JP5309437B2 - 偏光照射装置、光配向膜用配向装置、及びそれを使用して得た光配向膜 - Google Patents

偏光照射装置、光配向膜用配向装置、及びそれを使用して得た光配向膜 Download PDF

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Publication number
JP5309437B2
JP5309437B2 JP2006288669A JP2006288669A JP5309437B2 JP 5309437 B2 JP5309437 B2 JP 5309437B2 JP 2006288669 A JP2006288669 A JP 2006288669A JP 2006288669 A JP2006288669 A JP 2006288669A JP 5309437 B2 JP5309437 B2 JP 5309437B2
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alignment
photo
irradiated
polarized light
liquid crystal
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JP2006288669A
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Japanese (ja)
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JP2008107453A (ja
JP2008107453A5 (cg-RX-API-DMAC7.html
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善之 小野
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DIC Corp
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DIC Corp
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JP2006288669A 2006-10-24 2006-10-24 偏光照射装置、光配向膜用配向装置、及びそれを使用して得た光配向膜 Expired - Fee Related JP5309437B2 (ja)

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JP2006288669A JP5309437B2 (ja) 2006-10-24 2006-10-24 偏光照射装置、光配向膜用配向装置、及びそれを使用して得た光配向膜

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JP2006288669A JP5309437B2 (ja) 2006-10-24 2006-10-24 偏光照射装置、光配向膜用配向装置、及びそれを使用して得た光配向膜

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JP2008107453A JP2008107453A (ja) 2008-05-08
JP2008107453A5 JP2008107453A5 (cg-RX-API-DMAC7.html) 2009-11-05
JP5309437B2 true JP5309437B2 (ja) 2013-10-09

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JP2006288669A Expired - Fee Related JP5309437B2 (ja) 2006-10-24 2006-10-24 偏光照射装置、光配向膜用配向装置、及びそれを使用して得た光配向膜

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101260221B1 (ko) * 2011-12-01 2013-05-06 주식회사 엘지화학 마스크
JP5954594B2 (ja) * 2014-03-10 2016-07-20 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法
US11215854B2 (en) * 2018-04-24 2022-01-04 Hefei Xinsheng Optoelectronics Technology Co., Ltd. Apparatus for photo-alignment process, method of fabricating a liquid crystal display substrate, and method of fabricating an apparatus for photo-alignment process

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0519209A (ja) * 1991-07-10 1993-01-29 Seiko Epson Corp 偏光光源装置及びそれを用いた投写型液晶表示装置
JPH07234318A (ja) * 1994-02-21 1995-09-05 Matsushita Electric Ind Co Ltd 偏光装置、これを用いた偏光光源装置、投写型表示装置
JP3384346B2 (ja) * 1999-01-14 2003-03-10 ウシオ電機株式会社 液晶表示素子の光配向用偏光光照射装置
JP2002148435A (ja) * 2000-11-10 2002-05-22 Fdk Corp 偏光分離合成素子及びそれを用いる光デバイス
JP2002287147A (ja) * 2001-03-27 2002-10-03 Ushio Inc 偏光光照射装置
JP4706255B2 (ja) * 2004-12-28 2011-06-22 ウシオ電機株式会社 偏光光照射装置
JP2006251443A (ja) * 2005-03-11 2006-09-21 Seiko Epson Corp 露光装置、露光方法及び電気光学装置

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