JP5490569B2 - 半導体装置の作製方法 - Google Patents
半導体装置の作製方法 Download PDFInfo
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- JP5490569B2 JP5490569B2 JP2010046403A JP2010046403A JP5490569B2 JP 5490569 B2 JP5490569 B2 JP 5490569B2 JP 2010046403 A JP2010046403 A JP 2010046403A JP 2010046403 A JP2010046403 A JP 2010046403A JP 5490569 B2 JP5490569 B2 JP 5490569B2
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- 238000000227 grinding Methods 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
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Description
本実施の形態では、本発明の一態様に係る半導体装置、或いは光電変換装置が有するダイオードの作製方法について説明する。
本実施の形態では、実施の形態1とは異なる、半導体装置、或いは光電変換装置が有するダイオードの作製方法について説明する。
本実施の形態では、マスクにより光が遮蔽されることで形成される、未露光領域の形状について説明する。
本実施の形態では、光電変換装置の一つである太陽電池の作製方法について説明する。
本実施の形態では、本発明の一態様に係る作製方法により形成された、フォトICの構成について説明する。
次に、本発明の半導体装置の作製方法について詳しく述べる。なお、本実施の形態では、トランジスタと、縦型接合タイプのフォトダイオードとを半導体素子の一例として示すが、光電変換装置に用いられるフォトダイオード以外の半導体素子は、トランジスタだけに限定されない。例えば、フォトダイオードの他に、記憶素子、抵抗、ダイオード、容量、インダクタなどを用いることができる。
本実施の形態では、本発明の一態様に係る作製方法を用いて形成された、光電変換装置の構成について説明する。
101 p層
102 i層
103 n層
104 フォトレジスト層
105 レジストマスク
106 n層
107 フォトレジスト層
108 レジストマスク
109 i層
110 p層
113 p層
200 マスク
201 未露光領域
202 未露光領域
203 未露光領域
204 露光領域
205 未露光領域
206 露光領域
300 基板
301 p層
302 i層
303 n層
304 フォトレジスト層
305 レジストマスク
306 p層
307 i層
308 n層
309 フォトレジスト層
310 レジストマスク
311 n層
401 未露光領域
402 未露光領域
403 未露光領域
404 未露光領域
411 未露光領域
412 未露光領域
413 未露光領域
414 未露光領域
500 基板
501 導電膜
502 p層
503 i層
504 n層
505 p層
506 i層
507 n層
508 光電変換層
509 導電膜
600 基板
601 絶縁膜
602 半導体膜
603 半導体膜
604 半導体膜
605 トランジスタ
606 トランジスタ
607 ゲート絶縁膜
608 導電膜
609 導電膜
610 ゲート電極
611 ゲート電極
612 絶縁膜
614 絶縁膜
615 導電膜
616 導電膜
617 導電膜
618 導電膜
619 導電膜
620 導電膜
622 p層
623 i層
624 n層
625 フォトダイオード
628 絶縁膜
629 絶縁膜
630 導電膜
631 導電膜
633 絶縁膜
634 封止膜
635 導電膜
636 導電膜
637 チタン膜
638 ニッケル膜
639 金膜
640 導電膜
641 導電膜
801 フォトダイオード
802 増幅回路
803 トランジスタ
804 トランジスタ
810 導電膜
811 導電膜
812 導電膜
813 導電膜
814 導電膜
815 領域
816 導電膜
817 導電膜
818 領域
819 i層
820 n層
1401 フォトダイオード
1402 増幅回路
1403 ADコンバータ
1404 レギュレータ
1405 オシレータ
1406 インターフェース
1501 基板
1502 素子層
1502a 素子層
1502b 素子層
1502c 素子層
1503a 端子1
1503b 端子1
1503c 端子1
1504a 端子2
1504b 端子2
1504c 端子2
1503
1504
1701 p層
1702 i層
1703 n層
1704 周縁部
1705 周縁部
5001 筐体
5002 表示部
5003 センサ部
5101 本体
5102 表示部
5103 音声入力部
5104 音声出力部
5105 操作キー
5106 センサ部
Claims (1)
- 第1の半導体層の上方に第2の半導体層を形成する第1の工程と、
前記第2の半導体層の上方に第3の半導体層を形成する第2の工程と、
前記第3の半導体層の上方に、少なくとも第1の領域と第2の領域と第3の領域とを有する第1のフォトレジスト層を形成する第3の工程と、
前記第1の領域と前記第2の領域とにマスクが重なり、前記第3の領域に前記マスクが重ならないように、前記マスクを配置した状態で、前記第1のフォトレジスト層に対して第1の光を照射する第4の工程と、
前記第1の領域と前記第3の領域とに前記マスクが重なり、前記第2の領域に前記マスクが重ならないように、前記マスクを配置した状態で、前記第1のフォトレジスト層に対して第2の光を照射する第5の工程と、
前記第1のフォトレジスト層に対して第1の現像を行うことによって、前記第1の光及び前記第2の光が照射されていない箇所に、第1のレジストマスクを形成する第6の工程と、
前記第3の半導体層をエッチングして第3の島状半導体層を形成する第7の工程と、
前記第1のレジストマスクを除去する第8の工程と、
前記第3の島状半導体層の上方に第2のフォトレジスト層を形成する第9の工程と、
前記マスクの外周よりも内側に前記第3の島状半導体層の外周が位置するように前記マスクを配置した状態で、前記第2のフォトレジスト層に対して第3の光を照射する第10の工程と、
前記第2のフォトレジスト層に対して第2の現像を行うことによって、前記第3の光が照射されていない箇所に第2のレジストマスクを形成する第11の工程と、
前記第2の半導体層をエッチングして第2の島状半導体層を形成し、前記第1の半導体層をエッチングして第1の島状半導体層を形成する第12の工程と、
前記第2のレジストマスクを除去する第13の工程と、を少なくとも有し、
前記第1の半導体層は、少なくとも第1の元素を有し、
前記第3の半導体層は、少なくとも第2の元素を有し、
前記第1の元素は、前記第1の半導体層にn型又はp型の一方の導電型を付与することができる元素であり、
前記第2の元素は、前記第3の半導体層にn型又はp型の他方の導電型を付与することができる元素であることを特徴とする半導体装置の作製方法。
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