more vinyl benzyl groups in the molecule. For example, (i) a method of reacting a vinyl benzyl halide with an alkali in the presence of an alkali, (ii) vinyl Method of reacting benzyl halide and dihalomethyl compound having 2 to 20 carbon atoms in the presence of alkali, or (iii) Method of reacting fluorene compound, vinylbenzyl halide and dihalomethyl compound having 2 to 20 carbon atoms in the presence of alkali 2003-277440), or (iv) a method of reacting a fluorene compound and vinylbenzyl halide in the presence of an alkali (WO 02/083610 pamphlet) or the like. The curable polyvinyl benzyl compound preferably contains no hetero atom in the molecule from the viewpoint of low dielectric loss tangent.

  Although content of the curable polyvinyl benzyl compound in a resin composition is not specifically limited, 0.5-50 mass% is preferable with respect to 100 mass% of non volatile matters of a resin composition, and 2-50 mass. % Is more preferable, 5 to 25% by mass is further preferable, and 5 to 15% by mass is even more preferable. When the content of the curable polyvinyl benzyl compound is too small, the dielectric loss tangent tends to increase. On the other hand, when there is too much content of a curable polyvinyl benzyl compound, it exists in the tendency for adhesiveness to fall.

  As an indene compound, the indene compound represented by the following formula | equation (2) is mentioned, for example.

In the formula, R ³ may be the same or different and is a hydrogen atom, a halogen atom, an alkyl group (preferably an alkyl group having 1 to 5 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 5 carbon atoms). And one group selected from the group consisting of a thioalkoxy group (preferably a thioalkoxy group having 1 to 5 carbon atoms) (or two or more R ³ may be combined to form a ring) , P represents an integer of 0-4. Examples of forming a ring include a structure in which a ring such as a 5- to 8-membered cycloalkyl ring or a benzene ring is condensed.

  As a fluorene compound, the fluorene compound represented by the following formula | equation (3) is mentioned, for example.

In the formula, R ² may be the same or different and is a hydrogen atom, a halogen atom, an alkyl group (preferably an alkyl group having 1 to 5 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 5 carbon atoms). And one group selected from the group consisting of a thioalkoxy group (preferably a thioalkoxy group having 1 to 5 carbon atoms) (or two or more R ² may be combined to form a ring) , M represents an integer of 0-4. Examples of forming a ring include a structure in which a ring such as a 5- to 8-membered cycloalkyl ring or a benzene ring is condensed.

  Examples of the vinyl benzyl halide include p-vinyl benzyl chloride, m-vinyl benzyl chloride, and any mixture thereof. Examples of the dihalomethyl compound having 2 to 20 carbon atoms include 1,2-dichloroethane, 1,2-dibromoethane, 1,3-dichloropropane, 1,3-dibromopropane, 1,4-dichlorobutane, 1, Alkylene dihalides such as 4-dibromobutane, o-xylylene dichloride, o-xylylene dibromide, m-xylylene dichloride, m-xylylene dibromide, p-xylylene dichloride, p-xylylene dibromide, 4,4 ′ -Bis (chloromethyl) biphenyl, 4,4'-bis (chloromethyl) diphenyl ether, 4,4'-bis (chloromethyl) diphenyl sulfide, 2,6-bis (bromomethyl) naphthalene, 1,8-bis (bromomethyl) ) Diphthal such as naphthalene, 1,4-bis (chloromethyl) naphthalene It can be exemplified methyl compound.

  Examples of the alkali include sodium methoxide, sodium ethoxide, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide and the like.

  Such a curable polyvinyl benzyl compound can be easily produced according to the description in JP-A No. 2003-277440 and WO 02/083610.

  Preferred curable polyvinyl benzyl compounds include those represented by the following formula (4). The compound of the formula (4) may have a dimer structure in which a vinyl group is polyadded.

In the formula (4), R ¹ represents a divalent organic group having 2 to 20 carbon atoms derived from the carbon chain of the dihalomethyl compound having 2 to 20 carbon atoms, and R ² may be the same or different. A hydrogen atom, a halogen atom, an alkyl group (preferably an alkyl group having 1 to 5 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 5 carbon atoms) and a thioalkoxy group (preferably a thio having 1 to 5 carbon atoms). 1 represents a group selected from the group consisting of (alkoxy groups) (or two or more R ² may be combined to form a ring), m represents an integer of 0 to 4, and n represents 0. Represents an integer of ~ 20. Examples of forming a ring include a structure in which a ring such as a 5- to 8-membered cycloalkyl ring or a benzene ring is condensed.

  Particularly preferable curable polyvinyl benzyl compounds include those represented by the following formula (5).

(In Formula (5), R ⁴ is a C 2-20 divalent organic group (preferably an alkylene group) derived from the carbon chain of the C 2-20 dihalomethyl compound, and n is 0-20. Indicates an integer)

  As commercially available products, polyvinyl benzyl resin V-5000X (Tg 154 ° C. of cured product, relative dielectric constant 2.63, dielectric loss tangent 0.0016) manufactured by Showa Polymer Co., Ltd., V-6000X (of cured product) Tg 136 ° C., relative dielectric constant 2.59, dielectric loss tangent 0.0013) and the like.

  The curable polyvinyl benzyl compound in the present invention may be a curable polyvinyl benzyl ether compound. For example, it can be obtained by reacting a compound having two or more hydroxybenzyl groups in one molecule (polyphenol compound) with vinylbenzyl halide in the presence of an alkali (JP-A-9-31006, JP-A-2001-2001). 181383).

  Examples of the polyphenol compound include hydroquinone, bisphenol A, bisphenol F, bisphenol S, biphenol, phenol novolac resin, a phenol / benzaldehyde condensate, and xylok type phenol resin. The aromatic ring of these compounds may be substituted with an alkyl group, halogen or the like.

  Examples of the vinyl benzyl halide and alkali include those described above.

  As a typical polyvinyl benzyl ether compound, what is represented by the following formula | equation (6) can be mentioned (refer Unexamined-Japanese-Patent No. 9-31006, Unexamined-Japanese-Patent No. 2001-181383 etc.).

In the formula (6), R ¹ is a methyl group or an ethyl group, R ² is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, R ³ is a hydrogen atom or a vinylbenzyl group (however, a hydrogen atom and a vinylbenzyl group) The molar ratio is in the range of 60:40 to 0: 100), and n represents an integer of 2 to 4.
Examples of the hydrocarbon group having 1 to 10 carbon atoms include an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, and an aralkyl group having 7 to 10 carbon atoms. Can be mentioned.

  These polyvinyl benzyl ether compounds can be easily produced according to the descriptions in JP-A-9-31006 and JP-A-2001-181383.

  The products available on the market are Showa Polymer Co., Ltd. V-1000X (Tg 160 ° C. of cured product, relative dielectric constant 2.7, dielectric loss tangent 0.0045), V-1100X (Tg 171 ° C. of cured product, ratio) Dielectric constant 2.56, dielectric loss tangent 0.0038) and the like.

  These polyvinyl benzyl compounds may be used as a mixture of two or more different types.

[(C) Metal-based curing catalyst]
Examples of the metal-based curing catalyst used in the present invention include organometallic complexes or organometallic salts of metals such as cobalt, copper, zinc, iron, nickel, manganese and tin. Specific examples of the organometallic complex include organic cobalt complexes such as cobalt (II) acetylacetonate and cobalt (III) acetylacetonate, organocopper complexes such as copper (II) acetylacetonate, and zinc (II) acetylacetonate. Organic zinc complexes such as iron (III) acetylacetonate, organic nickel complexes such as nickel (II) acetylacetonate, and organic manganese complexes such as manganese (II) acetylacetonate. Examples of the organic metal salt include zinc octylate, tin octylate, zinc naphthenate, cobalt naphthenate, tin stearate, and zinc stearate. As metal-based curing catalysts, from the viewpoint of curability and solvent solubility, cobalt (II) acetylacetonate, cobalt (III) acetylacetonate, zinc (II) acetylacetonate, zinc naphthenate, iron (III) acetyl Acetonate is preferable, and cobalt (II) acetylacetonate and zinc naphthenate are particularly preferable. Two or more metal-based curing catalysts may be used in combination.

  The addition amount of the metal-based curing catalyst is such that the metal content based on the metal-based curing catalyst is 25 to 500 ppm, more preferably 40 to 200 ppm with respect to 100% by mass of the nonvolatile content of the resin composition. preferable. If it is less than 25 ppm, it tends to be difficult to form a conductor layer having excellent adhesion to the surface of the low-roughness insulating layer, and if it exceeds 500 ppm, the storage stability and insulation of the resin composition tend to decrease. It becomes.

  The resin composition of the present invention contains the component (A), the component (B), and the component (C), and the insulating layer formed of the resin composition has a low roughness and a low dielectric loss tangent, High adhesion of the conductor layer can be maintained.

  The peel strength of the cured product of the resin composition containing the components (A), (B), and (C) of the present invention is described below. <Measurement and Evaluation of Peeling Strength (Peel Strength) of Plating Conductor Layer> > Can be grasped by the measuring method described in>.

  The upper limit of the peel strength of the cured product of the resin composition of the present invention is preferably 0.5 kgf / cm, more preferably 0.6 kgf / cm, further preferably 0.7 kgf / cm, and further 1.0 kgf / cm. Even more preferred. The lower limit of the peel strength of the cured product of the resin composition of the present invention is preferably 0.4 kgf / cm, more preferably 0.45 kgf / cm.

  The surface roughness of the cured product of the resin composition containing the (A) component, (B) component, and (C) component of the present invention is <measurement of arithmetic average roughness (Ra value) after roughening> It can be grasped by the measuring method described in Evaluation>.

  The upper limit of the surface roughness of the cured product of the resin composition of the present invention is preferably 440 nm, more preferably 400 nm, and still more preferably 370 nm. The lower limit of the surface roughness of the cured product of the resin composition of the present invention is preferably 250 nm, more preferably 200 nm, still more preferably 150 nm, still more preferably 100 nm, and particularly preferably 50 nm.

  The dielectric loss tangent of the cured product of the resin composition containing the components (A), (B), and (C) of the present invention should be determined by the measurement method described in <Measurement and evaluation of dielectric loss tangent> described later. Can do.

  The upper limit of the dielectric loss tangent of the cured product of the resin composition of the present invention is preferably 0.0079, more preferably 0.0075, and still more preferably 0.0070. The lower limit of the dielectric loss tangent of the cured product of the resin composition of the present invention is preferably 0.0050, more preferably 0.0040, and still more preferably 0.0030.

[Polymer resin]
The resin composition of the present invention can further improve the film strength when used in the form of a mechanical strength of the cured product or an adhesive film by further containing a specific polymer resin. Such polymer resins include polyvinyl acetal resin, phenoxy resin, polyimide resin, polyamideimide resin, polyetherimide resin, polysulfone resin, polyethersulfone resin, polyphenylene ether resin, polycarbonate resin, polyetheretherketone resin, polyester. Examples thereof include resins. Two or more polymer resins may be used in combination. As the polymer resin, polyvinyl acetal resin and phenoxy resin are particularly preferable, and phenoxy resin is more preferable.

  As the polyvinyl acetal resin, a polyvinyl butyral resin is particularly preferable. Specific examples of the polyvinyl acetal resin include: Denki Butyral 4000-2, 5000-A, 6000-C, 6000-EP manufactured by Denki Kagaku Kogyo Co., Ltd. Series, BL series, BM series and the like. The polyvinyl acetal resin having a glass transition temperature of 80 ° C. or higher is particularly preferable. The “glass transition temperature” here is determined according to the method described in JIS K7197. When the glass transition temperature is higher than the decomposition temperature and the glass transition temperature is not actually observed, the decomposition temperature can be regarded as the glass transition temperature in the present invention. The decomposition temperature is defined as the temperature at which the mass reduction rate is 5% when measured according to the method described in JIS K 7120.

  Examples of the phenoxy resin include bisphenol A skeleton, bisphenol F skeleton, bisphenol S skeleton, bisphenol acetophenone skeleton, novolac skeleton, biphenyl skeleton, fluorene skeleton, dicyclopentadiene skeleton, norbornene skeleton, naphthalene skeleton, anthracene skeleton, adamantane skeleton, terpene skeleton, Examples thereof include those having one or more skeletons selected from a trimethylcyclohexane skeleton. Of these, a bisphenol acetophenone skeleton, a biphenyl skeleton, and a fluorene skeleton are preferable. Two or more phenoxy resins may be mixed and used. The terminal of the phenoxy resin may be any functional group such as a phenolic hydroxyl group or an epoxy group.

  Specific examples of the phenoxy resin include FX280, FX293 manufactured by Toto Kasei Co., Ltd., 1256, 4250 (bisphenol A skeleton-containing phenoxy resin) manufactured by Japan Epoxy Resin Co., Ltd., YX8100 (bisphenol S skeleton-containing phenoxy resin), YX6954, YL6974, YL7482, YL7553, YL6794 (bisphenol acetophenone skeleton-containing phenoxy resin), YL7213, YL7290, and the like can be given. The phenoxy resin preferably has a glass transition temperature of 80 ° C. or higher, particularly preferably 100 ° C. or higher.

  The weight average molecular weight of the polymer resin is preferably in the range of 5,000 to 200,000, more preferably in the range of 15,000 to 100,000, and still more preferably in the range of 30,000 to 80,000. If it is smaller than this range, the effect of improving the film forming ability and mechanical strength tends to be insufficient. If it is larger than this range, the compatibility with the cyanate ester resin and the epoxy resin is lowered, and the surface of the insulating layer is roughened. Later roughness tends to increase.

  In addition, the weight average molecular weight in this invention is measured by the gel permeation chromatography (GPC) method (polystyrene conversion). Specifically, the weight average molecular weight by the GPC method is LC-9A / RID-6A manufactured by Shimadzu Corporation as a measuring device, and Shodex K-800P / K-804L / K- manufactured by Showa Denko KK as a column. 804 L can be measured at a column temperature of 40 ° C. using chloroform or the like as a mobile phase, and can be calculated using a standard polystyrene calibration curve.

  The content of the polymer resin in the resin composition is not particularly limited, but is preferably 1 to 20% by mass, more preferably 2 to 15% with respect to 100% by mass of the nonvolatile content of the resin composition. It is mass%, More preferably, it is 2-10 mass%. If the content of the polymer resin is too small, the effect of improving the film forming ability and the mechanical strength tends to be hardly exhibited. If the content is too large, the roughness of the surface of the insulating layer after the roughening process tends to increase.

[Inorganic filler]
An inorganic filler may be added to the resin composition of the present invention in order to further reduce the thermal expansion coefficient of the insulating layer obtained from the resin composition. Examples of the inorganic filler include silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, barium titanate, Examples include strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, and calcium zirconate. Among these, silica such as amorphous silica, fused silica, crystalline silica, and synthetic silica Particularly preferred. The silica is preferably spherical. Two or more inorganic fillers may be used in combination. The average particle diameter of the inorganic filler is not particularly limited, but is preferably 5 μm or less, more preferably 1 μm or less, and even more preferably 0.7 μm or less from the viewpoint of forming fine wiring on the insulating layer. In addition, when the average particle diameter of the inorganic filler is too small, when the resin composition is used as a resin varnish, the viscosity of the varnish tends to increase and the handleability tends to decrease. It is preferable that it is 05 μm or more. The average particle diameter of the inorganic filler can be measured by a laser diffraction / scattering method based on Mie scattering theory. Specifically, the particle size distribution of the inorganic filler can be created on a volume basis by a laser diffraction particle size distribution measuring device, and the median diameter can be measured as the average particle diameter. As the measurement sample, an inorganic filler dispersed in water by ultrasonic waves can be preferably used. As a laser diffraction type particle size distribution measuring apparatus, LA-500 manufactured by Horiba Ltd. can be used.

  The inorganic filler is preferably one that has been surface treated with a surface treatment agent such as an epoxy silane coupling agent, an amino silane coupling agent, or a titanate coupling agent to improve its moisture resistance. The addition amount of the inorganic filler is preferably in the range of 10 to 70% by mass, more preferably in the range of 15 to 60% by mass, and further in the range of 20 to 55% by mass with respect to 100% by mass of the nonvolatile content of the resin composition. preferable. When there is too much content of an inorganic filler, it exists in the tendency for hardened | cured material to become weak and for the peel strength to fall.

[Rubber particles]
From the viewpoint of improving the plating adhesion, rubber particles can be further added to the resin composition of the present invention. The rubber particles that can be used in the present invention are, for example, those that do not dissolve in the organic solvent used when preparing the varnish of the resin composition and are incompatible with the essential components cyanate ester resin and polyvinylbenzyl compound. It is. Accordingly, the rubber particles exist in a dispersed state in the varnish of the resin composition of the present invention. Such rubber particles are generally prepared by increasing the molecular weight of the rubber component to a level at which it does not dissolve in an organic solvent or resin and making it into particles.

  Preferable examples of rubber particles that can be used in the present invention include core-shell type rubber particles, cross-linked acrylonitrile butadiene rubber particles, cross-linked styrene butadiene rubber particles, and acrylic rubber particles. The core-shell type rubber particles are rubber particles having a core layer and a shell layer. For example, a two-layer structure in which an outer shell layer is formed of a glassy polymer and an inner core layer is formed of a rubbery polymer, or Examples include a three-layer structure in which the outer shell layer is made of a glassy polymer, the intermediate layer is made of a rubbery polymer, and the core layer is made of a glassy polymer. The glassy polymer layer is made of, for example, a polymer of methyl methacrylate, and the rubbery polymer layer is made of, for example, a butyl acrylate polymer (butyl rubber). Two or more rubber particles may be used in combination. Specific examples of the core-shell type rubber particles include Staphyloid AC3832, AC3816N (trade name, manufactured by Ganz Kasei Co., Ltd.), and Metabrene KW-4426 (trade name, manufactured by Mitsubishi Rayon Co., Ltd.). Specific examples of the crosslinked acrylonitrile butadiene rubber (NBR) particles include XER-91 (average particle size: 0.5 μm, manufactured by JSR Corporation). Specific examples of the crosslinked styrene butadiene rubber (SBR) particles include XSK-500 (average particle size 0.5 μm, manufactured by JSR Corporation). Specific examples of the acrylic rubber particles include methabrene W300A (average particle size 0.1 μm), W450A (average particle size 0.2 μm) (manufactured by Mitsubishi Rayon Co., Ltd.), and the like.

  The average particle diameter of the rubber particles to be blended is preferably in the range of 0.005 to 1 μm, more preferably in the range of 0.2 to 0.6 μm. The average particle diameter of the rubber particles used in the present invention can be measured using a dynamic light scattering method. For example, rubber particles are uniformly dispersed in an appropriate organic solvent by ultrasonic waves, etc., and a particle size distribution of rubber particles is created on a mass basis using a concentrated particle size analyzer (FPAR-1000; manufactured by Otsuka Electronics Co., Ltd.). And it can measure by making the median diameter into an average particle diameter.

  The content of the rubber particles is preferably 1 to 10% by mass and more preferably 2 to 5% by mass with respect to 100% by mass of the nonvolatile content of the resin composition.

[Epoxy resin]
The resin composition of the present invention can further contain an epoxy resin from the viewpoint of improving adhesion and insulation. The epoxy resin is not particularly limited. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, alkylphenol novolac type epoxy resin, epoxy having a butadiene structure Resin, biphenyl type epoxy resin, aralkyl type epoxy resin, naphthol type epoxy resin, dicyclopentadiene type epoxy resin, naphthalene type epoxy resin, epoxidized product of phenol and aromatic aldehyde having phenolic hydroxyl group, biphenyl Examples thereof include aralkyl type epoxy resins, fluorene type epoxy resins, xanthene type epoxy resins, triglycidyl isocyanurate, phosphorus-containing epoxy resins and the like. Of these, biphenyl type epoxy resins, aralkyl type epoxy resins, naphthol type epoxy resins, naphthalene type epoxy resins, and biphenyl aralkyl type epoxy resins are preferable. Two or more epoxy resins may be used in combination.

  Examples of commercially available epoxy resins include “jER828EL” (liquid bisphenol A type epoxy resin) manufactured by Japan Epoxy Resin Co., Ltd., “HP4032”, “HP4032D” (naphthalene type 2) manufactured by Dainippon Ink & Chemicals, Inc. Functional epoxy resin), "HP4700" (naphthalene type tetrafunctional epoxy resin) manufactured by Dainippon Ink & Chemicals, Ltd., "ESN-475V" (naphthol type epoxy resin) manufactured by Toto Kasei Co., Ltd., Daicel Chemical Industries, Ltd. “PB-3600” (epoxy resin having a butadiene structure) manufactured by Nippon Kayaku Co., Ltd., “NC3000H”, “NC3000L” (biphenyl type epoxy resin), “YX4000” (biphenyl type epoxy) manufactured by Japan Epoxy Resin Co., Ltd. Resin), "YX8800" manufactured by Japan Epoxy Resin Co., Ltd. (Anthracene skeleton-containing epoxy resin) and the like.

  The upper limit of the content of the epoxy resin of the present invention is preferably 40% by mass, more preferably 30% by mass with respect to 100% by mass of the nonvolatile content of the resin composition, from the viewpoint of preventing a decrease in dielectric properties. More preferred is mass%. On the other hand, the lower limit of the content of the epoxy resin is preferably 3% by mass and more preferably 10% by mass from the viewpoint of obtaining the effect of blending the epoxy resin.

[Other thermosetting resins]
The resin composition of the present invention can be blended with a thermosetting resin such as a maleimide compound or a bisallylnadiimide compound within a range in which the effects of the present invention are exhibited as necessary. Such thermosetting resins may be used in combination of two or more. As maleimide resins, BMI-1000, BMI-2000, BMI-3000, BMI-4000, BMI-5100 (manufactured by Daiwa Kasei Kogyo Co., Ltd.), BMI, BMI-70, BMI-80 (Kay Kasei Co., Ltd.) )), ANILIX-MI (Mitsui Chemicals Fine Co., Ltd.), and the like, examples of bisallylnadiimide compounds include BANI-M, BANI-X (manufactured by Maruzen Petrochemical Industry Co., Ltd.), and the like.

[Acrylate compounds, methacrylate compounds]
The resin composition of this invention can also mix | blend polymeric compounds, such as an acrylate compound and a methacrylate compound, in the range by which the effect of this invention is exhibited as needed. Examples of such compounds include ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, oligoester (meth) monoacrylate, ethylene glycol di ( (Meth) acrylate, polyethylene glycol diacrylate, neopentyl glycol (meth) acrylate, tetramethylolmethane di (meth) acrylate, trimethylolpropane di (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, pentaerythritol tri (meth) Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2-hydroxy-1- (meth) acryloxy -3- (meth) acrylate, epoxy acrylate (for example, bisphenol A type epoxy (meth) acrylate, novolac type epoxy (meth) acrylate, cresol novolac type epoxy (meth) acrylate) and carboxyl group-containing cresol novolac type epoxy (meth) Acrylate), urethane (meth) acrylate, and the like.

[Flame retardants]
The resin composition of the present invention may contain a flame retardant as long as the effects of the present invention are not impaired. Examples of the flame retardant include an organic phosphorus flame retardant, an organic nitrogen-containing phosphorus compound, a nitrogen compound, a silicone flame retardant, and a metal hydroxide. Examples of organic phosphorus flame retardants include phenanthrene-type phosphorus compounds such as HCA, HCA-HQ, and HCA-NQ manufactured by Sanko Co., Ltd., phosphorus-containing benzoxazine compounds such as HFB-2006M manufactured by Showa Polymer Co., Ltd., and Ajinomoto Co., Inc. Reefos 30, 50, 65, 90, 110, Fine Techno Co., TPP, RPD, BAPP, CPD, TCP, TXP, TBP, TOP, KP140, TIBP, PPQ, Clariant (made by Hokuko Chemical Co., Ltd.) Phosphoric acid ester compounds such as OP930 manufactured by Daihachi Chemical Co., Ltd., FX289 compounds manufactured by Tohto Kasei Co., Ltd., phosphorus-containing epoxy resins such as FX305, phosphorus such as ERF001 manufactured by Tohto Kasei Co., Ltd. And a phosphorus-containing epoxy resin such as YL7613 manufactured by Japan Epoxy Resin Co., Ltd. Examples of organic nitrogen-containing phosphorus compounds include phosphate ester compounds such as SP670 and SP703 manufactured by Shikoku Kasei Kogyo Co., Ltd., phosphazenes such as SPB100 and SPE100 manufactured by Otsuka Chemical Co., Ltd., and FP-series manufactured by Fushimi Seisakusho Co., Ltd. Compounds and the like. As the metal hydroxide, magnesium hydroxide such as UD65, UD650, UD653 manufactured by Ube Materials Co., Ltd., B-30, B-325, B-315, B-308, B manufactured by Sakai Kogyo Co., Ltd. And aluminum hydroxide such as -303 and UFH-20.

[Other ingredients]
In the resin composition of the present invention, other components can be blended as necessary within a range not inhibiting the effects of the present invention. Other components include, for example, tougheners such as FORTEGRA manufactured by Dow Chemical Japan Co., Ltd., organic fillers such as silicon powder, nylon powder and fluorine powder, thickeners such as Orben and Benton, silicone type, fluorine type, Adhesion imparting agents such as polymeric antifoaming or leveling agents, imidazole, thiazole, triazole, silane coupling agents, phthalocyanine blue, phthalocyanine green, iodin green, disazo yellow, carbon black, etc. And the like.

  The method for preparing the resin composition of the present invention is not particularly limited, and examples thereof include a method in which the components are mixed using a rotary mixer or the like, if necessary, by adding a solvent or the like.

  The use of the resin composition of the present invention is not particularly limited, but includes insulating resin sheets such as adhesive films and prepregs, circuit boards, solder resists, underfill materials, die bonding materials, semiconductor encapsulants, hole filling resins, and component embeddings. It can be used in a wide range of applications where a resin composition is required, such as a resin. Especially, it can use suitably in order to form an insulating layer in manufacture of a multilayer printed wiring board. The resin composition of the present invention can be applied to a circuit board in a varnish state to form an insulating layer, but in general, it is preferably used in the form of a sheet-like laminated material such as an adhesive film or a prepreg. . The softening point of the resin composition is preferably 40 to 150 ° C. from the viewpoint of the laminate property of the sheet-like laminated material.

[Adhesive film]
The adhesive film of the present invention is prepared by a method known to those skilled in the art, for example, by preparing a resin varnish in which a resin composition is dissolved in an organic solvent, and applying the resin varnish to a support using a die coater or the like. It can be produced by drying the organic solvent by heating or blowing hot air to form the resin composition layer.

  Examples of the organic solvent include ketones such as acetone, methyl ethyl ketone and cyclohexanone, acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate and carbitol acetate, and carbitols such as cellosolve and butyl carbitol. , Aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. These organic solvents may be used alone or in combination of two or more.

  The drying conditions are not particularly limited, but the drying is performed so that the content of the organic solvent in the resin composition layer is 10% by mass or less, preferably 5% by mass or less. Depending on the amount of organic solvent in the varnish and the boiling point of the organic solvent, for example, a resin composition layer is formed by drying a varnish containing 30 to 60% by mass of an organic solvent at 50 to 150 ° C. for about 3 to 10 minutes. Is done. Those skilled in the art can appropriately set suitable drying conditions through simple experiments.

  The thickness of the resin composition layer formed in the adhesive film is preferably equal to or greater than the thickness of the conductor layer. Since the thickness of the conductor layer of the circuit board is usually in the range of 5 to 70 μm, the resin composition layer preferably has a thickness of 10 to 100 μm.

  Examples of the support include polyolefin films such as polyethylene, polypropylene, and polyvinyl chloride, polyethylene terephthalate (hereinafter sometimes abbreviated as “PET”), polyester films such as polyethylene naphthalate, polycarbonate films, and polyimide films. Various plastic films are listed. The support and the protective film described later may be subjected to surface treatment such as mat treatment or corona treatment. The release treatment may be performed with a release agent such as a silicone resin release agent, an alkyd resin release agent, or a fluororesin release agent. Moreover, you may use release foil, metal foil, such as copper foil and aluminum foil. In addition, when copper foil is used, a copper foil layer can also be pattern-processed by a subtractive method etc. as it is, and a circuit can also be formed.

  Although the thickness of a support body is not specifically limited, 10-150 micrometers is preferable and 25-50 micrometers is more preferable.

  A protective film according to the support can be further laminated on the surface of the resin composition layer on which the support is not in close contact. Although the thickness of a protective film is not specifically limited, For example, it is 1-40 micrometers. By laminating the protective film, it is possible to prevent dust and the like from being attached to the surface of the resin composition layer and scratches. The adhesive film can also be stored in a roll.

[Multilayer printed wiring board using adhesive film]
Next, an example of a method for producing a multilayer printed wiring board using the adhesive film produced as described above will be described.

  First, an adhesive film is laminated on one side or both sides of a circuit board using a vacuum laminator. Examples of the substrate used for the circuit substrate include a glass epoxy substrate, a metal substrate, a polyester substrate, a polyimide substrate, a BT resin substrate, a thermosetting polyphenylene ether substrate, and the like. In addition, a circuit board means here that the conductor layer (circuit) patterned was formed in the one or both surfaces of the above boards. Also, in a multilayer printed wiring board in which conductor layers and insulating layers are alternately laminated, one of the outermost layers of the multilayer printed wiring board is a conductor layer (circuit) in which one or both sides are patterned. It is included in the circuit board. The surface of the conductor layer may be previously roughened by blackening, copper etching, or the like.

In the above laminate, when the adhesive film has a protective film, after removing the protective film, the adhesive film and the circuit board are preheated as necessary, and the adhesive film is pressed and heated to the circuit board. Crimp. In the adhesive film of the present invention, a method of laminating on a circuit board under reduced pressure by a vacuum laminating method is preferably used. Lamination conditions are not particularly limited. For example, the pressure bonding temperature (laminating temperature) is preferably 70 to 140 ° C., and the pressure bonding pressure is preferably 1 to 11 kgf / cm ² (9.8 × 10 ^{4 to} 107). 9.9 × 10 ⁴ N / m ² ), and lamination is preferably performed under reduced pressure with an air pressure of 20 mmHg (26.7 hPa) or less. The laminating method may be a batch method or a continuous method using a roll.

  The vacuum lamination can be performed using a commercially available vacuum laminator. Commercially available vacuum laminators include, for example, a vacuum applicator manufactured by Nichigo-Morton Co., Ltd., a vacuum pressurizing laminator manufactured by Meiki Seisakusho Co., Ltd., a roll dry coater manufactured by Hitachi Industries, Ltd., and Hitachi AIC Co., Ltd. ) Made vacuum laminator and the like.

  Moreover, the lamination process which heats and pressurizes under reduced pressure can also be performed using a general vacuum hot press machine. For example, it can be performed by pressing a metal plate such as a heated SUS plate from the support layer side.

As pressing conditions, the degree of reduced pressure is preferably 1 × 10 ⁻² MPa or less, and more preferably 1 × 10 ⁻³ MPa or less. Although heating and pressurization can be carried out in one stage, it is preferable to carry out the conditions separately in two or more stages from the viewpoint of controlling the oozing of the resin. For example, the first stage press has a temperature of 70 to 150 ° C. and the pressure is in a range of 1 to 15 kgf / cm ² , and the second stage press has a temperature of 150 to 200 ° C. and a pressure of 1 to 40 kgf / cm ² It is preferable to carry out within a range. The time for each stage is preferably 30 to 120 minutes. Examples of commercially available vacuum hot press machines include MNPC-V-750-5-200 (manufactured by Meiki Seisakusho), VH1-1603 (manufactured by Kitagawa Seiki Co., Ltd.), and the like.

  After laminating the adhesive film on the circuit board, it is cooled to around room temperature, and then the support is peeled off, and then the resin composition is thermally cured to form an insulating layer on the circuit board. The thermosetting conditions may be appropriately selected according to the type and content of the resin component in the resin composition, but preferably 150 ° C. to 220 ° C. for 20 minutes to 180 minutes, more preferably 160 ° C. to 200 ° C. It is selected in the range of 30 to 120 minutes at ° C.

  If the support is not peeled off after the insulating layer is formed, it is peeled off here. Next, if necessary, holes are formed in the insulating layer formed on the circuit board to form via holes and through holes. Drilling can be performed, for example, by a known method such as drilling, laser, or plasma, or by combining these methods as necessary. However, drilling by a laser such as a carbon dioxide gas laser or a YAG laser is the most common method. is there.

  Next, a conductor layer is formed on the insulating layer by dry plating or wet plating. As the dry plating, a known method such as vapor deposition, sputtering, or ion plating can be used. In the case of wet plating, first, the surface of the cured resin composition layer (insulating layer) is coated with permanganate (potassium permanganate, sodium permanganate, etc.), dichromate, ozone, hydrogen peroxide / Roughening treatment is performed with an oxidizing agent such as sulfuric acid or nitric acid to form an uneven anchor. As the oxidizing agent, an aqueous sodium hydroxide solution (alkaline permanganate aqueous solution) such as potassium permanganate and sodium permanganate is particularly preferably used. Next, a conductor layer is formed by a method combining electroless plating and electrolytic plating. Alternatively, a plating resist having a pattern opposite to that of the conductor layer can be formed, and the conductor layer can be formed only by electroless plating. As a subsequent pattern formation method, for example, a subtractive method or a semi-additive method known to those skilled in the art can be used.

[Prepreg]
The prepreg of the present invention can be produced by impregnating the resin composition of the present invention into a sheet-like reinforcing base material made of fibers by a hot melt method or a solvent method, and heating and semi-curing. That is, it can be set as the prepreg which will be in the state which the resin composition of this invention impregnated the sheet-like reinforcement base material which consists of fibers. As the sheet-like reinforcing substrate made of fibers, for example, those made of fibers that are commonly used as prepreg fibers such as glass cloth and aramid fibers can be used.

  The hot melt method is a method in which a resin is once coated on a coated paper having good releasability from the resin without dissolving it in an organic solvent, and then laminated on a sheet-like reinforcing substrate, or the resin is added to an organic solvent. In this method, the prepreg is produced by, for example, coating directly on a sheet-like reinforcing substrate with a die coater without being dissolved in the substrate. In the solvent method, a resin varnish is prepared by dissolving a resin in an organic solvent in the same manner as the adhesive film, and a sheet-like reinforcing base material is immersed in the varnish, and then the resin-like varnish is impregnated into the sheet-like reinforcing base material. It is a method of drying.

[Multilayer printed wiring board using prepreg]
Next, an example of a method for producing a multilayer printed wiring board using the prepreg produced as described above will be described. One or several prepregs of the present invention are stacked on a circuit board, sandwiched between metal plates through a release film, and press-laminated under pressure and heating conditions. The pressurizing / heating conditions are preferably a pressure of 5 to 40 kgf / cm ² (49 × 10 ^{4 to} 392 × 10 ⁴ N / m ² ) and a temperature of 120 to 200 ° C. for 20 to 100 minutes. Similarly to the adhesive film, the prepreg can be laminated on a circuit board by a vacuum laminating method and then cured by heating. Thereafter, in the same manner as described above, the surface of the cured prepreg is roughened, and then a conductor layer is formed by plating to produce a multilayer printed wiring board.

  EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

[Example 1]
40 parts by mass of dicyclopentadiene-type cyanate ester resin (“DT-4000” manufactured by Lonza Japan Co., Ltd., toluene solution having a cyanate equivalent of about 140 and a nonvolatile content of 85% by mass), a curable polyvinylbenzyl compound (Showa Polymer Co., Ltd.) Manufactured by V5000X, non-volatile content: 65% by mass), 30 parts by weight of cobalt (II) acetylacetonate (manufactured by Tokyo Chemical Industry Co., Ltd.), 4 parts by mass of a 1% by mass N, N-dimethylformamide (hereinafter abbreviated as DMF) solution, 15 parts by weight of a polyvinyl butyral resin solution (1: 1 solution of methyl ethyl ketone (hereinafter abbreviated as MEK) and cyclohexanone having a solid content of 15% by mass of "KS-1" (glass transition temperature 105 ° C) manufactured by Sekisui Chemical Co., Ltd.) 1 part by weight of an epoxy resin having a butadiene structure (“PB-3600” manufactured by Daicel Chemical Industries, Ltd.) 80 parts by mass of spherical silica ("SOC2" manufactured by Admatechs Co., Ltd., surface-treated with aminosilane, average particle size 0.5 µm) and 10 parts by mass of toluene were mixed and dispersed uniformly with a high-speed rotary mixer. A varnish of a thermosetting resin composition was prepared.
In the nonvolatile content of the resin composition, dicyclopentadiene-type cyanate ester resin 25% by mass, curable polyvinyl benzyl compound 14% by mass, metal (cobalt) 53 ppm added as an organometallic catalyst, polymer resin 1.7% by mass, It becomes 59 mass% of inorganic fillers.
Next, on the release surface of the polyethylene terephthalate film (AL5 manufactured by Lintec Co., Ltd., thickness 38 μm, hereinafter abbreviated as “PET film”) subjected to the release treatment of the resin composition varnish, the resin composition layer after drying It apply | coated uniformly with the die-coater so that thickness might be set to 40 micrometers, and it dried for 6 minutes at 80-120 degreeC (average 100 degreeC) (residual solvent amount in a resin composition layer: about 1.5 mass%). Subsequently, it wound up in roll shape, bonding a 15-micrometer-thick polypropylene film on the surface of a resin composition layer. The roll-like adhesive film was slit to a width of 507 mm to obtain a sheet-like adhesive film having a size of 507 × 336 mm.

[Example 2]
Dicyclopentadiene-type cyanate ester resin (Lonza Japan Co., Ltd. “DT-4000”, cyanate equivalent of about 140, toluene solution with non-volatile content of 85% by mass), 30 parts by mass, curable polyvinylbenzyl compound (Showa Polymer Co., Ltd.) Manufactured by V5000X, non-volatile content: 65% by mass) 25 parts by weight, zinc naphthenate (II) (manufactured by Tokyo Chemical Industry Co., Ltd., 3% by mass of cyclohexanone solution of 3% by mass, mineral spirit solution having a zinc content of 8% by mass), bisphenol Prepolymer of A dicyanate ("BA230S75" manufactured by Lonza Japan Co., Ltd., methyl ethyl ketone solution having a cyanate equivalent of about 232 and a non-volatile content of 75% by mass), phenol novolac type polyfunctional cyanate ester resin ("Lonza Japan Co., Ltd." PT30 ", cyanate equivalent of about 124) Parts by weight, 10 parts by mass of a phenoxy resin solution (“YL-7553” manufactured by Japan Epoxy Resin Co., Ltd., a mixed solution of MEK and cyclohexanone having a nonvolatile content of 30% by mass, weight average molecular weight 36000), and a phosphorus-containing epoxy resin (Toto Kasei) Co., Ltd. TX-0712, epoxy equivalent of about 370, phosphorus content 2.8% by mass, non-volatile content 75% by mass MEK solution 8 parts by mass, and spherical silica (Admatex Co., Ltd. "SOC2" is aminosilane 80 parts by mass, average particle size 0.5 μm) and 10 parts by mass of toluene were mixed and dispersed uniformly with a high-speed rotary mixer to prepare a varnish of a thermosetting resin composition.
In the nonvolatile content of the resin composition, dicyclopentadiene-type cyanate ester resin 18% by mass, curable polyvinyl benzyl compound 11% by mass, metal (cobalt) 51 ppm added as an organometallic catalyst, polymer resin 2.1% by mass, It becomes 56 mass% of inorganic fillers.
Next, using this resin composition varnish, an adhesive film was obtained in exactly the same manner as in Example 1.

[Example 3]
30 parts by mass of a prepolymer of bisphenol A dicyanate ("BA230S75" manufactured by Lonza Japan Co., Ltd., MEK solution having a cyanate equivalent of about 232 and a non-volatile content of 75% by mass) and dicyclopentadiene-type cyanate ester resin (manufactured by Lonza Japan Co., Ltd. 10 parts by mass of DT-4000 ", a toluene solution having a cyanate equivalent of about 140 and a nonvolatile content of 85% by mass) was stirred and mixed together with 10 parts by mass of MEK. To this, 35 parts by mass of “ESN-475V” (an epoxy equivalent of about 340 non-volatile content 65% by mass MEK solution) manufactured by Toto Kasei Co., Ltd. as a naphthol type epoxy resin was added to a biphenyl type epoxy resin (epoxy equivalent 269, Nippon Kayaku). "NC3000L" manufactured by Co., Ltd.) was added by dissolving 15 parts by mass together with 20 parts by mass of cyclohexanone. Thereto, a phenoxy resin solution (“YL-7553” manufactured by Japan Epoxy Resin Co., Ltd., a mixed solution of MEK and cyclohexanone having a nonvolatile content of 30% by mass, a weight average molecular weight of 36000), 10 parts by mass, and a toluene having a nonvolatile content of 85% by mass. Solution) 30 parts by weight, curable polyvinyl benzyl compound (“V5000X” manufactured by Showa Polymer Co., Ltd., nonvolatile content 65% by weight) 3 parts by weight, zinc naphthenate (II) (manufactured by Tokyo Chemical Industry Co., Ltd., zinc content) 3 parts by weight of a 3% by weight cyclohexanone solution (8% by weight mineral spirit solution) and 95 parts by weight of spherical silica ("SOC2" manufactured by Admatechs Co., Ltd., surface-treated with aminosilane, average particle size 0.5 µm) And were uniformly dispersed with a high-speed rotary mixer to prepare a varnish of a thermosetting resin composition.
In the nonvolatile content of the resin composition, 5% by mass of a dicyclopentadiene-type cyanate ester resin, 1% by mass of a curable polyvinylbenzyl compound, 60 ppm of metal (zinc) added as an organometallic catalyst, 1.9% by mass of a polymer resin, It becomes 59 mass% of inorganic fillers.
Next, using this resin composition varnish, an adhesive film was obtained in exactly the same manner as in Example 1.

[Comparative Example 1]
40 parts by mass of the dicyclopentadiene-type cyanate ester resin of Example 1 (“DT-4000” manufactured by Lonza Japan Co., Ltd., a toluene solution having a cyanate equivalent of about 140 and a nonvolatile content of 85% by mass) was added to a phenol novolac-type polyfunctional cyanate ester. An adhesive film was obtained in exactly the same manner as in Example 1 except that the resin ("PT30" manufactured by Lonza Japan Co., Ltd., cyanate equivalent of about 124) was changed to 34 parts by mass.

[Comparative Example 2]
30 parts by weight of the curable polyvinyl benzyl compound (V5000X, Showa High Polymer Co., Ltd., non-volatile content 65 mass%) of Example 1 was added to a prepolymer of bisphenol A dicyanate (“BA230S75” manufactured by Lonza Japan Co., Ltd.) with a cyanate equivalent of about 232, methyl ethyl ketone solution having a nonvolatile content of 75% by mass) An adhesive film was obtained in the same manner as in Example 1 except that the content was changed to 26 parts by mass.

[Comparative Example 3]
Prepolymer of bisphenol A dicyanate ("BA230S75" manufactured by Lonza Japan Co., Ltd., MEK solution having a cyanate equivalent of about 232 and a nonvolatile content of 75% by mass) and phenol novolac type polyfunctional cyanate ester resin (Lonza Japan Co., Ltd.) 10 parts by weight of “PT30”, a cyanate equivalent of about 124) was mixed with 10 parts by weight of MEK with stirring. To this, as a naphthol type epoxy resin, “ESN-475V” manufactured by Tohto Kasei Co., Ltd. (an MEK solution having an epoxy equivalent of about 340 having a nonvolatile content of 65% by mass) and a biphenyl type epoxy resin (epoxy equivalent 269, Nippon Kayaku) "NC3000L" manufactured by Co., Ltd.) was added by heating and dissolving 35 parts by mass together with 20 parts by mass of cyclohexanone. There, 20 parts by mass of a polyvinyl butyral resin solution (Sekisui Chemical Co., Ltd. “KS-1” (1: 1 solution of MEK and cyclohexanone having a solid content of 15 mass%) having a solid content of 15 mass%) was mixed, 3 parts by mass of 3% by mass cyclohexanone solution of zinc naphthenate (II) (manufactured by Tokyo Chemical Industry Co., Ltd., mineral spirit solution having a zinc content of 8% by mass), and spherical silica ("SOC2" by Admatechs Co., Ltd.) 70 parts by mass of a surface treated with aminosilane (average particle size 0.5 μm) were mixed and dispersed uniformly with a high-speed rotary mixer to prepare a varnish of a thermosetting resin composition.
Next, using this resin composition varnish, an adhesive film was obtained in exactly the same manner as in Example 1.

<Preparation of samples for measuring peel strength and surface roughness>
(1) Ground treatment of laminated board Glass cloth base material epoxy resin double-sided copper-clad laminated board with inner layer circuit [copper foil thickness 18μm, substrate thickness 0.3mm, Panasonic Electric Works Co., Ltd. R5715ES] The copper surface was roughened by immersing in CZ8100 manufactured by Co., Ltd.
(2) Lamination of adhesive film The adhesive film produced in Examples 1 and 2 and Comparative Examples 1 to 3 was laminated using a batch-type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.). Laminated on both sides. Lamination was performed by reducing the pressure for 30 seconds to a pressure of 13 hPa or less, and then pressing at 100 ° C. and a pressure of 0.74 MPa for 30 seconds.
(3) Curing of resin composition After lamination, the resin composition was cured at 100 ° C for 30 minutes and further at 180 ° C for 30 minutes. Thereafter, the PET film was peeled from the adhesive film.
(4) Roughening treatment The laminate is immersed in a swelling dip securigant P containing diethylene glycol monobutyl ether of Atotech Japan Co., Ltd., which is a swelling liquid, and then the outlet of Atotech Japan Co., Ltd. as a roughening liquid. Immerse in rate compact P (KMnO ₄ : 60 g / L, NaOH: 40 g / L aqueous solution), and finally immerse in Atotech Japan Co., Ltd., reduction solution securigant P at 5 ° C. for 5 minutes. did. Roughening conditions: immersed in a swelling liquid at 80 ° C. for 10 minutes, and immersed in a roughening liquid at 80 ° C. for 25 minutes. About the laminated board after this roughening process, the surface roughness (arithmetic mean roughness) was measured.
(5) Plating by semi-additive method In order to form a circuit on the surface of the insulating layer, the laminate was immersed in an electroless plating catalyst solution containing PdCl ₂ and then immersed in an electroless copper plating solution. After annealing at 150 ° C. for 30 minutes, an etching resist was formed, and after pattern formation by etching, copper sulfate electrolytic plating was performed to form a conductor layer with a thickness of 30 ± 5 μm. Next, annealing was performed at 180 ° C. for 60 minutes. The peel strength of the plated copper was measured for this laminate.

<Measurement and Evaluation of Peeling Strength (Peel Strength) of Plating Conductor Layer>
The conductor layer of the laminated plate is cut with a cutter with a width of 10 mm and a length of 100 mm, and one end is peeled off to grasp the grip (TSE, Inc., Autocom type testing machine AC-50C-SL ) And measured the load when 35 mm was peeled off in the vertical direction at a speed of 50 mm / min at room temperature. When the peel strength value is 0.60 kgf / cm or more, “と し”, and less than 0.60 kgf / cm, 0.50 kgf / cm or more, “◯”, and less than 0.50 kgf / cm, 0.40 kgf / cm The case of cm or more was designated as “Δ”, and the case of less than 0.40 kgf / cm was designated as “x”.

<Measurement and evaluation of arithmetic average roughness (Ra value) after roughening>
Using a non-contact type surface roughness meter (WYKO NT3300 manufactured by BEIKO INSTRUMENTS Co., Ltd.), the arithmetic average roughness (Ra value) was obtained from the numerical value obtained by setting the measurement range to 121 μm × 92 μm with a VSI contact mode and a 50 × lens. In addition, the arithmetic average roughness (Ra value) shown in Table 1 is an average value of measured values obtained by cutting a 3 cm square measurement sample from the laminated plate and measuring 10 random points (10 locations) on the sample. . When the arithmetic average roughness (Ra value) is less than 300 nm, “◎”, when it is 300 nm or more and less than 370 nm, “◯”, when it is 370 nm or more and less than 450 nm, “Δ”, and 450 nm or more and less than 600 nm In the case of “×”, the case of 600 nm or more was designated as “XX”.

<Measurement and evaluation of dielectric loss tangent>
The adhesive films obtained in Examples 1, 2, and 3 and Comparative Examples 1, 2, and 3 were thermally cured at 190 ° C. for 90 minutes to obtain sheet-like cured products. The cured product was cut into a length of 80 mm and a width of 2 mm and used as an evaluation sample. The dielectric loss tangent of this evaluation sample was measured at a measurement frequency of 5.8 GHz and a measurement temperature of 23 ° C. by a cavity resonance perturbation method using an HP 8362B apparatus manufactured by Agilent Technologies. The case where the value of the dielectric loss tangent is less than 0.0060 is “、”, the case where it is 0.0060 or more and less than 0.0070 is “◯”, and the case where it is 0.0070 or more and less than 0.0080 is “△”, The case of 0.0080 or more and less than 0.0100 was designated as “X”, and the case of 0.0100 or more was designated as “XX”.

<Evaluation of linear thermal expansion coefficient>
The adhesive films obtained in Examples 1, 2, and 3 and Comparative Examples 1, 2, and 3 were thermally cured at 190 ° C. for 90 minutes to obtain sheet-like cured products. The cured product was cut into a test piece having a width of about 5 mm and a length of about 15 mm, and thermomechanical analysis was performed by a tensile load method using a thermomechanical analyzer manufactured by Rigaku Corporation (Thermo Plus TMA8310). After mounting the test piece on the above-mentioned apparatus, the test piece was measured twice continuously under the measurement conditions of a load of 1 g and a heating rate of 5 ° C./min. The average linear thermal expansion coefficient (ppm) from 25 ° C. to 150 ° C. in the second measurement was calculated. The case where the value of the coefficient of linear thermal expansion was less than 33 ppm was set as “◯”, and the case where it was 33 ppm or more was set as “Δ”.

  The results are shown in Table 1.

From the results of Table 1, the insulating layer formed of the adhesive films obtained in Examples 1 to 3 has a dielectric loss tangent lower than that of any of Comparative Examples 1 to 3, and a low linear thermal expansion coefficient of 32 ppm or less. In addition, it can be seen that a conductor layer peel strength of 0.5 kgf / cm or more can be obtained with a surface roughness as low as a Ra value of 360 nm or less and a low roughness.
On the other hand, in Comparative Example 1 in which the dicyclopentadiene type cyanate ester resin was not used and the phenol novolac type polyfunctional cyanate ester resin was changed, and in Comparative Example 2 in which no curable polyvinylbenzyl compound was used, the dielectric loss tangent was high. It can also be seen that the conductor layer peel strength is weak despite the high roughness.
In Comparative Example 3, which does not contain both the dicyclopentadiene-type cyanate ester resin and the curable polyvinyl benzyl compound, the roughness and the peel strength of the conductor layer are good, but the dielectric loss tangent is 0 because of the large amount of epoxy resin used. .011, which is nearly twice as high as that of the example, and was found to be unsuitable for use in the high frequency field.

According to the present invention, it is possible to provide a resin composition having a low dielectric loss tangent of a cured product and excellent adhesion strength with a conductor, and further, an adhesive film using the curable resin composition, and a prepreg Further, it is possible to provide an electronic component such as a printed wiring board using the adhesive film and the like, and a manufacturing method thereof.
This application is based on Japanese Patent Application No. 2009-008562 filed in Japan, the contents of which are incorporated in full herein.

Claims (14)

(A) A resin composition containing a dicyclopentadiene-type cyanate ester resin represented by the following general formula (1), (B) a curable polyvinylbenzyl compound , ( C) a metal-based curing catalyst, and an inorganic filler. The content of the inorganic filler is 56% by mass or more when the nonvolatile content of the resin composition is 100% by mass . (However, n is 0-5.)
When the nonvolatile content of the resin composition is 100% by mass, the content of the component (A) is 3 to 30 % by mass, the content of the component (B) is 0.5 to 25 % by mass, and the metal of the component (C) The resin composition according to claim 1, wherein the metal content based on the system curing catalyst is 25 to 500 ppm. The resin composition of Claim 1 or 2 whose content of a component (A) is 3-25 mass% when the non volatile matter of a resin composition is 100 mass%. Metal based curing catalyst is a cobalt, copper, zinc, iron, nickel, manganese, and of one or more metals selected from tin, according to any one of claims 1 to 3 which is an organic metal complex or organic metal salt Resin composition. Further, one kind selected from polyvinyl acetal resin, phenoxy resin, polyimide resin, polyamideimide resin, polyetherimide resin, polysulfone resin, polyethersulfone resin, polyphenylene ether resin, polycarbonate resin, polyetheretherketone resin, and polyester resin The resin composition according to any one of claims 1 to 4 , comprising the above polymer resin. The resin composition according to claim 5 , wherein the content of the polymer resin is 1 to 20% by mass with respect to 100% by mass of the nonvolatile content of the resin composition. The average particle size of no machine filler Ru der following 1 [mu] m, the resin composition according to any one of claims 1-6. The resin composition according to any one of claims 1 to 7 , wherein the inorganic filler is silica. The resin composition according to claim 1, which is for forming an insulating layer of a multilayer printed wiring board. The resin composition according to any one of claims 1 to 9, which is for forming an insulating layer of a multilayer printed wiring board in which a conductor layer is formed on the insulating layer by plating. The arithmetic average roughness after the roughening treatment of the cured product of the resin composition is 50 nm to 440 nm, and the peel strength between the surface of the cured product and the conductor layer after the roughening treatment is 0.4 kgf / cm to 1. The resin composition according to any one of claims 1 to 10 , which is 0 kgf / cm and the cured product has a dielectric loss tangent of 0.0030 to 0.0079. Adhesive film resin composition according to any one of claims 1 to 11 formed by a layer formed on a support. A prepreg formed by impregnating a sheet-like reinforcing base material made of fibers with the resin composition according to any one of claims 1 to 11 . Multilayer printed wiring board formed by forming an insulating layer with a cured product of the resin composition according to any one of claims 1 to 11.