JP5389660B2 - 高金属性ケイ質組成物及び同一物を生成する方法 - Google Patents
高金属性ケイ質組成物及び同一物を生成する方法 Download PDFInfo
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- JP5389660B2 JP5389660B2 JP2009535512A JP2009535512A JP5389660B2 JP 5389660 B2 JP5389660 B2 JP 5389660B2 JP 2009535512 A JP2009535512 A JP 2009535512A JP 2009535512 A JP2009535512 A JP 2009535512A JP 5389660 B2 JP5389660 B2 JP 5389660B2
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- metal
- silica particles
- colloidal silica
- metals
- salts
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- 239000000203 mixture Substances 0.000 title claims description 40
- 238000004519 manufacturing process Methods 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 claims description 81
- 239000002184 metal Substances 0.000 claims description 81
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 70
- 239000002245 particle Substances 0.000 claims description 61
- 238000000034 method Methods 0.000 claims description 47
- 239000008119 colloidal silica Substances 0.000 claims description 35
- 235000012239 silicon dioxide Nutrition 0.000 claims description 31
- 150000003839 salts Chemical class 0.000 claims description 30
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 22
- 150000002739 metals Chemical class 0.000 claims description 21
- 239000007787 solid Substances 0.000 claims description 18
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 claims description 14
- 239000003638 chemical reducing agent Substances 0.000 claims description 11
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 6
- 239000000725 suspension Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 claims description 5
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 60
- 239000000243 solution Substances 0.000 description 35
- 229910052763 palladium Inorganic materials 0.000 description 29
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 18
- 239000000377 silicon dioxide Substances 0.000 description 16
- 239000003054 catalyst Substances 0.000 description 15
- 239000010931 gold Substances 0.000 description 12
- 230000009467 reduction Effects 0.000 description 12
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- 238000001144 powder X-ray diffraction data Methods 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000084 colloidal system Substances 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- CAYKLJBSARHIDI-UHFFFAOYSA-K trichloroalumane;hydrate Chemical compound O.Cl[Al](Cl)Cl CAYKLJBSARHIDI-UHFFFAOYSA-K 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 7
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 238000000634 powder X-ray diffraction Methods 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 229910000323 aluminium silicate Inorganic materials 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
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- -1 palladium acetate Chemical class 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
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- 229910052723 transition metal Inorganic materials 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- 238000000108 ultra-filtration Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910020175 SiOH Inorganic materials 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 239000000908 ammonium hydroxide Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
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- 239000011734 sodium Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000004627 transmission electron microscopy Methods 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
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- 235000011389 fruit/vegetable juice Nutrition 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
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- 239000003456 ion exchange resin Substances 0.000 description 2
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- 229910052747 lanthanoid Inorganic materials 0.000 description 2
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- 239000004038 photonic crystal Substances 0.000 description 2
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- 102000004169 proteins and genes Human genes 0.000 description 2
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- 239000011833 salt mixture Substances 0.000 description 2
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- 150000003335 secondary amines Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
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- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
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- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
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- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- PMYUVOOOQDGQNW-UHFFFAOYSA-N hexasodium;trioxido(trioxidosilyloxy)silane Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])O[Si]([O-])([O-])[O-] PMYUVOOOQDGQNW-UHFFFAOYSA-N 0.000 description 1
- 239000003622 immobilized catalyst Substances 0.000 description 1
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- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 238000002429 nitrogen sorption measurement Methods 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
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- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
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- 238000003980 solgel method Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010907 stover Substances 0.000 description 1
- 239000012607 strong cation exchange resin Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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Description
Hermans&Geus,Interaction of Nickel Ions With Silica Supports During Deposition−Precipitation,Stud.Surf.Sci.Catal.,1979,pp.113−130
Lopez et al,Pt/SiO2 Sol−Gel Catalysts:Effects of pH and Platinum Precursor,J.Phys.Chem.,1993,pp.1671−1677
(1)高金属性ケイ質物質を調製する方法であって、当該方法が、
a)混合物を形成するために、1又はそれ以上の金属の1又はそれ以上の塩をケイ酸溶液と混合するステップと;
b)懸濁液中にコロイド状シリカ粒子を形成するために、前記混合物を塩基性ヒール溶液に添加するステップであって、前記コロイド状シリカ粒子の1又はそれ以上が取り込まれた金属粒子を含むステップと;
c)前記懸濁液を選択的に濃縮するステップと;
d)生成物を形成するために、還元剤で前記取り込まれた金属粒子を選択的に還元するステップと;
e)前記コロイド状シリカ粒子又は前記生成物を選択的に更に処理するステップと;
を含むことを特徴とする方法。
(2)上記(1)に記載の方法が、前記ケイ酸溶液を調製するためにケイ酸ナトリウム溶液を脱イオン化するステップを含むことを特徴とする方法。
(3)上記(1)に記載の方法が、前記混合物を形成するために、1又はそれ以上の金属の1又はそれ以上の塩を前記ケイ酸溶液と混合する前に塩化アルミニウム水和物を前記ケイ酸溶液と結合させるステップを含むことを特徴とする方法。
(4)上記(1)に記載の方法が、酢酸パラジウム、塩化金酸、塩化アルミニウム水和物、塩化銅、硝酸第二鉄、硝酸ニッケル、塩化コバルト、及びその組合せからなる群から選択される1又はそれ以上の金属の1又はそれ以上の塩を含むことを特徴とする方法。
(5)上記(1)に記載の方法において、前記塩基性ヒール溶液が水酸化ナトリウム、水酸化リチウム、水酸化カリウム、水酸化アンモニウム、第一級アミン、第二級アミン、第三級アミン、第四級アミン、第四級化合物、及びその組合せからなる群から選択される1又はそれ以上の塩基を含むことを特徴とする方法。
(6)上記(1)に記載の方法が、約1ナノメートル乃至約250ナノメートルにコロイド状シリカ粒子のサイズを制御するために、制御速度で前記混合物を前記塩基性ヒール溶液に添加するステップを含み、前記サイズが前記制御速度に依存することを特徴とする方法。
(7)上記(1)に記載の方法が、約4ナノメートル乃至約150ナノメートルにコロイド状シリカ粒子のサイズを制御するために、制御速度で前記混合物を前記塩基性ヒール溶液に添加するステップを含むことを特徴とする方法。
(8)上記(1)に記載の方法が、約60℃乃至約90℃に前記塩基性ヒール溶液を加熱するステップを含むことを特徴とする方法。
(9)上記(1)に記載の方法において、前記還元剤がヒドラジン及び水素ガスからなる群から選択されることを特徴とする方法。
(10)上記(1)に記載の方法において、前記取り込まれた金属粒子が前記コロイド状シリカ粒子内に本質的に均質に拡散することを特徴とする方法。
(11)上記(1)に記載の方法において、前記コロイド状シリカ粒子又は前記生成物を更に処理するステップが、限外濾過、脱イオン化、加熱、乾燥、濃縮、表面官能基化、及びその組合せからなる群から選択される1又はそれ以上のプロセスを用いるステップを含むことを特徴とする方法。
(12)上記(1)に記載の方法が、歯科用アプリケーション、タンパク質分離、モレキュラシーブ、ナノ多孔質膜、導波管、フォトニック結晶、耐熱性アプリケーション、ワイン及びジュースの清澄、半導体及びディスクドライブ構成の化学機械的な平坦化、触媒、触媒担体、製紙中の保水及び脱水助剤、充填剤、表面コーディング剤、セラミック物質、インベストメント鋳造用結合剤、平滑剤、プロッパント、化粧品調合剤、及び磨き摩耗剤からなる群から選択される産業用アプリケーションにおいて前記コロイド状シリカ粒子又は前記生成物を用いるステップを含むことを特徴とする方法。
(13)高金属性ケイ質組成物であって、ケイ酸溶液と、1又はそれ以上の金属の1又はそれ以上の塩との混合物から作られる複数の沈殿したシリカ粒子を含み、全固体に基づく約10重量パーセント乃至約50重量パーセントの金属が、前記コロイド状シリカ粒子と結合することを特徴とする高金属性ケイ質組成物。
(14)上記(13)に記載の高金属性組成物において、前記金属が還元された金属であることを特徴とする高金属性組成物。
(15)高金属性ケイ質組成物であって、約1乃至約250ナノメートルの平均直径を有し、ケイ酸溶液と、1又はそれ以上の金属の1又はそれ以上の塩との混合物から作られる複数のコロイド状シリカ粒子を含み、全固体に基づく約10重量パーセントまでの金属が、前記コロイド状シリカ粒子と結合することを特徴とする高金属性ケイ質組成物。
(16)上記(15)に記載の高金属性ケイ質組成物において、前記金属が還元された金属であることを特徴とする高金属性ケイ質組成物。
(17)上記(15)に記載の高金属性ケイ質組成物が、前記コロイド状シリカ粒子と結合する複数の異なる金属を含むことを特徴とする高金属性ケイ質組成物。
(18)上記(15)に記載の高金属性ケイ質組成物において、前記金属が、アルカリ金属、アルカリ土類金属、第一列遷移金属、第二列遷移金属、ランタニド、及びその組合せからなる群から選択されることを特徴とする高金属性ケイ質組成物。
(19)上記(15)に記載の高金属性ケイ質組成物において、前記金属が、パラジウム、白金、鉄、金、アルミニウム、銅、ニッケル、鉄、チタン、及びその組合せからなる群から選択されることを特徴とする高金属性ケイ質組成物。
(20)上記(15)に記載の高金属性ケイ質組成物において、前記コロイド状シリカ粒子が、稠密な及び乾燥したコロイド状シリカ粒子を含むことを特徴とする高金属性ケイ質組成物。
Claims (3)
- 高金属性ケイ質物質を調製する方法であって、当該方法が、
a)混合物を形成するために、1又はそれ以上の金属の1又はそれ以上の塩をケイ酸溶液と混合するステップであって、前記1又はそれ以上の金属の1又はそれ以上の塩が、酢酸パラジウム、塩化金酸、塩化銅、硝酸第二鉄、硝酸ニッケル、塩化コバルト、及びその組合せからなる群から選択されるステップと;
b)懸濁液中にコロイド状シリカ粒子を形成するために、前記混合物を塩基性ヒール溶液に添加するステップであって、前記コロイド状シリカ粒子は前記1又はそれ以上の金属の1又はそれ以上の塩を含むステップと;
c)前記懸濁液を選択的に濃縮するステップと;
d)生成物を形成するために、還元剤で前記取り込まれた金属を還元するステップと;
を含むことを特徴とする方法。 - 高金属性ケイ質組成物であって、ケイ酸溶液と、1又はそれ以上の金属の1又はそれ以上の塩との混合物から作られる複数の沈殿したシリカ粒子を含み、
前記1又はそれ以上の金属の1又はそれ以上の塩が、酢酸パラジウム、塩化金酸、塩化銅、硝酸第二鉄、硝酸ニッケル、塩化コバルト、及びその組合せからなる群から選択されるものであり、
全固体に基づく10重量パーセント乃至50重量パーセントの金属が、前記コロイド状シリカ粒子に取り込まれており、
前記取り込まれた金属が前記コロイド状シリカ粒子中に本質的に均質に分散し、さらに前記金属は還元された金属であることを特徴とする高金属性ケイ質組成物。 - 高金属性ケイ質組成物であって、1乃至250ナノメートルの平均直径を有し、ケイ酸溶液と、1又はそれ以上の金属の1又はそれ以上の塩との混合物から作られる複数のコロイド状シリカ粒子を含み、
前記1又はそれ以上の金属の1又はそれ以上の塩が、酢酸パラジウム、塩化金酸、塩化銅、硝酸第二鉄、硝酸ニッケル、塩化コバルト、及びその組合せからなる群から選択されるものであり、
全固体に基づく10重量パーセントまでの金属が、前記コロイド状シリカ粒子に取り込まれており、
前記取り込まれた金属が前記コロイド状シリカ粒子中に本質的に均質に分散し、さらに前記金属は還元された金属であることを特徴とする高金属性ケイ質組成物。
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EP2079546A4 (en) | 2012-08-29 |
US20100074974A1 (en) | 2010-03-25 |
CA2669471A1 (en) | 2008-05-15 |
CA2669471C (en) | 2015-03-10 |
CN101534944B (zh) | 2013-01-16 |
JP2010509496A (ja) | 2010-03-25 |
EP2079546B1 (en) | 2020-08-12 |
EP2079546A2 (en) | 2009-07-22 |
WO2008058240A2 (en) | 2008-05-15 |
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