JP5621198B2 - Semiconductor device - Google Patents

Description

  The present invention relates to a semiconductor device used for electric power or the like.

  Power semiconductor devices used for power energy conversion are required to have a withstand voltage corresponding to the intended use and to have a low loss, and silicon carbide has an excellent relationship between the withstand voltage and on-resistance as material properties A semiconductor device using a material such as a Schottky barrier diode has been studied (for example, see Patent Document 1).

  Since the silicon carbide material has a very large breakdown electric field as described in Non-Patent Document 1, when a semiconductor device having the same breakdown voltage is formed using another material, the drift region is used to maintain the voltage. The width of the depletion layer formed therein can be reduced and the impurity density of the drift region can be increased.

  As an example, when comparing the conditions of the drift region necessary to realize a power semiconductor device (for example, a diode), the impurity density is reduced with other materials, and a large thickness is required. When a silicon carbide material is used, the impurity density can be increased and the thickness can be reduced. As a result, since the resistance of the drift region can be reduced, the realization of a power semiconductor device having a low on-resistance is expected.

JP-A-6-252380

Edited by Hiroyuki Matsuuchi "Semiconductor SiC Technology and Applications" Nikkan Kogyo Shimbun, March 31, 2003, first edition (p.9-14)

  However, since the silicon carbide material has high hardness and brittleness, there is a problem that when the semiconductor device is realized as a semiconductor chip, a certain thickness is required as a support base in order to ensure strength as a structure. is there.

  That is, when silicon carbide is used as a semiconductor material, it has a high dielectric breakdown strength, so that the thickness of the substrate (resistive region) can be theoretically reduced as compared with a Schottky diode using silicon. However, since the strength of silicon carbide material is smaller than that of silicon, when the thickness of the substrate is reduced, the mechanical strength becomes weaker than that of a semiconductor device using silicon. For this reason, when silicon carbide is used as a semiconductor material, there is a limit in reducing on-resistance while maintaining mechanical strength.

  The present invention has been made to solve the above-described problems of the prior art, and provides a power semiconductor device capable of reducing resistance during conduction while maintaining strength.

  In order to achieve the above object, according to the present invention, the first electrode and the second electrode are arranged on the side walls of the plurality of recesses formed in the drift region so as to face each other and insulated from each other. Has been.

  According to the present invention, the first electrode and the second electrode disposed in the recess allow the current to flow substantially perpendicular to the sidewall of the recess, so that the supporting substrate and The resistance during conduction can be reduced while forming the drift region.

Sectional drawing which shows 1st Embodiment of this invention. Sectional drawing which shows the manufacturing method of 1st Embodiment of this invention. Sectional drawing which shows the manufacturing method of 1st Embodiment of this invention. Sectional drawing which shows the manufacturing method of 1st Embodiment of this invention. Sectional drawing which shows 2nd Embodiment of this invention. Sectional drawing which shows the manufacturing method of 2nd Embodiment of this invention. Sectional drawing which shows the manufacturing method of 2nd Embodiment of this invention. Sectional drawing which shows the manufacturing method of 2nd Embodiment of this invention. Sectional drawing which shows the manufacturing method of 2nd Embodiment of this invention. Another sectional view of a 2nd embodiment of the present invention. Another sectional view of a 2nd embodiment of the present invention. Another sectional view of a 2nd embodiment of the present invention. Sectional drawing which shows 3rd Embodiment of this invention. Another sectional view of a 3rd embodiment of the present invention. Another sectional view of a 3rd embodiment of the present invention. Sectional drawing which shows 4th Embodiment of this invention. Another sectional view of a 4th embodiment of the present invention. Sectional drawing which shows the manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows another manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows another manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows another manufacturing method of 4th Embodiment of this invention. Sectional drawing which shows another manufacturing method of 4th Embodiment of this invention. Another sectional view of a 4th embodiment of the present invention. Another sectional view of a 4th embodiment of the present invention. Sectional drawing which shows 5th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 5th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 5th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 5th Embodiment of this invention. Sectional drawing which shows the manufacturing method of 5th Embodiment of this invention. Another sectional view of a 5th embodiment of the present invention. Another sectional view of a 5th embodiment of the present invention. Another sectional view of a 5th embodiment of the present invention. Another sectional view of a 5th embodiment of the present invention. Another sectional view of a 5th embodiment of the present invention. Another sectional view of a 5th embodiment of the present invention. Another sectional view of a 5th embodiment of the present invention. Sectional drawing which shows 6th Embodiment of this invention. Another sectional view of a 6th embodiment of the present invention. Another sectional view of a 6th embodiment of the present invention. Sectional drawing which shows 7th Embodiment of this invention. Another sectional view showing a 7th embodiment of the present invention. The surface view which shows 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 43 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 44 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 43 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 44 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 43 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 44 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 43 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 44 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 43 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 44 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 43 which shows the manufacturing method of 7th Embodiment of this invention. Sectional drawing corresponding to FIG. 44 which shows the manufacturing method of 7th Embodiment of this invention.

(First embodiment)
A first embodiment of a semiconductor device according to the present invention will be described with reference to FIG. FIG. 1 is an example of a cross-sectional view illustrating an embodiment of the present invention.

As shown in FIG. 1, the semiconductor device 10 of the present invention is composed of, for example, a substrate material in which an N ⁻ type drift region 2 is formed on a P type substrate region 1 having a polytype of silicon carbide of 4H type. Has been. In the present embodiment, since the substrate region 1 needs to satisfy the strength as a support base, the thickness is about several tens of μm to several hundreds of μm. As the drift region 2, for example, an N-type impurity density of 10 ¹⁵ cm ⁻³ to 10 ¹⁸ cm ⁻³ and a thickness of 0.1 μm to several tens of μm can be used. Of course, depending on the element structure and required breakdown voltage, the drift region 2 may have an impurity density or thickness outside the above range. In the present embodiment, for example, a case where an impurity density of 10 ¹⁶ cm ⁻³ and a thickness of 12 μm is used will be described.

  In the present embodiment, the case where the semiconductor substrate is a substrate composed of two layers of the substrate region 1 and the drift region 2 will be described. However, a substrate formed of only the drift region 2 may be used. A multi-layer substrate may be used. In this embodiment, the case where the substrate material is formed of a silicon carbide material is described. However, the substrate material may be formed of other semiconductor materials such as silicon. In the present embodiment, as will be described later, the P-type substrate region 1 is used to prevent punch-through during reverse bias. However, even if the substrate region 1 is N-type, the drift region is used. Although there is a limit to the reduction of the thickness of 2, it can be used.

  A plurality of U-shaped grooves are formed on the main surface of the drift region 2 that faces the bonding surface with the substrate region 1, and the anode electrode 3 and the cathode electrode 4 are disposed so as to face each other through the sidewalls of the grooves. Is formed. Although FIG. 1 shows a case where the bottom of the groove has a vertical shape, the entire bottom of the groove may be curved, or only the end of the bottom may be curved. In the description of the present embodiment, the case of a stripe type in which grooves are formed in the depth direction with respect to the cross-sectional structure of FIG. 1 is taken as an example, but a square, hexagonal, or round annular structure may be used.

  In the present embodiment, the magnitude of the breakdown voltage is determined by the distance between the side walls of the groove sandwiched between the anode electrode 3 and the cathode electrode 4, that is, the thickness of the drift region 2 sandwiched between the anode electrode 3 and the cathode electrode 4. . In the present invention, the withstand voltage class is not limited, and an effect can be obtained. However, as an example, the case of the 600 V class will be described, and in this embodiment, the distance between the sidewalls of the groove is 5 μm.

  In the present embodiment, the anode electrode 3 and the cathode electrode 4 are configured to protrude from the groove so as to cover the main surface side of the drift region 2, but in this case, via the main surface portion of the drift region 2. An insulating film 5 is formed so that the breakdown voltage between the anode electrode 3 and the cathode electrode 4 does not decrease. Although not shown in the present embodiment, the anode electrode 3 and the cathode electrode 4 may be embedded so as not to protrude from the groove. In that case, the insulating film 5 is not essential.

  The anode electrode 3 is composed of a single-layer or multi-layer metal material including at least a metal material that forms a Schottky barrier with the drift region 2. For example, the metal material that forms the Schottky barrier includes titanium. A material such as nickel, molybdenum, gold, or platinum can be used. Further, the anode electrode 3 may have a multilayer structure using a metal material such as aluminum, copper, gold, nickel, or silver on the outermost surface in order to connect to an external electrode as an anode terminal.

  On the other hand, the cathode electrode 4 is made of an electrode material that is in ohmic contact with the drift region 2. Examples of electrode materials for ohmic connection include nickel silicide and titanium materials, and the cathode electrode 4 is made of aluminum, copper, gold, nickel, silver or the like on the outermost surface in order to connect to an external electrode as a cathode terminal. A metal material may be used to form a multilayer structure.

  In the cross-sectional view shown in FIG. 1, the anode electrode 3 and the cathode electrode 4 appear to be independent for each groove, but the anode electrodes 3 and The cathode electrodes 4 are connected to each other.

  As described above, the semiconductor device 10 shown in FIG. 1 operates as a Schottky junction diode including two terminals of the anode electrode 3 and the cathode electrode 4.

  Next, an example of the manufacturing method of this embodiment is demonstrated using FIGS.

First, as shown in FIG. 2, on an N type silicon carbide semiconductor substrate formed by epitaxially growing an N ⁻ type drift region 2 on a P type substrate region 1, for example, by a thermal oxidation method or a CVD method. The formed insulating film 5 is formed.

  Next, as shown in FIG. 3, a first mask material 51 made of, for example, a photoresist film having an opening in a predetermined shape is formed on the insulating film 5 by photolithography. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film.

  In the portion where the first mask material 51 is opened, the insulating film 5 layer and the drift region 2 are etched by, for example, reactive ion etching (dry etching).

  Next, as shown in FIG. 4, the first mask material 51 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution. Then, a metal material such as nickel or titanium is formed as the cathode electrode 4 by a lift-off method or film formation and etching. Thereafter, a metal material that forms a Schottky junction with the drift region 2 such as titanium, molybdenum, nickel, and aluminum is formed as the anode electrode 3 by the lift-off method or film formation and etching.

  In the present embodiment, since the anode electrode 3 and the cathode electrode 4 are formed on the same main surface, both portions using the same metal material may be formed at the same time. Thus, the semiconductor device 10 according to the first embodiment of the present invention shown in FIG. 1 is completed.

  As described above, this embodiment can be easily realized by using a general semiconductor manufacturing method.

  Next, the operation of this embodiment will be described.

  First, when a reverse bias voltage is applied between the anode electrode 3 and the cathode electrode 4, the diode maintains a cut-off state. That is, in the Schottky junction diode shown in FIG. 1, the depletion layer extends into the drift region 2 from the Schottky junction between the anode electrode 3 and the drift region 2 formed on the sidewall and bottom of the trench. In the present embodiment, since the anode electrode 3 and the cathode electrode 4 are formed so as to face each other through the sidewall of the groove, the depletion layer extends substantially parallel to the sidewall. For this reason, the withstand voltage of this embodiment is substantially determined by the thickness and impurity concentration of the side wall sandwiched between the anode electrode 3 and the cathode electrode 4. Therefore, in order to obtain the same breakdown voltage as that of a general vertical structure, the thickness of the side wall of the drift region 2 is set to be approximately the same as the thickness of the drift region layer in the vertical structure.

  In this embodiment, since the conductivity type of the substrate region 1 is P type opposite to that of the drift region 2, for example, a depletion layer extending from the bottom of the groove where the anode electrode 3 is formed reaches. However, the withstand voltage can be maintained without punching through.

  Thus, in the present embodiment, the same breakdown voltage as in the conventional structure can be maintained.

  Next, when a forward bias voltage is applied between the anode electrode 3 and the cathode electrode 4, the diode becomes conductive. That is, when the depletion layer extending in the drift region 2 recedes and reaches a forward bias voltage corresponding to the Schottky barrier height at the Schottky junction formed between the anode electrode 3 and the drift region 2. This is because an electron current supplied from the cathode electrode 4 flows. At this time, in the present embodiment, the resistance component generated between the anode electrode 3 and the cathode electrode 4 serving as the two terminals of the diode is constituted only by the thickness portion of the drift region 2 formed between the grooves in order to maintain the withstand voltage. Therefore, since the resistance generated in the substrate region 1 can be reduced as compared with the conventional vertical structure, current can be conducted with lower resistance.

  Furthermore, in the present embodiment, since the anode electrode 3 and the cathode electrode 4 are formed in the groove, respectively, the density of the element region that can be formed per unit area, which is limited by the conventional horizontal structure, is achieved. can do. In other words, by causing a current to flow in a direction perpendicular to the side wall surface where the grooves face each other, it is possible to realize a high density that is substantially proportional to the surface area of the side wall.

  In FIG. 1, the depth d of the groove formed in the drift region 2 is a pitch p at which the anode electrode 3 and the cathode electrode 4 are repeatedly formed (a recess in which the anode electrode 3 and the cathode electrode 4 are formed). By setting the distance to the center distance or more), a higher density than that of the conventional vertical structure can be realized. For example, in the present embodiment, when the anode electrode 3 and the cathode electrode 4 are formed with a groove depth of 8 μm and a groove width of 2 μm, the side wall thickness of the drift region 2 is 5 μm, so the groove depth d is 8 μm. The pitch p at which the anode electrode 3 and the cathode electrode 4 are repeatedly formed is 7 μm. In the case of the vertical structure, the area acting as a diode is proportional to the surface area of the drift region main surface, whereas in the present embodiment, the area acting as a diode is d / p times. .14 times higher density is possible. Furthermore, if the width of the groove is 1 μm, it is 1.33 times, and further improvement is possible by changing the width and depth of the groove. From this, the structure shown in this embodiment can achieve a low resistance exceeding the physical limit of on-resistance that can be obtained with a general vertical structure.

  Further, in the present embodiment, since silicon carbide is used as the material of the drift region 2, the sidewall thickness of the drift region 2 is about 5 μm, which can be reduced by an order of magnitude or more compared with the case of using silicon even with a withstand voltage of about 600V. The on-resistance lower than that of a general vertical structure can be achieved only by forming a groove having a depth of about several μm to several tens of μm. In other words, it is easy to implement and has a feature that it is easy to increase the density.

  As described above, in the present embodiment, the anode electrode 3 and the cathode electrode 4 are formed in the groove, respectively, and the current flows substantially perpendicularly to the side wall of the groove. Is formed with a thickness that can maintain the strength as a supporting base, while the resistance of the substrate region 1 that has been limited in the vertical structure can be reduced, and the density of the diode region that has been limited in the horizontal structure can be increased. Can be realized. For this reason, resistance at the time of conduction | electrical_connection can be reduced compared with the conventional horizontal structure and vertical structure.

(Second Embodiment)
A second embodiment of the semiconductor device 10 according to the present invention will be described with reference to FIGS. In the present embodiment, the description of the portion that performs the same operation as in the first embodiment is omitted, and different features will be described in detail.

  FIG. 5 is an example of a cross-sectional structure diagram illustrating an embodiment of the present invention corresponding to FIG. In FIG. 5, for example, a P-type electric field relaxation region 6 is formed so as to be in contact with the surface layer portion of the groove where the anode electrode 3 is formed.

  Next, an example of the manufacturing method of this embodiment is demonstrated using FIGS.

First, as shown in FIG. 6, an N ^- type drift region 2 is formed on a P-type substrate region 1 by epitaxial growth, and an opening having a predetermined shape is formed by photolithography, for example. A second mask material 52 made of a photoresist film is formed. As a material for the mask material, materials such as an oxide film, a SiN film, and a metal material film can be used in addition to the photoresist film. Then, in the portion where the second mask material 52 is opened, for example, ion implantation is used to introduce impurities into the drift region 2, for example, boron or aluminum, and the activation of the impurities by a predetermined heat treatment reduces the electric field. Region 6 is formed. As the impurity introduction method, any method other than the ion implantation method, such as a solid phase diffusion method, may be used as long as impurities can be introduced into at least the drift region 2.

  After this, the structure of FIG. 5 can be realized by the same process as the manufacturing method of FIGS. 2 to 4 shown in the first embodiment, and details will be described below.

  Next, FIG. 7 corresponds to FIG. 2, and the insulating film 5 formed by thermal oxidation or CVD is formed on the upper surface of the drift region 2.

  Next, FIG. 8 corresponds to FIG. 3, and a first mask material 51 made of, for example, a photoresist film having an opening in a predetermined shape is formed on the insulating film 5 by photolithography. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film. In the portion where the first mask material 51 is opened, the insulating film 5 layer and the drift region 2 are etched by, for example, reactive ion etching (dry etching).

  Next, FIG. 9 corresponds to FIG. 4, and the first mask material 51 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution. Then, a metal material such as nickel or titanium is formed as the cathode electrode 4 by a lift-off method or film formation and etching. Thereafter, a metal material that forms a Schottky junction with the drift region 2 such as titanium, molybdenum, nickel, and aluminum is formed as the anode electrode 3 by the lift-off method or film formation and etching. Also in this embodiment, since the anode electrode 3 and the cathode electrode 4 are formed on the same main surface, both portions using the same metal material may be formed at the same time.

  In this way, the semiconductor device 10 according to the second embodiment of the present invention shown in FIG. 5 is completed.

  As described above, this embodiment can also be easily realized by using a general semiconductor manufacturing method.

  The newly formed electric field relaxation region 6 in FIG. 5 is an end in the surface layer portion of the groove where the anode electrode 3 is formed when a reverse bias voltage is applied between the anode electrode 3 and the cathode electrode 4. It has the effect of alleviating the electric field concentration on the part. That is, in this embodiment, in the reverse bias state, an electric field is not applied to the Schottky junction portion of the groove surface layer portion, and a depletion layer spreads at the junction portion between the electric field relaxation region 6 and the drift region 2. is there. Therefore, in the present embodiment, in order to maintain the same withstand voltage as compared with the structure shown in FIG. 1 of the first embodiment, the gap between the anode electrode 3 and the cathode electrode 4 is between The thickness of the drift region 2 can be reduced. From this, since the resistance of the drift region 2 at the time of forward bias conduction can be reduced, the on-resistance can be further reduced as compared with the first embodiment.

  In FIG. 5, the electric field relaxation region 6 is formed only in the surface layer portion of the groove where the anode electrode 3 is formed as an example. However, as shown in FIG. The electric field relaxation region 6 may be formed in the surface layer portions of both formed grooves. Regarding the manufacturing method, if the opening shape of the second mask material described in FIG. 6 is changed, it can be manufactured easily.

  Further, as shown in FIGS. 11 and 12, by forming the electric field relaxation region 7 also on the bottom of the groove which is the other end of the groove where the anode electrode 3 shown in FIG. 5 is formed, Contributes to reduction of on-resistance. The reason is the same as the electric field relaxation of the surface layer portion described above. As a method of forming the electric field relaxation region 7 at the bottom of the groove, it is formed by using an ion implantation method selectively at a deep position using a predetermined mask material in the steps before and after introducing impurities into the surface layer portion shown in FIG. And a method of selectively introducing an impurity by an ion implantation method immediately after forming the groove, which can be realized using a general semiconductor device.

  As described above, by forming the electric field relaxation regions 6 and 7 on the surface layer portion and the bottom portion corresponding to the end portions at least on the side wall of the groove where the anode electrode 3 is formed, the electric field concentration at the time of reverse bias is relaxed, In order to obtain an equivalent breakdown voltage, the thickness of the drift region 2 between the grooves sandwiched between the anode electrode 3 and the cathode electrode 4 can be further reduced. From this, since the resistance of the drift region 2 during conduction can be reduced, the on-resistance can be further reduced as compared with the first embodiment.

  Also in the second embodiment, the other effects of the first embodiment described above can be achieved.

(Third embodiment)
A third embodiment of the semiconductor device according to the present invention will be described with reference to FIGS. In the present embodiment, description of portions that perform the same operations as those in the first embodiment and the second embodiment will be omitted, and different features will be described in detail.

  FIG. 13 is an example of a cross-sectional structure diagram illustrating an embodiment of the present invention corresponding to FIG. FIG. 13 shows a substrate region 11 made of an insulating silicon carbide material instead of the P-type substrate region 1, and a groove in which the anode electrode 3 and the cathode electrode 4 are formed penetrates the drift region 2. The bottom of the groove is formed in the substrate region 11.

  Next, the manufacturing method of the present embodiment can be easily described with reference to FIGS. 6 to 9, with an example of manufacturing easily based on FIGS. 2 to 4 described in the first embodiment. That is, this embodiment is the same silicon carbide material although the conductivity type of the substrate region 11 is different from that of the first embodiment, and it is only necessary to increase the etching depth in the process described in FIG. . That is, it can be easily realized as in the structure of FIG.

  As a new feature shown in FIG. 13, the depth of the groove in which the anode electrode 3 and the cathode electrode 4 are formed can be formed so that the drift region 2 penetrates, so that the anode electrode 3 functioning as a diode and This is because the surface area of the cathode electrode 4 can be improved to further reduce the on-resistance. In the configuration of FIG. 1, the withstand voltage is not limited between the bottom of the groove and the substrate region 1 in order to obtain a predetermined withstand voltage defined by the thickness of the drift region 2 sandwiched between the anode electrode 3 and the cathode electrode 4. Thus, it was necessary to keep a predetermined distance. On the other hand, in the present embodiment, since the substrate region 11 has an impurity concentration smaller than that of the drift region 2 and has an insulating property, the withstand voltage determined between the bottom of the groove and the substrate region 11 is the anode electrode 3 and the cathode electrode 4. It has a feature that it is larger than the breakdown voltage determined by the thickness of the drift region 2 sandwiched between them. Therefore, since the depth of the groove can be formed through the drift region 2, as described above, in the present embodiment, the entire region of the drift region 2 formed on the side wall of the groove can be used as a breakdown voltage holding region. Therefore, the surface areas of the anode electrode 3 and the cathode electrode 4 functioning as diodes can be improved, and the on-resistance can be further reduced. In the present embodiment, since the substrate region 11 has insulating properties, the function of the electric field relaxation region 7 formed in FIGS. 11 and 12 illustrated in the second embodiment is also described. Therefore, the electric field concentration at the bottom of the groove is small and the resistance can be further reduced.

  Also in this embodiment, as shown in FIGS. 14 and 15, the electric field relaxation region 6 of the groove surface layer portion described in the second embodiment can be easily formed by the same manufacturing method as in the second embodiment. The same effect can be obtained.

  As described above, the on-resistance can be further reduced by using the insulating material for the substrate region 11. In the present embodiment, the case where the silicon carbide material which is the same semiconductor material as the drift region 2 is used as the substrate region 11 has been described. However, other insulating materials such as a glass substrate and a ceramic substrate are used. May be. However, since the lattice matching between atoms of the substrate region 11 and the drift region 2 is good by using the same material as the drift region 2 as described in the present embodiment, a high-quality drift region 2 can be formed. There is an advantage.

  Also in this embodiment, the other effect of embodiment mentioned above can be show | played.

(Fourth embodiment)
A fourth embodiment of the semiconductor device according to the present invention will be described with reference to FIGS. In this embodiment, the description of the part which performs the same operation as the contents described in the first to third embodiments is omitted, and different features will be described in detail.

FIG. 16 is an example of a cross-sectional structure diagram for explaining an embodiment of the present invention corresponding to FIG. As shown in FIG. 16, for example, an N ⁺ type high concentration region 8 is formed in contact with the cathode electrode 4. As shown in FIG. 16, the high concentration region 8 may be formed in a part of a portion where the drift region 2 and the cathode electrode 4 are in contact with each other in FIG. 13, or as shown in FIG. 4 may also be formed in the substrate region 11 so as to cover the periphery of the groove in which 4 is formed. In any case, the high-concentration region 8 functions so that the cathode electrode 4 and the drift region 2 are in ohmic connection with lower resistance, and is more Schottky than the structure described in the first to third embodiments. The diode is further effective in operating with a low on-resistance.

  Next, a manufacturing method can be easily created in this embodiment. Here, as an example, two kinds of manufacturing methods are shown with the structure shown in FIG.

First, as shown in FIG. 18, an opening having a predetermined shape is formed by photolithography on an N-type silicon carbide semiconductor substrate formed by epitaxially growing an N ⁻ -type drift region 2 on an insulating substrate region 11. The third mask material 53 made of, for example, a photoresist film is formed. As a material for the mask material, materials such as an oxide film, a SiN film, and a metal material film can be used in addition to the photoresist film. Then, in the portion where the third mask material 53 is opened, an impurity that becomes an N-type dopant such as phosphorus or nitrogen is introduced into the drift region 2 by using, for example, an ion implantation method, and impurities of a predetermined heat treatment are introduced. The high concentration region 8 is formed through activation. As the impurity introduction method, any method other than the ion implantation method, such as a solid phase diffusion method, may be used as long as impurities can be introduced into at least the drift region 2. In FIG. 18, impurities are introduced so as to reach the substrate region 11. However, for example, by setting the acceleration energy of ion implantation to a predetermined magnitude, the depth does not reach the substrate region 11 corresponding to FIG. 16. You can also.

  After this, the structure of FIG. 5 can be realized by the same process as the manufacturing method of FIGS. 2 to 4 shown in the first embodiment, and details will be described below.

  Next, FIG. 19 corresponds to FIG. 2, and the insulating film 5 formed by thermal oxidation or CVD is formed on the upper surface of the drift region 2.

  Next, FIG. 20 corresponds to FIG. 3, and a first mask material 51 made of, for example, a photoresist film having an opening in a predetermined shape is formed on the insulating film 5 by photolithography. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film. In the portion where the first mask material 51 is opened, the layer of the insulating film 5 and the drift region 2 are etched by, for example, reactive ion etching (dry etching).

  Next, FIG. 21 corresponds to FIG. 4, and the first mask material 51 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution. Then, a metal material such as nickel or titanium is formed as the cathode electrode 4 by a lift-off method or film formation and etching. Thereafter, a metal material that forms a Schottky junction with the drift region 2 such as titanium, molybdenum, nickel, and aluminum is formed as the anode electrode 3 by the lift-off method or film formation and etching. Also in this embodiment, since the anode electrode 3 and the cathode electrode 4 are formed on the same main surface, both portions using the same metal material may be formed at the same time.

  Next, another manufacturing method will be described with reference to FIGS.

First, as shown in FIG. 22, on an N type silicon carbide semiconductor substrate formed by epitaxially growing an N ⁻ type drift region 2 on an insulating substrate region 11, for example, a thermal oxidation method or a CVD method is used. The insulating film 5 formed by the method is formed.

  Next, as shown in FIG. 23, on the insulating film 5, first, a fourth mask made of, for example, a photoresist film opened to a predetermined shape by photolithography in order to form a groove portion to be the cathode electrode 4. A material 54 is formed. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film.

  In the portion where the fourth mask material 54 is opened, the layer of the insulating film 5 and the drift region 2 are etched by, for example, reactive ion etching (dry etching).

  Further, after the etching, in the state having the fourth mask material 54, an impurity that becomes an N-type dopant such as phosphorus or nitrogen is introduced into the drift region 2 by using, for example, an ion implantation method, and an impurity by a predetermined heat treatment. Then, the high concentration region 8 is formed. As the impurity introduction method, any method other than the ion implantation method, such as a solid phase diffusion method, may be used as long as impurities can be introduced into at least the drift region 2. It is also possible to form a depth not reaching the substrate region 11 corresponding to FIG. 16 by introducing impurities such as ion implantation in the course of etching in this step and further adding etching.

  Next, as shown in FIG. 24, after the fourth mask material 54 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide, the anode electrode 3 is formed on the insulating film 5. In order to form the groove portion, a fifth mask material 55 made of, for example, a photoresist film having an opening in a predetermined shape is formed by photolithography. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film.

  In the portion where the fifth mask material 55 is opened, the layer of the insulating film 5 and the drift region 2 are etched by, for example, reactive ion etching (dry etching).

  Next, as shown in FIG. 25, the fifth mask material 55 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution. Then, a metal material such as nickel or titanium is formed as the cathode electrode 4 by a lift-off method or film formation and etching. Thereafter, a metal material that forms a Schottky junction with the drift region 2 such as titanium, molybdenum, nickel, and aluminum is formed as the anode electrode 3 by the lift-off method or film formation and etching.

  In any of the manufacturing methods shown in FIG. 18 to FIG. 21 and FIG. 22 to FIG. 25, the anode electrode 3 and the cathode electrode 4 are formed on the same main surface. May be formed simultaneously. In this manner, the semiconductor device 10 according to the embodiment of the present invention shown in FIG. 17 can be completed, and can be easily realized by using a general semiconductor manufacturing method.

  Also in this embodiment, the semiconductor device 10 having a lower resistance can be realized by combining the structures described in the first to third embodiments.

  26 and 27 show a case where the electric field relaxation region 6 described in the second embodiment is formed in the surface layer portion of the groove where the anode electrode 3 is formed, as compared with FIGS. 16 and 17. By doing so, the contact resistance with the drift region 2 of the cathode electrode 4 can be reduced, and the electric field concentration at the time of reverse bias in the surface layer portion of the groove in which the anode electrode 3 is formed is alleviated. Since the thickness of the drift region 2 between the grooves sandwiched between 3 and the cathode electrode 4 can be further reduced, the total on-resistance during conduction can be further reduced.

  In the present embodiment, the structure in which the groove reaches the substrate region 11 has been described as an example. However, the case where the bottom of the groove illustrated in FIGS. 1 to 12 is in the drift region 2 can be easily realized. And similar effects can be obtained.

  Also in the fourth embodiment, other effects according to the above-described embodiment can be obtained.

(Fifth embodiment)
A fifth embodiment of the semiconductor device according to the present invention will be described with reference to FIGS. In the present embodiment, description of portions that perform the same operations as those described in the first to fourth embodiments will be omitted, and different features will be described in detail.

  In the first to fourth embodiments, the case where a Schottky junction diode in which the anode electrode 3 and the drift region 2 have a Schottky junction is formed as the semiconductor device 10 will be described with reference to FIGS. However, in FIGS. 28 to 35 in the present embodiment, the drift region 2 and the drift region 2 are formed with a heterojunction diode in which the anode region 15 made of a semiconductor material having a different band gap is heterojunction. Will be described.

FIG. 28 is an example of a cross-sectional structure diagram illustrating an embodiment of the present invention corresponding to FIG. In FIG. 28, in place of the anode electrode 3 and the cathode electrode 4 formed in FIG. 14, a groove formed in the drift region 2 includes, for example, an anode region 15 made of P ⁺ type polysilicon, N ^A cathode region 16 made of ⁺ -type polysilicon is formed, and the anode region 15 and the cathode region 16 are connected to an anode electrode 13 and a cathode electrode 14 made of, for example, titanium or aluminum in the surface layer portion, respectively.

  Also in this embodiment, it can be easily created using a general semiconductor manufacturing apparatus.

First, in FIG. 29, the electric field relaxation region 6 is formed by the same manufacturing procedure as in FIGS. In other words, a first film made of, for example, a photoresist film that is opened in a predetermined shape by photolithography on an N-type silicon carbide semiconductor substrate formed by epitaxially growing an N ⁻ -type drift region 2 on an insulating substrate region 11. 2 mask material (not shown) is formed. As a material for the mask material, materials such as an oxide film, a SiN film, and a metal material film can be used in addition to the photoresist film. Then, in a portion where the second mask material (not shown) is opened, an impurity that becomes a P-type dopant such as aluminum or boron is introduced into the drift region 2 by using a predetermined heat treatment, for example, using an ion implantation method. The electric field relaxation region 6 is formed by activating the impurities. As the impurity introduction method, any method other than the ion implantation method, such as a solid phase diffusion method, may be used as long as impurities can be introduced into at least the drift region 2. Further, after an insulating film 5 formed by thermal oxidation or CVD is formed on the upper surface of the drift region 2, a first film made of, for example, a photoresist film having an opening in a predetermined shape by photolithography is formed on the insulating film 5. A mask material (not shown) is formed. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film. In the portion where the first mask material (not shown) is opened, the insulating film 5 layer and the drift region 2 are etched by, for example, reactive ion etching (dry etching). Further, for example, a polysilicon layer 56 formed by LP-CVD is formed so as to fill the groove after etching. At this time, the polycrystalline silicon layer may be formed by single-crystal silicon heteroepitaxially grown by, for example, molecular beam epitaxy, even if it is formed by recrystallization by laser annealing or the like after being deposited by electron beam evaporation or sputtering. It may be formed.

Next, as shown in FIG. 30, the polysilicon layer 56 protruding from the groove and deposited on the surface layer is etched back and removed by dry etching or the like. Thereafter, a sixth mask material 57 made of, for example, a photoresist film having a predetermined shape is formed by photolithography so that the groove portion to be the anode region 15 is opened. Then, in the portion where the sixth mask material 57 is opened, an impurity that becomes a P-type dopant such as boron is introduced into the polysilicon using, for example, an ion implantation method, and the impurity is activated by a predetermined heat treatment. Then, a P ⁺ -type anode region 15 is formed.

Next, as shown in FIG. 31, after the sixth mask material 57 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution, the groove portion that becomes the cathode region 16 is opened next. Then, a seventh mask material 58 made of, for example, a photoresist film having an opening in a predetermined shape is formed by photolithography. Then, in the portion where the seventh mask material 58 is opened, an impurity that becomes an N-type dopant such as phosphorus or arsenic is introduced into the polysilicon using, for example, an ion implantation method, and the impurity is activated by a predetermined heat treatment. Then, an N ⁺ type cathode region 16 is formed.

  Finally, as shown in FIG. 32, after the seventh mask material 58 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution, titanium, aluminum is used as the anode electrode 13 and the cathode electrode 14. A metal material that makes ohmic contact with the anode region 15 and the cathode region 16 is formed by film formation and etching.

  As described above, the heterojunction diode shown in FIG. 28 can be easily formed.

In the present embodiment, the cathode electrode terminal side of the heterojunction diode is exemplified by the cathode region 16 made of N ⁺ type polysilicon and the cathode electrode 14 made of a metal electrode. It is good also as a cathode electrode which consists only of a metal electrode as shown in 4th Embodiment from the form. The advantage of using the cathode region 16 shown in FIG. 28 as a part of the cathode electrode terminal is that the groove can be filled with the same polysilicon, so that the manufacturing process can be simplified. In addition, when the anode region 15 and the cathode region 16 are made to have P-type and N-type conductivity, impurities are easily diffused by using polysilicon as a material of each region, so that impurities are introduced into the surface layer portion of the groove. If this is done, conductivity can be provided up to the bottom of the groove by thermal diffusion, so that the manufacturing process can be simplified.

  Next, the operation will be described.

  When a voltage is applied between the anode electrode 13 and the cathode electrode 14, a rectifying action occurs at the junction interface between the anode region 15 and the drift region 2, and diode characteristics are obtained. First, when a reverse bias voltage is applied between the anode electrode 13 and the cathode electrode 14, the heterojunction diode exhibits a reverse characteristic and a cut-off characteristic. In the present embodiment, since the conductivity type of the anode region 15 is P type, the cutoff characteristic operates like a PN junction diode. This is because in the configuration in which the conductivity type of the anode region 15 is P-type and the conductivity type of the drift region 2 is N-type, leakage current characteristics due to carriers generated under a predetermined electric field as seen in a PN junction diode are dominant. This is because the leakage current through the energy barrier at the heterojunction interface can be greatly reduced.

  Next, when a forward bias voltage is applied between the anode electrode 13 and the cathode electrode 14, the conduction characteristics are exhibited as in the Schottky junction diode shown in the first embodiment. That is, the forward current flows with a voltage drop determined by the sum of the built-in potentials spreading from the heterojunction portion to the drift region 2 side and the anode region 15 side. Also in this embodiment, since the current flows between the anode region 15 and the cathode region 16 formed in the groove substantially perpendicularly to the side wall of the groove, the thickness of the substrate region 11 and the drift region 2 is reduced. While the thickness of the support structure is maintained, the resistance of the substrate area, which is limited in the vertical structure, can be reduced, and the density of the diode area, which is limited in the horizontal structure, can be increased. be able to. For this reason, resistance at the time of conduction | electrical_connection can be reduced compared with the conventional horizontal structure and vertical structure. Although the configuration of the diode portion is different from that of the Schottky junction diode described in the first to fourth embodiments, it has the same feature that it can operate with a low on-resistance. FIG. 28 illustrates the case where the polysilicon is completely embedded in the groove. However, as shown in FIG. 33, a polysilicon layer is formed so as to be in contact with the side wall of the groove, and the anode is also formed in the groove. Electrode 13 and cathode electrode 14 may be formed. In FIG. 33, the polysilicon layer and the metal film, which are constituent materials thereof, are continuously etched so that the end portions of the anode region 15 and the anode electrode 13 and the end portions of the cathode region 16 and the cathode electrode 14 are substantially aligned. Although illustrated, it may be formed separately and the end portions may not be aligned. However, there is an advantage that the manufacturing process can be simplified by etching continuously at the same time.

  Further, as shown in FIGS. 34 and 35, the case where the high concentration region 8 is formed in order to further reduce the resistance of the connection between the cathode region 16 and the drift region 2 is shown. As for the effect, the same effect as that of the fourth embodiment can be obtained, and the resistance can be further reduced.

  In addition, in this embodiment, in order to explain about a different part from other embodiment, the four structures of FIGS. 28-35 are demonstrated to the example, However, In 1st Embodiment to 4th Embodiment The features described with reference to FIGS. 1 to 27 can be obtained in the same manner by replacing the Schottky junction diode portion with a heterojunction diode in the configuration described.

  Furthermore, in FIG. 36, FIG. 37, FIG. 38, and FIG. 39 in the present embodiment, the PN junction in which the drift region 2 and the opposite conductivity type region 26 composed of the P type region opposite to the drift region 2 are PN junctioned. A case where a diode is formed will be described. Also in this embodiment, only the configuration of the formed diode is different, and the current flows between the anode electrode 23 and the cathode electrode 24 formed in the groove substantially perpendicularly to the side wall of the groove. While the substrate region 11 and the drift region 2 have the thickness that can maintain the strength as the support base, the resistance of the substrate region, which has been limited in the vertical structure, can be reduced, and the horizontal structure has a limitation. It is possible to realize a higher density of the diode region. For this reason, resistance at the time of conduction | electrical_connection can be reduced compared with the conventional horizontal structure and vertical structure. Although the configuration of the diode portion is different from that of the Schottky junction diode described in the first to fourth embodiments, it has the same feature that it can operate with a low on-resistance.

  As for the manufacturing method, a method of forming a P-type opposite conductivity type region using lithography and introduction of impurities such as ion implantation before digging the groove, and ion implantation when forming a groove in which the anode electrode 23 is embedded are performed. It can be formed by introducing impurities such as, and can be easily created as in the other embodiments. Further, the anode electrode 23 and the cathode electrode 24 can be simultaneously formed by using nickel that can be bonded to P-type and N-type silicon carbide materials with low resistance, thereby simplifying the manufacturing process. It is possible.

  Also in the present embodiment, in order to describe different parts from the other embodiments, the four structures of FIGS. 36 to 39 are described as examples, but the first to fourth embodiments have been described. By replacing the Schottky junction diode portion with a PN junction diode in the configuration, the features described with reference to FIGS. 1 to 27 can be obtained in the same manner, and thus description thereof is omitted here.

  Moreover, also in 5th Embodiment, there can exist another effect by embodiment mentioned above.

(Sixth embodiment)
A sixth embodiment of the semiconductor device according to the present invention will be described with reference to FIGS. In this embodiment, the description of the part which performs the same operation as the contents described in the first to fifth embodiments is omitted, and different features will be described in detail.

  In the first to fifth embodiments, the case where the anode electrode and the cathode electrode are formed on the same main surface has been described. However, in FIGS. 40 to 42 in the present embodiment, the anode electrode and the cathode electrode Shows a configuration in which grooves are formed from both of the main surfaces facing each other so as to face each other across the substrate region.

  FIG. 40 is a cross-sectional view corresponding to FIG. 1, in which the anode electrode 3 is formed in a groove formed from the main surface side where the drift region 2 is formed, and the substrate region 1 is formed in the cathode electrode 4. It is formed in a groove formed from the opposing main surface side. Also in this embodiment, the breakdown voltage of the Schottky junction diode is determined so as to be determined by the thickness of the side wall of the drift region 2 formed between the anode electrode 3 and the cathode electrode 4 formed in each groove.

  This embodiment is an example of a case where the low on-resistance, which is the effect of the present invention described above, is realized by a vertical structure. By adopting this embodiment, the surface area of the Schottky junction where the anode electrode 3 and the drift region 2 are in contact with each other increases, so that the built-in potential of the Schottky junction diode can be reduced, and the loss during conduction can be further reduced. Has an effect.

  As compared with other embodiments, the manufacturing process requires that the groove be formed at least twice on the anode electrode side, and the process is somewhat complicated. However, if a double-sided contact aligner is used, the front and back surfaces Can be relatively easily achieved, and can be realized by using a general semiconductor device.

  FIG. 41 illustrates the case where the Schottky junction diode is formed of a heterojunction diode, and FIG. 42 illustrates the case of formation of a PN junction diode. In any configuration, the loss of the diode can be reduced.

  Also in this embodiment, although not shown, the electric field relaxation regions 6 and 7 and the high concentration region 8 can be formed.

  Also in the sixth embodiment, other effects according to the above-described embodiment can be obtained.

(Seventh embodiment)
A seventh embodiment of the semiconductor device according to the present invention will be described with reference to FIGS. In this embodiment, the description of the part which performs the same operation as that described in the first to sixth embodiments is omitted, and different features will be described in detail.

  In the first to seventh embodiments, the case where a diode composed of a two-terminal element of an anode electrode and a cathode electrode has been described. In this embodiment, the source electrode, the drain electrode, and the gate electrode are formed. A case of three-terminal elements is shown, and specifically, a MOSFET structure is provided.

  43 and 44 show a cross-sectional structure of the semiconductor device 10 of the present invention. FIG. 45 shows the surface structure of the semiconductor device 10 of the present invention. 43 is a cross-sectional view taken along the line LA-LA shown in FIG. 44 is a cross-sectional view taken along the line LB-LB shown in FIG.

As shown in FIGS. 43 to 45, the semiconductor device 10 of this embodiment includes a substrate in which an N ⁻ type drift region 2 is formed on a substrate region 11 having, for example, a silicon carbide polytype of 4H type. Consists of materials. In the present embodiment, since the substrate region 11 needs to satisfy the strength as a supporting base, the thickness is about several tens of μm to several hundreds of μm. As the drift region 2, for example, an N-type impurity density of 10 ¹⁵ cm ⁻³ to 10 ¹⁸ cm ⁻³ and a thickness of 0.1 μm to several tens of μm can be used. Of course, depending on the element structure and required breakdown voltage, the drift region 2 may have an impurity density or thickness outside the above range. In the present embodiment, for example, a case where an impurity density of 10 ¹⁶ cm ⁻³ and a thickness of 12 μm is used will be described.

  In the present embodiment, the case where the semiconductor substrate is a substrate composed of two layers of the substrate region 11 and the drift region 2 will be described. However, a substrate formed of only the drift region 2 may be used. A multi-layer substrate may be used. In this embodiment, the case where the substrate material is formed of a silicon carbide material is described. However, the substrate material may be formed of other semiconductor materials such as silicon. In the present embodiment, as described in detail in the third embodiment, by using the insulating substrate region 11, there is an effect of reducing the electric field concentration at the bottom of the groove. Even if N is an N-type or P-type, the drift region 2 and the groove depth are limited, but can be used.

  A plurality of U-shaped grooves are formed on the main surface of the drift region 2 facing the bonding surface with the substrate region 1, and one of the grooves has a source electrode so as to face each other through the sidewall of the groove. 33 and the gate electrode 36, and the drain electrode 34 is formed in the other groove. 43 and 44 show the case where the bottom of the groove has a vertical shape, the entire bottom of the groove may be curved, or only the end of the bottom may be curved. In the description of the present embodiment, the case of a stripe type in which grooves are formed in the depth direction with respect to the cross-sectional structure is taken as an example, but a square, hexagonal, or round annular structure may be used.

  As shown in FIGS. 43 to 45, the source electrode 33 and the gate electrode 36 are formed at a predetermined repetition pitch in the groove where the source electrode 33 and the gate electrode 36 are formed.

  In this embodiment, the magnitude of the breakdown voltage is determined by the distance between the sidewalls of the groove sandwiched between the source electrode 33 and the drain electrode 34, that is, the thickness of the drift region 2 sandwiched between the source electrode 33 and the drain electrode 34. . In the present invention, the withstand voltage class is not limited and an effect can be obtained. However, the case of the 600 V class will be described as an example, and in this embodiment, the distance between the sidewalls of the groove is 6 μm. In the drift region 2 on the groove side where the source electrode 33 is formed, an N-type source region 31 and a P-type well region 32 are formed so as to be in contact with the source electrode 33. Further, a gate electrode 36 is formed so as to be in contact with the source region 31, the well region 32, and the drift region 2 through a gate insulating film 35 made of, for example, a silicon oxide film.

  An N-type high concentration region 8 is formed on the drain electrode 34 side so as to be in contact with the groove.

  The source electrode 33 is made of a metal material made of, for example, nickel, titanium, aluminum or the like so as to be in ohmic contact with the source region 31 and the well region 32 and the drain electrode 34 with the high concentration region 8, respectively.

  In the present embodiment, the source electrode 33 and the drain electrode 34 are configured to protrude from the groove so as to cover the main surface side of the drift region 2, but in this case, via the main surface portion of the drift region 2. The insulating film 5 is formed so that the withstand voltage between the source electrode 33 and the drain electrode 34 does not decrease. Although not shown in the present embodiment, the source electrode 33 and the drain electrode 34 may be embedded so as not to protrude from the groove. In that case, the insulating film 5 is not essential.

  As described above, the semiconductor device 10 illustrated in FIGS. 43 to 45 operates as a MOSFET including three terminals of the source electrode, the drain electrode, and the gate electrode.

  Next, a manufacturing method will be described with reference to FIGS. 46, 48, 50, 52, 54, and 56 are cross-sectional views corresponding to FIG. 47, 49, 51, 53, 55, and 57 are cross-sectional views corresponding to FIG.

First, as shown in FIGS. 46 and 47, for example, a thermal oxidation method is performed on an N-type silicon carbide semiconductor substrate formed by epitaxially growing an N ⁻ -type drift region 2 on an insulating substrate region 11. Alternatively, the insulating film 5 formed by the CVD method is formed.

  Next, a mask material 59 made of, for example, a photoresist film having an opening in a predetermined shape is formed on the insulating film 5 by photolithography so as to form a groove portion. As a material for the mask material, a material such as a SiN film or a metal material film can be used in addition to the photoresist film.

  In the portion where the mask material 59 is opened, the layer of the insulating film 5 and the drift region 2 are etched by, for example, reactive ion etching (dry etching).

  Next, as shown in FIGS. 48 and 49, the mask material 59 is removed by wet etching with, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution, and then, for example, from a photoresist film opened in a predetermined shape by photolithography. In order to form the well region 32 on the surface of the groove formed in the drift region 2, an impurity to be a P-type dopant such as boron or aluminum is introduced using, for example, an ion implantation method. .

  Next, as shown in FIGS. 50 and 51, the mask material 60 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution, and then opened, for example, in a predetermined shape by photolithography. In order to form the source region 31 and the high concentration region 8 on the surface of the groove formed in the drift region 2, for example, an ion implantation method is used to form an N-type dopant such as phosphorus or nitrogen. Impurities are introduced.

  Here, the N-type impurity is introduced after the introduction of the P-type impurity, but the order may be either. Similarly to the other embodiments, as the impurity introduction method, any other method such as a solid phase diffusion method other than the ion implantation method may be used as long as impurities can be introduced into at least the drift region 2. Similarly to the other embodiments such as the fourth embodiment, a manufacturing process in which the well region 32, the source region 31, and the high concentration region 8 are formed in the drift region 2 by ion implantation or the like before forming the groove may be used. good.

  Next, as shown in FIGS. 52 and 53, the mask material 61 is removed by wet etching using, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution, and then the impurity is activated by a predetermined heat treatment to be well region. 32, a source region 31 and a high concentration region 8 are formed.

  In order to form a gate electrode 36 after forming a thermal oxide film by a thermal oxidation method or a CVD oxide film by a CVD method as a gate insulating film 35 on the exposed portion such as the side wall of the drift region 2, for example, Then, a polysilicon layer formed by the LP-CVD method is formed. Then, for example, by introducing phosphorus or arsenic as an impurity by ion implantation, an N-type gate electrode 36 layer is formed. At this time, the polycrystalline silicon layer may be formed by single-crystal silicon heteroepitaxially grown by, for example, molecular beam epitaxy, even if it is formed by recrystallization by laser annealing or the like after being deposited by electron beam evaporation or sputtering. It may be formed. Further, solid phase diffusion or vapor phase diffusion may be used for impurity doping. Further, the conductivity type may be P type by introducing boron as an impurity.

  Next, as shown in FIGS. 54 and 55, a mask material 62 made of, for example, a photoresist film is formed by photolithography so that the polysilicon layer remains only in the portion where the gate electrode 36 is to be formed. The polysilicon layer where the mask material 62 is opened is removed by dry etching. Thereafter, an oxide film is formed by thermal oxidation on the etched end of the gate electrode 36 to form an insulated gate electrode.

  Finally, as shown in FIGS. 56 and 57, the oxide film formed on the sidewall of the groove where the source electrode 33 and the drain electrode 34 are formed is wet-etched with a mixed solution of ammonium fluoride and hydrofluoric acid. After the removal, a metal material that forms ohmic contact with the source region 31 and the high concentration region 8 such as nickel, titanium, and aluminum is formed by film formation and etching as the source electrode 33 and the drain electrode 34.

  As described above, the semiconductor device 10 of this embodiment can be formed using a general semiconductor device.

  Next, the operation will be described.

  In the present embodiment, for example, the source electrode 33 is grounded and a positive potential is applied to the drain electrode 34 for use.

  First, when the gate electrode 36 is set to a ground potential or a negative potential, for example, the cutoff state is maintained. That is, a reverse bias is applied between the P-type well region 32 and the N-type drift region 2, and the depletion layer spreads mainly from the PN junction to the drift region 2 side.

  Next, when a positive potential is applied to the gate electrode 36 so as to shift from the cutoff state to the conductive state, an inversion layer is formed in the surface layer portion of the well region 32 via the gate insulating film 35. Then, in the surface layer portion of the source region 31, the well region 32, and the drift region 2 in contact with the gate insulating film 35, there is a potential where free electrons can exist, and the depletion layer extending toward the drift region 2 is retreated, and as a result, the electrons Current conducts.

  In this embodiment, the electron current flows between the source electrode 33 and the drain electrode 34 formed in the groove substantially perpendicularly to the side wall of the groove, so that the thickness of the substrate region 11 and the drift region 2 is supported. It is possible to reduce the resistance of the substrate area, which has been limited in the vertical structure, while achieving a high density of the diode area, which has been limited in the horizontal structure, while having a thickness that can maintain the strength of the substrate. Can do. For this reason, resistance at the time of conduction | electrical_connection can be reduced compared with the conventional horizontal structure and vertical structure.

  As described above, the semiconductor device 10 of the present invention can be similarly applied not only to a diode having a two-terminal element but also to a switching element having a three-terminal element. In the description of the present embodiment, the MOSFET has been described as an example. However, the IGBT, JFET, and further, the first conductivity type semiconductor substrate, and the semiconductor substrate in contact with one main surface of the semiconductor substrate are in a band. A hetero semiconductor region having a different gap; a gate electrode in contact with a hetero junction drive end of a junction between the hetero semiconductor region and the semiconductor substrate via a gate insulating film; and a source electrode ohmically connected to the hetero semiconductor region And a semiconductor device 10 that controls the width of a hetero barrier formed in a heterojunction formed by the semiconductor substrate and an ohmic-connected drain electrode. In any case, since the current during conduction flows almost perpendicularly to the sidewall of the groove, the thickness of the substrate region 11 and the drift region 2 is configured with a thickness that can maintain the strength as a support base, It is possible to reduce the resistance of the substrate region where the restriction has occurred, and it is possible to realize a higher density of the diode region where the restriction has occurred in the horizontal structure. For this reason, resistance at the time of conduction | electrical_connection can be reduced compared with the conventional horizontal structure and vertical structure.

  Also in the seventh embodiment, other effects according to the above-described embodiments can be obtained.

  As described above, the specific configuration and effect of the present invention have been described through the first to seventh embodiments. However, as a semiconductor material of the drift region, a silicon carbide material or the like has been described as an example. Other semiconductor materials such as germane, gallium nitride, and diamond may be used. Moreover, although 4H type was demonstrated as a polytype of silicon carbide, other polytypes, such as 6H and 3C, may be sufficient.

  As mentioned above, although this invention was demonstrated in detail using embodiment, this invention is not limited to embodiment described in this specification. The scope of the present invention is determined by the description of the claims and the scope equivalent to the description of the claims. Hereinafter, modified embodiments in which the above-described embodiment is partially modified will be described.

1 substrate region 2 drift region 3, 13, 23 anode electrode 4, 14, 24 cathode electrode 5 insulating film 6, 7 electric field relaxation region 8 high concentration region 10 semiconductor device 11 substrate region 15 anode region 16 cathode region 26 opposite conductivity type region 31 Source region 32 Well region 33 Source electrode 34 Drain electrode 35 Gate insulating film 36 Gate electrodes 51 to 55, 57 to 62 Mask material 56 Polysilicon layer d Depth p Pitch

Claims (10)

A support substrate made of an insulating silicon carbide material ;
A drift region provided on the support substrate, made of a semiconductor material containing silicon carbide, and having a plurality of recesses;
A first electrode disposed in the recess;
A second electrode disposed in a recess different from the recess in which the first electrode is disposed;
Have
The first electrode and the second electrode are insulated;
The first electrode is disposed in the recess, and the first electrode and the second electrode are further insulated from each other, and the third electrode is the first electrode. control electrode der for controlling a current flowing between the electrodes the second electrode is,
The semiconductor device , wherein bottoms of the plurality of recesses extend through the drift region into the support substrate .   The plurality of recesses are formed on the same main surface side of the drift region, and the first electrode and the second electrode are formed on the same main surface side. A semiconductor device according to 1.   3. The semiconductor device according to claim 1, wherein a depth of the recess is greater than a distance between centers of the recesses in which the first electrode and the second electrode are respectively formed.   4. The semiconductor device according to claim 1, wherein a surface layer portion electric field relaxation region for relaxing electric field concentration is formed in a side wall surface layer portion of the concave portion.   The semiconductor device according to claim 1, wherein a bottom electric field relaxation region that relaxes electric field concentration is formed at a bottom of the side wall of the recess. The semiconductor device according to any one of claims 1 to 5, characterized in that the supporting substrate is made of semiconductor material. The semiconductor device according to claim 6 , wherein the support substrate is made of the semiconductor material having a conductivity type opposite to that of the drift region. The semiconductor device according to any one of claims 1 to 7, wherein the supporting substrate is characterized in that it consists of an insulating material. The semiconductor device according to claim 8 , wherein the support substrate is made of the same semiconductor material as the drift region and is made of an insulating material. The semiconductor device according to any one of claims 1 to 9, characterized in that the supporting substrate is made of silicon carbide material.

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