JP5195146B2 - Optical filter for display and manufacturing method thereof - Google Patents

Description

  The present invention relates to an optical filter for display and a method for producing the same. More specifically, the present invention is an inexpensive display optical filter that is disposed on a display surface of a display device such as a plasma display panel, shields leaking electromagnetic waves, and can be easily grounded (grounded), and The present invention relates to a method for manufacturing an optical filter for display, which can inexpensively manufacture an optical filter for display having such characteristics.

  A plasma display device (PDP) includes a front glass substrate having a display electrode, a bus electrode, a dielectric layer and a protective layer, and a back glass substrate having a phosphor layer on the data electrode, the dielectric layer and the stripe barrier rib. Are formed so as to be orthogonal to each other to form a cell, and a discharge gas such as neon gas or xenon gas is sealed in the cell.

  The PDP emits light by discharging a discharge gas when a voltage is applied between the data electrode and the display electrode, and when the discharge gas ions in a plasma state return to the ground state, ultraviolet light is generated. Excites the phosphor layer to emit red (R), green (G), and blue (B) light. In the process of emitting visible light, near infrared rays and electromagnetic waves are also generated in addition to the visible light.

The near infrared rays cause malfunctions of various remote control switches using the near infrared wavelength region, while electromagnetic waves may adversely affect the human body and other devices (for example, information processing devices).
Therefore, in the PDP, an optical filter having a near-infrared absorption function and an electromagnetic wave shielding function is installed in front of the plasma display display surface.
The display optical filter is also provided with an antireflection function, an antiglare function, and the like in order to prevent external light from being reflected and improve visibility.

  By the way, in recent years, with the spread of plasma televisions, the price has drastically decreased, and the price of display optical filters having an electromagnetic wave shielding function has also decreased. Therefore, an inexpensive display optical filter having an electromagnetic wave shielding function, and Therefore, a manufacturing method capable of manufacturing the optical filter for display at a low cost is strongly demanded.

  As a manufacturing method capable of inexpensively manufacturing an optical filter in which such an electromagnetic wave shielding material is disposed, for example, Patent Document 1 discloses that “it consists of a conductive metal mesh pattern and a metal plating layer laminated thereon. An optical filter for display in which an electromagnetic wave shielding material is adhered to one side of a transparent base material constituting an optical filter is disclosed. Also, as a method for manufacturing the optical filter for display, “on a support base material” is disclosed. A mesh pattern generating step for generating a developed silver mesh pattern by a photographic manufacturing method, a plating step for forming an electromagnetic wave shielding material made of a metal mesh on the developed silver mesh pattern by a conductive metal plating layer, and the electromagnetic wave shielding material Is attached to one side of the transparent substrate constituting the optical filter on the metal plating layer side by transfer. A method of manufacturing an optical filter for a display, which comprises a transfer step, a "is disclosed.

JP 2007-220789 A

However, in the optical filter for display provided with the electromagnetic wave shielding material described in Patent Document 1, the electromagnetic wave shielding material is completely embedded in the pressure-sensitive adhesive layer, so that it is grounded (grounded). There was a disadvantage that it was difficult.
In addition, in the manufacturing method of the optical filter for display in which the electromagnetic wave shielding material described in Patent Document 1 is provided, it is an inexpensive manufacturing method using transfer, but the transfer material is used only once. It was impossible to use it, so that the manufacturing cost was not sufficiently reduced, and there was still a point to be improved.

The present invention has been made under such circumstances, and an object of the present invention is to provide an inexpensive optical filter for display that can be easily grounded (grounded).
It is another object of the present invention to provide a method for manufacturing an optical filter for display having an electromagnetic wave shielding function, which can reuse a transfer material and is inexpensive based on resource saving.

That is, the present invention
[1] An optical filter for display in which a transparent substrate A having at least one of a near-infrared absorption function and an antireflection function and a transparent substrate B are laminated and integrated through an adhesive layer. An electromagnetic wave shielding material having a mesh pattern is disposed on the adhesive surface of the pressure-sensitive adhesive layer with the transparent base material B, and the electromagnetic wave shielding material is disposed on the adhesive surface with the transparent base material B. An optical filter for display, which is connected to a conductive member for grounding,
[2] A method for producing an optical filter for display according to [1] above,
(A) A mesh-like pattern made of a conductive resin composition containing fine metal powder and resin is formed on one surface of the support film, and a metal layer having a mesh-like pattern is formed by plating metal on the mesh-like pattern. And a transparent base material A having a pressure-sensitive adhesive layer on the outermost layer on one side and having at least one of a near-infrared absorption function and an antireflection function, and the metal layer. And laminating and integrating so that the pressure-sensitive adhesive layer is in contact with each other, and forming a laminate,
(B) The transfer mesh film is peeled from the laminate obtained in the step (a), and the metal layer is peeled off from the transparent substrate A on which the metal layer is transferred to the pressure-sensitive adhesive layer. Obtaining a transfer mesh film,
(C) Conductivity disposed on the surface of the transparent substrate B, the transparent substrate A obtained by the step (b) and having the metal layer transferred to the pressure-sensitive adhesive layer and the transparent substrate B. A step of stacking and integrating the member through the pressure-sensitive adhesive layer to which the metal layer is transferred so that the metal layer exposed from the pressure-sensitive adhesive layer is in contact with the member;
A method of manufacturing an optical filter for display (hereinafter referred to as manufacturing method 1),

[3] The production of the optical filter for display according to the above [2], wherein in the step (a), a release agent is coated on a region of the transfer mesh film where the metal layer of the mesh pattern is not formed. Method,
[4] A transfer mesh obtained by plating the metal on the mesh pattern in the transfer mesh film from which the metal layer has been peeled, obtained in the step (b), to form a metal layer having a mesh pattern. A method for producing an optical filter for display according to the above [2] or [3], wherein a film is obtained and the mesh film for transfer is used,
[5] A method for producing an optical filter for display according to [1] above,
(X) A metal oxide layer having a mesh pattern formed of a first metal layer having a mesh pattern on one surface of the support film and a metal oxide forming the first metal layer on the first metal layer. A transfer mesh film in which a second metal layer of a mesh pattern is formed on the metal oxide layer of this mesh pattern, and an adhesive layer on the outermost layer on one side, and absorbs near infrared rays A step of forming a laminated body by laminating and integrating the transparent base material A having at least one of a function and an antireflection function so that the second metal layer and the pressure-sensitive adhesive layer are in contact with each other;
(Y) The transparent base material A in which the mesh film for transfer is peeled from the laminate obtained in the step (x) and the second metal layer is transferred to the pressure-sensitive adhesive layer, and the second metal A step of obtaining a transfer mesh film from which the layer has been peeled;
(Z) The transparent base material A obtained by the step (y) and having the second metal layer transferred to the pressure-sensitive adhesive layer and the transparent base material B are disposed on the surface of the transparent base material B. A step of stacking and integrating the second metal layer through the pressure-sensitive adhesive layer so that the conductive member and the second metal layer exposed from the pressure-sensitive adhesive layer are in contact with each other;
A display optical filter manufacturing method (hereinafter referred to as manufacturing method 2), comprising:
[6] In the step (x), in the transfer mesh film, a release agent in a region where the first metal layer, the metal oxide layer, and the second metal layer of the mesh pattern are not formed. A method for producing an optical filter for display according to the above [5],
[7] Transfer the second metal layer again on the metal oxide layer of the mesh pattern in the transfer mesh film obtained in the step (y) from which the second metal layer has been peeled off. A method for producing an optical filter for display according to the above [5] or [6], wherein a mesh film is obtained and the transfer mesh film is used, and [8] the second metal obtained in the step (y). On the first metal layer of the mesh pattern in the transfer mesh film from which the layer has been peeled off, the metal oxide layer constituting the first metal layer and the second metal layer are formed again to form the transfer mesh. A method for producing an optical filter for display according to the above [5] or [6], wherein a film is obtained and the mesh film for transfer is used,
Is to provide.

ADVANTAGE OF THE INVENTION According to this invention, the cheap optical filter for a display which can shield the electromagnetic waves which leak and can be earth | grounded simply can be provided.
Further, according to the manufacturing method 1 of the optical filter for display of the present invention, the transfer film can be reused by performing the metal plating process again on the transfer mesh film from which the metal layer has been peeled off. An inexpensive method for producing an optical filter for display having an electromagnetic wave shielding function based on resources can be provided.
Furthermore, according to the manufacturing method 2 of the optical filter for display according to the present invention, the transfer film from which the second metal layer has been peeled is subjected to oxidation treatment, or oxidation treatment and metal plating treatment again, whereby a transfer film is obtained. Therefore, it is possible to provide an inexpensive method for manufacturing an optical filter for display having an electromagnetic wave shielding function based on resource saving.

First, the display optical filter of the present invention will be described with reference to the accompanying drawings.
[Optical filter for display]
FIG. 1 is a schematic cross-sectional view showing an example of an optical filter for display according to the present invention. The optical filter for display 10a of this embodiment shown in FIG. 1 has an antireflection layer 12, a transparent substrate A11, and a near-infrared shielding layer 13 to which a near-infrared absorber is added in order from the visual side (the upper side in FIG. 1). The pressure-sensitive adhesive layer 21 and the transparent base material B51 are laminated and integrated. The electromagnetic wave shielding material 31 having a mesh pattern is formed on the adhesive surface 21a of the pressure-sensitive adhesive layer 21 with the transparent base material B51. The electromagnetic wave shielding material 31 can be grounded (grounded) through the conductive member 22 disposed on the sticking surface 51a of the transparent base material B51 and the side surface of the transparent base material B. It is. In addition, the code | symbol 61a is the transparent resin (transparent resin which has a functional layer on both surfaces) in which 12, 11, and 13 were integrated.

  FIG. 2 is a schematic sectional view showing another example of the optical filter for display according to the present invention. The display optical filter 10b of the present embodiment shown in FIG. 2 includes, in order from the visual side (upper side in FIG. 2), an antireflection layer 12, a near infrared shielding layer 13 to which a near infrared absorber is added, and a transparent substrate A11. The adhesive layer 21 and the transparent base material B51 are laminated and integrated, and an electromagnetic wave shielding material 31 having a mesh pattern is formed on the adhesive surface 51a of the adhesive layer 21 with the transparent base material B51. The electromagnetic shielding material 31 can be grounded (grounded) via the conductive member 22 disposed on the sticking surface 51a of the transparent base material B51 and the side surface of the transparent base material B. is there. In addition, the code | symbol 61b is the transparent resin (transparent resin which has a functional layer on one side) in which 12, 13, and 11 were integrated.

(Transparent substrate A)
As long as the material composing the transparent substrate A11 is a material that is transparent in the visible light region (that is, has a sufficient transmittance), there is no limitation on the type and composition thereof. Cellulose resin, polycarbonate resin, polyether sulfone resin, polyacrylate resin, norbornene resin, amorphous polyolefin resin, etc. can be appropriately selected, and the thickness is not particularly limited. The thing of about 50 micrometers-10 mm can be used. Among these polyester resins, polyethylene terephthalate (hereinafter also referred to as PET) resin is preferably used because of its excellent durability, solvent resistance, productivity, and the like.

  The transparent substrate A11 may be colored in order to adjust the color tone and transmittance, and an ultraviolet absorber is used to prevent the near infrared absorber in the near infrared shielding layer 13 from being deteriorated. It may be added. Examples of the ultraviolet absorber include ultraviolet absorbing compounds such as benzophenone, benzotriazole, paraaminobenzoic acid, and salicylic acid. As the ultraviolet shielding performance, the ultraviolet transmittance is preferably 2% or less in the ultraviolet region having a wavelength of 380 nm or less.

  When the transparent substrate A is made of plastic as described above, for the purpose of improving the adhesiveness with the layer provided on the surface, the surface treatment is performed on one or both sides by an oxidation method or an unevenness method, if desired. Can be applied. Examples of the oxidation method include corona discharge treatment, plasma treatment, chromic acid treatment (wet), flame treatment, hot air treatment, ozone / ultraviolet irradiation treatment, and examples of the unevenness method include a sand blast method, a solvent, and the like. Treatment methods and the like. These surface treatment methods are appropriately selected depending on the type of the substrate, but in general, the corona discharge treatment method is preferably used from the viewpoints of effects and operability. A primer layer may be provided.

The structure of the antireflection layer 12 formed on one surface of the transparent substrate A11 is not limited, and may have a single layer structure or a multilayer structure.
Although not shown in FIGS. 1 and 2, various functional layers such as an antistatic function and an antiglare function may be laminated on the antireflection layer 12. A hard coat functional layer may be provided between the layer 12 or between the transparent base material A <b> 11 and the near-infrared shielding layer 13.

(Near-infrared shielding layer)
The near-infrared shielding layer 13 laminated on the transparent substrate A11 preferably has a near-infrared shielding performance against near-infrared rays in the range of 800 nm to 1100 nm. For example, a near-infrared absorbing dye in a resin matrix Is preferably contained.
<Near-infrared absorbing dye>
The near-infrared absorbing dye is not particularly limited as long as it shields near-infrared rays in the range of 800 nm to 1100 nm. For example, diimonium compounds, aminium compounds, phthalocyanine compounds, organometallic complex compounds, cyanine compounds, Azo-based compounds, polymethine-based compounds, quinone-based compounds, diphenylmethane-based compounds, triphenylmethane-based compounds, mercaptonaphthol-based compounds, and the like may be used, and these may be used as a single species, or 2 You may use suitably combining a seed | species or more.

  The diimonium-based compound has a strong absorptivity with a molar extinction coefficient of about 100,000 in the near-infrared region with a wavelength of 850 nm to 1100 nm, and thus has excellent near-infrared shielding properties. The diimonium-based compound has a slight absorption in a visible light frame with a wavelength of 400 nm to 500 nm and exhibits a yellowish brown transmission color, but has a visible light transmittance superior to other near-infrared absorbing dyes, so that at least 1 It is preferable that a kind of diimonium compound is contained.

<Resin matrix>
As the transparent resin matrix forming the near-infrared absorbing layer 13, it is transparent in the visible light region (that is, has a sufficient transmittance), and for example, a polyester resin, an acrylic resin, a methacrylic resin, or the like is used. However, it is preferable to use a transparent resin having a glass transition point of 60 ° C. or higher.
When the glass transition point of the transparent resin is less than 60 ° C., the resin softens when exposed to a high temperature of 60 ° C. or more for a long time, and at the same time, the near-infrared absorbing dye in the near-infrared shielding layer 13, particularly diimonium-based. Near-infrared absorbing dyes composed of compounds are susceptible to thermal alteration, and this may reduce long-term stability, such as loss of color balance and reduced near-infrared shielding properties.
On the other hand, when the glass transition point of the transparent resin is 60 ° C. or higher, thermal deterioration of the near-infrared absorbing dye, particularly a near-infrared absorbing dye made of a diimonium compound can be suppressed. In addition, when the above resin is used, when the near infrared shielding layer is laminated and bonded to the electromagnetic shielding layer via the adhesive layer, the pigment in the near infrared shielding layer is deteriorated, the near infrared shielding layer is distorted, and peeled off. Etc. can be prevented.

(Adhesive layer)
The pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer 21 is not particularly limited as long as it is transparent in the visible light region (that is, has sufficient transmittance). As long as it is transparent, a curable resin or a thermoplastic resin may be used. Examples of the curable resins include thermosetting resins, ultraviolet curable resins, and electron beam curable resins. Among these curable resins, the equipment for resin curing is simple and excellent in workability. Therefore, an ultraviolet curable resin is preferable. When black pigment is directly mixed in the pressure-sensitive adhesive layer 21 for adjusting the transmittance, a thermoplastic resin is preferably used.
As the pressure-sensitive adhesive, an acrylic copolymer, a silicone copolymer, or the like is preferably used from the viewpoint of transparency.
The pressure-sensitive adhesive layer 21 may contain the near infrared absorbing dye. In this case, the near infrared shielding layer 13 need not be laminated.

(Transparent substrate B)
The material constituting the transparent base material B51 is not limited as long as it is a material having sufficient transparency in the visible light region, and a glass plate or a transparent film can be used.
The transparent film can be appropriately selected from polyester resins, triacetyl cellulose resins, polycarbonate resins, polyether sulfone resins, polyacrylate resins, norbornene resins, amorphous polyolefin resins, etc. The thickness is not particularly limited, and a thickness of about 0.1 mm to 10 mm can be usually used. Among polyester resins, polyethylene terephthalate (hereinafter also referred to as PET) resin is preferably used because it is excellent in terms of durability, solvent resistance, productivity, and the like.
When the transparent substrate B is made of plastic, a surface treatment can be performed in the same manner as in the case of the transparent substrate A for the purpose of improving the adhesion with the layer provided on the surface.

(Electromagnetic wave shielding material)
The electromagnetic shielding material 31 having the mesh pattern is formed by intersecting a vertical line of metallic fine wires having an appropriate pitch interval and a horizontal line of metallic fine wires having an appropriate pitch interval. It is. The intersection of the vertical line and the horizontal line may be orthogonal or oblique. The line widths of the vertical lines and horizontal lines constituting the ultrafine line mesh pattern are each about 5 μm to 50 μm, preferably 10 μm to 30 μm. In addition, the pitch intervals between the vertical lines and the horizontal lines constituting the ultrafine mesh pattern are about 100 μm to 500 μm, preferably 200 μm to 300 μm, respectively. If the line width and pitch interval deviate from the above range, moire interference fringes are generated, the image quality is deteriorated, and it is difficult to achieve both the transmittance suitable for the display and the electromagnetic wave shielding performance.

  In the pressure-sensitive adhesive layer 21, the material forming the conductive member 22 disposed on the side of the sticking surface 51 a and the transparent base material B 51 with the transparent base material B 51 is particularly a material having excellent conductivity. For example, a belt-like (tape-like) aluminum plate having a thickness of about 30 μm to 100 μm can be exemplified.

The optical filter for display 10a or 10b configured as described above is such that the electromagnetic wave shielding material 31 having a mesh pattern is bonded to the transparent base material B51 in the adhesive layer 21 and the side face of the transparent base material B51. Is connected to a grounding (grounding) conductive member 22, and can be easily grounded (grounded) via the conductive member 22.
In addition, since the display optical filter 10a or 10b is manufactured by the manufacturing method 1 or 2 as described in detail below, for example, it is significantly less expensive than the conventional display optical filter. It has become.

Next, the manufacturing method of the optical filter for display of this invention is demonstrated. The manufacturing method of the optical filter for display according to the present invention includes two modes, manufacturing method 1 and manufacturing method 2 described below.
FIG. 3 is a schematic sectional view of a transfer film in the display optical filter manufacturing method 1 of the present invention. FIG. 4 is an example of a method for transferring a metal layer in the display optical filter manufacturing method of the present invention. It is explanatory drawing shown, Comprising: Based on FIG.3 and FIG.4, the manufacturing method of this invention is demonstrated. FIG. 4 shows an example in which a transparent substrate 61a having functional layers on both sides is used.

[Method 1 of manufacturing optical filter for display]
The manufacturing method 1 of the optical filter for display is as follows.
(A) A mesh pattern 74 made of a conductive resin composition containing fine metal powder and resin is formed on one surface of the support film 73, and a metal pattern is plated on the mesh pattern 74 to form a mesh pattern. A step (a-1) of obtaining a transfer mesh film 81 having the metal layer 71 formed thereon;
A transparent substrate having the transfer film 81 obtained in the step (a-1) and the pressure-sensitive adhesive layer 21 on the outermost layer on one side, and having at least one of a near infrared absorption function and an antireflection function. A11 (in FIG. 4, transparent resin 61a having functional layers on both sides) is laminated and integrated so that the metal layer 71 and the pressure-sensitive adhesive layer 21 are in contact with each other to form a laminate (a-2) When,
(B) The transparent base material 61a in which the transfer mesh film 81 is peeled from the laminate obtained in the step (a-2) and the metal layer 71 is transferred to the pressure-sensitive adhesive layer 21; Obtaining a transfer mesh film 81a from which the metal layer 71 has been peeled;
(C) The transparent base material 61a obtained by the step (b) and having the metal layer 71 transferred to the adhesive layer 21 and the transparent base material B51 are disposed on the surface of the transparent base material B51. A step of stacking and integrating the metal layer 71 through the pressure-sensitive adhesive layer 21 so that the conductive layer 22 and the metal layer 71 exposed from the pressure-sensitive adhesive layer 21 are in contact with each other;
have.

Hereinafter, the manufacturing method 1 is demonstrated for every process.
(Step (a-1))
In this step, as shown in FIG. 3, a mesh pattern 74 is formed on one surface of the support film 73 by using, for example, a printing method using a conductive resin composition containing fine metal powder and resin. In this step, a metal is plated on the mesh pattern 74 to obtain a transfer mesh film 81 in which a metal layer 71 of the mesh pattern is formed.

  The support film 73 is not particularly limited as long as it is a flexible film that can withstand the process of forming the metal layer 71 having a mesh pattern and has excellent mechanical strength. For example, the thickness is 25 μm to 200 μm. A suitable PET film, PE film, PP film, etc. can be used.

Examples of the conductive resin composition containing the metal fine powder and the resin include metal fine powder such as silver (Ag), copper (Cu), nickel (Ni), cellulose resin, acrylic resin, and polyurethane. Examples thereof include conductive resin compositions containing a resin such as a resin.
The average particle size of the metal fine powder is not particularly limited, but is preferably set in the range of usually 0.5 μm to 2 μm in consideration of being uniformly mixed in the conductive resin composition. When the average particle size exceeds the above range, the contact points between the metal fine powders are decreased, and the contact resistance may be increased. Conversely, if the average particle size is below the above range, it may be difficult to uniformly disperse the metal fine powder in the conductive resin composition.

  The blending amount of the metal fine powder takes into consideration the conductivity of the conductive resin composition (that is, the ease of plating), the adhesion between the mesh pattern 74 and the support film 73, and the transferability of the metal layer 71 of the mesh pattern. Although not particularly limited, it is usually 40 parts by mass to 2000 parts by mass, preferably 100 parts by mass to 1500 parts by mass with respect to 100 parts by mass of the resin component in the conductive resin composition. Set within the range of the part. When the blending amount of the metal fine powder is less than 40 parts by mass, the conductivity of the conductive resin composition is remarkably lowered, and it may be difficult to plate on the mesh pattern 74 made of the conductive resin composition. This is not preferable. On the contrary, if the blending amount of the metal fine powder exceeds 2000 parts by mass, the content of the resin with respect to the total amount of the conductive resin composition becomes too small, and the force for bonding the metal fine powder becomes small. Insufficient strength of the mesh pattern 74 made of the adhesive resin composition is caused, and the adhesion between the mesh pattern 74 and the support film 73 is reduced. This is not preferable because it may be difficult to transfer the metal layer 71 of the pattern to the pressure-sensitive adhesive layer 21.

  Examples of the resin include polyester resins, polyvinyl butyral resins, ethyl cellulose resins, (meth) acrylic resins, polyethylene resins, polystyrene resins, polyamide resins and other thermoplastic resins, polyester-melamine resins, melamine resins, epoxy-melamine resins, Any of thermosetting resins such as phenol resin, epoxy resin, amino resin, polyimide resin, and (meth) acrylic resin can be used.

  The conductive resin composition is prepared by further adding a solvent to the mixture of the resin and the metal fine powder in order to obtain a viscosity suitable for printing by a printing method. For example, a solvent having a boiling point of 150 ° C. or higher is preferably used. When the boiling point of the solvent is lower than the above range, the solvent is likely to be dried during printing, and pinholes may be generated, which is not preferable.

  Specific examples of solvents that can be used include hexanol, octanol, nonanol, decanol, undecanol, dodecanol, tridecanol, tetradecanol, pentadecanol, stearyl alcohol, seryl alcohol, cyclohexanol, terpineol and other alcohols; ethylene glycol monobutyl ether (Alkyl butyl cellosolve), ethylene glycol monophenyl ether, diethylene glycol, diethylene glycol monobutyl ether (butyl carbitol), cellosolve acetate, butyl cellosolve acetate, carbitol acetate, butyl carbitol acetate, and other alkyl ethers. It may be selected as appropriate in consideration.

  The mesh pattern 74 is formed by intersecting fine vertical lines with an appropriate pitch interval and horizontal lines with an appropriate pitch interval. The intersection of the vertical line and the horizontal line may be orthogonal or oblique. The line widths of the vertical lines and the horizontal lines constituting the ultrafine wire mesh pattern are 5 μm to 50 μm, preferably 10 μm to 30 μm, respectively. Moreover, the pitch intervals of the vertical lines and the horizontal lines constituting the ultrafine line mesh pattern are 100 μm to 500 μm, preferably 200 μm to 300 μm, respectively. If the line width and pitch interval deviate from the above range, moire interference fringes are generated, the image quality is deteriorated, and it is difficult to achieve both the transmittance suitable for the display and the electromagnetic wave shielding performance.

As the printing method, for example, a screen printing method, a gravure printing method, a flexographic printing method, or the like can be used.
The mesh pattern of the conductive resin composition printed and formed on the support film 73 is usually heated at 60 ° C. to 200 ° C. for 2 minutes to 30 minutes, preferably at 80 ° C. to 150 ° C. for 3 minutes to 15 minutes. Cured.

On the surface of the mesh pattern 74 formed by printing and curing the conductive resin composition on the support film 73, a metal layer 71 is further formed by plating.
Examples of the metal layer formed by plating include a film made of a metal such as copper (Cu), nickel (Ni), and gold (Au). The plating method may be electrolytic plating or electroless plating.

The composition of the plating solution used for electrolytic plating is not particularly limited, and can be prepared according to a conventional method. For example, when copper plating is formed, a copper sulfate aqueous solution may be used as a plating solution.
Further, the composition of the plating solution used for electroless plating is not particularly limited, and can be prepared according to a conventional method. For example, an electroless copper plating solution made of copper sulfate, EDTA, formaldehyde, and sodium hydroxide can be used.

The thickness of the metal layer 71 in the mesh pattern is preferably 0.2 μm to 8 μm, and more preferably 1 μm to 5 μm.
If the thickness of the metal layer 71 of the mesh pattern to be transferred is less than 0.2 μm, the electromagnetic shielding material is insufficient in conductivity, and sufficient electromagnetic shielding performance cannot be obtained. On the other hand, when the thickness of the metal layer 71 of the mesh pattern to be transferred is thicker than 8 μm, the embedding property in the pressure-sensitive adhesive layer 21 is lowered and unevenness is easily formed on the transfer surface, and the transparent substrate B is laminated. It is not preferable because air is easily entrapped during integration and the visible light transmittance of the optical filter for display is lowered.
On the metal layer 71, black plating such as nickel (Ni) may be applied in order to improve contrast. A known method can be applied to the black plating method.

A region of the transfer mesh film 81 where the metal layer 71 having a mesh pattern is not formed is preferably coated with a release agent, and a release agent coating layer 72 is formed.
When the release agent is coated on the area where the metal layer 71 of the mesh pattern is not formed, the transfer mesh film 81 is applied in the following step (a-2) in the area where the release agent is coated. And the transparent base material A11 having the pressure-sensitive adhesive layer on the outermost layer on one side is not attached even if the metal layer and the pressure-sensitive adhesive layer are in contact with each other, so that the transfer mesh film 81 is peeled off. In addition, when the transfer mesh film 81 is peeled off, peeling occurs from the interface between the mesh pattern 74 and the metal layer 71 of the mesh pattern.
As the release agent, for example, a silicone release agent, a fluorine release agent and the like can be suitably used.
As a release agent coating method, a general coating method such as gravure can be employed.

(Step (a-2))
This step has the transfer mesh film 81 obtained in the step (a-1) and the pressure-sensitive adhesive layer 21 on the outermost layer on one side, and at least one of the near infrared absorption function and the antireflection function. The transparent base material 61a or 61b having the above structure is pressure-bonded so that the metal layer 71 of the mesh pattern and the pressure-sensitive adhesive layer 21 are in contact with each other, and laminated and integrated to form a laminated body.

  The transparent base materials 61a and 61b are not particularly limited. For example, the anti-reflection layer 12, the transparent base material A11, and the near-infrared shielding layer 13 to which a near-infrared absorber is added are laminated in this order from the visual side. Examples of the integrated structure or those in which the anti-reflection layer 12, the near-infrared shielding layer 13 to which the near-infrared absorbing agent is added, and the transparent base material A11 are laminated and integrated in order from the visual side can be exemplified.

A method for forming the pressure-sensitive adhesive layer 21 on the transparent substrate A11 is not particularly limited. For example, a coating composition containing an adhesive resin such as an acrylic copolymer and an organic solvent is used as a transparent group. Preferably, a method of coating the near-infrared shielding layer 13 on the material 61a or 61b or the transparent base material A11 to form a coating film, and drying the coating film to form the pressure-sensitive adhesive layer 21 is preferably exemplified. it can. As a coating method, a normal coating method such as a lip coating method, a gravure coating method, a bar coating method, a spin coating method, a spray coating method, an ink jet method, or a screen printing method is used.
Although the thickness of the adhesive layer 21 is not specifically limited, 5 micrometers-50 micrometers are preferable. When the thickness of the pressure-sensitive adhesive layer 21 is less than 5 μm, embedding in the pressure-sensitive adhesive layer 21 is performed when the transfer mesh film 81 and the transparent base material 61 having the pressure-sensitive adhesive layer 21 on one side are laminated and integrated. As a result, the unevenness is likely to be formed on the transfer surface (the unevenness of the mesh pattern cannot be absorbed), and the metal layer 71 of the mesh pattern cannot be embedded in the adhesive layer 21. On the other hand, when the thickness of the pressure-sensitive adhesive layer 21 exceeds 50 μm, when the transfer mesh film 81 is peeled from the pressure-sensitive adhesive layer 21, distortion of the pressure-sensitive adhesive layer occurs, which is not preferable.

Such a transparent substrate 61a or 61b having the pressure-sensitive adhesive layer 21 on one side and a transfer film 81 having a metal layer 71 having a mesh pattern obtained in the step (a-1) are used as the pressure-sensitive adhesive. The layer 21 and the mesh-patterned metal layer 71 are pressure-bonded so as to be in contact with each other, and are laminated and integrated to form a laminated body.
A normal laminating method can be employed for pressure bonding and lamination. The laminating pressure (pressing force) is set to a sufficient pressing force (pressing force) so that the mesh-patterned metal layer 71 is embedded in the pressure-sensitive adhesive layer 21. The metal layer 71 having the mesh pattern may be easily embedded in the pressure-sensitive adhesive layer 21 by applying plasticity to the pressure-sensitive adhesive layer 21 by loading. A specific pressure-bonding force (pressing force) varies depending on the type of pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer 21, but is usually about 0.3 MPa to 1.0 MPa.

((B) Process)
In this step, as shown in FIG. 4, the transfer mesh film 81 is peeled off from the laminate obtained in the step (a-2), and the metal layer 71 of the mesh pattern becomes the pressure-sensitive adhesive. A transparent base material 61a (FIG. 4 shows the case of the transparent base material 61a, but 61b is the same), which is transferred into the layer 21 and the side surfaces of the metal layer 71 of the mesh pattern are exposed; This is a step of obtaining a transfer mesh film 81a from which the metal layer 71 having the mesh pattern is peeled off.
Adhesive force between a mesh pattern 74 made of a conductive resin composition containing a metal fine powder and a resin formed on the support film 73 and a metal layer 71 of the mesh pattern plated on the mesh pattern 74 Therefore, when the transfer mesh film 81 is peeled from the laminate obtained in the step (a-2), a mesh made of a conductive resin composition containing a metal fine powder and a resin is used. The pattern 74 is easily peeled from the interface between the mesh pattern 74 and the metal layer 71 of the mesh pattern plated on the mesh pattern 74. The reason is not necessarily clear, but the metal fine powder exposed on the surface of the mesh pattern 74 made of a conductive resin composition containing the metal fine powder and the resin and the metal layer of the mesh pattern formed by the plating method. 71 has sufficient adhesion, but the portion of the mesh pattern 74 where the fine metal powder is not exposed and the metal layer 71 of the mesh pattern formed by the plating method do not have adhesion. it is conceivable that.

(Step (c))
In this step, the transparent base material 61a or 61b obtained by the step (b), in which the metal layer 71 of the mesh pattern is transferred to the pressure-sensitive adhesive layer 21, and the transparent base material B51 are used. Via the pressure-sensitive adhesive layer 21 to which the metal layer 71 is transferred so that the conductive member 22 disposed on the surface of B51 and the metal layer 71 of the mesh pattern exposed from the pressure-sensitive adhesive layer 21 are in contact with each other. In this step, the metal layer 71 having the mesh pattern is used as the electromagnetic wave shielding material 31 to obtain an optical filter for display.

A normal laminating method can be employed for pressure bonding and lamination. The pressure-bonding force (pressure) when laminating is such that the transparent substrate 61a or 61b with the metal layer 71 transferred to the pressure-sensitive adhesive layer 21 and the transparent group A51 are laminated in parallel, and bubbles are formed at the lamination interface. The pressure-bonding force (pressing force) is sufficient to prevent formation of the pressure-sensitive adhesive, and the specific pressure-bonding force (pressing force) varies depending on the type of the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer 21, but is usually 0.3 MPa to 1.0 MPa. Degree. When bubbles are formed at the lamination interface, the visible light transmittance is lowered.
When pressure bonding and laminating and integrating, for example, an autoclave treatment may be performed at a temperature of 40 to 70 ° C. and a pressure of 0.3 MPa to 1.2 MPa for 10 minutes to 120 minutes. Autoclaving is preferable because bubbles remaining at the lamination interface can be eliminated.
The transparent substrate 51 may be a front glass plate that constitutes the display surface of the display.

  Meanwhile, the transfer mesh film 81a from which the metal layer 71 of the mesh pattern is peeled off and the metal layer 71 of the mesh pattern is peeled is plated again with the metal on the mesh pattern 74. A transfer mesh film 81 in which the metal layer 71 is newly formed can be obtained, and by repeatedly using the newly regenerated transfer mesh film 81, the manufacturing cost of the optical filter for display is greatly reduced. be able to.

"Method 2 of manufacturing optical filter for display"
The manufacturing method 2 of the optical filter for display is as follows.
(X) a mesh-patterned metal oxide comprising a mesh-patterned first metal layer on one surface of the support film and a metal oxide forming the first metal layer on the first metal layer. A transfer mesh film in which a mesh-patterned second metal layer is formed on the mesh-patterned metal oxide layer, and an adhesive layer on the outermost layer on one side. A transparent substrate A having at least one of an absorption function and an antireflection function, and a step of forming a laminate by laminating and integrating the second metal layer and the pressure-sensitive adhesive layer; and
(Y) The transparent base material A in which the mesh film for transfer is peeled from the laminate obtained in the step (x) and the second metal layer is transferred to the pressure-sensitive adhesive layer, and the second metal A step of obtaining a transfer mesh film from which the layer has been peeled;
(Z) The transparent base material A obtained by the step (y) and having the second metal layer transferred to the pressure-sensitive adhesive layer and the transparent group B are disposed on the surface of the transparent base material B. A step of stacking and integrating the second metal layer via the pressure-sensitive adhesive layer so that the conductive member and the metal layer exposed from the pressure-sensitive adhesive layer are in contact with each other;
have.

Hereinafter, the manufacturing method 2 is demonstrated for every process.
(Step (x-1))
FIG. 5 is a schematic cross-sectional view of a transfer film in the method 2 for producing an optical filter for display according to the present invention.
In this step, as shown in FIG. 5, a mesh-patterned first metal layer 74 is formed on one surface of a flexible support film 73, and the first metal layer 74 is formed on the first metal layer 74. A metal oxide layer 74a having a mesh pattern made of a metal oxide forming a metal layer is formed, and a second metal layer 71 having a mesh pattern is formed on the metal oxide layer 74a having the mesh pattern. This is a step of obtaining the mesh film 91 for use.

  The flexible support film 73 is a flexible film that can withstand the process of forming the first metal layer 74, the metal oxide layer 74a, and the second metal layer 71 in a mesh pattern and has excellent mechanical strength. The film is not particularly limited as long as it is a film, and for example, a PET film, PE film, or PP film having a thickness of about 25 μm to 200 μm can be suitably used.

  A first metal layer 74 having a mesh pattern is formed on one surface of the support film 73 and a metal oxide forming the first metal layer is formed on the first metal layer 74 having the mesh pattern. A mesh-patterned metal oxide layer 74a is formed, and the mesh-patterned second metal layer 71 is stacked on the mesh-patterned metal oxide layer 74a. The method 1) or (2) can be preferably exemplified.

(1) The electroless plating catalyst ink is printed on one surface of the support film 73 in a mesh pattern, and the first metal layer 74 is formed by performing electroless plating on the mesh pattern. The surface of the first metal layer 74 is oxidized to form a metal oxide layer 74a having a mesh pattern, and then electrolytic plating is performed on the metal oxide layer 74a having the mesh pattern to Two metal layers 71 are stacked. The oxidation treatment method for forming the oxide layer 74a is not particularly limited as long as the support film 73 is not deteriorated. For example, an alkaline aqueous solution containing hypochlorite or chlorite at a temperature of about 50 ° C to 60 ° C. A method of surface treatment by immersing in about 1 to 10 minutes can be exemplified.
(2) A metal foil is laminated on one surface of the support film 73, a first metal layer 74 having a mesh pattern is formed by a photoetching method, and then the surface of the first metal layer 74 is oxidized. A metal oxide layer 74a having a mesh pattern is formed, and then electrolytic plating is performed on the metal oxide layer 74a having the mesh pattern to form a second metal layer 71 having a mesh pattern. The oxidation treatment method for forming the oxide layer 74a is not particularly limited as long as the support film 73 is not deteriorated. For example, an alkaline aqueous solution containing hypochlorite or chlorite at a temperature of about 50 ° C to 60 ° C. A method of surface treatment by immersing in about 1 to 10 minutes can be exemplified.

Examples of the method of pattern printing the electroless plating catalyst ink on one surface of the support film 73 in the method (1) include a pattern printing method by a screen printing method or a gravure printing method. . Examples of the electroless plating catalyst ink include inorganic fine powder such as alumina (Al ₂ O ₃ ) on which noble metal catalyst fine particles such as palladium (Pd), platinum (Pt), gold (Au), and silver (Ag) are adsorbed. And those in which a resin and an organic solvent are dispersed and mixed. Examples of the resin include cellulose resins, acrylic resins, polyurethane resins, and the like, and examples of the organic solvent include terpineol, butyl carbitol, butyl carbitol acetate, and the like. The blending amount of the resin in the electroless plating catalyst ink is preferably 30% by mass to 95% by mass. When the blending amount of the resin is less than 30% by mass, the adhesion between the mesh pattern made of the electroless plating catalyst ink and the support film 73 is lowered, and is peeled off in the next step (y). This is not preferable because it may be difficult to transfer the metal layer 71 to the pressure-sensitive adhesive layer 21. On the other hand, if the blending amount of the resin exceeds 95% by mass, the amount of the noble metal catalyst fine particles may be reduced, and electroless plating may be difficult.

  In the method (2), the method for laminating the metal layer on one surface of the support film 73 is not particularly limited. For example, the support film 73 and the metal foil are laminated via the adhesive layer. And a method of laminating a metal layer by a sputtering method or a vapor deposition method. Examples of the metal foil include silver (Ag) foil, copper (Cu) foil, and nickel (Ni) foil having a thickness of about 1 μm to 20 μm. Examples of the pressure-sensitive adhesive that constitutes the pressure-sensitive adhesive layer include acrylic and silicone pressure-sensitive adhesives.

  A mesh-patterned first metal layer 74 formed on one surface of the support film 73 in this way, and a mesh-patterned metal oxide formed on the mesh-patterned first metal layer 74. In the transfer mesh film 91 having the layer 74a and the second metal layer 71 having a mesh pattern formed on the metal oxide layer 74a, when peeling in the step (y) described in detail below. Furthermore, stress is likely to occur in the layer interface between the first metal layer 74 and the second metal layer 71, that is, the metal oxide layer 74a, and fine cracks are generated in the layer interface, that is, the metal oxide layer 74a. Therefore, the adhesion between the first metal layer 74 and the second metal layer 71 is not sufficient, and the layer interface between the first metal layer 74 and the second metal layer 71, that is, metal oxidation. Easy peeling in physical layer 74a It can be.

The thickness of the second metal layer 71 is preferably 0.2 μm to 8 μm, and more preferably 1 μm to 5 μm.
If the thickness of the transferred second metal layer 71 is thinner than 0.2 μm, the electromagnetic shielding material has insufficient conductivity, and sufficient electromagnetic shielding performance cannot be obtained. On the other hand, if the thickness of the second metal layer 71 to be transferred is thicker than 8 μm, the embedding property in the pressure-sensitive adhesive layer 21 is lowered, and irregularities are easily formed on the transfer surface, and the transparent substrate B51 is laminated and integrated. When it does, it becomes easy to bite air and the visible light transmittance of an optical filter falls.
On the second metal layer 71, black plating such as nickel (Ni) may be applied in order to improve contrast. A known method can be applied to the black plating method.

In the transfer mesh film 91, a mold-released first metal layer 74, a mesh-patterned metal oxide layer 74a, and a region where the mesh-patterned second metal layer 71 is not formed are released. It is preferable that an agent is coated to form a release agent coating layer 72.
When a release agent is coated in a region where the first metal layer 74, the metal oxide layer 74a, and the second metal layer 71 of the mesh pattern are not formed, the release agent is coated. In the region, the second metal layer 71 and the pressure-sensitive adhesive layer 21 are in contact with the transfer mesh film and the transparent base material 61a or 61b having the pressure-sensitive adhesive layer on one side in the following (x-2) step. Thus, the transfer mesh film 91 can be easily peeled off even when pressed, and the first metal layer 74 and the second metal layer 74 can be peeled off when the transfer mesh film 91 is peeled off. Separation occurs from the interface with the metal layer 71, that is, from the metal oxide layer 74a.
As the release agent, for example, a silicone release agent, a fluorine release agent and the like can be suitably used.
As a release agent coating method, a general coating method such as a gravure coating method may be employed.

(Step (x-2))
This step has the transfer mesh film 91 obtained in the step (x-1) and the pressure-sensitive adhesive layer 21 on the outermost layer on one side, and at least one of the near infrared absorption function and the antireflection function. Is a step of forming a laminated body by laminating and integrating the transparent base material 61a or 61b having a layer so that the second metal layer and the pressure-sensitive adhesive layer are in contact with each other.
As said transparent base material 61a or 61b, the same thing as the transparent base material 61a or 61b in the above-mentioned manufacturing method 1 can be used.
Moreover, about the adhesive which comprises the said adhesive layer 21, the same thing as the adhesive in the manufacturing method 1 can be used, and the thickness of the method of forming an adhesive layer and an adhesive layer is also with the manufacturing method 1. May be identical.
Furthermore, the transfer mesh film 91 obtained in the step (x-1) and the pressure-sensitive adhesive layer 21 are provided on the outermost layer on one side, and have at least one of a near infrared absorption function and an antireflection function. The method of pressure-bonding and integrating the transparent base material 61a or 61b may be the same as the manufacturing method 1.

((Y) process)
Although not shown, this step can be performed in the same manner as the method shown in FIG. That is, it is a step of peeling the transfer mesh film 91 from the laminate obtained in the step (x-2). When the transfer mesh film 91 is peeled off, the first metal layer 74 and the second metal layer 71 do not have adhesiveness because the metal oxide layer 74a is interposed, and the first metal layer 74a has no adhesion. The transfer mesh film 91a from which the second metal layer 71 has been peeled can be peeled from the metal layer 74 and the second metal layer 71, that is, from the metal oxide layer 74a. The transparent base material 61a or 61b in which only the two metal layers 71 are transferred into the pressure-sensitive adhesive layer 21 can be obtained. Note that 91 and 91a correspond to 81 and 81a in FIG. 4, respectively.

(Step (z))
This step is obtained in the step (y), and the transparent base material 61a or 61b in which the second metal layer 71 of the mesh pattern is transferred to the pressure-sensitive adhesive layer 21 and the transparent base material B51 The pressure-sensitive adhesive to which the second metal layer 71 having the mesh pattern is transferred so that the conductive member 22 disposed on the surface of the base material B51 and the second metal layer 71 exposed from the pressure-sensitive adhesive layer 21 are in contact with each other. This is a step of obtaining an optical filter for display using the layer 21 by pressure bonding, laminating and integrating, and using the second metal layer 71 of the mesh pattern as the electromagnetic wave shielding material 31.

As said transparent base material B51, the same thing as the transparent base material B in the above-mentioned manufacturing method 1 can be used.
Further, the transparent base material 61a or 61b in which only the second metal layer 71 is transferred to the adhesive layer 21 and the transparent base material B51 are used, and the adhesive layer 21 to which the second metal layer 71 is transferred is used. The method of pressure bonding and laminating and integrating may also be the same as in manufacturing method 1.

  The transfer mesh film 91a from which the second metal layer 71 is peeled off and the second metal layer 71 is peeled off forms the second metal layer 71 on the first metal layer 74, or The metal oxide layer 74a constituting the second metal layer 71 and the first metal layer 74 is peeled off, and the metal oxide layer 74a constituting the second metal layer 71 and the first metal layer 74 is peeled off. The transfer mesh film 91a is formed on the first metal layer 74 by re-forming the metal oxide layer 74a constituting the first metal layer 74 and the second metal layer 71. A transfer mesh film in which the first metal layer 74 of the pattern, its oxide layer 74a, and the second metal layer 71 are formed can be obtained, and by repeatedly using this regenerated transfer mesh film, It is possible to reduce the manufacturing cost of the optical filter for display.

EXAMPLES Next, although an Example demonstrates this invention further in detail, this invention is not limited at all by these examples.
Example 1
As a transparent film, a PET film having a thickness of 100 μm containing a UV absorber [trade name “O-700E” manufactured by Mitsubishi Plastics, Inc.] is used. 60, an antireflection layer comprising a conductive medium refractive index layer having a thickness of 0.1 μm, a refractive index of 1.75, a high refractive index layer having a thickness of 0.1 μm, and a low refractive index layer having a refractive index of 2.00 and a thickness of 0.1 μm. Was formed according to conventional methods. Next, on the opposite side, a diimonium dye which is a diimonium compound having a counter anion represented by the chemical formula: (CH ₃ SO ₂ ) ₂ N ⁻ [trade name “CIR-1085” manufactured by Nippon Carlit Co., Ltd.] A coating solution having a solid content of 25% by mass, comprising a near-infrared absorbing dye consisting of a phthalocyanine dye [manufactured by Nippon Shokubai Co., Ltd., registered trademark “EEX Color IR-10A”], an acrylic transparent resin and toluene as a solvent. The coating was dried to form a near-infrared shielding layer having a thickness of 11 μm.

Next, a pressure-sensitive adhesive layer-forming coating solution having the following composition is applied onto the near-infrared shielding layer, and dried in an air atmosphere at a temperature of 100 ° C. for 1 minute to form a pressure-sensitive adhesive layer having a thickness of 25 μm. A transparent substrate I having an adhesive layer as the outermost layer and having a near infrared absorption function and an antireflection function was obtained.
<Composition of the coating solution for forming the adhesive layer>
Acrylic polymer: 20% by mass
Ethyl acetate: 70% by mass
Toluene: 10% by mass

On the other hand, a PET film [trade name “U-36”, manufactured by Toray Industries, Inc.] having a thickness of 100 μm was used as a support film, and a conductive resin composition having the following composition on one side thereof was L / S = 20. / 280 (μm) lattice-like (mesh-like) pattern printed using gravure printing method, and heated at 90 ° C. for 5 minutes in air atmosphere to form a mesh-like pattern. This mesh-like pattern Copper (Cu) was electroplated on the top, and then nickel (Ni) was black electroplated to obtain a transfer mesh film.
<Composition of conductive resin composition>
Silver fine powder (average particle size; 1.0 μm): 67% by mass
Resin (ethyl cellulose): 4.5% by mass
Solvent (α-terpineol): 28.5% by mass

Next, the transfer mesh film in which a metal layer of a mesh pattern is formed, and the transparent substrate I having a pressure-sensitive adhesive layer on the outermost layer on one side and having a near infrared absorption function and an antireflection function, The metal layer and the pressure-sensitive adhesive layer were pressure-bonded so that they were in contact with each other and laminated and integrated (laminated) to obtain a laminate.
The pressure bonding / lamination integration (lamination) was performed under the conditions of a pressure of 0.5 MPa and a speed of 10 m / min.

Next, the transfer mesh film is peeled from the laminate, and the metal layer (copper (Cu) electrolytic plating layer and nickel (Ni) black plating layer) is transferred to the adhesive layer. The metal layers (copper (Cu) electrolytic plating layer and nickel (Ni) black plating layer) were peeled off to obtain a transfer mesh film having only a conductive resin composition layer having a mesh pattern.
The transparent substrate I and the transparent substrate II (glass plate) on which the metal layers (copper (Cu) electrolytic plating layer and nickel (Ni) black plating layer) are transferred to the adhesive layer are used as the transparent substrate. The metal layer (copper (Cu) electrolytic plating layer so that the 60 μm thick aluminum (Al) tape (conductive member) disposed on the surface of the material II is in contact with the metal layer exposed from the adhesive layer And a nickel (Ni) black plating layer) transferred onto the pressure-sensitive adhesive layer, and laminated and integrated (laminated) to obtain an optical filter for display shown in FIG.
The pressure bonding / lamination integration (lamination) was performed under conditions of a pressure of 0.7 MPa and a speed of 5 m / min.

  “Total light transmittance”, “haze value”, “luminous reflectance”, “pencil hardness”, “steel wool hardness”, “adhesion”, “spectral transmittance (near red) of the obtained optical filter for display "External)", "Reliability test (change in transmittance in the near infrared region after 1000 hours at high temperature and high humidity)", and "Electromagnetic wave shielding" were evaluated by the following methods. The evaluation results are shown in Table 1.

(Evaluation method)
(1) Total light transmittance and haze value: Measured using a haze meter (manufactured by Nippon Denshoku).
(2) Luminous reflectance: It was measured using a spectrophotometer (“V-570” manufactured by JASCO Corporation).
(3) Pencil hardness: The minimum pencil hardness was measured with the antireflection layer surface facing up and not scratching under a load of 9.8 N.
(4) Strength of steel wool: Anti-reflective layer side up, # 0000 steel wool The number of scratches generated after reciprocating 10 times while applying a load of 45 N / cm ² was measured.

(5) Adhesion: The number of remaining squares after the antireflection layer surface is turned up, each 1 cm square side of the film surface is cut at 1 mm intervals, and the surface is peeled three times with adhesive tape. Was measured.
(6) Spectral transmittance: Using a spectrophotometer (“V-570” manufactured by JASCO Corporation), the transmittance of each sample at wavelengths of 850 nm, 950 nm, and 1000 nm was measured.
(7) Reliability:
(I) Each sample was put in a thermostat set at 80 ° C., and the spectral transmittance after 1000 hours was measured.
(Ii) Each sample was placed in a constant temperature and humidity tester set to 60 ° C. and relative humidity 90%, and the spectral transmittance after 1000 hours was measured.
(8) Electromagnetic shielding properties: Measured according to the KEC method (Kansai Electronics Industry Promotion Center Act).

Example 2
On the mesh pattern of the transfer mesh film obtained in Example 1 from which the metal layer was peeled off, electrolytic copper (Cu) plating was applied again, and then nickel (Ni) black plating was applied again in accordance with Example 1. Thus, a transfer mesh film having a metal layer formed on the mesh pattern was obtained. An optical filter for display was obtained according to Example 1 except that this transfer mesh film was used.
Such an operation (reuse of the transfer mesh film) was repeated, and the display-use optical filter of Example 2 was obtained according to Example 1 using the transfer mesh film that was reused for the fifth time.
When this display optical filter was evaluated according to Example 1, substantially the same evaluation results as the display optical filter of Example 1 were obtained.

Example 3
In accordance with Example 1, the optical filter for display of Example 3 was obtained. However, as the mesh film for transfer, what was produced as follows was used.
Using a 100 μm thick PET film (supra) as a support film, laminating a 10 μm thick copper (Cu) foil on one side with an acrylic adhesive, laminating a resist on it, A mesh pattern of L / S = 12/288 μm is formed by etching, and then immersed in an aqueous solution of sodium hydroxide containing sodium hypochlorite (temperature 50 ° C.) for 3 minutes to form a mesh of copper (Cu) A copper (Cu) oxide layer was formed on the pattern surface. Copper (Cu) electroplating was performed on the copper (Cu) oxide layer of this mesh pattern, and then black electroplating of nickel (Ni) was performed to obtain a transfer mesh film.
In this transfer mesh film, peeling occurred in the copper (Cu) oxide layer.
Next, the optical filter for display was evaluated according to Example 1. The evaluation results are shown in Table 2.

Example 4
In accordance with Example 3 on the mesh pattern of the transfer mesh film obtained by peeling off the metal layer (copper (Cu) electrolytic plating layer and nickel (Ni) black electrolytic plating layer) obtained in Example 3 Again, a copper (Cu) oxide layer, a copper (Cu) electrolytic plating layer, and a nickel (Ni) black electrolytic plating layer are formed on the copper (Cu) oxide layer for transfer. A mesh film was obtained. An optical filter for display was obtained according to Example 3 except that this transfer mesh film was used.
Such an operation (reuse of the transfer mesh film) was repeated, and the display-use optical filter of Example 4 was obtained according to Example 1 using the transfer mesh film that was reused for the fifth time.
When this display optical filter was evaluated according to Example 1, substantially the same evaluation results as the display optical filter of Example 3 were obtained.

Example 5
The optical filter for display of Example 5 was obtained according to Example 1. However, as the mesh film for transfer, what was produced as follows was used.
3.5 g of palladium fine particles and 171.5 g of γ-alumina were dispersed and agglomerated in ethanol, solid-liquid separated, and then dried to obtain γ-alumina fine particles carrying palladium fine particles. Next, 90 g of ethyl cellulose is dissolved in a solvent consisting of 472 g of α-terpineol and 236 g of butyl carbitol acetate, and γ-alumina fine particles supporting the fine palladium particles and 9 g of carbon black are added, and mixed and dispersed by a three roll mill. Then, a catalyst ink for electroless plating was produced.

Using a PET film having a thickness of 100 μm as the support film (described above), and using this electroless plating catalyst ink on one surface, a speed of 10 m / min and a pressing time of 1.5 seconds were used. A mesh pattern with S = 18/282 μm was gravure-printed and dried at 80 ° C. for 5 minutes to form a catalyst ink layer for electroless plating having a mesh pattern with a thickness of 1.5 μm.
Next, the support film on which the electroless plating catalyst ink layer is formed is immersed in an electroless copper plating solution “OPC-750” (Okuno Pharmaceutical Co., Ltd.) at 25 ° C. for 40 minutes, thereby electrolessly forming a mesh pattern. Copper (Cu) was deposited on the plating catalyst ink layer to form a copper (Cu) metal layer. Next, an oxide layer of copper (Cu) was formed on the surface of the copper (Cu) mesh pattern with chlorite and sodium hydroxide. Further, copper (Cu) electrolytic plating was performed on the copper (Cu) oxide layer of the mesh pattern, and then black electrolytic plating of nickel (Ni) was performed to obtain a transfer mesh film.
In this transfer mesh film, peeling occurred in the copper (Cu) oxide layer.
The optical filter for display was evaluated according to Example 1. The evaluation results are shown in Table 3.

Example 6
According to Example 5 on the mesh pattern of the transfer mesh film obtained by peeling off the metal layer (copper (Cu) electrolytic plating layer and nickel (Ni) black electrolytic plating layer) obtained in Example 5. Again, a copper (Cu) oxide layer, a copper (Cu) electrolytic plating layer, and a nickel (Ni) black electrolytic plating layer are formed on the copper (Cu) oxide layer for transfer. A mesh film was obtained.
An optical filter for display was obtained according to Example 5 except that this transfer mesh film was used.
Such an operation (reuse of the transfer mesh film) was repeated, and the display-use optical filter of Example 6 was obtained according to Example 1 using the transfer mesh film that was reused for the fifth time.
When this display optical filter was evaluated according to Example 1, substantially the same evaluation results as the display optical filter of Example 5 were obtained.

  The present invention provides an optical filter for a display that can be used for various displays such as a PDP (plasma display panel), a liquid crystal, and an EL to shield leaked electromagnetic waves and can be easily grounded. It is possible to provide a manufacturing method capable of inexpensively manufacturing the provided optical filter for display based on resource saving, and the industrial utility value is very large.

It is typical sectional drawing which shows an example of the optical filter for displays of this invention. It is typical sectional drawing which shows another example of the optical filter for displays of this invention. It is a cross-sectional schematic diagram of the transfer film in the manufacturing method 1 of the optical filter for displays of this invention. It is explanatory drawing which shows an example of the method of transferring a metal layer in the manufacturing method of the optical filter for displays of this invention. It is a cross-sectional schematic diagram of the transfer film in the manufacturing method 2 of the optical filter for displays of this invention.

Explanation of symbols

10a, 10b Display optical filter 11 Transparent substrate A
12 Antireflection layer 13 Near-infrared shielding layer 21 Adhesive layer 22 Conductive member 31 Electromagnetic wave shielding material 51 Transparent base material B
51a Adhesive surface 61a Transparent base material 61b with functional layers laminated on both sides Transparent base material 71 with functional layers laminated on one side 71 Metal layer 72 Release agent coating layer 73 Support film 74 Mesh pattern 81, 91 For transfer Mesh film 81a Mesh film for transfer without metal layer

Claims (7)

A transparent substrate A having at least one of a near-infrared absorption function and an antireflection function, and a transparent substrate B are laminated and integrated via an adhesive layer, and the transparent group in the adhesive layer An electromagnetic wave shielding material having a mesh pattern is disposed on the bonding surface with the material B, and the electromagnetic wave shielding material is connected to a grounding conductive member disposed on the bonding surface with the transparent base material B. A method for producing an optical filter for display comprising :
(A) A mesh-like pattern made of a conductive resin composition containing fine metal powder and resin is formed on one surface of the support film, and a metal layer having a mesh-like pattern is formed by plating metal on the mesh-like pattern. And a transparent base material A having a pressure-sensitive adhesive layer on the outermost layer on one side and having at least one of a near-infrared absorption function and an antireflection function, and the metal layer. And laminating and integrating so that the pressure-sensitive adhesive layer is in contact with each other, and forming a laminate,
(B) The transfer mesh film is peeled from the laminate obtained in the step (a), and the metal layer is peeled off from the transparent substrate A on which the metal layer is transferred to the pressure-sensitive adhesive layer. Obtaining a transfer mesh film,
(C) Conductivity disposed on the surface of the transparent substrate B, the transparent substrate A obtained by the step (b) and having the metal layer transferred to the pressure-sensitive adhesive layer and the transparent substrate B. A step of stacking and integrating the member through the pressure-sensitive adhesive layer to which the metal layer is transferred so that the metal layer exposed from the pressure-sensitive adhesive layer is in contact with the member;
A method for producing an optical filter for display, comprising: In the step (a), said at transfer mesh film, coating a release agent to the region where the metal layer is not formed in the mesh pattern, A method of manufacturing an optical filter for display according to claim 1. A transfer mesh film obtained by plating a metal on the mesh pattern in the transfer mesh film from which the metal layer has been peeled obtained in the step (b) is formed. , using the transfer mesh film, method of manufacturing an optical filter for displays as claimed in claim 1 or 2. A transparent substrate A having at least one of a near-infrared absorption function and an antireflection function, and a transparent substrate B are laminated and integrated via an adhesive layer, and the transparent group in the adhesive layer An electromagnetic wave shielding material having a mesh pattern is disposed on the bonding surface with the material B, and the electromagnetic wave shielding material is connected to a grounding conductive member disposed on the bonding surface with the transparent base material B. A method for producing an optical filter for display comprising :
(X) A metal oxide layer having a mesh pattern formed of a first metal layer having a mesh pattern on one surface of the support film and a metal oxide forming the first metal layer on the first metal layer. A transfer mesh film in which a second metal layer of a mesh pattern is formed on the metal oxide layer of this mesh pattern, and an adhesive layer on the outermost layer on one side, and absorbs near infrared rays A step of forming a laminated body by laminating and integrating the transparent base material A having at least one of a function and an antireflection function so that the second metal layer and the pressure-sensitive adhesive layer are in contact with each other;
(Y) The transparent base material A in which the mesh film for transfer is peeled from the laminate obtained in the step (x) and the second metal layer is transferred to the pressure-sensitive adhesive layer, and the second metal A step of obtaining a transfer mesh film from which the layer has been peeled;
(Z) The transparent base material A obtained by the step (y) and having the second metal layer transferred to the pressure-sensitive adhesive layer and the transparent base material B are disposed on the surface of the transparent base material B. A step of stacking and integrating the second metal layer through the pressure-sensitive adhesive layer so that the conductive member and the second metal layer exposed from the pressure-sensitive adhesive layer are in contact with each other;
A method for producing an optical filter for display, comprising: In the step (x), a release agent is coated on a region where the first metal layer, the metal oxide layer, and the second metal layer of the mesh pattern in the transfer mesh film are not formed. The manufacturing method of the optical filter for displays of Claim 4 . The transfer metal film is formed by re-forming the second metal layer on the metal oxide layer of the mesh pattern in the transfer mesh film from which the second metal layer is peeled, obtained in the step (y). The method for producing an optical filter for display according to claim 4 or 5 , wherein the transfer mesh film is used. A metal oxide layer constituting the first metal layer on the first metal layer of the mesh pattern in the transfer mesh film obtained by peeling the second metal layer obtained in the step (y), The method for producing an optical filter for display according to claim 4 or 5 , wherein the second metal layer is formed again to obtain a transfer mesh film, and the transfer mesh film is used.

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