JP5588396B2 - 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法 - Google Patents
高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法 Download PDFInfo
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- JP5588396B2 JP5588396B2 JP2011111662A JP2011111662A JP5588396B2 JP 5588396 B2 JP5588396 B2 JP 5588396B2 JP 2011111662 A JP2011111662 A JP 2011111662A JP 2011111662 A JP2011111662 A JP 2011111662A JP 5588396 B2 JP5588396 B2 JP 5588396B2
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- GJSGYPDDPQRWPK-UHFFFAOYSA-N tetrapentylammonium Chemical compound CCCCC[N+](CCCCC)(CCCCC)CCCCC GJSGYPDDPQRWPK-UHFFFAOYSA-N 0.000 description 1
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- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ZZJNLOGMYQURDL-UHFFFAOYSA-M trifluoromethanesulfonate;tris(4-methylphenyl)sulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C)=CC=C1[S+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZZJNLOGMYQURDL-UHFFFAOYSA-M 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
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| JP2014156530A (ja) * | 2013-02-15 | 2014-08-28 | Dic Corp | フッ素系界面活性剤及びポジ型レジスト組成物。 |
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| WO2005111097A1 (ja) * | 2004-05-18 | 2005-11-24 | Idemitsu Kosan Co., Ltd. | アダマンタン誘導体、その製造方法及びフォトレジスト用感光材料 |
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| JP5461472B2 (ja) | 2014-04-02 |
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| JP2011225885A (ja) | 2011-11-10 |
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