JP5534309B2 - Waste mushroom medium regeneration treatment method and new biomass utilization method by soft hydrothermal process - Google Patents

Description

  The present invention relates to a waste mushroom medium regeneration method using a soft hydrothermal process, a new biomass utilization method, and the like.

  Artificial cultivation of wood decaying edible mushrooms tends to increase year by year in both types and production of mushrooms. Therefore, the reuse method such as composting the mushroom after harvesting the mushrooms (waste fungus bed) is widely known, but there are differences in the time required when the operators are different The reality is that reuse is not progressing. In addition, due to the expansion of mushroom production, it has become saturated only by reusing the current situation, and efforts such as fuelization are being promoted.

On the other hand, the severity of mushroom management is increasing due to low sales prices and soaring fuel and materials. Therefore, for the purpose of reducing medium material costs and effective use of spent medium, effective use of such a large amount of waste mushroom medium that has been discharged has so far been made into fuel, livestock litter, Various experiments and practical applications such as feed, reuse as a medium, and composting have been attempted (Patent Documents 1 to 3).

  However, it has been considered difficult except for composting because of its physical properties (physical, chemical, biological) and its large quantity. In addition, the amount of compost derived from the waste mushroom medium due to composting does not exceed the waste amount of the waste mushroom medium, and most of it is discarded. Various attempts have been made to reuse it as the most desirable medium, but the yield of the mushroom fruit body inhibitory enzyme (or inhibitor) contained in the waste mushroom medium is significantly lower than the new medium. There was no practical use.

On the other hand, in the study of a very mild hydrothermal process (hereinafter referred to as “soft hydrothermal process”) of 200 ° C. or less using the floor of an experimental animal as a model substance by the present inventors, the water content value is high. , Demonstrated that it is possible to effectively dry woody biomass containing a large amount of septic compounds, decompose, extract and remove septic compounds, and recycle them (Patent Literature) 4 and 5). In addition, RNase, a thermostable protein, is a hydrothermal process that can control a wide variety of reaction systems by changing temperature, pressure, and steam saturation ^†. The possibility was made and the mechanism was clarified (Non-patent Document 1).
^† Steam saturation ratio (%) is according to the following formula.
Steam saturation ratio (%) = {Steam density (kg / m3) / Saturated steam density (kg / m3)} × 100

Japanese Patent No. 3107253 JP 2008-54510 A JP-A-9-51939 Japanese Patent No. 4272202 JP 2004-298110 A

Toru Miyamoto et al., “Research on inactivation of RNase by soft hydrothermal process and development of new sterilization method”, Medical Device Science, Vol. 78, No. 4, pp. 299

  Therefore, the present invention solves the above-mentioned problems and decomposes, extracts and sterilizes harmful substances from the medium after harvesting mushrooms, that is, "waste mushroom medium", sterilizes, inactivates mushroom growth inhibitory substances, and appropriately dries. The purpose of this project is to build a “zero-waste recycling-type mushroom cultivation system” that regenerates waste mushroom media as a new fungus bed.

  The present inventors have solved the above problems by controlling the chemical reaction of water by changing temperature, pressure, and steam saturation in a soft hydrothermal process, and using a waste mushroom medium as a fungus bed The present invention was completed by finding that it can be reproduced.

That is, each main aspect of the present invention is as follows.
1. A flow-type regeneration treatment method for waste mushroom medium, in which a saturated water vapor is continuously supplied to the waste mushroom medium, and the saturated water vapor is condensed by contacting with the waste mushroom medium. Hydrolyzing the substance contained therein, and further increasing the temperature of the saturated water vapor supplied by heating from the outside to obtain dry water vapor whose vapor saturation is reduced to 100% or less, and using the dry water vapor, the waste mushroom medium The method described above is characterized in that the substance contained in is extracted and removed, and the waste mushroom medium is dried.
2. The substance to be hydrolyzed is a mushroom growth inhibitory substance contained in the waste mushroom medium, and / or the substance to be extracted and removed is a mushroom growth inhibitory substance and / or harmful substance contained in the waste mushroom medium. Item 2. The method according to Item 1.
3. The method according to aspect 2, wherein the mushroom growth inhibitor to be hydrolyzed is protein, and the mushroom growth inhibitor to be extracted is terpenes and phenols.
4). The method according to embodiment 2 or 3, wherein the harmful substance is an organic compound.
5. The method according to any one of aspects 1 to 4, wherein the waste mushroom medium is dried by removing moisture obtained by condensing the moisture and saturated steam contained in the waste mushroom medium with dry steam.
6). The method according to any one of aspects 1 to 5, wherein the compound in the waste mushroom medium is extracted and removed by dry steam whose affinity for organic matter is increased due to a decrease in ionic product and dielectric constant.
7). The method according to any one of aspects 1 to 6, wherein the temperature of the saturated water vapor is 100 to 200 ° C.
8). The method according to any one of embodiments 1 to 7, wherein external heating is performed at 100 to 200 ° C.
9. 10. The method according to any one of aspects 1 to 9, wherein the treatment time is 10 to 120 minutes. The mushroom culture medium containing the reproduction | regeneration waste mushroom culture medium obtained by the method as described in any one of aspects 1-9.
11. A mushroom cultivation method comprising using the mushroom medium according to the tenth aspect.

  By the method of the present invention, decomposition, extraction removal, sterilization, mushroom growth of mushroom growth inhibitory substances and harmful substances that could not be treated from waste mushroom medium under conventional autoclave sterilization conditions (121 ° C, 0.2 MPa, 20 minutes) Inactivation of inhibitory substances became possible. Furthermore, by regenerating the waste mushroom medium modified by the regeneration treatment in this way, it was possible to provide a regenerated waste mushroom medium that can be used as a new fungus bed.

The required quality of the mushroom medium has the following four points.
1. Does not contain inhibitory substances.
2. Excellent breathability.
3. Sufficient nutrition.
4. Rich in water retention.

  Therefore, the regenerated waste mushroom medium obtained by the method of the present invention can be reused for cultivation of mushrooms in the same way as a new medium by adding normal nutrient additives (rice bran, bran soybean bran, etc.) and water. it can. As a result, it becomes possible to construct a “circular mushroom cultivation system with no waste”. Actually, the mushroom mushrooms were cultivated using the mushroom medium thus obtained, and it was proved that the yield was equal to or higher than that obtained when a normal new medium was used.

It is a whole block diagram of the apparatus which can implement the reproduction | regeneration processing method of this invention. The yield (buy) and the yield (broken line) by the mushroom cultivation experiment using the regeneration waste mushroom medium obtained by the regeneration treatment method of the present invention are shown. Incidentally, the yield and yield by the mushroom cultivation experiment (comparative example) using the conventional autoclaved culture medium are shown.

  The present invention is a flow-type regeneration treatment method for a waste mushroom medium, in which a saturated water vapor is continuously supplied to the waste mushroom medium, and the saturated water vapor is condensed by contacting with the waste mushroom medium. Hydrolyzing a substance contained in the waste mushroom medium, and further increasing the temperature of the saturated water vapor supplied by heating from the outside to obtain dry water vapor whose vapor saturation is reduced to 100% or less, and the dry water vapor In this method, the substance contained in the waste mushroom medium is extracted and removed, and the waste mushroom medium is further dried. In the present invention, there is no particular limitation on the type of mushrooms. Preferably, the substance to be hydrolyzed is a mushroom growth inhibitory substance contained in the waste mushroom medium, and / or the substance to be extracted and removed is a mushroom growth inhibitory substance and / or harmful substance contained in the waste mushroom medium. is there.

  In the present specification, the term “mushroom growth inhibitory substance” means any substance that has some inhibitory effect on growth during mushroom cultivation. For example, RNase and amine accumulated in the medium as a result of mushroom cultivation Representative examples include enzymes such as degrading enzymes, proteins containing thiamine-degrading heat-resistant factors, other various biological polymers, and plant-derived components such as terpenes and phenols. For example, the mushroom growth inhibitor to be hydrolyzed is protein and / or the mushroom growth inhibitor to be extracted and removed is terpenes and phenols. Incidentally, in the method of the present invention, the type and amount of the mushroom growth inhibitor to be hydrolyzed and / or extracted and removed vary depending on the treatment conditions and the like during the hydrolysis and / or extraction and removal of the method of the present invention. Incidentally, all the mushroom growth inhibitory substances contained in the waste mushroom medium need not be hydrolyzed.

In the present specification, “hazardous substance” means all substances having some harmful effect on the growth of mushrooms or mushroom fruit bodies, for example, various additives (Konuka, Husuma, Various organic compounds such as altered spoilage components such as flour beet and mushroom lime) and spoilage components during cultivation can be mentioned.

  The “mushroom growth inhibitory substance” and the “hazardous substance” described above are not completely independent and distinct concepts, and there may be substances belonging to both categories.

  The temperature and pressure of the saturated steam continuously supplied by the method of the present invention, and the treatment time can be appropriately selected depending on the nature and type of the waste mushroom medium to be treated, the type of cultivated mushroom, and the like. For example, in the case of a waste mushroom medium that has been used for a short period of time, the amount of mushroom growth-inhibiting substances and harmful substances contained in the medium is considered to be relatively small, so that it can be regenerated even under milder conditions. For example, the temperature of the saturated water vapor can be set to 100 to 200 ° C., preferably 120 to 150 ° C., and the pressure can be set to 0.1 MPa to a saturated water vapor pressure at each temperature, for example, 0.20 to 0.50 MPa. The treatment time is, for example, 10 to 120 minutes, preferably 30 to 90 minutes.

  Furthermore, the heating from the outside is performed outside the pressure vessel (regeneration processor) for carrying out the regeneration treatment method by an appropriate apparatus known to those skilled in the art such as a heater, for example, an appropriate heating temperature range, for example, 100 to 200 ° C. Can be done.

A feature of the present invention is that by controlling the vapor saturation of water used as a reaction medium, inactivation of a mushroom growth inhibitory substance (enzyme) contained in a waste mushroom medium, and decomposition, extraction, and extraction of various harmful substances It is possible to promote chemical reaction such as removal and drying of waste mushroom medium. The reaction of the material to be treated (waste mushroom medium) can control the steam saturation of water vapor in the pressure vessel by controlling the temperature and pressure using the fact that the steam saturation changes greatly even with relatively small temperature changes. It is to change and utilize the characteristics of saturated steam and dry steam.

Furthermore, the method of the present invention is a flow type in which a reaction medium (water vapor) is continuously supplied. The advantage is that the chemical reaction of the object to be processed becomes a non-equilibrium system, the reaction speed is faster than the batch type equilibrium system, the processing time is shortened, and the above various chemical reactions and drying proceed in parallel in one step. There is to do. As a result, the reaction can be made more efficient and the apparatus structure can be simplified.

On the other hand, the object to be treated cannot be dried by a closed type (batch type) like an existing autoclave. As a result, in the existing autoclave, a vacuum process (decompression process) or the like is provided after the sterilization process to dry the workpiece.

  Although the mechanism of the method of the present invention is considered to be as follows, the technical scope of the present invention is not limited thereto.

That is, first, when saturated water vapor comes into contact with an object to be treated (waste mushroom medium) having a high water content, the saturated water vapor condenses into a liquid phase. At that time, the temperature of the object to be processed rises to the temperature of saturated water vapor sent one after another by the heat of condensation, and hydrolysis is carried out in the liquid phase consisting of high-temperature high-pressure water with a low ionic product and dielectric constant thus obtained. The reaction proceeds and the mushroom growth inhibitor is inactivated. At the same time, the temperature of the saturated steam supplied by the heat applied from the outside rises, and the steam saturation is lowered to 100% or less to obtain dry steam. This dry steam has two actions. The first effect is that toxic substances such as spoilage components in waste mushroom medium are extracted and removed by dry water vapor that has become more compatible with organic substances due to a decrease in ionic product and dielectric constant. As the second action, the condensed water and the water to be treated are dried by a drying action by dry steam. These actions work more effectively in non-equilibrium flow systems.

The method of the present invention can be carried out using an appropriate processing system / processing apparatus known to those skilled in the art. For example, various processing apparatuses described in Patent Documents 4 to 6 can be used.

Specifically, a processing apparatus including at least the following parts 1) to 3) is exemplified. FIG. 1 is an overall configuration diagram showing a piping system of this processing apparatus.
1) A processing unit for an object to be processed (waste mushroom medium).
2) A steam generating unit that generates water vapor to be supplied to the processing unit.
3) A heater control unit that can control a predetermined water vapor condition by controlling the internal temperature of the processing unit.

  In the above 1), the “processing part of the object to be processed” refers to a part where the object to be processed is installed. Specifically, for example, it corresponds to 2 “processing device” in FIG.

In said 2), a steam generation part is a site | part which generate | occur | produces the saturated water vapor state of this invention, for example, corresponds to 5 "steam generator" of FIG.
In the above 3), the heater control unit is a part that controls the internal temperature of the processing unit of the object to be processed as described above and controls the predetermined water vapor condition to generate dry water vapor. It corresponds to “heater” and 27 “temperature controller”.

It is preferable that the apparatus further includes the following parts A) and B).
A) A control valve capable of controlling a predetermined saturated water vapor condition by controlling an internal pressure of the processing unit;
B) A steam trap section for removing saturated water vapor and / or a process for introducing saturated water vapor.

  The above will be described with reference to FIG. 1. The processing system 1 includes a processing device 2 and a steam generation device 5, and a steam supply pipe 7 and a nitrogen gas supply pipe 8 are disposed between them. The processing apparatus 2 has a regenerator (steamer) 22 composed of a pressure vessel installed in a horizontal state on an apparatus stand 21, and a steam supply pipe 7 and nitrogen gas supply are provided at one end of the regenerator 22. A tube 8 is in communication.

A clutch-type opening / closing lid 22a is attached to the other end of the regeneration processor 22, and the interior 22b of the regeneration processor 22 is kept airtight when the opening / closing lid 22a is closed. A cylindrical workpiece installation portion 23 is coaxially arranged inside the regenerator 22, and a workpiece such as an experimental instrument can be mounted on the workpiece installation portion 23.
When the opening / closing lid 22 a is opened, the workpiece installation portion 23 can be pulled out from the regeneration processor 22 along the slide rail 24. A steam blowing pipe 25 extends in the axial direction in the interior 22 b of the regeneration processor 22, and an end of the steam blowing pipe 25 is connected to the water vapor supply pipe 7.

  A heater 26 is attached so as to surround the outer periphery of the cylindrical body of the pressure vessel of the regeneration processor 22, and the drive of the heater 26 is controlled by a temperature controller 27. The temperature controller 27 drives the heater 26 based on the detection result of the temperature sensor 28 for detecting the temperature of the workpiece mounted on the workpiece installation unit 23, and sets the internal temperature of the regeneration processor 22 to a predetermined value. To the value of.

  The regeneration processor 22 is connected to an exhaust pipe 29 for releasing exhaust gas from the inside 22b to the outside. The exhaust pipe 29 is connected to the regeneration processor 22 from the side of the regeneration processor 22 by a filter 30 and a pressure gauge. 31, a control valve 32, a gas-liquid separator 33 and a deodorizing device 34 are connected, and the inside 22 b of the regeneration processor 22 can be opened to the atmosphere via these. The pressure inside the regeneration processor 22 b is displayed on a pressure gauge 35 and detected by a pressure regulator 36. Based on the detected pressure, the pressure adjuster 36 opens and closes the control valve 32 to adjust the gas discharge amount from the regeneration processor 22, thereby adjusting the internal pressure of the processing chamber 22 to a predetermined value. . Further, the interior 22b of the regeneration processor 22 can be opened to the atmosphere via a safety valve 37, and the safety valve 37 prevents an abnormal increase in internal pressure.

  A drain pipe 38 is also connected to the regeneration processor 22 of this example. A filter 39 is inserted into the drain pipe 38 and branches bifurcated at a downstream portion of the filter 39, one side is opened to the atmosphere via a stop valve 40 and a steam trap 41, and the other side is a stop valve 42. Through the atmosphere.

  Next, the steam generator 5 includes a water tank 51 storing pure water or ion-exchanged water, a water pump 52, a steam generator 53, an overflow type cooler 54, and a pressure holding valve 55, which are installed in the apparatus base. 56. The water in the water tank 51 is supplied to the water pump 52 through the circulation pipe 57a in which the filter 58 is inserted, and the water discharged from the water pump 52 is supplied to the steam generator 53 through the circulation pipe 57b. The steam generator 53 includes a coil-shaped passage 57c communicating with the circulation pipe 57b, and the passage 57c is heated from the outside by the electric furnace 53a, so that water is converted into water vapor while passing through the passage 57c. . The electric furnace 53a is controlled by a temperature controller 53b. The generated steam returns to the water tank 51 through the circulation pipe 57d and the circulation pipe 57e in which the cooler 54 and the pressure holding valve 55 are inserted. Here, the water vapor supply pipe 7 communicates with the circulation pipe 57d through the stop valve 59. When the stop valve 59 is opened, the saturated steam generated in the steam generator 53 is supplied to the regeneration processor 22 via the steam supply pipe 7, and only excess steam is refluxed via the circulation pipes 57d and 57e. Become. The pressure of the saturated water vapor supplied to the processing apparatus 2 side is adjusted by a pressure holding valve 55. A pressure gauge 60 and a safety valve 61 are connected to the circulation pipe 57d.

  Further, a nitrogen gas supply pipe 62 is attached to the steam generator 5, and this nitrogen gas supply pipe 62 is connected to the processing apparatus 2 side via a mass flow meter 63, a stop valve 64 and a check valve 65. The nitrogen gas supply pipe 8 is connected. The upstream end 62a of the nitrogen gas supply pipe 62 communicates with the nitrogen gas tank 68 through an upstream pipe 67 in which the pressure reducing valve 66 is inserted. Further, the upstream end 62a of the nitrogen gas supply pipe 62 communicates with the upstream side of the control valve 32 mounted on the processing apparatus 22 side via a discharge side pipe 70 into which the pressure reducing valve 69 is inserted.

  Here, the water vapor supply pipe 7 and the nitrogen gas supply pipe 8 that are spanned between the processing apparatus 2 and the steam generation apparatus 5 having the above-described configuration are respectively covered with line heaters 9 and 10, and these are interposed therebetween. Thus, water vapor and nitrogen gas supplied to the processing apparatus 2 can be heated. A stop valve 11 as a safety valve is connected to the water vapor supply pipe 7. Further, the nitrogen gas supply pipe 8 is connected at its downstream end to the regeneration processor 22 via the first stop valve 12, and at a portion upstream from the first stop valve 12. It communicates with the downstream portion of the water vapor supply pipe 7 via the stop valve 13.

  The processing operation of the object to be processed by the processing system 1 having the above configuration will be described. The basic processing operation is as follows. First, an object to be processed which is a waste mushroom medium is charged into the regeneration processor 22, and saturated steam is continuously supplied to the regeneration processor 22. After the internal temperature of the regeneration processor 22 reaches a predetermined temperature by the heat of condensation and the heater 26, the control valve 32 is adjusted to keep the interior 22b of the regeneration processor 22 in the saturated steam atmosphere for a predetermined time. At this time, saturated water vapor is condensed at the same time as the saturated water vapor comes into contact with the object to be treated (waste mushroom medium) having a high water content, and a liquid phase is formed. At the same time, the interior of the regenerator 22 is heated by the heater 26 to raise the temperature of the saturated water vapor, thereby generating dry water vapor whose vapor saturation is reduced to 100% or less.

After the processing is completed, the supply of saturated water vapor from the steam generator 5 is stopped, and then the internal pressure of the regenerator 22 is reduced while supplying nitrogen to the regenerator 22 and cooling the processed object inside. Set to atmospheric pressure. After it is confirmed that the internal pressure has become atmospheric pressure, the stop valve 42 (drain valve) is opened for safety, and then the regeneration processor 22 is opened to take out the processed object. However, nitrogen used for the treatment may be replaced with air, and nitrogen is used as an inert gas depending on characteristics of the object to be treated. The inert gas (nitrogen) is also used for adjusting and controlling the water vapor density in the regeneration process in consideration of the characteristics of the object to be processed.

  Hereinafter, the regeneration processing method of the present invention will be described in detail with reference to examples and comparative examples. However, these examples are intended to help the understanding of the present invention, and are within the technical scope of the present invention. Are not limited by these. Therefore, as long as the technical features of the present invention are provided, methods in which appropriate alterations and modifications are made also belong to the technical scope of the present invention.

[Regeneration experiment]
In this experiment, in order to confirm that the waste mushroom medium was hydrothermally treated in the same manner as the wood chip flooring material and could be reused again as a mushroom medium, the regeneration treatment method of the present invention was performed according to the following procedure. The regeneration treatment experiment was performed twice for each waste medium.

experimental method:
(1) Experimental equipment: 100 l dry steam treatment equipment (effective capacity 50 l, with rotating mechanism: equipment substantially equivalent to the equipment system shown in FIG. 1) Toyo University Graduate School of Medicine, Animal Experiment Facility Basement Wash Room (2 ) Experimental sample: Waste mushroom medium (SA medium and Sanko medium) and control medium (JA corn) provided by JA Nakano City Agricultural Cooperative are as follows.
SA Medium: Shinshu Culture Center (original enoki mushroom medium)
Sanko Medium: Sanko Shoji Co., Ltd. (Original Enoki Mushroom Medium)

1. The moisture content of the waste mushroom medium is measured in advance, and the processing conditions are inferred from the past processing experiment data. The moisture content was obtained by placing a sample in a beaker dried at 135 ° C. for 20 minutes, drying at 110 ° C. for 5 hours, and measuring the weight before and after.
2. The waste medium is packed into six cages in the experimental reactor, and after mass measurement, it is placed in the reactor.
3. Hydrothermal treatment experiments are conducted according to the operating conditions shown in the table below. At this time, in order to prevent malodor, the gas discharged from the apparatus is not brominated by the deodorizing apparatus.
4). The extract separated during the experiment is collected from the laboratory storage tank by a hose into a recovery plastic tank (20 l) and sprayed onto the regenerated mushroom medium as appropriate. (Obtaining the separated gas sample is omitted.)
5. After completion, after measuring the mass of the cage again, the mushroom medium is recovered as a regenerated waste mushroom medium sample.
6). The drying rate is calculated from the difference in mass before and after the experiment.
The above processing conditions are summarized in Table 1.

[Mushroom cultivation experiment]
“Hydrothermal SA” and “Miyuki Sanko”, which are regeneration waste mushroom media obtained by treating the used SA medium and Sanko medium in Example 1, and JA corn (corn cob: corn core as a control) are dried. The sown and crushed and screened to below a certain particle size, Nakano City Agricultural Cooperative Corn Cob Standard Medium) was used to prepare a mushroom medium (Table 2), and the enoki mushroom cultivation experiment was carried out in the following manner (Table 3). In addition, appropriate amounts of Konuka, bran, flour beet and mushroom lime were added to each medium. The yield results obtained are shown in Table 4. In addition, the composition of an example of the used medium (hydrothermal Sanko 100%) (example using 9.5 kg of regenerated waste mushroom medium obtained from used Sanko medium instead of 5.7 kg of corn cob in JA corn medium) Table 5 shows.

  The results shown in Table 4 are shown in FIG. From these, when cultivating mushroom mushrooms using the regenerated waste mushroom medium mushrooms obtained by the method of the present invention, compared with the case of using the usual new JA corn used as a control, it is equal or more Yields and yields were demonstrated.

[Comparative Example]
Incidentally, a cultivation experiment of enoki mushrooms was carried out in the same manner as in Example 2 using a fresh SA medium (new) and a medium (waste) obtained by conventional autoclaving of the same medium. As a result, it was confirmed that when the conventional autoclaved medium was mixed with fresh SA medium (test group), the yield and yield were significantly reduced compared to the control group (FIG. 3).

One of the features of the present invention is the use of water as the reaction medium and no chemicals that add to the environment. In addition, the reaction region is a very mild hydrothermal reaction of about 200 ° C. or less, and does not require a special high-pressure processing apparatus such as a supercritical or subcritical reaction apparatus, and a general-purpose material can be used. Furthermore, the greatest attraction of the present invention is that a highly water-containing biomass can be regenerated or made into a valuable resource at a very low cost because a complicated apparatus is not used.

By using a mushroom medium obtained by mixing the regenerated waste mushroom medium obtained by the flow-type regeneration treatment method of the present invention with ordinary nutrient additives (rice bran, bran soybean bran, etc.) and water, etc. Mushrooms can be cultivated in the same way as when using a simple medium.

Hereinafter, each reference numeral shown in FIG. 1 will be described.
DESCRIPTION OF SYMBOLS 1 Processing system 2 Processing apparatus 5 Steam generator 7 Steam supply pipe 8 Nitrogen gas supply pipe 9, 10 Line heater 12, 13 Stop valve 22 Regeneration processor 22a Opening / closing lid 22b Inside 23 To-be-processed object installation part 25 Steam blowing pipe 26 Heater 27 Temperature Controller 28 Temperature Sensor 29 Exhaust Pipe 32 Control Valve 33 Gas-Liquid Separator 34 Deodorizer 36 Pressure Controller 38 Drain Pipe 40, 42 Stop Valve 41 Steam Trap 51 Water Tank 52 Water Pump 53 Steam Generator 53a Electric Furnace 53b Temperature controller 54 Cooler 55 Holding valve 57a, 57b, 57d, 57e Circulation pipe 57c Coiled passage 68 Nitrogen gas tank

Claims (11)

A flow-type regeneration treatment method for waste mushroom medium, in which a saturated water vapor is continuously supplied to the waste mushroom medium, and the saturated water vapor is condensed by contacting with the waste mushroom medium. Hydrolyzing the substance contained therein, and further increasing the temperature of the saturated water vapor supplied by heating from the outside to obtain dry water vapor whose vapor saturation is reduced to 100% or less, and using the dry water vapor, the waste mushroom medium Extracting and removing substances contained therein, and further drying the waste mushroom medium. The substance to be hydrolyzed is a mushroom growth inhibitory substance contained in the waste mushroom medium, and / or the substance to be extracted and removed is a mushroom growth inhibitory substance and / or harmful substance contained in the waste mushroom medium. Item 2. The method according to Item 1. The method according to claim 2 , wherein the mushroom growth inhibitor to be hydrolyzed is a protein and / or the mushroom growth inhibitor to be extracted and removed is a terpene and a phenol. The method according to claim 2 or 3 , wherein the harmful substance is an organic compound. The method according to any one of claims 1 to 4, wherein the waste mushroom medium is dried by removing water obtained by condensing water and saturated water vapor contained in the waste mushroom medium with dry steam. . The method according to any one of claims 1 to 5, wherein the compound in the waste mushroom medium is extracted and removed by dry steam having a high affinity with an organic substance due to a decrease in ionic product and dielectric constant. The method as described in any one of Claims 1-6 whose temperature of saturated water vapor | steam is 100-200 degreeC. The method according to any one of claims 1 to 7, wherein external heating is performed at 100 to 200 ° C. The method according to any one of claims 1 to 8, wherein the treatment time is 10 to 120 minutes. The mushroom culture medium containing the reproduction | regeneration waste mushroom culture medium obtained with the reproduction | regeneration processing method as described in any one of Claims 1-9. A method for cultivating mushrooms, comprising using the mushroom medium according to claim 10.

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