US20130015433A1 - Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite - Google Patents
Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite Download PDFInfo
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- US20130015433A1 US20130015433A1 US13/617,420 US201213617420A US2013015433A1 US 20130015433 A1 US20130015433 A1 US 20130015433A1 US 201213617420 A US201213617420 A US 201213617420A US 2013015433 A1 US2013015433 A1 US 2013015433A1
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- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
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- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
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- H10K85/623—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing five rings, e.g. pentacene
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- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to a composite material which includes a carbon nanotube, and plural pentacene molecules bonded to the carbon nanotube, and more particularly, to a method of forming a semiconductor device including forming a channel region which includes a carbon nanotube-pentacene composite layer.
- TFT solution processed pentacene thin film transistors
- soluble pentacene precursors which after deposition on the surface could be converted to pentacene by moderate heating.
- U.S. Pat. No. 7,125,989 to Afzali-Ardakani et al. entitled “HETERO DIELS-ALDER ADDUCTS OF PENTACENE AS SOLUBLE PRECURSORS OF PENTACENE” which are commonly assigned with the present Application and incorporated by reference herein.
- carbon nanotubes have been demonstrated to have charge carrier mobility far superior to that of single crystal silicon but are very difficult to fabricate integrated circuits.
- An exemplary aspect of the present invention is directed to a composite material including a carbon nanotube, and plural pentacene molecules bonded to the carbon nanotube.
- Another exemplary aspect of the present invention is directed to a method of forming a carbon nanotube-pentacene composite layer.
- the method includes depositing on a substrate a dispersion of soluble pentacene precursor and carbon nanotubes, heating the dispersion to remove solvent from the dispersion; and heating the substrate to convert the pentacene precursor to pentacene and form the carbon nanotube-pentacene composite layer.
- Another exemplary aspect of the present invention is directed to a field effect transistor which includes source, drain and gate electrodes formed on a substrate, and a channel region formed on the substrate, the channel region including a carbon nanotube-pentacene composite layer.
- Still another exemplary aspect of the present invention is directed to a method of forming a field effect transistor.
- the method includes forming source, drain and gate electrodes on a substrate, and forming a channel region on the substrate, the channel region including a carbon nanotube-pentacene composite layer.
- the exemplary aspects of the present invention may provide a method of forming a semiconductor device including forming a channel region including a carbon nanotube-pentacene composite layer.
- FIG. 1 illustrates a carbon nanotube-pentacene composite material 100 , according to an exemplary aspect of the present invention
- FIG. 2 illustrates a method 200 of forming the CNT-pentacene composite, according to another exemplary aspect of the present invention
- FIG. 3A illustrates pentacene (I) being reacted with the dienophile N-sulfinyl acetamide (II) in the presence of a Lewis acid catalyst to give the pentacene precursor (III), according to an exemplary aspect of the present invention
- FIG. 3B illustrates an exemplary orientation of the plural molecules of pentacene precursor 305 along the carbon nanotube 310 in the deposited dispersion, according to an exemplary aspect of the present invention
- FIG. 3C illustrates heating of the substrate in a nitrogen atmosphere at a temperature in a range from 100° C. to 200° C. to convert the pentacene precursor which is coated on the CNT to pentacene;
- FIG. 4 illustrates an exemplary method 400 of forming a semiconductor device 450 (e.g., field effect transistor (FET)) according an exemplary aspect of the present invention
- a semiconductor device 450 e.g., field effect transistor (FET)
- FIGS. 5A-5C illustrate other configurations for the semiconductor device 450 , according to other exemplary embodiments of the present invention.
- FIG. 6 illustrates an exemplary method 600 of forming a semiconductor device according to the present invention.
- FIGS. 1-6 illustrate the exemplary aspects of the present invention.
- the present invention includes a composite 100 (e.g., carbon nanotube (CNT)-pentacene composite) which includes a carbon nanotube 110 , and plural pentacene molecules 120 bonded to the carbon nanotube.
- a composite 100 e.g., carbon nanotube (CNT)-pentacene composite
- CNT carbon nanotube
- pentacene molecules 120 bonded to the carbon nanotube.
- the present invention may combine the superior transfer properties of carbon nanotubes with the ease of processing of organic semiconductors to obtain a semiconductor device (e.g., a field effect transistor) with much higher mobility than that of organic semiconductors by using a dispersion (e.g., a highly stable dispersion) of carbon nanotubes in solution of pentacene precursors in an organic solvent.
- a semiconductor device e.g., a field effect transistor
- a dispersion e.g., a highly stable dispersion
- the carbon nanotube 110 may include, for example, an electrically semiconductive, single-walled nanotube (SWNT), and the plural pentacene molecules 120 may be bonded to the carbon nanotube 110 by ⁇ - ⁇ bonding and/or electrostatic bonding.
- SWNT electrically semiconductive, single-walled nanotube
- the pentacene may be bonded to (e.g., grafted to) the outer surface of the nanotube such that the double bonds of the CNT are essentially unaffected, thereby ensuring that the electrical and mechanical properties of the CNT are unaffected.
- FIG. 2 illustrates a method 200 of forming the CNT-pentacene composite.
- the method 200 of forming the CNT-pentacene composite may include depositing ( 210 ) on a substrate a dispersion of soluble pentacene precursor and carbon nanotubes, heating ( 220 ) the dispersion (e.g., at a temperature in a range from 50° C. to 100° C.) to remove solvent from the dispersion, and heating ( 230 ) the substrate (e.g., at a temperature in a range from 100° C. to 200° C.) to convert the pentacene precursor to pentacene and form the CNT-pentacene composite.
- the dispersion e.g., at a temperature in a range from 50° C. to 100° C.
- the substrate e.g., at a temperature in a range from 100° C. to 200° C.
- the method 200 may also include reacting pentacene with a dienophile to form a pentacene precursor (e.g., a soluble pentacene precursor).
- a pentacene precursor e.g., a soluble pentacene precursor
- the dienophile may include, for example, a compound that has at least one heteroatom such as N, O or S, connected by a double bond to a second heteroatom or carbon.
- the dienophile may include an N-sulfinylamide.
- the dienophile may include N-sulfinyl acetamide.
- the pentacene may be reacted with the dienophile at low to moderate temperatures and in the presence of a catalyst such as a Lewis acid catalyst to form the pentacene precursor.
- a catalyst such as a Lewis acid catalyst
- the Lewis acid catalyst may include, for example, titanium tetrachloride, silver tetrafluoroborate and methyl rhenium trioxide. Any residue from the dienophile remaining in the product of the reaction may be removed either by washing with a solvent or by vacuum drying.
- FIG. 3A illustrates a reaction (e.g., a Diels-Alder reaction) in which pentacene (I) is reacted with the dienophile N-sulfinyl acetamide (II) in the presence of a Lewis acid catalyst to give the pentacene precursor (III), according to an exemplary embodiment of the present invention.
- a reaction e.g., a Diels-Alder reaction
- pentacene (I) is reacted with the dienophile N-sulfinyl acetamide (II) in the presence of a Lewis acid catalyst to give the pentacene precursor (III), according to an exemplary embodiment of the present invention.
- the carbon nanotubes (CNTs) of the present invention may be formed by any one of several processes including, for example, arc discharge, laser ablation, high pressure carbon monoxide (HiPCO), and chemical vapor deposition (CVD) (e.g., plasma enhanced CVD).
- CVD chemical vapor deposition
- a metal catalyst layer of metal catalyst (e.g., including nickel, cobalt, iron, or a combination thereof), is formed on a substrate (e.g., silicon).
- the metal nanoparticles may be mixed with a catalyst support (e.g., MgO, Al 2 O 3 , etc) to increase the specific surface area for higher yield of the catalytic reaction of the carbon feedstock with the metal particles.
- the diameters of the nanotubes that are to be grown may be controlled by controlling the size of the metal particles, such as by patterned (or masked) deposition of the metal, annealing, or by plasma etching of a metal layer.
- the substrate including the metal catalyst layer may be heated to approximately 700° C.
- the growth of the CNTs may then be initiated at the site of the metal catalyst by introducing at least two gases into the reactor: a process gas (e.g., ammonia, nitrogen, hydrogen or a mixture of these) and a carbon-containing gas (e.g., acetylene, ethylene, ethanol, methane or a mixture of these).
- a process gas e.g., ammonia, nitrogen, hydrogen or a mixture of these
- a carbon-containing gas e.g., acetylene, ethylene, ethanol, methane or a mixture of these.
- a plasma may be also be used to enhance the growth process (plasma enhanced chemical vapor deposition), in which case the nanotube growth may follow the direction of the plasma's electric field.
- the CNTs of the present invention may be electrically and thermally conductive, and have an essentially uniform diameter which is in a range from 1 ⁇ m to 3 ⁇ m and a length which is in a range from 1 ⁇ m to 10 ⁇ m.
- the CNTs may also be single-walled nanotubes (SWNTs) or multi-walled nanotubes (MWNTs) (e.g., double-walled nanotubes (DWNTs)).
- SWNTs single-walled nanotubes
- MWNTs multi-walled nanotubes
- DWNTs double-walled nanotubes
- the CNTs may also have a zigzag, an armchair, or a chiral arrangement, so long as the resulting CNT-pentacene composite should exhibit good charge carrier mobility (e.g., in the range of 1 cm 2 /V ⁇ sec to 1000 cm 2 /V ⁇ sec).
- the CNTs may also be purified (e.g., by washing in a sodium hypochlorite solution) to remove any contaminants.
- the pentacene precursor e.g., obtained from a Diels-Alder reaction of pentacene with an N-sulfinylamide
- the purified carbon nanotubes may be dissolved in a solvent to form a mixture of soluble pentacene precursors and carbon nanotubes.
- the solvent may include, for example, chloroform, tetrachloroethane, tetrahydrofuran (THF), toluene, ethyl acetate, methyl ethyl ketone (MEK), dimethyl formamide, dichlorobenzene, propylene glycol monomethyl ether acetate (PGMEA) or mixtures of any of these.
- the mixture of purified carbon nanotubes and pentacene-N-sulfinylacetamide in an organic solvent may then be sonicated and centrifuged to remove un-coordinated nanotube as sediment.
- the supernatant liquid remaining after sonicating/centrifuging may serve as the stable dispersion of pentacene precursors and carbon nanotubes in the present invention.
- the supernatant liquid may then be deposited on a substrate, for example, by spin coating, drop cast, etc.
- the supernatant liquid may be deposited, for example, on the substrate at a location which is intended for the CNT-pentacene composite.
- FIG. 3B illustrates an exemplary orientation of the plural molecules of pentacene precursor 305 along the carbon nanotube 310 in the deposited dispersion.
- the molecules of pentacene precursor 305 may include pentacene portions which are formed in a “saddle-like” configuration on the carbon nanotube 310 , and N-sulfinyl acetamide functional group portions (e.g., —SO—N—CO—CH 3 ) which are formed at the apex of the “saddle-like” configuration and relatively aligned along the carbon nanotube 310 when viewing the carbon nanotube 310 in an axial direction.
- N-sulfinyl acetamide functional group portions e.g., —SO—N—CO—CH 3
- the substrate including the layer of dispersion may be heated at a low temperature (e.g., in a range from 50° C. to 100° C). to remove the solvent from the layer of dispersion and to form a pentacene precursor coated CNT.
- a low temperature e.g., in a range from 50° C. to 100° C.
- the substrate may be heated again in a nitrogen atmosphere at a temperature in a range from 100° C. to 200° C. to convert the pentacene preursor which is coated on the CNT to pentacene and, hence, to form a composite of pentacene 120 and carbon nanotube 110 (e.g., CNT-pentacene composite) at a location where the dispersion was deposited.
- a temperature in a range from 100° C. to 200° C. to convert the pentacene preursor which is coated on the CNT to pentacene and, hence, to form a composite of pentacene 120 and carbon nanotube 110 (e.g., CNT-pentacene composite) at a location where the dispersion was deposited.
- FIG. 4 illustrates an exemplary method 400 of forming a semiconductor device 450 (e.g., field effect transistor (FET)) according an exemplary aspect of the present invention.
- a semiconductor device 450 e.g., field effect transistor (FET)
- a substrate 402 (e.g., semiconductor substrate such as silicon, germanium, etc.) may be provided with a gate electrode 410 (e.g., highly doped silicon), an insulation layer 404 (e.g., SiO 2 , SiN, SiON), and a source electrode 406 (e.g., gold, palladium, etc.) and a drain electrode 408 (e.g., gold, palladium, etc.) formed on the insulation layer 404 (e.g., gate insulation layer). That is, the substrate 402 may include a predefined source electrode 406 , drain electrode 408 and a gate electrode 410 .
- a gate electrode 410 e.g., highly doped silicon
- an insulation layer 404 e.g., SiO 2 , SiN, SiON
- a source electrode 406 e.g., gold, palladium, etc.
- a drain electrode 408 e.g., gold, palladium, etc.
- the dispersion of pentacene precursors and carbon nanotubes may be deposited (e.g., by spin coating, drop cast, etc.) on the insulation layer 404 (e.g., between the source and drain electrodes 406 , 408 ).
- the solvent is removed (e.g., by heating at low temperature such as in a range from 50° C. to 100° C). to form the pentacene precursor-coated-CNT 412 on the insulation layer 404 (e.g., between the source and drain electrodes 406 , 408 ), as illustrated in FIG. 4 .
- the substrate is then heated (e.g., in a range from 100° C. to 200° C.) under nitrogen until all the pentacene precursor decoration are converted to pentacene resulting in a CNT-pentacene composite layer 414 formed on the insulation layer 404 and in the channel area (e.g., between the source and drain electrodes 406 , 408 ). That is, the CNT-pentacene composite layer 414 may serve as the channel material in the device 450 .
- the CNT-pentacene composite layer 414 may have a thickness in a range from 10 nm to 200 nm.
- the heating may also help to bond the CNT-pentacene composite layer to an adjacent feature (e.g., source and drain electrodes, insulating layer, etc.).
- an adjacent feature e.g., source and drain electrodes, insulating layer, etc.
- FIG. 4 illustrates a semiconductor device in which the CNT-pentacene composite layer 414 includes only one carbon nanotube
- the composite layer 414 may include plural carbon nanotubes which are coordinated (e.g., aligned) and have plural pentacene molecules formed on each of the carbon nanotubes.
- the carbon nanotube(s) in the composite layer 414 may be aligned at least substantially in a direction from one of the source/gate electrodes to the other one of the source/gate electrodes.
- FIG. 4 illustrates the device 450 as including the CNT-pentacene composite layer 414 (e.g., channel region) formed on the insulation layer 404 and between the source and drain electrodes 406 , 408 , other configurations are possible.
- FIGS. 5A-5C illustrate other possible configurations for the semiconductor device 450 according to other exemplary embodiments of the present invention.
- the CNT-pentacene composite layer 414 could be formed on the substrate 402 , and the source and drain electrodes 406 , 408 may be formed on the composite layer 414 .
- the gate insulating layer 404 may then be formed on the source and drain electrodes 406 , 408 and the gate electrode 410 may then be formed on the gate insulating layer 404 .
- the gate electrode 410 may be formed on the substrate 402 and then the gate insulating layer 404 may be formed on the gate electrode 410 .
- the CNT-pentacene composite layer 414 may then be formed on the gate insulating layer 404 and the source and drain electrodes 406 , 408 may be formed on the gate insulating layer 404 .
- the CNT-pentacene composite layer 414 could be formed on the substrate 402 , and one of the source and drain electrodes 406 , 408 (in this case, the drain electrode) may be formed on the substrate 402 beside the composite layer 414 . Then, the other of the source and drain electrodes 406 , 408 (in this case, the source electrode) and the gate insulating layer 404 may be formed on the composite layer 414 . The gate electrode 410 may then be formed on the gate insulating layer 404 .
- FIG. 6 illustrates an exemplary method 600 of forming a semiconductor device according to the present invention.
- the method 600 includes forming ( 610 ) source, drain and gate electrodes on a substrate, and forming ( 620 ) a channel region on the substrate, the channel region including a carbon nanotube-pentacene composite layer.
- the present invention is described herein as being used to form a transistor, the invention may be used to form other semiconductor devices which utilize a layer having good charge carrier mobility (e.g., diodes, photovoltaics, etc.).
- the exemplary aspects of the present invention may provide a method of forming a semiconductor device including forming a channel region including a carbon nanotube-pentacene composite layer.
Abstract
Description
- The present Application is related to U.S. patent application Ser. No. 13/077,216, to Afzali-Ardakani et al., entitled “METHOD OF PLACING A SEMICONDUCTING NANOSTRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SEMICONDUCTING NANOSTRUCTURE” (U.S. Patent Pub. No. 2011-0180777 A1), and U.S. patent application Ser. No. 12/195,524, to Afzali-Ardakani et al., entitled “METHOD OF PLACING A SEMICONDUCTING NANOSTRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SEMICONDUCTING NANOSTRUCTURE” (U.S. Pat. No. 8,138,102), which are commonly assigned with the present Application and are incorporated by reference herein.
- The present Application is a Divisional Application of U.S. patent application Ser. No. 12/113,064, which was filed on Apr. 30, 2008.
- The present invention relates to a composite material which includes a carbon nanotube, and plural pentacene molecules bonded to the carbon nanotube, and more particularly, to a method of forming a semiconductor device including forming a channel region which includes a carbon nanotube-pentacene composite layer.
- Organic semiconductors have been studied extensively for use as channel materials in thin film transistors. In particular, solution processed pentacene thin film transistors (TFT) have been formed using soluble pentacene precursors which after deposition on the surface could be converted to pentacene by moderate heating. For example, see U.S. Pat. No. 6,963,080 to Afzali-Ardakani et al. entitled “THIN FILM TRANSISTORS USING SOLUTION PROCESSED PENTACENE PRECURSOR AS ORGANIC SEMICONDUCTOR”, and U.S. Pat. No. 7,125,989 to Afzali-Ardakani et al. entitled “HETERO DIELS-ALDER ADDUCTS OF PENTACENE AS SOLUBLE PRECURSORS OF PENTACENE”, which are commonly assigned with the present Application and incorporated by reference herein.
- However, the charge carrier mobility of these organic thin film transistors (OFET) are limited and usually in the range of 10−2 cm2/V·sec to 10−1 cm2/V·sec.
- On the other hand, carbon nanotubes have been demonstrated to have charge carrier mobility far superior to that of single crystal silicon but are very difficult to fabricate integrated circuits.
- In view of the foregoing and other problems, disadvantages, and drawbacks of the aforementioned compositions, methods and devices, it is a purpose of the exemplary aspects of the present invention to provide, inter alia, a method of forming a semiconductor device including forming a channel region which includes a carbon nanotube-pentacene composite layer.
- An exemplary aspect of the present invention is directed to a composite material including a carbon nanotube, and plural pentacene molecules bonded to the carbon nanotube.
- Another exemplary aspect of the present invention is directed to a method of forming a carbon nanotube-pentacene composite layer. The method includes depositing on a substrate a dispersion of soluble pentacene precursor and carbon nanotubes, heating the dispersion to remove solvent from the dispersion; and heating the substrate to convert the pentacene precursor to pentacene and form the carbon nanotube-pentacene composite layer.
- Another exemplary aspect of the present invention is directed to a field effect transistor which includes source, drain and gate electrodes formed on a substrate, and a channel region formed on the substrate, the channel region including a carbon nanotube-pentacene composite layer.
- Still another exemplary aspect of the present invention is directed to a method of forming a field effect transistor. The method includes forming source, drain and gate electrodes on a substrate, and forming a channel region on the substrate, the channel region including a carbon nanotube-pentacene composite layer.
- With its unique and novel features, the exemplary aspects of the present invention may provide a method of forming a semiconductor device including forming a channel region including a carbon nanotube-pentacene composite layer.
- The foregoing and other objects, aspects and advantages will be better understood from the following detailed description of the embodiments of the invention with reference to the drawings, in which:
-
FIG. 1 illustrates a carbon nanotube-pentacenecomposite material 100, according to an exemplary aspect of the present invention; -
FIG. 2 illustrates amethod 200 of forming the CNT-pentacene composite, according to another exemplary aspect of the present invention; -
FIG. 3A illustrates pentacene (I) being reacted with the dienophile N-sulfinyl acetamide (II) in the presence of a Lewis acid catalyst to give the pentacene precursor (III), according to an exemplary aspect of the present invention; -
FIG. 3B illustrates an exemplary orientation of the plural molecules ofpentacene precursor 305 along thecarbon nanotube 310 in the deposited dispersion, according to an exemplary aspect of the present invention; -
FIG. 3C illustrates heating of the substrate in a nitrogen atmosphere at a temperature in a range from 100° C. to 200° C. to convert the pentacene precursor which is coated on the CNT to pentacene; -
FIG. 4 illustrates anexemplary method 400 of forming a semiconductor device 450 (e.g., field effect transistor (FET)) according an exemplary aspect of the present invention; -
FIGS. 5A-5C illustrate other configurations for thesemiconductor device 450, according to other exemplary embodiments of the present invention; and -
FIG. 6 illustrates anexemplary method 600 of forming a semiconductor device according to the present invention. - Referring now to the drawings,
FIGS. 1-6 illustrate the exemplary aspects of the present invention. - As illustrated in
FIG. 1 , the present invention includes a composite 100 (e.g., carbon nanotube (CNT)-pentacene composite) which includes acarbon nanotube 110, andplural pentacene molecules 120 bonded to the carbon nanotube. - The present invention may combine the superior transfer properties of carbon nanotubes with the ease of processing of organic semiconductors to obtain a semiconductor device (e.g., a field effect transistor) with much higher mobility than that of organic semiconductors by using a dispersion (e.g., a highly stable dispersion) of carbon nanotubes in solution of pentacene precursors in an organic solvent.
- The
carbon nanotube 110 may include, for example, an electrically semiconductive, single-walled nanotube (SWNT), and theplural pentacene molecules 120 may be bonded to thecarbon nanotube 110 by π-π bonding and/or electrostatic bonding. - In particular, the pentacene may be bonded to (e.g., grafted to) the outer surface of the nanotube such that the double bonds of the CNT are essentially unaffected, thereby ensuring that the electrical and mechanical properties of the CNT are unaffected.
-
FIG. 2 illustrates amethod 200 of forming the CNT-pentacene composite. Themethod 200 of forming the CNT-pentacene composite may include depositing (210) on a substrate a dispersion of soluble pentacene precursor and carbon nanotubes, heating (220) the dispersion (e.g., at a temperature in a range from 50° C. to 100° C.) to remove solvent from the dispersion, and heating (230) the substrate (e.g., at a temperature in a range from 100° C. to 200° C.) to convert the pentacene precursor to pentacene and form the CNT-pentacene composite. - The
method 200 may also include reacting pentacene with a dienophile to form a pentacene precursor (e.g., a soluble pentacene precursor). It should be noted that although the present invention is described as including pentacene, other polycyclic aromatic compounds may also be used instead of pentacene. - The dienophile may include, for example, a compound that has at least one heteroatom such as N, O or S, connected by a double bond to a second heteroatom or carbon. In particular, the dienophile may include an N-sulfinylamide. For example, the dienophile may include N-sulfinyl acetamide.
- The pentacene may be reacted with the dienophile at low to moderate temperatures and in the presence of a catalyst such as a Lewis acid catalyst to form the pentacene precursor. The Lewis acid catalyst may include, for example, titanium tetrachloride, silver tetrafluoroborate and methyl rhenium trioxide. Any residue from the dienophile remaining in the product of the reaction may be removed either by washing with a solvent or by vacuum drying.
-
FIG. 3A illustrates a reaction (e.g., a Diels-Alder reaction) in which pentacene (I) is reacted with the dienophile N-sulfinyl acetamide (II) in the presence of a Lewis acid catalyst to give the pentacene precursor (III), according to an exemplary embodiment of the present invention. - The carbon nanotubes (CNTs) of the present invention may be formed by any one of several processes including, for example, arc discharge, laser ablation, high pressure carbon monoxide (HiPCO), and chemical vapor deposition (CVD) (e.g., plasma enhanced CVD).
- For example, using CVD, a metal catalyst layer of metal catalyst (e.g., including nickel, cobalt, iron, or a combination thereof), is formed on a substrate (e.g., silicon). The metal nanoparticles may be mixed with a catalyst support (e.g., MgO, Al2O3, etc) to increase the specific surface area for higher yield of the catalytic reaction of the carbon feedstock with the metal particles. The diameters of the nanotubes that are to be grown may be controlled by controlling the size of the metal particles, such as by patterned (or masked) deposition of the metal, annealing, or by plasma etching of a metal layer.
- The substrate including the metal catalyst layer may be heated to approximately 700° C. The growth of the CNTs may then be initiated at the site of the metal catalyst by introducing at least two gases into the reactor: a process gas (e.g., ammonia, nitrogen, hydrogen or a mixture of these) and a carbon-containing gas (e.g., acetylene, ethylene, ethanol, methane or a mixture of these).
- A plasma may be also be used to enhance the growth process (plasma enhanced chemical vapor deposition), in which case the nanotube growth may follow the direction of the plasma's electric field. By properly adjusting the geometry of the reactor it is possible to synthesize aligned carbon nanotubes.
- Generally, the CNTs of the present invention may be electrically and thermally conductive, and have an essentially uniform diameter which is in a range from 1 μm to 3 μm and a length which is in a range from 1 μm to 10 μm. The CNTs may also be single-walled nanotubes (SWNTs) or multi-walled nanotubes (MWNTs) (e.g., double-walled nanotubes (DWNTs)). The CNTs may also have a zigzag, an armchair, or a chiral arrangement, so long as the resulting CNT-pentacene composite should exhibit good charge carrier mobility (e.g., in the range of 1 cm2/V·sec to 1000 cm2/V·sec).
- The CNTs may also be purified (e.g., by washing in a sodium hypochlorite solution) to remove any contaminants.
- The pentacene precursor (e.g., obtained from a Diels-Alder reaction of pentacene with an N-sulfinylamide) and the purified carbon nanotubes may be dissolved in a solvent to form a mixture of soluble pentacene precursors and carbon nanotubes.
- The solvent may include, for example, chloroform, tetrachloroethane, tetrahydrofuran (THF), toluene, ethyl acetate, methyl ethyl ketone (MEK), dimethyl formamide, dichlorobenzene, propylene glycol monomethyl ether acetate (PGMEA) or mixtures of any of these.
- The mixture of purified carbon nanotubes and pentacene-N-sulfinylacetamide in an organic solvent may then be sonicated and centrifuged to remove un-coordinated nanotube as sediment. The supernatant liquid remaining after sonicating/centrifuging may serve as the stable dispersion of pentacene precursors and carbon nanotubes in the present invention.
- The supernatant liquid may then be deposited on a substrate, for example, by spin coating, drop cast, etc. The supernatant liquid may be deposited, for example, on the substrate at a location which is intended for the CNT-pentacene composite.
-
FIG. 3B illustrates an exemplary orientation of the plural molecules ofpentacene precursor 305 along thecarbon nanotube 310 in the deposited dispersion. As illustrated inFIG. 3B , the molecules ofpentacene precursor 305 may include pentacene portions which are formed in a “saddle-like” configuration on thecarbon nanotube 310, and N-sulfinyl acetamide functional group portions (e.g., —SO—N—CO—CH3) which are formed at the apex of the “saddle-like” configuration and relatively aligned along thecarbon nanotube 310 when viewing thecarbon nanotube 310 in an axial direction. - After the stable dispersion of soluble pentacene precursors and carbon nanotubes has been deposited on a substrate, the substrate including the layer of dispersion may be heated at a low temperature (e.g., in a range from 50° C. to 100° C). to remove the solvent from the layer of dispersion and to form a pentacene precursor coated CNT.
- As illustrated in
FIG. 3C , after removal of the solvent from the layer of dispersion, the substrate may be heated again in a nitrogen atmosphere at a temperature in a range from 100° C. to 200° C. to convert the pentacene preursor which is coated on the CNT to pentacene and, hence, to form a composite ofpentacene 120 and carbon nanotube 110 (e.g., CNT-pentacene composite) at a location where the dispersion was deposited. -
FIG. 4 illustrates anexemplary method 400 of forming a semiconductor device 450 (e.g., field effect transistor (FET)) according an exemplary aspect of the present invention. - As illustrated in
FIG. 4 , a substrate 402 (e.g., semiconductor substrate such as silicon, germanium, etc.) may be provided with a gate electrode 410 (e.g., highly doped silicon), an insulation layer 404 (e.g., SiO2, SiN, SiON), and a source electrode 406 (e.g., gold, palladium, etc.) and a drain electrode 408 (e.g., gold, palladium, etc.) formed on the insulation layer 404 (e.g., gate insulation layer). That is, thesubstrate 402 may include apredefined source electrode 406,drain electrode 408 and agate electrode 410. - The dispersion of pentacene precursors and carbon nanotubes may be deposited (e.g., by spin coating, drop cast, etc.) on the insulation layer 404 (e.g., between the source and drain
electrodes 406, 408). The solvent is removed (e.g., by heating at low temperature such as in a range from 50° C. to 100° C). to form the pentacene precursor-coated-CNT 412 on the insulation layer 404 (e.g., between the source and drainelectrodes 406, 408), as illustrated inFIG. 4 . - After removal of the solvent, the substrate is then heated (e.g., in a range from 100° C. to 200° C.) under nitrogen until all the pentacene precursor decoration are converted to pentacene resulting in a CNT-
pentacene composite layer 414 formed on theinsulation layer 404 and in the channel area (e.g., between the source and drainelectrodes 406, 408). That is, the CNT-pentacene composite layer 414 may serve as the channel material in thedevice 450. The CNT-pentacene composite layer 414 may have a thickness in a range from 10 nm to 200 nm. - In addition to converting the pentacene precursor-coated-
CNT 412 to the CNT-pentacene composite layer 414, the heating may also help to bond the CNT-pentacene composite layer to an adjacent feature (e.g., source and drain electrodes, insulating layer, etc.). - It should be noted that although
FIG. 4 illustrates a semiconductor device in which the CNT-pentacene composite layer 414 includes only one carbon nanotube, thecomposite layer 414 may include plural carbon nanotubes which are coordinated (e.g., aligned) and have plural pentacene molecules formed on each of the carbon nanotubes. In particular, the carbon nanotube(s) in thecomposite layer 414 may be aligned at least substantially in a direction from one of the source/gate electrodes to the other one of the source/gate electrodes. - It should also be noted that although the
FIG. 4 illustrates thedevice 450 as including the CNT-pentacene composite layer 414 (e.g., channel region) formed on theinsulation layer 404 and between the source and drainelectrodes FIGS. 5A-5C illustrate other possible configurations for thesemiconductor device 450 according to other exemplary embodiments of the present invention. - As illustrated in
FIG. 5A , the CNT-pentacene composite layer 414 could be formed on thesubstrate 402, and the source and drainelectrodes composite layer 414. Thegate insulating layer 404 may then be formed on the source and drainelectrodes gate electrode 410 may then be formed on thegate insulating layer 404. - As illustrated in
FIG. 5B , thegate electrode 410 may be formed on thesubstrate 402 and then thegate insulating layer 404 may be formed on thegate electrode 410. The CNT-pentacene composite layer 414 may then be formed on thegate insulating layer 404 and the source and drainelectrodes gate insulating layer 404. - Further, as illustrated in
FIG. 5C , the CNT-pentacene composite layer 414 could be formed on thesubstrate 402, and one of the source and drainelectrodes 406, 408 (in this case, the drain electrode) may be formed on thesubstrate 402 beside thecomposite layer 414. Then, the other of the source and drainelectrodes 406, 408 (in this case, the source electrode) and thegate insulating layer 404 may be formed on thecomposite layer 414. Thegate electrode 410 may then be formed on thegate insulating layer 404. -
FIG. 6 illustrates anexemplary method 600 of forming a semiconductor device according to the present invention. As illustrated inFIG. 6 , themethod 600 includes forming (610) source, drain and gate electrodes on a substrate, and forming (620) a channel region on the substrate, the channel region including a carbon nanotube-pentacene composite layer. - It should also be noted that although the present invention is described herein as being used to form a transistor, the invention may be used to form other semiconductor devices which utilize a layer having good charge carrier mobility (e.g., diodes, photovoltaics, etc.).
- With its unique and novel features, the exemplary aspects of the present invention may provide a method of forming a semiconductor device including forming a channel region including a carbon nanotube-pentacene composite layer.
- While the invention has been described in terms of one or more embodiments, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the appended claims. Specifically, one of ordinary skill in the art will understand that the drawings herein are meant to be illustrative, and the design of the inventive assembly is not limited to that disclosed herein but may be modified within the spirit and scope of the present invention.
- Further, Applicant's intent is to encompass the equivalents of all claim elements, and no amendment to any claim in the present application should be construed as a disclaimer of any interest in or right to an equivalent of any element or feature of the amended claim.
Claims (16)
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US13/617,420 US20130015433A1 (en) | 2008-04-30 | 2012-09-14 | Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite |
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US12/113,064 US8598569B2 (en) | 2008-04-30 | 2008-04-30 | Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite |
US13/617,420 US20130015433A1 (en) | 2008-04-30 | 2012-09-14 | Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite |
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US12/113,064 Division US8598569B2 (en) | 2008-04-30 | 2008-04-30 | Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite |
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US13/617,420 Abandoned US20130015433A1 (en) | 2008-04-30 | 2012-09-14 | Pentacene-carbon nanotube composite, method of forming the composite, and semiconductor device including the composite |
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US8022487B2 (en) * | 2008-04-29 | 2011-09-20 | Intel Corporation | Increasing body dopant uniformity in multi-gate transistor devices |
CN101582382B (en) * | 2008-05-14 | 2011-03-23 | 鸿富锦精密工业(深圳)有限公司 | Preparation method of thin film transistor |
CN101582451A (en) * | 2008-05-16 | 2009-11-18 | 清华大学 | Thin film transistor |
CN101582449B (en) * | 2008-05-14 | 2011-12-14 | 清华大学 | Thin film transistor |
CN101599495B (en) * | 2008-06-04 | 2013-01-09 | 清华大学 | Thin-film transistor panel |
CN101582450B (en) * | 2008-05-16 | 2012-03-28 | 清华大学 | Thin film transistor |
CN101582447B (en) * | 2008-05-14 | 2010-09-29 | 清华大学 | Thin film transistor |
CN101587839B (en) * | 2008-05-23 | 2011-12-21 | 清华大学 | Method for producing thin film transistors |
CN101593699B (en) * | 2008-05-30 | 2010-11-10 | 清华大学 | Method for preparing thin film transistor |
CN101582445B (en) * | 2008-05-14 | 2012-05-16 | 清华大学 | Thin film transistor |
CN101582448B (en) * | 2008-05-14 | 2012-09-19 | 清华大学 | Thin film transistor |
CN101582446B (en) * | 2008-05-14 | 2011-02-02 | 鸿富锦精密工业(深圳)有限公司 | Thin film transistor |
CN101582444A (en) * | 2008-05-14 | 2009-11-18 | 清华大学 | Thin film transistor |
IT1401734B1 (en) * | 2010-06-29 | 2013-08-02 | St Microelectronics Srl | ELECTRONIC DEVICE INCLUDING A LAYER OF INTERFACE CONNECTION BASED ON NANOTUBES, AND MANUFACTURING PROCEDURE |
US8703523B1 (en) | 2010-12-06 | 2014-04-22 | Lawrence Livermore National Security, Llc. | Nanoporous carbon tunable resistor/transistor and methods of production thereof |
US8642432B2 (en) | 2011-12-01 | 2014-02-04 | International Business Machines Corporation | N-dopant for carbon nanotubes and graphene |
US8828762B2 (en) * | 2012-10-18 | 2014-09-09 | International Business Machines Corporation | Carbon nanostructure device fabrication utilizing protect layers |
JP6228129B2 (en) * | 2012-12-12 | 2017-11-08 | 株式会社ダイセル | Solvent or solvent composition for organic transistor production |
US9620728B2 (en) * | 2014-01-30 | 2017-04-11 | National Research Council Of Canada | CNT thin film transistor with high K polymeric dielectric |
US9859394B2 (en) | 2014-12-18 | 2018-01-02 | Agilome, Inc. | Graphene FET devices, systems, and methods of using the same for sequencing nucleic acids |
US10020300B2 (en) | 2014-12-18 | 2018-07-10 | Agilome, Inc. | Graphene FET devices, systems, and methods of using the same for sequencing nucleic acids |
EP3235010A4 (en) | 2014-12-18 | 2018-08-29 | Agilome, Inc. | Chemically-sensitive field effect transistor |
US10006910B2 (en) | 2014-12-18 | 2018-06-26 | Agilome, Inc. | Chemically-sensitive field effect transistors, systems, and methods for manufacturing and using the same |
US9618474B2 (en) | 2014-12-18 | 2017-04-11 | Edico Genome, Inc. | Graphene FET devices, systems, and methods of using the same for sequencing nucleic acids |
US9857328B2 (en) | 2014-12-18 | 2018-01-02 | Agilome, Inc. | Chemically-sensitive field effect transistors, systems and methods for manufacturing and using the same |
EP3459115A4 (en) | 2016-05-16 | 2020-04-08 | Agilome, Inc. | Graphene fet devices, systems, and methods of using the same for sequencing nucleic acids |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6963080B2 (en) * | 2001-11-26 | 2005-11-08 | International Business Machines Corporation | Thin film transistors using solution processed pentacene precursor as organic semiconductor |
US7125989B2 (en) * | 2001-11-26 | 2006-10-24 | International Business Machines Corporation | Hetero diels-alder adducts of pentacene as soluble precursors of pentacene |
US20040183070A1 (en) | 2003-03-21 | 2004-09-23 | International Business Machines Corporation | Solution processed pentacene-acceptor heterojunctions in diodes, photodiodes, and photovoltaic cells and method of making same |
US7563500B2 (en) * | 2003-08-27 | 2009-07-21 | Northeastern University | Functionalized nanosubstrates and methods for three-dimensional nanoelement selection and assembly |
CA2567930A1 (en) * | 2004-06-08 | 2005-12-22 | Nanosys, Inc. | Methods and devices for forming nanostructure monolayers and devices including such monolayers |
US7405129B2 (en) | 2004-11-18 | 2008-07-29 | International Business Machines Corporation | Device comprising doped nano-component and method of forming the device |
US7598516B2 (en) | 2005-01-07 | 2009-10-06 | International Business Machines Corporation | Self-aligned process for nanotube/nanowire FETs |
US7504132B2 (en) | 2005-01-27 | 2009-03-17 | International Business Machines Corporation | Selective placement of carbon nanotubes on oxide surfaces |
US7391074B2 (en) * | 2005-08-03 | 2008-06-24 | International Business Machines Corporation | Nanowire based non-volatile floating-gate memory |
GB2434692A (en) | 2005-12-29 | 2007-08-01 | Univ Surrey | Photovoltaic or electroluminescent devices with active region comprising a composite polymer and carbon nanotube material. |
US8859048B2 (en) | 2006-01-03 | 2014-10-14 | International Business Machines Corporation | Selective placement of carbon nanotubes through functionalization |
US7771695B2 (en) | 2006-07-21 | 2010-08-10 | International Business Machines Corporation | Complexes of carbon nanotubes and fullerenes with molecular-clips and use thereof |
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US8598569B2 (en) | 2013-12-03 |
WO2009132894A1 (en) | 2009-11-05 |
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