JP5183042B2 - 粉末厚膜胞子及びその製造方法 - Google Patents
粉末厚膜胞子及びその製造方法 Download PDFInfo
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- JP5183042B2 JP5183042B2 JP2006212854A JP2006212854A JP5183042B2 JP 5183042 B2 JP5183042 B2 JP 5183042B2 JP 2006212854 A JP2006212854 A JP 2006212854A JP 2006212854 A JP2006212854 A JP 2006212854A JP 5183042 B2 JP5183042 B2 JP 5183042B2
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Description
(1)菌糸体を培養して厚膜胞子を多量に含む厚膜胞子入り培養液とする。
(2)厚膜胞子入り培養液内の厚膜胞子と、菌糸とを分離する。
(3)前記処理を経た培養液を、厚膜胞子と培養上澄み液とに分離する。
(4)厚膜胞子に保護剤を添加した後、急速凍結処理する。
(5)急速凍結処理した凍結厚膜胞子を減圧乾燥する。
(6)乾燥した厚膜胞子を粉砕して粉末厚膜胞子とする。
グルコース 6.25 g
麦芽エキス 6.25 g
KH2PO4 1.25 g
酵母エキス 1.0 g
MgSO4・7H2O 0.625 g
ペプトン 0.625 g
蒸留水 1000 ml
前記のように栄養分を除去した菌糸体を下記飢餓培地に接種し、振盪培養機(26℃、100rpm)で170〜200時間好気的に培養した。
ショ糖 20 g
KNO3 1.0 g
KH2PO4 1.0 g
MgSO4・7H2O 0.5 g
CaCl2 0.1 g
ZnSO4 2.0 mg
CuCl2 0.1 mg
FeSO4 0.2 mg
Na2MoO4・2H2O 0.2 mg
H3BO3 0.01 mg
蒸留水 1000ml
前記培養液を30分間ホモジナイズし、厚膜胞子と菌糸を分離し次いでこの培養液を遠心分離機(直径32cm、回転数は3000rpm)を用い、1500×gの重力加速度で5分間かけて、胞子と液分を分離し、厚膜胞子を取り出す。
グルコース 3.3%
ポリペプトン 0.3%
mgSo4 0.05%
CaCl2 0.05%
pH 無調整
シード量 0.7%
(2)条件
温度 28℃
撹拌 200rpm
通気量 0.3vvm
前記培地で液体通気(撹拌)状態で3日間通気培養し、3日経過後1リットルサンプリングして、容量500mlの三角フラスコに100ml添加し、下記条件で7日間培養(全部で10日間培養)し、前記ジャーで継続培養したものと比較した所、表8の結果を得た。
(イ)胞子化の温度条件は、培養温度(28℃)が最適と思われる。
(ロ)最近の胞子形成と異なり、カルシウムの添加効果はない。
(ハ)厚膜胞子の形成は、菌体の自己消化酵素との関係が推定され、アルカリ側で若干の増加傾向が見られた。
(ニ)培養液のpHを5に調整した区で極端に胞子化が悪く、自己消化酵素との関係を裏付けられている。
(ホ)ジャー培養の胞子数5×107 CFU/mlで再現性あがり、糖切れ後のpH調整で胞子率は促進される。
Claims (1)
- トリコデルマ ハルジアナム SK−55(受託番号FERM BP−4346)の菌糸体に、下記各工程を順次加えることを特徴とした粉末厚膜胞子の製造方法。
(1)菌糸体をグルコース、酵母エキス及びポリペプトンを含む培養培地に接種して培養して厚膜胞子を多量に含む厚膜胞子入り培養液とする。
(2)厚膜胞子入り培養液内の厚膜胞子と、菌糸とをホモジナイズ処理により分離する。
(3)前記処理を経た培養液を、厚膜胞子と培養上澄み液とに分離する。
(4)厚膜胞子にグルコース、スクロース又はフルクトースなどの単糖類よりなる菌数保護剤を15%〜25%添加した後、−30℃〜−80℃の冷凍庫で60〜180秒以内に共晶点以下に急速凍結処理する。
(5)前記急速凍結処理した凍結厚膜胞子を0〜10Paの減圧下で、0〜25℃の温度下で、24〜48時間かけ、水分10%以下に減圧乾燥する。
(6)乾燥した厚膜胞子を粉砕して粉末厚膜胞子とする。
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JP5183042B2 true JP5183042B2 (ja) | 2013-04-17 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US8705010B2 (en) | 2007-07-13 | 2014-04-22 | Mapper Lithography Ip B.V. | Lithography system, method of clamping and wafer table |
USRE49488E1 (en) | 2007-07-13 | 2023-04-11 | Asml Netherlands B.V. | Lithography system, method of clamping and wafer table |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP3046167B2 (ja) * | 1992-12-25 | 2000-05-29 | 株式会社北海道グリーン興産 | 植物病害防除菌、これを用いた防除剤及び防除剤の製造方法並びに使用方法 |
JPH11279015A (ja) * | 1998-03-27 | 1999-10-12 | Shinkinrui Kino Kaihatsu Kenkyusho:Kk | 植物生長促進剤 |
JP4280839B2 (ja) * | 1998-03-31 | 2009-06-17 | 株式会社応微研 | 厚膜胞子及びその製造方法 |
JP4266046B2 (ja) * | 1998-09-25 | 2009-05-20 | 株式会社応微研 | トリコデルマハルジアナムの厚膜胞子の製造方法 |
JP3809634B2 (ja) * | 2000-03-31 | 2006-08-16 | 康晴 佐々木 | 厚膜胞子及びその製造方法 |
JP2001299016A (ja) * | 2000-04-24 | 2001-10-30 | Hokkaido Green Kosan:Kk | 健全成育植物種子類およびその活性促進剤の施用方法 |
JP2003204719A (ja) * | 2001-11-06 | 2003-07-22 | Hokkaido Green Kosan:Kk | 植物の栽培方法およびその生産物 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US8705010B2 (en) | 2007-07-13 | 2014-04-22 | Mapper Lithography Ip B.V. | Lithography system, method of clamping and wafer table |
US9645511B2 (en) | 2007-07-13 | 2017-05-09 | Mapper Lithography Ip B.V. | Lithography system, method of clamping and wafer table |
US9665013B2 (en) | 2007-07-13 | 2017-05-30 | Mapper Lithography Ip B.V. | Lithography system, method of clamping and wafer table |
USRE49488E1 (en) | 2007-07-13 | 2023-04-11 | Asml Netherlands B.V. | Lithography system, method of clamping and wafer table |
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