JP5430038B2 - ホールセンサ - Google Patents
ホールセンサ Download PDFInfo
- Publication number
- JP5430038B2 JP5430038B2 JP2012156700A JP2012156700A JP5430038B2 JP 5430038 B2 JP5430038 B2 JP 5430038B2 JP 2012156700 A JP2012156700 A JP 2012156700A JP 2012156700 A JP2012156700 A JP 2012156700A JP 5430038 B2 JP5430038 B2 JP 5430038B2
- Authority
- JP
- Japan
- Prior art keywords
- connection contact
- hall element
- hall
- connection
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000009987 spinning Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005426 magnetic field effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/066—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices field-effect magnetic sensors, e.g. magnetic transistor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
- G01R33/077—Vertical Hall-effect devices
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
Description
C2 …第2の接続点
C3 …第3の接続点
C4 …第4の接続点
VB1 …供給電圧
VB2 …基準電位
VH1 …ホール電圧
VH2 …ホール電圧
10 …ホールセンサ
100 …接点領域
110 …n窪み領域
120 …半導体本体
130 …絶縁領域
20 …ホール素子
23 …第1の接続接点
26 …第2の接続接点
29 …第3の接続接点
30 …ホール素子
33 …第4の接続接点
36 …第5の接続接点
39 …第6の接続接点
40 …ホール素子
43 …第7の接続接点
46 …第8の接続接点
49 …第9の接続接点
50 …ホール素子
53 …第10の接続接点
56 …第11の接続接点
59 …第12の接続接点
Claims (9)
- ホールセンサ(10)であって、
−第1の接続接点(23)および第2の接続接点(26)および第3の接続接点(29)を備える第1のホール素子(20)と、
−第4の接続接点(33)および第5の接続接点(36)および第6の接続接点(39)を備える第2のホール素子(30)と、
−第7の接続接点(43)および第8の接続接点(46)および第9の接続接点(49)を備える第3のホール素子(40)と、
−第10の接続接点(53)および第11の接続接点(56)および第12の接続接点(59)を備える第4のホール素子(50)と、を有している、そのようなホールセンサにおいて、
4つのホール素子の各々は中央の接続接点の回りに配置された少なくとも2つの接続接点を有しており、中央の接続接点の回りに配置された接続接点は、その次のホール素子の中央の接続接点の回りに配置された接続接点と配線されており、それにより、
第1のホール素子(20)および第2のホール素子(30)および第3のホール素子(40)および第4のホール素子(50)は直列につながれており、閉じたリングが生起されるように、列の最後のホール素子が列の最初のホール素子と配線されていることを特徴とするホールセンサ。 - 第2の接続接点(26)および第5の接続接点(36)および第8の接続接点(46)および第11の接続接点(56)はそれぞれ供給電圧端子またはホール電圧ピックアップ部として構成されていることを特徴とする、請求項1に記載のホールセンサ(10)。
- 第1の接続接点(23)は第12の接続接点(59)と接続されていることを特徴とする、請求項1または請求項2に記載のホールセンサ(10)。
- 第3の接続接点(29)は第4の接続接点(33)と配線されており、第6の接続接点(39)は第7の接続接点(43)と配線されており、第9の接続接点(49)は第10の接続接点(53)と配線されていることを特徴とする、請求項1〜3のうちいずれか1項に記載のホールセンサ(10)。
- 第1のホール素子(20)から第4のホール素子(50)では3つの接続接点がそれぞれ1本の直線上に配置されており、前記直線は好ましくは互いに平行に配置されていることを特徴とする、請求項1〜4のうちいずれか1項に記載のホールセンサ(10)。
- 第1のホール素子(20)から第4のホール素子(50)の接続接点は1本の共通の直線上に配置されていることを特徴とする、請求項1〜5のうちいずれか1項に記載のホールセンサ(10)。
- 第1のホール素子(20)から第4のホール素子(50)は1つの半導体本体(120)でそれぞれ垂直型のホール素子として構成されていることを特徴とする、請求項1〜6のうちいずれか1項に記載のホールセンサ(10)。
- 導体本体(120)の上には集積回路が構成されていることを特徴とする請求項7に記載のホールセンサ(10)。
- 第1のホール素子(20)および第2のホール素子(30)および第3のホール素子(40)および第4のホール素子(50)および集積回路は電気接続されており、ただ1つの共通のハウジングの中に配置されていることを特徴とする、請求項8に記載のホールセンサ(10)。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011107767.0 | 2011-07-15 | ||
DE102011107767A DE102011107767A1 (de) | 2011-07-15 | 2011-07-15 | Hallsensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013024871A JP2013024871A (ja) | 2013-02-04 |
JP5430038B2 true JP5430038B2 (ja) | 2014-02-26 |
Family
ID=46581681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012156700A Active JP5430038B2 (ja) | 2011-07-15 | 2012-07-12 | ホールセンサ |
Country Status (5)
Country | Link |
---|---|
US (1) | US9097753B2 (ja) |
EP (1) | EP2546670B1 (ja) |
JP (1) | JP5430038B2 (ja) |
CN (1) | CN102881818B (ja) |
DE (1) | DE102011107767A1 (ja) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8901923B2 (en) * | 2011-06-03 | 2014-12-02 | Micronas Gmbh | Magnetic field sensor |
US8988072B2 (en) | 2011-07-21 | 2015-03-24 | Infineon Technologies Ag | Vertical hall sensor with high electrical symmetry |
US9007060B2 (en) | 2011-07-21 | 2015-04-14 | Infineon Technologies Ag | Electronic device with ring-connected hall effect regions |
US9103868B2 (en) | 2011-09-15 | 2015-08-11 | Infineon Technologies Ag | Vertical hall sensors |
DE102012216388A1 (de) | 2011-09-16 | 2013-03-21 | Infineon Technologies Ag | Hall-sensoren mit erfassungsknoten mit signaleinprägung |
US8922207B2 (en) | 2011-11-17 | 2014-12-30 | Infineon Technologies Ag | Electronic device comprising hall effect region with three contacts |
US9312472B2 (en) | 2012-02-20 | 2016-04-12 | Infineon Technologies Ag | Vertical hall device with electrical 180 degree symmetry |
US9274183B2 (en) | 2012-06-22 | 2016-03-01 | Infineon Technologies Ag | Vertical hall device comprising first and second contact interconnections |
US8981504B2 (en) * | 2012-06-22 | 2015-03-17 | Infineon Technologies Ag | Vertical hall sensor with series-connected hall effect regions |
US8723515B2 (en) | 2012-07-05 | 2014-05-13 | Infineon Technologies Ag | Vertical hall sensor circuit comprising stress compensation circuit |
US9018948B2 (en) | 2012-07-26 | 2015-04-28 | Infineon Technologies Ag | Hall sensors and sensing methods |
US9170307B2 (en) | 2012-09-26 | 2015-10-27 | Infineon Technologies Ag | Hall sensors and sensing methods |
EP2778704B1 (en) * | 2013-03-11 | 2015-09-16 | Ams Ag | Magnetic field sensor system |
US10456030B2 (en) * | 2013-07-29 | 2019-10-29 | Bioptigen, Inc. | Procedural optical coherence tomography (OCT) for surgery and related methods |
DE102013018370A1 (de) * | 2013-10-29 | 2015-04-30 | Micronas Gmbh | Hallsensorvorrichtung |
CN104749393B (zh) * | 2013-12-31 | 2019-08-20 | 森萨塔科技麻省公司 | 一种霍尔传感器装置及其制造方法 |
US9547048B2 (en) * | 2014-01-14 | 2017-01-17 | Allegro Micosystems, LLC | Circuit and method for reducing an offset component of a plurality of vertical hall elements arranged in a circle |
US9316705B2 (en) | 2014-05-09 | 2016-04-19 | Infineon Technologies Ag | Vertical hall effect-device |
US9425385B2 (en) | 2014-05-09 | 2016-08-23 | Infineon Technologies Ag | Vertical hall effect device |
US9279864B2 (en) | 2014-05-16 | 2016-03-08 | Infineon Technologies Ag | Sensor device and sensor arrangement |
DE102014007208B3 (de) * | 2014-05-19 | 2015-04-23 | Micronas Gmbh | Hallsensor mit mehreren Hallelementen |
EP2963435B1 (en) | 2014-07-01 | 2017-01-25 | Nxp B.V. | Differential lateral magnetic field sensor system with offset cancelling and implemented using silicon-on-insulator technology |
DE102014010547B4 (de) | 2014-07-14 | 2023-06-07 | Albert-Ludwigs-Universität Freiburg | Hallsensor |
US9671474B2 (en) | 2014-10-03 | 2017-06-06 | Infineon Technologies Ag | Three 3-contact vertical hall sensor elements connected in a ring and related devices, systems, and methods |
GB2531536A (en) | 2014-10-21 | 2016-04-27 | Melexis Technologies Nv | Vertical hall sensors with reduced offset error |
US9651635B2 (en) | 2014-11-05 | 2017-05-16 | Infineon Technologies Ag | Bias circuit for stacked hall devices |
US9766303B2 (en) | 2014-11-18 | 2017-09-19 | Infineon Technologies Ag | Systems and arrangements of three-contact hall-effect devices and related methods |
WO2016099051A1 (ko) | 2014-12-19 | 2016-06-23 | 엘지이노텍(주) | 렌즈 구동장치 |
DE102015001064B4 (de) | 2015-01-30 | 2021-04-08 | Tdk-Micronas Gmbh | Verfahren zum Aufwecken einer Magnetfeldsensorvorrichtung und eine Magnetfeldsensorvorrichtung |
CN106153081A (zh) * | 2015-06-29 | 2016-11-23 | 苏州森特克测控技术有限公司 | 一种霍尔基片连接结构及霍尔集成传感器芯片 |
CN107015047B (zh) * | 2017-04-13 | 2019-10-15 | 国网重庆市电力公司电力科学研究院 | 一种无铁芯霍尔电流传感器 |
CN107436416B (zh) * | 2017-08-28 | 2020-05-19 | 上海麦歌恩微电子股份有限公司 | 能处理垂直霍尔盘信号的磁开关系统及信号处理方法 |
DE102019003481B3 (de) | 2019-05-16 | 2020-06-18 | Tdk-Micronas Gmbh | Hallsensorstruktur |
DE102019004060B3 (de) | 2019-06-11 | 2020-05-07 | Tdk-Micronas Gmbh | lsolierte Hallsensorstruktur |
DE102019004599B4 (de) | 2019-07-04 | 2021-01-14 | Tdk-Micronas Gmbh | Vertikale Hallsensorstruktur, Betrieb derselben und vertikaler Hallsensor |
US11372061B2 (en) | 2020-03-13 | 2022-06-28 | Globalfoundries Singapore Pte. Ltd. | Hall effect sensor devices and methods of forming hall effect sensor devices |
US11333718B2 (en) | 2020-04-15 | 2022-05-17 | Allegro Microsystems, Llc | Sensors having dynamic phase compensation |
US11802922B2 (en) | 2021-01-13 | 2023-10-31 | Allegro Microsystems, Llc | Circuit for reducing an offset component of a plurality of vertical hall elements arranged in one or more circles |
CN113759295A (zh) * | 2021-08-06 | 2021-12-07 | 苏州矩阵光电有限公司 | 集成式霍尔磁传感器及其制造方法 |
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JPS58154263A (ja) * | 1982-03-09 | 1983-09-13 | Seiko Instr & Electronics Ltd | ホ−ルic |
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DE102011101604B4 (de) * | 2010-06-02 | 2016-06-09 | Albert-Ludwigs-Universität Freiburg | Magnetfeldsensor |
US8896303B2 (en) * | 2011-02-08 | 2014-11-25 | Infineon Technologies Ag | Low offset vertical Hall device and current spinning method |
DE102011017096A1 (de) * | 2011-04-14 | 2012-10-18 | Austriamicrosystems Ag | Hall-Sensor-Halbleiterbauelement und Verfahren zum Betrieb des Hall-Sensor-Halbleiterbauelementes |
US9007060B2 (en) * | 2011-07-21 | 2015-04-14 | Infineon Technologies Ag | Electronic device with ring-connected hall effect regions |
DE102011115566A1 (de) * | 2011-10-10 | 2013-04-11 | Austriamicrosystems Ag | Hall-Sensor |
US8981504B2 (en) * | 2012-06-22 | 2015-03-17 | Infineon Technologies Ag | Vertical hall sensor with series-connected hall effect regions |
-
2011
- 2011-07-15 DE DE102011107767A patent/DE102011107767A1/de not_active Withdrawn
-
2012
- 2012-07-02 EP EP12004922.6A patent/EP2546670B1/de active Active
- 2012-07-05 US US13/542,465 patent/US9097753B2/en active Active
- 2012-07-12 JP JP2012156700A patent/JP5430038B2/ja active Active
- 2012-07-13 CN CN201210243984.7A patent/CN102881818B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
US9097753B2 (en) | 2015-08-04 |
CN102881818A (zh) | 2013-01-16 |
JP2013024871A (ja) | 2013-02-04 |
US20130015853A1 (en) | 2013-01-17 |
EP2546670B1 (de) | 2016-11-30 |
EP2546670A3 (de) | 2015-10-28 |
DE102011107767A1 (de) | 2013-01-17 |
EP2546670A2 (de) | 2013-01-16 |
CN102881818B (zh) | 2014-12-17 |
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