JP5594601B2 - Touch panel sensor, method for manufacturing the touch panel sensor, and method for manufacturing an input / output device including the touch panel sensor - Google Patents

Description

  The present invention relates to a touch panel sensor, a method for manufacturing the touch panel sensor, and a method for manufacturing an input / output device including the touch panel sensor.

  Today, touch panel devices are widely used as input means. The touch panel device includes a touch panel sensor, a control circuit that detects a contact position on the touch panel sensor, wiring, and an FPC (flexible printed circuit board). In many cases, the touch panel device is used together with the display device as an input means for various devices including a display device such as a liquid crystal display or a plasma display (for example, a ticket vending machine, an ATM device, a mobile phone, a game machine). ing. In such a device, the touch panel sensor is disposed on the display surface of the display device, thereby enabling extremely direct input to the display device. The area | region which faces the display area of a display apparatus among touch panel sensors is transparent, and this area | region of a touch panel sensor comprises the active area which can detect a contact position (approach position).

  Touch panel devices are classified into various types based on the principle of detecting a contact position (approach position) on a touch panel sensor. In recent years, capacitive touch panel devices have attracted attention because they are optically bright, have good design properties, have a simple structure, and are superior in function. In a capacitively coupled touch panel device, when an external conductor (typically a finger) whose position is to be detected contacts (approaches) the touch panel sensor via a dielectric, a new strange capacitance is generated. The position of the object on the touch panel sensor is detected based on the change in capacitance caused by this strange capacity. The capacitive coupling method includes a surface type and a projection type. The projection type is attracting attention because it is suitable for multi-touch recognition (multi-point recognition) (for example, Patent Document 1).

  A projected capacitively coupled touch panel sensor includes a dielectric and first and second sensor electrodes formed in different patterns on both sides of the dielectric. Typically, the first sensor electrode and the second sensor electrode respectively have a first transparent conductor and a second transparent conductor arranged in a lattice pattern. In this case, the position of the touched transparent conductor is detected based on an electromagnetic change or a change in capacitance that occurs when an outer conductor (typically, a finger) contacts or approaches the touch panel sensor. .

  Further, various identification marks for identifying the touch panel sensor are generally formed in the inactive area at the periphery of the active area of the touch panel sensor. For example, an alignment mark used when a touch panel sensor is bonded to a display device, a control board, or the like is formed (for example, Patent Document 2). In the touch panel sensor described in Patent Document 2, the alignment mark is formed at the same time as the metal wiring arranged in the inactive area and electrically connected to the transparent conductor. For this reason, the alignment mark is made of metal. ing. The end of the metal wiring constitutes a terminal to which a display device, a control board, and the like are connected, and a signal from the transparent conductor is transmitted to the display device and the like through this terminal.

Japanese Patent Laid-Open No. 9-292950 JP 2009-53894 A

  By the way, when manufacturing an input / output device including a touch panel sensor, a display device, a control board, and the like, a touch panel sensor in which metal wiring is not formed in the inactive area may be used. Here, when the identification mark is made of metal, a metal patterning step is performed only for forming the identification mark, which is not preferable from the viewpoint of manufacturing cost.

  An object of this invention is to provide the laminated body used in order to produce the touchscreen sensor which can solve such a subject effectively, and a touchscreen sensor.

A touch panel sensor according to the present invention is a touch panel sensor including an active area corresponding to a region where a touch position can be detected, and an inactive area located at a periphery of the active area, the base material, and A first transparent conductor on one side and patterned in the active area;
An identification mark patterned on a surface of one side of the substrate and in an inactive area, and the identification mark is made of the same material as the material of the first transparent conductor Formed with a first transparent conductor, and the base material has a transparent main body part, and a first index matching layer formed on a surface of the transparent main body part on the first transparent conductor side, and The touch panel sensor, wherein a thickness of the first index matching layer in a region corresponding to the identification mark provided in a non-active area is different from a thickness of the first index matching layer in the active area. .

  In the touch panel sensor according to the present invention, the first index matching layer includes a first high refractive index layer provided on a surface of the main body portion on the first transparent conductor side, and the first high refractive index layer. And a first low refractive index layer provided on the surface on the one transparent conductor side. In this case, the light refractive index of the first transparent conductor is smaller than the light refractive index of the first high refractive index layer and larger than the light refractive index of the first low refractive index layer.

  In the touch panel sensor according to the present invention, the first high refractive index layer and the first low refractive index layer in the region corresponding to the identification mark with respect to the thickness of the first high refractive index layer and the first low refractive index layer in the active area. The ratio of the thickness of the refractive index layer may be 66.7% or less.

  In the touch panel sensor according to the present invention, the ratio of the thickness of the first high refractive index layer in the region corresponding to the identification mark to the thickness of the first high refractive index layer in the active area is 48.3% or less. It may be.

  In the touch panel sensor according to the present invention, the ratio of the thickness of the first low refractive index layer in the region corresponding to the identification mark to the thickness of the first low refractive index layer in the active area is 55% or less. Also good.

  In the touch panel sensor according to the present invention, preferably, the first transparent conductor has a thickness in the range of 16 to 22 nm and a light refractive index in the range of 1.8 to 2.0, and the inactive area. Wherein the first high-refractive index layer of the first index matching layer has a thickness in the range of 3 to 7 nm and a light refractive index in the range of 2.1 to 2.4, and The first low refractive index layer of the one index matching layer has a thickness in the range of 50 to 80 nm and a light refractive index in the range of 1.4 to 1.55.

  The touch panel sensor according to the present invention may further include a second transparent conductor on the surface on the other side of the base material and patterned in the active area.

  In the touch panel sensor according to the present invention, the base material may further include a second index matching layer formed on the surface of the transparent main body portion on the second transparent conductor side.

  The method of manufacturing a touch panel sensor according to the present invention includes a step of preparing a transparent main body, a step of forming a first index matching layer on a surface of one side of the transparent main body, and the first Forming a first transparent conductive layer on the index matching layer; and patterning the first transparent conductive layer to form a first transparent conductor located in the active area and located in the inactive area. Forming an identification mark, and in the first index matching layer forming step, the thickness of the first index matching layer in a region corresponding to the identification mark is equal to the thickness of the first index matching layer in the active area. The first index matching layer is formed so as to be different from the thickness. A method for producing a switch panel sensor.

  In the method for manufacturing a touch panel sensor according to the present invention, the first index matching layer includes a first high refractive index layer provided on a surface of the main body portion on the first transparent conductor side, and the first high refractive index layer. And a first low refractive index layer provided on the surface of the first transparent conductor side. In this case, the light refractive index of the first transparent conductor is smaller than the light refractive index of the first high refractive index layer and larger than the light refractive index of the first low refractive index layer.

  In the method for manufacturing a touch panel sensor according to the present invention, the first high refractive index layer and the first low refractive index layer may each be formed by sputtering. In this case, in at least one of the step of forming the first high-refractive index layer by sputtering or the step of forming the first low-refractive index layer by sputtering, the main body is shielded on a region corresponding to the identification mark. A board is placed.

  A method of manufacturing an input / output device according to the present invention includes a step of preparing a display device, and a step of joining the touch panel sensor described above to the display device, wherein the identification mark includes an alignment mark, and the touch panel sensor In the step of joining the display device to the display device, the touch panel sensor is aligned with the display device based on the alignment mark of the touch panel sensor.

  According to the touch panel sensor of the present invention, the identification mark patterned in the inactive area is formed together with the first transparent conductor using the same material as that of the first transparent conductor patterned in the active area. Has been. Further, the thickness of the first index matching layer in the region corresponding to the identification mark provided in the inactive area is different from the thickness of the first index matching layer in the active area. For this reason, the light transmittance or reflectance in the region where the identification mark is formed is different from the light transmittance or reflectance in the region around the alignment mark. For this reason, it becomes possible to visually recognize the identification mark made of the same material as the material of the first transparent conductor. As a result, the identification mark can be formed at a low cost, and thereby the manufacturing cost of the touch panel sensor can be reduced.

FIG. 1 is a diagram for explaining an embodiment according to the present invention, and schematically shows a touch panel device together with a display device. 2 is a cross-sectional view showing the touch panel sensor of the touch panel device of FIG. 1 together with a display device. Note that the cross section shown in FIG. 2 generally corresponds to the cross section taken along the line II-II in FIG. FIG. 3 is a plan view showing a touch panel sensor of the touch panel device. 4A is a cross-sectional view taken along line IVA-IVA in FIG. 4A is a cross-sectional view taken along line IVB-IVB in FIG. 4C is a cross-sectional view taken along line IVC-IVC in FIG. Fig.5 (a) is a figure which shows the specific example of the base film contained in a touchscreen sensor, FIG.5 (b) is a spectrum of the transmitted light flat in each wavelength range by the index matching layer of a base film. It is a figure which shows a mode that it is performed. FIG. 6 is an enlarged plan view showing the vicinity of the alignment mark of the touch panel sensor. 7 is a cross-sectional view taken along line VII-VII in FIG. FIG. 8A is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8B is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8C is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8D is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8E is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8F is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8G is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8H is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8I is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 8J is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 9 is a flowchart for explaining a method of manufacturing the touch panel sensor of FIG. FIG. 10 is a plan view showing a sheet to which a plurality of touch panel sensors are assigned. FIG. 11A is a diagram showing a state in which a high refractive index layer is formed by sputtering. FIG. 11B is a diagram showing the relationship between the film main body, the first shielding plate, and the high refractive index layer target material shown in FIG. 11A and the film thickness distribution of the formed high refractive index layer. FIG. 11C is a diagram showing a modification of the relationship between the film main body, the first shielding plate, and the high refractive index layer target material. FIG. 12 is a diagram showing an example of the wavelength dependence of the refractive index in the high refractive index layer and the transparent conductor of the touch panel sensor according to the present invention. 13A is a diagram showing a reflection spectrum in an active area in Comparative Example 1. FIG. FIG. 13B is a diagram showing a difference in reflectance in the active area in Comparative Example 1. 14A is a diagram showing a reflection spectrum in the alignment mark area in Comparative Example 2. FIG. FIG. 14B is a diagram showing a difference in reflectance in the alignment mark area in Comparative Example 2. FIG. 15A is a diagram illustrating a relationship between the thickness of the high refractive index layer and the Y value by reflection in Example 1. FIG. 15B is a diagram illustrating the relationship between the thickness of the high refractive index layer and the reflectance ratio in Example 1. FIG. 16A is a diagram illustrating the relationship between the thickness of the low refractive index layer and the Y value due to reflection in Example 2. FIG. 16B is a diagram illustrating the relationship between the thickness of the low refractive index layer and the reflectance ratio in Example 2. FIG. 17A is a diagram illustrating the relationship between the thickness of the index matching layer and the Y value due to reflection in Example 3. FIG. 17B is a diagram illustrating the relationship between the thickness of the index matching layer and the reflectance ratio in Example 3.

  Embodiments of the present invention will be described below with reference to the drawings.

  In the drawings attached to the present specification, for the sake of illustration and ease of understanding, the scale, the vertical / horizontal dimension ratio, and the like are appropriately changed and exaggerated from those of the actual ones.

  Further, in the present case, the terms “sheet”, “film”, and “plate” are not distinguished from each other based only on the difference in names. Therefore, for example, a “sheet” is a concept that includes members and portions that can also be called films, plates, and the like.

Touch Panel Device First, the entire touch panel device 20 will be described with reference to FIGS. 1 and 2. The touch panel device 20 shown in FIGS. 1 and 2 is configured as a projected capacitive coupling method, and is configured to be able to detect the contact position of an external conductor (for example, a human finger) to the touch panel device 20. Yes. In addition, when the detection sensitivity of the capacitively coupled touch panel device 20 is excellent, it is possible to detect which region of the touch panel device the external conductor is approaching just by approaching the external conductor. Can do. Along with such a phenomenon, the “contact position” used here is a concept including an approach position that is not actually in contact but can be detected.

  As shown in FIGS. 1 and 2, the touch panel device 20 is used in combination with a display device (for example, a liquid crystal display device) 15 and constitutes an input / output device 10. The illustrated display device 15 is configured as a flat panel display. The display device 15 includes a display panel 16 having a display surface 16 a and a display control unit 17 connected to the display panel 16. The display panel 16 includes a display area A1 that can display an image, and a non-display area (also referred to as a frame area) A2 that is disposed outside the display area A1 so as to surround the display area A1. . The display control unit 17 processes information regarding the video to be displayed, and drives the display panel 16 based on the video information. The display panel 16 displays a predetermined image on the display surface 16a according to a control signal from the display control unit 17. That is, the display device 15 plays a role as an output device that outputs information such as characters and drawings as video.

  As shown in FIG. 1, the touch panel device 20 includes a touch panel sensor 30 disposed on the display surface 16 a of the display device 15 and a detection control board (not shown) connected to the touch panel sensor 30. 25. Of these, the touch panel sensor 30 is bonded to the display surface 16 a of the display device 15 via an adhesive layer 19 as shown in FIG. 2. As described above, the touch panel device 20 is configured as a projected capacitively coupled touch panel device, and plays a role as an input device for inputting information. The detection control board of the detection control unit 25 is formed of, for example, a flexible printed circuit board on which a detection circuit described later is formed. The flexible printed circuit board includes a first extraction terminal unit and a second extraction terminal unit described later of the touch panel sensor 30. Connected to the extraction terminal.

  Further, as shown in FIG. 2, the touch panel device 20 further includes a protective cover 12 having translucency that functions as a dielectric on the viewer side of the touch panel sensor 30, that is, the side opposite to the display device 15. Have. The protective cover 12 is bonded onto the touch panel sensor 30 via the adhesive layer 14. The protective cover 12 functions as an input surface (touch surface, contact surface) to the touch panel device 20. That is, information can be input from the outside to the touch panel device 20 by bringing a conductor such as a human finger 5 into contact with the protective cover 12. The protective cover 12 forms the most observer side of the input / output device 10, and also functions as a cover for protecting the touch panel device 20 and the display device 15 from the outside in the input / output device 10.

  In addition, as the adhesive layers 14 and 19 described above, layers made of materials having various adhesive properties can be used. In this specification, “adhesion (layer)” is used as a concept including adhesion (layer).

  The detection control unit 25 of the touch panel device 20 is connected to the touch panel sensor 30 as described above, and the information input via the protective cover 12 is processed by the detection control unit 25. Specifically, the detection control unit 25 can specify the contact position of the conductor 5 with the protective cover 12 when the conductor (typically a human finger) 5 is in contact with the protective cover 12. The circuit (detection circuit) comprised in this is included. Further, the detection control unit 25 may be connected to the display control unit 17 of the display device 15. In this case, the detection control unit 25 can transmit the processed input information to the display control unit 17. At this time, the display control unit 17 can create video information based on the input information and display a video corresponding to the input information on the display panel 16.

  Note that the terms “capacitive coupling” and “projection type” capacitive coupling are used in the present case as having the same meaning as used in the technical field of touch panels. The “capacitive coupling” method is also referred to as “capacitance” method or “capacitance coupling” method in the technical field of touch panels. It is treated as a term synonymous with the “capacitive coupling” method. A typical capacitively coupled touch panel device includes a conductor layer, and an external conductor (typically a human finger) comes into contact with the touch panel, whereby the external conductor and the conductor layer of the touch panel device are contacted. A capacitor (capacitance) is formed between the two. Based on the change in the electrical state accompanying the formation of the capacitor, the position coordinates of the position where the external conductor is in contact with the touch panel are specified. The “projection type” capacitive coupling method is also referred to as “projection type” capacitive coupling method in the technical field of touch panel, and in this case, the term is synonymous with this “projection type” capacitive coupling method. handle. The “projection type” capacitive coupling method is typically a method of detecting a position where an external conductor is in contact using sensor electrodes arranged in a lattice pattern. Contrast with “type” capacitive coupling scheme.

Touch Panel Sensor Next, the touch panel sensor 30 will be described in detail with reference to FIGS. 2 to 4C. As shown in FIG. 2, the touch panel sensor 30 is a first transparent film provided in a predetermined pattern on a base film (base material) 32 and a surface 32 a on one side (observer side) of the base film 32. It has the conductor 40 and the 2nd transparent conductor 45 provided in the predetermined pattern on the surface 32b of the other side (the display apparatus 15 side) of the base film 32. FIG. In FIG. 3, components provided on the other side of the base film 32, such as the second transparent conductor 45, are indicated by dotted lines for convenience.

  Among these, the base film 32 functions as a dielectric in the touch panel sensor 30. As shown in FIG. 3, the base film 32 includes a rectangular active area Aa1 corresponding to a region where the touch position can be detected, and a rectangular frame-shaped inactive area Aa2 surrounding the active area Aa1. . Among these, the active area Aa1 occupies an area facing the display area A1 of the display device 15 as shown in FIG. 1, while the inactive area Aa2 is an area facing the non-display area A2 of the display device 15. Is formed.

  As shown in FIG. 3, the inactive area Aa2 includes a rectangular frame-shaped frame wiring area Aa3 surrounding the active area Aa1, and a rectangular frame-shaped alignment mark area Aa4 surrounding the frame wiring area Aa3. . Among these, the frame wiring area Aa3 is an area in which an extraction conductor (described later) and an extraction terminal portion (described later) for transmitting signals from the transparent conductors 40 and 45 to the detection control unit 25 are provided. The mark area Aa4 is an area where an alignment mark (described later) used when the touch panel sensor 30 is joined to the display device 15 or the like is provided.

  As described above, the base film 32 is provided with the first transparent conductor 40 and the second transparent conductor 45, and among these, the first transparent conductor 40 provided in the active area Aa1 of the base film 32 and The second transparent conductor 45 forms a first sensor electrode 36a and a second sensor electrode 37a that can form capacitive coupling with the outer conductor 5 (see FIG. 3). As will be described later, each of the base film 32, the first transparent conductor 40, and the second transparent conductor 45 has a light-transmitting property. Can be observed.

  Further, as shown in FIG. 3, in the frame wiring area Aa3 of the inactive area Aa2 of the base film 32, a first extraction wiring 36b electrically connected to the first sensor electrode 36a and a second sensor electrode 37a And a second extraction wiring 37b that is electrically connected to the first and second wirings 37b. Among these, as shown in FIG. 3, the first extraction wiring 36b is electrically connected to the first transparent conductor 40 at one end thereof, and extends in the y direction shown in FIG. And a first extraction terminal portion 44 connected to the other end of the first extraction conductor 43. Further, as shown in FIG. 3, the second extraction wiring 37 b is connected to the second extraction conductor 48 electrically connected to the second transparent conductor 45 at one end and to the other end of the second extraction conductor 48. And a second extraction terminal portion 49 connected thereto.

  As shown in FIGS. 4A to 4C to be described later, the first conductive conductor 43 and the first extraction terminal portion 44, and a first surface 32a on one side of the base film 32 are made of a transparent conductive layer. One transparent extraction conductor may be interposed. The 1st transparent extraction conductor consists of a transparent conductor formed with the 1st transparent conductor 40 so that it may demonstrate in the manufacturing method of the touch panel sensor 30 mentioned later. Similarly, a second transparent extraction conductor made of a transparent conductive layer is interposed between the second extraction conductor 48 and the second extraction terminal portion 49 and the surface 32b on the other side of the base film 32. Also good.

  Next, each element constituting the touch panel sensor 30 will be described in detail.

Sensor Electrode First, the first sensor electrode 36a and the second sensor electrode 37a will be described in detail. As described above, the first sensor electrode 36a and the second sensor electrode 37a are respectively configured by the first transparent conductor 40 and the second transparent conductor 45 provided in the active area Aa1. The first transparent conductor 40 and the second transparent conductor 45 are made of a transparent material having conductivity. Among these, the 1st transparent conductor 40 is provided on the surface 32a of the one side of the base film 32, and is extended substantially parallel to the x direction, as shown in FIG. The second transparent conductor 45 is provided on the surface 32b on the other side of the base film 32 and extends substantially parallel to the y direction orthogonal to the x direction as shown in FIG.

  As shown in FIG. 3, the first transparent conductor 40 includes a line portion 41a extending linearly and a bulging portion 41b bulging from the line portion 41a. Here, the bulging portion 41 b is a portion that bulges from the line portion 41 a along the film surface of the base film 32. Similarly, the 2nd transparent conductor 45 has the line part 46a extended linearly, and the bulging part 46b bulged from the line part 46a.

  As shown in FIG. 3, the first transparent conductor 40 and the second transparent conductor 45 are arranged in different patterns. Specifically, as shown in FIG. 3, the bulging portion 41 b of the first transparent conductor 40 and the bulging portion 46 b of the second transparent conductor 45 are in the normal direction of the film surface of the base film 32. Are arranged so as not to overlap each other when observed from above. In this way, either the first transparent conductor 40 or the second transparent conductor 45 is disposed over almost the entire active area Aa1 of the base film 32.

  As the material of the first transparent conductor 40 and the second transparent conductor 45, a material having transparency and required conductivity is used. Examples of such materials include indium tin oxide (ITO), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum-added zinc oxide, potassium-added zinc oxide, silicon-added zinc oxide, and zinc oxide-oxide Examples thereof include metal oxides such as tin-based, indium oxide-tin oxide-based, and zinc oxide-indium oxide-magnesium oxide-based, and two or more of these metal oxides may be combined. The formation method of the 1st transparent conductor 40 and the 2nd transparent conductor 45 is not specifically limited, Sputtering method, a vacuum evaporation method, an ion plating method, CVD method, a coating method, a printing method etc. can be used.

  The light refractive index of the transparent conductors 40 and 45 made of ITO is, for example, 1.94 near the light wavelength of 550 nm. Although the calculation method of a photorefractive index is not specifically limited, For example, it calculates from the measurement using an ellipsometer. Moreover, also in each layer of the base film 32 described later, the optical refractive index in the vicinity of the light wavelength of 550 nm of each layer is calculated from, for example, measurement using an ellipsometer.

  The thickness of the transparent conductors 40 and 45 made of ITO is preferably 20 nm or less, for example, 18 nm each. When the film thickness is small, for example, 40 nm or less, generally, the smaller the thickness of the transparent conductors 40 and 45, the smaller the light reflectance at the interface between the transparent conductors 40 and 45 and the air, and the influence of the absorption term. Is small, the transmittance is high.

  By the way, when the index matching layer (described later) is not interposed between the transparent conductors 40, 45 and the film body (described later) of the base film 32, generally, the light reflectance in the transparent conductors 40, 45 is low. The smaller the touch panel sensor 30, the smaller the difference in light reflectance between the region where the transparent conductors 40, 45 are patterned and the region where the transparent conductors 40, 45 are not patterned. For this reason, by making the thickness of the transparent conductors 40 and 45 smaller, the area where the transparent conductors 40 and 45 are patterned in the touch panel sensor 30 and the area where the transparent conductors 40 and 45 are not patterned are provided. The difference in the reflectance of light between the two can be reduced, whereby the pattern of the transparent conductors 40 and 45 can be prevented from being visually recognized by the user of the touch panel sensor 30.

  On the other hand, when an index matching layer is interposed between the transparent conductors 40 and 45 and the film body of the base film 32, the reflectance in the region of the touch panel sensor 30 where the transparent conductors 40 and 45 are not patterned. As a result, the difference in light reflectance between the region where the transparent conductors 40 and 45 are patterned in the touch panel sensor 30 and the region where the transparent conductors 40 and 45 are not patterned is reduced. . Here, the index matching layer is a layer including at least a pair of a high refractive index layer and a low refractive index layer, as will be described later. When such an index matching layer is interposed between the transparent conductors 40 and 45 and the film body 33, an effect of thin film interference occurs, whereby the transparent conductors 40 and 45 of the touch panel sensor 30 are patterned. The difference in light reflectance and transmittance between the region where the transparent conductors 40 and 45 are not patterned can be reduced. In the present embodiment, an index matching layer between the first transparent conductor 40 and the film body is constituted by a first high refractive index layer and a first low refractive index layer which will be described later, and a second layer which will be described later. The high-refractive index layer and the second low-refractive index layer constitute an index matching layer between the second transparent conductor 45 and the film body.

  In the present embodiment, the thickness of the transparent conductors 40 and 45 is further reduced, and an index matching layer is interposed between the transparent conductors 40 and 45 and the film body, so that the touch panel sensor 30 It is intended to reduce the difference in light reflectance and transmittance between the region where the transparent conductors 40, 45 are patterned and the region where the transparent conductors 40, 45 are not patterned.

Incidentally, in general, the smaller the thickness of the transparent conductors 40 and 45, the greater the electrical resistance of the transparent conductors 40 and 45. When the electrical resistance of the transparent conductors 40 and 45 is increased, it is conceivable that an electrical signal sent from the sensor electrodes 36a and 37a including the transparent conductors 40 and 45 to the detection circuit of the detection control unit 25 is inhibited. For this reason, when the thickness of the transparent conductors 40 and 45 is made smaller than before, the specific resistance of the transparent conductors 40 and 45 is smaller than the conventional one so that the electrical resistance of the transparent conductors 40 and 45 does not become excessive. It is preferable to use a material. For example, the specific resistance of the transparent conductors 40 and 45 is preferably 4 × 10 ⁻⁶ Ωm (23 ° C., 55% RH) or less.

Referring to extraction wirings then 4A to 4C, a first extraction wiring 36b electrically connected to the first sensor electrode 36a, the second extraction wirings 36b electrically connected to the second sensor electrode 37a And will be described in detail.

(First extraction wiring)
As described above, the first extraction wiring 36b is electrically connected to the first transparent conductor 40 at one end thereof, and extends in the y direction, and the other of the first extraction conductor 43. And a first extraction terminal portion 44 connected to the end. As shown in FIGS. 4A and 4C, a first conductive conductive layer 43 and a first extraction terminal portion 44 and a surface 32 a on one side of the base film 32 are each formed of a transparent conductive layer. A transparent extraction conductor 42 is interposed. As will be described later, the first extraction conductor 43 and the first extraction terminal portion 44 are simultaneously formed from the same material.

  As described above, the first extraction conductor 43 and the first extraction terminal portion 44 are arranged in the frame wiring area Aa3 of the inactive area Aa2. For this reason, the 1st extraction conductor 43 and the 1st extraction terminal part 44 do not need to be formed from the material which has translucency, and can be formed from the material which has high electroconductivity. In the present embodiment, the first extraction conductor 43 and the first extraction terminal portion 44 are formed of a metal material having a higher conductivity (electrical conductivity) than the material forming the first transparent conductor 40. Yes. Specifically, it is made of a metal material that has a light shielding property and has a much higher conductivity than a transparent conductor such as ITO, such as aluminum, molybdenum, silver, chromium, copper, or an alloy thereof. ing.

  The method for forming the first extraction conductor 43 and the first extraction terminal portion 44 is not particularly limited, and a known method such as a screen printing method or a photolithography method is appropriately used.

(Second extraction wiring)
Next, the second extraction wiring 37b will be described. As described above, the second extraction wiring 37b has the second extraction conductor 48 electrically connected to the second transparent conductor 45 at one end thereof and the second extraction conductor 48 connected to the other end of the second extraction conductor 48 as described above. 2 extraction terminal portions 49. As shown in FIGS. 4B and 4C, a second conductive conductive layer 48 is formed between each second extraction conductor 48 and the second extraction terminal portion 49 and the surface 32 b on the other side of the base film 32. A transparent extraction conductor 47 is interposed. As will be described later, the second extraction conductor 48 and the second extraction terminal portion 49 are simultaneously formed from the same material.

  As described above, the second extraction conductor 48 and the second extraction terminal portion 49 are arranged in the frame wiring area Aa3 of the inactive area Aa2. For this reason, as in the case of the first extraction conductor 43 and the first extraction terminal portion 44, the second extraction conductor 48 and the second extraction terminal portion 49 do not need to be formed of a light-transmitting material. It can be formed from a material having high conductivity. In the present embodiment, the second extraction conductor 48 and the second extraction terminal portion 49 are formed from a metal material having a higher conductivity (electrical conductivity) than the material forming the second transparent conductor 45. Yes. Specifically, it is made of a metal material that has a light shielding property and has a much higher conductivity than a transparent conductor such as ITO, such as aluminum, molybdenum, silver, chromium, copper, or an alloy thereof. ing.

  The method of forming the second extraction conductor 48 and the second extraction terminal portion 49 is not particularly limited, and a known method such as a screen printing method or a photolithography method is appropriately used.

Base Film Next, the base film 32 will be described in detail with reference to FIGS. In this Embodiment, the base film 32 is comprised from several layers so that it may mention later. Here, each layer of the base film 32 is integrally formed by sputtering or the like without using bonding via an adhesive layer.

Fig.5 (a) is a figure which shows the cross section of the base film 32 in active area Aa1. As shown in FIG. 5A, the base film 32 is provided on a transparent film main body (main body portion) 33 and a surface 33 a on the first transparent conductor 40 side (one side) of the film main body 33. The first undercoat layer 71, the first high refractive index layer 72 provided on the first transparent conductor 40 side (one side) surface 71a of the first undercoat layer 71, and the first high refractive index. The first low refractive index layer 73 provided on the first transparent conductor 40 side (one side) surface 72a of the layer 72 and the second transparent conductor 45 side (the other side) surface of the film body 33. A second undercoat layer 76 provided on 33b, a second high refractive index layer 77 provided on a surface 76b on the second transparent conductor 45 side (the other side) of the second undercoat layer 76, Provided on the surface 77b of the second high refractive index layer 77 on the second transparent conductor 45 side (the other side). It has a second low-refractive index layer 78, a.
In such a base film 32, the first high-refractive index layer 72 and the first low-refractive index layer 73 constitute the first index matching layer 70, and the second high-refractive index layer 77 and the second low-refractive index layer. 78 constitutes a second index matching layer 75.

  Hereinafter, each layer which comprises the base film 32 is explained in full detail. First, the film body 33 will be described in detail.

(Film body)
The material of the film body 33 is preferably a highly transparent material, for example, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polyetheretherketone (PEEK), polycarbonate (PC). ), Polypropylene (PP), polyamide (PA), acrylic resin, epoxy resin, phenol resin, aliphatic cyclic polyolefin, norbornene-based thermoplastic transparent resin, and the like. In the present embodiment, the film body 33 is formed of PET having a light refractive index of 1.66. The thickness of the film main body 33 made of PET is not particularly limited, but is, for example, in the range of 50 to 200 μm.

(Undercoat layer)
Next, the first undercoat layer 71 and the second undercoat layer 76 will be described in detail. The undercoat layers 71 and 76 are layers for preventing a low molecular polymer (oligomer) generated in the film main body 33 from entering the high refractive index layers 72 and 77, and are made of, for example, an acrylic resin. . The light refractive index of the undercoat layers 71 and 76 made of acrylic resin is, for example, 1.53, and the thickness thereof is, for example, 3000 nm.

  The oligomer of the film main body 33 is generally generated when the base film 32 is heated in the step of forming the transparent conductors 40 and 45 described later. In addition, in the film main body 33, when the device for not generating an oligomer, or the device for not taking out the generated oligomer to the outside, etc. are made, the undercoat layers 71 and 76 are formed on the surfaces 33a and 33b of the film main body 33. It may not be provided.

(Index matching layer)
Next, the first index matching layer 70 and the second index matching layer 75 will be described in detail. First, the purpose of providing the first index matching layer 70 and the second index matching layer 75 will be described.

(Purpose of index matching layer)
As described above, there is a difference of about 0.3 in the optical refractive index between the film body 33 and the transparent conductors 40 and 45. Thus, when the difference of the optical refractive index of the film main body 33 and the transparent conductors 40 and 45 is large, generally, the area | region where the transparent conductors 40 and 45 are provided among the base film 32, and the area | region where it is not provided It is conceivable that the reflectance and transmittance of light differ greatly. Moreover, since the transparent conductors 40 and 45 made of ITO generally have a characteristic of absorbing light of a short wavelength, the spectrum of light transmitted through the region of the base film 32 where the transparent conductors 40 and 45 are provided is It may be yellow. The first index matching layer 70 and the second index matching layer 75 are provided in order to solve such problems.

(Structure of index matching layer)
Next, the configuration of the first index matching layer 70 and the second index matching layer 75 will be described. As described above, the index matching layers 70 and 75 include the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78. Among these, the optical refractive index of the high refractive index layers 72 and 77 is larger than the optical refractive index of the transparent conductors 40 and 45. The light refractive index of the low refractive index layers 73 and 78 is smaller than the light refractive index of the transparent conductors 40 and 45. By providing the index matching layers 70 and 75 having such a configuration between the film main body 33 and the transparent conductors 40 and 45, an effect of thin film interference can be produced. The light reflectance in the area where the transparent conductors 40 and 45 are provided in the active area Aa1 (light reflectance in the area indicated by arrows (1) and (3) in FIG. 5A) and the transparent conductive material. The difference between the reflectance of light in the region where the bodies 40 and 45 are not provided (the reflectance of light in the region indicated by arrows (2) and (4) in FIG. 5A) can be reduced. Similarly, by providing the index matching layers 70 and 75, the light transmittance in the region where the transparent conductors 40 and 45 are provided and the light transmittance in the region where the transparent conductors 40 and 45 are not provided. It is also possible to reduce the difference. Thus, the difference between the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are provided and the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided. By reducing the value, it is possible to prevent the pattern of the transparent conductors 40 and 45 from being visually recognized in the active area Aa1. That is, the invisible pattern of the transparent conductors 40 and 45 is achieved.

  Further, by providing the index matching layers 70 and 75 having the above-described configuration, the spectrum of light transmitted through the region where the transparent conductors 40 and 45 are provided in the base film 32 is flattened in each wavelength region. It can be. The spectrum shown on the left side in FIG. 5B is a spectrum of transmitted light when the index matching layers 70 and 75 are not provided, and the spectrum shown on the right side in FIG. 5B is the index matching layers 70 and 75. It is a spectrum of the transmitted light when is provided. As shown in FIG. 5B, by providing the index matching layers 70 and 75 between the film main body 33 and the transparent conductors 40 and 45, it is possible to realize uniform transmittance in each wavelength region. Become. In this way, it is possible to prevent only the yellow component from being excessive in the transmitted light. In this case, the absolute value of b * when the transmitted light is expressed in L * a * b * display color is, for example, 1 .5 or less.

(Index matching layer design method)
Next, a method for designing the index matching layers 70 and 75 having the above functions will be described. First, a target of optical characteristics in the touch panel sensor 30 is determined. For example, in the active area Aa1 of the base film 32, the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are provided, and the light in the region where the transparent conductors 40 and 45 are not provided. The difference between the reflectance and the transmittance is 1% or less, and the b * of the light transmitted through the region of the base film 32 where the transparent conductors 40 and 45 are provided is 1.5 or less. This is the target of optical characteristics.

  Next, based on the thickness and optical refractive index of each layer of the base film 32 and the thickness and optical refractive index of the transparent conductors 40 and 45, the values of reflectance, transmittance, and b * are obtained by simulation. Then, using the thicknesses of the high-refractive index layers 72 and 77 and the low-refractive index layers 73 and 78 and the optical refractive index as variable parameters, a parameter that achieves the above-described optical characteristic target is searched. As a result, an appropriate range of the thickness and the optical refractive index of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 can be calculated, and thus the target optical characteristics can be obtained. 70 and 75 are designed. As a simulation tool, for example, thin film design software (OPTAS-FILM) manufactured by Cybernet Systems Co., Ltd. can be used.

As a result of searching for a parameter that achieves the above-mentioned optical characteristic target, it was found that the configuration described below is optimal. That is, the transparent conductors 40 and 45 each have a thickness in the range of 16 to 22 nm and a light refractive index in the range of 1.8 to 2.0, and the high refractive index layers 72 and 77 each have 3 Having a thickness in the range of ˜7 nm and a photorefractive index in the range of 2.1 to 2.4, and the low refractive index layers 73 and 78 have a thickness in the range of 50 to 80 nm and 1.4˜ And a refractive index in the range of 1.55. An example of the base film 32 and the transparent conductors 40 and 45 having such a configuration is shown in Table 1 below.

Next, the materials of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 will be described in detail. The material of the high refractive index layers 72 and 77 is not particularly limited as long as the material has a light refractive index capable of achieving a target optical characteristic. For example, niobium pentoxide having a light refractive index of 2.30. (Nb ₂ O ₅ ) is used. Further, the material of the low refractive index layers 73 and 78 is not particularly limited as long as it is a material having a light refractive index capable of achieving a target optical characteristic. For example, silicon dioxide having a light refractive index of 1.46. (SiO ₂ ) is used.

Alignment Mark Next, with reference to FIGS. 6 and 7, the alignment mark provided in the alignment mark area Aa4 of the touch panel sensor will be described in detail. As described above, the alignment mark is an alignment mark used when the touch panel sensor 30 is joined to the display device 15 or the like. In the present embodiment, as shown in FIG. 7, the first alignment mark 81 is formed on the surface 32 a on one side of the base film 32, and the first alignment mark 81 is formed on the surface 32 b on the other side of the base film 32. Two alignment marks 86 are formed.

  Next, the shape of the alignment marks 81 and 86 will be described. Since the first alignment mark 81 and the second alignment mark 86 are different only in the provided surfaces, only the shape of the first alignment mark 81 among the alignment marks 81 and 86 will be described here. The shape of the second alignment mark 86 is substantially the same as the shape of the first alignment mark 81.

As shown in FIG. 6, the first alignment mark 81 has a cross shape. Here, the cross line width t ₁ (see FIG. 6) is, for example, in the range of 50 to ₁₀₀ μm, and the cross-shaped total width t ₂ (see FIG. 6) is, for example, 10 mm.

  The shapes of the alignment marks 81 and 86 are not limited to the cross shape, and are appropriately selected according to the specifications of the reading unit that reads the alignment marks.

  Next, materials constituting the alignment marks 81 and 86 will be described. In the present embodiment, the alignment marks 81 and 86 are formed together with the transparent conductors 40 and 45 using the same material as that of the transparent conductors 40 and 45, as will be described later. For this reason, it is possible to form the alignment marks 81 and 86 at a lower cost than when a separate patterning process is performed only for forming the alignment marks 81 and 86.

  On the other hand, as described above, in the active area Aa1, the index matching layers 70 and 75 are provided between the film body 33 and the transparent conductors 40 and 45, whereby the pattern of the transparent conductors 40 and 45 is provided. Invisibility has been achieved. If the index matching layers 70 and 75 are provided between the film body 33 and the transparent conductors 40 and 45 even in the alignment mark area Aa4 where the alignment marks 81 and 86 are provided, the transparent conductor 40 , 45, the alignment marks 81 and 86 made of the same material are also made invisible. When the alignment marks 81 and 86 are made invisible, the alignment marks 81 and 86 cannot be read by the reading means described above. In order to cope with such a problem, in the present embodiment, the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 is different from the thickness of the index matching layers 70 and 75 in the active area Aa1. Thus, the index matching layers 70 and 75 are formed. For example, as shown in FIG. 7, the index matching layers 70 and 75 are formed so that the index matching layers 70 and 75 do not extend into the alignment mark area Aa4 where the alignment marks 81 and 86 are formed. That is, the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 is zero.

  “The thickness of the index matching layers 70 and 75 in the alignment mark area Aa4 is different from the thickness of the index matching layers 70 and 75 in the active area Aa1” means that the thickness of the index matching layers 70 and 75 in the alignment mark area Aa4 This means that the thickness of the index matching layers 70 and 75 in the active area Aa1 is different from the degree of variation in the manufacturing process. For example, when there is a possibility that the thickness of the index matching layers 70 and 75 may vary by up to 5% depending on the location due to an error in the manufacturing process, the thickness of the index matching layers 70 and 75 in the alignment mark area Aa4 and the active The thickness of the index matching layers 70 and 75 in the area Aa1 differs by more than 5%.

  In the present embodiment, the “region corresponding to the alignment marks 81, 86” refers to a region of the index matching layers 70, 75 that overlaps with the alignment marks 81, 86 when viewed from the normal direction of the index matching layers 70, 75. The concept includes not only the peripheral region of the overlapping region. That is, among the index matching layers 70 and 75, the thickness in the peripheral region of the overlapping region is also different from the thickness of the index matching layers 70 and 75 in the active area Aa1. As a result, the difference between the light reflectance and transmittance of the alignment marks 81 and 86 and the light reflectance and transmittance in the peripheral region of the alignment marks 81 and 86 can be increased. As a result, the alignment marks 81 and 86 can be read by the reading means described above.

  Preferably, as supported by Example 4 described later, the ratio of the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 to the thickness of the index matching layers 70 and 75 in the active area Aa1 is 66.7% or less. As a result, the Y value due to light reflection in the region where the alignment marks 81 and 86 are provided and the Y value due to light reflection in the region where the alignment marks 81 and 86 are not provided with respect to one of the Y values. The ratio of the other Y value can be 1.25 or more. As a result, the alignment marks 81 and 86 can be read by the reading means described above.

  Alternatively, the thickness of one of the plurality of layers constituting the index matching layers 70 and 75 may be made different between the active area Aa1 and the regions corresponding to the alignment marks 81 and 86. For example, as supported by Example 2 described later, in the index matching layers 70 and 75 including the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78, the high refractive index layers 72 and 72 in the active area Aa1. The ratio of the thickness of the high refractive index layers 72 and 77 in the region corresponding to the alignment marks 81 and 86 to the thickness of 77 may be 48.3% or less. Alternatively, as supported by Example 3 described later, in the index matching layers 70 and 75 including the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78, the low refractive index layer 73 in the active area Aa1. The ratio of the thickness of the low refractive index layers 73 and 78 in the region corresponding to the alignment marks 81 and 86 to the thickness of 78 may be 55% or less. With these configurations, either the Y value due to light reflection in the region where the alignment marks 81 and 86 are provided and the Y value due to light reflection in the region where the alignment marks 81 and 86 are not provided are either Y The ratio of the other Y value to the value can be 1.25 or more.

  Next, a method of manufacturing the touch panel sensor 30 having the above configuration according to the flowchart shown in FIG. 9 will be described with reference to FIGS. 8A to 8J. 8A to 8J, (a) is a plan view showing a case where the touch panel sensor being manufactured is viewed from one side of the film body 33. (B) has shown the touch-panel sensor under manufacture in the cross section along the VIII-VIII line in (a). 8A to 8J, the structure of the transparent conductive layers 40 and 45 and the like are appropriately simplified as compared with the touch panel sensor 30 shown in FIG.

Step of Forming Laminate First, referring to FIGS. 8A to 8D, a step of forming a laminate (also called blanks) 50 as a base material for manufacturing touch panel sensor 30 (steps S1 to S4 in FIG. 9). Will be described. As will be described later, the touch panel sensor 30 can be obtained by performing processing (processing) such as film formation and patterning on the laminated body 50.

  First, as shown in FIGS. 9 and 8A (a) (b), a first undercoat layer 71 and a second undercoat layer 76 are formed on the surface 33a on one side and the surface 33b on the other side, respectively. A film body 33 is prepared (step S1). The undercoat layers 71 and 76 are formed integrally with the film body 33 by coating, for example.

  Next, as shown in FIGS. 9 and 8B (a) and (b), the first high refractive index layer 72 is formed on the surface 71a on one side of the first undercoat layer 71 by sputtering, and the second A second high refractive index layer 77 is formed by sputtering on the surface 76b on the other side of the undercoat layer 76 (step S2). At this time, the thickness of the high refractive index layers 72 and 77 in the region corresponding to the alignment marks 81 and 86 is different from the thickness of the high refractive index layers 72 and 77 in the region to be the active area Aa1. , 77 are formed. Specifically, as shown in FIGS. 8B (a) and 8 (b), shielding plates 82 and 87 are respectively disposed on regions of the film body 33 that are to become the alignment mark area Aa4 during sputtering. Thereby, it is possible to prevent the high refractive index layers 72 and 77 from being formed in the region of the film body 33 that is to become the alignment mark area Aa4.

  11A and 11B are diagrams showing in more detail how the high refractive index layer 72 is formed by sputtering. Among these, FIG. 11A is a figure which shows a mode that the target material 95 for high refractive index layers is sputtered on the film main body 33 conveyed through the roll 96, and FIG. 11B is a film main body 33 shown by FIG. 11A. FIG. 4 is a diagram showing a relationship between a first shielding plate 82 and a high refractive index layer target material 95 and a film thickness distribution of a high refractive index layer 72 to be formed.

  In the examples shown in FIGS. 11A and 11B, the length of the high refractive index layer target material 95 is larger than the width of the active area. In this case, since the thickness of the high refractive index layer 72 formed in the region to be the alignment mark area Aa4 and the thickness of the high refractive index layer 72 in the region to be the active area Aa1 are different, The 1st shielding board 82 is arrange | positioned so that the edge part vicinity in a direction may be covered.

  By the way, in the above-mentioned FIG. 8B (b), the example in which the high refractive index layer 72 is not formed at all in the region to be the alignment mark area Aa4 in the film main body 33 is shown, but actually, as shown in FIG. 11B. In addition, it is conceivable that some high refractive index layers 72 are also formed in the region of the film body 33 that is to become the alignment mark area Aa4. This is because the material sputtered from the high refractive index layer target material 95 is trapped between the film body 33 and the first shielding plate 82. In this case, the film thickness of the high refractive index layer 72 formed in the region to be the alignment mark area Aa4 gradually decreases toward the end of the film body 33 as shown in FIG. 11B.

  11A and 11B show an example in which the length of the high refractive index layer target material 95 is larger than the width of the film body 33, but the present invention is not limited to this. For example, as shown in FIG. 11C, the length of the high refractive index layer target material 95 may be smaller than the width of the film body 33. In this case, as shown in FIG. 11C, even if the first shielding plate 82 is not disposed, the thickness of the high refractive index layer 72 formed in the region to be the alignment mark area Aa4 and the active area Aa1 It is possible to make the thickness of the high refractive index layer 72 different in the region to be.

  Next, as shown in FIGS. 9 and 8C (a) (b), the first low refractive index layer 73 is formed on the surface 72a on one side of the first high refractive index layer 72 by sputtering. 2 The second low refractive index layer 78 is formed by sputtering on the surface 77b on the other side of the high refractive index layer 77 (step S3). At this time, the thickness of the low refractive index layers 73 and 78 in the region corresponding to the alignment marks 81 and 86 is different from the thickness of the low refractive index layers 73 and 78 in the region to be the active area Aa1. , 78 are formed. Specifically, as shown in FIGS. 8C (a) and 8 (b), shielding plates 82 and 87 are respectively disposed on regions of the film body 33 that are to become the alignment mark area Aa4 during sputtering. Accordingly, it is possible to prevent the low refractive index layers 73 and 78 from being formed in the region of the film body 33 that is to become the alignment mark area Aa4.

  In this way, the index matching layers 70 and 75 including the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 having a desired thickness can be formed in the region to be the active area Aa1. In this way, the base film 32 composed of the film body 33, the undercoat layers 71 and 76, the high refractive index layers 72 and 77, and the low refractive index layers 73 and 78 is obtained. In the base film 32, as described above, the thickness of the index matching layers 70 and 75 formed in the region to be the active area Aa1, and the index matching layer 70 formed in the region to be the alignment mark area Aa4. , 75 is different in thickness.

  Next, as shown in FIGS. 9 and 8D (a) and (b), the first transparent conductive layer 52a is formed on the surface 32a on one side of the base film 32, and the other side of the base film 32 is formed. A second transparent conductive layer 52b is formed on the surface 32b (step S4). Here, the first transparent conductive layer 52a and the second transparent conductive layer 52b are layers that become the first transparent conductor 40 and the second transparent conductor 45 having translucency by performing patterning to be described later. As the 1st transparent conductive layer 52a and the 2nd transparent conductive layer 52b, the material which has translucency and electroconductivity is used, for example, ITO is used. The transparent conductive layers 52a and 52b made of ITO are formed on the base film 32 by sputtering, for example. Thereby, the laminated body 50 containing the base film 32 and the transparent conductive layers 52a and 52b is obtained.

  In addition, the form of the laminated body 50 is not particularly limited, and a sheet-like laminated body 50 may be prepared, or an elongated web-like laminated body 50, for example, a laminated body 50 wound around a roll. May be prepared.

Step of Patterning Laminate Next, with reference to FIGS. 8E to 8J, steps of manufacturing the touch panel sensor 30 by patterning the laminate 50 (steps S5 to S10 in FIG. 9) will be described.

  First, as shown in FIGS. 9 and 8E (a) and 8 (b), a light-dissolving type first photosensitive layer 56a is formed on a surface 50a on one side of the laminate 50, and the other of the laminate 50 is formed. A photodissolvable second photosensitive layer 56b is formed on the side surface 50b (step S5). The first photosensitive layer 56a and the second photosensitive layer 56b have photosensitivity to light in a specific wavelength range, for example, ultraviolet rays. The photosensitive layers 56a and 56b are formed, for example, by coating a photosensitive material on the surface of the laminate 50 using a coater.

  Next, as shown in FIGS. 9 and 8F (a) and (b), the first photosensitive layer 56a and the second photosensitive layer 56b are exposed (step S6). Specifically, first, as shown in FIGS. 8A and 8B, the first mask 58a is disposed on the first photosensitive layer 56a, and the second mask 58b is disposed on the second photosensitive layer 56b. . The first mask 58a is a pattern corresponding to the first alignment mark 81 to be formed, and a light shielding portion 59a for shielding exposure light in a pattern corresponding to the first sensor electrode 36a and the first extraction wiring 36b to be formed. A light shielding part 59b that shields the exposure light and an opening part 59c are included. The second mask 58b is a pattern corresponding to the second alignment mark 86 to be formed and a light shielding portion 60a for shielding exposure light in a pattern corresponding to the second sensor electrode 37a and the second extraction wiring 37b to be formed. And includes a light shielding part 60b for shielding exposure light and an opening part 60c.

  Next, as shown in FIG. 8F (b), in this state, exposure light is irradiated to the photosensitive layers 56a and 56b through the masks 58a and 58b. As a result, the first photosensitive layer 56a and the second photosensitive layer 56b are simultaneously exposed in different patterns. In this case, as exposure light, light in a short wavelength region having low transparency with respect to the base film 32, for example, far ultraviolet rays is used. For this reason, the light which is irradiated from one side of the laminated body 50 and exposes the first photosensitive layer 56a does not pass through the laminated body 50 and reach the second photosensitive layer 56b. Similarly, the light that is irradiated from the other side of the stacked body 50 and exposes the second photosensitive layer 56b does not pass through the stacked body 50 and reach the first photosensitive layer 56a. Thus, the first photosensitive layer 56a and the second photosensitive layer 56b can be simultaneously exposed with a desired pattern with high accuracy.

  Next, as shown in FIGS. 9 and 8G (a) and 8 (b), the exposed first and second photosensitive layers 56a and 56b are developed (step S7). Specifically, a developer corresponding to the first photosensitive layer 56a and the second photosensitive layer 56b is prepared, and the first photosensitive layer 56a and the second photosensitive layer 56b are developed using this developer. Thereby, as shown in FIGS. 8G (a) and 8 (b), portions of the first photosensitive layer 56a and the second photosensitive layer 56b irradiated with the exposure light are removed.

  Thereafter, as shown in FIGS. 9 and 8H (a) (b), the first transparent conductive layer 52a is etched using the patterned first photosensitive layer 56a as a mask, and the patterned second photosensitive layer 56b is masked. As a result, the second transparent conductive layer 52b is etched (step S8). As the etchant, for example, a solution containing ferric chloride is used. By such etching, as shown in FIG. 8H (b), the first sensor electrode 36a, the first extraction wiring 36b, and the first alignment mark to be formed on the surface 32a on one side of the base film 32. A first transparent conductive layer 52 a having a pattern corresponding to 81 is formed. Further, as shown in FIG. 8H (b), it corresponds to the second sensor electrode 37a, the second extraction wiring 37b and the second alignment mark 86 to be formed on the surface 32b on the other side of the base film 32. A second transparent conductive layer 52b having a pattern is formed.

  Next, as shown in FIGS. 9 and 8I (a) (b), the photosensitive layers 56a and 56b on the transparent conductive layers 52a and 52b are removed (step S9). As a result, as shown in FIGS. 8I (a) and 8 (b), sensor electrodes 36a and 37a made of transparent conductors 40 and 45 are formed in the region to be the active area Aa1. In addition, alignment marks 81 and 86 made of the same material as the transparent conductors 40 and 45 are formed in the region to be the alignment mark area Aa4.

  Here, as shown in FIGS. 8I (a) and 8 (b), in the region where the alignment marks 81 and 86 are formed, index matching comprising high refractive index layers 72 and 77 and low refractive index layers 73 and 78 is performed. Layers 70 and 75 are not provided. For this reason, the alignment marks 81 and 86 can be visually recognized from the outside.

  Thereafter, as shown in FIG. 9 and FIG. 8J (a) (b), a first end electrically connected to the first transmissive conductor 40 on the surface 32a on one side of the base film 32. The extraction conductor 43 and the first extraction terminal portion 44 electrically connected to the other end of the first extraction conductor 43 are formed by a screen printing method. Similarly, on the surface 32 b on the other side of the base film 32, a second extraction conductor 48 whose one end is electrically connected to the second transmissive conductor 45 and the other end of the second extraction conductor 48. And a second extraction terminal portion 49 that is electrically connected to the first and second terminals 49 by screen printing. The step of forming the extraction conductors 43 and 48 and the extraction terminal portions 44 and 49 may be performed in the same factory as the factory where the production line for patterning the transparent conductive layers 52a and 52b is provided. It may be implemented in other factories.

  The specific method of the screen printing method is not particularly limited, and a well-known screen printing method is used. For example, first, using a screen plate (not shown) in which a screen plate opening is formed in a pattern corresponding to the extraction conductors 43 and 48 and the extraction terminal portions 44 and 49, aluminum, molybdenum, silver, chromium, copper Alternatively, a conductive paste containing a metal material such as an alloy thereof is applied on the surfaces 32 a and 32 b of the base film 32. Next, baking is performed at a temperature of 150 ° C. or less, for example, 120 ° C. for 1 hour. In this way, extraction conductors 43 and 48 and extraction terminal portions 44 and 49 are formed. As a result, the transparent extraction conductors 42 and 47 made of a transparent conductive layer, and the extraction wirings 36b including the extraction conductors 43 and 48 and the extraction terminal portions 44 and 49 formed on the transparent extraction conductors 42 and 47, 37b is obtained. The alignment marks 81 and 86 described above may be used when positioning between the screen plate and the substrate film 32 is performed.

  In this manner, as shown in FIGS. 8J (a) and 8 (b), the touch panel sensor 30 including the sensor electrodes 36a and 37a, the extraction wirings 36b and 37b, and the alignment marks 81 and 86 is manufactured.

Method for Manufacturing Input / Output Device Next, the input / output device 10 is manufactured using the touch panel sensor 30 obtained as described above. First, the touch panel sensor 30 is bonded to the display device 15 via the adhesive layer 19. In this case, alignment of the touch panel sensor 30 with respect to the display device 15 is performed based on the alignment marks 81 and 86 of the touch panel sensor 30. Thereafter, the protective cover 12 and the detection control board of the detection control unit 25 are combined with the touch panel sensor 30, whereby the input / output device 10 is obtained. Also in this case, the alignment marks 81 and 86 of the touch panel sensor 30 can be used for alignment. In addition, after joining of the touch panel sensor 30 and the display apparatus 15 etc. is completed, alignment mark area Aa4 in which the alignment marks 81 and 86 are formed may be removed.

  Hereinafter, the operational effects according to the present embodiment will be described.

  According to the present embodiment, the index matching layers 70 and 75 are provided between the film body 33 and the transparent conductors 40 and 45. Therefore, the reflectance and transmittance of light in the area where the transparent conductors 40 and 45 are provided in the active area Aa1 of the base film 32 and the light in the area where the transparent conductors 40 and 45 are not provided. The difference between reflectance and transmittance can be reduced. Further, the index matching layers 70 and 75 can make the spectrum of the light transmitted through the region of the base film 32 provided with the transparent conductors 40 and 45 into a flat spectrum in each wavelength region. When the transmitted light is represented by L * a * b * display color, b * can be 1.5 or less. Thereby, it can prevent that the pattern of the transparent conductors 40 and 45 is visually recognized from the outside, and, thereby, the design property of the touch panel sensor 30 can be improved.

  According to the present embodiment, the alignment marks 81 and 86 patterned in the alignment mark area Aa4 of the non-active area Aa2 are the same material as the material of the transparent conductors 40 and 45 patterned in the active area Aa1. Are formed together with the transparent conductors 40 and 45. Further, the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 provided in the alignment mark area Aa4 of the non-active area Aa2 is different from the thickness of the index matching layers 70 and 75 in the active area Aa1. ing. Therefore, in the alignment mark area Aa4, the light transmittance or reflectance in the region where the alignment marks 81 and 86 are formed is different from the light transmittance or reflectance in the region around the alignment marks 81 and 86. Can be made. For this reason, the alignment marks 81 and 86 made of the same material as that of the transparent conductors 40 and 45 can be visually recognized from the outside. In this way, the alignment marks 81 and 86 used when the touch panel sensor 30 is combined with the display device 15 or the like can be formed at a low cost, and thereby the manufacturing cost of the touch panel sensor 30 can be reduced. .

According to the present embodiment, as described above, patterning for alignment marks 81 and 86 for alignment is performed using masks 58a and 58b simultaneously with patterning for sensor electrodes 36a and 37a. . Therefore, the relative positions of the alignment marks 81 and 86 with respect to the sensor electrodes 36a and 37a are more accurate than when the patterning for the sensor electrode and the patterning for the alignment mark are performed using different masks at different occasions. It can be set well.
The alignment marks 81 and 86 are used for alignment between the touch panel sensor 30 and the display device 15 as described above. In the alignment between the touch panel sensor 30 and the display device 15, the most important thing is to accurately align the positions of the sensor electrodes 36 a and 37 a of the touch panel sensor 30 with respect to the display device 15. Here, according to the present embodiment, as described above, the relative positions of the alignment marks 81 and 86 with respect to the sensor electrodes 36a and 37a are set with high accuracy. Therefore, by using such alignment marks 81 and 86, the positions of the sensor electrodes 36a and 37a of the touch panel sensor 30 can be accurately aligned with the display device 15.

  Further, according to the present embodiment, as described above, alignment marks 81 and 86 are formed by patterning transparent conductive layers 52a and 52b using a photolithography method. Therefore, the patterning for the alignment marks 81 and 86 is performed simultaneously with the patterning for the sensor electrodes 36a and 37a, as compared with the case where the alignment marks 81 and 86 are formed using a screen printing method or the like. In addition to the point, the alignment marks 81 and 86 can be formed more precisely by combining the point that the line width dimension accuracy and the position accuracy are superior by the photolithography method compared with the screen printing method.

  Next, some modifications to the above-described embodiment will be described.

  In the present embodiment, an example in which the index matching layers 70 and 75 are not provided in the alignment mark area Aa4 is shown. However, the present invention is not limited to this, and the thickness of the index matching layers 70 and 75 in the alignment mark area Aa4 may be different from the thickness of the index matching layers 70 and 75 in the active area Aa1.

  In the present embodiment, an example is shown in which none of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 constituting the index matching layers 70 and 75 are provided in the alignment mark area Aa4. . However, the present invention is not limited to this, and it is sufficient that either one of the high refractive index layers 72 and 77 or the low refractive index layers 73 and 78 is not provided in the alignment mark area Aa4. Alternatively, the thickness of either the high refractive index layers 72 and 77 or the low refractive index layers 73 and 78 in the alignment mark area Aa4 is equal to the thickness of the high refractive index layers 72 and 77 or the low refractive index layers 73 and 78 in the active area Aa1. It may be different from the thickness.

  In the present embodiment, an example in which the index matching layers 70 and 75 are configured by the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 is shown. However, the configuration of the index matching layers 70 and 75 is not limited to the above configuration as long as the effect of thin film interference can be appropriately generated. For example, the index matching layer may be configured by combining a larger number of high refractive index layers and low refractive index layers.

  In the present embodiment, the first alignment mark 81 is provided on the surface 32a on one side of the base film 32, and the second alignment mark 86 is provided on the surface 32b on the other side of the base film 32. An example is given. However, the present invention is not limited to this, and an alignment mark may be provided on at least one surface 32a of the base film 32.

  In the present embodiment, the first transparent conductor 40 is provided on one side surface 32 a of the base film 32, and the second transparent conductor 45 is provided on the other side surface 32 b of the base film 32. An example in which is provided is shown. However, the present invention is not limited to this, and it is sufficient that a transparent conductor is provided on at least one surface 32 a of the base film 32. In this case, the first sensor electrode extending in the x direction and the second sensor electrode extending in the y direction are configured by the transparent conductor provided on the surface 32a on one side of the base film 32.

  In the present embodiment, the first index matching layer 70 is provided on the surface 33a on one side of the film body 33, and the second index matching layer 75 is provided on the surface 33b on the other side of the film body 33. An example is given. However, the present invention is not limited to this, and an index matching layer may be provided on the surface 33a on at least one side of the film body 33. In this case, the pattern matching of the transparent conductors 40 and 45 is made invisible by the index matching layer provided on the surface 33a on one side of the film body 33.

  Moreover, in this Embodiment, the example in which the one side of the base film 32 is an observer side was shown. However, the present invention is not limited to this, and one side of the base film 32 may be the display substrate side.

  In the present embodiment, the example in which the extraction conductors 43 and 48 and the extraction terminal portions 44 and 49 are formed by screen printing is shown. However, the present invention is not limited to this. For example, by providing a metal conductive layer made of a metal on the transparent conductive layers 52a and 52b and patterning the metal conductive layer by a photolithography method or the like, the extraction conductors 43 and 48 are provided. The extraction terminal portions 44 and 49 may be formed. In this case, the laminated body 50 described above may include a metal conductive layer in advance.

  Further, in the present embodiment, the extraction wiring is formed from the transparent extraction conductors 42 and 47 made of a transparent conductive layer, the extraction conductors 43 and 48 formed on the transparent extraction conductors 42 and 47 and the extraction terminal portions 44 and 49. An example in which 36b and 37b are configured is shown. However, the present invention is not limited to this, and the extraction wirings 36b and 37b may be configured by only the transparent extraction conductors 42 and 47. In this case, the transparent extraction conductors 42 and 47 are connected to the detection control board of the detection control unit 25 via connection parts (not shown), whereby signals from the transparent conductors 40 and 45 are detected by the detection control unit. 25.

  In the present embodiment, the example in which the first photosensitive layer 56a and the second photosensitive layer 56b are simultaneously exposed to light in a short wavelength region has been shown. However, the present invention is not limited to this, and the first photosensitive layer 56a and the second photosensitive layer 56b may be separately exposed. For example, the first photosensitive layer 56a is first formed, exposed and developed, and then the first transparent conductive layer 52a is etched using the first photosensitive layer 56a as a mask, and then the second photosensitive layer 56b is formed and exposed. Then, the second transparent conductive layer 52b may be etched using the second photosensitive layer 56b as a mask. In this case, the exposure light used is not limited to light in the short wavelength region, and light in a desired wavelength region can be used as the exposure light.

  In the present embodiment, the touch panel sensor 30 is divided into a rectangular active area Aa1 and a rectangular inactive area Aa2 surrounding the active area Aa1, and among these, the inactive area Aa2 defines the active area Aa1. An example is shown that includes a surrounding rectangular frame-shaped frame wiring area Aa3 and a rectangular frame-shaped alignment mark area Aa4 surrounding the frame wiring area Aa3. However, the present invention is not limited to this, and as shown in FIG. 10, a plurality of touch panel sensors 30 each having a rectangular active area Aa1 and a rectangular inactive area Aa2 surrounding the active area Aa1 are provided. The sheet 90 may be allocated. In this case, as shown in FIG. 10, the outer peripheral area of the sheet 90 and the area between the touch panel sensors 30 are alignment mark areas Aa4 in which a large number of alignment marks 81 are formed. As in the case of the above-described form, also in the form shown in FIG. 10, the thickness of the index matching layer in the region corresponding to the alignment mark 81 provided in the alignment mark area Aa4 is the thickness of the index matching layer in the active area Aa1. The base film of the sheet 90 is configured differently. Accordingly, even when the alignment mark 81 is formed from the same material as that of the transparent conductor, the alignment mark 81 can be visually recognized from the outside.

  In the present embodiment, an example is shown in which alignment marks 81 and 86 for alignment are formed on the surface of the base film 32 and in the inactive area Aa2. However, the present invention is not limited to this, and various identification marks for identifying the touch panel sensor 30 such as a product name, a lot number, and a name of a manufacturing tool (such as a mask) used in the manufacturing process are provided on the surface of the base film 32. It can be formed in the inactive area Aa2. Also in this case, as in the case of the alignment marks 81 and 86, the identification mark is formed together with the transparent conductors 40 and 45 using the same material as that of the transparent conductors 40 and 45. Further, the index matching layers 70 and 75 are formed so that the thickness of the index matching layers 70 and 75 in the region corresponding to the identification mark is different from the thickness of the index matching layers 70 and 75 in the active area Aa1. Accordingly, various identification marks that can be read by the above-described reading unit can be formed on the surface of the base film 32 at a low cost.

  In the present embodiment, the frame wiring area Aa3 where the extraction conductor and the extraction terminal portion are provided and the alignment mark area Aa4 where the alignment mark is provided are shown separately (see FIG. 3). It is not limited to. For example, the extraction conductor and the extraction terminal portion and the alignment mark may be provided closer to each other. Specifically, an alignment mark and other identification marks may be provided in the frame wiring area Aa3 shown in FIG. 3 in addition to the extraction conductor and the extraction terminal portion. In this case, the alignment mark area Aa4 shown in FIG.

  In the present embodiment, the touch panel sensor 30 has a film-like base film 32 and the base film 32 has a transparent film body 33. However, the present invention is not limited to this, and the touch panel sensor 30 can be formed from various base materials such as a sheet-like glass base material as well as a film-like base material film. Note that the configuration of the above-described index matching layers 70 and 75 is appropriately set according to the refractive index of the base material constituting the touch panel sensor 30.

  In addition, although the some modification with respect to embodiment mentioned above was demonstrated above, naturally, it is also possible to apply combining several modifications suitably.

  EXAMPLES Hereinafter, although this invention is demonstrated in detail using an Example and a comparative example, this invention is not limited to this Example.

Comparative Example 1
The touch panel sensor according to the embodiment of the present invention, except that the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 is the same as the thickness of the index matching layers 70 and 75 in the active area Aa1. A touch panel sensor identical to 30 was prepared. Next, based on the thickness and the optical refractive index of each layer of the touch panel sensor, the light reflectance value in the region where the transparent conductive layers 52a and 52b are provided and the transparent conductive layers 52a and 52b are provided by simulation. The difference from the reflectance value of the light in the unexposed area was obtained. Details will be described below.
In the active area Aa1, the “region where the transparent conductive layers 52a and 52b are provided” corresponds to the “region where the transparent conductors 40 and 45 are provided”, and the “transparent conductive layers 52a and 52b are provided. The “region not provided” corresponds to the “region where the transparent conductors 40 and 45 are not provided”.
In the alignment mark area Aa4, the “region where the transparent conductive layers 52a and 52b are provided” corresponds to the “region where the alignment marks 81 and 86 are provided”, and the “transparent conductive layers 52a and 52b are provided. The “region not provided” corresponds to the “region where the alignment marks 81 and 86 are not provided”.

(Thickness and refractive index)
First, the film body 33, undercoat layers 71 and 76 made of thermosetting acrylic resin, high refractive index layers 72 and 77 made of niobium pentoxide (Nb ₂ O ₅ ), and low refraction made of silicon dioxide (SiO ₂ ). The refractive index and thickness of the index layers 73 and 78 were measured. Further, the optical refractive index (real part n and absorption term k) and thickness of the transparent conductive layers 52a and 52b made of ITO were measured. The results are shown in Table 2. The light refractive index was measured while changing the light wavelength in 5 nm increments within the light wavelength range of 380 nm to 780 nm. In the simulation described later, the light refractive index (real part n and absorption term k) of the atmosphere was treated as n = 1 and k = 0.

  As shown in Table 2, in the layer having a high optical refractive index, that is, the high refractive index layers 72 and 77 and the transparent conductive layers 52a and 52b, the optical refractive index greatly changed depending on the light wavelength. FIG. 12 shows the result of plotting the optical refractive index (real part n) of the high refractive index layers 72 and 77 and the transparent conductive layers 52a and 52b against the optical wavelength. As shown in FIG. 12, when the light wavelength is changed from 400 nm to 550 nm, the light refractive index is reduced by 0.15 in the transparent conductive layers 52a and 52b, and the light refractive index is 0. 5 in the high refractive index layers 72 and 77. It was only 18 smaller. Further, when the light wavelength is changed from 550 nm to 780 nm, the light refractive index is decreased by 0.12 in the transparent conductive layers 52a and 52b, and the light refractive index is decreased by 0.07 in the high refractive index layers 72 and 77. . That is, the refractive index change of the high refractive index layers 72 and 77 is larger than the refractive index change of the transparent conductive layers 52a and 52b at 400 to 550 nm, and the transparent conductive layer is higher than the refractive index change of the high refractive index layers 72 and 77 at 550 to 780 nm. The refractive index change of 52a and 52b was large.

(Simulation conditions)
Next, simulation conditions will be described.
With respect to the region where the transparent conductive layers 52a and 52b are provided, assuming the following layer configuration, the reflectance of each layer existing between the interface between the film body and the undercoat layer and the interface between the transparent conductive layer and the atmosphere is determined. The required simulation was performed.
Film body (output side medium) / undercoat layer / high refractive index layer / low refractive index layer / transparent conductive layer / atmosphere (incident side medium)
In addition, as shown in Table 2, the thickness of the film main body 33 is very large compared with the thickness of other components. Therefore, in this comparative example and the comparative example or example to be described later, the thickness of the film body 33 is set to infinity and all simulations are performed. In all simulations, the incident angle of light was set to 0 degree (normal incidence).

With respect to the region where the transparent conductive layers 52a and 52b are not provided, the reflectance by each layer existing between the interface between the film main body and the undercoat layer and the interface between the low refractive index layer and the atmosphere is assumed assuming the following layer configuration. The simulation which asks for was performed.
Film body (output side medium) / undercoat layer / high refractive index layer / low refractive index layer / atmosphere (incident side medium)

  FIG. 13A shows light reflection spectra obtained by simulation in a region where the transparent conductive layers 52a and 52b are provided and a region where the transparent conductive layers 52a and 52b are not provided. As shown in FIG. 13A, periodic disturbance (hunting) of the reflection spectrum of light was observed in the light wavelength range of 380 nm to 780 nm. It is considered that the degree of such hunting mainly depends on the thickness of the undercoat layers 71 and 76.

  FIG. 13B shows the difference (reflectance difference) between the light reflection spectrum in the region where the transparent conductive layers 52a and 52b are not provided and the light reflection spectrum in the region where the transparent conductive layers 52a and 52b are provided. Here, reflectance difference = (reflectance in a region where the transparent conductive layers 52a and 52b are not provided) − (reflectance in a region where the transparent conductive layers 52a and 52b are provided) (an example to be described later) The same applies to the above). As shown in FIG. 13B, hunting was observed in the light wavelength range of 380 nm to 780 nm with respect to the difference in reflectance. As shown in FIG. 13B, this hunting was generated with a line having a reflectance difference of 0% (dotted line indicated by reference numeral 81 in FIG. 13B) as a substantially center line. The occurrence of hunting about the 0% line 81 in this way means that the reflectance difference is substantially close to zero. It was also confirmed that the shorter the wavelength, the larger the hunting amplitude.

  A region where the transparent conductive layers 52a and 52b are provided and a region where the transparent conductive layers 52a and 52b are not provided using the color matching function in the XYZ color system (see JIS Z8701) from the reflection spectrum obtained by simulation. For each, the Y value in the XYZ color system was determined (see JIS Z8701). At this time, the spectral distribution of standard light C was used as the spectral distribution of standard light used for color display. As a result, the Y value due to light reflection in the region where the transparent conductive layers 52a and 52b are provided is 5.37%, and the Y value due to light reflection in the region where the transparent conductive layers 52a and 52b are not provided. Was 5.42%. In this case, the Y value (= 5.37%) due to light reflection in the region where the transparent conductive layers 52a and 52b are provided is the Y value due to light reflection in the region where the transparent conductive layers 52a and 52b are not provided. The value divided by (= 5.42%) (hereinafter referred to as the reflectance ratio. The same applies to the examples described later) is 0.99. Thus, in this comparative example, the reflectance ratio is approximately 1. For this reason, it is considered that the patterns of the transparent conductive layers 52a and 52b are not visually recognized in both the active area Aa1 and the alignment mark area Aa4. In this case, in the active area Aa1, the pattern of the transparent conductive layers 52a and 52b (that is, the pattern of the transparent conductors 40 and 45) is not visually recognized by the user, thereby improving the design of the touch panel sensor. On the other hand, in the alignment mark area Aa4, the pattern of the transparent conductive layers 52a and 52b is not visually recognized from the outside, and therefore, the alignment marks 81 and 86 formed of the pattern of the transparent conductive layers 52a and 52b cannot be read.

  Thus, when the thickness of the index matching layers 70 and 75 in the alignment mark area Aa4 is the same as the thickness of the index matching layers 70 and 75 in the active area Aa1 as in this comparative example, the transparent conductive layers 52a, The feature of the present invention that the alignment mark is formed at low cost using 52b is not realized.

Comparative Example 2
A touch panel sensor that is the same as the touch panel sensor 30 according to the embodiment of the present invention is prepared except that the undercoat layers 71 and 76, the high refractive index layers 72 and 77, and the low refractive index layers 73 and 78 are not provided. did. Next, based on the thickness and the optical refractive index of each layer of the touch panel sensor, the light reflectance value in the region where the transparent conductive layers 52a and 52b are provided and the transparent conductive layers 52a and 52b are provided by simulation. The difference from the reflectance value of the light in the unexposed area was obtained.

(Simulation conditions)
With respect to the region where the transparent conductive layers 52a and 52b are provided, assuming the following layer configuration, the reflectance of each layer existing between the interface between the film body and the transparent conductive layer and between the transparent conductive layer and the interface between the atmosphere is set. The required simulation was performed.
Film body (emission side medium) / Transparent conductive layer / Atmosphere (incident side medium)

With respect to the region where the transparent conductive layers 52a and 52b are not provided, a simulation was performed to obtain the reflectance at the interface between the film body and the atmosphere assuming the following layer configuration.
Film body (exit side medium) / Atmosphere (incident side medium)

  FIG. 14A shows a light reflection spectrum in a region where the transparent conductive layers 52a and 52b are provided and a region where the transparent conductive layers 52a and 52b are not provided, which are obtained by simulation. FIG. 14B shows the difference (reflectance difference) between the light reflection spectrum in the region where the transparent conductive layers 52a and 52b are not provided and the light reflection spectrum in the region where the transparent conductive layers 52a and 52b are provided. Show. As shown in FIG. 14B, it was confirmed that the absolute value of the difference in reflectance increases as the wavelength decreases.

  Similar to the case of Comparative Example 1, the regions where the transparent conductive layers 52a and 52b are provided and the transparent conductive layers 52a and 52b are provided using the color matching function in the XYZ color system from the reflection spectrum obtained by simulation. The Y value in the XYZ color system was determined for each area that was not used. As a result, the Y value due to light reflection in the region where the transparent conductive layers 52a and 52b are provided is 7.66%, and the Y value due to light reflection in the region where the transparent conductive layers 52a and 52b are not provided. Was 6.11%. In this case, the reflectance ratio is 1.25. Thus, in this comparative example, the reflectance ratio is greatly deviated from 1. For this reason, the pattern of the transparent conductive layers 52a and 52b, which has been made invisible by the action of the index matching layers 70 and 75 in the comparative example 1, is visualized by not providing the index matching layers 70 and 75 in this comparative example. Yes. In this case, in the alignment mark area Aa4, the pattern of the transparent conductive layers 52a and 52b is visually recognized from the outside. Therefore, the alignment marks 81 and 86 formed of the pattern of the transparent conductive layers 52a and 52b can be read. Yes. On the other hand, in the active area Aa1, the pattern of the transparent conductive layers 52a and 52b (that is, the pattern of the transparent conductors 40 and 45) is visually recognized by the user, which is not preferable from the viewpoint of the design of the touch panel sensor.

  Thus, when the undercoat layers 71 and 76, the high refractive index layers 72 and 77, and the low refractive index layers 73 and 78 are not provided as in this comparative example, the transparent conductors 40 and 45 of the active area Aa1 The feature of the present invention that improves the design of the touch panel sensor by making the pattern invisible is not realized.

(Summary of comparative examples)
In any of the above-described Comparative Examples 1 and 2, the transparent conductive layers 52a and 52b are used to form alignment marks at low cost, and the pattern of the transparent conductors 40 and 45 in the active area Aa1 is made invisible. The features of the invention could not be realized. Hereinafter, based on the technical idea of the present invention, the thickness of the index matching layers 70 and 75 in the alignment mark area Aa4 and the thickness of the index matching layers 70 and 75 in the active area Aa1 are made different from each other. An example of realizing the above will be described.

Specifically, in the first embodiment, by changing the thicknesses of the high refractive index layers 72 and 77 of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86, the alignment marks 81 that are visible from the outside. , 86 will be described.
In the second embodiment, the alignment marks 81 and 86 visible from the outside are realized by changing the thicknesses of the low refractive index layers 73 and 78 of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86. An example will be described.
Further, in the third embodiment, the thickness of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 are both changed to be visually recognized from the outside. An example in which possible alignment marks 81 and 86 are realized will be described.

Example 1
The thicknesses of the high refractive index layers 72 and 77 of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 are set to 0, 0.9, 1.9, 2.0, 2.9, 4.0, Except for setting to 4.8, 4.9, 5.0, or 6.0 nm, Y is determined by reflection of light in the region where the transparent conductive layers 52a and 52b are provided by simulation in the same manner as in Comparative Example 1. Value and Y value by light reflection in a region where the transparent conductive layers 52a and 52b are not provided. The results are shown in FIG. 15A. Moreover, the result of calculating the reflectance ratio is shown in FIG. 15B.

  In FIG. 15A and FIG. 15B, the horizontal axis indicates the high refractive index layers 72 and 77 in the region corresponding to the alignment marks 81 and 86 with respect to the thickness (= 6 nm) of the high refractive index layers 72 and 77 in the active area Aa1. The thickness ratio (%) is used. Here, the above-described thicknesses of the high refractive index layers 72 and 77 in the regions corresponding to the alignment marks 81 and 86 are expressed as ratios to the thicknesses of the high refractive index layers 72 and 77 in the active area Aa1, respectively. , 31.7, 33.3, 48.3, 66.7, 80, 81.7, 83.3 and 100%.

As shown in FIG. 15B, the ratio of the thickness of the high refractive index layers 72 and 77 in the region corresponding to the alignment marks 81 and 86 to the thickness of the high refractive index layers 72 and 77 in the active area Aa1 is 48.3% or less. In this case, the reflectance ratio was 1.25 or more. Further, when the ratio of the thickness of the high refractive index layers 72 and 77 in the region corresponding to the alignment marks 81 and 86 to the thickness of the high refractive index layers 72 and 77 in the active area Aa1 is 15% or less, the reflectance The ratio was 1.51 or more. Accordingly, in the touch panel sensor 30 according to the present invention, preferably, the ratio of the thickness of the high refractive index layers 72 and 77 in the region corresponding to the alignment marks 81 and 86 to the thickness of the high refractive index layers 72 and 77 in the active area Aa1. It is 48.3% or less, more preferably 15% or less. Thereby, the alignment marks 81 and 86 made of the transparent conductive layers 52a and 52b can be made visible from the outside.
As described above, the index matching layers 70 and 75 are not provided in the comparative example 2, and thus the pattern of the transparent conductive layers 52a and 52b is visualized. The reflectance ratio in Comparative Example 2 was 1.25. Therefore, in this embodiment, the reflectance ratio of 1.25 or more is adopted as a standard for visualizing the patterns of the transparent conductive layers 52a and 52b. This standard is also adopted in Examples 2 and 3 described later.
A reflectance ratio of 1.51 or more means an increase of 0.51 with respect to the reflectance ratio of 1. On the other hand, the reflectance ratio (= 1.25), which is the standard for invisibility, means an increase of 0.25 with respect to the reflectance ratio 1. That is, from the viewpoint of an increase rate with respect to the reflectivity ratio 1, that the reflectivity ratio is 1.51 or more indicates that the reflectivity increase rate is higher than that in the case of the invisibility standard (reflectance ratio = 1.25). Has more than doubled.

Example 2
The thickness of the low refractive index layers 73 and 78 of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 is set to 0, 16, 17, 18, 20, 27, 33, 40, 42, 48, 50 or Except for setting to 60 nm, the Y value by reflection of light in the region where the transparent conductive layers 52a and 52b are provided and the transparent conductive layers 52a and 52b are not provided by simulation in the same manner as in Comparative Example 1. The Y value due to light reflection in the region was determined. The results are shown in FIG. 16A. Moreover, the result of calculating the reflectance ratio is shown in FIG. 16B.

  In FIGS. 16A and 16B, the horizontal axis indicates the low refractive index layers 73 and 78 in the region corresponding to the alignment marks 81 and 86 with respect to the thickness (= 60 nm) of the low refractive index layers 73 and 78 in the active area Aa1. The thickness ratio (%) is used. Here, when the thicknesses of the low refractive index layers 73 and 78 in the regions corresponding to the alignment marks 81 and 86 are expressed as ratios to the thicknesses of the low refractive index layers 73 and 78 in the active area Aa1, they are 0 and 26, respectively. 7, 28.3, 30, 33.3, 45, 55, 66.7, 70, 80, 83.3 and 100%.

  As shown in FIG. 16B, the ratio of the thickness of the low refractive index layers 73 and 78 in the region corresponding to the alignment marks 81 and 86 to the thickness of the low refractive index layers 73 and 78 in the active area Aa1 is 55% or less. When it is, the reflectance ratio was 1.25 or more. Further, when the ratio of the thickness of the low refractive index layers 73 and 78 in the region corresponding to the alignment marks 81 and 86 to the thickness of the low refractive index layers 73 and 78 in the active area Aa1 is 30% or less, the reflectance The ratio was 1.51 or more. Therefore, in the touch panel sensor 30 according to the present invention, preferably, the ratio of the thickness of the low refractive index layers 73 and 78 in the region corresponding to the alignment marks 81 and 86 to the thickness of the low refractive index layers 73 and 78 in the active area Aa1. It is 55% or less, more preferably 30% or less. Thereby, the alignment marks 81 and 86 made of the transparent conductive layers 52a and 52b can be made visible from the outside.

Example 3
The ratio of the thickness of the index matching layers 70, 75 in the region corresponding to the alignment marks 81, 86 to the thickness of the index matching layers 70, 75 in the active area Aa1 is 0, 16.7, 33.3, 50, 63. Except for setting it as 3, 66.7, 83.3 or 100%, the Y value by reflection of light in the region where the transparent conductive layers 52a and 52b are provided by simulation in the same manner as in Comparative Example 1, The Y value by light reflection in the region where the transparent conductive layers 52a and 52b are not provided was obtained. The results are shown in FIG. 17A. Moreover, the result of calculating the reflectance ratio is shown in FIG. 17B.

  In the present embodiment, more specifically, the thicknesses of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 constituting the index matching layers 70 and 75 are set to (the thickness of the high refractive index layer, the low refractive index). Rate layer thickness) = (0 nm, 0 nm), (1 nm, 10 nm), (2 nm, 20 nm), (3 nm, 30 nm), (3.8 nm, 38 nm), (4 nm, 40 nm), (5 nm, 50 nm) or (6 nm, 60 nm). Thereby, the ratio of the above-described thickness to the high refractive index layers 72 and 77 (thickness 6 nm) and the low refractive index layers 73 and 78 (thickness 60 nm) constituting the index matching layers 70 and 75 in the active area Aa1 is realized.

  As shown in FIG. 17B, the ratio of the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 to the thickness of the index matching layers 70 and 75 in the active area Aa1 is 66.7% or less. When it is, the reflectance ratio was 1.25 or more. When the ratio of the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 to the thickness of the index matching layers 70 and 75 in the active area Aa1 is 33.3% or less, the reflectance The ratio was 1.51 or more. Therefore, in the touch panel sensor 30 according to the present invention, preferably, the ratio of the thickness of the index matching layers 70 and 75 in the region corresponding to the alignment marks 81 and 86 to the thickness of the index matching layers 70 and 75 in the active area Aa1 is 66. It is 7% or less, more preferably 33.3% or less. Thereby, the alignment marks 81 and 86 made of the transparent conductive layers 52a and 52b can be made visible from the outside.

  In the first to third embodiments, the example in which the alignment marks 81 and 86 visible from the outside are realized by setting the reflectance ratio in the region corresponding to the alignment marks 81 and 86 to a predetermined value or more is shown. That is, the Y value by reflection in the region where the transparent conductive layers 52a and 52b are provided and the Y value by reflection in the region where the transparent conductive layers 52a and 52b are not provided are intentionally different from the outside. An example in which alignment marks 81 and 86 that can be visually recognized are realized is shown. However, the present invention is not limited to this, and the Y value due to transmission in the region where the transparent conductive layers 52a and 52b are provided and the Y value due to transmission in the region where the transparent conductive layers 52a and 52b are not provided are intentional. The alignment marks 81 and 86 that can be visually recognized from the outside may be realized.

In Examples 1 to 3, the index matching layers 70 and 75 including the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 are used as the index matching layers. However, the configuration of the index matching layer is not limited to the above-described configuration, and various layer configurations can be appropriately selected. For example, the index matching layers 70 and 75 may be composed of only the low refractive index layers 73 and 78 made of silicon dioxide (SiO ₂ ). Even in this case, by appropriately adjusting the thicknesses of the low refractive index layers 73 and 78, the reflectance ratio in the active area Aa1 is made substantially 1, and the reflectance in the region corresponding to the alignment marks 81 and 86 is set. The ratio can be shifted from 1.

DESCRIPTION OF SYMBOLS 10 Input / output device 15 Display device 20 Touch panel device 30 Touch panel sensor 32 Base film 32a surface (surface on one side)
32b surface (surface on the other side)
33 Film body 36a First sensor electrode 36b First extraction wire 37a Second sensor electrode 37b Second extraction wire 40 First transparent conductor 41a Line portion 41b Swelling portion 42 First transparent extraction conductor 43 First extraction conductor 44 First extraction terminal portion 45 Second transparent conductor 46a Line portion 46b Swelling portion 47 Second transparent extraction conductor 48 Second extraction conductor 49 Second extraction terminal portion 50 Laminated body (blanks)
52a First transparent conductive layer 52b Second transparent conductive layer 56a First photosensitive layer 56b Second photosensitive layer 58a First mask 58b Second mask 59a Light shielding portion of the first mask (corresponding to the first sensor electrode and the first extraction wiring)
59b Light shielding portion of first mask (corresponding to first alignment mark)
59c First mask opening 60a Second mask shading portion (corresponding to second sensor electrode and second extraction wiring)
60b Light shielding portion of second mask (corresponding to second alignment mark)
60c Second mask opening 70 First index matching layer 71 First undercoat layer 71a surface (surface on one side)
72 surface of first high refractive index layer 72a (surface on one side)
73 first low refractive index layer 75 second index matching layer 76 second undercoat layer 76b surface (surface on the other side)
77 second high refractive index layer 77b surface (surface on the other side)
78 Second Low Refractive Index Layer 80 Intermediate Stack 81 First Alignment Mark 82 First Shielding Plate 86 Second Alignment Mark 87 Second Shielding Plate 90 Sheet 95 High Refractive Index Layer Target Material 96 Roll

Claims (12)

In a touch panel sensor including an active area corresponding to a region where a touch position can be detected, and an inactive area located at the periphery of the active area,
A substrate;
A first transparent conductor patterned on an active area on one side of the substrate;
An identification mark on one side of the substrate and patterned in a non-active area,
The identification mark is formed together with the first transparent conductor using the same material as that of the first transparent conductor,
The base material has a transparent main body part, and a first index matching layer formed on the surface of the transparent main body part on the first transparent conductor side,
The touch panel sensor, wherein a thickness of the first index matching layer in a region corresponding to the identification mark provided in the inactive area is different from a thickness of the first index matching layer in the active area. The first index matching layer includes a first high refractive index layer provided on a surface of the main body portion on the first transparent conductor side, and a surface of the first high refractive index layer on the first transparent conductor side. A first low refractive index layer provided on
The optical refractive index of the first transparent conductor is smaller than the optical refractive index of the first high refractive index layer and larger than the optical refractive index of the first low refractive index layer. Touch panel sensor according to. Ratio of the thickness of the first high refractive index layer and the first low refractive index layer in the region corresponding to the identification mark to the thickness of the first high refractive index layer and the first low refractive index layer in the active area Is 66.7% or less, The touch panel sensor according to claim 2 characterized by things. The ratio of the thickness of the first high refractive index layer in the region corresponding to the identification mark to the thickness of the first high refractive index layer in the active area is 48.3% or less. The touch panel sensor according to claim 2. The ratio of the thickness of the first low refractive index layer in the region corresponding to the identification mark to the thickness of the first low refractive index layer in the active area is 55% or less. 2. The touch panel sensor according to 2. The first transparent conductor has a thickness in the range of 16-22 nm and a photorefractive index in the range of 1.8-2.0;
In the inactive area, the first high refractive index layer of the first index matching layer has a thickness in the range of 3 to 7 nm and a light refractive index in the range of 2.1 to 2.4, The first low-refractive index layer of the first index matching layer has a thickness in the range of 50 to 80 nm and a light refractive index in the range of 1.4 to 1.55. The touch panel sensor according to any one of 2 to 5. The touch panel sensor according to claim 1, further comprising a second transparent conductor that is patterned on the other side of the base material and in an active area. The touch panel sensor according to claim 7, wherein the base material further includes a second index matching layer formed on a surface of the transparent main body portion on the second transparent conductor side. A method for manufacturing the touch panel sensor according to claim 1,
Preparing a transparent body, and
Forming a first index matching layer on a surface of one side of the transparent main body,
Forming a first transparent conductive layer on the first index matching layer;
Patterning the first transparent conductive layer to form a first transparent conductor located in the active area and forming an identification mark located in the inactive area,
In the step of forming the first index matching layer, the first index matching layer is formed such that a thickness of the first index matching layer in a region corresponding to the identification mark is different from a thickness of the first index matching layer in the active area. A method for manufacturing a touch panel sensor, wherein: The first index matching layer includes a first high refractive index layer provided on a surface of the main body portion on the first transparent conductor side, and a surface of the first high refractive index layer on the first transparent conductor side. A first low refractive index layer provided on
The optical refractive index of the first transparent conductor is smaller than the optical refractive index of the first high refractive index layer and larger than the optical refractive index of the first low refractive index layer. The manufacturing method of the touch-panel sensor as described in any one of. The first high refractive index layer and the first low refractive index layer are each formed by sputtering,
In at least one of the step of forming the first high refractive index layer by sputtering or the step of forming the first low refractive index layer by sputtering, a shielding plate is disposed on a region corresponding to the identification mark in the main body portion. The touch panel sensor manufacturing method according to claim 10, wherein the touch panel sensor is manufactured. Preparing a display device;
Bonding the touch panel sensor according to claim 1 to the display device,
The identification mark comprises an alignment mark,
In the step of bonding the touch panel sensor to the display device, the touch panel sensor is aligned with the display device based on the alignment mark of the touch panel sensor.

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