JP5411528B2 - 薄膜トランジスタ及び表示装置 - Google Patents
薄膜トランジスタ及び表示装置 Download PDFInfo
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- JP5411528B2 JP5411528B2 JP2009042436A JP2009042436A JP5411528B2 JP 5411528 B2 JP5411528 B2 JP 5411528B2 JP 2009042436 A JP2009042436 A JP 2009042436A JP 2009042436 A JP2009042436 A JP 2009042436A JP 5411528 B2 JP5411528 B2 JP 5411528B2
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- Prior art keywords
- semiconductor layer
- layer
- microcrystalline semiconductor
- thin film
- film transistor
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- 238000001039 wet etching Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
- 229910021355 zirconium silicide Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66765—Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Film Transistor (AREA)
Description
ここでは、微結晶半導体層をチャネル形成領域に有する薄膜トランジスタと比較してオフ電流が低く、非晶質半導体層をチャネル形成領域に有する薄膜トランジスタと比較して、高速動作が可能であり、オン電流が高い薄膜トランジスタの構造について、図1を用いて説明する。
本実施の形態では、実施の形態1と比較して更にオン電流及び電界効果移動度が高い薄膜トランジスタの構造について、図4を用いて示す。また、オフ電流を低減できるTFTの構造について示す。
本実施の形態では、第2の微結晶半導体層の他の形態を図5を用いて示す。本実施の形態では、第2の微結晶半導体層を2層とし、ゲート絶縁層09及び第1の微結晶半導体層51a、51bに接する側をi型の微結晶半導体層または非晶質半導体層とし、非晶質半導体層55に接する側をn型の微結晶半導体層または非晶質半導体層とすることを特徴とする。
本実施の形態では、第1の微結晶半導体層51a、51b上に非晶質半導体層55が形成される薄膜トランジスタについて、図6を用いて示す。
実施の形態1乃至実施の形態3において、第1の微結晶半導体層51a、51bの代わりに、導電層を形成することができる。
本実施の形態では、実施の形態1乃至実施の形態5における薄膜トランジスタとは異なる構造の薄膜トランジスタについて、図8を用いて示す。具体的には、実施の形態1乃至実施の形態5に示す薄膜トランジスタにおいて、第1の微結晶半導体層51a、51bを分離せず一つとし、また、ソース領域及びドレイン領域として機能する一導電型を付与する不純物元素が添加された一対の不純物半導体層59、61が、第1の微結晶半導体層に重ならない構造の薄膜トランジスタである。
本実施の形態では、実施の形態1乃至実施の形態5における薄膜トランジスタとは異なる構造の薄膜トランジスタについて、図9を用いて示す。具体的には、実施の形態1乃至実施の形態5に示す薄膜トランジスタにおいて、第1の微結晶半導体層51a、51bを分離せず一つとし、また、ソース領域及びドレイン領域として機能する一導電型を付与する不純物元素が添加された一対の不純物半導体層59、61の一方の端部が、第1の微結晶半導体層に重なり、ソース領域及びドレイン領域として機能する一導電型を付与する不純物元素が添加された一対の不純物半導体層59、61の他方の端部が、第1の微結晶半導体層に重ならない構造の薄膜トランジスタである。
実施の形態1乃至実施の形態7においては、チャネルエッチ型の逆スタガ型薄膜トランジスタに関して示したが、実施の形態1乃至実施の形態7において、チャネル保護型の逆スタガ薄膜トランジスタを形成することができる。
本実施の形態では、図4に示すような、高速動作が可能であり、オン電流が高く、且つオフ電流の低い薄膜トランジスタの作製工程について示す。
本実施の形態では、図3に類似する、高速動作が可能であり、オン電流が高く、オフ電流の低い薄膜トランジスタの作製工程について示す。
本実施の形態では、図16に示す素子基板300の周辺部に設けられた走査線入力端子部と信号線入力端子部の構造について、図17を用いて以下に示す。図17に、基板01の周辺部に設けられた走査線入力端子部及び信号線入力端子部、並びに画素部の薄膜トランジスタの断面図を示す。
次に、本発明の一形態である表示パネルの構成について、以下に示す。
上記実施の形態により得られる素子基板、及びそれを用いた表示装置等によって、アクティブマトリクス型表示装置パネルに用いることができる。即ち、それらを表示部に組み込んだ電子機器全てに上記実施の形態を実施できる。
Claims (10)
- ゲート電極を被覆するゲート絶縁層と、
前記ゲート絶縁層上に設けられた第1の微結晶半導体層及び第2の微結晶半導体層と、 前記第1の微結晶半導体層、前記第2の微結晶半導体層及び前記ゲート絶縁層上に、第
3の微結晶半導体層と、
前記第3の微結晶半導体層上に非晶質半導体層と、
前記非晶質半導体層上にソース領域及びドレイン領域と、を有し、
前記第1の微結晶半導体層及び前記第2の微結晶半導体層はドナーとなる不純物元素を含み、
前記第3の微結晶半導体層は前記第1の微結晶半導体層と前記第2の微結晶半導体層との間で前記ゲート絶縁層と接し、
前記ゲート絶縁層は、前記第1の微結晶半導体層と前記第2の微結晶半導体層との間の第1の領域で第1の膜厚を有し、前記第1の微結晶半導体層又は前記第2の微結晶半導体層に接する第2の領域で第2の膜厚を有し、
前記第1の膜厚は前記第2の膜厚よりも薄いことを特徴とする薄膜トランジスタ。 - 請求項1において、前記第1の微結晶半導体層又は前記第2の微結晶半導体層と、前記
ゲート絶縁層との界面は、前記第3の微結晶半導体層と、前記非晶質半導体層との界面と
、同じ又は概略同じ高さであることを特徴とする薄膜トランジスタ。 - 請求項1において、前記第3の微結晶半導体層上の第4の微結晶半導体層を有し、前記
第4の微結晶半導体層はドナーとなる不純物元素を含み、
前記非晶質半導体層は前記第4の微結晶半導体層上に設けられることを特徴とする薄膜
トランジスタ。 - 請求項1において、前記第1の微結晶半導体層上の第1のバッファ層と、
前記第2の微結晶半導体層上の第2のバッファ層と、を有し、
前記第3の微結晶半導体層は前記第1のバッファ層及び前記第2のバッファ層を覆い、
前記第1のバッファ層は非晶質半導体層であり、
前記第2のバッファ層は非晶質半導体層であることを特徴とする薄膜トランジスタ。 - 請求項1において、前記第1の微結晶半導体層上の第1のバッファ層と、
前記第2の微結晶半導体層上の第2のバッファ層と、を有し、
前記第3の微結晶半導体層は前記第1のバッファ層及び前記第2のバッファ層を覆い、
前記第1のバッファ層は非晶質半導体層及び前記非晶質半導体層上の絶縁層からなり、
前記第2のバッファ層は非晶質半導体層及び前記非晶質半導体層上の絶縁層からなるこ
とを特徴とする薄膜トランジスタ。 - ゲート電極を被覆するゲート絶縁層と、
前記ゲート絶縁層上に設けられた第1の微結晶半導体層及び第2の微結晶半導体層と、 前記第1の微結晶半導体層、前記第2の微結晶半導体層及び前記ゲート絶縁層と重なる非晶質半導体層と、
前記非晶質半導体層上にソース領域及びドレイン領域と、を有し、
前記第1の微結晶半導体層及び前記第2の微結晶半導体層はドナーとなる不純物元素を含み、
前記非晶質半導体層は前記第1の微結晶半導体層と前記第2の微結晶半導体層との間で前記ゲート絶縁層と接し、
前記ゲート絶縁層は、前記第1の微結晶半導体層と前記第2の微結晶半導体層との間の
第1の領域で第1の膜厚を有し、前記第1の微結晶半導体層又は前記第2の微結晶半導体
層に接する第2の領域で第2の膜厚を有し、
前記第1の膜厚は前記第2の膜厚よりも小さいことを特徴とする薄膜トランジスタ。 - ゲート電極を被覆するゲート絶縁層と、
前記ゲート絶縁層上に設けられた第1の微結晶半導体層と、
前記第1の微結晶半導体層及び前記ゲート絶縁層と重なる第2の微結晶半導体層と、
前記第2の微結晶半導体層上に非晶質半導体層と、
前記非晶質半導体層上にソース領域及びドレイン領域と、を有し、
前記第1の微結晶半導体層はドナーとなる不純物元素を含み、
前記第2の微結晶半導体層は前記第1の微結晶半導体層の外側で前記ゲート絶縁層と接し、
前記ゲート絶縁層は、前記第1の微結晶半導体層と接する第1の領域で第1の膜厚を有し、前記第2の微結晶半導体層に接する第2の領域で第2の膜厚を有し、
前記第2の膜厚は前記第1の膜厚よりも小さいことを特徴とする薄膜トランジスタ。 - 請求項1乃至7のいずれか一項において、前記微結晶半導体層、前記第1の微結晶半
導体層、前記第2の微結晶半導体層、前記第3の微結晶半導体層、または前記第4の微結
晶半導体層は、微結晶シリコン層であることを特徴とする薄膜トランジスタ。 - 請求項1乃至8のいずれか一項において、前記非晶質半導体層は非晶質シリコン層で
あることを特徴とする薄膜トランジスタ。 - 請求項1乃至9のいずれか一項に記載の薄膜トランジスタが画素部の各画素に設けら
れていることを特徴とする表示装置。
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-
2009
- 2009-02-25 JP JP2009042436A patent/JP5411528B2/ja not_active Expired - Fee Related
- 2009-03-04 CN CN200910128138.9A patent/CN101540342B/zh not_active Expired - Fee Related
- 2009-03-05 US US12/398,295 patent/US8624321B2/en not_active Expired - Fee Related
- 2009-03-12 TW TW098108064A patent/TWI492386B/zh not_active IP Right Cessation
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Publication number | Publication date |
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TWI492386B (zh) | 2015-07-11 |
CN101540342A (zh) | 2009-09-23 |
TW201003922A (en) | 2010-01-16 |
JP2009260277A (ja) | 2009-11-05 |
US20090236600A1 (en) | 2009-09-24 |
CN101540342B (zh) | 2015-05-20 |
US8624321B2 (en) | 2014-01-07 |
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