JP5254653B2 - 保護膜被覆装置 - Google Patents
保護膜被覆装置 Download PDFInfo
- Publication number
- JP5254653B2 JP5254653B2 JP2008098406A JP2008098406A JP5254653B2 JP 5254653 B2 JP5254653 B2 JP 5254653B2 JP 2008098406 A JP2008098406 A JP 2008098406A JP 2008098406 A JP2008098406 A JP 2008098406A JP 5254653 B2 JP5254653 B2 JP 5254653B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- protective film
- holding
- ring frame
- film coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000001681 protective effect Effects 0.000 title claims description 77
- 239000007888 film coating Substances 0.000 title claims description 34
- 238000009501 film coating Methods 0.000 title claims description 34
- 239000011347 resin Substances 0.000 claims description 16
- 229920005989 resin Polymers 0.000 claims description 16
- 239000007788 liquid Substances 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 239000002390 adhesive tape Substances 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000032258 transport Effects 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 8
- 238000001514 detection method Methods 0.000 description 8
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Images
Landscapes
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
10a 加工面
10b 裏面
11 粘着テープ
12 リングフレーム
12a 開口部
100 保護膜被覆装置
110 保持テーブル
111 保持面
112 ヒータ
120 被覆手段
130 リングフレーム保持手段
140 赤外線カメラ
170 保護膜
180 隙間
Claims (1)
- 粘着テープを介してリングフレームの開口部に貼着されたウエーハの加工面にレーザ光線を照射してレーザ加工を施す前に前記ウエーハの加工面に保護膜を被覆する保護膜被覆装置であって、
ヒータを有する保持テーブルと、
該保持テーブルに保持されて加熱された前記ウエーハの加工面に液状の樹脂を被覆して前記保護膜を形成する被覆手段と、
前記保持テーブルの上側で前記リングフレームを保持するリングフレーム保持手段と、
該リングフレーム保持手段に保持された前記リングフレームに貼着された前記ウエーハの全面を検出可能な上方位置に配設されて赤外線を検出する赤外線カメラと、
を備え、
前記保護膜の被覆状態の検出時には、前記ウエーハを保持していた保持テーブルを下降させることで、前記リングフレーム保持手段に保持された前記ウエーハの裏面と前記保持テーブルの保持面との間に所定の隙間を持たせた状態で、前記ヒータを加熱状態のまま所定の待機時間経過後に、前記赤外線カメラによって前記ウエーハの全面から放射される赤外線を検出するようにしたことを特徴とする保護膜被覆装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008098406A JP5254653B2 (ja) | 2008-04-04 | 2008-04-04 | 保護膜被覆装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008098406A JP5254653B2 (ja) | 2008-04-04 | 2008-04-04 | 保護膜被覆装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009252967A JP2009252967A (ja) | 2009-10-29 |
JP5254653B2 true JP5254653B2 (ja) | 2013-08-07 |
Family
ID=41313392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008098406A Active JP5254653B2 (ja) | 2008-04-04 | 2008-04-04 | 保護膜被覆装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5254653B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8802545B2 (en) * | 2011-03-14 | 2014-08-12 | Plasma-Therm Llc | Method and apparatus for plasma dicing a semi-conductor wafer |
JP2013254817A (ja) * | 2012-06-06 | 2013-12-19 | Disco Abrasive Syst Ltd | レーザー加工装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0290008A (ja) * | 1988-09-28 | 1990-03-29 | Oki Electric Ind Co Ltd | レジスト塗布膜厚測定方法及びその装置 |
JPH05299428A (ja) * | 1992-04-17 | 1993-11-12 | Sony Corp | 半導体ウェーハの熱処理方法及び熱処理装置 |
JPH06212432A (ja) * | 1993-01-20 | 1994-08-02 | Hitachi Ltd | 化学蒸着装置 |
JP4776431B2 (ja) * | 2006-05-17 | 2011-09-21 | 株式会社ディスコ | 保護膜被覆装置 |
-
2008
- 2008-04-04 JP JP2008098406A patent/JP5254653B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2009252967A (ja) | 2009-10-29 |
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