JP5571334B2 - レジスト組成物 - Google Patents

レジスト組成物 Download PDF

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Publication number
JP5571334B2
JP5571334B2 JP2009184075A JP2009184075A JP5571334B2 JP 5571334 B2 JP5571334 B2 JP 5571334B2 JP 2009184075 A JP2009184075 A JP 2009184075A JP 2009184075 A JP2009184075 A JP 2009184075A JP 5571334 B2 JP5571334 B2 JP 5571334B2
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group
formula
carbon atoms
acid
represented
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Japanese (ja)
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JP2011039128A5 (enExample
JP2011039128A (ja
Inventor
幸司 市川
昌子 杉原
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Priority to JP2009184075A priority Critical patent/JP5571334B2/ja
Publication of JP2011039128A publication Critical patent/JP2011039128A/ja
Publication of JP2011039128A5 publication Critical patent/JP2011039128A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2009184075A 2009-08-07 2009-08-07 レジスト組成物 Active JP5571334B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009184075A JP5571334B2 (ja) 2009-08-07 2009-08-07 レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009184075A JP5571334B2 (ja) 2009-08-07 2009-08-07 レジスト組成物

Publications (3)

Publication Number Publication Date
JP2011039128A JP2011039128A (ja) 2011-02-24
JP2011039128A5 JP2011039128A5 (enExample) 2012-08-09
JP5571334B2 true JP5571334B2 (ja) 2014-08-13

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ID=43766987

Family Applications (1)

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JP2009184075A Active JP5571334B2 (ja) 2009-08-07 2009-08-07 レジスト組成物

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JP (1) JP5571334B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5729312B2 (ja) * 2011-01-19 2015-06-03 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
TWI619733B (zh) 2012-09-15 2018-04-01 Rohm And Haas Electronic Materials Llc 包含多種酸產生劑化合物之光阻劑

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3393915B2 (ja) * 1994-03-04 2003-04-07 住友化学工業株式会社 化学増幅型レジスト組成物
JP4099656B2 (ja) * 2001-12-27 2008-06-11 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2005152736A (ja) * 2003-11-25 2005-06-16 Mitsui Chemicals Inc 配線基板の塗布方法
JP2005158907A (ja) * 2003-11-25 2005-06-16 Mitsui Chemicals Inc 配線板の製造方法
JP2007057651A (ja) * 2005-08-23 2007-03-08 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP4717612B2 (ja) * 2005-11-28 2011-07-06 東京応化工業株式会社 スプレー塗布用ホトレジスト組成物および積層体
JP2009098155A (ja) * 2006-02-08 2009-05-07 Mitsubishi Gas Chem Co Inc 感放射線性組成物
CN101687781B (zh) * 2007-02-15 2015-08-12 中央硝子株式会社 光产酸剂用化合物以及使用它的抗蚀剂组合物、图案形成方法
JP5012122B2 (ja) * 2007-03-22 2012-08-29 住友化学株式会社 化学増幅型レジスト組成物
JP5446118B2 (ja) * 2007-04-23 2014-03-19 三菱瓦斯化学株式会社 感放射線性組成物

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JP2011039128A (ja) 2011-02-24

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