JP5305938B2 - 露光装置、光源装置及びデバイス製造方法 - Google Patents

露光装置、光源装置及びデバイス製造方法 Download PDF

Info

Publication number
JP5305938B2
JP5305938B2 JP2009009423A JP2009009423A JP5305938B2 JP 5305938 B2 JP5305938 B2 JP 5305938B2 JP 2009009423 A JP2009009423 A JP 2009009423A JP 2009009423 A JP2009009423 A JP 2009009423A JP 5305938 B2 JP5305938 B2 JP 5305938B2
Authority
JP
Japan
Prior art keywords
optical element
mirror
wavelength
reflective optical
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009009423A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010171031A5 (enExample
JP2010171031A (ja
Inventor
直哉 飯塚
文太郎 正木
明 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009009423A priority Critical patent/JP5305938B2/ja
Priority to US12/690,503 priority patent/US20100182583A1/en
Publication of JP2010171031A publication Critical patent/JP2010171031A/ja
Publication of JP2010171031A5 publication Critical patent/JP2010171031A5/ja
Application granted granted Critical
Publication of JP5305938B2 publication Critical patent/JP5305938B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009009423A 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法 Expired - Fee Related JP5305938B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009009423A JP5305938B2 (ja) 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法
US12/690,503 US20100182583A1 (en) 2009-01-20 2010-01-20 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009009423A JP5305938B2 (ja) 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010171031A JP2010171031A (ja) 2010-08-05
JP2010171031A5 JP2010171031A5 (enExample) 2012-03-01
JP5305938B2 true JP5305938B2 (ja) 2013-10-02

Family

ID=42336715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009009423A Expired - Fee Related JP5305938B2 (ja) 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US20100182583A1 (enExample)
JP (1) JP5305938B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102436152B (zh) * 2011-12-22 2013-06-19 北京理工大学 一种深紫外光刻照明系统
JP5729517B1 (ja) 2014-03-28 2015-06-03 Toto株式会社 反応焼結炭化珪素部材

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3309890B2 (ja) * 1995-04-06 2002-07-29 日本電信電話株式会社 多層膜ｘ線反射鏡
JP2003315532A (ja) * 2002-04-22 2003-11-06 Sony Corp 極短紫外光の反射体およびその製造方法、位相シフトマスク、並びに露光装置
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DE102008002403A1 (de) * 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung

Also Published As

Publication number Publication date
US20100182583A1 (en) 2010-07-22
JP2010171031A (ja) 2010-08-05

Similar Documents

Publication Publication Date Title
TWI528116B (zh) 形成光譜純度濾光器之方法
USRE49066E1 (en) Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus
JP5449358B2 (ja) レチクル、リソグラフィ装置、およびレチクルを生成する方法
US7083290B2 (en) Adjustment method and apparatus of optical system, and exposure apparatus
TWI597579B (zh) 輻射源
JP2008270739A (ja) 光学装置、多層膜反射鏡、露光装置、及びデバイス製造方法
TW200807020A (en) Multilayer mirror, evaluation method, exposure apparatus, device manufacturing method
US9063277B2 (en) Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method
JP6140191B2 (ja) リソグラフィ装置及びデバイス製造方法
CN105122140A (zh) 辐射收集器、辐射源以及光刻设备
US20050157284A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2004311780A (ja) 露光装置
JP2004273572A (ja) 収差測定装置及び方法
TWI452440B (zh) 多層鏡及微影裝置
JP2010199503A (ja) 光学素子、露光装置及びデバイス製造方法
US8030628B2 (en) Pulse modifier, lithographic apparatus and device manufacturing method
JP5305938B2 (ja) 露光装置、光源装置及びデバイス製造方法
TWI880958B (zh) 微影設備及偵測輻射光束之方法
TWI453526B (zh) 經組態以將一光學元件安裝於用於一微影裝置之一模組中之座、用於一微影裝置之模組及經建構及配置以將一力施加於一微影裝置之一模組之一光學元件之一周邊上的彈性構件
JP3958261B2 (ja) 光学系の調整方法
US7543948B2 (en) Multilayer mirror manufacturing method, optical system manufacturing method, exposure apparatus, and device manufacturing method
JP2005308629A (ja) ミラーユニット及びそれの製造方法
JP4393227B2 (ja) 露光装置、デバイスの製造方法、露光装置の製造方法
US20040179179A1 (en) Exposure apparatus
JP4591686B2 (ja) 多層膜反射鏡

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120116

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120116

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130118

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130129

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130325

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130528

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130625

LAPS Cancellation because of no payment of annual fees