JP5476315B2 - 光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法 - Google Patents

光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法 Download PDF

Info

Publication number
JP5476315B2
JP5476315B2 JP2010537025A JP2010537025A JP5476315B2 JP 5476315 B2 JP5476315 B2 JP 5476315B2 JP 2010537025 A JP2010537025 A JP 2010537025A JP 2010537025 A JP2010537025 A JP 2010537025A JP 5476315 B2 JP5476315 B2 JP 5476315B2
Authority
JP
Japan
Prior art keywords
optical
ray
energy
optical device
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010537025A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011506929A (ja
JP2011506929A5 (enExample
Inventor
ホプキンズ，フォレスト・フランク
リー，スザンヌ・マデレーン
エディック，ピーター・マイケル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JP2011506929A publication Critical patent/JP2011506929A/ja
Publication of JP2011506929A5 publication Critical patent/JP2011506929A5/ja
Application granted granted Critical
Publication of JP5476315B2 publication Critical patent/JP5476315B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/18—Windows, e.g. for X-ray transmission
    • H01J2235/183—Multi-layer structures

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
JP2010537025A 2007-12-07 2008-12-03 光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法 Expired - Fee Related JP5476315B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/952,498 2007-12-07
US11/952,498 US7742566B2 (en) 2007-12-07 2007-12-07 Multi-energy imaging system and method using optic devices
PCT/US2008/085312 WO2009076111A2 (en) 2007-12-07 2008-12-03 A multi-energy imaging system and method using optic devices

Publications (3)

Publication Number Publication Date
JP2011506929A JP2011506929A (ja) 2011-03-03
JP2011506929A5 JP2011506929A5 (enExample) 2013-01-31
JP5476315B2 true JP5476315B2 (ja) 2014-04-23

Family

ID=40512437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010537025A Expired - Fee Related JP5476315B2 (ja) 2007-12-07 2008-12-03 光学アセンブリ、光学装置のアレイ、多重エネルギ・イメージング・システム及び方法

Country Status (4)

Country Link
US (1) US7742566B2 (enExample)
EP (1) EP2229682B1 (enExample)
JP (1) JP5476315B2 (enExample)
WO (1) WO2009076111A2 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100185319A1 (en) * 2004-01-12 2010-07-22 Titech Gmbh Device and Method for Separating Bulk Material
US9333577B2 (en) 2008-08-29 2016-05-10 General Electric Company Electro discharge machining apparatus and method
CN102282629A (zh) * 2008-10-30 2011-12-14 茵斯派德外科技术公司 X射线束处理器
US8369674B2 (en) * 2009-05-20 2013-02-05 General Electric Company Optimizing total internal reflection multilayer optics through material selection
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8483354B1 (en) * 2010-02-26 2013-07-09 Orbital Therapy Llc Reducing imaging artifacts
KR101430121B1 (ko) * 2010-04-06 2014-08-14 삼성전자주식회사 멀티-에너지 Ｘ－ｒａｙ 시스템의 영상 처리 장치 및 그 방법
US8311184B2 (en) * 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
FR2967887B1 (fr) * 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
US8744048B2 (en) * 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
CN102157216B (zh) * 2011-02-17 2012-11-21 浙江工业大学 Su-8材料镶嵌式二维聚焦x射线组合折射透镜的制作方法
CN102157217B (zh) * 2011-03-16 2013-01-16 浙江工业大学 抛物面型二维聚焦x射线组合折射透镜
US8761346B2 (en) * 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
JP6175436B2 (ja) * 2011-08-06 2017-08-02 リガク イノベイティブ テクノロジーズ インコーポレイテッド Ｘ線光子及び中性子を導くナノチューブ素材の装置
US8693631B2 (en) 2011-08-29 2014-04-08 General Electric Company Craser device, imaging system and method
US20130142312A1 (en) * 2011-12-02 2013-06-06 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
CN103137233A (zh) * 2011-12-02 2013-06-05 佳能株式会社 X射线波导和x射线波导系统
JP6016386B2 (ja) 2012-03-09 2016-10-26 キヤノン株式会社 Ｘ線光学装置
JP6108671B2 (ja) 2012-03-13 2017-04-05 キヤノン株式会社 放射線撮影装置
JP6016391B2 (ja) 2012-03-14 2016-10-26 キヤノン株式会社 Ｘ線光学装置及びその調整方法
CN103886928B (zh) * 2014-04-15 2017-01-11 西安石油大学 用于软X射线波段透射式Fibonacci薄膜透镜及其设计、制备方法
CN106488743B (zh) * 2014-05-08 2019-09-20 劳伦斯·利弗莫尔国家安全有限责任公司 使用激光康普顿x射线源的2色射线成像的方法
JP6397690B2 (ja) * 2014-08-11 2018-09-26 株式会社日立ハイテクノロジーズ Ｘ線透過検査装置及び異物検出方法
JP6533006B2 (ja) * 2015-07-14 2019-06-19 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 強化されたｘ線放射を用いた撮像
WO2017009363A1 (en) * 2015-07-14 2017-01-19 Koninklijke Philips N.V. Imaging with modulated x-ray radiation
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
CN108983334A (zh) * 2018-09-05 2018-12-11 中国科学院上海应用物理研究所 一种光子光闸装置
US11287585B2 (en) 2020-03-11 2022-03-29 Nubis Communications, Inc. Optical fiber-to-chip interconnection
US11071506B1 (en) * 2020-04-28 2021-07-27 Wisconsin Alumni Research Foundation X-ray imaging device providing enhanced spatial resolution by energy encoding
US12461321B2 (en) 2021-03-11 2025-11-04 Nubis Communications, Inc. Optical fiber-to-chip interconnection
EP4305477A4 (en) * 2021-03-11 2025-03-05 Nubis Communications, Inc. FIBER-TO-CHIP CONNECTION
US11982848B2 (en) 2021-03-11 2024-05-14 Nubis Communications, Inc. Optical fiber-to-chip interconnection
JP2023181859A (ja) * 2022-06-13 2023-12-25 キヤノン株式会社 放射線撮像装置、情報処理装置、情報処理方法及びプログラム

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189547A (ja) * 1984-10-08 1986-05-07 Rigaku Denki Kogyo Kk Ｘ線分光素子
US4684565A (en) 1984-11-20 1987-08-04 Exxon Research And Engineering Company X-ray mirrors made from multi-layered material
JPH02210299A (ja) * 1989-02-10 1990-08-21 Olympus Optical Co Ltd Ｘ線用光学系及びそれに用いる多層膜反射鏡
JP2883122B2 (ja) * 1989-10-20 1999-04-19 オリンパス光学工業株式会社 Ｘ線顕微鏡
FR2665261A1 (fr) * 1990-07-24 1992-01-31 Philips Electronique Lab Dispositif de diffractometrie a rayons x et utilisation de ce dispositif.
US5497008A (en) * 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
US5175755A (en) * 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5216699A (en) * 1991-09-17 1993-06-01 Olympus Optical Co., Ltd. X-ray microscope
US6271534B1 (en) * 1994-07-08 2001-08-07 Muradin Abubekirovich Kumakhov Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles
US5570408A (en) * 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5745547A (en) * 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
CN1069136C (zh) * 1996-02-17 2001-08-01 北京师范大学 整体x光透镜及其制造方法及使用整体x光透镜的设备
JPH11352297A (ja) * 1998-06-11 1999-12-24 Rigaku Denki Kk Ｘ線分光素子
GB9815968D0 (en) * 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
US6389100B1 (en) * 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
RU2164361C1 (ru) * 1999-10-18 2001-03-20 Кумахов Мурадин Абубекирович Линза для управления излучением в виде потока нейтральных или заряженных частиц, способ изготовления таких линз и содержащее такие линзы аналитическое устройство, устройство для лучевой терапии и устройства для контактной и проекционной литографии
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
RU2187160C1 (ru) * 2000-12-29 2002-08-10 Кумахов Мурадин Абубекирович Устройство для рентгеновской литографии
EP1402541B1 (en) 2001-06-19 2006-08-16 X-Ray Optical Systems, Inc. Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection
JP2003149392A (ja) * 2001-11-09 2003-05-21 Tohken Co Ltd Ｘ線増強反射板及びｘ線検査装置
AU2002364525A1 (en) * 2001-12-04 2003-06-17 X-Ray Optical Systems, Inc. X-ray fluorescence analyser for analysing fluid streams using a semiconductor-type detector and focusing means
US6782073B2 (en) * 2002-05-01 2004-08-24 Siemens Medical Solutions Usa, Inc. Planning system for convergent radiation treatment
US7120222B2 (en) * 2003-06-05 2006-10-10 General Electric Company CT imaging system with multiple peak x-ray source
US7440546B2 (en) * 2006-12-06 2008-10-21 Uchicago Argonne, Llc Method of making and structure of multilayer laue lens for focusing hard x-rays
US7412131B2 (en) 2007-01-02 2008-08-12 General Electric Company Multilayer optic device and system and method for making same
US7366374B1 (en) 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
US20090041198A1 (en) 2007-08-07 2009-02-12 General Electric Company Highly collimated and temporally variable x-ray beams
US7508911B1 (en) 2007-09-19 2009-03-24 General Electric Company X-ray imaging system and methods of using and forming an array of optic devices therein

Also Published As

Publication number Publication date
EP2229682A2 (en) 2010-09-22
JP2011506929A (ja) 2011-03-03
WO2009076111A3 (en) 2009-08-20
WO2009076111A2 (en) 2009-06-18
US7742566B2 (en) 2010-06-22
US20090147922A1 (en) 2009-06-11
EP2229682B1 (en) 2013-08-14

Similar Documents

Publication Publication Date Title
JP2011506929A (ja) 光学装置を用いた多重エネルギ・イメージング・システム及び方法
JP5923257B2 (ja) 勾配付き多層光学装置を用いたファン形ｘ線ビーム・イメージング・システム
US8208602B2 (en) High flux photon beams using optic devices
US7508911B1 (en) X-ray imaging system and methods of using and forming an array of optic devices therein
US10416099B2 (en) Method of performing X-ray spectroscopy and X-ray absorption spectrometer system
JP7171190B2 (ja) 線源－検出器装置
JP3090471B2 (ja) 粒子、ｘ線およびガンマ線量子のビーム制御装置
US7366374B1 (en) Multilayer optic device and an imaging system and method using same
US7412131B2 (en) Multilayer optic device and system and method for making same
CN101011250A (zh) X射线设备的用于产生相位对比照片的焦点－检测器装置
JPS63501735A (ja) 改良されたｘ線減衰方法および装置
US20080075230A1 (en) Compact e-beam source for generating X-rays
US20200080947A1 (en) X-ray CT microscopy system and method utilizing lattice sampling
US20070030947A1 (en) X-ray device with improved efficiency
JP7023897B2 (ja) Ｘ線装置及びその操作方法
EP3602020A1 (en) Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
US10925556B2 (en) Imaging with modulated X-ray radiation
JP2025500052A (ja) 分光学的に整形するｘ線光学デバイスとスペクトルフィルタ開口デバイスとを含むｘ線照射装置、蛍光ｘ線イメージング装置、及び特に蛍光ｘ線イメージングにおけるその応用
Troussel et al. Development of supermirrors for high-resolution x-ray LMJ microscopes

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111201

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111201

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121203

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130913

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130924

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131106

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140114

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140207

R150 Certificate of patent or registration of utility model

Ref document number: 5476315

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees