JP5576617B2 - 単結晶半導体層の結晶性評価方法 - Google Patents

単結晶半導体層の結晶性評価方法 Download PDF

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Publication number
JP5576617B2
JP5576617B2 JP2009062728A JP2009062728A JP5576617B2 JP 5576617 B2 JP5576617 B2 JP 5576617B2 JP 2009062728 A JP2009062728 A JP 2009062728A JP 2009062728 A JP2009062728 A JP 2009062728A JP 5576617 B2 JP5576617 B2 JP 5576617B2
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single crystal
semiconductor layer
crystal semiconductor
layer
laser
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JP2009260298A5 (enExample
JP2009260298A (ja
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明久 下村
将樹 古山
基 中島
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
  • Recrystallisation Techniques (AREA)
JP2009062728A 2008-03-17 2009-03-16 単結晶半導体層の結晶性評価方法 Expired - Fee Related JP5576617B2 (ja)

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JP2009062728A JP5576617B2 (ja) 2008-03-17 2009-03-16 単結晶半導体層の結晶性評価方法

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JP2008067295 2008-03-17
JP2008067295 2008-03-17
JP2009062728A JP5576617B2 (ja) 2008-03-17 2009-03-16 単結晶半導体層の結晶性評価方法

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JP2009260298A JP2009260298A (ja) 2009-11-05
JP2009260298A5 JP2009260298A5 (enExample) 2012-04-12
JP5576617B2 true JP5576617B2 (ja) 2014-08-20

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CN119534507B (zh) * 2024-11-05 2025-10-03 华中科技大学 钙钛矿单晶品质评价方法、程序产品,介质及电子设备

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07111955B2 (ja) * 1985-04-22 1995-11-29 工業技術院長 熔融結晶化膜の処理方法
JPH1055959A (ja) * 1996-08-09 1998-02-24 Toshiba Corp 薄膜製造方法およびその製造装置ならびに薄膜トランジスタ
JP4759919B2 (ja) * 2004-01-16 2011-08-31 セイコーエプソン株式会社 電気光学装置の製造方法
JP4737366B2 (ja) * 2004-02-25 2011-07-27 セイコーエプソン株式会社 半導体装置の製造方法

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