JP5055127B2 - 固体前駆物質の蒸気を処理装置に供給する装置 - Google Patents
固体前駆物質の蒸気を処理装置に供給する装置 Download PDFInfo
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- JP5055127B2 JP5055127B2 JP2007542005A JP2007542005A JP5055127B2 JP 5055127 B2 JP5055127 B2 JP 5055127B2 JP 2007542005 A JP2007542005 A JP 2007542005A JP 2007542005 A JP2007542005 A JP 2007542005A JP 5055127 B2 JP5055127 B2 JP 5055127B2
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- Prior art keywords
- solid precursor
- container
- gas
- vapor
- outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
- B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
- B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
- Chemical Vapour Deposition (AREA)
Description
昇華の起こる固体前駆物質の表面積が徐々に減少する。
優先的な様式でキャリアガスが流れ、固体前駆物質との接触を制限するような流路が固体前駆物質に成形される。
Claims (11)
- 少なくとも1つの固体前駆物質の蒸気を物理化学処理装置(12)に供給する装置(30)において、
入口(34)及び出口(36)を備えており、出口を物理化学処理装置に接続すべくなされており、固体前駆物質の粒子を収容することが可能な収容器(32)と、
固体前駆物質の蒸気を出口に搬送すべく、且つ固体前駆物質の粒子を流動床とすべく、入口及び出口の間でガスを循環させる手段(42,43,44)と、
前記流動床をなす固体前駆物質の蒸気を発生させるように、収容器(32)の内容物を加熱する手段と
を備えることを特徴とする装置。 - 出口(36)に接続されており、物理化学処理装置(12)に連通すべくなされているダクト(22)と、
固体前駆物質の蒸気濃度を高くしたガスにより搬送された固体前駆物質の粒子を捕獲でき、ダクトの位置及び/又は出口の位置にあるフィルタ(46)と
を更に備えることを特徴とする請求項1に記載の装置。 - 収容器(32)は、固体前駆物質の粒子を受け入れることのできる収容器の入口(34)と内容物との間にグリッド(38)を備えることを特徴とする請求項1に記載の装置。
- ガスを循環させる手段(42,43,44)は、
ガス供給手段(42)と、
ガス供給手段を収容器(32)に接続するダクト(43)と、
ダクトを通って流れるガス流を制御するための手段(44)と
を備えることを特徴とする請求項1に記載の装置。 - 少なくとも1つの固体前駆物質の蒸気を供給するための装置(30)と蒸気を受け入れる物理化学処理装置(12)とを備える物理化学処理システムであって、
入口(34)及び出口(36)を備えており、出口を物理化学処理装置に接続すべくなされており、固体前駆物質の粒子を収容することが可能な収容器(32)と、
固体前駆物質の蒸気を出口に搬送すべく、且つ固体前駆物質の粒子を流動床とすべく、入口及び出口の間でガスを循環させる手段(42,43,44)と、
前記流動床をなす固体前駆物質の蒸気を発生させるように、収容器(32)の内容物を加熱する手段と
を備えることを特徴とするシステム。 - 物理化学処理装置(12)が化学蒸着装置であることを特徴とする請求項5に記載のシステム。
- 少なくとも1つの固体前駆物質の蒸気を物理化学処理装置(12)に供給する方法において、
入口(34)及び物理化学処理装置に接続された出口(36)を備える収容器(32)に固体前駆物質の粒子を供給するステップと、
固体前駆物質の粒子を流動床とすべく、収容器中にてガスを循環させるステップと、
前記流動床をなす固体前駆物質の蒸気を発生させるように、収容器(32)の内容物を加熱するステップと、
固体前駆物質の蒸気濃度を高くしてあり、出口を通して排出されるガスを物理化学処理装置に供給するステップと
を含むことを特徴とする方法。 - 固体前駆物質は、流動床の形成を補助する不活性固体化合物の粒子と混合されることを特徴とする請求項7に記載の方法。
- ガスは不活性ガスであることを特徴とする請求項7に記載の方法。
- 収容器(32)の内容物は、250℃よりも低い温度に保たれることを特徴とする請求項7に記載の方法。
- 出口(36)位置での平均圧力が1000Paよりも高いことを特徴とする請求項7に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0452817A FR2878453B1 (fr) | 2004-11-30 | 2004-11-30 | Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement |
FR0452817 | 2004-11-30 | ||
PCT/EP2005/056358 WO2006058895A1 (en) | 2004-11-30 | 2005-11-30 | Device for providing vapors of a solid precursor to a processing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008522022A JP2008522022A (ja) | 2008-06-26 |
JP5055127B2 true JP5055127B2 (ja) | 2012-10-24 |
Family
ID=34951620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007542005A Expired - Fee Related JP5055127B2 (ja) | 2004-11-30 | 2005-11-30 | 固体前駆物質の蒸気を処理装置に供給する装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080268143A1 (ja) |
EP (1) | EP1828427A1 (ja) |
JP (1) | JP5055127B2 (ja) |
FR (1) | FR2878453B1 (ja) |
WO (1) | WO2006058895A1 (ja) |
Families Citing this family (17)
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GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
DE102006026576A1 (de) * | 2006-06-06 | 2008-01-10 | Aixtron Ag | Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs |
JP5257197B2 (ja) * | 2008-03-31 | 2013-08-07 | 住友化学株式会社 | 有機金属化合物供給装置 |
WO2011053505A1 (en) | 2009-11-02 | 2011-05-05 | Sigma-Aldrich Co. | Evaporator |
US8758515B2 (en) * | 2010-08-09 | 2014-06-24 | Rohm And Haas Electronic Materials Llc | Delivery device and method of use thereof |
KR101329032B1 (ko) * | 2011-04-20 | 2013-11-14 | 주식회사 실리콘밸류 | 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법 |
DE102011121078B4 (de) | 2011-12-12 | 2013-11-07 | Oliver Feddersen-Clausen | Zyklisches Verdampfungsverfahren |
US9598766B2 (en) | 2012-05-27 | 2017-03-21 | Air Products And Chemicals, Inc. | Vessel with filter |
KR101543858B1 (ko) * | 2013-02-28 | 2015-08-11 | 고려대학교 산학협력단 | 원자층 증착 장치 |
KR102344996B1 (ko) * | 2017-08-18 | 2021-12-30 | 삼성전자주식회사 | 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
US10814395B2 (en) * | 2018-01-24 | 2020-10-27 | General Electric Company | Heated gas circulation system for an additive manufacturing machine |
US10814388B2 (en) | 2018-01-24 | 2020-10-27 | General Electric Company | Heated gas circulation system for an additive manufacturing machine |
US11168394B2 (en) * | 2018-03-14 | 2021-11-09 | CeeVeeTech, LLC | Method and apparatus for making a vapor of precise concentration by sublimation |
US20220042174A1 (en) * | 2018-03-14 | 2022-02-10 | CeeVeeTech, LLC | Method and apparatus for making a vapor of precise concentration by sublimation |
WO2020114580A1 (en) * | 2018-12-04 | 2020-06-11 | Applied Materials, Inc. | Evaporation apparatus for evaporating a material and method for evaporating a material with an evaporation apparatus |
US11566327B2 (en) * | 2020-11-20 | 2023-01-31 | Applied Materials, Inc. | Methods and apparatus to reduce pressure fluctuations in an ampoule of a chemical delivery system |
FI20225491A1 (en) * | 2022-06-03 | 2023-12-04 | Canatu Oy | REAGENT CARTRIDGE AND REACTOR EQUIPMENT |
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-
2004
- 2004-11-30 FR FR0452817A patent/FR2878453B1/fr not_active Expired - Fee Related
-
2005
- 2005-11-30 EP EP05816231A patent/EP1828427A1/en not_active Withdrawn
- 2005-11-30 JP JP2007542005A patent/JP5055127B2/ja not_active Expired - Fee Related
- 2005-11-30 US US11/792,020 patent/US20080268143A1/en not_active Abandoned
- 2005-11-30 WO PCT/EP2005/056358 patent/WO2006058895A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP1828427A1 (en) | 2007-09-05 |
FR2878453A1 (fr) | 2006-06-02 |
US20080268143A1 (en) | 2008-10-30 |
FR2878453B1 (fr) | 2007-03-16 |
WO2006058895A1 (en) | 2006-06-08 |
JP2008522022A (ja) | 2008-06-26 |
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