JP5148233B2 - Drawing apparatus and drawing method - Google Patents

Description

  The present invention relates to a drawing apparatus and a drawing method, and more particularly, to a drawing apparatus and method for transferring drawing data for drawing using an electron beam inside the apparatus.

  Lithography technology, which is responsible for the progress of miniaturization of semiconductor devices, is an extremely important process for generating a pattern among semiconductor manufacturing processes. In recent years, with the high integration of LSI, circuit line widths required for semiconductor devices have been reduced year by year. In order to form a desired circuit pattern on these semiconductor devices, a highly accurate original pattern (also referred to as a reticle or a mask) is required. Here, the electron beam (electron beam) drawing technique has an essentially excellent resolution, and is used for producing a high-precision original pattern.

FIG. 7 is a conceptual diagram for explaining the operation of a conventional variable shaping type electron beam drawing apparatus.
In a first aperture 410 in a variable shaping type electron beam drawing apparatus (EB (Electron beam) drawing apparatus), a rectangular, for example, rectangular opening 411 for forming the electron beam 330 is formed. Further, the second aperture 420 is formed with a variable shaping opening 421 for shaping the electron beam 330 having passed through the opening 411 of the first aperture 410 into a desired rectangular shape. The electron beam 330 irradiated from the charged particle source 430 and passed through the opening 411 of the first aperture 410 is deflected by the deflector, passes through a part of the variable shaping opening 421 of the second aperture 420, and passes through a predetermined range. The sample is irradiated on a stage that moves continuously in one direction (for example, the X direction). That is, the drawing area of the sample 340 mounted on the stage in which the rectangular shape that can pass through both the opening 411 of the first aperture 410 and the variable shaping opening 421 of the second aperture 420 is continuously moved in the X direction. Drawn on. A method of creating an arbitrary shape by passing both the opening 411 of the first aperture 410 and the variable shaping opening 421 of the second aperture 420 is referred to as a variable shaping method.

  In performing such electron beam drawing, a plurality of drawing data files that can be input to the electron beam drawing apparatus are input to a disk in the apparatus. Then, in the drawing apparatus, a plurality of data processing such as a format check of drawing data of each file is performed and transferred to the next disk in the apparatus. A plurality of data processing is performed by pipeline processing that executes a series of operations in parallel to improve efficiency. Further, in the drawing apparatus, after data conversion, the pattern defined in the data is drawn on the sample.

Here, although not an electron beam drawing apparatus, description of an external apparatus that is offline is disclosed. In the external device (drawing data creation device), a plurality of arithmetic units with different numbers of serially connected processors are provided in parallel when creating the drawing data. As a result, even design data with different loads can be converted into drawing data with a pipeline configuration (see, for example, Patent Document 1).
Japanese Patent Laid-Open No. 5-90141

  As described above, when a plurality of drawing data files are input to a disk in the apparatus, a series of pipelines that perform a plurality of data processing such as format checking of the data of each file and transfer it to the next disk in the apparatus Processing is performed. Here, in such pipeline processing, when there are many individual file input / output (I / O) processes from each data processing process, access to the disk storing each file is concentrated. . For example, when the data size of the drawing data is small, each data processing can be completed in a short time, so that file input / output (I / O) processing is performed one after another. Therefore, access to the disk is concentrated. Therefore, the performance of the disk deteriorates, in other words, the file I / O speed decreases.

FIG. 8 is a diagram illustrating an example of pipeline processing.
FIG. 8 shows an example in which data processing of files 1, 2, and 3 is performed as a series of pipelines for processing 1, 2 and file transfer. As described above, when access to the disk is concentrated, the performance of the disk deteriorates as indicated by the solid line, and the file I / O speed decreases. For this reason, a large delay occurs compared to the case indicated by the dotted line in which the performance of the disk is not deteriorated. Therefore, there has been a problem that the time until the completion of a series of pipeline processing is limited by the time required for file I / O, even though efficiency has been improved by pipeline processing. This makes it impossible to proceed with data processing efficiently.

  It is an object of the present invention to provide a drawing apparatus and method for overcoming such problems and performing highly efficient data processing.

The drawing device of one embodiment of the present invention includes:
A first storage device for storing a plurality of integrated data files in which a plurality of drawing data files are integrated;
A first data processing unit that sequentially reads a plurality of integrated data files from the first storage device and sequentially performs a first process on the drawing data of each drawing data file integrated into the read integrated data file When,
Separately from the first process, the plurality of integrated data files are sequentially read out from the first storage device, and the drawing data of each drawing data file integrated into the read integrated data file is read out with respect to the first data. A second data processing unit for performing second processing in order so that the processing and the pipeline processing are performed,
A transfer processing unit that reads and transfers the integrated data file for which data processing has been completed from the first storage device ;
A second storage device for storing the transferred integrated data file;
A drawing unit that draws a pattern defined in a plurality of drawing data files integrated as an integrated data file using a charged particle beam on a sample;
Equipped with a,
In the integrated data file, the plurality of drawing data files are integrated for each predetermined number of drawing unit areas.
A predetermined drawing unit area is used as a processing unit of the pipeline processing,
A development unit for developing the integrated data file read from the first storage device into the plurality of drawing data files;
The first and second processes are performed on the drawing data of each drawing data file developed as a file,
Each drawing data file is a data file for one corresponding frame region among a plurality of frame regions obtained by dividing the chip region .

  A plurality of data processing units and transfer processing units access the first storage device. At that time, the integrated data file is created externally in advance, and it is input and stored in the first storage device, thereby reducing the number of accesses compared to the case of reading a plurality of drawing data files. be able to. Therefore, access concentration to the first storage device can be suppressed.

  The integrated data file is preferably integrated with a plurality of drawing data files for each predetermined number of drawing unit areas.

  A predetermined drawing unit area is preferably used as a processing unit for pipeline processing.

  In addition, it is preferable to further include a development unit that develops the integrated data file into a plurality of drawing data files.

The drawing method of one embodiment of the present invention includes:
Since a plurality of integrated data files in which a plurality of drawing data files are integrated are stored, the plurality of integrated data files are read out, and the drawing data of each drawing data file integrated into the read integrated data file is sequentially added. A process of performing the process 1;
Separately from the first process, the plurality of integrated data files are sequentially read out from the first storage device, and the drawing data of each drawing data file integrated into the read integrated data file is read out with respect to the first data. A step of performing a second process in order so as to become a process of the above and a pipeline process;
A transfer processing step of reading and transferring the integrated data file from which data processing has been completed from the first storage device ;
A plurality of drawing data files integrated as an integrated data file are read from the second storage device that stores the transferred integrated data file, and a pattern defined in the plurality of drawing data files is used as a sample by using a charged particle beam. A drawing process for drawing;
Equipped with a,
In the integrated data file, the plurality of drawing data files are integrated for each predetermined number of drawing unit areas.
A predetermined drawing unit area is used as a processing unit of the pipeline processing,
A development unit for developing the integrated data file read from the first storage device into the plurality of drawing data files;
The first and second processes are performed on the drawing data of each drawing data file developed as a file,
Each drawing data file is a data file for one corresponding frame region among a plurality of frame regions obtained by dividing the chip region .

  According to the present invention, concentration of access to the storage device can be reduced. Therefore, it is possible to improve the efficiency of a series of pipeline processing.

  Hereinafter, in the embodiment, a configuration using an electron beam will be described as an example of a charged particle beam. However, the charged particle beam is not limited to an electron beam, and a beam using charged particles such as an ion beam may be used. As an example of the charged particle beam apparatus, a charged particle beam drawing apparatus, particularly, a variable shaping type electron beam drawing apparatus will be described.

FIG. 1 is a conceptual diagram illustrating a configuration of a drawing apparatus according to the first embodiment.
In FIG. 1, a drawing apparatus 100 is an example of an electron beam drawing apparatus. The drawing apparatus 100 includes a drawing unit 150 and a control unit 160. The drawing unit 150 includes a drawing chamber 103 and an electronic lens barrel 102 disposed on the upper portion of the drawing chamber 103. In the electron column 102, an electron gun 201, an illumination lens 202, a first aperture 203, a projection lens 204, a deflector 205, a second aperture 206, an objective lens 207, and a deflector 208 are provided. An XY stage 105 is arranged in the drawing chamber 103, and a sample 101 to be drawn is arranged on the XY stage 105. The control unit 160 includes a drawing control circuit 110, a control unit 120, and magnetic disk devices 140.142, 144. The magnetic disk devices 140.142 and 144 are examples of storage devices. The components of the control unit 160 are connected to each other via a bus (not shown). The control unit 120 includes a pipeline control unit 121, an input unit 122, a format inspection unit 124, a shot density calculation unit 126, a transfer unit 130, a file development unit 132, and a memory 134. The memory 134 is an example of a storage device. Here, the pipeline control unit 121, the input unit 122, the format inspection unit 124, the shot density calculation unit 126, the transfer unit 130, and the file development unit 132 are each processing functions executed by a computer such as a CPU that executes a program. You may comprise as. Alternatively, each configuration of the pipeline control unit 121, the input unit 122, the format inspection unit 124, the shot density calculation unit 126, the transfer unit 130, and the file development unit 132 may be configured by hardware using an electric circuit. Or you may make it implement by the combination of the hardware and software by an electrical circuit. Alternatively, a combination of such hardware and firmware may be used. Further, in the case of implementation by software or in combination with software, information input to a computer that executes processing or information during and after arithmetic processing is stored in the memory 134 each time. In FIG. 1, constituent parts necessary for explaining the first embodiment are described. Needless to say, the drawing apparatus 100 may normally include other necessary configurations.

  In performing electron beam drawing, first, a layout of a semiconductor integrated circuit is designed, and design data in which a pattern layout is defined is generated. Then, the design data is converted by an external conversion device, and a plurality of drawing data that can be input to the drawing device 100 is generated. Each drawing data file of drawing data for drawing a predetermined pattern on the sample 101 is integrated (stored) every predetermined number of drawing unit areas. For example, the data files for the first to tenth frames are integrated into one data file. Thereafter, similarly, integration is performed every 10 frames. Each integrated data file 30 is stored in an external magnetic disk device 300 that is an example of a storage device. Here, the files are integrated every 10 frames, but the present invention is not limited to this, and the number of frames may be more or less. It is sufficient that a plurality of drawing data files are integrated into one file. The file integration is preferably created in an archive format such as a ZIP file.

FIG. 2 is a diagram illustrating an example of a hierarchical structure of drawing data according to the first embodiment.
In the drawing data, the drawing area is a layer of the chip 10, a layer of the frame 14 virtually divided into strips in the y direction, for example, a layer of the block 16 that divided the frame 14, and at least one figure. It is hierarchized for each of a series of a plurality of internal structural units such as a layer of the configured cell 18 and a layer of a graphic 19 configuring the cell 18. In general, a plurality of layers of the chip 10 are laid out with respect to the drawing region of one sample 101. Here, the chip area of the frame 14 is divided into strips in the y direction (predetermined direction), but this is an example, and the chip area is divided in the x direction that is parallel to the drawing surface and orthogonal to the y direction. It is possible that Alternatively, other directions parallel to the drawing surface may be used.

FIG. 3 is a diagram illustrating an example of drawing data according to the first embodiment.
When a pattern is drawn by the drawing apparatus, for example, the frame 14 is drawn as a drawing unit area. In FIG. 3, as an example, the drawing data 12 located in the frame area identified by the number “n” in a certain chip 10 will be described. Then, cell arrangement data, link data, and cell pattern data are created as the drawing data 12 for the frame. In FIG. 3, a drawing data file in which drawing data 12 for one frame is defined includes a cell arrangement data file 22, a link data file 24, and a cell pattern data file 26 as an example. These files are created for each frame. The drawing data 12 further includes a chip configuration file 20 that defines configuration information of each frame, parameters common to the entire chip, and the like for a chip configured with one or more frames. Further, FIG. 3 shows an example of a correspondence relationship between each data in the cell arrangement data file 22, the link data file 24, and the cell pattern data file 26. When a desired pattern is drawn on a sample, the mask is composed of one or more chips 10 for one mask. In such a case, there are a plurality of chip data composed of these files, and has layout information for arranging them on the mask.

  The cell arrangement data file 22 includes arrangement data (arrangement information) for arranging the cells 18 corresponding to the pattern data of a certain chip 10 included in the design data. The cell arrangement data file 22 includes arrangement data for arranging any of the arranged cells 18 for each block area, for example. The cell arrangement data is indicated by coordinates indicating the arrangement position of the reference point of the cell 18. In FIG. 3, a cell arrangement data file 22 is followed by a block (0, 0) header, cell arrangement data (p), cell arrangement data (q), and cells arranged in the block (0, 0). Arranged data (r), block (0, 1) header, cell arrangement data (s) arranged in block (0, 1), block (1, 0) header, arranged in block (1, 0) The cell arrangement data (t) is defined (stored). Other arrangement data is further stored.

  Next, the cell pattern data file 26 includes each pattern data of a plurality of cells 18 arranged in the nth frame 14 of a certain chip 10. In FIG. 3, each pattern data of the cells (i) to (l) is shown as an example. Here, the cell pattern data file 26 includes, as part thereof, a pattern data segment (0), cell pattern data (i) indicating pattern data of the cell (i), and cell pattern indicating pattern data of the cell (j). Data (j) is stored once in order. Subsequently, cell pattern data (k) indicating the pattern data segment (1) and the pattern data of the cell (k) is stored. Further, other data is stored, and thereafter, pattern data segment (4) and cell pattern data (l) indicating the pattern data of cell (l) are stored.

  The link data file 24 includes link information for referring to each cell pattern data from each cell arrangement data and operation information to the cell pattern data. In FIG. 3, the link data file 24 includes, as a part thereof, relation data (a) for associating cell arrangement data (p) with cell pattern data (i), and cell arrangement data (q) as cell pattern data. Relation data (b) for relating to (j), Relation data (c) for relating cell arrangement data (r) to cell pattern data (i), and cell arrangement data (s) to cell pattern data (k) ) And relation data (e) for associating the cell arrangement data (t) with the cell pattern data (l) are stored together with other data.

  As described above, the drawing apparatus 100 inputs a plurality of drawing data files and transfers the plurality of drawing data files through a series of pipeline processes as will be described later.

FIG. 4 is a conceptual diagram for explaining pipeline processing in the first embodiment.
In FIG. 4, the control unit 120 executes a series of processes such as a data input process, a format check process, a shot density calculation process, and a file transfer process as a pipeline process.

  First, as a data input process, as shown in FIG. 4, the input unit 122 includes a first integrated data file 30 (frame 1-10) integrated from the first frame to the tenth frame, Each integrated data file is input in order of the second integrated data file 30 (frame 11-20),... Integrated from the 11th frame to the 20th frame. Each input integrated data file is stored in the magnetic disk device 140 (first storage device). The input unit 122 is controlled by the pipeline control unit 121. The input of the integrated data file may be a copy of each integrated data file in the magnetic disk device 300 or may be transferred from the magnetic disk device 300 using a file transfer protocol (FTP).

  Subsequently, as the format inspection process, the format inspection unit 124 reads the first integrated data file 30 from the magnetic disk device 140. Then, the format inspection unit 124 outputs the read integrated data file 30 to the file development unit 132. The file expansion unit 132 expands the integrated data file 30 into a plurality of original drawing data files. For example, here, the file is expanded from the first frame to the drawing data file for the tenth frame. Then, the format checking unit 124 inputs a plurality of developed drawing data files, and performs format checking on the drawing data of each drawing data file so as to perform pipeline processing as shown in FIG. Subsequently, the format checking unit 124 reads the second integrated data file 30 from the magnetic disk device 140. Similarly, after the expansion, the drawing data in the drawing data file for the eleventh frame to the twentieth frame after the expansion is subjected to pipeline processing as shown in FIG. Perform format checking. This is repeated sequentially. The format inspection unit 124 is controlled by the pipeline control unit 121. The result of the format check for each file is stored in the magnetic disk device 144. In the first embodiment, instead of individually reading a plurality of drawing data files from the magnetic disk device 140, an integrated data file integrated every predetermined number of frames is read. Therefore, the number of accesses to the magnetic disk device 140 can be reduced. Here, since 10 frames are read at a time, the number of accesses can be reduced to 1/10. Therefore, even when there are many drawing data files with a small data size, concentration of access to the magnetic disk device 140 can be avoided.

  Subsequently, as a shot density calculation step, the shot density calculation unit 126 reads the first integrated data file 30 from the magnetic disk device 140. Then, the shot density calculation unit 126 outputs the read integrated data file 30 to the file development unit 132. The file expansion unit 132 expands the integrated data file 30 into a plurality of original drawing data files. For example, here, as described above, the file is expanded from the first frame to the drawing data file for the tenth frame. Then, the shot density calculation unit 126 inputs a plurality of developed drawing data files, and performs shot density calculation for the drawing data of each drawing data file so as to perform pipeline processing as shown in FIG. Do. Subsequently, the shot density calculation unit 126 reads the second integrated data file 30 from the magnetic disk device 140. Similarly, after the expansion, the drawing data in the drawing data file for the eleventh frame to the twentieth frame after the expansion is subjected to pipeline processing as shown in FIG. Perform shot density calculation. This is repeated sequentially. The shot density calculation unit 126 is controlled by the pipeline control unit 121. The calculated shot density is stored in the magnetic disk device 144. In the first embodiment, a plurality of drawing data files are not individually read from the magnetic disk device 140 as described above, but an integrated data file integrated every predetermined number of frames is read. Therefore, the number of accesses to the magnetic disk device 140 can be reduced. Here, since 10 frames are read at a time, the number of accesses can be reduced to 1/10. Therefore, even when there are many drawing data files with a small data size, concentration of access to the magnetic disk device 140 can be avoided.

  Here, the format inspection unit 124 and the shot density calculation unit 126, which are an example of a plurality of data processing units, perform two processes, ie, a format inspection process and a shot density calculation process, as a plurality of data processes. It is not limited. Needless to say, three or more processes may be performed.

  As a file transfer processing step, the transfer unit 130 sequentially reads the integrated data file 30 for which a plurality of data processes have been completed from the magnetic disk device 140 and sequentially uses the FTP to the magnetic disk device 142 (second storage device). Forward. The transfer unit 130 is an example of a transfer processing unit. The sequentially transferred integrated data file is stored (stored) in the magnetic disk device 142.

  Conventionally, access processing to the magnetic disk device 140 is required for the number of drawing data files to be transferred, and reading is required at a deteriorated I / O speed each time. In the first embodiment, drawing data files are integrated. By doing so, it is possible to read the integrated part with one reading. Therefore, even when there are many drawing data files with a small data size, concentration of access to the magnetic disk device 140 can be avoided.

  As described above, the number of accesses to the magnetic disk device 140 can be reduced in each data processing and transfer processing. Therefore, even when there are many drawing data files with a small data size, concentration of access to the magnetic disk device 140 can be avoided. As a result, the efficiency of parallel processing performed by a series of pipeline processing can be improved.

FIG. 5 is a diagram illustrating an example for explaining comparison of I / O speeds in the first embodiment.
FIG. 5 shows an example in which three files are sequentially read from the magnetic disk device 140. If there is no concentration of access to the magnetic disk device 140, it takes 0.2 seconds, for example, to read each file. However, when concentration of access to the magnetic disk device 140 occurs, the performance of the magnetic disk device 140 deteriorates and it takes 0.3 seconds for reading each file, for example. Therefore, a total of at least 0.9 seconds is required to read out the three files. On the other hand, according to the first embodiment, since concentration of access to the magnetic disk device 140 can be avoided, an integrated data file obtained by integrating three files can be read out in 0.6 seconds, for example. Therefore, it is possible to read out in a shorter time than the time required for reading when access is concentrated.

  Here, since each file that has been transferred is an integrated data file, it is difficult to use it for the next data processing as it is. Therefore, as a file expansion process, the file expansion unit 132 reads the integrated data file from the magnetic disk device 142 and expands the file into a plurality of original drawing data files. Then, the plurality of drawing data files developed as files are stored (stored) in the magnetic disk device 142 again. This file expansion process may be performed separately from the pipeline process described above. Therefore, it does not affect the efficiency of the series of pipeline processes described above. Here, the file development unit 132 is arranged in the control unit 120, but the present invention is not limited to this. For example, it may be arranged in the drawing control circuit 110. Or you may comprise independently. Or you may arrange | position in the structure which is not illustrated in figure.

  When the drawing data file for each frame is stored in the magnetic disk device 142 as described above, the drawing control device 110 converts the drawing data defined in these files. Then, as a drawing process, the drawing unit 150 uses the electron beam 200 to draw a pattern defined in a plurality of drawing data files converted by the drawing control device 110 on the sample 101. Specifically, the drawing operation is performed as follows.

  The electron beam 200 emitted from the electron gun 201 illuminates the entire first aperture 203 having a rectangular shape, for example, a rectangular hole, by the illumination lens 202. Here, the electron beam 200 is first formed into a rectangle, for example, a rectangle. Then, the electron beam 200 of the first aperture image that has passed through the first aperture 203 is projected onto the second aperture 206 by the projection lens 204. The position of the first aperture image on the second aperture 206 is controlled by the deflector 205, and the beam shape and size can be changed. Then, the electron beam 200 of the second aperture image that has passed through the second aperture 206 is focused by the objective lens 207, deflected by the deflector 208, and the sample 101 on the XY stage 105 that is movably disposed. The desired position is irradiated.

  As described above, when the drawing device 100 inputs the data file after the file integration, concentration of access to the magnetic disk device 140 can be avoided even when there are many frame data having a small data size. Therefore, the rate limiting due to the I / O processing to the magnetic disk device 140 can be suppressed.

Embodiment 2. FIG.
In the first embodiment, the format inspection unit 124 or the shot density calculation unit 126 causes the file development unit 132 configured separately to develop the integrated data file. However, the present invention is not limited to this. In the second embodiment, a case where each is configured to be deployed inside will be described.

FIG. 6 is a conceptual diagram illustrating a configuration of a drawing apparatus according to the second embodiment.
6 is the same as FIG. 1 except that the format inspection unit 124 includes the expansion unit 135 and the inspection unit 136 and the shot density calculation unit 126 includes the expansion unit 137 and the calculation unit 138.

  In the format inspection process described in the first embodiment, the format inspection unit 124 reads the first integrated data file 30 from the magnetic disk device 140. Then, the read integrated data file 30 is expanded into a plurality of original drawing data files by the internal expansion unit 135. Then, as shown in FIG. 4, format inspection is performed on each drawing data of the plurality of drawing data files developed by the internal inspection unit 136 so as to be pipeline processing. This is sequentially repeated for the second integrated data file 30, the third integrated data file 30,. Other points are the same as in the first embodiment.

  Also in the shot density calculation process described in the first embodiment, first, the shot density calculation unit 126 reads the first integrated data file 30 from the magnetic disk device 140. Then, the read integrated data file 30 is expanded into a plurality of original drawing data files by the internal expansion unit 137. Then, as shown in FIG. 4, shot density calculation is performed for each drawing data of the plurality of drawing data files in which the internal calculation unit 138 is expanded so as to perform pipeline processing. This is sequentially repeated for the second integrated data file 30, the third integrated data file 30,. Other points are the same as in the first embodiment.

  As described above, the same effects as those of the first embodiment can be obtained even if the configuration is such that each data processing process is expanded.

  The embodiments have been described above with reference to specific examples. However, the present invention is not limited to these specific examples.

  In addition, although descriptions are omitted for parts and the like that are not directly required for the description of the present invention, such as a device configuration and a control method, a required device configuration and a control method can be appropriately selected and used. For example, the description of the control unit configuration for controlling the variable shaping type EB drawing apparatus 100 is omitted, but it is needless to say that the required control unit configuration is appropriately selected and used.

  In addition, all charged particle beam drawing apparatuses, charged particle beam drawing methods, charged particle beam drawing data creation methods, charged particle beam drawing data conversion methods, which include elements of the present invention and can be appropriately modified by those skilled in the art, And their devices are within the scope of the present invention.

1 is a conceptual diagram illustrating a configuration of a drawing apparatus according to Embodiment 1. FIG. 6 is a diagram illustrating an example of a hierarchical structure of drawing data according to Embodiment 1. FIG. 6 is a diagram illustrating an example of drawing data according to Embodiment 1. FIG. FIG. 3 is a conceptual diagram for explaining pipeline processing in the first embodiment. 6 is a diagram illustrating an example for explaining comparison of I / O speeds according to Embodiment 1. FIG. 6 is a conceptual diagram illustrating a configuration of a drawing apparatus according to Embodiment 2. FIG. It is a conceptual diagram for demonstrating operation | movement of the conventional variable shaping type | mold electron beam drawing apparatus. It is a figure which shows an example of a pipeline process.

Explanation of symbols

10 chip 12 drawing data 14 frame 16 block 18 cell 19 graphic 20 chip configuration file 22 cell arrangement data file 24 link data file 26 cell pattern data file 30 integrated data file 100 drawing apparatus 101, 340 sample 102 electron column 103 drawing chamber 105 XY stage 110 Drawing control circuit 120 Control unit 121 Pipeline control unit 122 Input unit 124 Format inspection unit 126 Shot density calculation unit 130 Transfer unit 132 File expansion unit 134 Memory 135, 137 Expansion unit 136 Inspection unit 138 Calculation units 140, 142, 144, 300 Magnetic disk device 150 Drawing unit 160 Control unit 200 Electron beam 201 Electron gun 202 Illumination lenses 203, 410 First aperture 206, 420 Second aperture Catcher 204 projecting lens 205, 208 the deflector 207 an objective lens 330 electron beam 411 opening 421 variable-shaped opening 430 a charged particle source

Claims (2)

A first storage device for storing a plurality of integrated data files in which a plurality of drawing data files are integrated;
First data for sequentially reading the plurality of integrated data files from the first storage device and sequentially performing a first process on the drawing data of each drawing data file integrated into the read integrated data file A processing unit;
Separately from the first process, the plurality of integrated data files are sequentially read out from the first storage device, and the drawing data of each drawing data file integrated into the read integrated data file is read out with respect to the first data. A second data processing unit for performing second processing in order so that the processing and the pipeline processing are performed,
A transfer processing unit that reads and transfers the integrated data file for which data processing has been completed from the first storage device ;
A second storage device for storing the transferred integrated data file;
A drawing unit that draws a pattern defined in a plurality of drawing data files integrated as the integrated data file using a charged particle beam on a sample;
Equipped with a,
In the integrated data file, the plurality of drawing data files are integrated for each predetermined number of drawing unit areas.
A predetermined drawing unit area is used as a processing unit of the pipeline processing,
A development unit for developing the integrated data file read from the first storage device into the plurality of drawing data files;
The first and second processes are performed on the drawing data of each drawing data file developed as a file,
Each drawing data file is a data file for a corresponding one of a plurality of frame areas obtained by dividing a chip area . Sequentially reading out the plurality of integrated data file from the first storage device in which a plurality of drawing data file stores the integrated plurality of integrated data file, rendering the rendering data file that is integrated to the read integrated data file Performing a first process on the data in order;
Separately from the first process, the plurality of integrated data files are sequentially read out from the first storage device, and the drawing data of each drawing data file integrated into the read integrated data file is read out with respect to the first data. A step of performing a second process in order so as to become a process of the above and a pipeline process;
A transfer processing step of reading out and transferring the integrated data file from which data processing has been completed from the first storage device ;
A plurality of drawing data files integrated as the integrated data file are read from the second storage device that stores the transferred integrated data file, and a pattern defined in the plurality of drawing data files using a charged particle beam A drawing process for drawing a sample on a sample;
Equipped with a,
In the integrated data file, the plurality of drawing data files are integrated for each predetermined number of drawing unit areas.
A predetermined drawing unit area is used as a processing unit of the pipeline processing,
Further comprising the step of developing the integrated data file read from the first storage device into the plurality of drawing data files,
The first and second processes are performed on the drawing data of each drawing data file developed as a file,
Each drawing data file is a data file for one corresponding frame area among a plurality of frame areas obtained by dividing a chip area .