JP5157131B2 - 加熱体及びそれを搭載した半導体製造装置 - Google Patents

加熱体及びそれを搭載した半導体製造装置 Download PDF

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Publication number
JP5157131B2
JP5157131B2 JP2006302555A JP2006302555A JP5157131B2 JP 5157131 B2 JP5157131 B2 JP 5157131B2 JP 2006302555 A JP2006302555 A JP 2006302555A JP 2006302555 A JP2006302555 A JP 2006302555A JP 5157131 B2 JP5157131 B2 JP 5157131B2
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heater
heat
wafer
heating body
heating
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JP2008118080A (ja
JP2008118080A5 (enExample
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益宏 夏原
知之 粟津
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Sumitomo Electric Industries Ltd
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Sumitomo Electric Industries Ltd
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  • Chemical Vapour Deposition (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Resistance Heating (AREA)
JP2006302555A 2006-11-08 2006-11-08 加熱体及びそれを搭載した半導体製造装置 Active JP5157131B2 (ja)

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JP2006302555A JP5157131B2 (ja) 2006-11-08 2006-11-08 加熱体及びそれを搭載した半導体製造装置

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JP2006302555A JP5157131B2 (ja) 2006-11-08 2006-11-08 加熱体及びそれを搭載した半導体製造装置

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JP2008118080A JP2008118080A (ja) 2008-05-22
JP2008118080A5 JP2008118080A5 (enExample) 2009-12-17
JP5157131B2 true JP5157131B2 (ja) 2013-03-06

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JP2006302555A Active JP5157131B2 (ja) 2006-11-08 2006-11-08 加熱体及びそれを搭載した半導体製造装置

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5447123B2 (ja) * 2009-05-28 2014-03-19 住友電気工業株式会社 ヒータユニット及びそれを備えた装置
JP5416570B2 (ja) * 2009-12-15 2014-02-12 住友電気工業株式会社 加熱冷却デバイスおよびそれを搭載した装置
CN104752301B (zh) * 2013-12-31 2018-05-25 北京北方华创微电子装备有限公司 一种静电卡盘以及腔室
NL2015429B1 (en) * 2015-09-11 2017-03-29 Walker Holdings B V Portable stove for solid fuels.
CN112114498A (zh) * 2020-09-12 2020-12-22 刘晟麟 一种匀胶显影均温加热装置
CN117286474B (zh) * 2022-12-28 2024-06-21 无锡至辰科技有限公司 一种高温金属外壳晶圆加热器及其加工方法
KR102760972B1 (ko) * 2023-02-09 2025-02-03 주식회사 알씨테크 반도체 공정에 이용되기 위한 케미컬 공급 장치

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025912A (ja) * 2000-07-04 2002-01-25 Sumitomo Electric Ind Ltd 半導体製造装置用サセプタとそれを用いた半導体製造装置

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