JP5282895B2 - 露光装置、露光方法、およびデバイス製造方法 - Google Patents

露光装置、露光方法、およびデバイス製造方法 Download PDF

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JP5282895B2
JP5282895B2 JP2009052773A JP2009052773A JP5282895B2 JP 5282895 B2 JP5282895 B2 JP 5282895B2 JP 2009052773 A JP2009052773 A JP 2009052773A JP 2009052773 A JP2009052773 A JP 2009052773A JP 5282895 B2 JP5282895 B2 JP 5282895B2
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pattern
axis
mask
substrate
along
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JP2010204588A (ja
JP2010204588A5 (enrdf_load_stackoverflow
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雅人 熊澤
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Nikon Corp
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Nikon Corp
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JP2009052773A 2009-03-06 2009-03-06 露光装置、露光方法、およびデバイス製造方法 Active JP5282895B2 (ja)

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JP2010204588A JP2010204588A (ja) 2010-09-16
JP2010204588A5 JP2010204588A5 (enrdf_load_stackoverflow) 2012-08-16
JP5282895B2 true JP5282895B2 (ja) 2013-09-04

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102096891B1 (ko) * 2012-07-13 2020-04-03 가부시키가이샤 니콘 디바이스 제조 방법
JP6160620B2 (ja) * 2012-08-06 2017-07-12 株式会社ニコン 処理装置およびデバイス製造方法
JP6069941B2 (ja) * 2012-08-08 2017-02-01 株式会社ニコン 投影露光装置及びデバイス製造方法
JP6256338B2 (ja) * 2012-09-14 2018-01-10 株式会社ニコン 基板処理装置及びデバイス製造方法
TWI596652B (zh) * 2012-11-06 2017-08-21 尼康股份有限公司 Polarizing beam splitter, substrate processing apparatus, component manufacturing system, and device manufacturing method
KR102204689B1 (ko) * 2013-04-18 2021-01-19 가부시키가이샤 니콘 주사 노광 장치
CN105684126A (zh) * 2013-10-22 2016-06-15 应用材料公司 具有主动对准的卷对卷无掩模光刻

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001313241A (ja) * 2000-04-28 2001-11-09 Canon Inc 露光装置および露光方法
JP3652329B2 (ja) * 2002-06-28 2005-05-25 キヤノン株式会社 走査露光装置、走査露光方法、デバイス製造方法およびデバイス
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置

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