JP5415696B2 - 機能が向上された厚膜超伝導フィルム - Google Patents

機能が向上された厚膜超伝導フィルム Download PDF

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JP5415696B2
JP5415696B2 JP2007534868A JP2007534868A JP5415696B2 JP 5415696 B2 JP5415696 B2 JP 5415696B2 JP 2007534868 A JP2007534868 A JP 2007534868A JP 2007534868 A JP2007534868 A JP 2007534868A JP 5415696 B2 JP5415696 B2 JP 5415696B2
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copper
film
alkaline earth
precursor
precursor solution
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Japanese (ja)
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JP2008514545A (ja
JP2008514545A5 (enExample
Inventor
リー，イャオピン
コデンカンダス，トーマス
シーガル，エドワード，ジェー．
ツァン，ウェイ
ルピッチ，マーティン，ダブリュー．
ハン，イービン
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アメリカン・スーパーコンダクター・コーポレーション
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Priority claimed from PCT/US2005/035521 external-priority patent/WO2006137898A2/en
Publication of JP2008514545A publication Critical patent/JP2008514545A/ja
Publication of JP2008514545A5 publication Critical patent/JP2008514545A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2007534868A 2004-10-01 2005-09-30 機能が向上された厚膜超伝導フィルム Expired - Lifetime JP5415696B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US61528904P 2004-10-01 2004-10-01
US60/615,289 2004-10-01
US70383605P 2005-07-29 2005-07-29
US60/703,836 2005-07-29
PCT/US2005/035521 WO2006137898A2 (en) 2004-10-01 2005-09-30 Thick superconductor films with improved performance

Publications (3)

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JP2008514545A JP2008514545A (ja) 2008-05-08
JP2008514545A5 JP2008514545A5 (enExample) 2013-08-22
JP5415696B2 true JP5415696B2 (ja) 2014-02-12

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JP2007534868A Expired - Lifetime JP5415696B2 (ja) 2004-10-01 2005-09-30 機能が向上された厚膜超伝導フィルム

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JP (1) JP5415696B2 (enExample)
KR (1) KR100910601B1 (enExample)
CN (1) CN101258618B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5562615B2 (ja) * 2009-11-24 2014-07-30 公益財団法人国際超電導産業技術研究センター 希土類系酸化物超電導線材の製造方法
JP5273561B2 (ja) * 2009-12-09 2013-08-28 独立行政法人産業技術総合研究所 超電導膜の製造方法
WO2011071103A1 (ja) * 2009-12-09 2011-06-16 独立行政法人産業技術総合研究所 希土類超電導膜形成用溶液およびその製造方法
CN102568694A (zh) * 2010-12-23 2012-07-11 吴仕驹 高温超导体及其制备方法
CN102255041B (zh) * 2011-07-13 2013-07-03 中国科学院电工研究所 一种ybco超导薄膜的制备方法
CN102584204A (zh) * 2012-02-12 2012-07-18 中国科学院电工研究所 一种ybco超导复合薄膜的制备方法
KR20160006829A (ko) 2014-07-09 2016-01-20 서울대학교산학협력단 초전도체, 초전도 선재, 및 초전도체 형성방법
KR102019615B1 (ko) * 2015-08-26 2019-09-06 아메리칸 수퍼컨덕터 코포레이션 균일한 이온 주입식 피닝 마이크로구조를 갖는 긴 길이의 고온 초전도 와이어
KR101719266B1 (ko) * 2016-06-27 2017-04-06 서울대학교산학협력단 초전도체, 초전도 선재, 및 초전도체 형성방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01160857A (ja) * 1987-12-18 1989-06-23 Mitsui Mining & Smelting Co Ltd 超伝導セラミックスおよびその製造法
JPH01219019A (ja) * 1988-02-29 1989-09-01 Nec Corp 酸化物超伝導体膜の製造方法
US5231074A (en) * 1990-04-17 1993-07-27 Massachusetts Institute Of Technology Preparation of highly textured oxide superconducting films from mod precursor solutions
CA2295194A1 (en) * 1997-06-18 1998-12-23 John A. Smith Controlled conversion of metal oxyfluorides into superconducting oxides
CN1364321B (zh) * 1999-07-23 2010-06-02 美国超导体公司 多层制品及其制造方法
DE60031784T2 (de) * 1999-07-23 2007-09-06 American Superconductor Corp., Westborough Verbesserte hochtemperatursupraleiter-beschichtete elemente
EP1198848A1 (en) * 1999-07-23 2002-04-24 American Superconductor Corporation Coated conductor thick film precursor
US6332967B1 (en) 1999-11-23 2001-12-25 Midwest Research Institute Electro-deposition of superconductor oxide films
JP3548801B2 (ja) * 2001-03-27 2004-07-28 独立行政法人産業技術総合研究所 特定の金属種に特定の配位子を配位させた金属錯体を含む溶液組成物、希土類超電導膜製造用溶液組成物、特定金属錯体の非結晶固形物、特定の金属種に特定の配位子を配位させた金属錯体を含む溶液の製造方法、希土類超電導膜製造用溶液の製造方法、及び超電導薄膜の形成方法。
JP4771632B2 (ja) * 2001-10-12 2011-09-14 富士通株式会社 高温超伝導体膜の形成方法
JP3851948B2 (ja) * 2002-05-10 2006-11-29 独立行政法人産業技術総合研究所 超電導体の製造方法
JP2004155618A (ja) * 2002-11-07 2004-06-03 Hitachi Ltd 酸化物系超伝導部材とその製造方法

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Publication number Publication date
KR100910601B1 (ko) 2009-08-03
JP2008514545A (ja) 2008-05-08
KR20070093050A (ko) 2007-09-17
CN101258618B (zh) 2010-04-14
CN101258618A (zh) 2008-09-03

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