JP5582657B2 - 汚染物質除去用プラズマ反応器 - Google Patents
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
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Description
10 工程チャンバ
11 連結管
20 真空ポンプ
30 誘電体
31 第1誘電体
32 第2誘電体
41 第1接地電極
42 第2接地電極
43 第3接地電極
44 第4接地電極
45 第5接地電極
411 均一直径部
412 可変直径部
431 第1可変直径部
432 第2可変直径部
50 駆動電極
51 第1駆動電極
52 第2駆動電極
53 第3駆動電極
54 第4駆動電極
60 交流電源部
71 第1接地電極
72 第2接地電極
821 大径部
822 小径部
L1 第1距離
L2 第2距離
Claims (22)
- 工程チャンバおよび真空ポンプの間に位置し、低圧プラズマを生成して前記工程チャンバから排出される汚染物質を除去する汚染物質除去用プラズマ反応器であって、
内部にプラズマ生成空間を形成する少なくとも1つの誘電体と、
前記誘電体の少なくとも一端に連結する接地電極と、
前記誘電体の外周面に固定され、交流電源部と連結して交流駆動電圧が印加される少なくとも1つの駆動電極と、を含み、
前記プラズマ反応器の長さ方向に対して垂直な平面で切断した断面における直径を、前記誘電体及び接地電極のそれぞれの直径としたとき、
前記接地電極は、前記プラズマ反応器の長さ方向に沿って非均一直径を有する汚染物質除去用プラズマ反応器。 - 前記誘電体は、前記プラズマ反応器の中央に1つが配置され、
前記接地電極は、前記工程チャンバに向かう前記誘電体の前端に連結する第1接地電極、および、前記真空ポンプに向かう前記誘電体の後端に連結する第2接地電極を含む請求項1に記載の汚染物質除去用プラズマ反応器。 - 前記第1接地電極は、前記工程チャンバおよび前記誘電体を連結する連結管で構成され、
前記第2接地電極は、前記誘電体および前記真空ポンプを連結する連結管で構成される請求項2に記載の汚染物質除去用プラズマ反応器。 - 前記第1接地電極は、
前記誘電体よりも小さい直径を有する均一直径部、および、前記汚染物質の流れ方向に沿って直径が漸進的に拡大し、前記誘電体の前端に固定される可変直径部を含む請求項2に記載の汚染物質除去用プラズマ反応器。 - 前記第2接地電極は、
前記誘電体の後端に固定され、前記汚染物質の流れ方向に沿って直径が漸進的に縮小する可変直径部、および、
前記誘電体よりも小さい直径を有する均一直径部を含む請求項2に記載の汚染物質除去用プラズマ反応器。 - 前記第1接地電極は、前記誘電体の前端に固定され、前記誘電体と同じ直径で形成され、
前記第2接地電極は、前記誘電体の後端に固定され、前記汚染物質の流れ方向に沿って直径が漸進的に縮小する可変直径部、および、
前記可変直径部に連結し、前記誘電体よりも小さい直径を有する均一直径部を含む請求項2に記載の汚染物質除去用プラズマ反応器。 - 前記第1接地電極は、前記誘電体の前端に固定され、前記誘電体と同じ直径で形成され、
前記第2接地電極は、前記誘電体の後端に固定され、前記誘電体と同じ直径で形成される大径部、および、
前記大径部に連結し、前記大径部よりも小さい直径を有する小径部を含む請求項2に記載の汚染物質除去用プラズマ反応器。 - 前記駆動電極および前記第1接地電極の間の第1距離は、
前記駆動電極および前記第2接地電極の間の第2距離よりも大きく設定される請求項2〜7のいずれか一項に記載の汚染物質除去用プラズマ反応器。 - 前記駆動電極は、前記誘電体の外周面に1つがリング形状または円筒形状に配置され、
前記駆動電極は、前記プラズマ反応器の長さ方向に沿って前記第1接地電極および前記第2接地電極と距離をおいて位置する請求項2〜8のうちのいずれか一項に記載の汚染物質除去用プラズマ反応器。 - 前記駆動電極は、前記誘電体の外周面にリング形状または円筒形状に配置され、互いに距離をおいて位置する第1駆動電極および第2駆動電極を含み、
前記第1駆動電極と前記第2駆動電極はそれぞれ、前記プラズマ反応器の長さ方向に沿って前記第1接地電極および前記第2接地電極と距離をおいて位置する請求項2〜8のうちのいずれか一項に記載の汚染物質除去用プラズマ反応器。 - 前記第1駆動電極および前記第2駆動電極は、大きさが同じであって極性が反対である両極性パルス電圧が印加される請求項10に記載の汚染物質除去用プラズマ反応器。
- 前記誘電体は、互いに距離をおいて位置する第1誘電体および第2誘電体を含み、
前記接地電極は、前記第1誘電体および前記第2誘電体の間に位置する非均一直径の第3接地電極を含む請求項1に記載の汚染物質除去用プラズマ反応器。 - 前記第1誘電体および前記第2誘電体は、同じ長さおよび同じ直径を有するように形成される請求項12に記載の汚染物質除去用プラズマ反応器。
- 前記第3接地電極は、
前記第1誘電体の後端に固定され、前記汚染物質の流れ方向に沿って直径が漸進的に減少する第1可変直径部、および、
前記汚染物質の流れ方向に沿って直径が漸進的に拡大し、前記第2誘電体の前端に固定される第2可変直径部を含む請求項13に記載の汚染物質除去用プラズマ反応器。 - 前記第1可変直径部および前記第2可変直径部は、一定の比率で直径が変わったり、階段形状の段差を有したりするように形成される請求項14に記載の汚染物質除去用プラズマ反応器。
- 前記接地電極は、
前記第1誘電体の前端に位置して前記工程チャンバと前記第1誘電体を連結する第4接地電極、および、
前記第2誘電体の後端に位置して前記第2誘電体と前記真空ポンプを連結する第5接地電極をさらに含む請求項13に記載の汚染物質除去用プラズマ反応器。 - 前記第4接地電極および前記第5接地電極は一定の直径を有する請求項16に記載の汚染物質除去用プラズマ反応器。
- 前記第4接地電極は、
前記第1誘電体よりも小さい直径を有する均一直径部、および、
前記汚染物質の流れ方向に沿って直径が漸進的に拡大し、前記第1誘電体の前端に固定される可変直径部を含む請求項16に記載の汚染物質除去用プラズマ反応器。 - 前記第5接地電極は、
前記第2誘電体の後端に固定され、前記汚染物質の流れ方向に沿って直径が漸進的に縮小する可変直径部、および、
前記第2誘電体よりも小さい直径を有する均一直径部を含む請求項16に記載の汚染物質除去用プラズマ反応器。 - 前記駆動電極は、
前記第1誘電体の外周面にリング形状または円筒形状に配置される第3駆動電極、および、
前記第2誘電体の外周面にリング形状または円筒形状に配置される第4駆動電極を含む請求項12〜19のうちのいずれか一項に記載の汚染物質除去用プラズマ反応器。 - 前記第3駆動電極および前記第4駆動電極は、大きさと極性が同じである両極性パルス電圧が印加される請求項20に記載の汚染物質除去用プラズマ反応器。
- 前記第3駆動電極および前記第4駆動電極は、大きさが同じであって極性が反対である両極性パルス電圧が印加される請求項20に記載の汚染物質除去用プラズマ反応器。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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KR10-2011-0103085 | 2011-10-10 | ||
KR1020110103085A KR101278682B1 (ko) | 2011-10-10 | 2011-10-10 | 비균일 직경을 가지는 오염 물질 제거용 플라즈마 반응기 |
KR1020120030687A KR101299709B1 (ko) | 2012-03-26 | 2012-03-26 | 오염 물질 제거용 플라즈마 반응기 |
KR10-2012-0030687 | 2012-03-26 |
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JP2013084561A JP2013084561A (ja) | 2013-05-09 |
JP5582657B2 true JP5582657B2 (ja) | 2014-09-03 |
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JP2012147025A Active JP5582657B2 (ja) | 2011-10-10 | 2012-06-29 | 汚染物質除去用プラズマ反応器 |
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US (1) | US20130087287A1 (ja) |
EP (1) | EP2581925B1 (ja) |
JP (1) | JP5582657B2 (ja) |
CN (1) | CN103028357B (ja) |
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GB2526627A (en) | 2014-05-30 | 2015-12-02 | Novaerus Patents Ltd | A plasma coil electrostatic precipitator assembly for air disinfection and pollution control |
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US6955794B2 (en) * | 1999-12-15 | 2005-10-18 | Plasmasol Corporation | Slot discharge non-thermal plasma apparatus and process for promoting chemical reaction |
EP1162646A3 (en) * | 2000-06-06 | 2004-10-13 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and method |
KR100476136B1 (ko) * | 2002-12-02 | 2005-03-10 | 주식회사 셈테크놀러지 | 대기압 플라즈마를 이용한 표면처리장치 |
JP4413084B2 (ja) * | 2003-07-30 | 2010-02-10 | シャープ株式会社 | プラズマプロセス装置及びそのクリーニング方法 |
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2012
- 2012-06-27 US US13/534,446 patent/US20130087287A1/en not_active Abandoned
- 2012-06-29 EP EP12174383.5A patent/EP2581925B1/en active Active
- 2012-06-29 JP JP2012147025A patent/JP5582657B2/ja active Active
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EP2581925A2 (en) | 2013-04-17 |
CN103028357B (zh) | 2015-12-16 |
JP2013084561A (ja) | 2013-05-09 |
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CN103028357A (zh) | 2013-04-10 |
US20130087287A1 (en) | 2013-04-11 |
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