JP5495138B2 - イオン源 - Google Patents
イオン源 Download PDFInfo
- Publication number
- JP5495138B2 JP5495138B2 JP2011238540A JP2011238540A JP5495138B2 JP 5495138 B2 JP5495138 B2 JP 5495138B2 JP 2011238540 A JP2011238540 A JP 2011238540A JP 2011238540 A JP2011238540 A JP 2011238540A JP 5495138 B2 JP5495138 B2 JP 5495138B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- slit
- ion source
- ion beam
- electrode rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 54
- 238000000605 extraction Methods 0.000 claims description 19
- 238000011144 upstream manufacturing Methods 0.000 claims description 11
- 239000007789 gas Substances 0.000 description 11
- 230000001133 acceleration Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000001629 suppression Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
Description
2・・・イオンビーム
7・・・加速電極
8・・・引出電極
9・・・抑制電極
10・・・接地電極
14・・・電極枠体
15・・・開口部
16・・・電極棒
17・・・スリット状開口部
21・・・大径部
22・・・小径部
23・・・傾斜部
Claims (4)
- 引出し電極系として複数枚のスリット電極を有するイオン源であって、
前記スリット電極は、開口部を有する電極枠体と、
前記電極枠体の一面に形成された電極棒支持部にその両端部が面接触により当接支持され、前記開口部内に並設された複数本の電極棒と、
前記電極枠体の前記電極棒支持部が形成された面に取り付けられ、前記電極棒支持部上方を覆う蓋体とを備えていて、
前記イオン源より発生されるイオンビームの進行方向に沿って最も上流側に位置する前記スリット電極を構成する前記電極棒は、前記開口部内に配置される中央部と前記開口部外に配置される端部とを有し、前記電極棒の中央部は隣り合う電極棒間に形成されるスリット状開口部の形状が前記イオンビームの進行方向に沿って略テーパー状に広がるように構成されていて、前記電極棒の端部と前記電極棒支持部との当接面は平面形状であるイオン源。 - 前記イオン源より発生されるイオンビームの進行方向に沿って最も上流側に位置する前記スリット電極以外の前記スリット電極に備えられた前記電極棒の形状が略円柱形状をしていることを特徴とする請求項1記載のイオン源。
- 前記イオン源より発生されるイオンビームの進行方向に沿って最も上流側に位置する前記スリット電極を構成する前記電極棒は、前記イオンビームの進行方向に沿って、大径部と小径部とを有していることを特徴とする請求項1または2記載のイオン源。
- 前記イオンビームの進行方向に沿って、前記大径部と前記小径部との間に傾斜部を有していることを特徴とする請求項3記載のイオン源。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011238540A JP5495138B2 (ja) | 2011-10-31 | 2011-10-31 | イオン源 |
CN201210208305.2A CN103094027B (zh) | 2011-10-31 | 2012-06-19 | 引出电极系统及狭缝电极 |
KR1020120070783A KR101366512B1 (ko) | 2011-10-31 | 2012-06-29 | 인출 전극계 및 슬릿 전극 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011238540A JP5495138B2 (ja) | 2011-10-31 | 2011-10-31 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013097958A JP2013097958A (ja) | 2013-05-20 |
JP5495138B2 true JP5495138B2 (ja) | 2014-05-21 |
Family
ID=48206476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011238540A Active JP5495138B2 (ja) | 2011-10-31 | 2011-10-31 | イオン源 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5495138B2 (ja) |
KR (1) | KR101366512B1 (ja) |
CN (1) | CN103094027B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7046147B2 (ja) | 2020-11-25 | 2022-04-01 | 株式会社Lixil | 框接合構造 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104299871B (zh) * | 2013-07-16 | 2016-12-28 | 上海凯世通半导体股份有限公司 | 离子源系统和离子束流系统 |
JP6388520B2 (ja) * | 2014-10-17 | 2018-09-12 | 住友重機械イオンテクノロジー株式会社 | ビーム引出スリット構造、イオン源、及びイオン注入装置 |
CN106935458B (zh) * | 2015-12-31 | 2019-02-26 | 核工业西南物理研究院 | 一种高功率强流离子源四电极支撑座组件 |
US10224181B2 (en) * | 2016-04-20 | 2019-03-05 | Varian Semiconductor Equipment Associates, Inc. | Radio frequency extraction system for charge neutralized ion beam |
KR102415488B1 (ko) * | 2016-11-11 | 2022-07-01 | 닛신 이온기기 가부시기가이샤 | 이온 소스 |
US11424104B2 (en) | 2017-04-24 | 2022-08-23 | Applied Materials, Inc. | Plasma reactor with electrode filaments extending from ceiling |
US10510515B2 (en) | 2017-06-22 | 2019-12-17 | Applied Materials, Inc. | Processing tool with electrically switched electrode assembly |
JP6756315B2 (ja) * | 2017-08-18 | 2020-09-16 | 日新イオン機器株式会社 | イオン源 |
CN114360990A (zh) * | 2021-11-30 | 2022-04-15 | 核工业西南物理研究院 | 一种多栅极射频感应耦合离子源 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63108645A (ja) * | 1986-10-23 | 1988-05-13 | Nissin Electric Co Ltd | イオン源 |
US5532483A (en) * | 1994-03-17 | 1996-07-02 | Hitachi, Ltd. | Mass spectrometer and ion source |
JP3303587B2 (ja) * | 1994-03-17 | 2002-07-22 | 株式会社日立製作所 | 質量分析装置及びイオン源 |
JPH08148106A (ja) * | 1994-11-21 | 1996-06-07 | Nissin Electric Co Ltd | 大面積イオン引出し電極系 |
JPH09105734A (ja) * | 1995-10-12 | 1997-04-22 | Ngk Spark Plug Co Ltd | イオン電極及びその製造方法 |
JP2000133153A (ja) * | 1998-10-23 | 2000-05-12 | Hitachi Ltd | イオン源,核融合用中性粒子ビーム入射装置,及びイオンビームプロセス装置 |
KR100851901B1 (ko) * | 2005-01-07 | 2008-08-13 | 삼성전자주식회사 | 이온 빔 추출장치 |
JP5337028B2 (ja) * | 2006-06-30 | 2013-11-06 | ノルディコ テクニカル サーヴィシズ リミテッド | 装置 |
-
2011
- 2011-10-31 JP JP2011238540A patent/JP5495138B2/ja active Active
-
2012
- 2012-06-19 CN CN201210208305.2A patent/CN103094027B/zh active Active
- 2012-06-29 KR KR1020120070783A patent/KR101366512B1/ko active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7046147B2 (ja) | 2020-11-25 | 2022-04-01 | 株式会社Lixil | 框接合構造 |
Also Published As
Publication number | Publication date |
---|---|
KR101366512B1 (ko) | 2014-02-24 |
KR20130047556A (ko) | 2013-05-08 |
CN103094027B (zh) | 2015-11-11 |
JP2013097958A (ja) | 2013-05-20 |
CN103094027A (zh) | 2013-05-08 |
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