JP5190976B2 - Thermosetting resin composition using urethane resin - Google Patents
Thermosetting resin composition using urethane resin Download PDFInfo
- Publication number
- JP5190976B2 JP5190976B2 JP2005271682A JP2005271682A JP5190976B2 JP 5190976 B2 JP5190976 B2 JP 5190976B2 JP 2005271682 A JP2005271682 A JP 2005271682A JP 2005271682 A JP2005271682 A JP 2005271682A JP 5190976 B2 JP5190976 B2 JP 5190976B2
- Authority
- JP
- Japan
- Prior art keywords
- diol
- epoxy resin
- solder resist
- polycarbonate diol
- polyurethane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229920001187 thermosetting polymer Polymers 0.000 title claims description 44
- 239000011342 resin composition Substances 0.000 title claims description 24
- 229920002803 thermoplastic polyurethane Polymers 0.000 title description 5
- 150000002009 diols Chemical class 0.000 claims description 50
- 239000004417 polycarbonate Substances 0.000 claims description 41
- 229920000515 polycarbonate Polymers 0.000 claims description 41
- 239000003822 epoxy resin Substances 0.000 claims description 35
- 229920000647 polyepoxide Polymers 0.000 claims description 35
- -1 alicyclic diol Chemical class 0.000 claims description 32
- 229910000679 solder Inorganic materials 0.000 claims description 27
- 239000004814 polyurethane Substances 0.000 claims description 24
- 229920002635 polyurethane Polymers 0.000 claims description 23
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 16
- 239000005056 polyisocyanate Substances 0.000 claims description 12
- 229920001228 polyisocyanate Polymers 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 238000007334 copolymerization reaction Methods 0.000 claims description 5
- 150000008065 acid anhydrides Chemical class 0.000 claims description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 3
- 238000005476 soldering Methods 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims description 2
- 235000010290 biphenyl Nutrition 0.000 claims description 2
- 239000004305 biphenyl Substances 0.000 claims description 2
- 150000002902 organometallic compounds Chemical class 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 13
- 238000007747 plating Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 239000000470 constituent Substances 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- 239000005058 Isophorone diisocyanate Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000001771 impaired effect Effects 0.000 description 4
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 2
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine powder Natural products NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 235000013824 polyphenols Nutrition 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- JVYDLYGCSIHCMR-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butanoic acid Chemical compound CCC(CO)(CO)C(O)=O JVYDLYGCSIHCMR-UHFFFAOYSA-N 0.000 description 1
- AUABZJZJXPSZCN-UHFFFAOYSA-N 2-(dimethylamino)phenol Chemical compound CN(C)C1=CC=CC=C1O AUABZJZJXPSZCN-UHFFFAOYSA-N 0.000 description 1
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- CTRPRMNBTVRDFH-UHFFFAOYSA-N 2-n-methyl-1,3,5-triazine-2,4,6-triamine Chemical compound CNC1=NC(N)=NC(N)=N1 CTRPRMNBTVRDFH-UHFFFAOYSA-N 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- NAMCDLUESQLMOZ-UHFFFAOYSA-N 6-ethyl-1,3,5-triazine-2,4-diamine Chemical compound CCC1=NC(N)=NC(N)=N1 NAMCDLUESQLMOZ-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 101150030514 GPC1 gene Proteins 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- JZSSINHDNJHXOW-UHFFFAOYSA-N NC1(CC(=CC(=C1C)N)C1=NC=NC=N1)C Chemical compound NC1(CC(=CC(=C1C)N)C1=NC=NC=N1)C JZSSINHDNJHXOW-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- LNWBFIVSTXCJJG-UHFFFAOYSA-N [diisocyanato(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(N=C=O)(N=C=O)C1=CC=CC=C1 LNWBFIVSTXCJJG-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 1
- 229940022682 acetone Drugs 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 239000003429 antifungal agent Substances 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- XJZLVTUDAHWQGH-UHFFFAOYSA-N butyl-(2,5-dihydroxyphenyl)phosphanium;bromide Chemical compound [Br-].CCCC[PH2+]C1=CC(O)=CC=C1O XJZLVTUDAHWQGH-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000012663 cationic photopolymerization Methods 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- KQWGXHWJMSMDJJ-UHFFFAOYSA-N cyclohexyl isocyanate Chemical compound O=C=NC1CCCCC1 KQWGXHWJMSMDJJ-UHFFFAOYSA-N 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940032007 methylethyl ketone Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- UQKAOOAFEFCDGT-UHFFFAOYSA-N n,n-dimethyloctan-1-amine Chemical compound CCCCCCCCN(C)C UQKAOOAFEFCDGT-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- HXHCOXPZCUFAJI-UHFFFAOYSA-N prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1 HXHCOXPZCUFAJI-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- NNENFOSYDBTCBO-UHFFFAOYSA-M tributyl(hexadecyl)phosphanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC NNENFOSYDBTCBO-UHFFFAOYSA-M 0.000 description 1
- QEXITCCVENILJI-UHFFFAOYSA-M tributyl(phenyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)C1=CC=CC=C1 QEXITCCVENILJI-UHFFFAOYSA-M 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 229960004418 trolamine Drugs 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Landscapes
- Epoxy Resins (AREA)
- Polyurethanes Or Polyureas (AREA)
Description
本発明は、1分子中に2個以上のカルボキシル基を有し、かつポリカーボネートジオールとポリイソシアネートとの反応で形成されるウレタン結合を有するポリウレタン及び熱硬化性成分を含む熱硬化性樹脂組成物に関する。更に詳しく言えば、基材との密着性、低反り性、可とう性、耐錫めっき性、耐湿熱性、はんだ耐熱性などに優れた熱硬化性組成物に関する。本発明の熱硬化性組成物は、ソルダーレジストや層間絶縁膜等の保護膜や電気絶縁材料、ICや超LSI封止材料、積層板等の分野の用途に利用できる。 The present invention relates to a thermosetting resin composition comprising a polyurethane having two or more carboxyl groups in one molecule and a urethane bond formed by a reaction between a polycarbonate diol and a polyisocyanate, and a thermosetting component. . More specifically, the present invention relates to a thermosetting composition excellent in adhesion to a substrate, low warpage, flexibility, tin plating resistance, moist heat resistance, solder heat resistance, and the like. The thermosetting composition of the present invention can be used for applications in the fields of protective films such as solder resists and interlayer insulating films, electrical insulating materials, ICs and VLSI sealing materials, and laminates.
ソルダーレジストでは、硬化収縮及び硬化後の冷却収縮が大きいために生じる反りが問題となっている。また、従来の熱硬化型レジストとしては、特公平5−75032号(特許文献1)に開示されているようなエポキシ樹脂と二塩基酸無水物を必須成分とするエポキシ樹脂系レジスト組成物があるが、形成される被膜に低反り性、可撓性を付与するように調整した場合、耐錫めっき性、耐湿熱性、はんだ耐熱性が低下するという問題がある。 The solder resist has a problem of warpage caused by shrinkage due to curing and cooling shrinkage after curing. In addition, as a conventional thermosetting resist, there is an epoxy resin resist composition having an epoxy resin and a dibasic acid anhydride as essential components as disclosed in JP-B-5-75032 (Patent Document 1). However, when it adjusts so that low warpage property and flexibility may be imparted to the coating film to be formed, there is a problem that the tin plating resistance, the moist heat resistance, and the solder heat resistance are lowered.
従って、本発明は、基材との密着性、低反り性、及び可とう性に優れ、かつ耐錫めっき性、耐湿熱性、及びはんだ耐熱性に優れた熱硬化性組成物を提供することを主たる課題とする。 Therefore, the present invention provides a thermosetting composition that is excellent in adhesion to a substrate, low warpage, and flexibility, and that is excellent in tin plating resistance, moist heat resistance, and solder heat resistance. Let it be the main issue.
本発明者らは、前記課題を解決するため鋭意研究した結果、1分子中に2個以上のカルボキシル基を有し、かつポリカーボネートジオール(a)とポリイソシアネート(b)が反応して形成されるウレタン結合を有するポリウレタン(A)、及び熱硬化性成分(B)を含む熱硬化性樹脂組成物によれば、基材との密着性、低反り性、可とう性、耐錫めっき性、耐湿熱性、はんだ耐熱性のバランスに優れ、前記課題が解決できることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above-mentioned problems, the present inventors have two or more carboxyl groups in one molecule, and are formed by reaction between polycarbonate diol (a) and polyisocyanate (b). According to the thermosetting resin composition containing the polyurethane (A) having a urethane bond and the thermosetting component (B), adhesion to the substrate, low warpage, flexibility, tin plating resistance, moisture resistance The present inventors have found that the balance between thermal properties and solder heat resistance is excellent and can solve the above problems, and have completed the present invention.
すなわち、本発明は以下の1〜14に示される熱硬化性樹脂組成物、その硬化物、その硬化物からなるソルダーレジスト及び保護膜ならびにその硬化物で被覆されたプリント配線基板に関する。
1.1分子中に2個以上のカルボキシル基を有し、かつポリカーボネートジオール(a)とポリイソシアネート(b)との反応で形成されるウレタン結合を有するポリウレタン(A)、及び熱硬化性成分(B)を含むことを特徴とする熱硬化性樹脂組成物。
2.ポリウレタン(A)の数平均分子量が500〜100000で、酸価が5〜150mgKOH/gである前記1に記載の熱硬化性樹脂組成物。
3.ポリカーボネートジオール(a)の数平均分子量が200〜5000である前記1に記載の熱硬化性樹脂組成物。
4.ポリカーボネートジオール(a)が、構成単位として、1種または2種以上の直鎖状脂肪族ジオールに由来の繰り返し単位を含むポリカーボネートジオール、1種または2種以上の脂環式ジオールに由来の繰り返し単位を含むポリカーボネートジオール、及びこれら両方のジオールに由来の繰り返し単位を含むポリカーボネートジオールからなる群から選ばれる少なくとも1種である前記1または3に記載の熱硬化性樹脂組成物。
5.ポリカーボネートジオール(a)が、構成単位として、直鎖状脂肪族ジオールと脂環式ジオールに由来の繰り返し単位を含むポリカーボネートジオールであって、数平均分子量が400〜2000であり、直鎖状脂肪族ジオールと脂環式ジオールの共重合割合が質量比で3:7〜7:3である前記4に記載の熱硬化性樹脂組成物。
6.ポリイソシアネート(b)が、脂環式ジアミンから誘導される脂環式ジイソシアネートである前記1に記載の熱硬化性樹脂組成物。
7.熱硬化性成分(B)がエポキシ樹脂である前記1に記載の熱硬化性樹脂組成物。
8.エポキシ樹脂が、ビスフェノールS型エポキシ樹脂、ジグリシジルフタレート樹脂、ヘテロサイクリックエポキシ樹脂、ビキシレノール型エポキシ樹脂、ビフェニル型エポキシ樹脂、及びテトラグリシジルキシレノイルエタン樹脂からなる群から選ばれる少なくとも1種である前記7に記載の熱硬化性樹脂組成物。
9.さらに硬化剤を含む前記1に記載の熱硬化性樹脂組成物。
10.硬化剤が、アミン、四級アンモニウム塩、酸無水物、ポリアミド、窒素含有複素環化合物、及び有機金属化合物からなる群から選ばれる少なくとも1種である前記9に記載の熱硬化性樹脂組成物。
11.さらに有機溶媒を含む前記1に記載の熱硬化性樹脂組成物。
12.前記1乃至11のいずれか1項に記載の熱硬化性樹脂組成物を硬化してなることを特徴とする硬化物。
13.前記12に記載の硬化物からなるソルダーレジスト。
14.前記12に記載の硬化物からなる保護膜。
15.前記12に記載の硬化物で、面の一部または全部が被覆されたプリント配線基板。
That is, this invention relates to the thermosetting resin composition shown by the following 1-14, its hardened | cured material, the soldering resist and protective film which consist of the hardened | cured material, and the printed wiring board coat | covered with the hardened | cured material.
1.1 Polyurethane (A) having two or more carboxyl groups in the molecule and having a urethane bond formed by a reaction between polycarbonate diol (a) and polyisocyanate (b), and thermosetting component ( A thermosetting resin composition comprising B).
2. 2. The thermosetting resin composition according to 1 above, wherein the polyurethane (A) has a number average molecular weight of 500 to 100,000 and an acid value of 5 to 150 mgKOH / g.
3. 2. The thermosetting resin composition according to 1, wherein the polycarbonate diol (a) has a number average molecular weight of 200 to 5,000.
4). Polycarbonate diol (a) is a repeating unit derived from a polycarbonate diol, one or more alicyclic diols containing one or more linear aliphatic diols as a structural unit. 4. The thermosetting resin composition as described in 1 or 3 above, which is at least one selected from the group consisting of polycarbonate diols containing polycarbonate and polycarbonate diols containing repeating units derived from both diols.
5. The polycarbonate diol (a) is a polycarbonate diol containing a repeating unit derived from a linear aliphatic diol and an alicyclic diol as a constitutional unit, the number average molecular weight is 400 to 2000, and the linear aliphatic 5. The thermosetting resin composition as described in 4 above, wherein the copolymerization ratio of the diol and the alicyclic diol is from 3: 7 to 7: 3 by mass ratio.
6). 2. The thermosetting resin composition according to 1, wherein the polyisocyanate (b) is an alicyclic diisocyanate derived from an alicyclic diamine.
7). 2. The thermosetting resin composition as described in 1 above, wherein the thermosetting component (B) is an epoxy resin.
8). The epoxy resin is at least one selected from the group consisting of a bisphenol S type epoxy resin, a diglycidyl phthalate resin, a heterocyclic epoxy resin, a bixylenol type epoxy resin, a biphenyl type epoxy resin, and a tetraglycidyl xylenoylethane resin. 8. The thermosetting resin composition as described in 7 above.
9. Furthermore, the thermosetting resin composition of 1 containing a hardening | curing agent.
10. 10. The thermosetting resin composition according to 9, wherein the curing agent is at least one selected from the group consisting of amines, quaternary ammonium salts, acid anhydrides, polyamides, nitrogen-containing heterocyclic compounds, and organometallic compounds.
11. Furthermore, the thermosetting resin composition of 1 containing an organic solvent.
12 A cured product obtained by curing the thermosetting resin composition according to any one of 1 to 11 above.
13. A solder resist comprising the cured product as described in 12 above.
14 13. A protective film comprising the cured product as described in 12 above.
15. 13. A printed wiring board, wherein a part or all of the surface is covered with the cured product described in 12 above.
本発明によるウレタン結合を有するポリウレタン(A)及び熱硬化性成分(B)を含む熱硬化性樹脂組成物は、基材との密着性、低反り性、可とう性に優れ、かつ耐錫めっき性、耐湿熱性、はんだ耐熱性にも優れており、ソルダーレジストや層間絶縁膜等の電気絶縁材料、ICや超LSI封止材料、積層板等の分野へ好適に利用できる。
従来のソルダーレジストでは、硬化収縮及び硬化後の冷却収縮が大きいため反りが生じ、歩留まり低下の原因となっていたが、本発明の熱硬化性樹脂組成物によれば、低反り性や可撓性とトレードオフの関係にあった耐錫メッキ性、はんだ耐熱性、耐湿熱性を同時に達成でき、優れたソルダーレジスト、あるいは保護膜を低コストで生産性よく形成できる。
The thermosetting resin composition containing polyurethane (A) having a urethane bond and a thermosetting component (B) according to the present invention is excellent in adhesion to a substrate, low warpage, flexibility, and tin-resistant plating. It is also excellent in heat resistance, moisture heat resistance, and solder heat resistance, and can be suitably used in fields such as electrical insulating materials such as solder resists and interlayer insulating films, IC and VLSI sealing materials, and laminates.
In the conventional solder resist, curing shrinkage and cooling shrinkage after curing are large, causing warping and causing a decrease in yield. However, according to the thermosetting resin composition of the present invention, low warpage and flexibility In addition, it is possible to achieve tin plating resistance, solder heat resistance, and moist heat resistance that are in a trade-off relationship with each other, and an excellent solder resist or protective film can be formed at low cost with high productivity.
以下、本発明を詳細に説明する。
ポリウレタン(A)は、1分子中に2個以上のカルボキシル基を有し、かつポリカーボネートジオール(a)とポリイソシアネート(b)が反応して形成されるウレタン結合を有する。ポリウレタン(A)は、例えば、少なくともポリカーボネートジオール(a)、ポリイソシアネート(b)、及び酸価を調節する目的でカルボキシル基を有するポリオール(c)を反応させて得られる。反応に際しては末端封止剤としてモノヒドロキシル化合物(d)を加えても良い。
Hereinafter, the present invention will be described in detail.
The polyurethane (A) has two or more carboxyl groups in one molecule, and has a urethane bond formed by a reaction between the polycarbonate diol (a) and the polyisocyanate (b). The polyurethane (A) is obtained, for example, by reacting at least a polycarbonate diol (a), a polyisocyanate (b), and a polyol (c) having a carboxyl group for the purpose of adjusting the acid value. In the reaction, a monohydroxyl compound (d) may be added as a terminal blocking agent.
ポリカーボネートジオール(a)としては、1種または2種以上の直鎖状脂肪族ジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオール(a1)、1種または2種以上の脂環式ジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオール(a2)、またはこれら両方のジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオール(a3)が挙げられる。 The polycarbonate diol (a) is derived from a polycarbonate diol (a1) containing a repeating unit derived from one or more linear aliphatic diols as a constituent unit, derived from one or more alicyclic diols. Polycarbonate diol (a2) containing as a structural unit, or polycarbonate diol (a3) containing a repeating unit derived from both of these diols as a structural unit.
直鎖状脂肪族ジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオール(a1)の具体例としては、例えば、1,6−ヘキサンジオールから誘導されるポリカーボネートジオール、1,5−ペンタンジオールと1,6−ヘキサンジオールから誘導されるポリカーボネートジオール、1,4−ブタンジオールと1,6−ヘキサンジオールから誘導されるポリカーボネートジオール、3−メチル−1,5−ペンタンジオールと1,6−ヘキサンジオールから誘導されるポリカーボネートジオールが挙げられる。 Specific examples of the polycarbonate diol (a1) containing a repeating unit derived from a linear aliphatic diol as a constituent unit include, for example, polycarbonate diol derived from 1,6-hexanediol, 1,5-pentanediol and 1 Polycarbonate diol derived from 1,6-hexanediol, polycarbonate diol derived from 1,4-butanediol and 1,6-hexanediol, 3-methyl-1,5-pentanediol and 1,6-hexanediol The polycarbonate diol derived is mentioned.
脂環式ジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオール(a2)の具体例としては、例えば、1,4−シクロヘキサンジメタノールから誘導されるポリカーボネートジオールが挙げられる。 Specific examples of the polycarbonate diol (a2) containing a repeating unit derived from an alicyclic diol as a constituent unit include, for example, a polycarbonate diol derived from 1,4-cyclohexanedimethanol.
直鎖状脂肪族ジオールと脂環式ジオールの両方のジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオール(a3)の具体例としては、例えば、1,6−ヘキサンジオールと1,4−シクロヘキサンジメタノールから誘導されるポリカーボネートジオールが挙げられる。 Specific examples of the polycarbonate diol (a3) containing repeating units derived from both a linear aliphatic diol and an alicyclic diol as constituent units include, for example, 1,6-hexanediol and 1,4-cyclohexane. Polycarbonate diols derived from dimethanol are mentioned.
直鎖状脂肪族ジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオールは、低反り性や可撓性に優れる傾向がある。また、脂環式ジオールに由来の繰り返し単位を構成単位として含むポリカーボネートジオールは、結晶性が高くなり耐錫メッキ性やはんだ耐熱性に優れる傾向がある。以上の観点から、これらのポリカーボネートジオールは2種以上を組み合わせて用いるか、あるいは直鎖状脂肪族ジオール由来と脂環式ジオール由来の両方の繰り返し単位を構成単位として含むポリカーボネートジオールを用いることができる。低反り性や可撓性と、耐錫メッキ性やはんだ耐熱性とをバランス良く発現させるには、直鎖状脂肪族ジオールと脂環式ジオールの共重合割合が質量比で3:7〜7:3のポリカーボネートジオールを用いるのが好適である。 A polycarbonate diol containing a repeating unit derived from a linear aliphatic diol as a constituent unit tends to be excellent in low warpage and flexibility. Moreover, the polycarbonate diol containing a repeating unit derived from an alicyclic diol as a constituent unit tends to have high crystallinity and excellent tin plating resistance and solder heat resistance. From the above viewpoints, these polycarbonate diols can be used in combination of two or more, or polycarbonate diols containing repeating units derived from both linear aliphatic diols and alicyclic diols as constituent units can be used. . In order to achieve a good balance between low warpage and flexibility, tin plating resistance and solder heat resistance, the copolymerization ratio of the linear aliphatic diol and the alicyclic diol is 3: 7 to 7 by mass ratio. : 3 polycarbonate diol is preferably used.
また、ポリカーボネートジオール(a)の数平均分子量は200〜5000であることが好ましい。数平均分子量が200未満では耐薬品性が低下し、耐錫メッキ性を損ねることがある。5000を超えると相対的なウレタン結合の量が減り、酸価も低下するため架橋密度が下がり結果的に、はんだ耐熱性を損ねる場合がある。ポリカーボネートジオールが構成単位として直鎖状脂肪族ジオールと脂環式ジオールに由来の繰り返し単位を含み、直鎖状脂肪族ジオールと脂環式ジオールの共重合割合が質量比で3:7〜7:3である前記の場合は、数平均分子量が400〜2,000のものが好ましい。 Moreover, it is preferable that the number average molecular weights of polycarbonate diol (a) are 200-5000. When the number average molecular weight is less than 200, the chemical resistance is lowered and the tin plating resistance may be impaired. If it exceeds 5,000, the relative amount of urethane bonds decreases and the acid value also decreases, so that the crosslinking density decreases and as a result, solder heat resistance may be impaired. The polycarbonate diol includes a repeating unit derived from a linear aliphatic diol and an alicyclic diol as a structural unit, and the copolymerization ratio of the linear aliphatic diol and the alicyclic diol is from 3: 7 to 7: In the case of 3, the number average molecular weight is preferably 400 to 2,000.
ポリイソシアネート(b)の具体例としては、2,4−トルエンジイソシアネート、2,6−トルエンジイソシアネート、イソホロンジイソシアネート、ヘキサメチレンジイソシアネート、ジフェニルメチレンジイソシアネート、(o,m,またはp)−キシレンジイソシアネート、(o,m,またはp)−水添キシレンジイソシアネート、メチレンビス(シクロヘキシルイソシアネート)、トリメチルヘキサメチレンジイソシアネート、シクロヘキサン−1,3−ジメチレンジイソシアネート、シクロヘキサン−1,4−ジメチレレンジイソシアネート及び1,5−ナフタレンジイソシアネート等のジイソシネートが挙げられる。これらのポリイソシアネートは1種または2種以上を組み合わせて用いることができる。
これらの中でも脂環式ジアミンから誘導される脂環式ジイソシアネート、具体的には、イソホロンジイソシアネート或いは(o,m,またはp)−水添キシレンジイソシアネートが好ましい。これらのジイソシアネートを使用した場合、耐錫メッキ性に優れた硬化物を得ることが出来る。
Specific examples of the polyisocyanate (b) include 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, isophorone diisocyanate, hexamethylene diisocyanate, diphenylmethylene diisocyanate, (o, m, or p) -xylene diisocyanate, (o , M, or p) -hydrogenated xylene diisocyanate, methylene bis (cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, cyclohexane-1,3-dimethylene diisocyanate, cyclohexane-1,4-dimethylene diisocyanate, 1,5-naphthalene diisocyanate, etc. Of the diisocyanate. These polyisocyanates can be used alone or in combination of two or more.
Among these, alicyclic diisocyanates derived from alicyclic diamines, specifically, isophorone diisocyanate or (o, m, or p) -hydrogenated xylene diisocyanate are preferable. When these diisocyanates are used, a cured product excellent in tin plating resistance can be obtained.
カルボキシル基を有するポリオール(c)としては、特にカルボキシル基を有するジヒドロキシ脂肪族カルボン酸を使用することが好ましい。このようなジヒドロキシル化合物としては、ジメチロールプロピオン酸、ジメチロールブタン酸が挙げられる。カルボキシル基を有するジヒドロキシ脂肪族カルボン酸を使用することによって、ウレタン樹脂中に容易にカルボキシル基を存在させることができる。 As the polyol (c) having a carboxyl group, it is particularly preferable to use a dihydroxy aliphatic carboxylic acid having a carboxyl group. Examples of such a dihydroxyl compound include dimethylolpropionic acid and dimethylolbutanoic acid. By using a dihydroxy aliphatic carboxylic acid having a carboxyl group, the carboxyl group can be easily present in the urethane resin.
モノヒドロキシル化合物(d)としては、ポリウレタン(A)の末端封止剤となるもので分子中にヒドロキシル基を一つ有する化合物であればよく、脂肪族アルコール(d1)、モノヒドロキシモノ(メタ)アクリレート化合物(d2)等が挙げられる。
脂肪族アルコール(d1)の例としては、メタノール、エタノール、プロパノール、イソブタノール等が挙げられ、モノヒドロキシモノ(メタ)アクリレート化合物(d2)の例としては、2−ヒドロキシエチルアクリレート等が挙げられる。
The monohydroxyl compound (d) may be a compound having one hydroxyl group in the molecule as an end-capping agent for the polyurethane (A), such as aliphatic alcohol (d1), monohydroxymono (meth). An acrylate compound (d2) etc. are mentioned.
Examples of the aliphatic alcohol (d1) include methanol, ethanol, propanol, isobutanol and the like, and examples of the monohydroxy mono (meth) acrylate compound (d2) include 2-hydroxyethyl acrylate and the like.
前記のウレタン樹脂(A)の数平均分子量は500〜100,000であることが好ましく、8,000〜30,000が更に好ましい。ここで、数平均分子量は、ゲルパーミエーションクロマトグラフィーで測定したポリスチレン換算の値である。ポリウレタン(A)の数平均分子量が500未満では、硬化膜の伸度、可撓性、並びに強度を損なうことがあり、100,000を超えると硬くなり可撓性を低下させるおそれがある。 The number average molecular weight of the urethane resin (A) is preferably 500 to 100,000, and more preferably 8,000 to 30,000. Here, the number average molecular weight is a value in terms of polystyrene measured by gel permeation chromatography. When the number average molecular weight of the polyurethane (A) is less than 500, the elongation, flexibility and strength of the cured film may be impaired, and when it exceeds 100,000, it may become hard and decrease flexibility.
ウレタン樹脂(A)の酸価は5〜150mgKOH/gのものが好ましく、30〜120mgKOH/gが更に好ましい。酸価が5mgKOH/g未満では硬化性成分との反応性が低下し耐熱性を損ねることがある。150mgKOH/gを超えると硬化膜の耐アルカリ性、電気特性等のレジストとしての特性が低下する場合がある。なお、樹脂の酸価はJISK5407に準拠して測定をした値である。 The acid value of the urethane resin (A) is preferably 5 to 150 mgKOH / g, more preferably 30 to 120 mgKOH / g. When the acid value is less than 5 mgKOH / g, the reactivity with the curable component is lowered, and the heat resistance may be impaired. If it exceeds 150 mgKOH / g, the resist properties such as alkali resistance and electrical properties of the cured film may be deteriorated. In addition, the acid value of resin is the value measured based on JISK5407.
熱硬化性成分(B)としては、前記(A)成分と反応するエポキシ樹脂が使用される。具体例としては、ビスフェノールA型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、臭素化ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、N−グリシジル型エポキシ樹脂、ビスフェノールAのノボラック型エポキシ樹脂、キレート型エポキシ樹脂、グリオキザール型エポキシ樹脂、アミノ基含有エポキシ樹脂、ゴム変性エポキシ樹脂、ジシクロペンタジエンフェノリック型エポキシ樹脂、シリコーン変性エポキシ樹脂、ε−カプロラクトン変性エポキシ樹脂などの一分子中に2個以上のエポキシ基を有するエポキシ化合物が挙げられる。また、難燃性付与のために、塩素、臭素等のハロゲンや燐等の原子がその構造中に導入されたものを使用してもよい。さらに、ビスフェノールS型エポキシ樹脂、ジグリシジルフタレート樹脂、ヘテロサイクリックエポキシ樹脂、ビキシレノール型エポキシ樹脂、ビフェノール型エポキシ樹脂及びテトラグリシジルキシレノイルエタン樹脂等を使用してもよい。 As the thermosetting component (B), an epoxy resin that reacts with the component (A) is used. Specific examples include bisphenol A type epoxy resins, hydrogenated bisphenol A type epoxy resins, brominated bisphenol A type epoxy resins, bisphenol F type epoxy resins, novolac type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, N-glycidyl type epoxy resin, bisphenol A novolac type epoxy resin, chelate type epoxy resin, glyoxal type epoxy resin, amino group-containing epoxy resin, rubber modified epoxy resin, dicyclopentadiene phenolic type epoxy resin, silicone modified epoxy resin, ε -Epoxy compounds having two or more epoxy groups in one molecule such as caprolactone-modified epoxy resin. Further, in order to impart flame retardancy, a material in which an atom such as halogen such as chlorine or bromine or phosphorus is introduced into the structure may be used. Furthermore, bisphenol S type epoxy resin, diglycidyl phthalate resin, heterocyclic epoxy resin, bixylenol type epoxy resin, biphenol type epoxy resin, tetraglycidyl xylenoyl ethane resin, and the like may be used.
本発明の熱硬化性樹脂組成物において、前記硬化成分(B)は、単独または2種以上の混合物として用いられる。その配合量は、前記(A)成分のカルボキシル基に対する硬化成分(B)のエポキシ基の当量比が1.0〜3.0であることが望ましい。1.0未満では熱硬化性樹脂組成物の硬化膜の電気絶縁性が不十分となる場合があり、3.0を超えると硬化膜の収縮量が多くなり、フレキシブルプリント配線基板(FPC)の絶縁保護膜として使用した場合に低反り性が悪化する傾向がある。
In the thermosetting resin composition of the present invention, the curing component (B) is used alone or as a mixture of two or more. The amount thereof, the equivalent ratio of the epoxy groups of the (A) curable component against the carboxyl groups of component (B) is desirably 1.0 to 3.0. If it is less than 1.0, the electric insulation of the cured film of the thermosetting resin composition may be insufficient, and if it exceeds 3.0, the amount of shrinkage of the cured film increases, and as an insulating protective film of a flexible printed circuit board (FPC) When used, low warpage tends to deteriorate.
本発明で用いる硬化剤は、硬化反応を促進させるものであり、密着性、耐薬品性、耐熱性等の特性をより一層向上するために使用される。このような硬化剤の具体例としては、イミダゾール誘導体(例えば、四国化成工業(株)製、2MZ、2E4MZ、C11Z、C17Z、2PZ、1B2MZ、2MZ−CN、2E4MZ−CN,C11Z−CN、2PZ−CN、2PHZ−CN、2MZ−CNS、2E4MZ−CNS、2PZ−CNS、2MZ−AZINE、2E4MZ−AZINE、C11Z−AZINE、2MA−OK、2P4MHZ、2PHZ、2P4BHZ等);アセトグアナミン、ベンゾグアナミン等のグアナミン類;ジアミノジフェニルメタン、m−フェニレンジアミン、m−キシレンジアミン、ジアミノジフェニルスルフォン、ジシアンジアミド、尿素、尿素誘導体、メラミン、多塩基ヒドラジド等のポリアミン類;これらの有機酸塩及び/またはエポキシアダクト;三フッ化ホウ素のアミン錯体;エチルジアミノ−S−トリアジン、2,4−ジアミノ−S−トリアジン,2,4−ジアミノ−6−キシリル−S−トリアジン等のトリアジン誘導体類;トリメチルアミン、トリエタノールアミン、N,N−ジメチルオクチルアミン、N−ベンジルジメチルアミン、ピリジン、N−メチルモルホリン、ヘキサ(N−メチル)メラミン、2,4,6−トリス(ジメチルアミノフェノール)、テトラメチルグアニジン、m−アミノフェノール等のアミン類;ポリビニルフェノール、ポリビニルフェノール臭素化物、フェノールノボラック、アルキルフェノールノボラック等のポリフェノール類;トリブチルホスフィン、トリフェニルホスフィン、トリス−2−シアノエチルホスフィン等の有機ホスフィン類;トリ−n−ブチル(2,5−ジヒドロキシフェニル)ホスホニウムブロマイド、ヘキサデシルトリブチルホスホニウムクロライド等のホスホニウム塩類;ベンジルトリメチルアンモニウムクロライド、フェニルトリブチルアンモニウムクロライド等の4級アンモニウム塩類;前記多塩基酸無水物;ジフェニルヨードニウムテトラフルオロボロエート、トリフェニルスルホニウムヘキサフルオロアンチモネート、2,4,6−トリフェニルチオピリリウムヘキサフルオロホスフェート、チバ・ガイギー社製、イルガキュアー261、旭電化(株)製、オプトマ−SP−170等の光カチオン重合触媒;スチレン−無水マレイン酸樹脂;フェニルイソシアネートとジメチルアミンの等モル反応物や、トリレンジイソシアネート、イソホロンジイソシアネート等の有機ポリイソシアネートとジメチルアミンの等モル反応物等の公知慣用である硬化剤類あるいは硬化促進剤類が挙げられる。 The curing agent used in the present invention accelerates the curing reaction, and is used to further improve properties such as adhesion, chemical resistance, and heat resistance. Examples of such curing agents, imidazole derivatives (e.g., manufactured by Shikoku Chemicals Co., 2MZ, 2E4MZ, C 11 Z , C 17 Z, 2PZ, 1B2MZ, 2MZ-CN, 2E4MZ-CN, C 11 Z-CN, 2PZ-CN, 2PHZ-CN, 2MZ-CNS, 2E4MZ-CNS, 2PZ-CNS, 2MZ-AZINE, 2E4MZ-AZINE, C 11 Z-AZINE, 2MA-OK, 2P4MHZ, 2PHZ, 2P4BHZ , etc.); Guanamines such as acetoguanamine and benzoguanamine; polyamines such as diaminodiphenylmethane, m-phenylenediamine, m-xylenediamine, diaminodiphenylsulfone, dicyandiamide, urea, urea derivatives, melamine, polybasic hydrazide; organic acid salts and / or Or epoxy adak G; amine complex of boron trifluoride; triazine derivatives such as ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2,4-diamino-6-xylyl-S-triazine; trimethylamine, triethanol Amine, N, N-dimethyloctylamine, N-benzyldimethylamine, pyridine, N-methylmorpholine, hexa (N-methyl) melamine, 2,4,6-tris (dimethylaminophenol), tetramethylguanidine, m- Amines such as aminophenol; polyphenols such as polyvinylphenol, polyvinylphenol bromide, phenol novolak, alkylphenol novolak; organic phosphines such as tributylphosphine, triphenylphosphine, tris-2-cyanoethylphosphine; phosphonium salts such as n-butyl (2,5-dihydroxyphenyl) phosphonium bromide and hexadecyltributylphosphonium chloride; quaternary ammonium salts such as benzyltrimethylammonium chloride and phenyltributylammonium chloride; the polybasic acid anhydrides; diphenyliodonium tetra Fluoroboroate, triphenylsulfonium hexafluoroantimonate, 2,4,6-triphenylthiopyrylium hexafluorophosphate, manufactured by Ciba Geigy, Irgacure 261, manufactured by Asahi Denka Co., Ltd., Optomer-SP-170, etc. Cationic photopolymerization catalyst of styrene; maleic anhydride resin; equimolar reaction product of phenyl isocyanate and dimethylamine, tolylene diisocyanate, isophorone diisocyanate Over organic polyisocyanate and the curing agents or curing accelerators such known conventional such equimolar reaction product of dimethylamine, such bets can be mentioned.
これら硬化剤は単独で、または2種以上混合して用いることができる。硬化剤の使用は必須ではないが、特に硬化を促進したい場合には、前記硬化成分(B)100質量部に対して25質量部までの範囲で用いることができる。25質量部を超えるとその硬化物からの昇華性成分が多くなり好ましくない。 These curing agents can be used alone or in admixture of two or more. The use of a curing agent is not essential, but can be used in a range of up to 25 parts by mass with respect to 100 parts by mass of the curing component (B), particularly when curing is desired to be accelerated. If it exceeds 25 parts by mass, the sublimable component from the cured product increases, which is not preferable.
本発明の熱硬化性樹脂組成物は、上記ポリウレタン(A)、熱硬化性成分(B)を混合機、例えばディスパー、ニーダー、3本ロールミル、ビーズミル等を用いて、溶解または分散することにより得られる。その際、エポキシ基、及びカルボキシル基に対して不活性な溶剤を使用してもよい。 The thermosetting resin composition of the present invention is obtained by dissolving or dispersing the polyurethane (A) and the thermosetting component (B) using a mixer such as a disper, a kneader, a three-roll mill, or a bead mill. It is done. In that case, you may use the solvent inactive with respect to an epoxy group and a carboxyl group.
有機溶剤は、ポリウレタン(A)、熱硬化性成分(B)を容易に溶解または分散させるため、あるいは塗工に適した粘度に調整するために使用する。有機溶剤の例としては、トルエン、キシレン、エチルベンゼン、ニトロベンゼン、シクロヘキサン、イソホロン、ジエチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、カルビトールアセテート、プロピレングリコールメチルエーテルアセテート、プロピレングリコールエチルエーテルアセテート、ジプロピレングリコールメチルエーテルアセテート、ジエチレングリコールエチルエーテルアセテート、メトキシプロピオン酸メチル、メトキシプロピオン酸エチル、エトキシプロピオン酸メチル、エトキシプロピオン酸エチル、酢酸エチル、酢酸n−ブチル、酢酸イソアミル、乳酸エチル、アセトン、メチルエチルケトン、シクロヘキサノン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、γ−ブチロラクトン、ジメチルスルホキシド、クロロホルム及び塩化メチレン等を挙げることができる。 The organic solvent is used for easily dissolving or dispersing the polyurethane (A) and the thermosetting component (B), or adjusting the viscosity to be suitable for coating. Examples of organic solvents include toluene, xylene, ethylbenzene, nitrobenzene, cyclohexane, isophorone, diethylene glycol dimethyl ether, ethylene glycol diethyl ether, carbitol acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, dipropylene glycol methyl ether acetate, Diethylene glycol ethyl ether acetate, methyl methoxypropionate, ethyl methoxypropionate, methyl ethoxypropionate, ethyl ethoxypropionate, ethyl acetate, n-butyl acetate, isoamyl acetate, ethyl lactate, acetone, methyl ethyl ketone, cyclohexanone, N, N-dimethyl Formamide, N, N-dimethylacetamide, N- Methylpyrrolidone, .gamma.-butyrolactone, dimethyl sulfoxide, can be mentioned chloroform and methylene chloride.
さらに、本発明の熱硬化性組成物には、公知の各種添加剤、例えば、硫酸バリウム、タルク、炭酸カルシウム、アルミナ、ガラス粉、石英粉、シリカ等の無機充填剤、ガラス繊維、炭素繊維、窒化ホウ素繊維等の繊維強化材、酸化チタン、酸化亜鉛、カーボンブラック、鉄黒、有機顔料、有機染料等の着色剤、ヒンダードフェノール系化合物、リン系化合物、ヒンダードアミン系化合物等の酸化防止剤、ベンゾトリアゾール系化合物、ベンゾフェノン系化合物等の紫外線吸収剤等を配合することができる。
また、用途に合わせて粘度調整剤、難燃剤、抗菌剤、防黴剤、老化防止剤、帯電防止剤、可塑剤、滑剤、発泡剤などを添加・混合することができる。
Furthermore, the thermosetting composition of the present invention includes various known additives such as inorganic fillers such as barium sulfate, talc, calcium carbonate, alumina, glass powder, quartz powder, silica, glass fiber, carbon fiber, Fiber reinforcing materials such as boron nitride fibers, colorants such as titanium oxide, zinc oxide, carbon black, iron black, organic pigments, organic dyes, antioxidants such as hindered phenol compounds, phosphorus compounds, hindered amine compounds, Ultraviolet absorbers such as benzotriazole compounds and benzophenone compounds can be blended.
Moreover, a viscosity modifier, a flame retardant, an antibacterial agent, an antifungal agent, an anti-aging agent, an antistatic agent, a plasticizer, a lubricant, a foaming agent, and the like can be added and mixed according to the application.
合成例1:ポリウレタン(PU−1)の合成
撹拌装置、温度計、コンデンサーを備えた反応容器に、1,5−ペンタンジオールと1,6−ヘキサンジオールから誘導されるポリカーボネートジオール(宇部興産(株)製、PCDL800、数平均分子量800)を2400g(3mol)、カルボキシル基を有するジヒドロキシル化合物としてジメチロールプロピオン酸を402g(3mol)、ポリイソシアネートとしてイソホロンジイソシアネート1554g(7mol)及びモノヒドロキシル化合物として2−ヒドロキシエチルアクリレート、238g(2.05mol)を投入した。撹拌しながら60℃まで加熱して停止し、反応容器内の温度が低下し始めた時点で再度加熱して80℃で撹拌を続け、赤外線吸収スペクトルでイソシアネート基の吸収スペクトル(2280cm-1)が消失したことを確認して反応を終了した。固形分が50質量%となるようにカルビトールアセテートを添加し、希釈剤を含有する粘稠液体のポリウレタン(PU−1)を得た。得られたポリウレタンの数平均分子量は22,000(平均分子量は、ゲル担体液体クロマトグラフィー(GPC昭和電工(株)製GPC−1)を用い、ポリスチレンに換算した値で求めた。)、固形分の酸価は46mgKOH/gであった。
Synthesis Example 1: Synthesis of polyurethane (PU-1) Polycarbonate diol (Ube Industries, Ltd.) derived from 1,5-pentanediol and 1,6-hexanediol in a reaction vessel equipped with a stirrer, a thermometer, and a condenser. ), PCDL800, number average molecular weight 800) 2400 g (3 mol), dimethylolpropionic acid 402 g (3 mol) as a dihydroxyl compound having a carboxyl group, isophorone diisocyanate 1554 g (7 mol) as polyisocyanate and 2-hydroxyl compound as 2-hydroxyl compound Hydroxyethyl acrylate, 238 g (2.05 mol) was added. The mixture was heated to 60 ° C. while stirring and stopped. When the temperature in the reaction vessel began to decrease, the mixture was heated again and stirred at 80 ° C., and the absorption spectrum of the isocyanate group (2280 cm −1 ) was observed in the infrared absorption spectrum. The reaction was terminated after confirming disappearance. Carbitol acetate was added so that the solid content was 50% by mass to obtain a viscous liquid polyurethane (PU-1) containing a diluent. The number average molecular weight of the obtained polyurethane was 22,000 (the average molecular weight was determined as a value converted to polystyrene using gel carrier liquid chromatography (GPC-1 manufactured by GPC Showa Denko KK)), solid acid. The value was 46 mgKOH / g.
合成例2:ウレタン樹脂(PU−2)の合成
ポリカーボネートジオールとして、1,6−ヘキサンジオールと1,4−シクロヘキサンジメタノールから誘導されたポリカーボネートジオール(宇部興産(株)製、UM−CARB90、数平均分子量900、上記2種のジオールの共重合割合は質量比で1:1)を2700g用いた以外は合成例1と同様の手段で合成を行い、希釈剤を含有する粘稠液体のポリウレタンPU−2を得た。得られたポリウレタンの数平均分子量は24,000、固形分の酸価は57mgKOH/gであった。
Synthesis Example 2: Synthesis of urethane resin (PU-2) Polycarbonate diol derived from 1,6-hexanediol and 1,4-cyclohexanedimethanol as polycarbonate diol (manufactured by Ube Industries, Ltd., UM-CARB90, number) The polyurethane PU of a viscous liquid containing a diluent was synthesized by the same means as in Synthesis Example 1 except that 2700 g of an average molecular weight of 900 and the copolymerization ratio of the above two kinds of diols were 1: 1) by mass ratio. -2 was obtained. The number average molecular weight of the obtained polyurethane was 24,000, and the acid value of the solid content was 57 mgKOH / g.
比較例1:
ジョンソンポリマー(株)製のスチレン−アクリル酸樹脂;ジョンクリル586(分子量4600、固形分酸価108mgKOH/g)をカルボキシル基含有樹脂として用いた。
Comparative Example 1:
Styrene-acrylic acid resin manufactured by Johnson Polymer Co., Ltd .; John Cryl 586 (molecular weight 4600, solid content acid value 108 mgKOH / g) was used as the carboxyl group-containing resin.
比較例2:
ダイセル化学工業(株)製のアクリル共重合樹脂;サイクロマーP ACA320(分子量20000、固形分酸価130mgKOH/g)をカルボキシル基含有樹脂として用いた。
Comparative Example 2:
Acrylic copolymer resin manufactured by Daicel Chemical Industries, Ltd .; Cyclomer P ACA320 (molecular weight 20000, solid content acid value 130 mgKOH / g) was used as the carboxyl group-containing resin.
参考例1〜2、実施例1及び比較例1〜2:
表1に示す各成分及び配合割合で、三本ロールにより混合(23℃)し、硬化性樹脂組成物を調製した。得られた熱硬化性組成物をバーコーターにて膜厚約25μmとなるように基板に塗工した。各塗工基板を80℃にて15分間溶剤を予備乾燥した後、150℃×60分の条件で熱硬化を行なった。各例における性能を下記の方法で評価した。その結果を表1に示す。
Reference Examples 1-2, Example 1 and Comparative Examples 1-2:
Each component and blending ratio shown in Table 1 were mixed with a three roll (23 ° C.) to prepare a curable resin composition. The obtained thermosetting composition was coated on a substrate with a bar coater so as to have a film thickness of about 25 μm. Each coated substrate was pre-dried at 80 ° C. for 15 minutes, and then thermally cured under conditions of 150 ° C. × 60 minutes. The performance in each example was evaluated by the following method. The results are shown in Table 1.
性能評価法
(1)反り性
ポリイミドフィルム(カプトン100H;東レデュポン(株)製、厚さ25μm)に熱硬化性組成物を塗工し、熱硬化後、50mmφにサークルカッターでカットした。円形にカットされたものは中心付近が凸状または凹状に反る形の変形を呈する。1時間後に下に凸の状態で静置し、水平面からの反りの高さの最大、最小値を測定し、平均した。符号は反りの方向を表し、下に凸の状態で静置した際、ポリイミドフィルムに対し硬化膜が上側になる場合を「+」、硬化膜が下側になる場合を「−」とした。
(2)可撓性
ポリイミドフィルム(カプトン100H;東レデュポン(株)製、厚さ25μm)上で、熱硬化まで行った試料を15×70mmにカットし、レジスト面が外側になるように180度折り曲げ、折り曲げ部位に0.35kNの力が1秒間かかるようにした。顕微鏡で観察し、クラックが入るまでの回数を可撓性として測定した。なお、評価は10回までとした。
(3)はんだ耐熱性
リジッド銅基板上の一部をカプトンポリイミドテープ(東レデュポン(株)製)でマスクし、マスク面、非マスク面を全体的に塗工し、硬化塗膜を得た。ついでカプトンポリイミドテープを剥離し、ロジン系フラックスを塗布して、はんだ浴に260℃×10秒間浸漬させた。レジスト膜とテープ剥離部の界面を目視観察し、膜剥離などの変化が現れるまでの浸漬回数を評価した。なお、評価は3回までとした。
(4)密着性
銅基板、ポリイミドフィルム(カプトン300H;東レデュポン(株)製、厚さ100μm)上で硬化させた塗膜を用いて、JIS K5600 に準拠して評価した。なお、剥離用テープは日東製を用い、下記の基準で評価した。
○:碁盤目の数が完全に残る場合、
△:碁盤目の数が50個以上100個未満残る場合、
×:碁盤目の数が50個未満しか残らない場合。
(5)プレッシャークッカーテスト(PCT:耐湿熱性試験)
フレキシブル銅基板(宇部興産(株)製ユピセルN SE3150)上に硬化塗膜を得て、121℃、相対湿度100%RHの恒温恒湿機内で120時間放置後、以下の基準で評価した。
○:硬化塗膜に膨れ、剥がれ、変色なし、
△:硬化塗膜に若干、膨れ、剥がれ、変色がある、
×:硬化塗膜に膨れ、剥がれ、変色がある。
(6)耐錫メッキ性
フレキシブル銅基板(宇部興産(株)製ユピセルN SE3150)上に硬化塗膜を得て、錫メッキ液(ローム&ハース社製:TINPOSIT LT-34)のメッキ浴にて70℃、3分浸漬後、湯洗(70℃、3分)し、以下の基準で目視評価した。
○:硬化塗膜に膨れ、剥がれ、変色なし、
△:硬化塗膜に若干、膨れ、剥がれ、変色がある、
×:硬化塗膜に膨れ、剥がれ、変色がある。
Performance Evaluation Method (1) Warpage Property A thermosetting composition was applied to a polyimide film (Kapton 100H; manufactured by Toray DuPont Co., Ltd., thickness 25 μm), and after thermosetting, cut to 50 mmφ with a circle cutter. What is cut into a circle exhibits a deformation in which the vicinity of the center warps in a convex or concave shape. After 1 hour, it was allowed to stand in a convex state, and the maximum and minimum values of the height of warpage from the horizontal plane were measured and averaged. The sign represents the direction of warping, and when left in a downwardly convex state, the case where the cured film is on the upper side with respect to the polyimide film is “+”, and the case where the cured film is on the lower side is “−”.
(2) Flexibility On a polyimide film (Kapton 100H; manufactured by Toray DuPont Co., Ltd., thickness: 25 μm), a sample which has been subjected to thermosetting is cut into 15 × 70 mm and 180 degrees so that the resist surface is on the outside. A force of 0.35 kN was applied to the bent part and the bent part for 1 second. Observed with a microscope, the number of times until cracks occurred was measured as flexibility. Evaluation was made up to 10 times.
(3) Solder heat resistance A portion of the rigid copper substrate was masked with a Kapton polyimide tape (manufactured by Toray DuPont Co., Ltd.), and the mask surface and non-mask surface were entirely coated to obtain a cured coating film. Next, the Kapton polyimide tape was peeled off, rosin-based flux was applied, and immersed in a solder bath at 260 ° C. for 10 seconds. The interface between the resist film and the tape peeling portion was visually observed, and the number of immersions until a change such as film peeling appeared was evaluated. Evaluation was performed up to three times.
(4) Adhesiveness Using a coating film cured on a copper substrate and a polyimide film (Kapton 300H; manufactured by Toray DuPont Co., Ltd., thickness: 100 μm), evaluation was performed based on JIS K5600. In addition, the tape for peeling used the product made from Nitto, and evaluated on the following reference | standard.
○: When the number of grids remains completely,
△: When the number of grids remains from 50 to less than 100,
×: When the number of grids remains less than 50.
(5) Pressure cooker test (PCT: wet heat resistance test)
A cured coating film was obtained on a flexible copper substrate (Ubecel N SE3150, manufactured by Ube Industries, Ltd.), and allowed to stand in a constant temperature and humidity chamber at 121 ° C. and a relative humidity of 100% RH for 120 hours, and then evaluated according to the following criteria.
○: Swelling, peeling, no discoloration on the cured coating film,
Δ: Slightly swollen, peeled, or discolored in the cured coating film,
X: The cured coating film swells, peels off and discolors.
(6) Tin plating resistance A cured coating film was obtained on a flexible copper substrate (Upicel N SE3150, manufactured by Ube Industries, Ltd.), and was plated with a tin plating solution (TINPOSIT LT-34, manufactured by Rohm & Haas). After immersion at 70 ° C. for 3 minutes, it was washed with hot water (70 ° C., 3 minutes) and visually evaluated according to the following criteria.
○: Swelling, peeling, no discoloration on the cured coating film,
Δ: Slightly swollen, peeled, or discolored in the cured coating film,
X: The cured coating film swells, peels off and discolors.
以上のように、本発明によるウレタン結合を有するポリウレタン(A)及び熱硬化性成分(B)を含む熱硬化性樹脂組成物は、基材との密着性、低反り性、可とう性、耐錫めっき性、耐湿熱性、はんだ耐熱性に優れており、ソルダーレジストや層間絶縁膜等の電気絶縁材料、ICや超LSI封止材料、積層板等の分野へ好適に利用できる。
As described above, the thermosetting resin composition containing the polyurethane (A) having a urethane bond and the thermosetting component (B) according to the present invention has adhesiveness to a substrate, low warpage, flexibility, resistance to resistance. It has excellent tin plating properties, heat and humidity resistance, and solder heat resistance, and can be suitably used in fields such as electrical insulating materials such as solder resists and interlayer insulating films, IC and VLSI sealing materials, and laminates.
Claims (9)
前記ポリカーボネートジオール(a)が、構成単位として、直鎖状脂肪族ジオールと脂環式ジオールに由来の繰り返し単位を含むポリカーボネートジオールであり、
前記熱硬化性成分(B)が前記ポリウレタン(A)と反応するエポキシ樹脂であり、
前記ポリウレタン(A)成分のカルボキシル基に対する前記熱硬化性成分(B)のエポキシ基の当量比が1.0〜3.0であることを特徴とするソルダーレジスト。 Polyurethane (A) having two or more carboxyl groups in one molecule and having a urethane bond formed by reaction of polycarbonate diol (a) and polyisocyanate (b), and thermosetting component (B) A solder resist formed by curing a thermosetting resin composition containing
The polycarbonate diol (a) is a polycarbonate diol containing a repeating unit derived from a linear aliphatic diol and an alicyclic diol as a structural unit,
Ri epoxy resin der the thermosetting component (B) is reacted with the polyurethane (A),
The solder resist , wherein an equivalent ratio of the epoxy group of the thermosetting component (B) to the carboxyl group of the polyurethane (A) component is 1.0 to 3.0 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005271682A JP5190976B2 (en) | 2004-09-21 | 2005-09-20 | Thermosetting resin composition using urethane resin |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004273553 | 2004-09-21 | ||
JP2004273553 | 2004-09-21 | ||
JP2005271682A JP5190976B2 (en) | 2004-09-21 | 2005-09-20 | Thermosetting resin composition using urethane resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006117922A JP2006117922A (en) | 2006-05-11 |
JP5190976B2 true JP5190976B2 (en) | 2013-04-24 |
Family
ID=36536093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005271682A Expired - Fee Related JP5190976B2 (en) | 2004-09-21 | 2005-09-20 | Thermosetting resin composition using urethane resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5190976B2 (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE528577C2 (en) * | 2005-03-23 | 2006-12-19 | Perstorp Specialty Chem Ab | Waterborne polyurethane dispersion and its use |
TWI443120B (en) | 2005-12-15 | 2014-07-01 | Dainippon Ink & Chemicals | Thermosetting resin composition |
CN101400716B (en) * | 2006-03-16 | 2012-06-06 | 昭和电工株式会社 | Heat curable resin composition, overcoating agent for flexible circuit board, and surface protective film |
JP2008045032A (en) * | 2006-08-16 | 2008-02-28 | Showa Denko Kk | Thermosetting resin composition, overcoating agent and protective film |
JP4709188B2 (en) | 2007-07-10 | 2011-06-22 | 太陽ホールディングス株式会社 | Urethane resin, thermosetting resin composition containing the same, and cured product thereof |
WO2009011304A1 (en) | 2007-07-18 | 2009-01-22 | Showa Denko K. K. | Heat curable resin compositon |
JP5043577B2 (en) * | 2007-09-27 | 2012-10-10 | 太陽ホールディングス株式会社 | Thermosetting resin composition and cured product thereof |
US8669306B2 (en) | 2008-12-26 | 2014-03-11 | Showa Denko K.K. | Curable composition |
KR101399173B1 (en) | 2009-10-07 | 2014-05-27 | 히타치가세이가부시끼가이샤 | Thermosetting resin composition, method for forming protective film for flexible wiring board, and flexible wiring board |
US20120305295A1 (en) * | 2010-02-03 | 2012-12-06 | Showa Denko K.K. | Thermosetting composition |
JP5398754B2 (en) * | 2011-02-04 | 2014-01-29 | 太陽ホールディングス株式会社 | Urethane resin, thermosetting resin composition containing the same, and cured product thereof |
JP6026095B2 (en) | 2011-10-31 | 2016-11-16 | 太陽インキ製造株式会社 | Thermosetting resin composition, cured product thereof, and printed wiring board using the same |
KR101613787B1 (en) | 2013-06-18 | 2016-04-19 | 주식회사 엘지화학 | Thermosetting Resin Composition and Method for Preparing the Same |
JP2013199656A (en) * | 2013-06-28 | 2013-10-03 | Taiyo Holdings Co Ltd | Thermosetting resin composition and cured product |
KR102018009B1 (en) | 2015-11-09 | 2019-09-03 | 쇼와 덴코 가부시키가이샤 | Curable Compositions and Uses thereof |
CN109071954B (en) | 2016-04-22 | 2021-11-02 | 日保丽公司 | Curable composition, cured film using same, and overcoat film |
KR102112436B1 (en) | 2016-04-22 | 2020-05-18 | 쇼와 덴코 가부시키가이샤 | Curable composition, cured film and overcoat film using the composition |
WO2017188155A1 (en) | 2016-04-25 | 2017-11-02 | 株式会社カネカ | Thermosetting resin composition, cured film and method for producing same, and flexible printed board with cured film and method for producing same |
JP7290127B2 (en) * | 2020-02-28 | 2023-06-13 | イチカワ株式会社 | Shoe press belt and method for manufacturing the shoe press belt |
WO2022019095A1 (en) * | 2020-07-22 | 2022-01-27 | 株式会社有沢製作所 | Thermosetting resin composition, coverlay film, adhesive sheet, and flexible printed circuit board |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10279652A (en) * | 1997-04-01 | 1998-10-20 | Toyobo Co Ltd | Curable resin composition |
JP4623890B2 (en) * | 2000-09-11 | 2011-02-02 | 昭和電工株式会社 | Photosensitive composition, cured product thereof and printed wiring board using the same |
JP2004016325A (en) * | 2002-06-13 | 2004-01-22 | Sanyo Chem Ind Ltd | Back coating material for hook-and-loop fastener, and hook-and-loop fastener |
JP2004019016A (en) * | 2002-06-13 | 2004-01-22 | Sanyo Chem Ind Ltd | Finishing agent for fiber and resin-finished fibrous base material |
JP2004062057A (en) * | 2002-07-31 | 2004-02-26 | Showa Denko Kk | Photosensitive thermosetting resin composition and its hardened product |
JP4587865B2 (en) * | 2004-04-22 | 2010-11-24 | 昭和電工株式会社 | Photosensitive resin composition, cured product thereof, and method for producing printed wiring board using them |
-
2005
- 2005-09-20 JP JP2005271682A patent/JP5190976B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2006117922A (en) | 2006-05-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5190976B2 (en) | Thermosetting resin composition using urethane resin | |
TWI389975B (en) | Thermosetting ethylcarbamate resin composition | |
JP5237790B2 (en) | Surface protection film of flexible circuit board | |
EP1937776B1 (en) | Heat-curable carboxylated polyurethane resin composition including silicone powder | |
JP4709188B2 (en) | Urethane resin, thermosetting resin composition containing the same, and cured product thereof | |
US20090065244A1 (en) | Thermosetting resin compositions and uses thereof | |
JP5043577B2 (en) | Thermosetting resin composition and cured product thereof | |
JP5167113B2 (en) | Thermosetting resin composition containing low chlorine polyfunctional aliphatic glycidyl ether compound, cured product of the composition and use thereof | |
JP4716416B2 (en) | Thermosetting resin composition using terminal carboxyurethane resin | |
JP5164090B2 (en) | Thermosetting resin composition containing carboxylic group-containing urethane resin and cured product thereof | |
JP5355918B2 (en) | Thermosetting resin composition, cured product thereof and printed wiring board using the same | |
JP5398754B2 (en) | Urethane resin, thermosetting resin composition containing the same, and cured product thereof | |
JP5308698B2 (en) | Thermosetting resin composition containing urethane oligomer and cured product thereof | |
JP5701949B2 (en) | Thermosetting resin composition, cured product thereof and printed wiring board using the same | |
JP2013199656A (en) | Thermosetting resin composition and cured product |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20070705 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080604 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101209 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101214 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110204 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20110204 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110624 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110804 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120210 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120405 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130125 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130125 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5190976 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160208 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |