JP5413632B2 - Wiring board - Google Patents
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- JP5413632B2 JP5413632B2 JP2007055699A JP2007055699A JP5413632B2 JP 5413632 B2 JP5413632 B2 JP 5413632B2 JP 2007055699 A JP2007055699 A JP 2007055699A JP 2007055699 A JP2007055699 A JP 2007055699A JP 5413632 B2 JP5413632 B2 JP 5413632B2
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- 230000002093 peripheral effect Effects 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 28
- 239000011889 copper foil Substances 0.000 description 19
- 239000010410 layer Substances 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 239000004020 conductor Substances 0.000 description 8
- 238000007747 plating Methods 0.000 description 8
- 238000005553 drilling Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Description
本発明は、回路を有した配線板に関し、特に、回路加工を行う際のガイド孔を有したものに関する。 The present invention relates to a wiring board having a circuit, and particularly to a wiring board having a guide hole for circuit processing.
配線板の回路加工において、近年レーザーを使用したものが増えてきている。
また、配線板は、高密度化、高多層化への要求が強く、1層あたりの厚みも薄いものが多く使用される。
In the circuit processing of wiring boards, those using lasers have been increasing in recent years.
In addition, there is a strong demand for higher density and higher multi-layered wiring boards, and a thin wiring board is often used.
図1は、薄くてかつ非貫通穴を有する配線板を作成する製造工程を説明する概略工程図である。
図1(a)に示すように、非貫通穴を有する薄い配線板を作成するには、先ず両面に銅箔2、3を有した薄い銅張積層板1の片側の銅箔2をレーザー加工マスクとして利用するため、非貫通穴が配置される位置をエッチングにより除去する。
FIG. 1 is a schematic process diagram illustrating a manufacturing process for creating a thin wiring board having a non-through hole.
As shown in FIG. 1 (a), in order to produce a thin wiring board having non-through holes, first, a copper foil 2 on one side of a thin copper
その次に図1(b)に示すように、銅箔2の銅を部分的に除去し、樹脂面が露出している部分へ炭酸ガスレーザーを照射して、銅張積層板の基材部分を燃焼分解して除去することにより非貫通穴4、5を形成する。
Next, as shown in FIG. 1 (b), the copper of the copper foil 2 is partially removed, and the portion where the resin surface is exposed is irradiated with a carbon dioxide gas laser, so that the base material portion of the copper clad laminate is obtained. The
そして、図1(c)に示すように、無電解銅めっき及び電解銅めっき処理をして表裏の回路導体を接続する非貫通穴4、5の内壁及び銅箔表面にめっき導体6を施し、その後外層銅箔(外層導体)をエッチングにより除去し回路形成することにより、図1(d)のような非貫通穴4、5を有する薄い配線板7を得ることができる。
And as shown in FIG.1 (c), the electroconductive copper plating and the electrolytic copper plating process are performed, and the plating conductor 6 is given to the inner wall and copper foil surface of the non-through-
図1(d)にて示す回路形成の前の状態の図1(b)などは、片側の銅箔2のみエッチングや穴あけ加工されているため、回路形成の基準となるパターンや穴の形成は可能であるが、銅箔3側には基準となるパターンや穴を作製することができない。 In FIG. 1 (b) and the like before the circuit formation shown in FIG. 1 (d), only the copper foil 2 on one side is etched or drilled. Although it is possible, a reference pattern or hole cannot be formed on the copper foil 3 side.
銅箔3側も図1(d)回路形成時には、やはり基準となるものが必用であるため、図1(e)に示すように、銅箔2側の回路配置(製品)領域8と外周部9に、レーザーを用いて加工した非貫通穴10、11を画像認識させて、図1(f)に示すように、それと同心円の貫通孔12、13を設けて、銅箔2、3側共通の基準孔とすることで解決できる。
As shown in FIG. 1E, the circuit arrangement (product) region 8 and the outer peripheral portion on the copper foil 2 side are also necessary for the copper foil 3 side as shown in FIG. 9, the
ここで設けるガイド孔は、先に設けてある銅箔2側の回路形成領域の非貫通穴4、5と同工程で穴あけされた非貫通穴10、11を画像認識させて、回路形成基準孔12、13を設けているので、配線板7の表裏での回路位置整合及び、非貫通穴4、5と外層回路で高い位置合わせ精度を得ることが可能となる。
しかしながら、図1(e)に示すものは、最初の回路加工を行う際に、識別力の高い貫通したガイド孔を設けることができないため、識別力の低い非貫通のガイド穴を使用することとなる。
このガイド穴は、図1(e)に非貫通穴10、11として示すように、レーザー加工にてあけた1つの窪みであり、微細配線への要求の高まりから、より高い識別力を有するものが望まれている。
However, the one shown in FIG. 1 (e) uses a non-penetrating guide hole with low discriminating power because it is not possible to provide a penetrating guide hole with high discriminating power when performing the first circuit processing. Become.
As shown as
本発明は、非貫通でありながら高い識別力を有するガイドを有し、位置精度の高い配線板を提供することを目的とする。 An object of the present invention is to provide a wiring board having a high positional accuracy, having a guide having a high discrimination power while being non-penetrating.
本発明は、以下のものに関する。
(1)回路配置領域と、この回路配置領域内の非貫通穴と同時に加工され、非貫通穴同士が重なりを有するように全体として円を描きその円と相似形の大なる円を設けて同芯円形状となるように前記回路配置領域の外周部に設けられる複数の非貫通穴と、この複数の非貫通穴を基準として前記複数の非貫通穴の中心を貫通加工され、前記回路配置領域の外周部に設けられるガイド孔とを備え、前記回路配置領域の外周部に設けられる複数の非貫通穴を基準として前記複数の非貫通穴の中心を貫通加工されるガイド孔が、前記複数の非貫通穴を設けた個々の非貫通穴の最外点を結んだ集合領域内に設けられる配線板。
(2)項(1)に記載された配線板において、複数の非貫通穴が、隣接する非貫通穴との間に一定ピッチで離間を有する配線板。
The present invention relates to the following.
(1) A circuit arrangement area and a non-through hole in the circuit arrangement area are processed at the same time, and a circle is drawn as a whole so that the non-through holes overlap each other. A plurality of non-through holes provided in an outer peripheral portion of the circuit arrangement region so as to have a core circle shape, and the centers of the plurality of non-through holes are processed through the plurality of non-through holes, and the circuit arrangement region A guide hole provided in an outer peripheral portion of the circuit arrangement region, and a guide hole that is formed through the center of the plurality of non-through holes on the basis of the plurality of non-through holes provided in the outer peripheral portion of the circuit arrangement region. A wiring board provided in a collective region connecting outermost points of individual non-through holes provided with non-through holes .
(2) The wiring board according to item (1), wherein the plurality of non-through holes are spaced apart from each other by a constant pitch.
本発明によれば、回路形成領域の製品の層間接続のための非貫通穴と、それと同時に加工された回路形成領域外周部の複数の非貫通穴を認識して孔あけされた貫通のガイド孔を使用して回路形成することにより、従来ひとつの非貫通穴を認識し孔あけされた貫通ガイド孔を用いるより、任意の大きさや形状の非貫通穴を認識することにより認識精度が向上し、表裏ともに非貫通の層間接続穴と回路の合せがよく、より高密度の配線板が得られる。
また、ガイド孔が、その面積を複数の非貫通穴の集合領域よりも狭くした場合は、貫通のガイド孔を加工後に、規則正しく配列した非貫通穴と貫通孔あけしたガイド孔の位置関係を比較して、孔あけ精度の確認が可能である。
更に、複数の非貫通穴が、隣接する非貫通穴との間にある一定のピッチで離間を有する場合は、複数の凹みと突起が密集することによりコントラストが向上し、大きなひとつの穴(凹み)を画像認識するより、認識精度が向上し、より精度の良いガイド孔が得られる。
According to the present invention, a non-through hole for interlayer connection of products in a circuit forming region and a through guide hole formed by recognizing a plurality of non-through holes in the outer periphery of the circuit forming region processed at the same time By using this to form a circuit, the recognition accuracy is improved by recognizing a non-through hole of any size and shape, rather than using a through guide hole that has been perforated by recognizing a single non-through hole. The front and back surfaces are well aligned with the non-penetrating interlayer connection holes and a higher density wiring board can be obtained.
In addition, when the guide hole has a smaller area than the collection area of multiple non-through holes, the positional relationship between the non-through holes that are regularly arranged and the guide holes that are drilled through is compared after processing the guide holes. Thus, it is possible to check the drilling accuracy.
Furthermore, when a plurality of non-through holes are spaced at a certain pitch between adjacent non-through holes, the plurality of dents and protrusions close together to improve the contrast, and a large single hole (dent ) Is recognized more accurately, and a guide hole with higher accuracy can be obtained.
本発明にて述べる回路配置領域とは、回路を形成する領域を意味し、より具体的には、最も外側となる回路を含みそれよりも内側の領域全てを回路配置領域としている。
回路配置領域は、配線板内に複数に分離して配置されていても良い。その複数の回路配置領域は、基板の端部から10mm程度離れた箇所に均一に配置されるのが望ましい。
また、後述するガイド孔を設けるのに必要な画像認識される非貫通穴は、回路形成領域の製品接続のための非貫通穴と同様の工程で穴あけされた穴であるのが良い。
The circuit arrangement area described in the present invention means an area in which a circuit is formed. More specifically, the circuit arrangement area includes the outermost circuit and the entire inner area.
The circuit arrangement area may be divided into a plurality of areas in the wiring board. It is desirable that the plurality of circuit arrangement regions are uniformly arranged at a location about 10 mm away from the edge of the substrate.
Further, the non-through hole for image recognition necessary for providing a guide hole to be described later is preferably a hole formed in the same process as the non-through hole for product connection in the circuit formation region.
本発明にて述べる外周部とは、先に述べた回路配置領域よりも外側となる部分全てを意味している。
外周部は、各種ガイド孔あるいはガイド穴が配置される場所であって、基板端部の歪みなどの影響を受けるため、なるべく端部からの距離が均一の幅であることがのぞましい。
The outer peripheral portion described in the present invention means all portions outside the circuit arrangement region described above.
The outer peripheral portion is a place where various guide holes or guide holes are arranged, and is affected by distortion of the end portion of the substrate. Therefore, it is preferable that the distance from the end portion is as uniform as possible.
本発明にて述べるガイド孔は、貫通した孔であり、孔あけ方法については特に限定されず、具体的にはドリル加工により行うことができる。
ガイド孔は、先に述べた外周部に設けられるものであり、回路配置領域とは別の領域に存在させる。
また、ガイド孔は、先に設けてある複数の非貫通穴(ガイド穴)を認識した後に設けられるものであり、この認識は、画像認識により行っても、孔あけ加工者が自ら視認して行っても良い。即ち、ガイド孔は、非貫通穴を基準として設けられれば良い。
The guide hole described in the present invention is a through hole, and the drilling method is not particularly limited, and can be specifically performed by drilling.
The guide hole is provided in the outer peripheral portion described above and is present in a region different from the circuit arrangement region.
In addition, the guide hole is provided after recognizing a plurality of non-through holes (guide holes) provided in advance, and even if this recognition is performed by image recognition, the hole puncher himself / herself visually recognizes it. You can go. That is, the guide hole may be provided with reference to the non-through hole.
本発明にて述べる非貫通穴は、この非貫通穴を設けた面の回路加工を行う際の基準になるものであり、複数の穴より形成されるものであれば良い。
より具体的には、図2に示すように、非貫通穴14同士が、重なりを有するようにし、全体として斜めにした正方形の形状となるようにしたもの、図3に示すように、非貫通穴14同士が、重なりを有するようにし、全体として円を描き、その円と相似形の大なる円を設けて同芯円形状とすること等ができる。
非貫通穴の大きさは、特に限定されるものでなく、複数の非貫通穴の全てが、必ずしも同じ大きさである必用もない。
但し、非貫通穴の大きさは、非貫通穴を設ける際の加工条件を変更する必用がないことから、全て同じにし、形状も同じとすることが好ましい。
また、非貫通穴は、金属層をストッパーとして使用することができることから、レーザー加工により行うことが、ドリル加工を行うよりも加工が容易であり好ましい。
更に、非貫通穴の大きさは、なるべく大きい方が加工コストを省けるので望ましいものの、その非貫通穴を形成する絶縁層の厚みにより、ガイド孔を加工する際の認識精度が変化するので、適宜設定するのが良い。
The non-through hole described in the present invention serves as a reference when performing circuit processing on the surface provided with the non-through hole, and may be formed from a plurality of holes.
More specifically, as shown in FIG. 2, the
The size of the non-through hole is not particularly limited, and it is not always necessary that all of the plurality of non-through holes have the same size.
However, since it is not necessary to change the processing conditions for providing the non-through holes, the sizes of the non-through holes are all the same and the shapes are preferably the same.
Moreover, since the metal layer can be used as a stopper, the non-through hole is preferably performed by laser processing because it is easier to process than drilling.
Furthermore, the size of the non-through hole is desirable because it is possible to save the processing cost, but the recognition accuracy when processing the guide hole varies depending on the thickness of the insulating layer forming the non-through hole. It is good to set.
本発明にて述べる非貫通穴の集合領域とは、図4に示すように、複数の非貫通穴14を設けた個々の非貫通穴14の最外点を結んだ領域(集合領域15)を示す。
As shown in FIG. 4, the non-through hole assembly region described in the present invention is a region (aggregation region 15) connecting the outermost points of the individual
以下、図面を用いて、本発明の実施例を説明する。
図5は、本発明の1実施例を説明する配線板の製造工程を示す。
図5(a)に示すように、非貫通穴を有する薄い配線板を得るために、ガラスエポキシ材に銅箔を張り合わせた銅張積層板21(日立化成工業株式会社製 MCL−E−679FG t0.03mm 12D)の片側を、エッチングにより銅箔を除去し、レーザー穴あけ加工用のコンフォーマルマスク22を作製した。
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 5 shows a manufacturing process of a wiring board for explaining one embodiment of the present invention.
As shown to Fig.5 (a), in order to obtain the thin wiring board which has a non-through-hole, the copper clad laminated board 21 (Hitachi Chemical Industry Co., Ltd. MCL-E-679FG t0) which bonded the copper foil to the glass epoxy material. .03 mm 12D), the copper foil was removed by etching to produce a
次に、図5(b)に示すように、銅箔を除去し樹脂が露出しているコンフォーマルマスク22の部分へ、炭酸ガスレーザー(レーザー加工条件:周波数1000Hz、パルス幅10〜30μsec、サイクル数5〜10)を照射し、樹脂を燃焼分解して除去することにより、回路配置(製品)領域24と外周部23とに、それぞれ直径0.1mmの非貫通穴25、26を複数、密集形成した。
Next, as shown in FIG. 5B, a carbon dioxide laser (laser processing condition: frequency 1000 Hz, pulse width 10 to 30 μsec, cycle) is applied to the
そして、図5(c)に示すように、無電解銅めっき及び電解銅めっき処理(めっき厚15μm)をしてひとつの層とそれと違う他の層とを接続する非貫通穴25、26の内壁及び銅箔表面にめっき導体27を施した。
And as shown in FIG.5 (c), the inner wall of the non-through-
その後、図5(d)に示すように、外周部の非貫通穴26(図5(c)参照)をX線孔あけ機(セイコープレシジョン株式会社製)により画像認識をさせ、ドリルで密集した複数の非貫通穴26の中心を直径2.0mmで貫通孔あけを行い、外層回路形成時に必要な基準孔28を形成した。
After that, as shown in FIG. 5 (d), the non-through holes 26 (see FIG. 5 (c)) on the outer peripheral portion were image-recognized by an X-ray drilling machine (Seiko Precision Co., Ltd.) and densely gathered with a drill. The center of the plurality of
図5(e)に示すようにその基準孔28を基準にして、表裏の外層銅箔(外層導体)をエッチングすることにより、所定の外層回路導体を設け、非貫通穴を有する薄板配線板29を得た。
As shown in FIG. 5E, by using the
上記で得られた薄板配線板29は、非貫通穴を有する両面板であるが、この両面板をコア材に用いて、その上にプリプレグと銅箔とを交互に積層するビルドアップを行えば薄板多層配線板の作製が可能である。
The
1…銅張積層板、2…銅箔、3…銅箔、4…非貫通穴、5…非貫通穴、6…めっき導体、7…配線板、8…回路配置領域、9…外周部、10…非貫通穴、11…非貫通穴、12…貫通孔、13…貫通孔、14…非貫通穴、15…集合領域、21…銅張積層板、22…コンフォーマルマスク、23…外周部、24…回路配置領域、25…非貫通穴、26…非貫通穴、27…めっき導体、28…基準孔、29…薄板配線板。
DESCRIPTION OF
Claims (2)
前記回路配置領域の外周部に設けられる複数の非貫通穴を基準として前記複数の非貫通穴の中心を貫通加工されるガイド孔が、前記複数の非貫通穴を設けた個々の非貫通穴の最外点を結んだ集合領域内に設けられる配線板。 A circuit arrangement area and a non-through hole in this circuit arrangement area are processed at the same time, and a circle is drawn as a whole so that the non-through holes overlap each other. A plurality of non-through holes provided in an outer peripheral portion of the circuit arrangement region, and a center of the plurality of non-through holes is processed with reference to the plurality of non-through holes, and the outer peripheral portion of the circuit arrangement region And a guide hole provided in the
Guide holes that are processed through the centers of the plurality of non-through holes on the basis of the plurality of non-through holes provided in the outer peripheral portion of the circuit arrangement region are the individual non-through holes provided with the plurality of non-through holes. A wiring board provided in the gathering area connecting the outermost points .
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