JP5538642B2 - 成膜方法および発光素子の作製方法 - Google Patents

成膜方法および発光素子の作製方法 Download PDF

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Publication number
JP5538642B2
JP5538642B2 JP2009094005A JP2009094005A JP5538642B2 JP 5538642 B2 JP5538642 B2 JP 5538642B2 JP 2009094005 A JP2009094005 A JP 2009094005A JP 2009094005 A JP2009094005 A JP 2009094005A JP 5538642 B2 JP5538642 B2 JP 5538642B2
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Prior art keywords
substrate
layer
light
electrode
abbreviation
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Expired - Fee Related
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JP2009094005A
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English (en)
Japanese (ja)
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JP2009277649A5 (https=
JP2009277649A (ja
Inventor
幸一郎 田中
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2009094005A priority Critical patent/JP5538642B2/ja
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Publication of JP2009277649A5 publication Critical patent/JP2009277649A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2009094005A 2008-04-15 2009-04-08 成膜方法および発光素子の作製方法 Expired - Fee Related JP5538642B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009094005A JP5538642B2 (ja) 2008-04-15 2009-04-08 成膜方法および発光素子の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008105559 2008-04-15
JP2008105559 2008-04-15
JP2009094005A JP5538642B2 (ja) 2008-04-15 2009-04-08 成膜方法および発光素子の作製方法

Publications (3)

Publication Number Publication Date
JP2009277649A JP2009277649A (ja) 2009-11-26
JP2009277649A5 JP2009277649A5 (https=) 2012-05-24
JP5538642B2 true JP5538642B2 (ja) 2014-07-02

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Family Applications (1)

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JP2009094005A Expired - Fee Related JP5538642B2 (ja) 2008-04-15 2009-04-08 成膜方法および発光素子の作製方法

Country Status (2)

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US (1) US20090258167A1 (https=)
JP (1) JP5538642B2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009099002A1 (en) 2008-02-04 2009-08-13 Semiconductor Energy Laboratory Co., Ltd. Deposition method and method for manufacturing light-emitting device
JP5416987B2 (ja) * 2008-02-29 2014-02-12 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
JP5292263B2 (ja) * 2008-12-05 2013-09-18 株式会社半導体エネルギー研究所 成膜方法及び発光素子の作製方法
WO2012158709A1 (en) 2011-05-16 2012-11-22 The Board Of Trustees Of The University Of Illinois Thermally managed led arrays assembled by printing
WO2013010113A1 (en) 2011-07-14 2013-01-17 The Board Of Trustees Of The University Of Illinois Non-contact transfer printing
KR20150056112A (ko) * 2013-11-14 2015-05-26 삼성디스플레이 주식회사 막 형성용 마스크, 이를 이용한 막 형성 방법 및 유기 발광 표시 장치의 제조 방법
US11387384B2 (en) * 2019-04-16 2022-07-12 Samsung Electronics Co., Ltd. LED transferring method and display module manufactured by the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002216957A (ja) * 2001-01-19 2002-08-02 Sharp Corp 転写法を用いた有機ｌｅｄ表示パネルの製造方法およびそれにより製造された有機ｌｅｄ表示パネル
US6695029B2 (en) * 2001-12-12 2004-02-24 Eastman Kodak Company Apparatus for permitting transfer of organic material from a donor to form a layer in an OLED device
US6688365B2 (en) * 2001-12-19 2004-02-10 Eastman Kodak Company Method for transferring of organic material from a donor to form a layer in an OLED device
US6703179B2 (en) * 2002-03-13 2004-03-09 Eastman Kodak Company Transfer of organic material from a donor to form a layer in an OLED device
US6929048B2 (en) * 2003-09-05 2005-08-16 Eastman Kodak Company Laser transfer of organic material from a donor to form a layer in an OLED device
KR100611756B1 (ko) * 2004-06-18 2006-08-10 삼성에스디아이 주식회사 유기 전계 발광 소자 및 그의 제조 방법
JP2006344459A (ja) * 2005-06-08 2006-12-21 Sony Corp 転写方法および転写装置
KR100703532B1 (ko) * 2005-09-09 2007-04-03 삼성에스디아이 주식회사 기판 합착장치 및 이를 이용한 기판 합착방법
JP2008066147A (ja) * 2006-09-07 2008-03-21 Fuji Electric Holdings Co Ltd 蒸着によるパターン形成方法、該方法を含む色変換フィルタ基板およびカラー有機ｅｌ素子の製造方法

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JP2009277649A (ja) 2009-11-26
US20090258167A1 (en) 2009-10-15

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