JP5476315B2 - 光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法 - Google Patents

光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法 Download PDF

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JP5476315B2
JP5476315B2 JP2010537025A JP2010537025A JP5476315B2 JP 5476315 B2 JP5476315 B2 JP 5476315B2 JP 2010537025 A JP2010537025 A JP 2010537025A JP 2010537025 A JP2010537025 A JP 2010537025A JP 5476315 B2 JP5476315 B2 JP 5476315B2
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optical
ray
energy
optical device
optical system
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JP2011506929A (ja
JP2011506929A5 (enExample
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ホプキンズ，フォレスト・フランク
リー，スザンヌ・マデレーン
エディック，ピーター・マイケル
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General Electric Co
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General Electric Co
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/18—Windows, e.g. for X-ray transmission
    • H01J2235/183—Multi-layer structures

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
JP2010537025A 2007-12-07 2008-12-03 光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法 Expired - Fee Related JP5476315B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/952,498 US7742566B2 (en) 2007-12-07 2007-12-07 Multi-energy imaging system and method using optic devices
US11/952,498 2007-12-07
PCT/US2008/085312 WO2009076111A2 (en) 2007-12-07 2008-12-03 A multi-energy imaging system and method using optic devices

Publications (3)

Publication Number Publication Date
JP2011506929A JP2011506929A (ja) 2011-03-03
JP2011506929A5 JP2011506929A5 (enExample) 2013-01-31
JP5476315B2 true JP5476315B2 (ja) 2014-04-23

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JP2010537025A Expired - Fee Related JP5476315B2 (ja) 2007-12-07 2008-12-03 光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法

Country Status (4)

Country Link
US (1) US7742566B2 (enExample)
EP (1) EP2229682B1 (enExample)
JP (1) JP5476315B2 (enExample)
WO (1) WO2009076111A2 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100185319A1 (en) * 2004-01-12 2010-07-22 Titech Gmbh Device and Method for Separating Bulk Material
US9333577B2 (en) 2008-08-29 2016-05-10 General Electric Company Electro discharge machining apparatus and method
EP2342720A4 (en) * 2008-10-30 2012-06-06 Inspired Surgical Technologies Inc PROCESSOR OF X-RAY BEAMS
US8369674B2 (en) 2009-05-20 2013-02-05 General Electric Company Optimizing total internal reflection multilayer optics through material selection
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8483354B1 (en) * 2010-02-26 2013-07-09 Orbital Therapy Llc Reducing imaging artifacts
KR101430121B1 (ko) * 2010-04-06 2014-08-14 삼성전자주식회사 멀티-에너지 Ｘ－ｒａｙ 시스템의 영상 처리 장치 및 그 방법
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
FR2967887B1 (fr) * 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
CN102157216B (zh) * 2011-02-17 2012-11-21 浙江工业大学 Su-8材料镶嵌式二维聚焦x射线组合折射透镜的制作方法
CN102157217B (zh) * 2011-03-16 2013-01-16 浙江工业大学 抛物面型二维聚焦x射线组合折射透镜
US8761346B2 (en) * 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
EP2740127B1 (en) * 2011-08-06 2017-11-29 Rigaku Innovative Technologies, Inc. Nanotube based device for guiding x-ray photons and neutrons
US8693631B2 (en) * 2011-08-29 2014-04-08 General Electric Company Craser device, imaging system and method
US20130142312A1 (en) * 2011-12-02 2013-06-06 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
JP6016386B2 (ja) 2012-03-09 2016-10-26 キヤノン株式会社 Ｘ線光学装置
JP6108671B2 (ja) 2012-03-13 2017-04-05 キヤノン株式会社 放射線撮影装置
JP6016391B2 (ja) 2012-03-14 2016-10-26 キヤノン株式会社 Ｘ線光学装置及びその調整方法
CN103886928B (zh) * 2014-04-15 2017-01-11 西安石油大学 用于软X射线波段透射式Fibonacci薄膜透镜及其设计、制备方法
US10508998B2 (en) * 2014-05-08 2019-12-17 Lawrence Livermore National Security, Llc Methods for 2-color radiography with laser-compton X-ray sources
JP6397690B2 (ja) * 2014-08-11 2018-09-26 株式会社日立ハイテクノロジーズ Ｘ線透過検査装置及び異物検出方法
JP6533006B2 (ja) * 2015-07-14 2019-06-19 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 強化されたｘ線放射を用いた撮像
WO2017009363A1 (en) * 2015-07-14 2017-01-19 Koninklijke Philips N.V. Imaging with modulated x-ray radiation
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
CN108983334A (zh) * 2018-09-05 2018-12-11 中国科学院上海应用物理研究所 一种光子光闸装置
US11287585B2 (en) 2020-03-11 2022-03-29 Nubis Communications, Inc. Optical fiber-to-chip interconnection
US11071506B1 (en) * 2020-04-28 2021-07-27 Wisconsin Alumni Research Foundation X-ray imaging device providing enhanced spatial resolution by energy encoding
US12461321B2 (en) 2021-03-11 2025-11-04 Nubis Communications, Inc. Optical fiber-to-chip interconnection
US11982848B2 (en) 2021-03-11 2024-05-14 Nubis Communications, Inc. Optical fiber-to-chip interconnection
EP4305477A4 (en) * 2021-03-11 2025-03-05 Nubis Communications, Inc. FIBER-TO-CHIP CONNECTION
JP2023181859A (ja) * 2022-06-13 2023-12-25 キヤノン株式会社 放射線撮像装置、情報処理装置、情報処理方法及びプログラム

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189547A (ja) * 1984-10-08 1986-05-07 Rigaku Denki Kogyo Kk Ｘ線分光素子
US4684565A (en) * 1984-11-20 1987-08-04 Exxon Research And Engineering Company X-ray mirrors made from multi-layered material
JPH02210299A (ja) * 1989-02-10 1990-08-21 Olympus Optical Co Ltd Ｘ線用光学系及びそれに用いる多層膜反射鏡
JP2883122B2 (ja) * 1989-10-20 1999-04-19 オリンパス光学工業株式会社 Ｘ線顕微鏡
FR2665261A1 (fr) * 1990-07-24 1992-01-31 Philips Electronique Lab Dispositif de diffractometrie a rayons x et utilisation de ce dispositif.
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5497008A (en) * 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
US5175755A (en) * 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5216699A (en) * 1991-09-17 1993-06-01 Olympus Optical Co., Ltd. X-ray microscope
US6271534B1 (en) * 1994-07-08 2001-08-07 Muradin Abubekirovich Kumakhov Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles
US5570408A (en) * 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) * 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5745547A (en) * 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
CN1069136C (zh) * 1996-02-17 2001-08-01 北京师范大学 整体x光透镜及其制造方法及使用整体x光透镜的设备
JPH11352297A (ja) * 1998-06-11 1999-12-24 Rigaku Denki Kk Ｘ線分光素子
GB9815968D0 (en) * 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
US6389100B1 (en) * 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
RU2164361C1 (ru) * 1999-10-18 2001-03-20 Кумахов Мурадин Абубекирович Линза для управления излучением в виде потока нейтральных или заряженных частиц, способ изготовления таких линз и содержащее такие линзы аналитическое устройство, устройство для лучевой терапии и устройства для контактной и проекционной литографии
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
RU2187160C1 (ru) * 2000-12-29 2002-08-10 Кумахов Мурадин Абубекирович Устройство для рентгеновской литографии
ES2271277T3 (es) * 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
JP2003149392A (ja) * 2001-11-09 2003-05-21 Tohken Co Ltd Ｘ線増強反射板及びｘ線検査装置
WO2003049510A2 (en) * 2001-12-04 2003-06-12 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
US6782073B2 (en) * 2002-05-01 2004-08-24 Siemens Medical Solutions Usa, Inc. Planning system for convergent radiation treatment
US7120222B2 (en) * 2003-06-05 2006-10-10 General Electric Company CT imaging system with multiple peak x-ray source
US7440546B2 (en) * 2006-12-06 2008-10-21 Uchicago Argonne, Llc Method of making and structure of multilayer laue lens for focusing hard x-rays
US7412131B2 (en) * 2007-01-02 2008-08-12 General Electric Company Multilayer optic device and system and method for making same
US7366374B1 (en) * 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
US20090041198A1 (en) * 2007-08-07 2009-02-12 General Electric Company Highly collimated and temporally variable x-ray beams
US7508911B1 (en) * 2007-09-19 2009-03-24 General Electric Company X-ray imaging system and methods of using and forming an array of optic devices therein

Also Published As

Publication number Publication date
WO2009076111A2 (en) 2009-06-18
EP2229682A2 (en) 2010-09-22
JP2011506929A (ja) 2011-03-03
US20090147922A1 (en) 2009-06-11
EP2229682B1 (en) 2013-08-14
US7742566B2 (en) 2010-06-22
WO2009076111A3 (en) 2009-08-20

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