JP5315240B2 - カーボン・ナノチューブ及びフラーレンと分子クリップとの錯体とその使用 - Google Patents
カーボン・ナノチューブ及びフラーレンと分子クリップとの錯体とその使用 Download PDFInfo
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- JP5315240B2 JP5315240B2 JP2009521030A JP2009521030A JP5315240B2 JP 5315240 B2 JP5315240 B2 JP 5315240B2 JP 2009521030 A JP2009521030 A JP 2009521030A JP 2009521030 A JP2009521030 A JP 2009521030A JP 5315240 B2 JP5315240 B2 JP 5315240B2
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- carbon nanotubes
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
- B82B1/008—Nanostructures not provided for in groups B82B1/001 - B82B1/007
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/152—Fullerenes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/152—Fullerenes
- C01B32/156—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
- C01B32/174—Derivatisation; Solubilisation; Dispersion in solvents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/18—Nanoonions; Nanoscrolls; Nanohorns; Nanocones; Nanowalls
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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Description
Claims (34)
- カーボン・ナノチューブ又はフラーレンと分子クリップとのπ−π錯体において,前記分子クリップは、ポリアセンとジエノフィルとのディールス−アルダー付加体である、前記錯体。
- 前記ポリアセンは、アントラセン、ナフタセン、ペンタセン、ヘキサセン及びヘプタセンからなる群から選択される、請求項1に記載の錯体。
- 前記付加体は、ペンタセンとマレイミドとのディールス−アルダー付加体である、請求項1に記載の錯体。
- 前記カーボン・ナノチューブ又はフラーレンの付加体に対するモル比は、1:1から1:1000である、請求項1に記載の錯体。
- 前記カーボン・ナノチューブ又はフラーレンは、0.5ナノメートルから2.5ナノメートルの直径を有する、請求項1に記載の錯体。
- カーボン・ナノチューブ又はフラーレンと分子クリップとのπ−π錯体であって,前記分子クリップは、ポリアセンとジエノフィルとのディールス−アルダー付加体である、前記錯体の水又は有機溶媒中の分散体。
- 前記有機溶媒は、クロロホルム、ベンゼン、トルエン、キシレン、ジクロロベンゼン、N,N−ジメチルホルムアミド、プロピレングリコール及びメチルエーテルアセテートからなる群から選択される、請求項8に記載の分散体。
- 前記ポリアセンは、アントラセン、ナフタセン、ペンタセン、ヘキサセン及びヘプタセンからなる群から選択される、請求項8に記載の分散体。
- 前記付加体は、ペンタセンとマレイミドとのディールス−アルダー付加体である、請求項8に記載の分散体。
- 前記カーボン・ナノチューブ又はフラーレンの付加体に対する重量比は、1:1から1:100である、請求項8に記載の分散体。
- 前記カーボン・ナノチューブ又はフラーレンは、0.5ナノメートルから2.5ナノメートルの直径を有する、請求項8に記載の分散体。
- カーボン・ナノチューブ又はフラーレンと分子クリップとのπ−π錯体であって,前記分子クリップは、ポリアセンとジエノフィルとのディールス−アルダー付加体である、前記π−π錯体の層を基板上に堆積させるステップを含む、物品の製造方法。
- 金属又は金属酸化物の基板上に前記錯体を選択的に堆積させるステップを含む、請求項16に記載の方法。
- カーボン・ナノチューブ又はフラーレンと分子クリップとのπ−π錯体であって,前記分子クリップは、ポリアセンとジエノフィルとのディールス−アルダー付加体である、前記錯体の水又は有機溶媒中の分散体から前記錯体を堆積させるステップを含む、請求項16に記載の方法。
- 基板上に前記錯体を選択的に堆積させ、次に電気的コンタクトを堆積させることによって、又は電気的コンタクトを備えた基板上に前記錯体を選択的に堆積させることによって、電子デバイスを製造するステップを含む、請求項16に記載の方法。
- 前記デバイスがFETである、請求項19に記載の方法。
- 前記ポリアセンは、アントラセン、ナフタセン、ペンタセン、ヘキサセン及びヘプタセンからなる群から選択される、請求項16に記載の方法。
- 前記付加体は、ペンタセンとマレイミドとのディールス−アルダー付加体である、請求項19に記載の方法。
- 基板と、カーボン・ナノチューブ又はフラーレンと分子クリップとのπ−π錯体であって,前記分子クリップは、ポリアセンとジエノフィルとのディールス−アルダー付加体である、前記錯体の層とを備える物品。
- 前記基板は金属酸化物を含む、請求項25に記載の物品。
- 電子デバイスであり、電気コンタクトをさらに備える、請求項25に記載の物品。
- 直径に応じてカーボン・ナノチューブ又はフラーレンを分離する方法であって、
(a)溶媒中にポリアセンとジエノフィルとのディールス−アルダー付加体である分子クリップを含む溶液を調製するステップと、
(b)前記ステップ(a)で調整された溶液中にカーボン・ナノチューブ又はフラーレンを含む懸濁液を超音波処理するステップと、
(c)前記ステップ(b)により超音波処理した溶液を遠心分離するステップと、
(d)前記ステップ(c)により処理された溶液の上澄み液を沈殿から分離するステップと、
を含む方法。 - 前記ポリアセンは、アントラセン、テトラセン、ペンタセン、ヘキサセン及びヘプタセンからなる群から選択される、請求項28に記載のカーボン・ナノチューブの分離方法。
- (a)基板上に分子クリップの単一層を堆積させるステップであって、前記分子クリップは−SH、−NC、−PO3H2、−CONHOH、及び−CO2Hからなる群から選択される少なくとも1つの末端官能基を有し、ポリアセンとジエノフィルとのディールス−アルダー付加体である、ステップと、
(b)前記ステップ(a)において処理された基板を溶媒中にカーボン・ナノチューブを含む分散体に浸漬するステップと、
(c)付着していないカーボン・ナノチューブを溶媒によって前記基板から洗浄するステップと、
を含む、物品の製造方法。 - 前記付加体は、予め選択された2面角及び外側環の間の距離を有し、予め選択された直径を有するカーボン・ナノチューブ又はフラーレンは、前記付加体によって前記基板に固定され、前記方法は、所望の直径ではないカーボン・ナノチューブ又はフラーレンを前記基板から洗い流すステップをさらに含む、請求項32に記載の方法。
- 前記付加体は、120°の2面角及び0.5〜2.5nmの外側環の間の距離を有する、請求項32に記載の方法。
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US11/490,248 US7771695B2 (en) | 2006-07-21 | 2006-07-21 | Complexes of carbon nanotubes and fullerenes with molecular-clips and use thereof |
PCT/US2007/074118 WO2008011623A2 (en) | 2006-07-21 | 2007-07-23 | Complexes of carbon nanotubes and fullerenes with molecular-clips and use thereof |
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EP (1) | EP2076463B1 (ja) |
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Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8598569B2 (en) | 2008-04-30 | 2013-12-03 | International Business Machines Corporation | Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite |
US8138102B2 (en) | 2008-08-21 | 2012-03-20 | International Business Machines Corporation | Method of placing a semiconducting nanostructure and semiconductor device including the semiconducting nanostructure |
CN102137830A (zh) * | 2008-08-29 | 2011-07-27 | 出光兴产株式会社 | 有机薄膜晶体管用化合物和使用其的有机薄膜晶体管 |
WO2010117392A1 (en) * | 2008-12-19 | 2010-10-14 | Bosnyak Clive P | Exfoliated carbon nanotubes, methods for production thereof and products obtained therefrom |
EP2216683B1 (en) * | 2009-02-08 | 2018-11-14 | Rohm and Haas Electronic Materials, L.L.C. | Substrates coated with an antireflective composition and a photoresist |
KR101675322B1 (ko) | 2009-06-23 | 2016-11-14 | 삼성전자주식회사 | 다공성 산화막 속에 형성된 나노와이어 네트워크 단원계 상변화층을 갖는 상변화 메모리 및 형성 방법 |
US20110042618A1 (en) * | 2009-08-21 | 2011-02-24 | Massachusetts Institute of Techonology | Systems and methods for handling and/or isolating nanotubes and other nanostructures |
US20120289711A1 (en) * | 2009-10-28 | 2012-11-15 | Futurecarbon Gmbh | Method for producing carbon nanomaterials and/or carbon micromaterials and corresponding material |
WO2012080158A1 (en) | 2010-12-14 | 2012-06-21 | Styron Europe Gmbh | Improved elastomer formulations |
US8765024B2 (en) * | 2010-12-17 | 2014-07-01 | Nano-C, Inc. | Functionalized carbon nanotubes exhibiting enhanced solubility and methods of making |
AU2011349123A1 (en) * | 2010-12-23 | 2013-04-11 | The University Of Melbourne | Continuous process for the functionalization of fullernes |
US9055784B2 (en) * | 2011-01-06 | 2015-06-16 | Nike, Inc. | Article of footwear having a sole structure incorporating a plate and chamber |
CN102145885A (zh) * | 2011-03-04 | 2011-08-10 | 南京师范大学 | 表面膦酸化水溶性碳纳米管的制备方法及制得的碳纳米管 |
FR2974314B1 (fr) * | 2011-04-19 | 2013-05-10 | Snecma Propulsion Solide | Procede de preparation d'un element monolithique de catalyse comprenant un support fibreux et ledit element monolithique de catalyse |
US9997785B2 (en) | 2011-06-23 | 2018-06-12 | Molecular Rebar Design, Llc | Nanoplate-nanotube composites, methods for production thereof and products obtained therefrom |
KR101999866B1 (ko) | 2011-06-23 | 2019-07-12 | 몰레큘라 레바 디자인 엘엘씨 | 나노플레이트-나노튜브 복합체, 그의 생산 방법 및 그로부터 수득한 생성물 |
WO2013123308A1 (en) | 2012-02-15 | 2013-08-22 | Arizona Board Of Regents, A Body Corporate Of The State Of Arizona Acting For And On Behalf Of Arizona State University | Multifunctional materials and composites |
CN105960242A (zh) * | 2014-01-23 | 2016-09-21 | 勃林格殷格翰动物保健有限公司 | 犬科动物中代谢紊乱的治疗 |
US10020300B2 (en) | 2014-12-18 | 2018-07-10 | Agilome, Inc. | Graphene FET devices, systems, and methods of using the same for sequencing nucleic acids |
US9857328B2 (en) | 2014-12-18 | 2018-01-02 | Agilome, Inc. | Chemically-sensitive field effect transistors, systems and methods for manufacturing and using the same |
US9859394B2 (en) | 2014-12-18 | 2018-01-02 | Agilome, Inc. | Graphene FET devices, systems, and methods of using the same for sequencing nucleic acids |
WO2016100049A1 (en) | 2014-12-18 | 2016-06-23 | Edico Genome Corporation | Chemically-sensitive field effect transistor |
US10006910B2 (en) | 2014-12-18 | 2018-06-26 | Agilome, Inc. | Chemically-sensitive field effect transistors, systems, and methods for manufacturing and using the same |
US9618474B2 (en) | 2014-12-18 | 2017-04-11 | Edico Genome, Inc. | Graphene FET devices, systems, and methods of using the same for sequencing nucleic acids |
AU2016340023B2 (en) | 2015-10-15 | 2021-06-24 | Flex-G Pty Ltd | Traction drive fluid |
TWI622104B (zh) * | 2016-01-19 | 2018-04-21 | 國立虎尾科技大學 | 單壁式奈米碳管電晶體製造方法 |
CN107298436B (zh) * | 2016-04-07 | 2019-12-06 | 中国科学院苏州纳米技术与纳米仿生研究所 | 获取高纯度半导体性单壁碳纳米管的方法 |
WO2017201081A1 (en) | 2016-05-16 | 2017-11-23 | Agilome, Inc. | Graphene fet devices, systems, and methods of using the same for sequencing nucleic acids |
US11034847B2 (en) | 2017-07-14 | 2021-06-15 | Samsung Electronics Co., Ltd. | Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition |
KR102433666B1 (ko) * | 2017-07-27 | 2022-08-18 | 삼성전자주식회사 | 하드마스크 조성물, 이를 이용한 패턴의 형성방법 및 상기 하드마스크 조성물을 이용하여 형성된 하드마스크 |
KR102486388B1 (ko) | 2017-07-28 | 2023-01-09 | 삼성전자주식회사 | 그래핀 양자점의 제조방법, 상기 제조방법에 따라 얻어진 그래핀 양자점을 포함한 하드마스크 조성물, 이를 이용한 패턴의 형성방법 및 상기 하드마스크 조성물을 이용하여 형성된 하드마스크 |
CN111417253B (zh) * | 2020-04-13 | 2020-11-20 | 南京鑫达泰科技有限公司 | 一种低介电常数聚酰亚胺电路板 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7250147B2 (en) * | 2001-01-29 | 2007-07-31 | Tour James M | Process for derivatizing carbon nanotubes with diazonium species |
US7125989B2 (en) * | 2001-11-26 | 2006-10-24 | International Business Machines Corporation | Hetero diels-alder adducts of pentacene as soluble precursors of pentacene |
AU2003253923A1 (en) * | 2002-07-16 | 2004-02-02 | James M. Tour | Process for functionalizing carbon nanotubes under solvent-free conditions |
WO2004024428A1 (en) * | 2002-09-10 | 2004-03-25 | The Trustees Of The University Pennsylvania | Carbon nanotubes: high solids dispersions and nematic gels thereof |
WO2006074141A2 (en) * | 2005-01-03 | 2006-07-13 | Luna Innovations Incorporated | Chemical separation method for fullerenes |
US20080085243A1 (en) * | 2006-10-05 | 2008-04-10 | Sigma-Aldrich Company | Molecular markers for determining taxane responsiveness |
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US20100297833A1 (en) | 2010-11-25 |
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US20100320438A1 (en) | 2010-12-23 |
US7955585B2 (en) | 2011-06-07 |
JP2010504899A (ja) | 2010-02-18 |
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US20100291759A1 (en) | 2010-11-18 |
US7883685B1 (en) | 2011-02-08 |
US20100170418A1 (en) | 2010-07-08 |
US7771695B2 (en) | 2010-08-10 |
CN101489927B (zh) | 2013-07-10 |
EP2076463B1 (en) | 2013-11-20 |
WO2008011623A2 (en) | 2008-01-24 |
CN101489927A (zh) | 2009-07-22 |
US7867469B2 (en) | 2011-01-11 |
TW200825023A (en) | 2008-06-16 |
WO2008011623A3 (en) | 2008-08-07 |
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