JP5400093B2 - 1次係数および2次係数の温度補償型共振子 - Google Patents
1次係数および2次係数の温度補償型共振子 Download PDFInfo
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- JP5400093B2 JP5400093B2 JP2011120268A JP2011120268A JP5400093B2 JP 5400093 B2 JP5400093 B2 JP 5400093B2 JP 2011120268 A JP2011120268 A JP 2011120268A JP 2011120268 A JP2011120268 A JP 2011120268A JP 5400093 B2 JP5400093 B2 JP 5400093B2
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- 238000000576 coating method Methods 0.000 claims description 34
- 239000011248 coating agent Substances 0.000 claims description 28
- 239000013078 crystal Substances 0.000 claims description 25
- 101150091203 Acot1 gene Proteins 0.000 claims description 10
- 102100025854 Acyl-coenzyme A thioesterase 1 Human genes 0.000 claims description 10
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims description 6
- 239000010432 diamond Substances 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 2
- -1 CTE2 Proteins 0.000 claims 2
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 22
- 235000012239 silicon dioxide Nutrition 0.000 description 21
- 239000010453 quartz Substances 0.000 description 20
- 239000010410 layer Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229940119177 germanium dioxide Drugs 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H9/02433—Means for compensation or elimination of undesired effects
- H03H9/02448—Means for compensation or elimination of undesired effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/21—Crystal tuning forks
- H03H9/215—Crystal tuning forks consisting of quartz
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
- G04F5/04—Apparatus for producing preselected time intervals for use as timing standards using oscillators with electromechanical resonators producing electric oscillations or timing pulses
- G04F5/06—Apparatus for producing preselected time intervals for use as timing standards using oscillators with electromechanical resonators producing electric oscillations or timing pulses using piezoelectric resonators
- G04F5/063—Constructional details
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
- H03H9/02023—Characteristics of piezoelectric layers, e.g. cutting angles consisting of quartz
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/19—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of quartz
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/027—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the microelectro-mechanical [MEMS] type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0407—Temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
- H03H2009/241—Bulk-mode MEMS resonators
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- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Micromachines (AREA)
Description
− 本体は、同一の対をなす面を有するほぼ四角形状の断面を含み、
− 本体は、そのほぼ四角形状の断面が全体的にコーティングをされ、
− プレートのカット角度は、上記1次のおよび2次の温度係数が負であるように選択され、コーティングは、正の1次のおよび2次のヤング率変動を含み、
コーティングには、二酸化ゲルマニウムが含まれ、
− プレートのカット角度は、上記1次温度係数および2次温度係数が、それぞれ正および負であるように選択され、コーティングが、負および正である1次ヤング率変動および2次ヤング率変動を有し、
コーティングには、人工ダイヤが含まれ、
− 本体は、ひげぜんまい即ちヘアスプリングを形成する渦巻き状の棒体で、慣性ブロックに結合され、
− 本体は、少なくとも2本の対称に装着されたアームを含んで、音叉を形成し、
音叉が、反転タイプおよび/または溝付きタイプおよび/または円錐タイプおよび/またはひれ型タイプのものであり、
− 本体は、MEMS(微小電気機械システム)である。
式中、
− Δf/f0 は、ppm(10-6)で表された相対的な周波数変動であり、
− Aは、ppmの、基準点に依存する定数であり、
− T0は、℃の、基準温度であり、
− αは、ppm.℃-1で表された、1次温度係数であり、
− βは、ppm.℃-2で表された、2次温度係数であり、
− γは、ppm.℃-3で表された、3次温度係数である。
5、7、25、27、35、37、45、47 アーム;
3、23、33、43 ベース。
Claims (9)
- 本体を含む温度補償共振子であって、前記本体(3、5、7、15、23、25、27、33、35、37、43、45、47)のコア(58、58’、18)が、1次のおよび2次の温度係数(α、β、α’、β’)を決定する水晶カット角度(θ、θ’)で形成されたプレートから形成される、温度補償共振子において、
前記本体(3、5、7、15、23、25、27、33、35、37、43、45、47)が、前記コア(58、58’、18)上に少なくとも部分的に堆積され、前記共振子の1次および2次の温度係数(α、β、α’、β’)をほぼゼロにするために、前記共振子の1次および2次の温度係数(α、β、α’、β’)それぞれに対して反対の符号の、温度による1次および2次のヤング率変動(CTE1、CTE2、CTE1’、CTE2’)を有するコーティング(52、54、56、52’、54’、56’、16)を含み、
前記プレートの前記カット角度(θ)が、前記1次および2次の温度係数(α、β)が負であるように選択され、
前記コーティング(52、54、56、52’、54’、56’、16)が、正である1次および2次のヤング率変動(CTE1、CTE2)を有し、
前記コーティング(52、54、56、52’、54’、56’、16)が、酸化ゲルマニウムを含むことを特徴とする、共振子。 - 本体を含む温度補償共振子であって、前記本体(3、5、7、15、23、25、27、33、35、37、43、45、47)のコア(58、58’、18)が、1次のおよび2次の温度係数(α、β、α’、β’)を決定する水晶カット角度(θ、θ’)で形成されたプレートから形成される、温度補償共振子において、
前記本体(3、5、7、15、23、25、27、33、35、37、43、45、47)が、前記コア(58、58’、18)上に少なくとも部分的に堆積され、前記共振子の1次および2次の温度係数(α、β、α’、β’)をほぼゼロにするために、前記共振子の1次および2次の温度係数(α、β、α’、β’)それぞれに対して反対の符号の、温度による1次および2次のヤング率変動(CTE1、CTE2、CTE1’、CTE2’)を有するコーティング(52、54、56、52’、54’、56’、16)を含み、
前記プレートの前記カット角度(θ’)が、前記1次および2次の温度係数(α’、β’)が、それぞれ正および負であるように選択され、
前記コーティング(52、54、56、52’、54’、56’、16)が、それぞれ負および正である1次および2次のヤング率変動(CTE1’、CTE2’)を含み、
前記コーティング(52、54、56、52’、54’、56’、16)が、人工ダイヤを含むことを特徴とする、共振子。 - 前記本体(3、5、7、15)が、同一の対をなす面を備えたほぼ四角形状の断面を有することを特徴とする、請求項1または2に記載の共振子。
- 前記本体(3、5、7、15)が、全体的にコーティングされた面を有するほぼ四角形状の断面を含むことを特徴とする、請求項1または2に記載の共振子。
- 前記本体(15)が、ひげぜんまい(11)を形成する渦巻き状の棒体であり、慣性部材と連結されていることを特徴とする、請求項1から4のいずれかに記載の共振子。
- 前記本体が、音叉(1、21、31、41)を形成する少なくとも2本の対称に装着されたアーム(5、7、25、27、35、37、45、47)を含むことを特徴とする、請求項1から4のいずれかに記載の共振子。
- 前記音叉(1、21、31、41)が、反転型および/または溝付き型および/または円錐型および/またはひれ型タイプのものであることを特徴とする、請求項6に記載の共振子。
- 前記本体が、MEMSであることを特徴とする、請求項1から4のいずれかに記載の共振子。
- 請求項1から8のいずれかに記載の少なくとも1つの共振子を含むことを特徴とする、時計。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10165563A EP2395661A1 (fr) | 2010-06-10 | 2010-06-10 | Résonateur thermocompensé aux premier et second ordres |
EP10165563.7 | 2010-06-10 |
Publications (2)
Publication Number | Publication Date |
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JP2011259426A JP2011259426A (ja) | 2011-12-22 |
JP5400093B2 true JP5400093B2 (ja) | 2014-01-29 |
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JP2011120268A Active JP5400093B2 (ja) | 2010-06-10 | 2011-05-30 | 1次係数および2次係数の温度補償型共振子 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8724431B2 (ja) |
EP (2) | EP2395661A1 (ja) |
JP (1) | JP5400093B2 (ja) |
KR (1) | KR101355752B1 (ja) |
CN (1) | CN102332892B (ja) |
HK (1) | HK1166557A1 (ja) |
TW (1) | TWI530095B (ja) |
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EP2395661A1 (fr) * | 2010-06-10 | 2011-12-14 | The Swatch Group Research and Development Ltd. | Résonateur thermocompensé aux premier et second ordres |
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ATE453954T1 (de) * | 2007-07-19 | 2010-01-15 | Eta Sa Mft Horlogere Suisse | Piezoelektrischer resonator mit optimierten bewegungsfähigkeiten |
JP5057148B2 (ja) * | 2007-10-16 | 2012-10-24 | 株式会社村田製作所 | 圧電振動装置 |
DE602007013123D1 (de) * | 2007-11-28 | 2011-04-21 | Manuf Et Fabrique De Montres Et De Chronometres Ulysse Nardin Le Locle S A | Mechanischer oszillator mit einem optimierten thermoelastischen koeffizienten |
JP5168568B2 (ja) * | 2008-09-01 | 2013-03-21 | Tdk株式会社 | 薄膜バルク波共振器 |
EP2284629A1 (fr) * | 2009-08-13 | 2011-02-16 | ETA SA Manufacture Horlogère Suisse | Résonateur mécanique thermocompensé |
EP2395661A1 (fr) * | 2010-06-10 | 2011-12-14 | The Swatch Group Research and Development Ltd. | Résonateur thermocompensé aux premier et second ordres |
-
2010
- 2010-06-10 EP EP10165563A patent/EP2395661A1/fr not_active Withdrawn
-
2011
- 2011-05-11 EP EP11165632.8A patent/EP2395662B1/fr active Active
- 2011-05-16 TW TW100117062A patent/TWI530095B/zh not_active IP Right Cessation
- 2011-05-30 JP JP2011120268A patent/JP5400093B2/ja active Active
- 2011-06-03 KR KR1020110054031A patent/KR101355752B1/ko not_active IP Right Cessation
- 2011-06-09 CN CN201110153626.2A patent/CN102332892B/zh active Active
- 2011-06-09 US US13/156,648 patent/US8724431B2/en active Active
-
2012
- 2012-07-23 HK HK12107209.8A patent/HK1166557A1/xx unknown
Also Published As
Publication number | Publication date |
---|---|
EP2395662A1 (fr) | 2011-12-14 |
KR101355752B1 (ko) | 2014-01-27 |
HK1166557A1 (en) | 2012-11-02 |
TWI530095B (zh) | 2016-04-11 |
CN102332892B (zh) | 2015-05-20 |
KR20110135341A (ko) | 2011-12-16 |
US8724431B2 (en) | 2014-05-13 |
CN102332892A (zh) | 2012-01-25 |
US20110305120A1 (en) | 2011-12-15 |
EP2395661A1 (fr) | 2011-12-14 |
JP2011259426A (ja) | 2011-12-22 |
TW201214960A (en) | 2012-04-01 |
EP2395662B1 (fr) | 2014-04-16 |
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