JP5147468B2 - 計測装置および露光装置 - Google Patents

計測装置および露光装置 Download PDF

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Publication number
JP5147468B2
JP5147468B2 JP2008060432A JP2008060432A JP5147468B2 JP 5147468 B2 JP5147468 B2 JP 5147468B2 JP 2008060432 A JP2008060432 A JP 2008060432A JP 2008060432 A JP2008060432 A JP 2008060432A JP 5147468 B2 JP5147468 B2 JP 5147468B2
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Japan
Prior art keywords
light
substrate
measurement
stage
image sensor
Prior art date
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Expired - Fee Related
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JP2008060432A
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English (en)
Japanese (ja)
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JP2009216531A (ja
JP2009216531A5 (enExample
Inventor
渉 山口
隆宏 松本
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008060432A priority Critical patent/JP5147468B2/ja
Publication of JP2009216531A publication Critical patent/JP2009216531A/ja
Publication of JP2009216531A5 publication Critical patent/JP2009216531A5/ja
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Publication of JP5147468B2 publication Critical patent/JP5147468B2/ja
Expired - Fee Related legal-status Critical Current
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2008060432A 2008-03-11 2008-03-11 計測装置および露光装置 Expired - Fee Related JP5147468B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008060432A JP5147468B2 (ja) 2008-03-11 2008-03-11 計測装置および露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008060432A JP5147468B2 (ja) 2008-03-11 2008-03-11 計測装置および露光装置

Publications (3)

Publication Number Publication Date
JP2009216531A JP2009216531A (ja) 2009-09-24
JP2009216531A5 JP2009216531A5 (enExample) 2011-04-28
JP5147468B2 true JP5147468B2 (ja) 2013-02-20

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ID=41188543

Family Applications (1)

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JP2008060432A Expired - Fee Related JP5147468B2 (ja) 2008-03-11 2008-03-11 計測装置および露光装置

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JP (1) JP5147468B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787483B2 (ja) * 2010-01-16 2015-09-30 キヤノン株式会社 計測装置及び露光装置
KR20160021301A (ko) 2010-11-12 2016-02-24 에베 그룹 에. 탈너 게엠베하 웨이퍼 스택에 있는 결함 및 층 두께를 측정하기 위한 측정 장치 및 측정 방법
JP6196119B2 (ja) * 2013-10-11 2017-09-13 大塚電子株式会社 形状測定装置及び形状測定方法
JP2015166751A (ja) * 2015-07-03 2015-09-24 エーファウ・グループ・エー・タルナー・ゲーエムベーハー ウェーハスタック内の層厚さ及び欠陥を測定する測定デバイス及び方法
JP7735055B2 (ja) * 2020-02-28 2025-09-08 キヤノン株式会社 識別装置、分別方法
WO2021172274A1 (ja) * 2020-02-28 2021-09-02 キヤノン株式会社 識別装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3444749B2 (ja) * 1997-04-04 2003-09-08 株式会社日立製作所 粒子分布検出方法
JP4460659B2 (ja) * 1997-10-22 2010-05-12 株式会社ルネサステクノロジ 薄膜の膜厚計測方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
JP2004219092A (ja) * 2003-01-09 2004-08-05 Univ Waseda リアルタイム分光画像分析装置及び分析方法
JP2006071784A (ja) * 2004-08-31 2006-03-16 Tokyo Seimitsu Co Ltd 共焦点顕微鏡、外観検査装置及び半導体外観検査装置
JP2006098368A (ja) * 2004-09-30 2006-04-13 Fuji Photo Film Co Ltd 全反射減衰を利用したセンサー
JP2007142078A (ja) * 2005-11-17 2007-06-07 Nikon Corp 位置計測方法及び装置、露光方法及び装置、測定検査装置、並びにプログラム

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JP2009216531A (ja) 2009-09-24

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