JP5185503B2 - 光電変換材料、半導体電極並びにそれを用いた光電変換素子 - Google Patents
光電変換材料、半導体電極並びにそれを用いた光電変換素子 Download PDFInfo
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- JP5185503B2 JP5185503B2 JP2006030896A JP2006030896A JP5185503B2 JP 5185503 B2 JP5185503 B2 JP 5185503B2 JP 2006030896 A JP2006030896 A JP 2006030896A JP 2006030896 A JP2006030896 A JP 2006030896A JP 5185503 B2 JP5185503 B2 JP 5185503B2
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- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 150000004961 triphenylmethanes Chemical class 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
Landscapes
- Hybrid Cells (AREA)
- Photovoltaic Devices (AREA)
Description
1,2−ビス(4−ブロムフェニルチオ)エタンの合成
4−ブロモチオフェノール19gをエタノール230mlに溶解し、ナトリウムメトキシド6.0gを加えて10分間攪拌した。さらに、1,2−ジブロモエタン9.3gを加えて室温で30分間攪拌し、次いでオイルバスを用いて4時間加熱還流した。反応液を室温に戻した後、析出した結晶を濾取した。粗生成物を50℃の温水400mlに分散、洗浄した後、濾過を行って生成物を集め、ロート上で水200mlで洗浄、40℃にて減圧乾燥して、1,2−ビス(4−ブロムフェニルチオ)エタンを無色粉末として17.2g得た。
例示化合物Fの合成
1,2−ビス(4−ブロムフェニルチオ)エタン7.5g、例示化合物G 6.5g、酢酸パラジウム0.1g、t−ブトキシカリウム5.1gをキシレン120mlに溶解した。反応系を窒素置換した後、トリス(t−ブチル)ホスフィン0.4gを加え、窒素気流中で120℃に加熱しながら7時間攪拌した。反応液を室温に冷却した後、不溶物を濾別し、濾液からキシレンを減圧留去した。残留物をトルエン/n−ヘキサン=4/1混合溶液100mlで洗浄、濾過して、例示化合部Fを8.7g固体として得た。
例示化合物Hの合成
例示化合物F 5.6gをDMF25mlに溶解し、オキシ塩化リン9.2gを加えて室温で7時間攪拌した。反応液を氷水300g中にあけて、炭酸ナトリウム20gを加えて中和した。デカンテーションして水層を捨て、残留した油状物をクロロホルム200mlに溶解、抽出した。クロロホルム溶液を飽和炭酸水素ナトリウム水溶液200ml、次いで飽和食塩水200mlで洗浄後、無水硫酸マグネシウムで乾燥し、クロロホルムを減圧留去して粗生成物8.0gを固体として得た。これをクロロホルムを展開溶剤としてシリカゲルカラムクロマトグラフィーで精製して、例示化合部Hを固体として5.2g得た。
例示化合物(B−19)の合成
例示化合部H 1.5g、シアノ酢酸1.1g、ピペリジン0.5gをアセトニトリル200mlに溶解し、95℃に加熱しながら70時間加熱還流した。反応液を室温に冷却した後、上澄み液をデカンテーションして捨て、残留するガム状固体をクロロホルム/メタノール=10/1を展開溶剤としたシリカゲルカラムクロマトグラフィーで精製して、例示化合物B−19のピペリジン塩を黄色固体として1.2g得た。これをクロロホルム300mlとDMF20mlの混合溶液に溶解して0.1N塩酸50ml、次いで水100mlで3回洗浄し、無水硫酸マグネシウムで乾燥後、溶媒を減圧留去して例示化合物B−19を黄色の固体として0.9g得た。
例示化合物Jの合成
4,4´−ジブロモビフェニル6.6g、例示化合物G 6.7g、酢酸パラジウム0.1g、t−ブトキシカリウム9.4gをキシレン150mlに溶解した。反応系を窒素置換した後、トリス(t−ブチル)ホスフィン0.4gを加え、窒素気流中で120℃に加熱しながら6時間攪拌した。反応液を室温に冷却した後、クロロホルム200mlを加えて水100mlで5回洗浄した。このクロロホルム溶液に無水硫酸マグネシウムを加えて乾燥した後、ロータリエバポレーターを用いて溶剤を減圧留去して粗生成物を得た。これをトルエン/n−ヘキサン=1/2混合溶液を展開溶剤としてシリカゲルカラムクロマトグラフィーで精製して、例示化合物Jを4.3g固体として得た。
例示化合物Kの合成
例示化合物J 4.3gをDMF100mlに溶解し、オキシ塩化リン5.0gを加えて室温で3時間、次いで75℃に加熱しながら3時間攪拌した。反応液を氷水300g中にあけて、炭酸ナトリウム20gを加えて中和した。生成物をクロロホルム60mlで5回抽出し、次いで水50mlで5回洗浄し、無水硫酸マグネシウムで乾燥した。このクロロホルム溶液からロータリエバポレーターを用いて溶剤を減圧留去して粗生成物を得た。粗生成物をクロロホルム/トルエン=3/1混合溶液を展開溶剤としてシリカゲルカラムクロマトグラフィーで精製して、例示化合物Kを2.4g固体として得た。
例示化合物A−4の合成
例示化合物K 0.5g、4−オキソ−2−チオキソ−3−チアゾリジニル酢酸0.5g、酢酸アンモニウム0.1gを酢酸50mlに溶解し、120℃で7時間加熱還流した。反応液を室温に冷却した後、生じた沈殿を濾取し、ジエチルエーテル60mlで洗浄、風乾して粗生成物0.88gを得た。これをクロロホルム/メタノール=10/1混合溶液を展開溶剤としてシリカゲルカラムクロマトグラフィーで精製して、例示化合物A−4を0.3g赤色の固体として得た。
酸化チタン(日本アエロジル社製P−25)2g、アセチルアセトン0.2g、界面活性剤(アルドリッチ社製Triton X−100)0.3gを水6.5gと共にペイントコンディショナー(レッドデビル社製)で6時間分散処理を施した。更に、この分散液4.0gに対して濃硝酸0.2ml、エタノール0.4ml、ポリエチレングリコール(#20,000)1.2gを加えてペーストを作製した。このペーストをFTOガラス基板上に膜厚12μmになるように塗布し、室温で乾燥後、100℃で1時間、更に550℃で1時間焼成した。
例示化合物(A−4)を、表1に示す例示化合物に変更した以外は実施例1と同様にして素子を作製し評価した。その結果を表1に示す。更に、例示化合物(A−4)を、表3に示す例示化合物に変更した以外は実施例1と同様にして半導体電極に対する色素の吸着安定性を評価した。その結果を表3に示す。
例示化合物(B−4)で示した色素をt−ブタノール/アセトニトリル(1/1)の混合溶液に溶解し、0.3mMの濃度の色素溶液を作製した。この色素溶液に、ステロイド化合物(E−1)を0.6mMの濃度で溶解した。次いで、この色素溶液に、実施例1で作製した半導体電極を室温で15時間浸漬して吸着処理を施した。電解液はヨウ化リチウム0.1M、ヨウ素0.05M、ヨウ化1,2−ジメチル−3−n−プロピルイミダゾリウム0.5Mの3−メトキシプロピオニトリル溶液、対極にはチタニウム板上に白金をスパッタリングしたものを使用した。
例示化合物(B−4)を、表2に示す例示化合物に変更し、ステロイド化合物(E−1)を表2に示す例示化合物に変更した以外は実施例14と同様にして素子を作製し評価した。その結果を表2に示す。
例示化合物(A−4)を、(R−1)に示す化合物に変更した以外は実施例1と同様にして素子を作製し、評価した。その結果、開放電圧0.50V、短絡電流密度4.2mA/cm2、形状因子0.55、変換効率1.16%と本発明の色素に比較して低い値であった。更に、例示化合物(A−4)を、(R−1)に示す化合物に変更した以外は実施例1と同様にして、色素の半導体電極に対する吸着安定性を評価した。その結果を表3に示す。
例示化合物(A−4)を、(R−2)に示す化合物に変更した以外は実施例1と同様にして素子を作製し、評価した。その結果、開放電圧0.45V、短絡電流密度4.5mA/cm2、形状因子0.49、変換効率0.99%と本発明の色素に比較して低い値であった。更に、例示化合物(A−4)を、(R−2)に示す化合物に変更した以外は実施例1と同様にして、色素の半導体電極に対する吸着安定性を評価した。その結果を表3に示す。
例示化合物(A−4)を、(R−3)に示す化合物に変更した以外は実施例1と同様にして素子を作製し、評価した。その結果、開放電圧0.43V、短絡電流密度4.1mA/cm2、形状因子0.50、変換効率0.91%と本発明の色素に比較して低い値であった。更に、例示化合物(A−4)を、(R−3)に示す化合物に変更した以外は実施例1と同様にして、色素の半導体電極に対する吸着安定性を評価した。その結果を表3に示す。
例示化合物(A−4)を、(R−4)に示す化合物に変更した以外は実施例1と同様にして素子を作製し、評価した。その結果、開放電圧0.59V、短絡電流密度3.8mA/cm2、形状因子0.57、変換効率1.27%と本発明の色素に比較して低い値であった。更に、例示化合物(A−4)を、(R−4)に示す化合物に変更した以外は実施例1と同様にして、色素の半導体電極に対する吸着安定性を評価した。その結果を表3に示す。
例示色素(A−19)で示した色素をt−ブタノール/アセトニトリル(1/1)の混合溶液に溶解し、0.3mMの濃度の色素溶液を作製した。この色素溶液に、実施例1と同様にして作製した半導体電極を室温で15時間浸漬して吸着処理を施し、作用電極を作製した。対極にはチタニウム板上に白金をスパッタリングしたものを使用した。両電極を互いに向かい合うように配置し、それらの間に電解液を注入して光電変換素子を作製した。電解液はヨウ化リチウム0.1M、ヨウ素0.05M、ヨウ化1,2−ジメチル−3−n−プロピルイミダゾリウム0.5Mの3−メトキシプロピオニトリル溶液を使用した。
例示化合物(A−19)を、表4に示す例示化合物に変更した以外は実施例26と同様にして素子を作製し評価した。その結果を表4に示す。更に、例示化合物(A−19)を、表5に示す例示化合物に変更した以外は実施例26と同様にして半導体電極に対する色素の吸着安定性を評価した。その結果を表5に示す。
例示化合物(B−19)で示した色素をt−ブタノール/アセトニトリル(1/1)の混合溶液に溶解し、0.3mMの濃度の色素溶液を作製した。次いで、この色素溶液に、実施例1で作製した半導体電極を室温で15時間浸漬して吸着処理を施した。電解液はヨウ化リチウム0.1M、ヨウ素0.05M、ヨウ化1,2−ジメチル−3−n−プロピルイミダゾリウム0.5M、4−t−ブチルピリジン0.05Mの3−メトキシプロピオニトリル溶液、対極にはチタニウム板上に白金をスパッタリングしたものを使用した。
例示化合物(B−19)を、表7に示す例示化合物に変更した以外は実施例36と同様にして素子を作製し評価した。その結果と実施例31〜34の結果をまとめて表7に示す。
例示化合物(A−25)で示した色素をDMFに溶解し、0.3mMの濃度の色素溶液を作製した。この色素溶液に、ステロイド化合物(E−1)を0.6mMの濃度で溶解した。次いで、この色素溶液に、実施例1で作製した半導体電極を室温で15時間浸漬して吸着処理を施した。電解液はヨウ化リチウム0.1M、ヨウ素0.05M、ヨウ化1,2−ジメチル−3−n−プロピルイミダゾリウム0.5M、4−t−ブチルピリジン0.05Mの3−メトキシプロピオニトリル溶液、対極にはチタニウム板上に白金をスパッタリングしたものを使用した。
例示化合物(A−25)を、表8に示す例示化合物に変更した以外は実施例41と同様にして素子を作製し評価した。その結果を表8に示す。更に、例示化合物(A−25)を表8に示す例示化合物に変更した以外は実施例41と同様にして半導体電極に対する色素の吸着安定性を評価した。その結果を表9に示す。
例示化合物(A−25)を、(R−5)に示す化合物に変更した以外は実施例41と同様にして色素吸着半導体電極を作製して吸着安定性を評価した。その結果を表9に併せて示す。
例示化合物(C−4)で示した色素をt−ブタノール/アセトニトリル(1/1)の混合溶液に溶解し、0.3mMの濃度の色素溶液を作製した。この色素溶液に、実施例1と同様にして作製した半導体電極を室温で15時間浸漬して吸着処理を施し、作用電極を作製した。対極にはチタニウム板上に白金をスパッタリングしたものを使用した。両電極を互いに向かい合うように配置し、それらの間に電解液を注入して光電変換素子を作製した。電解液はヨウ化リチウム0.1M、ヨウ素0.05M、ヨウ化1,2−ジメチル−3−n−プロピルイミダゾリウム0.5Mの3−メトキシプロピオニトリル溶液を使用した。
例示化合物(C−4)を、表10に示す例示化合物に変更した以外は実施例44と同様にして素子を作製し評価した。その結果を表10に示す。更に、例示化合物(C−4)を、表11に示す例示化合物に変更した以外は実施例44と同様にして半導体電極に対する色素の吸着安定性を評価した。その結果を表11に示す。
Claims (4)
- 一般式[I]〜一般式[IV]で示される化合物のうち少なくとも一種を用いることを特徴とする光電変換材料。
- 表面に導電性を有する基板と、その導電性表面上に被覆された半導体層と、その半導体層の表面に吸着した色素からなる半導体電極において、色素として請求項1記載の一般式[I]〜[IV]で示される化合物を少なくとも一種以上用いることを特徴とする半導体電極。
- 前記半導体が、チタン、スズ、亜鉛、鉄、銅、タングステン、ジルコニウム、ハフニウム、ストロンチウム、インジウム、セリウム、イットリウム、ランタン、バナジウム、ニオブ、タンタル、カドミウム、鉛、銀、アンチモン、ビスマス、モリブデン、アルミニウム、ガリウム、クロム、コバルト、ニッケルから選ばれる金属カルコゲニドを少なくとも1種含むことを特徴とする請求項2記載の半導体電極。
- 請求項2または請求項3記載の半導体電極を用いることを特徴とする光電変換素子。
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JP4610160B2 (ja) * | 2002-12-19 | 2011-01-12 | 三菱製紙株式会社 | 光電変換材料、半導体電極、並びにそれを用いた光電変換素子 |
JP4610158B2 (ja) * | 2002-10-15 | 2011-01-12 | 三菱製紙株式会社 | 光電変換素子 |
JP2004319120A (ja) * | 2003-04-11 | 2004-11-11 | Mitsubishi Paper Mills Ltd | 半導体電極の作製方法、並びにそれを用いた光電変換素子 |
JP4326272B2 (ja) * | 2003-06-26 | 2009-09-02 | 三菱製紙株式会社 | 色素増感型太陽電池用色素 |
JP2005026114A (ja) * | 2003-07-03 | 2005-01-27 | Mitsubishi Paper Mills Ltd | 半導体電極並びにそれを用いた光電変換素子 |
JP2005026116A (ja) * | 2003-07-03 | 2005-01-27 | Mitsubishi Paper Mills Ltd | 半導体電極並びにそれを用いた光電変換素子 |
JP2005026115A (ja) * | 2003-07-03 | 2005-01-27 | Mitsubishi Paper Mills Ltd | 半導体電極並びにそれを用いた光電変換素子 |
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